Abstract: Off-axis projection optics that includes first and second mirrors positioned off-axis and sharing a confocal point that are arranged to reduce linear astigmatism. If a distance between an object plane and the first mirror is l1, an incident angle of light coming from the object plane to the first mirror is i1, a distance between the first mirror and the confocal point is l1?, a distance between the confocal point and the second mirror is l2, an incident angle of light coming from the first mirror to the second mirror is i2, and a distance between the second mirror and an image plane is l2?, the off-axis projection optics may satisfy the following equation: l 1 ? + l 1 l 1 ? tan ? ? i 1 = l 2 ? + l 2 l 2 ? tan ? ? i 2 .

Abstract: A catadioptric projection system for forming an intermediate image of a first object plural times, and images the intermediate image onto a second object includes at least two deflective reflectors, a lens unit arranged in an optical path between the two deflective reflectors, the lens unit having a negative refractive power, and not forming a reciprocating optical system that passes incident light and reflected light.

Abstract: An optical element and a manufacturing method therefor, an exposure apparatus, and a device manufacturing method that can reduce the effect of intrinsic birefringence under high NA conditions. According to an optical element as one aspect of the present invention, an angle between a [0 0 1] axis of an isometric crystal and an optical axis is less than 10°, and preferably 0°.

Abstract: A projection device includes an image source unit, a first projecting optical system, an intermediate optical system, and a second projecting optical system. The image displaying area of the image source unit is tilted with respect to a first virtual plane, and an intermediate image is tilted with respect at least the first virtual plane. A following relationship is satisfied: - 1 > tan ? ? ?2 tan ? ? ?1 > f ? ? 1 H 2 ? sin ? ? ?1 where, f1 denotes a focal length of the first projecting optical system, ?1 denotes a tilt angle of the image display surface of the image source unit with respect to the first virtual plane, H represents a length of the image source unit which corresponds to the image projected on the screen in the vertical direction, and ?2 denotes a tilt angle of the intermediate image with respect to the first imaginary surface.

Abstract: An image projecting apparatus includes a light source, a relay lens, a reflective light valve, and a projection lens. The light source is capable of emitting a light beam. The relay lens is disposed to permit the light beam provided by the light source to pass therethrough, and has a lens periphery formed with a notch. The reflective light valve is spaced apart from the relay lens, and is disposed to receive and modulate the light beam passing through the relay lens into an image light beam. The projection lens is disposed proximate to the notch of the relay lens, and is capable of projecting the image light from the reflective light valve to display an image onto a screen. The relay lens has a plurality of light-absorbing regions proximate to the notch for reducing a light-splitting effect attributed to the notch.

Abstract: A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.

Abstract: A projection optical system for performing enlargement projection from a primary image surface on the reduction side to a secondary image surface on the enlargement side has, from the primary image surface side, a lens optical system including two or more lens elements sharing a common rotation-symmetry axis and each having an optical power, a first reflective optical element having an optical power, and a second reflective optical element having a negative optical power. The projection optical system is non-telecentric toward the reduction side, and a prescribed condition is.

Abstract: A catadioptric projection optical system includes a first optical system, for receiving light from an object, a second optical system, for forming an image of the object on an image plane, and a third optical system disposed optically between the first optical system and the second optical system. The first, second and third optical systems have a common straight optical axis. The image of the object is projected onto the image plane through a plurality of real intermediate image formations, and a pupil plane of the catadioptric projection optical system is free of a void area.

Abstract: Projection lenses for use with pixelized panels (PP) are provided. The projection lenses have a first unit (U1) separated from a positive second unit (U2). The lenses are telecentric on the short conjugate side, have a large field of view in the direction of the long conjugate, have low aberration levels, and include a space between two of the lens elements making up the lens which is sufficient to accept a reflective surface (RS) for folding the lens' optical axis. The second or rear lens unit (U2) includes at least a first color-correcting lens subunit (SU2/CC1) which has a positive-followed-by-negative form and contributes to the correction of the chromatic aberrations of the projection lens, including the correction of lateral color.

Abstract: A projection lens for a EUV microlithographic projection exposure apparatus comprises a diaphragm (BL) which is arranged at a distance (D) in front of a mirror (S2) of the lens. The diaphragm (BL) has a non-round aperture with an edge contour that may be configured such two rays of a light bundle disposed symmetrically with respect to a chief ray are treated equally, i.e. either both rays pass through the diaphragm aperture or both are blocked by the diaphragm.

Abstract: A lithography apparatus having variable lenses.

Abstract: A projection system for imaging an object field onto an image field, including at least two partial objectives (S1, S2); at least one intermediate image field between the partial objectives (S1, S2); and a concave reflector (119, 219) having a concave reflecting surface. The concave reflecting surface crosses an optical axis of the projection system proximate along the optical axis to the intermediate image field. Alternatively or in addition, the concave reflecting surface crosses an optical axis of the projection system at a position where the condition |HCR/HMR|?2 is met, with HCR being a chief ray height and HMR being a marginal ray height with respect to the optical axis.

Abstract: Provided is a projection lens, including: a plurality of moving lens units that move on an optical axis for zooming; and a plurality of plastic lenses containing plastic, in which when a focal distance of an i-th positive lens from a predetermined plane side of N positive lenses of the plurality of plastic lenses is given by fpi, a focal distance of a j-th negative lens from the predetermined plane side of M negative lenses of the plurality of plastic lenses is given by fnj, and fp and fn are defined by 1 fp = ? i = 1 N ? 1 fpi 1 fn = ? j = 1 M ? 1 fnj (N and M each are a natural number, that is, an integer equal to or larger than 1), ?0.56<fn/fp<?0.05 is satisfied.

Abstract: In a projection type image display apparatus, a projector optical unit for projecting an image onto a screen while magnifying a size of the image to be projected with respect to an original size of the image displayed by an image forming element, has a group of lenses for magnifying the size of the image with respect to the original size thereof, and an optical path extending from the image forming element to the screen to transmit the image along the optical path.

Abstract: A projection display device for enlarging and projecting an image includes a first lens group on the enlarging end of the projection display device, a plurality of display elements, each modulating a different one of a plurality of light beams with image information, an optical combiner for receiving from different directions different light beams modulated by different display elements, combining the modulated light beams, and directing the combined modulated light beams along an optical axis to the first lens group, and a plurality of second lens groups, each arranged on a separate optical axis so that a different one of the modulated light beams modulated by a different display element on the separate optical axis passes through one of the second lens groups before being incident on the optical combiner. The projection optical device satisfies certain conditions related to focal lengths and size of the display elements.

Abstract: A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration. The projection objective includes optical elements arranged along an optical axis thereof, which include a first group of elements following the object plane and a last optical element following the first group, which is arranged near the image plane. The last optical element defines an exit surface of the projection objective, which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no or only slight curvature. The method includes varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and axially displacing the last optical element to set a working distance.

Abstract: A very high-aperture, purely refractive projection objective having a multiplicity of optical elements has a system diaphragm (5) arranged at a spacing in front of the image plane. The optical element next to the image plane (3) of the projection objective is a planoconvex lens (34) having a substantially spherical entrance surface and a substantially flat exit surface. The planoconvex lens has a diameter that is at least 50% of the diaphragm diameter of the system diaphragm (5). It is preferred to arrange only positive lenses (32, 33, 34) between the system diaphragm (5) and image plane (3). The optical system permits imaging in the case of very high apertures of NA?0.85, if appropriate of NA?1.

Abstract: A projection exposure machine comprises a projection lens with a lens arrangement and at least one stop. The lens arrangement comprises a group of optical elements which is arranged between the stop and the image plane. An optical element of the group situated close to the image plane has a thickness of at least 6.5% of the entire stop diameter.

Abstract: A holding unit holds a plurality of types of white balance adjustment color data with respect to colors of the plurality of projection surfaces. A projection control unit causes a projection unit to simultaneously project patterns having a plurality of colors based on the plurality of types of held color data, upon dividing the patterns into areas configured to be selected for each pattern. A selection control unit causes a designation unit to select a pattern which is whitest from the patterns having the plurality of projected colors. When a given pattern is selected from the patterns having the plurality of colors projected, a color data acquiring unit acquires color data corresponding to the selected pattern from the plurality of types of held color data. A color correction unit performs color correction of an image to be projected.

Abstract: A semiconductor manufacturing apparatus includes a liquid supplying section for supplying a liquid onto a stage for holding a wafer on which a resist film is formed; an exposing section for irradiating the resist film with exposing light through a mask with the liquid provided on the resist film; and a removing part for removing, from the liquid, a gas included in the liquid. Thus, the liquid from which the gas has been removed is provided on the resist film, and therefore, foams included in the liquid or formed during the exposure can be removed. Accordingly, exposure abnormality such as diffraction abnormality can be prevented, resulting in forming a resist pattern in a good shape.

Abstract: Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8<D1/D2<1.1.

Abstract: A zoom lens comprises a plurality of lens units including a first lens unit disposed most adjacent to an enlargement side and having negative refractive power, wherein one or more lens units of the plurality of lens units are moved in the direction of the optical axis thereof during magnification change, and wherein the first lens unit includes a 1-1st lens unit comprising at least one lens of negative refractive power and moved during focusing and a 1-2nd lens unit having positive refractive power, and fixed during focusing.

Abstract: A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L?0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.

Abstract: A projection lens system that is suited to a compact, wide-angle lens system. The projection lens system projects projection light from a light modulator onto a screen, wherein the projection lens system is constructed, in order from a screen side thereof, of a first lens group with negative refractive power and a second lens group with positive refractive power and is non-telecentric on an incident side thereof, and the second lens group includes a pair of cemented doublet lenses with positive refractive power whose cemented surfaces face in opposite directions and a cemented triplet lens with positive refractive power.

Abstract: A lens includes mechanical dithering that displaces pixels adjacent to undithered pixels. The dithering, for example, precisely places pixels above, below, and on both sides of the undithered pixel. Image data is supplemented with interpolation and/or new data in additional pixel locations. The image data may be projected by a dithered lens.

Abstract: A method and system for improving the contrast ratio of a projected image. An asymmetric aperture stop improves the contrast ratio of a projected image. Using slightly offset projection, the majority of the on-state projection light from the modulator array passes through a region that is not centered in the projection lens pupil. The blocked region of the asymmetric aperture is oriented toward the illumination path and away from the specular reflection path. The asymmetric aperture is able to block a significant portion of the diffracted light using the blocked region, without blocking much of the desired projection light passing through the remainder of the aperture. The result is that dark regions of the image become significantly darker, while light regions remain about the same. The same effect occurs without offset illumination.

Abstract: A projector, includes: a light source device; an optical modulator arranged on an illumination optical axis of a light beam irradiated by the light source device to modulate the light beam in accordance with image information and form an optical image; a projection lens that enlarges the optical image formed by the optical modulator and projects the optical image; and an optical converter arranged between the optical modulator and the projection lens and provided with an optical conversion area that optically converts the incident light beam, in which the optical conversion area of the optical converter is formed in a profile on which substantially all of the light beams irradiated from the optical modulator to be irradiated from the projection lens as the optical image are incident, the optical modulator has a center axis passing though the center of an optical image formation area of the optical modulator and being parallel to the illumination optical axis, the projection lens is so arranged that a lens opt

Abstract: A projection type display apparatus, wherein a common case can be used for housing an illumination optical system even when a shape of an image display element and an optical path length in a prism are different, is provided: wherein a light source for emitting an illumination light, an image display device, an illumination optical system for irradiating the illumination light from the light source to the image display device, and a projection optical system for projecting an image formed by said image display device are provided; the illumination optical system comprises a first fly-eye lens and a second fly-eye lens arranged at each other's focal points, a first lens group and a second lens group arranged over a mirror for bending an optical path; the first and second lens groups have a same focal length but a different back focus; and predetermined condition formulas are satisfied.

Abstract: The present invention provides a zoom lens that suppresses the generation of unnecessary light and is suitable for a projection lens. The zoom lens is used as a projection lens of a projector in which a prism is located between the projection lens and a spatial optical modulating element B. A lens closest to the spatial optical modulating element B is a meniscus positive lens whose convex surface faces a screen. A refractive index of the meniscus positive lens is 1.75 or more.

Abstract: Disclosed is an illumination optical system having an imaging optical system for imaging a predetermined object plane upon an image plane, by use of light supplied from an integrator that functions to produce a plurality of light sources using light from a light source. In one preferred form of the invention, the imaging optical system includes, in an order from a light incidence side thereof, a first lens group having a positive power, a second lens group having a negative power, and a third lens group having a positive power, wherein the second lens group includes a concave lens at a light exit side thereof and wherein the third lens group includes a convex lens at a light entrance side thereof. The position of intersection between an optical axis of the imaging optical system and a principal ray of abaxial light is defined between the second lens group and the third lens group.

Abstract: A projection aligner of the present invention, in which ultraviolet light emitted from a lamp housing is split by a fly-eye lens into a large number of point light sources which are independent of one another. Further, in this projection aligner, the light is shaped by an aperture, so that a secondary light source plane is formed. Moreover, after an exposure area is established by a blind, a photomask is illuminated. Thereafter, an image of a light source is formed on a pupillary surface of a projection optical system from light diffracted by the photomask. Furthermore, a wave front aberration is compensated by an aberration eliminating filter placed on the pupillary surface of the optical system of the projection aligner. Then, the image of a circuit pattern is formed on a wafer. Thereby, the influence of the aberration of the optical system is eliminated. Consequently, the high-accuracy transferring of the pattern can be achieved.

Abstract: A projection lens assembly is provided that includes first, second, third, fourth, fifth, and sixth lenses. The second, third, fifth, and sixth lenses of the projection lens assembly form a double gauss-type lens assembly. The first lens is configured to provide telecentricity and the fourth lens in configured to correct aberrations due to variations in the third lens.

Abstract: Aspects of the invention can provide a projector including a illumination system, an electro-optic modulator, and a projection system. The illumination system can include device that emits a substantially parallel illumination light beam to the side of an illuminated region, a first lens array that has plural small lenses for dividing the illumination light beam into a plurality of partial light beams, a second lens array that has plural small lenses corresponding to the plural small lenses of the first lens array, a polarization conversion element for converting into polarized light an unpolarized light included in the illumination light beam emerging from the second lens array, and a superposition lens for superposing the partial light beams on the illuminated region. The electro-optic modulator can modulate the illumination light beam in response to image information. The projection system can project the illumination light beam modulated by the electro-optic modulator.

Abstract: In a projection cathode ray tube device in which a projection cathode ray tube and a projection lens assembly are coupled and held by a coupler, superior focus characteristics and high resolution are realized by eliminating the deviation between the center of the phosphor screen of the cathode ray tube and the center of the lens assembly. In the cathode ray tube, each of the outside and inside surfaces of a faceplate is formed as a spherical convex surface which is curved toward an electron gun.

Abstract: The invention relates to a projection lens comprising a lens assembly that has at least one first narrowing of the group of light beams. A lens with a non-spherical surface is located in front of and/or behind the first narrowing.

Abstract: A projection objective has at least five lens groups (G1 to G5) and has several lens surfaces. At least two aspheric lens surfaces are arranged so as to be mutually adjacent. These mutually adjacently arranged lens surfaces are characterized as a double asphere. This at least one double asphere (21) is mounted at a minimum distance from an image plane (0?) which is greater than the maximum lens diameter (D2) of the objective.

Abstract: A very-high aperture, purely refractive projection objective is designed as a two-belly system with an object-side belly, an image-side belly and a waist (7) situated therebetween. The system diaphragm (5) is seated in the image-side belly at a spacing in front of the image plane. Arranged between the waist and the system diaphragm in the region of divergent radiation is a negative group (LG5) which has an effective curvature with a concave side pointing towards the image plane. The system is distinguished by a high numerical aperture, low chromatic aberrations and compact, material-saving design.

Abstract: Provided is a projection optical system for forming an image of a pattern of a first object (R) on a second object (W). The projection optical system is made of an optical material having a refractive index of not more than 1.6 and is substantially telecentric both on the first object side and on the second object side. The projection optical system satisfies the condition of (?×L)/(NA×Y02)<1.5×10?3, where ? is a wavelength of light, L a distance between the first object and the second object, MA a numerical aperture on the second object side, and Y0 a maximum image height on the second object.

Abstract: Projection lenses for use with pixelized panels (PP) are provided. The projection lenses have a first unit (U1) separated from a positive second unit (U2) by a distance sufficient to accept a reflective surface (RS) for folding the lens' optical axis. The lenses are telecentric on the short conjugate side, have a large field of view in the direction of the long conjugate, and have low aberration levels. By using negative lens elements (LU1/N1 and LU1/N2) composed of plastic materials having large positive Q-values at the long conjugate side of the first lens unit (U1), the lenses can achieve low levels of lateral color, including low levels of secondary lateral color, with reduced cost compared to lenses which employ anomalous dispersion glasses in the first lens unit.

Abstract: A projection type image display apparatus having an image display element outputting an image ray, a projection lens apparatus for performing overhead projection of the image ray from the image display element, the projection lens apparatus having a plurality of lens elements, a reflection mirror reflecting the image ray from the projection lens apparatus, and a screen on which the image ray reflected by the reflection mirror is projected.

Abstract: Projection lens systems for use with cathode ray tube (CRT) projection televisions are provided which have positive first lens units (U1) and negative second lens units (U2) where the negative second lens units are customized in terms of at least one optical property for at least two of the colors of light produced by the CRTs with which the units are used. The at least one optical property is not spectral transmission, although the second lens units can also be customized for spectral transmission. As illustrated in FIGS. 1B–1F and FIGS. 8B–8F, such customization of a non-transmissive property provides an effective and cost effective approach for improving the color performance of CRT projection lens systems. Constructions for the positive first lens unit which improve image contrast and reduce manufacturing costs are also provided.

Abstract: Optical system designs for projectors using flat light sources are disclosed. These projectors make use of imagers that manipulate the transmission or reflectance of light through electronically controlled pixels. The optical systems of the invention employ a rectangular flat light source that is matched to the aspect ratio of the imager itself, thus enabling very efficient use of light. Several flat light sources are possible for this projection system, including flat fluorescent lights and field emission light sources. Collimation of these light sources is an option. Polarization conversion means is also disclosed for such flat light sources, so that the light output is almost totally linearly polarized. Such projection systems can be very compact.

Abstract: A reticle-masking (REMA) objective for imaging an object plane onto an image plane has a condenser portion, an intermediate portion, and a field lens portion. The three portions together have no more than 10 lenses with a combined total of no more than five aspheric lens surfaces. Each of the three portions of the REMA objective has one or two aspheric lens surfaces.

Abstract: A luminous flux, from one conjugate surface (A), having an opening angle of at least 10° sequentially passes through a first optical system (30) having a luminous flux convergent action in the vicinity of its reference axis and a second optical system (31) having a luminous flux divergent action in the vicinity of its reference axis, and converges on another conjugate surface (B). A specific condition is given to the converging distance of each converging point at a luminous flux section including a principal ray according to the v passing position of the luminous flux through the first optical system (30) to thereby implement an oblique-incident optical system having a half angle of at least 60° and a comparatively simple structure irrespective of a type of an optical element used.

Abstract: A projection lens system that projects projection light from a light modulator onto a screen and which is telecentric on an input side is provided. The projection lens system comprises a first meniscus lens that is disposed closest to the screen, is convex on a screen side, and has negative refractive power; and a second meniscus lens that is disposed next closest to the screen, is convex on a screen side, and has negative refractive power. The first meniscus lens is made of plastic and at least one out of two curved surfaces thereof is aspherical, and a refractive power of the first meniscus lens is lower than a refractive power of the second meniscus lens. In the projection lens system, far superior aberration-correcting performance can be achieved and a drop in aberration-correcting performance due to thermal deformation can be prevented.

Abstract: An optical element and a manufacturing method therefor, an exposure apparatus, and a device manufacturing method that can reduce the effect of intrinsic birefringence under high NA conditions. According to an optical element as one aspect of the present invention, an angle between a [0 0 1] axis of an isometric crystal and an optical axis is less than 10°, and preferably 0°.

Abstract: A catadioptric projection optical system for projecting an image of an object onto an image plane through two intermediate image formations. The catadioptric projection optical system includes a first optical system, for receiving light from the object, including a plurality of lenses, a second optical system, for forming the image of the object on the image plane, including a plurality of lenses, and a third optical system disposed optically between the first optical system and the second optical system. The third optical system includes a first concave mirror and a second concave mirror. The light is reflected by the first concave mirror then by the second concave mirror to be directed to the second optical system along a z-shaped optical path, and the first, second and third optical systems have a common straight optical axis.

Abstract: In order to provide a display device by which increasing of number of spatial light modulation elements and increasing of number of pixels can be suppressed, and high definition of a display image is easily realized, in the display device, a DMD is inclined with respect to a sub scanning direction by very small inclining-angle, and this inclining-angle is set in accordance with a scanning density of a light beam in a main scanning direction on the surface to be scanned.

Abstract: A projection lens system for an image projection apparatus that enhances the image aberration correction rate to achieve high resolution and luminance. The lens system includes a first lens group having first and second spherical lenses of positive refraction power movable along an optical axis, a second lens group having a third doublet lens formed with a lens of positive refraction power and a lens of negative refraction power in junction to correct chromatic aberration, and a fourth spherical lens to correct spherical aberration, a third lens group having lenses of positive refraction power, and a fourth lens group for correcting distortions having a seventh spherical lens being concave on both surfaces thereof, an eighth spherical lens of negative refraction power having a concave surface on one side and a convex surface on the other side, and a ninth lens of negative refraction power having an aspheric surface.

Abstract: Telecentric lens systems for use with pixelized panels, such as LCD or DMD panels, are provided. The systems have a long aperture stop to object distance (ASOD) and a high level of aberration correction, including a high level of lateral color correction. Preferably, the systems also have a low f-number and are wide angle. The systems include a negative first unit which produces the long ASOD, a weak second unit which includes two meniscus elements which surround the system's aperture stop, and a positive third unit which images the aperture stop to form the system's telecentric pupil.