Abstract: The invention provides a method of photographic processing, comprising the steps of applying a first component of a processing solution to the surface of a silver halide photographic material to be processed and applying a second component of the processing solution to the surface of photographic material to be processed. When the applied first and second components have mixed together, the processing solution is active to oxidise silver in the photographic material. The invention also provides a photographic processor suitable for carrying out the method.

Abstract: A system for regulating (e.g., terminating) a development process is provided. The system includes one or more light sources, each light source directing light to one or more patterns and/or gratings on a wafer. Light reflected from the patterns and/or gratings is collected by a measuring system, which processes the collected light. The collected light is indicative of the dimensions achieved at respective portions of the wafer. The measuring system provides development related data to a processor that determines the acceptability of the development of the respective portions of the wafer. The collected light may be analyzed by scatterometry and/or reflectometry systems to produce development related data and the development related data may be examined to determine whether a development process end point has been reached, at which time the system can control the development process and terminate development.

Abstract: A method and system for environmental control in film processing is disclosed. In general, photographic film is coated with a processing solution, such as a developer solution, and is then developed within a controlled air environment. In the preferred embodiments, the temperature and humidity within the air environment is strictly controlled, which allows the development process to be more accurately and consistently controlled. This also allows fewer processing chemicals to be used and reduces harmful effluents caused by photographic film processing.

Abstract: A substrate (W) is held in an approximately horizontal position by a substrate holder (10) and is rotated by a spinning motor (13). A rinsing liquid supply nozzle (140) is rotatably supported at its one end by a second nozzle movement mechanism (150) and is rotated to pass over the substrate (W). The rinsing liquid supply nozzle (140) is rotated to pass over the substrate (W) and at the same time to discharge a rinsing liquid from its discharge unit. At this time, the rinsing liquid supply nozzle (140) and the substrate (W) are rotated so that a virtual scanning direction (La) of the substrate (W) is substantially perpendicular to a direction of extension of the rinsing liquid supply nozzle (140). That is, since the rinsing liquid supply nozzle (140) is shifted in the virtual scanning direction (La), a non-supplying area of the substrate (W) where a rinsing liquid is not supplied can successively be made up and eliminated as the scanning by the nozzle (140) proceeds.

Abstract: A developer supply nozzle moves from a first end toward a second end of a substrate for supplying a developer to the overall main surface of the substrate. After a lapse of a required developing time, a rinse discharge nozzle moves from the first end toward the second end of the substrate for supplying a rinse to the overall main surface of the substrate. A partition plate is provided for preventing the rinse discharged from a slit discharge port of the rinse discharge nozzle onto the substrate from flowing frontward in the direction of movement of the rinse discharge nozzle or washing away the developer supplied onto the substrate frontward.

Abstract: A photographic film developing apparatus maintains a photographic film, a developer solution and a second processing solution at a specific temperature while performing film development operation by directly applying the individual solutions to an emulsion side of the photographic film. After the developer solution and the second processing solution have been applied from respective processing solution application heads to the emulsion side of the photographic film, the quantity of each solution on the emulsion side is adjusted to form a layer of a specified thickness. While transfer belts advance each successive portion of the photographic film up to a processing solution wipe-out device, heaters provided close to the transfer belts heat the individual solutions applied to the photographic film through the transfer belts to maintain the solutions at the specific temperature.

Abstract: A resist coating unit includes a coater cup surrounding a wafer W held by a spin chuck and an air supply mechanism for blowing an air into the coater cup. The air supply mechanism includes a hollow frame having a first open portion formed in the vertical wall, an air blowing device for blowing an air into the hollow frame, and a filter chamber unit into which the air within the frame is introduced. The filter chamber unit includes a first air introducing chamber having a heater arranged therein, a second air introducing chamber, an air stream control mechanism, and a filter unit. The air flowing within the frame flows into the first air introducing chamber through the first open portion so as to be uniformly heated by the heater and, then, is introduced into the second air introducing chamber. Then, the air uniformly heated by the heater is blown into the coater cup through the air stream control mechanism and the filter unit.

Abstract: An aqueous developer solution for use in digital film processing. The developer solution includes a developing agent and at least one surfactant or thickener. A method of processing a photographic film is also provided, and includes the steps of coating an aqueous developer solution containing at least one surfactant or thickener onto the film, thereby developing the film, and scanning the film through the coating of developer solution.

Abstract: A digital film processing system and film processing solution cartridge are disclosed. The cartridge comprises a housing and a chamber for storing a film processing fluid. The processing solution may be contained within a flexible bladder within the chamber. The cartridge may also include an integral applicator for coating the processing solution onto undeveloped film. The cartridge is generally removeably attached to the film processing system, but may also be refillable.

Abstract: A solution-receiving plate having solution-passing holes for passing a developer solution therethrough toward the back side of the plate is provided. Respective surfaces of the solution-receiving plate and a substrate are at the same height, and the solution-receiving plate is placed on the front-end side of the substrate and separated slightly from the front end of the substrate. A supply nozzle is moved to apply a developer solution. Accordingly, when the developer solution extended continuously between the perimeter of the substrate and the supply nozzle is severed, the severed developer solution is prevented from returning to the developer solution already spread over the substrate and thus flow and waves are prevented from occurring in the developer solution spread on the surface of the substrate. A resist pattern with a highly uniform line width is thus produced.

Abstract: The present invention relates to a method of supplying a developing solution to a surface of a substrate to perform developing treatment for the substrate, comprising a first step of supplying the developing solution to the surface of the substrate while a developing solution supply nozzle is moving relative to the substrate and a second step of developing the substrate for a first predetermined period of time, and the second step has the step of stirring the developing solution on the surface of the substrate after a second predetermined period of time from the completion of the first step. Because of stirring, the concentration of the developing solution on the substrate is made uniform, resulting in a rise in the uniformity of developing treatment.

Abstract: One aspect of the invention is a system for digital dye color film processing. In one embodiment, a developer station applies a processing solution to film to initiate development of metallic silver grains and at least one dye image within the film. A scanning system illuminates the coated film with light having at least one frequency within the visible portion of the electromagnetic spectrum. The light interacts with the silver and at least one dye image within the film. The scanning station measures the light from the film and produces sensor data that is communicated to a data processing system. The data processing system processes the sensor data to produce a digital image. The digital image can then be output to an output device, such as a printer, monitor, memory device, and the like.

Abstract: Thermal processing unit sections each with ten tiers and coating processing unit sections each with five tiers are disposed around a first main wafer transfer section and a second main wafer transfer section, and in the thermal processing unit section, the influence of the time required for substrate temperature regulation processing on a drop in throughput can be reduced greatly by transferring the wafer W while the temperature of the wafer W is being regulated by a temperature regulation and transfer device.

Abstract: A substrate treating apparatus disclosed herein realizes improved throughput. The substrate treating apparatus according to this invention includes an antireflection film forming block, a resist film forming block and a developing block arranged in juxtaposition. Each block includes chemical treating modules, heat-treating modules and a single main transport mechanism. The main transport mechanism transports substrates within each block. Transfer of the substrates between adjacent blocks is carried out through substrate rests. The main transport mechanism of each block is not affected by movement of the main transport mechanisms of the adjoining blocks. Consequently, the substrates may be transported efficiently to improve the throughput of the substrate treating apparatus.

Abstract: The present invention relates to a web handling apparatus and process ideally suited for applications involving wet chemistry. The invention involves the horizontal processing of webs in processing containers. The web is redirected into the processing container by inserting a cassette across the web and into the processing container. The cassette includes at least one functional fluid element that facilitates processing of the web. The web handling practices of the invention improve the quality of the processed web. The invention is preferably used in electrodeposition processes.

Abstract: A system for regulating the time and temperature of a development process is provided. The system includes one or more light sources, each light source directing light to one or more gratings being developed on a wafer. Light reflected from the gratings is collected by a measuring system, which processes the collected light. Light passing through the gratings may similarly be collected by the measuring system, which processes the collected light. The collected light is indicative of the progress of development of the respective portions of the wafer. The measuring system provides progress of development related data to a processor that determines the progress of development of the respective portions of the wafer. The system also includes a plurality of heating devices, each heating device corresponds to a respective portion of the developer and provides for the heating thereof. The processor selectively controls the heating devices so as to regulate temperature of the respective portions of the wafer.

Abstract: A monobath solution is coated onto undeveloped film to produce a developed image within the film. The coated film is scanned to produce an electronic representation of the developed image. The electronic representation can be output to a output device, such as a printer, memory storage device, data network, or the Internet. The monobath solution comprises a combination of a developing agent and some other processing function. For example, the monobath solution may comprise a combination of a developing agent and a fixing agent, bleaching agent, or stabilizing agent. The developed image generally comprises developed in-situ silver and at least one dye.

Abstract: Development fluid extends up to and contacts the underside of the transparent cover (18). The normal height of the fluid is shown by line (36). A leading edge (18A) of the coveris inclined upwardly and includes acut-out portion (38). As a result of surface tension, the meniscus of the chemical rises up into the cut-out portion (38). As the leading edge of the plate part is beneath the inclined leading edge (18A), the top surface of the plate comes into contact with the chemical at the region where the curved line formed by the surface tension of the chemical (40) extends into the cut-out portion to coat the plate in a straight line across the width of the machine.

Abstract: A digital film processing system and film processing solution cartridge are disclosed. The cartridge comprises a housing and a chamber for storing a film processing fluid. The processing solution may be contained within a flexible bladder within the chamber. The cartridge may also include an integral applicator for coating the processing solution onto undeveloped film. The cartridge is generally removeably attached to the film processing system, but may also be refillable.

Abstract: An apparatus is disclosed for coating a semiconductor wafer with polyimide so that excess polyimide is removed from the wafer edge, back side and coating process area and is conveniently drained. A developer, such as dilute TMAH, that mixes with the excess polyimide is injected into a chamber. The soluble mixture of TMAH and excess polymide may then be drained into a bulk drain, obviating the accumulation of excess polymide in the coater cup. The method is implemented through an assembly that includes a coater cup, spin chuck disposed within the coater cup, and a pair of nozzles intruding into the coater cup at a lower portion of the cup. A fist nozzle operates to inject developing fluid onto the back side of the wafer in the cup, and a second nozzle, positioned nearer the center of the cup and the spin chuck, operates to inject rinsing fluid.

Abstract: A photoresist developing nozzle, a photoresist developing apparatus and a photoresist developing method capable of effecting uniform development are provided even in the case of a large diameter wafer. A photoresist nozzle has a plurality of small chambers, developer supply flow passages for supplying developer to respective small chambers, and developer discharge sections for discharging developer supplied from the developer supply flow passages onto the wafer. The photoresist developing apparatus has the photoresist developing nozzle and the photoresist developing method uses the photoresist developing nozzle.

Abstract: Recovering the dye image on film in electronic film development following a latent holding stage obviates the problem common in prior art electronic film development of film image destruction. Recovery of the image is accomplished using a developing agent containing couplers to form a dye image. These dyes do not affect the infrared scans of the image. Upon complete development of the dye image, further dye formation is halted by the application of a coupler blocking agent, while silver development and electronic scanning may continue or halt. After halting dye formation, the film is stable for an arbitrary time in a latent stage and may be dried and stored. Following this latent stage, silver is removed from the film with a bleach-fix leaving a conventionally usable film image.

Abstract: A method of processing light sensitive material by the surface application of fresh processing solution to the surface of a moving belt by means of an applicator. The material to be processed is brought into moving contact with the moving belt, the resulting relative motion providing a high level of agitation and mixing of the processing solution.

Abstract: The method and apparatus supplies processing solution directly to the surface of a web of sensitized material by means of a movable applicator. The web and applicator are moved relative to each other to enable good mixing of the solution on the surface. The movable applicators can be moved in and out of contact with the material as required so that the process can be varied.

Abstract: An apparatus for processing a substrate comprising a substrate holding mechanism for holding the substrate substantially horizontally, a chemical solution discharge/suction mechanism having a chemical solution discharge/suction portion which has a chemical solution outlet for discharging a chemical solution onto the substrate and chemical solution inlets for sucking up the chemical solution present on the substrate, and a chemical solution supply/suction system for supplying the chemical solution to the chemical solution discharge/suction mechanism simultaneously with sucking the chemical solution by the chemical solution supply/suction mechanism.

Abstract: One embodiment is a system for the development of a film includes an infrared light source and a visible light source. The system also includes at least one sensor operable to collect a first set of optical data from light associated the infrared light source and a second set of optical data from light associated with the visible light source. The system further includes a processor in communication with the at least one sensor, the processor operable to determine an image on the film in response to the first and second sets of optical data.

Abstract: One aspect of the present invention relates to a method and an apparatus for rinsing a substrate during a development process to mitigate pattern collapse. The apparatus includes a bath chamber; a substrate holder disposed in the bath chamber for holding the substrate having a resist pattern formed thereon; a first nozzle for dispensing a first rinsing solution having a first density and first surface tension into the bath chamber; a second nozzle for dispensing a second rinsing solution having a second density and second surface tension, which is less than the first rinsing solution, into the bath chamber; a drain disposed in a bottom portion of the bath chamber; and a controlling system operatively coupled to the first nozzle, the second nozzle and the drain designed to regulate and coordinate the operation of the first nozzle, the second nozzle and the drain.

Abstract: One aspect of the invention is a digital dye color film processing system. In one embodiment, the digital dye color film processing system includes a developer station, a processing station, a scanning system, and a data processing system. The developer station applies a developer solution to a silver halide based film to produce metallic silver grains and at least one dye image within the film. The processing station then applies at least one processing solution to the film to convert the silver halide and/or metallic silver to a substantially transparent silver complex. The scanning system then scans the coated film and produces sensor data that is communicated to a data processing system that processes the sensor data to produce a digital image The digital image can then be output to an output device, such as a printer, display monitor, memory device, and the like.

Abstract: In electronic film development, a film is scanned, using light, multiple times during development. The light is reflected from an emulsion containing milky undeveloped silver halide embedded with developing grains. The undeveloped halide layer has a finite depth over which photons from a light source scatter backward. This depth is within the range of the coherency length of infrared sources commonly used in electronic film development, causing coherency speckle noise in the scanned image. A prescan made after the emulsion swells, but before the silver grains develop, normalizes subsequent scans, pixel by pixel, to cancel coherency speckle and other defects.

Abstract: The present invention is a method of supplying a developing solution to an entire face of a substrate to perform a developing treatment, including the steps of: moving a developing solution supply nozzle at a predetermined speed at least from one end to another end of the substrate while the developing solution is being supplied; measuring an amplitude of a wave on a solution face of the developing solution supplied on the substrate after the supply of the developing solution; and changing the predetermined speed of the developing solution supply nozzle based on a measured value. Accordingly, it is unnecessary to measure a line width or the like which is finally formed on the substrate before correction as in the conventional art, and thus the correction can be made earlier as compared with the conventional case, resulting in a reduced number of defective items and improved yield.

Abstract: There are disclosed a processing apparatus for a photosensitive material having a coating device of a processing liquid to a photosensitive material, which comprises using a slot die having a manifold and a slot at the inside of the die as a coating device, and a processing apparatus for a photosensitive material which comprises a photosensitive material transferring device, a photosensitive material detecting device, a slot die for coating a processing liquid to the photosensitive material and having a manifold and a slot at the inside of the die, and a device for supplying a predetermined amount of the processing liquid to the slot die, wherein a detection result at the detecting device of the photosensitive material is fed back to the supplying device of the processing liquid to control operation of the processing liquid supplying device.

Abstract: The present invention is a developing method for performing developing treatment for a substrate, having the steps of moving a developing solution supply nozzle from one end of the substrate to the other end along a horizontal direction and a predetermined direction above the rotating substrate, and supplying a developing solution to the substrate from the aforementioned developing solution supply nozzle during the movement, and when the developing solution supply nozzle moves from one end of the substrate to the other end, a rotational speed of the substrate is changed. According to the present invention, the amount of the developing solution supplied to the center area of the substrate is decreased, and thereby evenness of the developing solution within the substrate surface can be improved.

Abstract: One aspect of the invention is a system for digital dye color film processing. In one embodiment, a developer station applies a processing solution to film to initiate development of metallic silver grains and at least one dye image within the film. A scanning system illuminates the coated film with light having at least one frequency within the visible portion of the electromagnetic spectrum. The light interacts with the silver and at least one dye image within the film. The scanning station measures the light from the film and produces sensor data that is communicated to a data processing system. The data processing system processes the sensor data to produce a digital image. The digital image can then be output to an output device, such as a printer, monitor, memory device, and the like.

Abstract: A substrate processing method for forming a resist film on a wafer with a base film being formed, and performing an exposure processing and a developing processing for the resist film to thereby form a desired resist pattern, has a base reflected light analyzing step of radiating a light of the same wavelength as an exposure light radiated during the exposure processing to the base film and analyzing a reflected light, before forming the resist film, and a processing condition control step of controlling at least one of a resist film forming condition and an exposure processing condition, based on the analysis of the reflected light. The method makes it possible to control a line width of a resist pattern with high precision.

Abstract: Multiple widths of fluid may be extruded onto portions of material without requiring a complex reconfiguration of the system or replacing the extruding device. In at least one embodiment, various extrusion widths are provided by altering the angle at which materials are guided with respect to the extruding device along a lateral plane with the extruder. In one embodiment, the present invention provides for the manipulation of the position of the extruding device with respect to the material, or alternately, by manipulation of the position of the material with respect to the extruding device. Another embodiment provides a single extruder with multiple applicator heads of different sizes. An additional embodiment provides a single coater head with multiple applicator openings of different sizes. Yet another embodiment provides an extruding device capable of moving laterally over the material to achieve the proper angle of approach.

Abstract: A slot coater device is provided for applying a processing solution, such as developer, to film during film development. The slot coater includes a housing having an opening for dispensing the processing solution, a reservoir within the housing adapted to receive a predetermined amount of the processing solution, and a channel for delivering the processing solution from the reservoir to the opening.

Abstract: An apparatus and method are provided for developing photoresist patterns on electronic component substrates such as semiconductor wafers. The method and apparatus use a specially defined developer composition in sequence with a specially defined rinse composition to develop an exposed photoresist pattern and then to rinse the developed pattern. Both the developer composition and rinse composition contain an anionic surfactant and, when the solutions are used in sequence, have been found to provide a resist pattern which avoids pattern collapse even when small features such as line widths less than 150 nm with aspect ratios of greater than about 3 are formed. It is preferred to use a puddle developing and puddle rinsing process to develop and rinse the exposed wafer. Preferred anionic surfactants are ammonium perfluoroalkyl sulfonate and ammonium perfluoroalkyl carboxylate.

Abstract: When a developing process is performed, a mixture of developing solution and pure water is supplied while the ratio of developing solution and pure water is gradually increased from pure water to developing solution. Thus, a developing solution component and a resist component gradually react. Even if a resist component dissolves in the mixture of pure water and developing solution, the equality of the concentration of the developing solution can be maintained. Thus, the developing process can be suppressed from being unequally performed. When a rinsing process is performed, a mixture of developing solution and pure water is supplied while the ratio of developing solution against pure water is gradually decreased from developing solution to pure water. Consequently, the substitution from developing solution to pure water can be gradually performed. As a result, particles due to the solidification of unsolved resist can be prevented.

Abstract: A method and apparatus for developing an unprocessed photosensitive media and providing a visual receipt of the images developed. The apparatus includes a mechanism for moving a strip of photosensitive media along a processing path; a mechanism for applying a coating of a developing solution on the photosensitive media so as to develop any exposed image presented on the photosensitive media; a scanner for scanning the photosensitive media after the images have been developed so as to provide a digital record of the images; an order mechanism for allowing a consumer to place a photofinishing order; and a printing mechanism for printing a customer order receipt of the photofinishing order.

Abstract: A method of processing photographic material in which a fixed volume of processing solution is added to the surface of the material and spread repeatedly over the length of material. The processing solution is added to the material in at least two stages.

Abstract: A photographic material processing apparatus and method provides for a homogeneous application of processing solution which leads to homogeneous development. The apparatus utilizes a spreader member in the form of, for example, a spreader bar that applies a limited quantity of developer solution to photographic material such as imagewise exposed film. A pressure member in the form of, for example, a weighted roller or spring-loaded roller acts a squeegee roller and improves contact of the film with a support and/or a heating source. A roller arrangement which includes at least the spreader member and pressure member is configured to enable multiple contacts of the spreader member and pressure member with the photographic material to aid in the agitation of the applied developer solution. In a further embodiment, an additional member in the form of, for example, a mixer member can be utilized to further agitate the applied solution.

Abstract: A developing method comprising, a step of holding a substrate in substantially a horizontal position, the substrate coated with a photoresist film which has a pattern-exposed region where a predetermined circuit pattern is formed by light exposure, and a step of developing the photoresist film by starting to apply, at a time, a developing solution to the entire pattern-exposed region of the photoresist film.

Abstract: A photofinishing apparatus is designed such that full bleed durable prints are produced with a high productivity and low waste generation process. The photofinishing apparatus in this case includes a printer and a finisher or post-print treatment processor. The printer is designed to produce media segment with multiple images of various formats. This media segment is then transported to the post-print treatment processor. The post-print treatment processor includes a dryer station, a durability station, a two-axis cutting station, and a print sorting station. The dryer performs the function of drying the media segment. The durability station performs the function of applying and or fixing durability material on the media segments. The two-axis cutting station includes slitting and chopping stations that performs the required two-axis cutting that produces the full bleed prints.

Abstract: A device and method for delivering various substrates into a high-precision measuring instrument. The device comprises a magazine in which are configured several compartments in which substrate holders for different substrates can be deposited. Also provided is a loading station in which the substrate holders can be loaded with the substrate that matches the substrate holder. An automatic transfer device removes substrate holders from the magazine and introduces them into the loading station, or removes the substrate holders together with the introduced substrate from the loading station. The automatic transport device is configured as a robot arm at whose front end sits a fork.

Abstract: An apparatus can be used to process photographic silver halide materials in an “almost dry” format. This apparatus includes means for supplying the photographic material as well as photochemical delivery articles and means for providing the chemicals for photochemical reaction and image formation. The apparatus can also include heating means for speeding up the reaction, scanning means and solution applicators at various stations. The delivery articles can be laminated or other wise contacted with the imaged photographic materials on the silver halide emulsion side allowing photochemicals to diffuse into and out of the materials for the desired chemical reactions. Multiple delivery articles can be used in sequence to provide the desired sequence of photochemical reactions.

Abstract: An image forming device which, after exposing a silver halide photographic photosensitive material, subjects the silver halide photographic photosensitive material to at least developing and bleaching-fixing processings so as to form an image on the silver halide photographic photosensitive material. The silver halide photographic photosensitive material has, on a support, one or more photographic structural layers. At least one of the photographic structural layers contains at least one color developing agent and at least one dye forming coupler. The image forming device includes a processing solution applying device which applies a processing solution for developing onto only a surface of the silver halide photographic photosensitive material at which surface the one or more photographic structural layers are provided.

Abstract: An image forming processing in which a minimum necessary amount of a processing solution, including hydrogen peroxide, which is substantially devoid of developing agents, an alkaline processing solution, and/or a post-processing solution is applied by a processing solution applying mechanism and the like serving as a non-contacting applying mechanism. The solutions are applied only on a surface of a silver halide photographic photosensitive material, which surface is provided with a photographic structuring layer having a single layer containing a reducing agent. Accordingly, neither the processing solution nor the post-processing solution is wasted and the photosensitive material can be speedily dried.

Abstract: An apparatus for processing a photographic light sensitive material with a processing solution, comprises a jetting head provided so as to face the photographic light sensitive material with air space and having a plurality of orifices through which the processing solution is jetted toward the photographic light sensitive material; a supplying device to apply a pressure to the processing solution and to supply the pressed processing solution to the jetting head; a conduit provided between the supplying device and the jetting head so as to transmit the pressed processing solution from the supplying device to the jetting head; a valve provided on the conduit so as to open or close the conduit; and a controller to control a supplying amount of the processing solution by controlling a duty ratio of an opening time period to a closing time period of the valve per a unit time.

Abstract: A method and apparatus for developing a strip of photosensitive media having image exposure area having an undeveloped exposed portion thereon. The apparatus includes a transport mechanism for moving the photosensitive media along a processing path; and a mechanism positioned along the processing path for selectively applying a coating of the processing solution only on the undeveloped exposed portion of the strip of photosensitive media. The apparatus further includes sensors for determining the location of the undeveloped exposed portion of the image exposure area. A scanner may be provided for scanning the strip of photosensitive media so as to obtain a digital record of the images developed thereon.

Abstract: A wafer processing apparatus includes a common path, extending in a Y-axis direction, in which one wafer or a plurality of wafers are conveyed, a plurality of process units stacked on both sides of the common path to constitute multi-stage structures, a main handler moved in the common path in the Y-axis direction and rotated about a Z axis at an angle &thgr; to load/unload the wafer into/from the process units, an arm section arranged to move in the main handler in the Z-axis direction, a plurality of holding arms arranged in the arm section to constitute a multi-stage structure so as to respectively hold the wafers, each holding arm being advanced and retreated on an X-Y plane from the arm section, an optical sensor, arranged in the arm section, for detecting a holding state of the wafer in each of the plurality of holding arms, and a controller for controlling an operation of the main handler, an operation of the arm section, and operations of the plurality of holding arms on the basis of a detection resul