Abstract: Technologies relating to crossbar array circuits with nTnR design to reduce sneak current path and minimize area size are disclosed. An example crossbar array circuit includes: a first transistor comprising a first source terminal, a first drain terminal and a first gate terminal; a first RRAM device connected to the first source terminal of the first transistor; a second transistor comprising a second source terminal, a second drain terminal and a second gate terminal; a second RRAM device connected to the second source terminal of the second transistor; a word line connected to the first drain terminal of the first transistor and the second drain terminal of the second transistor; a first bit line connected to the first RRAM device; and a second bit line connected to the second RRAM device, wherein the first gate terminal of the first transistor is configured to be connected to a first selective voltage source, and the second gate terminal is configured to be connected to a second selective voltage source.

Abstract: A magnetic memory according to one embodiment of the present invention comprises: a magnetic tunnel junction comprising a free layer, a reference layer, and a tunnel barrier layer disposed between the free layer and the reference layer; a first conductive line disposed adjacent to the free layer; and a second conductive line disposed adjacent to the free layer and intersecting the first conductive line. A magnetization switching method of the magnetic memory comprises the steps of: applying an alternating current-type first current having a first frequency to the first conductive line; and applying an alternating current-type second current having the first frequency to the second conductive line. The free layer performs magnetization reversal, using the first current and the second current, and the magnetic tunnel junction is disposed on an intersection point between the first conductive line and the second conductive line.

Abstract: Disclosed herein is an integrated circuit including multiple magnetic tunneling junction (MTJ) cells coupled to a static random access memory (SRAM). In one aspect, the integrated circuit includes a SRAM having a first port and a second port, and a set of pass transistors coupled to the first port of the SRAM. In one aspect, the integrated circuit includes a set of MTJ cells, where each of the set of MTJ cells is coupled between a select line and a corresponding one of the set of pass transistors.

Abstract: Methods, systems, and devices for discharge current mitigation in a memory array are described. Access lines of a memory array may be divided into discrete segments, with each segment coupled with a driver for the access line by one or more vias respective to the segment. For example, a first segment of an access line may be coupled with a first set of memory cells, a second segment of the access line may be coupled with a second set of memory cells, and a driver may be coupled to the first segment by a first via and to the second segment by a second via. To access a memory cell in either the first set or the second, both the first segment of the access line and the second segment of the access line may be activated together by the common driver.

Abstract: An apparatus is described. The apparatus includes a cross-point non volatile memory cell array comprised of a first plurality of access lines and a second orthogonal plurality of access lines. Each of the first plurality of access lines are coupled to a first address decoder through a respective pass transistor. The pass transistor is coupled to control circuitry to bias the pass transistor into one of at least two states that include a first active state determined from a second address decoder and a second active state determined from the second address decoder.

Abstract: A memory cell includes a first conductive line, a lower electrode, a carbon nano-tube (CNT) layer, a middle electrode, a resistive layer, a top electrode and a second conductive line. The first conductive line is disposed over a substrate. The lower electrode is disposed over the first conductive line. The carbon nano-tube (CNT) layer is disposed over the lower electrode. The middle electrode is disposed over the carbon nano-tube layer, thereby the lower electrode, the carbon nano-tube (CNT) layer and the middle electrode constituting a nanotube memory part. The resistive layer is disposed over the middle electrode. The top electrode is disposed over the resistive layer, thereby the middle electrode, the resistive layer and the top electrode constituting a resistive memory part. The second conductive line is disposed over the top electrode.

Abstract: A weight cell, an electronic device and a device are provided. The weight cell includes a first resistive memory element and a second resistive memory element, a select transistor, and a layer of Spin Hall (SH) material disposed between the first resistive memory element and the second resistive memory element, the layer of the SH material including a first contact and a second contact. The first contact of the SH material is connected to a drain of the select transistor and the second contact of the SH material is connected to an external word line.

Abstract: An electron device using a crossbar array and capable of implementing a high-speed and high-reliability process is provided. An operational processing device (100) includes a crossbar array (110); a row selecting/driving circuit (120) electrically coupling to a row line; a column selecting/driving circuit (130) electrically coupling to a column line; and a control part (140) controlling each part. The control part (140) is capable of applying, from the row selecting/driving circuit (120), an output signal received by the row selecting/driving circuit (120) or applying, from the column selecting/driving circuit (130), an output signal received by the column selecting/driving circuit (130).

Abstract: The present disclosure, in some embodiments, relates to a method of forming an integrated chip. The method may be performed by forming a memory device over a substrate and forming an inter-level dielectric (ILD) layer over the memory device. The ILD layer is selectively etched to define a first cavity that exposes a top of the memory device and to define a second cavity that is laterally separated from the first cavity by the ILD layer. The second cavity is defined by a smooth sidewall of the ILD layer that extends between upper and lower surfaces of the ILD layer. A conductive material is formed within the first cavity and the second cavity.

Abstract: A resistance variable memory device may include a plurality of tiles in which memory cells are arranged. The first to third level of the word lines may be sequentially stacked on the plurality of tile regions with the decoding circuits along rows of the tile regions. A first level of the bit lines may be interposed between the first level of the word lines and the second level of the word lines. A first level of the bit lines may be extended along columns of the tile regions. The second level of the bit lines may be interposed between the second level of the word lines and the third level of the word lines. The second level of the bit lines may be extended along the columns of the tile regions. The first and third levels of the word lines at a selected row of a selected tile region among the tile regions and the second level of the bit lines at a selected column of the selected tile region may be controlled by a decoding circuit of the selected tile region.

Abstract: An RRAM cell stack is formed over an opening in a dielectric layer. The dielectric layer is sufficiently thick and the opening is sufficiently deep that an RRAM cell can be formed by a planarization process. The resulting RRAM cells may have a U-shaped profile. The RRAM cell area includes contributions from a bottom portion in which the RRAM cell layers are stacked parallel to the substrate and a side portion in which RRAM cell layers are stacked roughly perpendicular to the substrate. The combined side and bottom portions of the curved RRAM cell provide an increased area in comparison to a planar cell stack. The increased area lowers forming and set voltages for the RRAM cell.

Abstract: A reference circuit for generating a reference current includes a plurality of resistive elements including at least one magnetic tunnel junction (MTJ). A control circuit is coupled to a first terminal of the at least one MTJ and is configured to selectively flow current through the at least one MTJ in the forward and inverse direction to generate a reference current.

Abstract: Apparatuses and methods of manufacture are disclosed for phase change memory cell electrodes having a conductive barrier material. In one example, apparatus includes a first chalcogenide structure and a second chalcogenide structure stacked together with the first chalcogenide structure. A first electrode portion is coupled to the first chalcogenide structure, and a second electrode portion is coupled to the second chalcogenide structure. An electrically conductive barrier material is disposed between the first and second electrode portions.

Abstract: Resistive random-access memory cell structures including a first and second resistive random-access memory element stacks, each including an anode and a cathode; a pass transistor having first and second source/drain terminals, and a gate terminal. The gate terminal is connected to the anodes of the first and second resistive random-access memory element stacks. An isolation layer is disposed upon the gate terminal. The isolation layer includes at least two vias, each defined by a perimeter extending from a top surface of the isolation layer to a bottom surface of the isolation layer, each perimeter exposes a portion of the gate. The first and second resistive random-access memory element stacks include a bottom electrode, a switching layer, a top electrode and a low-resistance film. The gate is the bottom electrode. The switching layer, top electrode and low resistance film are disposed in the vias.

Abstract: A logic state to be stored at a memory cell of a memory device is determined, where the logic state is to be represented by a threshold voltage stored at the memory cell. A verify reference voltage associated with the logic state is determined. The verify reference voltage defines a target voltage level of the threshold voltage associated with the logic state. The verify reference voltage is updated using an amount of compensation for an expected shift in the threshold voltage of the memory cell after heat is applied to the memory device. Before the heat is applied to the memory device, a plurality of sets of multiple programming pulses to the memory cell is applied until a threshold condition is satisfied. The threshold condition is associated with a relative magnitude of the threshold voltage of the memory cell to the updated verify reference voltage.

Abstract: A three-dimensional (3D) memory device includes parallel lower and upper bit lines, parallel word lines, lower and upper memory cells, a lower bit line contact in contact with the lower bit line, and an upper bit line contact in contact with the upper bit line. The parallel word lines are in a same plane between the lower and the upper bit lines. Each word line is perpendicular to the lower and upper bit lines. Each lower memory cell is disposed at an intersection of the lower bit line and a respective word line. Each upper memory cell is disposed at an intersection of the upper bit line and a respective word line. Each lower or upper memory cell includes stacked a phase-change memory (PCM) element, a selector, and electrodes. At least one of the lower and upper bit line contacts is disposed inclusively between the lower and upper memory cells in a plan view.

Abstract: A resistance variable memory device may include a plurality of tiles in which memory cells are arranged. The first to third level of the word lines may be sequentially stacked on the plurality of tile regions with the decoding circuits along rows of the tile regions. A first level of the bit lines may be interposed between the first level of the word lines and the second level of the word lines. A first level of the bit lines may be extended along columns of the tile regions. The second level of the bit lines may be interposed between the second level of the word lines and the third level of the word lines. The second level of the bit lines may be extended along the columns of the tile regions. The first and third levels of the word lines at a selected row of a selected tile region among the tile regions and the second level of the bit lines at a selected column of the selected tile region may be controlled by a decoding circuit of the selected tile region.

Abstract: The present disclosure provides a microcontroller unit and its fabrication method. The microcontroller unit includes a logic control substrate, and also includes at least one memory die and at least one non-memory die, which are disposed on the logic control substrate. The logic control substrate includes a semiconductor device layer and an interconnection dielectric layer. A central processing unit and at least one logic controller are formed in the semiconductor device layer. All memory dies are disposed on the interconnection dielectric layer side by side or stacked one over another, and the at least one memory die is electrically connected to the central processing unit through a corresponding electrical interconnection structure in the interconnection dielectric layer.

Abstract: An integrated circuit device can include a plurality of access transistors formed in a substrate having control terminals connected to word lines that extend in a first direction; a plurality of two-terminal programmable impedance elements formed over the substrate; at least one conductive plate structure formed on and having a common conductive connection to, the programmable impedance elements, and extending in at least the first direction; a plurality of storage contacts that extend from a first current terminal of each access transistor to one of the programmable impedance elements; a plurality of bit lines formed over the at least one conductive plate structure, the bit lines extending in a second direction different from the first direction; and a plurality of bit line contacts that extend from a second current terminal of each access transistor through openings in the at least one plate structure to one of the bit lines.

Abstract: A semiconductor device including a variable resistance device is provided. A variable resistance element according to one embodiment of the present disclosure includes: an ion-receiving layer having a top, a bottom and a sidewall connecting the top to the bottom; an ion supply layer having an inner sidewall connected to at least a portion of the sidewall of the ion-receiving layer; a gate pattern connected to an outer sidewall of the ion supply layer; and a source pattern connected to one of the top or bottom of the ion-receiving layer, and a drain pattern connected to the other one of the top or bottom of the ion-receiving layer, wherein a resistance of the ion-receiving layer varies depending on an amount of ions supplied from the ion supply layer based on a voltage applied to the gate pattern.

Abstract: A nonvolatile memory device includes a substrate, a source electrode structure disposed on the substrate, a channel structure disposed to be contact a sidewall surface of the source electrode structure, a resistance change memory layer disposed on a sidewall surface of the channel structure, a drain electrode structure disposed to contact the resistance change memory layer, a plurality of gate dielectric structures extending in the first direction and disposed to be spaced apart from each other in a second direction, and a plurality of gate electrode structures disposed to extend in the first direction in the plurality of the gate dielectric structure.

Abstract: An example device in accordance with an aspect of the present disclosure includes an active oxide layer to form and dissipate a conductive bridge. The conductive bridge is to dissipate spontaneously within a relaxation time to enable the memory device to self-refresh according to volatile behavior in response to the input voltage being below a threshold corresponding to disregarding sneak current and noise of a crossbar array in which the memory device is to operate. The conductive bridge is to persist beyond the relaxation time to enable the memory device to retain programming for neuromorphic computing training according to non-volatile behavior of the memory device in response to the input voltage not being below the threshold.

Abstract: An electronic storage memory device is disclosed. The memory device includes a first conductive layer, and also includes a memory layer connected to the first conductive layer, where the memory layer has a variable resistance, and where no amorphous layer exists between the first conductive layer and the memory layer.

Abstract: A method reads data from a synapse which includes a transistor and a variable resistor. The transistor has a gate electrode, a first electrode and a second electrode. The variable resistor has a first electrode connected to the second electrode of the transistor. The method includes applying a read voltage to the gate electrode of the transistor, applying a pre-synaptic voltage to the first electrode of the transistor, and applying a post-synaptic voltage to a second electrode of the variable resistor. The read voltage is lower than the threshold voltage of the transistor.

Abstract: A method for fabricating stacked resistive memory with individual switch control is provided. The method includes forming a first random access memory (ReRAM) device. The method further includes forming a second ReRAM device in a stacked nanosheet configuration on the first ReRAM device. The method also includes forming separate gate contacts for the first ReRAM device and the second ReRAM device.

Abstract: A resistance variable memory device may include a plurality of memory cells and a control circuit block. The memory cells may be connected between a global word line and a global bit line. The control circuit block may control the memory cells. The control circuit block may include a write pulse control block. The write pulse control block may include a high resistance path circuit and a bypass circuit connected between the global word line and a selected memory cell. The write pulse control block may selectively enable any one of the high resistance path circuit and the bypass circuit in accordance with a position the selected memory cell.

Abstract: Described herein are apparatuses, systems, and methods associated with a memory circuit that includes memory cells having respective threshold switches. The memory cells may include a selector transistor with a gate terminal coupled to a word line to receive a word line signal, a drain terminal coupled to a bit line to receive a bit line signal, and a source terminal coupled to a first terminal of the threshold switch. The threshold switch may switch from a high resistance state to a low resistance state when a voltage across the first terminal and a second terminal exceeds a threshold voltage and may remain in the low resistance state after switching when the voltage across the first and second terminals is equal to or greater than a holding voltage that is less than the threshold voltage. Other embodiments may be described and claimed.

Abstract: Magnetic random-access memory (MRAM) circuits are provided herein. In one example implementation, an MRAM circuit includes control circuitry coupled to a magnetic tunnel junction (MTJ) element in series with a selector element. This control circuitry is configured to adjust current through the selector element when the selector element is in a conductive state. The circuit also includes a compensation circuitry configured to compensate for a offset voltage across the selector element in the conductive state based on adjustments to the current through the selector element. An output circuit is also configured to report a magnetization state of the MTJ element.

Abstract: A single-event-upset (SEU) stabilized memory cell includes a latch portion including a cross-coupled latch, and at least one cross coupling circuit path in the latch portion including a first series-connected pair of vertical resistors.

Abstract: Systems and methods for providing write process optimization for memristors are described. Write process optimization circuitry manipulates the memristor's write operation, allowing the number of cycles in the write process is reduced. Write process optimization circuitry can include write current integration circuitry that measures an integral of a write current over time. The write optimization circuitry can also include shaping circuitry. The shaping circuitry can shape a write pulse, by determining the pulse's termination, width, and slope. The write pulse is shaped depending upon whether the target memristor device exhibits characteristics of “maladroit” cells or “adroit” cells. The pulse shaping circuitry uses the integral and measured write current to terminate the write pulse in a manner that allows the memristor, wherein having maladroit cells and adroit cells, to reach a target state.

Abstract: A nonvolatile memory apparatus performs a plurality of read operations by using a plurality of read voltages. A first read operation is performed by applying a first read voltage to a memory cell. A second read operation is selectively performed based on whether a snap-back of the memory cell occurs during the first read operation. The second read operation is performed by applying a second read voltage having a higher voltage level than the first read voltage to the memory cell.

Abstract: A memory architecture includes: a plurality of cell arrays each of which comprises a plurality of bit cells, wherein each of bit cells of the plurality of cell arrays uses a respective variable resistance dielectric layer to transition between first and second logic states; and a control logic circuit, coupled to the plurality of cell arrays, and configured to cause a first information bit to be written into respective bit cells of a pair of cell arrays as an original logic state of the first information bit and a logically complementary logic state of the first information bit, wherein the respective variable resistance dielectric layers are formed by using a same recipe of deposition equipment and have different diameters.

Abstract: A memory apparatus includes a memory cell disposed at an intersection of a first wiring line and a second wiring line, and including a variable resistor and a selector, the variable resistor having a resistance state that changes to a first resistance state and a second resistance state, and a drive circuit that writes data to the memory cell by changing the variable resistor from the first resistance state to the second resistance state, and erases the data stored in the memory cell by changing the variable resistor from the second resistance state to the first resistance state. When erasing the data, the drive circuit changing in a stepwise manner a voltage applied to the memory cell, and changing in a stepwise manner a current limit value that limits a magnitude of a current flowing through the memory cell.

Abstract: An MRAM bitline write control circuit including an MRAM array of a plurality of MTJ cells. Each MTJ cell is connected to a bitline between a bitline transfer gate and a transfer device. Each transfer device is connected to a sourceline and a sourceline transfer gate. A master bitline is connected to each bitline transfer gate. A first bitline control transistor is connected to VDD and to a source follower transistor that is connected to the master bitline and a gate connected to a write 0 bias voltage. A second bitline control transistor is connected to VSS and to the master bitline. A selected MTJ cell is biased to write a 0 when the transfer device, the bitline transfer gate and the source line transfer gate, associated with the selected MTJ cell, are enabled and the first bitline control transistor is enabled to connect the source follower transistor to VDD.

Abstract: A method for setting memory elements in a plurality of states includes applying a set signal to a memory element to transition the memory element from a low-current state to a high-current state; applying a partial reset signal to the memory element to transition the memory element from the high-current state to a state between the high-current state and the low-current state; determining whether the state corresponds to a predetermined state; and applying one or more additional partial reset signals to the memory element until the state corresponds to the predetermined current state. The memory element may be coupled in series with a transistor, and a voltage control circuit may apply voltages to the transistor to set and partially reset the memory element.

Abstract: Disclosed is a resistive random access memory (RRAM). The RRAM includes a bottom electrode made of tungsten and a switching layer made of hafnium oxide disposed above the bottom electrode, wherein the switching layer includes a filament and one or more lateral regions including a doping material that are between a top region and a bottom region of the switching layer. The RRAM further includes a top electrode disposed above the switching layer.

Abstract: According to one embodiment, a magnetic memory device includes a first magnetic layer having a variable magnetization direction, a second magnetic layer having a fixed magnetization direction, and a nonmagnetic layer provided between the first magnetic layer and the second magnetic layer, wherein the first magnetic layer includes a first sub-magnetic layer in a polycrystalline state and a second sub-magnetic layer in an amorphous state.

Abstract: A reconfigurable circuit includes: a first line; a first switch element disposed between the first line and a first power source line of first voltage; a second line; a second switch element disposed between the second line and a second power source line of second voltage which is different from the first voltage; and a resistive switch assembly disposed between the first line and the second line. The resistive switch assembly includes: a first non-volatile resistive switch; and a second non-volatile resistive switch whose first end is coupled to a first end of the first non-volatile resistive switch. The second end of the first non-volatile resistive switch is coupled to the first line, and the second end of the second non-volatile resistive switch is coupled to the second line.

Abstract: A programming method for an artificial neuron network having synapses, each including a single resistive random-access memory having first and second electrodes on either side of an active zone, the method including determining a number N of conductance intervals, where N?3; for each memory: choosing a conductance interval from amongst the N intervals; a step i) for application of a voltage pulse of a first type between the first and second electrodes, and for reading the conductance value of the memory; if the conductance value does not belong to the previously chosen conductance interval, a sub-step ii) for application of a voltage pulse of a second type between the first and second electrodes, and for reading the conductance value; if the conductance value does not belong to the chosen conductance interval, a step according to which step i) is reiterated, with steps i) and ii) being repeated until the conductance value belongs to the interval.

Abstract: A magnetoresistive random access memory (MRAM), including multiple cell array regions, multiple MRAM cells disposed in the cell array region, a silicon nitride liner conformally covering on the MRAM cells, an atomic layer deposition dielectric layer covering on the silicon nitride liner in the cell array region, wherein the surface of atomic layer deposition dielectric layer is a curved surface concave downward to the silicon nitride liner at the boundary of MRAM cells, and an ultra low-k dielectric layer covering on the atomic layer deposition dielectric layer.

Abstract: There is described a two-terminal multi-level memristor element synthesised from binary memristors, which is configured to implement a variable resistance based on unary or binary code words. There is further described a circuit such as a synapse circuit implemented using a multi-level memristor element.

Abstract: A memory layout structure, which is provided with multiple source lines between active areas, each source line has multiple branches electrically connecting with the active areas at opposite sides in alternating arrangement. Multiple word lines traverse through the active areas to form transistors. Multiple storage units are disposed between the word lines on the active areas in staggered array arrangement, and multiple bit lines electrically connect with all storage units on a corresponding active area, wherein each storage cell includes one of the storage unit, two of the transistors respectively at both sides of the storage unit, and two branches of the source line.

Abstract: A nonvolatile memory device includes a memory cell array that includes memory blocks, wherein each of the memory blocks includes pages each including memory cells, a row decoder circuit that selects one of the pages from a selected memory block of the memory blocks in a write operation and selects memory cells of a close unit from the selected memory block in a close operation, and a page buffer circuit that writes data into memory cells of a page selected by the row decoder circuit in the write operation and writes dummy data into the memory cells of the close unit selected by the row decoder circuit in the close operation. The close unit includes one or more pages, and, in the close operation, the row decoder circuit adjusts a size of the close unit.

Abstract: Subject matter disclosed herein may relate to fabrication of a correlated electron material (CEM) switch. In embodiments, processes are described in which conductive traces may be formed on or over an insulating material. Responsive to forming voids in the insulating material, localized portions of the conductive traces in contact with the voids may be exposed to gaseous oxidizing agents, which may convert the localized portions of the conductive traces to a CEM. In embodiments, an electrode material may be deposited within the voids to contact the localized portion of conductive trace converted to the CEM.

Abstract: A data write-in method and a non-volatile memory are provided. The data write-in method includes: providing a reset voltage to a plurality of selected memory cells according to a first flag, and recursively performing a reset process for the plurality of selected memory cells; setting a second flag according to a plurality of first verification currents of the plurality of selected memory cells; and under a condition that the second flag is set: providing a set voltage to the plurality of selected memory cells according to a resistance of the plurality of selected memory cells; and setting the first flag according to a plurality of second verification currents of the plurality of selected memory cells.

Abstract: Memory systems and memory programming methods are described. In one arrangement, a memory system includes a memory cell configured to have a plurality of different memory states, an access circuit coupled with the memory cell and configured to provide a first signal to a memory element of the memory cell to program the memory cell from a first memory state to a second memory state, and a current source coupled with the memory cell and configured to generate a second signal which is provided to the memory element of the memory cell after the first signal to complete programming of the memory cell from the first memory state to the second memory state.

Abstract: A memory device includes a memory cell array including memory cells disposed at points at which word lines and bit lines intersect, a first decoder circuit determining a selected bit line and non-selected bit lines among the bit lines, a second decoder circuit determining a selected word line and non-selected word lines among the word lines, a current compensation circuit providing a current path drawing a compensation current from the selected word line to compensate for off currents flowing in the non-selected bit lines, a first sense amplifier comparing a voltage of the selected word line with a reference voltage and outputting an enable signal, and a second sense amplifier outputting a voltage difference between the voltage of the selected word line and the reference voltage during an operating time determined by the enable signal in a readout operation mode of the memory device.

Abstract: A memory device includes a memory array, a first reference unit, a second reference unit, and a control unit. The memory array includes a plurality of memory cells. The first reference unit provides a first reference current. The second reference unit provides a second reference current, wherein a current value of the first reference current is less than a current value of the second reference current. In a data-writing operation, the control unit provides a first current to a memory cell, reads a second current generated by the memory cell in response to the first current, and selects to compare the second current with the first reference current or to compare the second current with the second reference current according to a data-writing state of the memory cell, so as to determine whether a data writing of the data writing state is successful.

Abstract: A semiconductor storage device includes first to third wirings extending in a first direction and adjacent in a second direction intersecting the first direction, fourth to sixth wirings extending in the second direction and adjacent in the first direction, memory cells each having one end connected to one of the first to third wirings and the other end connected to one of the fourth to sixth wirings, a circuit configured to output a first voltage, second and third voltages higher than the first voltage, a fourth voltage higher than the second voltage and the third voltage, and a fifth voltage higher than the fourth voltage. In a write operation for memory cells connected to the first and fourth wirings, the first, fourth, second, fifth and third voltages are transferred to the first, second, third, fourth, and fifth wirings, respectively, and the third voltage is transferred to the sixth wiring.

Abstract: A magnetoresistive device may include a first plurality of magnetic tunnel junction (MTJ) bits arranged in a first XY plane, and a second plurality of MTJ bits arranged in a second XY plane that is spaced apart from the first XY plane in a Z direction. And, the MTJ bits of the first plurality of MTJ bits may be spaced apart from the MTJ bits of the second plurality of MTJ bits in the X and Y directions.