Abstract: A memory device includes a phase change memory (PCM) cell connected between a bit line and a word line. An X-decoder provides a word line voltage to the word line during a reset operation, and a Y-decoder provides a bit line voltage to the bit line during the reset operation. A voltage bias circuit generates the word line voltage and the bit line voltage based on a first bias during a first period of the reset operation, the word line voltage and the bit line voltage based on a second bias greater than the first bias during a second period of the reset operation, and the word line voltage and the bit line voltage based on a third bias smaller than the first and second biases during a third period of the reset operation.

Abstract: A charge pump apparatus includes a first charge pump system, a second charge pump system, a switch transistor, and a voltage regulation circuit. The first charge pump system converts a first supply voltage into a first boost voltage. The second charge pump system converts a second supply voltage into a second boost voltage. The switch transistor is coupled to the first charge pump system and the second charge pump system, and outputs an output voltage according to the second boost voltage. The switch transistor includes a control terminal receiving the second boost voltage, a first terminal receiving the first boost voltage, and a second terminal outputting the output voltage. The voltage regulation circuit successively adjusts a code of a voltage regulation signal according to the output voltage, in order to control the second charge pump system to successively adjust the second boost voltage according to the voltage regulation signal.

Abstract: A memory device includes pages arranged in columns and each constituted by a plurality of memory cells on a substrate, voltages applied to a first gate conductor layer, a second gate conductor layer, a first impurity layer, and a second impurity layer in each memory cell included in each of the pages are controlled to perform a page write operation of retaining, inside a channel semiconductor layer, a group of positive holes generated by an impact ionization phenomenon or by a gate-induced drain leakage current, the voltages applied to the first gate conductor layer, the second gate conductor layer, the first impurity layer, and the second impurity layer are controlled to perform a page erase operation of discharging the group of positive holes from inside the channel semiconductor layer, the first impurity layer of the memory cell is connected to a source line, the second impurity layer thereof is connected to a bit line, one of the first gate conductor layer or the second gate conductor layer is connected t

Abstract: Numerous examples for performing tuning of a page or a word of non-volatile memory cells in an analog neural memory are disclosed. In one example, a method comprises programming a word or page of non-volatile memory cells in an analog neural memory system; and identifying any fast bits in the word or page of non-volatile memory cells.

Abstract: According to an embodiment, a semiconductor memory device comprises: a stacked body that includes a plurality of control gate electrodes stacked above a substrate; a memory columnar body that extends in a first direction above the substrate and configures a memory string along with the stacked body; and a source contact that extends in the first direction and is electrically connected to one end of the memory string. Moreover, this source contact is adjacent to the stacked body via a spacer insulating layer. Furthermore, a spacer protective layer including a nitride or a metal oxide is provided between these source contact and spacer insulating layer.

Abstract: Provided is a memory device including a substrate, a plurality of stack structures, a protective layer, and a plurality of contact plugs. The stack structures are disposed over the substrate. The protective layer conformally covers top surfaces and sidewalls of the stack structures. The contact plugs are respectively disposed over the substrate between the stack structures. One of the contact plugs includes a narrower portion and a wider portion over the narrower portion. In a top view, the wider portion is separated from an adjacent protective layer by a distance.

Abstract: A non-volatile semiconductor memory device includes a memory cell array and a control circuit. A control circuit performs an erase operation providing a memory cell with a first threshold voltage level for erasing data of a memory cell, and then perform a plurality of first write operations providing a memory cell with a second threshold voltage level, the second threshold voltage level being higher than the first threshold voltage level and being positive level. When the control circuit receives a first execution instruction from outside during the first write operations, the first execution instruction being for performing first function operation except for the erase operation and the first write operations, the circuit performs the first function operation during the first write operations.

Abstract: A layout structure of a small-area one time programmable (OTP) memory using a complementary FET (CFET) is provided. The OTP memory has transistors TP as a program element and transistors TS as a switch element. The transistors TP are three-dimensional transistors of which channel portions overlap each other as viewed in plan. The transistors TS are three-dimensional transistors of which channel portions overlap each other as viewed in plan. The OTP memory of two bits is implemented in a small area.

Abstract: Methods and apparatuses are disclosed, such as those including a block of memory cells that includes strings of charge storage devices. Each of the strings may comprise a plurality of charge storage devices formed in a plurality of tiers. The apparatus may comprise a plurality of access lines shared by the strings. Each of the plurality of access lines may be coupled to the charge storage devices corresponding to a respective tier of the plurality of tiers. The apparatus may comprise a plurality of sub-sources associated with the strings. Each of the plurality of sub-sources may be coupled to a source select gate of each string of a respective subset of a plurality of subsets of the strings, and each sub-source may be independently selectable from other sub-sources to select the strings of its respective subset independently of other strings corresponding to other subsets.

Abstract: A method of adjusting operating conditions includes: a substrate; first conductive layers; a first semiconductor layers facing the first conductive layers; a second semiconductor layer connected to the first semiconductor layers; and an electric charge accumulating layer disposed between the first conductive layers and the first semiconductor layers. At a predetermined timing of a program operation, the second conductive layer which is one of the first conductive layers is supplied with a program voltage or a write pass voltage. The method executes: a first operation that supplies the second conductive layer with the write pass voltage and supplies a third conductive layer which is one of the plurality of first conductive layers with the program voltage; and a second operation that supplies the second conductive layer with a verify voltage and supplies the third conductive layer with a voltage.

Abstract: An electronic biasing circuit for memory operating in a high temperature environment, comprising a first memory cell and a second memory cell, a first MOSFET transistor electrically coupled in series with the first memory cell, wherein the first MOSFET transistor is configured as a switch, a second MOSFET transistor electrically coupled in series with the second memory cell, wherein the second MOSFET transistor is configured as a switch, a DC bias current source configured to generate a negative DC bias voltage signal, a first read/word line electrically coupled to a gate of the first MOSFET transistor, and a second read/word line electrically coupled to a gate of the second MOSFET transistor, wherein in response to a read operation of the first memory cell, the second read/word line is configured to deliver the negative DC bias voltage signal to the gate of the second MOSFET transistor.

Abstract: An IC device includes an anti-fuse device including a dielectric layer between a first gate structure and an active area, a first transistor including a second gate structure overlying the active area, and a second transistor including a third gate structure overlying the active area. The first gate structure is between the second gate structure and the third gate structure.

Abstract: A customized seal ring for a semiconductor device is formed of multiple seal ring cells that are selected and arranged to produce a seal ring design. The cells include first cells that are coupled to ground and second cells that are not coupled to ground. The second cells that are not coupled to ground, include a higher density of metal features in an inner portion thereof, than the first seal ring cells. Dummy metal vias and other metal features that may be present in the inner portion of the second seal ring cells are absent from the inner portion of the first seal ring cells that are coupled to ground. The seal ring design may include various arrangements, including alternating and repeating sequences of the different seal ring cells.

Abstract: A circuit for adjusting a select gate voltage of a non-volatile memory is provided. The circuit includes a well, a select gate, and an adjustment unit. There is a capacitive coupling between the well and the select gate. The adjustment unit generates a driving voltage for the select gate based on a non-constant voltage.

Abstract: Retention voltage generation circuits and electronic apparatus are provided.

Abstract: Techniques are presented for the prevention and detection of inter-plane disturbs in a memory circuit, where, when concurrently performing memory operations on multiple planes, a defect in one plane can feed back through a common supply node and adversely affect memory operations in another node. To isolate such defects to plane in which the occur, the memory supplies the elements, such as a word line, of different planes from a common supply node through a uni-directional circuit element, such as a diode. In this way, if the voltage on an element in an array gets pulled up to an elevated voltage though a defect, this elevated voltage is stopped from flowing back to the common supply node. Additionally, by comparing the voltage levels on either side of the uni-directional circuit element, it can be determined whether such a defect is present in an array.

Abstract: A reading circuit for a charge-retention circuit stage is provided with a storage capacitor coupled between a first biasing terminal and a floating node, and a discharge element coupled between the floating node and a reference terminal. The reading circuit further has an operational amplifier having a first input terminal that is coupled to the floating node and receives a reading voltage, a second input terminal receives a reference voltage, and an output terminal on which it supplies an output voltage, the value of which is a function of the comparison between the reading voltage and the reference voltage and indicative of a residual charge in the storage capacitor. A shifting stage shifts the value of the reading voltage of the floating node, before the comparison is made between the reading voltage and the reference voltage for supplying the output voltage.

Abstract: A semiconductor device according to an embodiment comprises: a field effect transistor comprising a semiconductor layer and a gate electrode; a wiring line layer positioned above the field effect transistor; and a control circuit that adjusts a voltage of a wiring line in the wiring line layer. The wiring line layer comprises: a contact wiring line connected to a source or a drain of the field effect transistor; and a first wiring line facing a position between the gate electrode and the contact wiring line, of the semiconductor layer. The control circuit adjusts the contact wiring line to a certain voltage and sets the first wiring line to a floating state.

Abstract: Semiconductor memory devices and methods include a flash memory cell array fabricated in a well, with memory cells in the same column connected to each other in series and connected to a respective bit line. The memory devices also include a column decoder, a data register buffer unit, a row decoder, an erase control unit, and an input/output buffer unit. In one or more embodiments, the erase control unit applies voltages to the well to erase the memory cells in a manner that avoids breaking down p-n junctions formed by transistors fabricated in the well. In another embodiment, high voltage transistors are used to selectively isolate the bit lines from and couple the bit lines to a peripheral circuit in pairs so that each high voltage transistor is shared by two bit lines.

Abstract: Embodiments are directed to a self-reference STT-MRAM sensing scheme that uses offset-cancellation to reduce the impact of FET mismatch and thereby allow the sensing of lower read voltages. In some embodiments, the sensing scheme includes a differential amplifier having a first input connected to a memory cell. In some embodiments, a second input of the differential amplifier may be connected to ground, a common mode voltage of the system or a mid-level supply voltage. The present disclosure provides flexibility with respect to the voltage level at which the sensing is performed (e.g., ground, Voc, Vmid, etc.). The present disclosure provides further flexibility with respect to the sense voltage polarity.

Abstract: An erase process for a 3D stacked memory device allows a portion of a block of memory cells to be erased. In one approach, in a U-shaped NAND string configuration, memory cells in the drain- or source-side columns are erased. In another approach, such as in a U-shaped or a straight NAND string configuration, memory cells in a portion of a column of memory cells are erased, and a dummy memory cell is provided between the erased and non-erased memory cells. A dummy memory cell can be on either side (e.g., above and below) of an erase memory cell, or on either side of a non-erased memory cell. A dummy memory cell is ineligible to store user data, but prevents a downshift in the threshold voltage of an erased memory cell from changing the threshold voltage of a non-erased memory cell, due to capacitive coupling.

Abstract: The NVM device includes a semiconductor substrate having a first region and a second region. The NVM device includes a data-storing structure formed in the first region and designed operable to retain charges. The NVM device includes a capacitor formed in the second region and coupled with the data-storing structure for data operations. The data-storing structure includes a first doped well of a first-type in the semiconductor substrate. The data-storing structure includes a first gate dielectric feature on the first doped well. The data-storing structure includes a first gate electrode disposed on the first gate dielectric feature and configured to be floating. The capacitor includes a second doped well of the first-type. The capacitor includes a second gate dielectric feature on the second doped well. The capacitor also includes a second gate electrode disposed on the second gate dielectric feature and connected to the first gate electrode.

Abstract: A nonvolatile memory embedded in an advanced logic circuit and a method forming the same are provided. In the nonvolatile memory, the word lines and erase gates have top surfaces lower than the top surfaces of the control gate. In addition, the word lines and the erase gates are surrounded by dielectric material before a self-aligned silicidation process is performed. Therefore, no metal silicide can be formed on the word lines and the erase gate to produce problems of short circuit and current leakage in a later chemical mechanical polishing process.

Abstract: A semiconductor device and manufacturing method are disclosed which provide increased ESD resistance. By disposing a slit mask when forming a second p-type well layer, impurity concentration of the second p-type well layer is partially reduced. By forming a second n-type offset layer in the second p-type well layer having decreased impurity concentration, it is possible to increase thickness of the second n-type offset layer in this place compared with that heretofore known. By increasing thickness of the second n-type offset layer, a depletion layer does not reach an n-type drain layer at a low voltage when reverse bias is applied to the drain. It thus is possible to prevent thermal destruction caused by localized electrical field concentration. As a result, it is possible to increase ESD resistance. As it is sufficient to replace a photoresist mask, there is no increase in the number of processes.

Abstract: A method includes, at a non-volatile memory having a three dimensional (3D) memory configuration, performing an erase operation. Performing the erase operation includes providing a first control signal to isolate a first portion of a string of the non-volatile memory from a second portion of the string. Performing the erase operation further includes providing a first erase signal to erase the second portion of the string while data is maintained at the first portion of the string.

Abstract: A semiconductor device and a manufacturing method and an operating method for the same are provided. The semiconductor device comprises a substrate, a doped region and a stack structure. The doped region is in the substrate. The stack structure is on the substrate. The stack structure comprises a dielectric layer, an electrode layer, a solid electrolyte layer and an ion supplying layer.

Abstract: In an embodiment, each block of a plurality of blocks includes a respective plurality of strings of memory cells, where each of the plurality of strings of a block is coupled to a respective select transistor, and wherein each of the select transistors coupled to the plurality of strings of the block is coupled to a common first select line. The plurality of blocks includes N block sizes, where N may be an integer greater than or equal to three. N?1 blocks of one block size of the N block sizes collectively include a first number of second select lines. A group of blocks consisting of a respective block of each remaining block size of the N block sizes collectively include a second number of second select lines that is equal to the first number of select lines or that is less than the first number of second select lines.

Abstract: A method of operation of a non-volatile memory system includes: providing a control field effect transistor having a source electrode and a body-tie electrode; coupling a resistive storage element to the source electrode; and opening a well switch coupled to the body-tie electrode for increasing a well voltage and resetting the resistive storage element by the source electrode floating on the well voltage.

Abstract: A semiconductor memory device according to an embodiment of the present invention may include a memory cell array having a plurality of memory cells, a pass transistor group having normal pass transistors coupled between global word lines and local word lines to which the plurality of memory cells are coupled, and an address decoder coupled to the global word lines and a block word line to which gates of the normal pass transistors are coupled in common, wherein the address decoder gradually increases a voltage, obtained by subtracting a voltage of the global word lines from a voltage of the block word line, when an erase voltage is provided to a channel of the plurality of memory cells.

Abstract: A non-volatile memory has an array of non-volatile memory cells. Each of the non-volatile memory cells includes a coupling device formed on a first well, a read device, a floating gate device formed on a second well and coupled to the coupling device, a program device formed on the second well, and an erase device formed on a third well and coupled to the first floating gate device. The read device, the program device, and the erase device are formed on separate wells so as to separate the cycling counts of a read operation, a program operation and an erase operation of the non-volatile memory cell.

Abstract: A sector of an electrically programmable non-volatile memory includes memory cells connected to word lines and to bit lines, each cell including at least one transistor having a gate connected to a word line, a drain connected to a bit line and a source connected to a source line. The sector includes at least two distinct wells insulated from one another, each including a number of cells of the sector, being able to take different potentials, and in that the sector has at least one bit line electrically linked to the drain of at least two cells mounted on two distinct wells.

Abstract: Different back bias (or body bias) conditions are applied to a non-volatile storage system during different program verify operations of a programming operation. A back bias may be applied during verify of an intermediate state (e.g., a lower page, middle page). The intermediate state is a state that exists during a program operation, but is not one of the final states. A lower back bias or no back bias is applied during verify of a final state (e.g., an upper page). Thus, a different back bias may be used when verifying an intermediate state than the back bias used when verifying a final state. Using the back bias makes it easier to verify a low VTH, such as a negative VTH. Also, using the back bias is effective at dealing with sense amplifier headroom issues.

Abstract: Techniques for providing a direct injection semiconductor memory device are disclosed. In one particular exemplary embodiment, the techniques may be realized as a direct injection semiconductor memory device including a first region connected to a bit line extending in a first orientation and a second region connected to a source line extending in a second orientation. The direct injection semiconductor memory device may also include a body region spaced apart from and capacitively coupled to a word line extending in the second orientation, wherein the body region is electrically floating and disposed between the first region and the second region. The direct injection semiconductor memory device may further include a third region connected to a carrier injection line extending in the second orientation, wherein the first region, the second region, the body region, and the third region are disposed in sequential contiguous relationship.

Abstract: A method of charging a floating gate in a nonvolatile memory cell comprises bringing a substrate channel within the memory cell to a first voltage, bringing a control gate to a programming voltage, and floating the substrate channel voltage while the control gate is at the programming voltage. Memory devices include state machines or controllers operable to perform the described method, and operation of such a state machine, memory device, and information handling system are described.

Abstract: A number (Nwl) of programmed word lines in a block of NAND strings is determined by measuring a reference combined current (Iref) in the block when all of the memory cells are in a conductive state. Subsequently, to determine if a word line is a programmed word line, an additional combined current (Iadd) in the block is measured with a demarcation voltage applied to the selected word line. The selected word line is determined to be programmed word lines if Idd is less than Iref by at least a margin. Nwl can be used to adjust an erase-verify test of an erase operation by making the erase-verify test relatively hard to pass when the number is relatively small and relatively easy to pass when the number is relatively large. Or, Nwl can be used to identify a next word line to program in the block.

Abstract: The present invention provides a nonvolatile memory cell string and a memory array using the same. According to the present invention, a wall type semiconductor separated into twin fins and a memory cell string formed with memory cells having a gated diode structure along each fin are enabled to increase the degree of integration and basically prevent the interferences between adjacent cells. And a first semiconductor layer and a depletion region of a PN junction wrapped up by a gate electrode are enabled to remove GSL and CSL by GIDL memory operation and significantly increase the degree of integration for applying to a neuromorphic technology.

Abstract: A semiconductor storage device has a plurality of memory cells each having a control gate that are formed on a well. The semiconductor storage device has a control circuit that applies a voltage to the well and the control gates. In an erase operation of the memory cell, the control circuit applies a first pulse wave of a first erasure voltage that rises stepwise to the well and then applies a second pulse wave of a second erasure voltage to the well.

Abstract: Integrated circuit memory devices include a plurality of vertically-stacked strings of nonvolatile memory cells having respective vertically-arranged channel regions therein electrically coupled to an underlying substrate. A control circuit is provided, which is configured to drive the vertical channel regions with an erase voltage that is ramped from a first voltage level to a higher second voltage level during an erase time interval. This ramping of the erase voltage promotes time efficient erasure of vertically stacked nonvolatile memory cells with reduced susceptibility to inadvertent programming of ground and string selection transistors (GST, SST).

Abstract: Techniques for providing a direct injection semiconductor memory device are disclosed. In one exemplary embodiment, the techniques may be realized as a direct injection semiconductor memory device including a plurality of memory cells arranged in an array of rows and columns. At least one of the plurality of memory cells may include a first region coupled to a respective bit line of the array, a second region coupled to a respective source line of the array, a body region spaced apart from and capacitively coupled to a respective word line of the array, wherein the body region may be electrically floating and disposed between the first region and the second region, and a third region coupled to a respective carrier injection line of the array, wherein the respective carrier injection line may be one of a plurality of carrier injection lines in the array that are coupled to each other.

Abstract: A method includes selectively creating a first breakdown condition and a second breakdown condition at a semiconductor transistor structure. The first breakdown condition is between a source overlap region of the semiconductor transistor structure and a gate of the semiconductor transistor structure. The second breakdown condition is between ad rain overlap region of the semiconductor transistor structure and the gate.

Abstract: Multi-port semiconductor memory cells including a common floating body region configured to be charged to a level indicative of a memory state of the memory cell. The multi-port semiconductor memory cells include a plurality of gates and conductive regions interfacing with said floating body region. Arrays of memory cells and method of operating said memory arrays are disclosed for making a memory device.

Abstract: A memory includes a doped substrate well, a substrate connector coupled to the doped substrate well, and a set of interlayer connectors insulated from the doped substrate well. A series arrangement including a plurality of memory cells is coupled on a first end by a first switch to a bit line and coupled on a second end by a second switch to a source line contact pad. The source line contact pad is connected to the substrate connector and to at least one of the interlayer connectors in the set of interlayer connectors. A supply line is connected to the set of interlayer connectors. A plurality of word lines is coupled to the plurality of memory cells. Circuitry is coupled to the supply line and to the doped substrate well and configured to bias the supply line and the doped substrate well with different bias conditions.

Abstract: A nonvolatile semiconductor memory device includes a plurality of nonvolatile memory cells formed on a semiconductor substrate, each memory cell including source and drain regions separately formed on a surface portion of the substrate, buried insulating films formed in portions of the substrate that lie under the source and drain regions and each having a dielectric constant smaller than that of the substrate, a tunnel insulating film formed on a channel region formed between the source and drain regions, a charge storage layer formed of a dielectric body on the tunnel insulating film, a block insulating film formed on the charge storage layer, and a control gate electrode formed on the block insulating film.

Abstract: A semiconductor memory device includes a memory array including a plurality of memory cells, and a peripheral circuit configured to perform an erase operation by supplying a first erase voltage to selected memory cells and perform an erase verify operation by supplying an erase verify voltage to the selected memory cells, wherein the peripheral circuit is configured to increase the first erase voltage to a first level at a first rising rate for a first rising period and increase the first erase voltage to a first target level at a second rising rate lower than the first rising rate for a second rising period.

Abstract: Word line switch transistors in a well in a substrate may be back biased. A memory array having non-volatile storage devices may be in a separate well in the substrate. The well of the word line switch transistors may be biased separately from the well of the non-volatile storage devices. Word line switch transistors may be back-biased during an erase operation. A first voltage may be applied to a first terminal of word line switch transistors that are coupled to blocks selected for erase. The first voltage may be applied to a first terminal of word line switch transistors that are coupled to blocks that are not selected for erase. The first voltage is passed to word lines in selected blocks, but is not passed to word lines in unselected blocks.

Abstract: There is disclosed an operating method of a semiconductor device including programming a memory cell by supplying a program voltage to a control gate of the memory cell and a detrap voltage to a well which is formed in a semiconductor substrate, and subsequently removing electrons trapped in a tunnel insulating layer of the memory cell by supplying a voltage lower than the detrap voltage to the control gate while also supplying the detrap voltage to the well before the programmed memory cell is verified.

Abstract: Provided are erase methods for a memory device which includes a substrate and multiple cell strings provided on the substrate, each cell string including multiple cell transistors stacked in a direction perpendicular to the substrate. The erase method includes applying a ground voltage to a ground selection line connected with ground selection transistors of the cell strings; applying a ground voltage to string selection lines connected with selection transistors of the cell strings; applying a word line erase voltage to word lines connected with memory cells of the cell strings; applying an erase voltage to the substrate; controlling a voltage of the ground selection line in response to applying of the erase voltage; and controlling voltages of the string selection lines in response to the applying of the erase voltage.

Abstract: A memory device, and method of making the same, in which a trench is formed into a substrate of semiconductor material. The source region is formed under the trench, and the channel region between the source and drain regions includes a first portion that extends substantially along a sidewall of the trench and a second portion that extends substantially along the surface of the substrate. The floating gate is disposed in the trench, and is insulated from the channel region first portion for controlling its conductivity. A control gate is disposed over and insulated from the channel region second portion, for controlling its conductivity. An erase gate is disposed at least partially over and insulated from the floating gate. An electrically conductive coupling gate is disposed in the trench, adjacent to and insulated from the floating gate, and over and insulated from the source region.

Abstract: A 2T cell NOR architecture based on the use of BE-SONOS for embedded memory includes memory cells having respective access transistors having access gates and memory transistors having memory gates arranged in series between the corresponding bit lines and one of the plural reference lines. A memory transistor in a memory cell comprises a semiconductor body including a channel having a channel surface and a charge storing dielectric stack between the memory gate and the channel surface. The dielectric stack comprises a bandgap engineered, tunneling dielectric layer contacting one of the gate (for gate injection tunneling) and the channel surface (for channel injection tunneling). The dielectric stack of the memory cell also includes a charge trapping dielectric layer on the tunneling dielectric layer and a blocking dielectric layer.

Abstract: A non-volatile semiconductor storage device includes: a memory cell array having memory cells arranged therein, the memory cells storing data in a non-volatile manner; and a plurality of transfer transistors transferring a voltage to the memory cells, the voltage to be supplied for data read, write and erase operations with respect to the memory cells. Each of the transfer transistors includes: a gate electrode formed on a semiconductor substrate via a gate insulation film; and diffusion layers formed to sandwich the gate electrode therebetween and functioning as drain/source layers. Upper layer wirings are provided above the diffusion layers and provided with a predetermined voltage to prevent depletion of the diffusion layers at least when the transfer transistors become conductive.