Abstract: The present disclosure is a substrate treatment method of supplying a surface treatment liquid onto a surface of a substrate having a film with high water repellency formed thereon, the method including: a liquid puddle forming step of forming a liquid puddle of the surface treatment liquid by supplying the surface treatment liquid from a nozzle to one location of a peripheral portion of the substrate; and a liquid puddle moving step of then moving the liquid puddle formed at the peripheral portion of the substrate to a central portion of the substrate by moving the nozzle from a position above the peripheral portion of the substrate to a position above the central portion of the substrate while continuing the supply of the surface treatment liquid.
Abstract: A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a developing process, and to start supply of the rinsing liquid in a rinsing process, immediately after the supply of the developer ends, thereby achieving a shortened period of the developing process. A switching is made to a drying process by starting supply of the nitrogen gas immediately after completion of the rinsing process. Thus, even if the substrate has a large angle of contact, formation of droplets of the rinsing liquid is inhibited to prevent post-develop defects.
Abstract: An apparatus is provided for processing an imaged element comprising a support, an image-receiving layer and a silver halide emulsion layer. The apparatus comprises a tank for holding a processing liquid, driving means for propelling the imaged element through the tank, guide means for directing the path of the imaged element through the tank and developer circulation means for promoting circulation of the processing liquid in the tank. The circulation means includes flow control means to provide substantially fresh processing liquid to the surface of the imaged element and to disperse exhausted processing liquid present at the surface of the element, thereby eliminating the difficulties associated with local developer exhaustion and ensuring that consistently high image quality is maintained across the whole area of the imaged element.
Type:
Grant
Filed:
September 29, 1999
Date of Patent:
October 9, 2001
Assignee:
Agfa-Gevaert
Inventors:
Simon John Blanchard, Malcolm Bryan Gwilt
Abstract: An apparatus is provided for processing a lithographic printing plate precursor comprising an aluminium support, an image-receiving layer and a silver halide emulsion layer. The apparatus comprises a tank for holding a processing liquid, at least one set of driving rollers, at least one guide roller or guide plate and means for providing direct electrical contact between the lithographic printing plate precursor and other electrically conducting surfaces in the apparatus which are in contact with the processing liquid. A method of processing a lithographic printing plate precursor using the apparatus is also disclosed. Undesirable electrochemical cell formation during processing, and the consequent deleterious effects on silver image formation, are prevented and subsequent problems with poor plate run length can therefore be avoided.
Type:
Grant
Filed:
September 21, 1999
Date of Patent:
May 8, 2001
Assignee:
Agfa-Gevaert
Inventors:
Simon John Blanchard, John Michael Kitteridge
Abstract: Method and an apparatus for measuring the development parameter of a light-sensitive fluid in a white-light environment. The apparatus comprises first and second flexible light-impervious sheets superimposed and sealed together to form a pouch containing a plurality of chambers having flow paths therebetween, wherein the chambers are sealed with burstable seals allowing fluid communication between the chambers upon the application of a predetermined pressure.
Type:
Grant
Filed:
October 15, 1996
Date of Patent:
October 7, 1997
Assignee:
Eastman Kodak Company
Inventors:
John B. Chemelli, Walter J. Bernecker, Craig A. Caprio
Abstract: A distance measuring apparatus includes: a light projecting unit including a light source and a light projecting lens; a distance measuring first photosensor unit disposed at a predetermined baseline length from the light projecting unit and including a first photosensor and a first light receiving lens; and a second photosensor unit disposed in the vicinity of the light projecting unit in a direction perpendicular to the baseline and including a second photosensor and a second light receiving lens. An output of the second photosensor unit is used for correcting an output of the first photosensor unit.