Fluid-treating Apparatus Patents (Class 396/564)
  • Patent number: 9786527
    Abstract: It is an object to reduce a chemical treating width in a peripheral edge part of a substrate while suppressing deterioration in each of uniformity of the chemical treating width and processing efficiency. In order to achieve the object, a substrate processing device for carrying out a chemical treatment for a substrate using a processing liquid having a reaction rate increased with a rise in temperature includes a substrate holding portion, a rotating portion for rotating the substrate held in the substrate holding portion in a substantially horizontal plane, a heating portion for injecting heating steam to a central part of a lower surface of the substrate to entirely heat the substrate, and a peripheral edge processing portion for supplying the processing liquid from above to a peripheral edge part of the substrate heated by the heating portion, thereby carrying out a chemical treatment for the peripheral edge part.
    Type: Grant
    Filed: February 27, 2017
    Date of Patent: October 10, 2017
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Nobuyuki Shibayama
  • Patent number: 9368383
    Abstract: A treating section has substrate treatment lines arranged one over the other for treating substrates while transporting the substrates substantially horizontally. An IF section transports the substrates fed from each substrate treatment line to an exposing machine provided separately from this apparatus. The substrates are transported to the exposing machine in the order in which the substrates are loaded into the treating section. The throughput of this apparatus can be improved greatly, without increasing the footprint, since the substrate treatment lines are arranged one over the other. Each substrate can be controlled easily since the order of the substrates transported to the exposing machine is in agreement with the order of the substrates loaded into the treating section.
    Type: Grant
    Filed: July 30, 2014
    Date of Patent: June 14, 2016
    Assignee: SCREEN SEMICONDUCTOR SOLUTIONS CO., LTD.
    Inventors: Hiroyuki Ogura, Tsuyoshi Mitsuhashi, Yoshiteru Fukutomi, Kenya Morinishi, Yasuo Kawamatsu, Hiromichi Nagashima
  • Patent number: 8554007
    Abstract: An image processing apparatus includes a storage that stores, therein, edge position data indicating the position of a first edge image that represents a first edge of a first object image representing an object in a first image, a determination portion that detects a second edge image based on the edge position data and a specific scaling factor, the second edge image representing a second edge of a second object image that represents the object in a second image, the second image being obtained by modifying the size or the resolution of the first image by increasing the number of pixels by ? times (?>1) corresponding to the scaling factor, the second edge having a width equal to that of the first edge, and a removal portion that performs a process for deleting an edge of an inner area surrounded by the second edge image.
    Type: Grant
    Filed: March 17, 2011
    Date of Patent: October 8, 2013
    Assignee: Konica Minolta Business Technologies, Inc.
    Inventor: Hideyuki Hashimoto
  • Publication number: 20110096304
    Abstract: A pretreatment process, carried out prior to a developing process, spouts pure water, namely, a diffusion-assisting liquid for assisting the spread of a developer over the surface of a wafer, through a cleaning liquid spouting nozzle onto a central part of the wafer to form a puddle of pure water. The developer is spouted onto the central part of the wafer for prewetting while the wafer is rotated at a high rotating speed to spread the developer over the surface of the wafer. The developer dissolves the resist film partly and produces a solution. The rotation of the wafer is reversed, for example, within 7 s in which the solution is being produced to reduce the water-repellency of the wafer by spreading the solution over the entire surface of the wafer. Then, the developer is spouted onto the rotating wafer to spread the developer on the surface of the wafer.
    Type: Application
    Filed: October 14, 2010
    Publication date: April 28, 2011
    Applicant: Tokyo Electron Limited
    Inventors: Hirofumi TAKEGUCHI, Tomohiro Iseki, Yuichi Yoshida, Kousuke Yoshihara
  • Patent number: 7922405
    Abstract: A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a developing process, and to start supply of the rinsing liquid in a rinsing process, immediately after the supply of the developer ends, thereby achieving a shortened period of the developing process. A switching is made to a drying process by starting supply of the nitrogen gas immediately after completion of the rinsing process. Thus, even if the substrate has a large angle of contact, formation of droplets of the rinsing liquid is inhibited to prevent post-develop defects.
    Type: Grant
    Filed: February 6, 2007
    Date of Patent: April 12, 2011
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Tsuyoshi Mitsuhashi, Kenji Sugimoto
  • Patent number: 7874748
    Abstract: A photo development apparatus for use in fabricating a color filter substrate for a display panel is disclosed. The disclosed photo apparatus includes a development solution supplier to supply a negative development solution. The photo apparatus also includes a first photo apparatus to form a positive photo-resist pattern to be used in forming a black matrix, wherein the positive photo-resist pattern is formed by patterning a light shielding layer formed on a substrate using the negative development solution and a positive photo-resist.
    Type: Grant
    Filed: November 11, 2009
    Date of Patent: January 25, 2011
    Assignee: LG Display Co., Ltd.
    Inventor: Seung Han Paek
  • Publication number: 20100209098
    Abstract: An apparatus for reusing developer liquid in a plate processor device includes: a new developer liquid container (13); a work in progress developer liquid tank (10) for plate processing is filled with developer liquid (15) from the new developer liquid container (13); a waste developer liquid container (14) configured to receive spilled over developer liquid (16) from the work in progress developer liquid tank (10); and replenish means configured to replenish the waste developer liquid (21) from the waste developer liquid container (14) back according to the conductivity level of the waste developer liquid.
    Type: Application
    Filed: February 16, 2009
    Publication date: August 19, 2010
    Inventors: Moshe Marom, Kaiman Shamir
  • Patent number: 7651284
    Abstract: A development apparatus has a holder which horizontally holds a substrate, a nozzle which supplies a developer to a resist film on the substrate held by the holder, a liquid flow suppressing member whose size in a two-dimensional plane viewing field is equal to or larger than that of the substrate and which has a mesh having many openings and hydrophilic properties with respect to the developer and transmits the developer supplied from the nozzle through the openings of the mesh to form a liquid film of the developer between the mesh and the substrate, and a moving mechanism which movably supports this liquid flow suppressing member, sets the mesh to face the resist film on the substrate and brings the mesh into contact with a surface of the liquid film of the developer or immerges the mesh in the liquid film.
    Type: Grant
    Filed: November 13, 2006
    Date of Patent: January 26, 2010
    Assignee: Tokyo Electron Limited
    Inventor: Tetsuya Kitamura
  • Patent number: 7637676
    Abstract: A photographic pack includes photographic prints in one order, an order information print for the one order having index images recorded on a first side and at least a fee recorded on a second side, and a bag having at least a transparent area, and for accommodating a stack formed by superposing the order information print and the photographic prints. A non-image recording side of a first print of the photographic prints in the stack faces outward, the second side of the order information print faces outward and the rest of the photographic prints are sandwiched between the first print and the order information print. A print system includes an order receiver for receiving the one order of a customer, a fee calculator for calculating a fee, a printer for preparing the photographic prints and the order information print, and a packer for preparing the photographic pack.
    Type: Grant
    Filed: June 28, 2006
    Date of Patent: December 29, 2009
    Assignee: Fujifilm COrporation
    Inventors: Tsuyoshi Tanabe, Takayuki Iida, Naoyuki Morita
  • Publication number: 20090280436
    Abstract: An immersion system is used in an immersion exposure, wherein a substrate is exposed with an exposure light through an optical member and a liquid, and that fills an optical path of the exposure light between the optical member and the substrate with the liquid.
    Type: Application
    Filed: March 23, 2009
    Publication date: November 12, 2009
    Applicant: NIKON CORPORATION
    Inventor: Yasufumi Nishii
  • Publication number: 20090010639
    Abstract: RFID tag to which predetermined information is written in advance is added to a replenisher cartridge, and the information is read from the RFID tag when the replenisher cartridge is loaded in a photo processing device. Whether or not a loaded replenisher cartridge is a genuine product is judged based on whether or not the predetermined information is written in the tag. When it is judged, based on whether or not the predetermined information is in the tag, that the loaded replenisher cartridge is not the genuine product, a processing speed (carrying speed of photographic paper) is reduced from normal level and at the same time a supply quantity of the replenisher to a processing solution tank is increased from a normal level. This avoids significant reduction in the photo processing performance and enables non-genuine replenisher cartridges to be also used.
    Type: Application
    Filed: February 21, 2006
    Publication date: January 8, 2009
    Applicant: FUJIFILM Corporation
    Inventor: Yoshihiro Fujita
  • Patent number: 7435021
    Abstract: A developer replenishing method of an automatic development device of photosensitive lithographic printing plate including developing a plurality of exposed photosensitive lithographic printing plates with a developer containing an electrolyte and keeping the developer activity constant by replenishing with a replenisher. The method includes obtaining certain defined values, conducting defined calculations, comparing defined values and, dependent on the comparison, setting new values An automatic development device which carries out the method is also set forth.
    Type: Grant
    Filed: July 20, 2007
    Date of Patent: October 14, 2008
    Assignee: Fujifilm Corporation
    Inventor: Hiroyuki Sasayama
  • Patent number: 7387455
    Abstract: Rinsing nozzles 310a to 310e are moved on a wafer W while they are discharging rinsing solution 326. At that point, discharging openings 317a to 317e are contacted to developing solution 350 coated on the wafer W or rinsing solution 326 on the wafer W. Thus, the impact against the wafer W can be suppressed. As a result, pattern collapse can be prevented. In addition, a front portion of the developing solution 350 can push away the developing solution 350.
    Type: Grant
    Filed: May 16, 2003
    Date of Patent: June 17, 2008
    Assignee: Tokyo Electron Limited
    Inventors: Tetsutoshi Awamura, Yukio Kiba, Keiichi Tanaka, Takahiro Okubo, Shuuichi Nishikido
  • Publication number: 20070280680
    Abstract: A photo process apparatus including: a loading/unloading unit that loads and unloads a substrate; a coating line that coats photoresist on the substrate; an exposure line that exposes the photoresist coated on the substrate; a development line that develops the exposed substrate; and a transferring line that temporarily stores the substrate coated with the photoresist and loads the substrate coated with the photoresist to the exposure line and temporarily stores the exposed substrate and loads the exposed substrate to the development line.
    Type: Application
    Filed: December 15, 2006
    Publication date: December 6, 2007
    Inventors: Yong Hun Kim, Jin Woo Seo
  • Patent number: 7208263
    Abstract: A method for making a photosensitive resin printing plate which comprises at least (1) the exposure step of forming a latent image in an aqueous-developable photosensitive resin layer of a printing plate material by irradiating the printing plate material with a ray of active light, (2) the development step of forming a relief image from the latent image by dissolving or dispersing the photosensitive resin layer that forms the latent image into a developer that contains water as a main component, and (3) the drying step of removing the developer from the printing plate having the relief image, the method being characterized in that a photosensitive resin layer component-dissolved or dispersed developer produced in the development step is subjected to a reduced pressure distillation, and is therefore reused as a developer, and a residue produced by the reduced pressure distillation is solidified.
    Type: Grant
    Filed: July 2, 2002
    Date of Patent: April 24, 2007
    Assignee: Toray Industries, Inc.
    Inventors: Kumiko Asato, Shinji Tanaka, Toshiki Kito, Katsuhiro Uehara
  • Patent number: 7024996
    Abstract: An automatic processing method by developing a plural number of exposed photosensitive lithographic printing plates with a developer, which comprises the previously calculating step, the measuring step and the replenishing step as defined herein, wherein during a period from immediately after start of operation of an automatic processing apparatus until the measured electric conductivity value of the developer exceeds the target electric conductivity value, the target electric conductivity value is corrected using a first operation expression as previously defined for every replenishment of the developer replenisher; and after the measured electric conductivity value of the developer first exceeds the target electric conductivity value after start of operation of the automatic processing apparatus, the target electric conductivity value is corrected using a second operation expression for every replenishment of the developer replenisher.
    Type: Grant
    Filed: December 22, 2003
    Date of Patent: April 11, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Hiroyuki Sasayama
  • Patent number: 7014373
    Abstract: The present invention relates to a processing solution supply cartridge which utilizes a single container for a single-part developer concentrate. The single container has at least two valves or necks and is adapted to be utilized on a existing processor or processing machine. The single developer container design of the present invention assures a complete emptying of the container by permitting the simultaneous replenishment of single-part developer through each of the valves into the processing machine. With the combination of the single developer container and the single-part developer the process of metering distinct developers through distinct containers is not required. By facilitating the complete emptying of the developer container, the likelihood of developer solution remaining in the container is minimized.
    Type: Grant
    Filed: November 25, 2003
    Date of Patent: March 21, 2006
    Assignee: Eastman Kodak Company
    Inventors: Ralph L. Piccinino, Jr., Charles M. Darmon, Daniel R. English, Paul A. Schwartz
  • Publication number: 20040190893
    Abstract: A submerged processing device for a photosensitive material disposed at a partitioning wall which is provided within a processing tank main body and which is between processing chambers respectively storing a processing liquid, the submerged processing device includes: a housing at an interior of which is formed a processing space where the processing liquid is stored; a conveying path for conveying-in of the photosensitive material and which is formed in the housing so as to communicate with an interior of the processing space; a path for conveying-out of the photosensitive material and which is formed in the housing so as to communicate with the interior of the processing space; a processing liquid passage preventing mechanism disposed at the photosensitive material conveying path such that only the photosensitive material passes therethrough; and a processing liquid changing mechanism provided at the housing, for changing the processing liquid stored in the processing space.
    Type: Application
    Filed: March 24, 2004
    Publication date: September 30, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Katsuhiko Tanaka, Fumio Mogi
  • Publication number: 20040136707
    Abstract: A thermal development apparatus includes a heating drum and rollers. The heating drum with a smooth layer having an arc shaped portion of an outer circumferential surface heats and carries photothermographic imaging material being in contact with the arc-shaped portion, and opposed rollers arranged in line along a carrying path of the material presses the material to the outer circumferential surface of the arc-shaped portion. When R (mm) denotes radius of arc-shaped portion, r (mm) denotes radius of opposed rollers, &agr; (degree) denotes angle between lines respectively connecting center of arc-shaped portion and centers of two opposed rollers adjacent to each other, P (mm) denotes pitch of opposed rollers, and &bgr; (degree) denotes contact angle of material to opposed roller, P=2&pgr;R&agr;/360, 2r+3≧P>2r, and &bgr;≦60 are satisfied.
    Type: Application
    Filed: December 19, 2003
    Publication date: July 15, 2004
    Inventors: Makoto Sumi, Mamoru Umeki, Kazuhiro Kido
  • Publication number: 20040131351
    Abstract: A film-processing method according to the present invention includes: a processing step of irradiating electron beams onto a film on a surface of an object to be processed to conduct a process to the film; an electric-current measuring step of capturing the electron beams in a vicinity of the object to be processed to measure an electric-current value during the processing step; and a detecting step of detecting an end point of the process to the film, based on an amount of electron obtained by means of a time integration of the electric-current value. According to the present invention, a suitable irradiation of the electron beams onto the film on a surface of the object to be processed can be realized. Thus, a suitable film quality can be obtained.
    Type: Application
    Filed: December 19, 2003
    Publication date: July 8, 2004
    Inventors: Tadashi Onishi, Manabu Hama
  • Publication number: 20040096210
    Abstract: The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting of a supercritical fluid; and a supercritical fluid container for storing a supercritical fluid, where the supercritical fluid container is connected to the development processing chamber through a valve.
    Type: Application
    Filed: November 13, 2003
    Publication date: May 20, 2004
    Inventors: Hisayuki Takasu, Kouichi Miyazawa, Toru Iwaya
  • Publication number: 20040086273
    Abstract: A density adjustment method for adjusting a density of a diagnostic image, having the steps of; exposing an image; developing the latent image; measuring a density of the developed image; creating a lookup table for relating the diagnostic image data and amount of exposure so as to form a density specified by the diagnostic image data; and correcting at least one of an exposure condition and a development condition to ensure that the next film has the optimized density, based on the difference between the measured density of a partial area of the film, and a density for comparison; wherein, a density of a prescribed area in a test exposure image is used as the density for comparison; while the exposure amount is used for exposing the partial area of the film at the time of forming a diagnostic image.
    Type: Application
    Filed: October 29, 2003
    Publication date: May 6, 2004
    Applicant: KONICA MINOLTA HOLDINGS, INC.
    Inventors: Makoto Horiuchi, Mamoru Umeki, Akira Taguchi, Youichi Ono
  • Publication number: 20040081456
    Abstract: An apparatus for processing photographic materials has at least one photographic processing station enclosed in a housing. The housing and the processing station are each independently mounted through their own oscillation-damping connections to a common support base, so that any connections between the housing and the processing station run exclusively through the common support base.
    Type: Application
    Filed: September 18, 2003
    Publication date: April 29, 2004
    Applicant: Agfa-Gevaert AG
    Inventors: Michael Johnke, Hans Schluter
  • Publication number: 20040076912
    Abstract: A method and an apparatus for removing an organic film such as a resist film from a substrate surface are provided. These are very safe even at high temperatures, and use a treatment liquid which can be recycled and reused. A treatment liquid typically formed from liquid ethylene carbonate, propylene carbonate, or a liquid mixture of these two compounds, and in particular such a treatment liquid containing dissolved ozone, is contacted with a substrate with an organic film, and the organic film is removed.
    Type: Application
    Filed: October 14, 2003
    Publication date: April 22, 2004
    Inventors: Hisashi Muraoka, Rieko Muraoka, Asuka Sato, Mitsuru Endo
  • Publication number: 20040062546
    Abstract: A method of washing contaminants from a coated surface of a material transports the material up an inclined substantially planar surface and introduces wash solution at the upper part of the planar surface. The planar surface incorporates substantially non smooth resistance means which provides a resistance to downward flow of the wash solution and has a capacity for holding wash solution which is in excess of that of a substantially smooth surface.
    Type: Application
    Filed: August 26, 2003
    Publication date: April 1, 2004
    Applicant: Eastman Kodak Company
    Inventors: Gareth B. Evans, Peter Hewitson
  • Publication number: 20040052517
    Abstract: A photographic processing system, which contains: solidifying a photographic processing waste solution, to give a solidified matter thereof; and reusing part of the solidified matter as a solid processing agent.
    Type: Application
    Filed: August 12, 2003
    Publication date: March 18, 2004
    Inventors: Hideaki Nomura, Takatoshi Ishikawa
  • Publication number: 20040043340
    Abstract: A rinse-processing composition of the present invention comprises a compound represented by R—(OC2H4)n—OH, wherein R is an alkyl group containing 8 to 13 carbon atoms and n is an integer of 10 to 30, but comprises neither aldehyde compounds nor hexamethylenetetramine derivatives, and a processing method and a processing apparatus of the present invention uses such a rinse-processing composition.
    Type: Application
    Filed: August 23, 2002
    Publication date: March 4, 2004
    Inventor: Hiroyuki Seki
  • Publication number: 20040042788
    Abstract: An apparatus for washing contaminants from a coated surface of a material comprises an inclined substantially planar surface up which the material is passed, an inlet for the introduction of wash solution at the upper part of the planar surface and pressure applying means for holding the material in full contact with the surface.
    Type: Application
    Filed: August 26, 2003
    Publication date: March 4, 2004
    Applicant: Eastman Kodak Company
    Inventors: Gareth B. Evans, Peter Hewitson
  • Publication number: 20040005149
    Abstract: A series of substrate transport paths for transporting substrates is arranged on upper and lower stories. The substrates are transferable between the substrate transport path on the first story and the substrate transport path on the second story. The substrate transport paths define a going-only path for transporting the substrates forward, and a return-only path for transporting the substrates in the opposite direction, the going-only path and return-only path being arranged on the upper and lower stories. An indexer connects one end of the substrate transport path on one story to one end of the substrate transport path on the other story. An interface connects the other end of the substrate transport path on one story to the other end of the substrate transport path on the other story.
    Type: Application
    Filed: June 9, 2003
    Publication date: January 8, 2004
    Applicant: Dainippon Screen Mfg. Co.,Ltd.
    Inventors: Kenji Sugimoto, Minobu Matsunaga, Masakazu Sanada, Katsushi Yoshioka, Kaoru Aoki, Moritaka Yano, Satoshi Yamamoto, Tsuyoshi Mitsuhashi, Takashi Nagao, Mitsumasa Kodama
  • Publication number: 20030211408
    Abstract: The invention relates to an apparatus for thermal development having a receiver for receiving an imagewise exposed thermal film, an accumulator for gathering the film, a drive for advancing the film from the receiver to the accumulator, a heater located between the receiver and the accumulator for developing the film, a compound image scanner for scanning the film after it has been thermally developed, the scanner having a first light source and a first sensor placed for forming a first electronic record of the image formed on the developed film by reflection, a second light source and a second sensor placed for forming a second electronic record of the image by an opposing reflection, and a third sensor and a third light source placed for forming a third electronic record of the image formed by transmission, and a lighttight container for the receiver and the heater.
    Type: Application
    Filed: May 21, 2003
    Publication date: November 13, 2003
    Inventors: Richard P. Szajewski, Mark E. Irving
  • Publication number: 20030210907
    Abstract: After the first workpieces have been processed in the first process portion while the second workpieces are being processed in the second process portion, the first process portion in which the first process condition has been set for the third process condition. By repeating such processes, a plurality of workpieces can be successively processed in different types of process conditions.
    Type: Application
    Filed: May 9, 2003
    Publication date: November 13, 2003
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Kiyohisa Tateyama
  • Publication number: 20030202792
    Abstract: A substrate processing apparatus include a spin chuck capable of holding a semiconductor wafer in a horizontal position, a drive motor for driving the spin chuck for rotation, and a processing vessel accommodating the spin chuck and the drive motor 50 therein and capable of sealing a supercritical fluid, such as supercritical carbon dioxide, therein. The supercritical fluid flows along the upper and the lower surface of the semiconductor wafer at velocities relative to the upper and the lower surface of the semiconductor wafer as the spin chuck holding the semiconductor wafer in a horizontal position rotates to remove contaminants including particles and adhering to the semiconductor wafer from the semiconductor wafer.
    Type: Application
    Filed: April 23, 2003
    Publication date: October 30, 2003
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Gentaro Goshi
  • Publication number: 20030198468
    Abstract: Provided are an apparatus and method for developing a large-sized liquid crystal display. The apparatus includes a bar-shaped developer spraying nozzle and a bar-shaped developer removing nozzle. The bar-shaped developer spraying nozzle is installed at a predetermined distance from a substrate and sprays a developer on the substrate. The bar-shaped developer removing nozzle is kept at a predetermined distance from a side of the developer spraying nozzle, collects the developer sprayed from the developer spraying nozzle in a vacuum state, and removes the sprayed developer. Accordingly, the apparatus and method can be applied to a rinsing process, a stripping process, a developing process, and an etching process.
    Type: Application
    Filed: March 5, 2003
    Publication date: October 23, 2003
    Inventors: Yong-Seok Park, Jum-Lyul Han
  • Publication number: 20030185558
    Abstract: An image forming device which automatically manages temperature and humidity for stably processing a photosensitive material. A temperature sensor and a humidity sensor sense changes in temperature and humidity within a heat developing section of the image forming device. A temperature regulator computes an optimal temperature and heating time in accordance with results of sensing, and controls a heating section and conveying of the photosensitive material.
    Type: Application
    Filed: March 27, 2003
    Publication date: October 2, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Kazuhiko Matsumoto
  • Publication number: 20030161628
    Abstract: A method of applying an image processing onto two dimensionally-arranged image data representing a photographed image including a main photographed-subject and producing image signals to reproduce the photographed image visually with one of various reproduction sizes on one of various kinds of recording media, includes a reproduction size determining step of determining a reproduction size of the photographed image to be reproduced visually on a recording medium; a subject size determining step of determining a size of the main photographed-subject on the determined reproduction size of the photographed image; an image processing content changing step of changing a content of the image processing on the basis of the determined reproduction size of the photographed image and the determined size of the main photographed-subject; and a processing step of applying the image processing with the changed content onto the two dimensionally-arranged image data and producing image signals.
    Type: Application
    Filed: February 14, 2003
    Publication date: August 28, 2003
    Inventors: Tsukasa Ito, Hiroaki Takano
  • Publication number: 20030159717
    Abstract: A method of washing a process station and/or the material being processed therein uses a series of tanks of wash solution used in a sequential fashion. A first volume of wash solution is used and discarded to waste. Subsequent volumes of solution are transferred after use to the tank from which the previous volume of solution was supplied. The last volume of solution used is taken from a source of clean solution.
    Type: Application
    Filed: February 24, 2003
    Publication date: August 28, 2003
    Applicant: Eastman Kodak Company
    Inventors: Gareth Evans, Leslie R. Wells, Peter Hewitson, John R. Fyson
  • Publication number: 20030156838
    Abstract: An image processing method to conduct an image processing on image signals indicating an image obtained through photographing by a photographing apparatus for generating image signals for output. The image processing method has a determining process to determine a content of image processing to be conducted on the image signals based on information about environment light in the course of photographing, information about flashlight in the course of photographing, and on at least one of information about zoom magnification in the course of photographing and information about ISO speed.
    Type: Application
    Filed: February 14, 2003
    Publication date: August 21, 2003
    Inventors: Chizuko Ikeda, Tsukasa Ito, Hiroaki Takano
  • Publication number: 20030156837
    Abstract: An image processing method to conduct an image processing on image signals indicating a photographed image for generating image signals for output, having the steps of: detecting an area in the photographed image where the mixed ratio of flashlight to environment light in the course of photographing is greater than a prescribed value, based on respective information including information about environment light in the course of photographing, information about flashlight in the course of photographing, and at least one of information about zoom magnification in the course of photographing, information about ISO speed and information about a subject distance in the course of photographing; and determining a content of image processing in accordance with a ratio of the area detected to the total area of the photographed image.
    Type: Application
    Filed: February 14, 2003
    Publication date: August 21, 2003
    Inventors: Chizuko Ikeda, Tsukasa Ito, Hiroaki Takano
  • Publication number: 20030147643
    Abstract: A resist coating/developing system comprises a cassette station, a process station, and an interface station. A second wafer transfer member for transferring the wafer from a high precision temperature control unit mounted to the interface station to an in-stage of a light exposure device provisionally disposes the wafer held by the second wafer transfer member on a restoration unit in the case where the wafer was taken out from the high precision temperature control unit because it was possible to transfer the wafer onto the in-stage, but it was rendered impossible later to transfer the wafer W onto the in-stage.
    Type: Application
    Filed: January 30, 2003
    Publication date: August 7, 2003
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Akira Miyata, Makio Higashi, Shigeki Wada
  • Patent number: 6595706
    Abstract: A processing apparatus is provided which can be easily transported to whatever location is required. The apparatus has no open tanks of processing solution, the possibility of spillage of the solutions being therefore eliminated.
    Type: Grant
    Filed: December 11, 2001
    Date of Patent: July 22, 2003
    Assignee: Eastman Kodak Company
    Inventor: Nigel R. Wildman
  • Publication number: 20030133710
    Abstract: One aspect of the invention is a system for digital dye color film processing. In one embodiment, a developer station applies a processing solution to film to initiate development of metallic silver grains and at least one dye image within the film. A scanning system illuminates the coated film with light having at least one frequency within the visible portion of the electromagnetic spectrum. The light interacts with the silver and at least one dye image within the film. The scanning station measures the light from the film and produces sensor data that is communicated to a data processing system. The data processing system processes the sensor data to produce a digital image. The digital image can then be output to an output device, such as a printer, monitor, memory device, and the like.
    Type: Application
    Filed: July 16, 2002
    Publication date: July 17, 2003
    Inventors: Paul N. Winberg, Stanley Kowalski, Michael W. Shields,, David J. Bassett, William A. Gagnon, Michael R. Thering
  • Publication number: 20030128977
    Abstract: A clean booth has a conveyor area for carrying recording sheets, and a motor drive area for containing motor and mechanical parts that emit much dust. The conveyor area and the motor drive area are covered respectively, and separated by a frame plate. Moreover, fan filter units blow pressurized clean air into the conveyor area to discharge dust while a ventilation system exhausts air in the motor drive area. There is no airflow from motor drive area to the conveyor area because of the difference in air pressure. The recording sheets in the conveyor area are carried by belt conveyors with artificial suede belts. The artificial suede belt is suitable to be used as a conveyer belt because of low dust emission and sufficient flexibility to prevent flaw or pressure marks on the recording sheets.
    Type: Application
    Filed: December 18, 2002
    Publication date: July 10, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Takehiko Nakayama, Hiroyuki Nishida, Hideyuki Uezono
  • Publication number: 20030123875
    Abstract: A bundle for photographic processing chemicals containing the concentrates for all the processing steps for processing a photographic material, wherein the concentrations of chemicals in the individual concentrates are selected such that all the concentrates are prepared with the same quantity of water in each case and the resultant replenishing liquids for all the processing steps are sufficient for the same quantity of photographic material, makes it possible largely to avoid operating errors and provides simple monitoring of the replenishment rate of the individual baths.
    Type: Application
    Filed: December 18, 2002
    Publication date: July 3, 2003
    Inventors: Peter Buttner, Marc Reiners
  • Patent number: 6587839
    Abstract: A method of informing a customer that their photofinishing order is ready to picked up at a retailer. An electronic notification is sent to the customer when the order has been completed, the notification containing at least one image of the plurality of image in the customer order. A notice may also be sent to retail provider where the order is to picked-up by the customer. The method also includes the ability for the consumer to direct that the order be sent to a particular retail establishment.
    Type: Grant
    Filed: February 4, 2000
    Date of Patent: July 1, 2003
    Assignee: Eastman Kodak Company
    Inventors: Dale F. McIntyre, Andrew T. Cooper, Robert F. Weir
  • Publication number: 20030118341
    Abstract: A developer supply nozzle moves from a first end toward a second end of a substrate for supplying a developer to the overall main surface of the substrate. After a lapse of a required developing time, a rinse discharge nozzle moves from the first end toward the second end of the substrate for supplying a rinse to the overall main surface of the substrate. A partition plate is provided for preventing the rinse discharged from a slit discharge port of the rinse discharge nozzle onto the substrate from flowing frontward in the direction of movement of the rinse discharge nozzle or washing away the developer supplied onto the substrate frontward.
    Type: Application
    Filed: December 26, 2002
    Publication date: June 26, 2003
    Applicant: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Masakazu Sanada, Masahiko Harumoto
  • Patent number: 6572284
    Abstract: A photo minilab includes a computer or other device for estimating processing times of jobs accepted by the minilab.
    Type: Grant
    Filed: September 12, 2001
    Date of Patent: June 3, 2003
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventor: Stephen W. Bauer
  • Publication number: 20030095802
    Abstract: In the present invention, an image formation method of recording digital image information on a silver salt color film to obtain an image, comprises:
    Type: Application
    Filed: November 4, 2002
    Publication date: May 22, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Yasunori Mimaki, Makoto Yamada
  • Patent number: 6567619
    Abstract: A system and method provide reliable and effective notification to customers that film rolls they have deposited with a vendor for processing have been returned and are available for retrieval. The method includes storing customer identification data in a data repository that accompanies a film roll container, reading customer identification data from the data repository after development of the film roll in the film container, and generating a notification message for delivery to the customer corresponding to the customer identification data. The notification message informs the customer that the developed film is available for retrieval from the deposit site. Entry of the data for storage in the data repository may be performed by a customer or deposit site employee through a keypad or through a scanning device that reads a customer token.
    Type: Grant
    Filed: June 27, 2000
    Date of Patent: May 20, 2003
    Assignee: NCR Corporation
    Inventor: Terence M. Glogovsky
  • Publication number: 20030091347
    Abstract: An image forming method comprising exposing a heat-developable light-sensitive material comprising a support having thereon at least a light-sensitive silver halide having a silver iodide content of 5 to 100 mol %, a light-insensitive organic silver salt, a heat developing agent, and a binder by means of a scanning optical system having a light source emitting a laser beam having an emission peak between 350 nm and 450 nm to form a latent image on said heat-developable light-sensitive material, heating said heat-developable light-sensitive material to about 80 to 250° C. in a heat development section, and cooling said heat-developable light-sensitive material having been heat treated in said heat development section to or below a development stopping temperature while said heat-developable light-sensitive material is transported in a cooling section.
    Type: Application
    Filed: July 11, 2002
    Publication date: May 15, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Yasuhiko Goto, Katsutoshi Yamane
  • Publication number: 20030081955
    Abstract: The image processing method includes successively acquiring image data of images of a plurality of frames, changing a timing with which determination of an image processing condition is started in accordance with contents of the images carried by the acquired image data, determining the image processing condition for each of the frames based on the timing using the image data of the images of the frames and performing image processing in accordance with the thus determined image processing condition to output data for output purposes. The image processing condition of each frame can be determined rapidly in a correct or proper manner in a digital laboratory system, and the workability or the productivity of print output or image file output can be improved.
    Type: Application
    Filed: September 26, 2002
    Publication date: May 1, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Hiroyasu Yamamoto