Abstract: The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,0000 pulses power second. Preferred embodiments are configured as KrF, ArF and F2 lasers used for light sources for integrated circuit lithography. Improvements include a modified high voltage power supply capable for charging an initial capacitor of a magnetic compression pulse power system to precise target voltages 6,000 to 10,0000 times per second and a feedback control for monitoring pulse energy and determining the target voltages on a pulse-by-pulse basis. Several techniques are disclosed for removing discharge created debris from the discharge region between the laser electrodes during the intervals between discharges. In one embodiment the width of the discharge region is reduced from about 3 mm to about 1 mm so that a gas circulation system designed for 4,000 Hz operation could be utilized for 10,000 Hz operation.

Abstract: In a gas circulation fan, a main shaft is supported in a non-contact manner, by magnetic bearings. Between each of the magnetic bearings and a controller, a relay is provided. Each relay includes a position detection sensor circuit, an offset adjuster, a feedback gain adjuster and a filter circuit. Thus, compatibility between a mechanical body unit and the controller is attained.

Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

Abstract: The present invention relates to a two stage laser system in which a desired spectral line width can be obtained at high output even when the integrated spectral characteristic of oscillator laser does not have the desired spectral line width, comprising an oscillator laser device 10 which has discharge electrodes 2 within a laser chamber 1 filled with laser gas containing F2 and emits laser beam which is band-narrowed by means of a band narrowing module 3 arranged in a laser resonator, and an amplifier laser device 20 which has discharge electrodes 2 within a laser chamber 1 filled with laser gas containing F2 and amplifies laser pulse injected from said oscillator laser device 10. In the system, a synchronous time interval having a predetermined spectral line width exists in laser pulse from the oscillator laser 10, and the system is set such that a discharge occurs in the amplifier laser 20 within the synchronous time interval.

Abstract: Feedback timing control equipment and process for an injection seeded modular gas discharge laser. A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. The feedback timing control is programmed to permit in some circumstances discharges timed so that no significant laser energy is output from the system. Use of this technique permits burst mode operation in which the first discharge of a burst is a no-output discharge so that timing parameters for each of the two chambers can be monitored before the first laser output pulse of the burst. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber.

Abstract: A tangential blower for use in a gas discharge laser is provided provides improved homogeneity of laser gas flow through the discharge region of the laser. A flange which supports adjacent blower sections has an aerodynamic shape and occupies a minimal portion of the space in the inlet region of the blowers. The ends of the blower's shafts may be formed as a twice-profiled polygon which is has a non-uniform and preferably rounded geometry along its longitudinal axis where it fits into end flanges. The blades of the blower may be formed with varying thickness and radii of curvature. The blower's blades and hubs may be cast as a single piece of steel, titanium alloy, or other suitable material.

Abstract: A gas supply path structure forms a fluid path for allowing a laser gas to flow into or out of a pair of fluid inlet and outlet 11a and a laser gas is controlled to a predetermined subsonic speed at a throat portion. Gas supplies for controlling the speed of the gas are connected each to the fluid inlet and to the fluid outlet of the gas supply path structure and, together with a cooling device, compose a circulation system for controlling the speed and pressure of the laser gas at the fluid inlet and/or at the fluid outlet.

Abstract: An ultra-narrow band fluorine laser apparatus is provided in which a line width of a fluorine laser can be narrowed to about 0.2 to 0.3 pm without using any band-narrowing element such as an etalon. In an oscillator 11, a laser chamber 15 is provided in a stable type resonator constituted by an output mirror 13 and a totally reflecting mirror 14. The laser chamber 15 is filled with a laser gas at about 0.8 atm. As a result, when discharge is caused in the laser chamber 15 to cause laser oscillation, laser light L10 in a bandwidth of about 0.3 pm is provided. The power of the laser light L10 is increased by an amplifier 12. The amplifier 12 emits laser light L20 in a bandwidth of about 0.3 pm having laser energy of 10 mJ or more.

Abstract: The present invention provides a gas discharge ultraviolet laser capable of producing a high quality pulsed ultraviolet laser beam at pulse rates greater than 2000 Hz at pulse energies at 5 mJ or greater and having an enclosed beam path at least a portion of which comprises an oxidation agent. In a preferred embodiment a portion of the beam path comprises a sealed chamber containing a gas comprising a small concentration of oxygen. In one preferred embodiment the sealed chamber is an etalon chamber and the contained gas is nitrogen with an oxygen concentration of between 1.6 and 2.4 percent. In another preferred embodiments a small concentration of oxygen is added to the purge gas of a special purge compartment containing optical components exposed to high intensity output laser beam.

Abstract: A F2 laser includes a laser tube filled with a laser gas mixture at least including molecular fluorine for generating a spectral emission including multiple closely-spaced lines in a wavelength range between 157 nm and 158 nm, including a first line centered around 157.62 nm and a second line centered around 157.52 nm, multiple electrodes within the discharge chamber connected with a power supply circuit for energizing the molecular fluorine, a laser resonator including a line selection unit for selecting one of the first and second lines of the multiple closely spaced lines and for supressing the other of the first and second lines, for generating a narrow bandwidth VUV output beam, and at least one intracavity polarizing element. The narrow bandwidth VUV output beam is polarized at least 95%, and may be 98% or more.

Abstract: A laser oscillator capable of effectively collecting and removing particulate foreign matter contained in gas laser medium flowing in a circulating path. An electric discharge section arranged in an optical resonator is incorporated into a circulating path of the gas medium including a heat exchanger and a blower. The gas laser medium flows at a high speed in the circulating path. At least one spiral-flow dust collecting mechanism is provided in the circular path downstream of the heat exchanger, and the gas laser medium discharged from the blower is supplied to the electric discharge section through the spiral-flow dust collecting mechanism. The gas laser medium containing the particulate foreign matter spirally flows around an inner pipe in a cylindrical body of the spiral-flow dust collecting mechanism.

Abstract: A buffer gas contained in a laser gas used for an ArF excimer laser mainly consists of He, and Xe is preferably added to the laser gas. Mixture piping divided by valves is disposed on piping running from a chamber to an excimer laser gas cylinder, the mixture piping and a Xe gas cylinder are connected, gas exhaust by a gas exhaust module and opening and closing of the valves are controlled by a gas controller to add a trace quantity of xenon gas to the excimer laser gas. Thus, to remedy a burst characteristic and a spike characteristic of the ultraviolet laser device by adding a trace quantity of xenon gas, the xenon gas can be supplied efficiently into the chamber without modifying existing laser gas supply equipment.

Abstract: A molecular fluorine (F2) laser system that includes a gaseous molecular fluorine gain medium contained in a laser tube, a resonant cavity, a power supply for exciting the gain medium to produce a laser beam having an ultra violet (UV) radiation output at substantially 157 nm and a red radiation output in the range of 620 to 760 nm, a discharge module connected to the laser tube for adding and withdrawing gas to the gain medium, a controller for controlling the power supply and the discharge module, and a photo diamond detector that receives a portion of the laser beam for measuring at least one optical parameter of the UV radiation such as energy, pulse energy, pulse shape, pulse width, etc. The photo diamond detector is substantially insensitive to the red radiation output that is also present in the laser beam.

Abstract: First and second radial magnetic bearings are provided at opposing ends of a rotary shaft, first and second protective bearings are arranged in the vicinity thereof, a third radial magnetic bearing is arranged on a side of a fan near a motor, and by the third radial magnetic bearing, negative spring element of the motor is corrected.

Abstract: A gas supply path structure forms a fluid path for allowing a laser gas to flow into or out of a pair of fluid inlet and outlet 11a and a laser gas is controlled to a predetermined subsonic speed at a throat portion. Gas supplies for controlling the speed of the gas are connected each to the fluid inlet and to the fluid outlet of the gas supply path structure and, together with a cooling device, compose a circulation system for controlling the speed and pressure of the laser gas at the fluid inlet and/or at the fluid outlet.

Abstract: There is provided an excimer laser device capable of producing a stable oscillation even at a high repetition rate of 4 kHz. This gas laser device is comprised of a laser chamber having laser gas filled therein; a pair of main discharge electrodes arranged in the laser chamber; a cross-flow fan for circulating the laser gas within the laser chamber at least between the main discharge electrodes; and a diameter of the cross-flow fan is 150 mm or less, its peripheral speed being 25.0 m/s or more.

Abstract: An excimer laser gas in a laser tube 2 is excited by a microwave introduced from awaveguide 1, and electric field concentration occurs in a slit-shaped gap 3 provided in a plate member 11c, causing plasma discharge. Then the phase of plasma light is regulated and the light is resonated, to cause excimer laser light. This construction realizes plasma excitation entirely uniform along a lengthwise direction of laser light emission, and enables uniform laser light emission with minimum energy loss.

Abstract: The invention relates to a gas discharge laser including a discharge tube (1), in which a gas is present and which has at least one aperture (19) through which a laser beam emerges or at which a laser beam is reflected. For withdrawing a partial amount of the gas contained in the discharge tube (1), at least one gas withdrawal point (9) is present, from which the withdrawn gas is supplied to a sintered filter (11) for being cleaned. The cleaned gas may be led in via at least one gas inlet point (27) in the zone of the aperture (19). The invention further relates to a method of operating a gas discharge laser, and the use of a sintered filter for cleaning gas withdrawn from a discharge tube (1) of a gas discharge laser.

Abstract: The present invention provides an injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The parameters chamber can be controlled separately permitting optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment is a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In this preferred embodiment, both of the chambers and the laser optics are mounted on a vertical optical table within a laser enclosure.

Abstract: An excimer or molecular fluorine laser system includes a laser chamber filled with a gas mixture at least including a halogen-containing species and a buffer gas, and multiple electrodes with the laser chamber connected to a discharge circuit energizing the gas mixture. The laser chamber is within a laser resonator generating an output beam. The resonator includes a line-narrowing package for reducing a bandwidth of the output beam. The line-narrowing package includes a grating or grism element for use with a highly reflective (HR) and/or an anti-reflective (AR) dielectric coating. The grating may serve as a resonator reflector having a dielectric HR coating. The grating may be disposed before a HR mirror and thus have a dielectric AR or HR coating when the grating is configured in transmission or reflection mode, respectively. The grating may be used as an output coupler, and may be partially reflective with or without a coating.

Abstract: There is provided an electric discharge gas laser comprising a housing, a rotating fan, a bearing device and a control. The housing contains a laser gas. The rotating fan is provided in the housing to circulate the gas in the housing. The bearing device magnetically supports a rotating shaft. The bearing device is provided with a sensor device comprising a sensor and a signal processor. The sensor senses the position of the rotating shaft to generate signals indicating the position of the rotating shaft. The signal processor receives and processes the signals delivered from the sensor to output processed signals. The control is separated from the bearing device and is functionally associated with the bearing device to receive the processed signal from the sensor device for controlling the bearing device on the basis of the processed signals.

Abstract: A helium purge for a grating based line narrowing device for minimizing thermal distortions in line narrowed lasers producing high energy laser beams at high repetition rates. Applicants have shown substantial improvement in performance with the uses of helium purge as compared to prior art nitrogen purges. In preferred embodiments a stream of helium gas is directed across the face of the grating. In other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.

Abstract: A compact molecular gas laser and circuit apparatus for same.

Abstract: The invention relates to an High Repetition Rate UV Excimer Laser which includes a source of a laser beam and one or more windows which include magnesium fluoride. Another aspect of the invention relates to an excimer laser which includes a source of a laser beam, one or more windows which include magnesium fluoride and a source for annealing the one or more windows. Another aspect of the invention relates to a method of producing a predetermined narrow width laser beam.

Abstract: A gas laser oscillator comprising a laser gas pressure controller for controlling the pressure of laser gas in laser gas chamber to be constant, an electromagnetic valve for supplying laser gas into the laser gas chamber from a gas bottle so that the laser gas within the laser gas chamber is maintained constant, detection means for detecting that the cycle period of open/close actions of the electromagnetic valve became longer than a reference value, and an alarm display controller which issues an alarm. In a gas laser oscillator of the present invention, even such a micro vacuum leak that hardly ill-affects the laser output can be detected with ease while the gas laser oscillator is in operation. This makes it possible to apply an appropriate maintenance work beforehand on the vacuum seal. Thus, reliable gas laser oscillators can be offered in accordance with the present invention.

Abstract: An electric discharge laser apparatus having a laser chamber containing a laser gas and two longitudinal electrodes defining a discharge region for producing electrical discharges and a tangential fan for circulating the laser gas and having blade members configured to minimize adverse effects of reflections of electric discharge generated shock waves back to the discharge region simultaneously with a subsequent discharge.

Abstract: A system and method for a power supply system that charges a capacitor, wherein the capacitor charge drives a pulse discharge driven system. The power supply system utilizes a main power supply and a resonant inductor and capacitor configuration to charge the capacitor to a specified, large percentage of a driving voltage that is required by the pulse system. A control module monitors the capacitor charge and disconnects the main power supply when the capacitor charge is within the specified percentage. The main power supply disconnect causes the inductor to discharge and similarly charge the capacitor in a more controlled manner. Once the control module measures the capacitor voltage at the full driving voltage, the control module commands a switch to separate the inductor from the capacitor.

Abstract: A molecular fluorine laser system includes a discharge tube filled with a gas mixture including molecular fluorine and at least one buffer gas and having a total pressure of less than substantially 2500 mbar, multiple electrodes within the discharge tube, a pulsed discharge circuit connected to the electrodes for energizing the gas mixture, a line-selection optic for selecting one of multiple closely-spaced lines around 157 nm emitted from the discharge tube, and a laser resonator including the line-selection optic and the discharge tube for generating a beam of laser pulses having a wavelength around 157 nm at a bandwidth of less than 0.6 pm.

Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

Abstract: An excimer or molecular fluorine laser system includes a wavelength calibration module permitting the wavelength of the narrow band output beam to be calibrated to a specific absolute wavelength. The module is preferably a lamp which contains at least one species including platinum with an optical transition within the emission spectrum of the laser system. Light from the lamp is preferably coincident at a spectrometer with a beam portion from the laser, and the laser beam wavelength is calibrated by simultaneous analysis at the spectrograph.

Abstract: A method of operating a laser system for increasing the lifetimes of optical components of the resonator includes the steps of configuring the laser system to initially output laser pulses at an energy in a range above a predetermined energy for industrial lithographic processing, and attenuating the energy of the output pulses to the predetermined energy. A further step includes reducing an amount of attenuation as optics of the laser resonator age to maintain the laser pulses at the predetermined energy, or reducing the amount of attenuation to produce pulses having a higher energy than the predetermined energy.

Abstract: The objective of the present invention is providing a method and ultra light-weight instruments for controlling propagation of high energy laser beams. The control optical systems are based on gases and techniques for creating gas concentration and flow patterns that modulate the refractive index along the path of propagation of a laser beam.

Abstract: An excimer or molecular fluorine laser system is provided which emits a laser beam during operation and has a gas mixture with a gas composition initially provided within a discharge chamber. The laser system includes a discharge chamber containing a laser gas mixture at least including a halogen-containing species and a buffer gas, multiple electrodes within the discharge chamber and connected to a discharge circuit for energizing the gas mixture, a resonator for generating a laser beam, an electrostatic precipitator for having a voltage applied thereto and for receiving and precipitating contaminant particulates from a flow of the gas mixture, and a processor for monitoring the corona discharge ignition voltage of the electrostatic precipitator and for determining a status of said gas mixture based on the monitored voltage.

Abstract: A F2-laser includes a discharge chamber filled with a gas mixture including molecular fluorine for generating a spectral emission in a wavelength range between 157 nm and 158 nm including a primary line and a secondary line, multiple electrodes coupled with a power supply circuit for producing a pulsed discharge to energize the molecular fluorine, a resonator including the discharge chamber and an interferometric device for generating a laser beam having a bandwidth of less than 1 pm, and a wavelength monitor coupled in a feedback loop with a processor for monitoring a spectral distribution of the laser beam. The processor controls an interferometric spectrum of the interferometric device based on the monitored spectral distribution such that sidebands within the spectral distribution are substantially minimized.

Abstract: A gas discharge laser having an elongated cathode and an elongated anode with a porous insulating layer covering the anode discharge surface. A pulse power system provides electrical pulses at rates of at least 1 KHz. A blower circulates laser gas between the electrodes at speeds of at least 5 m/s and a heat exchanger is provided to remove heat produced by the blower and the discharges. In preferred embodiments at least a portion of the anode is comprised of lead, and fluorine ion sputtering of the anode surface creates the insulating layer (over the discharge surface of the anode) comprised in large part of lead fluoride. In a particular preferred embodiment the anode is fabricated in two parts, a first part having the general shape of a prior art anode with a trench shaped cavity at the top and a second part comprised of lead rich brass and disposed in the trench shape cavity.

Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with optical components adjustable from outside of the enclosure without the need to open it. Targets and beam directors are included within the beam path enclosure and are used to judge the quality of alignment. These target and beam directors are located on a moveable mount which is insertable in the beam path for alignment and are removed out of the beam path for normal operation. The positions of the targets and beam directors are controlled from outside the beam path enclosure. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber.

Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems.

Abstract: A gas discharge laser system for generating a laser beam, such as an excimer or molecular fluorine laser system, includes a laser resonator with an optical element for making wavefront corrections such as an adaptable optical element, a phase conjugating mirror, or a retroreflector array. The resonator preferably also has one or more line-narrowing optical elements for narrowing the bandwidth of the laser beam. One of the resonator reflectors or a transmissive or reflective intracavity optical element of the laser may include the adaptable optical element, phase conjugating mirror or retroreflector plate. A beam expander may be disposed before the adaptable optical element, phase conjugating mirror or retroreflector array for increasing the radius of curvature of the wavefront of the laser beam. A detection and control system including a processor and a detector may be used for controlling the contour of the wavefront correcting optical element in a feedback loop.

Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems.

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.

Abstract: In an excimer laser oscillation apparatus including a laser chamber (20) constituted by a laser tube (2) for storing a laser gas containing a gas mixture of at least one inert gas selected from the group consisting of Kr, Ar, and Ne, He and F2 gas, and an optical resonator consisting of a pair of reflection mirrors (5, 6) arranged to sandwich the laser chamber (20) therebetween, the inner surface of the laser chamber (20) for storing the laser gas has a reflection-free surface with respect to light of a desired wavelength of 248 nm, 193 nm, or 157 nm, and the uppermost surface of the inner surface consists of a fluoride, and a means (waveguide 1) for introducing a microwave for exciting the laser gas in the laser chamber (20) is prepared.

Abstract: An automatic F2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor for monitoring the F2 consumption rates through the operating life of the laser system. These consumption rates are used by a processor programmed with an algorithm to determine F2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F2 controls for a two-chamber MOPA laser system.

Abstract: A gas drawing/refilling and sealing structure for a laser gas storage container of the present invention includes a sealed container and a blocking member, wherein the body of the container is provided with a gas passage having a gas inlet end and a blocking end. The gas passage is further provided with a communicating section to make connection of the gas passage to the container. The blocking member is mounted on the blocking end, gas is drawn out of or injected into the container via the gas inlet end when the gas inlet end is opened; the gas is cut off when the gas inlet end is closed, and the container is sealed at the same time. Thereby, manufacturing and test of the laser equipment can be more convenient, and the superiority of products can be increased.

Abstract: A spiral-type guide member having a spiral channel extending about an open center portion is provided adjacent the gas inlet end of the laser discharge tube of a gas laser assembly. This guides the entering gas stream about the periphery of the laser discharge tube to improve the distribution of the power of the laser beam over the cross section of the laser discharge tube to the discharge tube of the laser beam 113 is provided for the laser gas in the feed line 123, through which at least part of the laser gas is fed to the laser-discharge tube 103.

Abstract: An excimer laser with a laser chamber containing a circulating laser gas containing fluorine and a set of long life electrode structures. At least one of the electrode structures has an erosion pad and a cross section shape designed to provide in conjunction with other chamber structure a gradual increasing flow cross section between the discharge region and the circulating tangential fan blade. In a preferred embodiment, electrode lifetime is increased by annealing the erosion rod after it is are machined. This annealing relieves the surface stress caused by the machining operation and reduces the exposed metallic grain boundary length per unit area on the surface of the electrodes, which provides substantial reduction in erosion caused by fluorine chemical attack. Annealing after machining also reduces the stress throughout the bulk of the electrode material. In preferred embodiments the anode is a copper-aluminum alloy and the cathode is a copper-zinc alloy.

Abstract: A sealed exhaust chemical oxygen-iodine laser (SECOIL) employing a sealed exhaust system (SES) is described. The SES is capable of selectively condensing and cryosorbing various chemical species contained in the laser-exhaust gas. Additionally, a condensable diluent is employed. The SES is configured so that the diluent and other condensables can be removed in a first stage with a high temperature condensing bed, while the oxygen can then be removed in a second stage in a low temperature sorbing bed. The result is a reduction in the weight, volume, and power consumption of the SECOIL system, especially the SES component thereof.

Abstract: A circuit configuration for detecting a functional disturbance has a first and a second differential amplifier. The outputs of the differential amplifiers are connected to the inputs of a gate. One input of the differential amplifiers is in each case connected to a reference potential terminal. The respective other input of the first and second differential amplifiers is connected to a monitoring means, which responds in the event of a change in the supply voltage at a supply potential terminal of the circuit configuration.

Abstract: A laser oscillator capable of effectively collecting and removing particulate foreign matter contained in gas laser medium flowing in a circulating path. An electric discharge section arranged in an optical resonator is incorporated into a circulating path of the gas medium including a heat exchanger and a blower. The gas laser medium flows at a high speed in the circulating path. At least one spiral-flow dust collecting mechanism is provided in the circular path downstream of the heat exchanger, and the gas laser medium discharged from the blower is supplied to the electric discharge section through the spiral-flow dust collecting mechanism. The gas laser medium containing the particulate foreign matter spirally flows around an inner pipe in a cylindrical body of the spiral-flow dust collecting mechanism.

Abstract: A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an F2 gas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.

Abstract: A supplying method and a supplying apparatus for supplying fluorine gas, in which when a fluorine-occluding substance is used for the fluorine gas-generating means, a necessary amount of fluorine gas can be stably and swiftly supplied to have a uniform concentration to &a chamber of an excimer laser device or the like even at running, to say nothing of the gas exchange time. In a fluorine gas-generating means, fluorine gas is generated at the use point by controlling a fluorine-occluding substance to a predetermined temperature, the fluorine gas is introduced into a mixing container, a diluting gas is introduced into the mixing container to mix it with the fluorine gas to prepare a fluorine mixed gas having a predetermined pressure and a predetermined fluorine gas concentration, and the fluorine mixed gas reserved in the mixing container is supplied to a use side such as chamber, using the pressure difference.