Abstract: A cross flow system for metalizing compact discs, capable of being interposed in-line in the production of the compact discs after premastering, mastering, electro-forming, and molding includes a vacuum chamber having diametrically opposed vacuum locks and multiple metalization sources in the form of magnetrons, with a preferred cross flow including the introduction of a disc to be metalized through one lock and the exit of the metalized disc through the diametrically opposite lock. The double vacuum lock diametrically opposed cross flow system eliminates the problems of throughput limitations, high rate deposition, substrate pitting, and software complexity due to indexing which makes prior systems both costly and inefficient. The system also permits processing of more than one substrate or compact disc title such that multiple titled compact discs can be processed simultaneously.

Abstract: The present invention relates to an apparatus for the safe filling and emptying of a pressurized vessel charged with flammable and/or aggressive gas. The apparatus features an upper flap combination, an intermediate lock vessel having a flushing apparatus, and a lower flap combination. The present invention also relates to a pressurized reactor which is charged with flammable and/or aggressive gas and is equipped with a filling lock apparatus and an emptying lock apparatus for the simultaneous preparation of tetrachlorosilane, trichlorosilane and hydrogen. In addition, the present invention relates to a special process for filling and emptying such a reactor.

Abstract: A vacuum treatment system has an outer housing which defines a substantially cylindrical inner wall around an axis. At least two openings are provided for treating or conveying-through a respective workpiece arranged along at least one great circle of the cylindrical inner wall. One treatment, conveying or lock chamber respectively, is connected with the at least two openings. An inner housing defines a cylindrical outer wall and, together with the substantially cylindrical inner wall, forms a substantially cylindrical ring gap. A workpiece carrier carousel is rotationally drivable about the axis in the ring gap. A feed device comprising driving devices is movable in a radially driven manner on the inner housing and is aligned with the at least two openings. The driving devices act into the ring gap, and each of the driving devices has a separate drive.

Abstract: A substrate transfer system is used in an in-line film deposition system. The substrate transfer system is provided with an auxiliary vacuum chamber and a main vacuum chamber. The auxiliary vacuum chamber has a plurality of first substrate cassettes. The main vacuum chamber is communicated with another vacuum chamber through which carriers are transferred along a transport path. The main vacuum chamber has two robots and a plurality of second substrate cassettes arranged in parallel on which the substrates is placed. The second substrate cassettes are arranged between the two robots. The substrates are disk-shaped substrates having center holes. The center holes are utilized as hook parts during a pickup operation. Thereby the method of mounting substrates in the holders of carriers etc. is improved without changing the operating speed of the robots. Therefore the amount of substrates transported per unit time is increased and the processing capacity of the substrate processing system is enhanced.

Abstract: A workpiece handling system with dual load locks, a transport chamber and a process chamber. Workpieces may be retrieved from one load lock for processing at vacuum pressure, while workpieces are unloaded from the other load lock at the pressure of the surrounding envirornment. The transport chamber has a transport robot with two arms. Processed workpieces and new workpieces may be exchanged by a simple under/over motion of the two robot arms. The transport robot rotates about a central shaft to align with the load locks or the process chamber. The robot may also be raised or lowered to align the arms with the desired location to which workpieces are deposited or from which workpieces are retrieved. The two load locks may be positioned one above the other such that a simple vertical motion of the robot can be used to select between the two load locks. The two load locks and transport robot allow almost continuous processing.

Abstract: A flexible, modular thin film deposition machine comprises a number of batch process stations which define a batch process path. At least one of the batch process stations is a thin film deposition station including a serial deposition chamber and an inter-chamber disk transfer mechanism. The disks move in batches along the process path, being individually processed only at the deposition station. Within the serial sputtering chambers of at least one deposition station there is at most partial environmental separation, whereas between different deposition stations the separation is complete. The resulting simplification of the transport mechanism provides for a high throughput rate while simultaneously minimizing contamination of individual thin film layers.

Abstract: A functional load lock apparatus having two or more load lock chambers mounted on a central chamber which can be mounted on a single opening in a vacuum chamber such as a substrate processing platform for making integrated circuits on silicon wafers. Each load lock chamber preferably has a semi-cylindrical valve which remains sealed when the load lock chamber is open to atmospheric pressure. A wafer cassette holder positioned within each load lock chamber can be loaded and unloaded while the semi-cylindrical valves seal the vacuum chamber from atmospheric pressure. The semi-cylindrical valve pivots to an open position when the load lock chamber is under vacuum and the entire wafer cassette moves from the load lock chamber to the central chamber.

Abstract: A load lock has a substrate carrier movable between one position and another position each position vertically separated from the other, to locate the carrier at vertically discrete positions to load substrates onto the carrier or remove substrates from the carrier. A ring seal is provided around the substrate carrier for opening and closing the load lock chamber to the vacuum transport apparatus by controllably vertically positioning it between an uppermost and a lowermost position within the load lock.

Abstract: A functional load lock apparatus having two or more load lock chambers mounted on a central chamber which can be mounted on a single opening in a vacuum chamber such as a substrate processing platform for making integrated circuits on silicon wafers. Each load lock chamber preferably has a semi-cylindrical valve which remains sealed when the load lock chamber is open to atmospheric pressure. A wafer cassette holder positioned within each load lock chamber can be loaded and unloaded while the semi-cylindcical valves seal the vacuum chamber from atmospheric pressure. The semi-cylindrical valve pivots to an open position when the load lock chamber is under vacuum and the entire wafer cassette moves from the load lock chamber to the central chamber.

Abstract: A processing unit for a substrate comprises a partition 6 provided between an atmospheric area S1 and an inert gas area S2. The partition 6 has an opening 22 to communicate the atmospheric area S1 and the inert gas area S2. A door 23 is provided at the opening 22 to open and close it. Carrier holding device 11 is provided for holding a carrier 2 of the substrate in such a manner that the carrier 2 comes in contact with the opening 22 on the side of the atmospheric area. Inert gas replacing device 56 is provided for replacing a gas in the carrier 2 with an inert gas by introducing the inert gas into the carrier 2 when the door 23 closes the opening 22 and the carrier 2 comes in contact with the opening 22 on the side of the atmospheric area by the carrier holding device 11. This processing unit can perform the process of the substrate without increasing the concentration of the oxygen in the inert gas area S2 by preventing leakage of the air from the atmospheric area S1 into the inert gas area S2.

Abstract: A flexible, modular thin film deposition machine comprises a number of batch process stations which define a batch process path. At least one of the batch process stations is a thin film deposition station including a serial deposition chamber and an inter-chamber disk transfer mechanism. The disks move in batches along the process path, being individually processed only at the deposition station. Within the serial sputtering chambers of at least one deposition station there is at most partial environmental separation, whereas between different deposition stations the separation is complete. The resulting simplification of the transport mechanism provides for a high throughput rate while simultaneously minimizing contamination of individual thin film layers.

Abstract: Transport of a workpiece into and out of high vacuum conditions is achieved using a vacuum handler having an ante-chamber which buffers a vacuum lock and other mechanically vulnerable components from high pressure differences. During loading of the workpiece, the ante-chamber is vented to atmospheric pressure while the vacuum lock door is sealed closed. The antechamber is then opened and receives the incoming workpiece from the exterior of the vacuum handler. The ante-chamber is then closed and evacuated to the pressure level of the vacuum lock, which is only opened once this pressure level is achieved. The vacuum lock receives the workpiece and is evacuated to the pressure of the main vacuum chamber of the vacuum handler and then opened thereto. An elevator assembly transports the workpiece into the vacuum chamber for processing. The process is reversed during unloading of the workpiece from the vacuum handler following processing completion.

Abstract: A functional load lock apparatus having two or more load lock chambers mounted on a central chamber which can be mounted on a single opening in a vacuum chamber such as a substrate processing platform for making integrated circuits on silicon wafers. Each load lock chamber preferably has a semi-cylindrical valve which remains sealed when the load lock chamber is open to atmospheric pressure. A wafer cassette holder positioned within each load lock chamber can be loaded and unloaded while the semi-cylindrical valves seal the vacuum chamber from atmospheric pressure. The semi-cylindrical valve pivots to an open position when the load lock chamber is under vacuum and the entire wafer cassette moves from the load lock chamber to the central chamber.

Abstract: A photo-chemical vapor deposition ("photo-CVD") apparatus has exchange apparatus of optical window and method of exchanging optical window therewith. There photo-CVD apparatus has exchange apparatus of optical window which can replace an optical window blurred by attachment of materials produced by dissociation of reaction gas or materials used for disposition in a reaction chamber of a photo-CVD apparatus during photo-CVD reaction with a clean optical window without exposing the inside of the reaction chamber to the air and to the method of exchanging optical window of the photo-CVD apparatus using the exchange apparatus of optical window.

Abstract: An ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The ion implantation system includes a high vacuum process chamber that mounts an ion source, a single workpiece translating stage, and a loadlock. The single workpiece handling assembly mounted within the process chamber both removes the workpiece from the loadlock and supports the workpiece during implantation by the ion beam generated by the ion source. The process chamber is in selective fluid communication with a loadlock assembly, which in turn is mechanically integrated with a workpiece loading or end station. Additionally, the workpiece handling assembly includes a translation stage or element for translating the workpiece in a linear scanning direction during implantation. This linear scanning direction extends along a path transverse or orthogonal to the horizontal longitudinal axis of the implantation system.

Abstract: A method of discharging particulate material from a first container to a lower positioned storage area being under a lower pressure than the first container. Particulate material is discharged via an upper tube section of a discharge tube communicating with the first container and permanently containing a column of the particulate material. The discharged material is directed into a pressurized stabilizer. The discharged material is directed via a lower tube section to a material feeder for forming columns of the particulate material in the upper and lower tube sections thereby reducing the pressure of the material to a predetermined normal pressure level at the input of the feeder. The material is fed to the storage area. The quantity of discharged material is controlled by the feeder.

Abstract: An assembly for recovering crystals from a slurry comprises a filtration unit including a rotatably mounted cylindrical filter, a slurry input for receiving slurry pressurized by a pump. The filtration unit has an outlet for discharging crystalline material separated from the slurry by the filtration unit. A first hopper connected to the filtration unit at the discharge outlet thereof is provided at a downstream side with a first valve unit which is in turn connected to a second hopper on a downstream side. A second valve unit is coupled to the second hopper at a downstream side thereof. Each of the valve units includes a rotatably mounted dome shaped valve member. The second hopper is provided with a vent extending to a gas storage tank. A conduit links the hoppers to one another for substantially equalizing pressure in the hoppers prior to an opening of the upstream valve during a discharge procedure.

Abstract: Vacuum coating apparatus (30) includes a coating chamber (32), and a load-lock chamber (34) connected to the coating chamber via a high vacuum valve (44). The coating chamber includes deposition-devices (123) and a cylindrical or drum shaped substrate-transporter (100) for transporting substrates (64) past the deposition-devices. Substrates are carried on substrate-carriers (66) which are configured to fit into transport-stations (102) around the periphery of the substrate-transporter. A magazine (61) holding a plurality of substrate-carriers is located in the load-lock chamber. An injector arrangement (120) is provided for ejecting a substrate-carrier from the magazine, transporting the substrate-carrier through the high vacuum valve, and inserting the substrate-carrier into a transport-station of the substrate-carrier.

Abstract: An apparatus for transferring objects from a first region to a second reg, the first and second regions having differing atmospheric environments. The apparatus includes a shell having an entrance and an exit, a conveyor belt running through the shell from the entrance to the exit, and a horizontally mounted "revolving door" with at least four vanes revolving about its axis. The inner surface of the shell and the top surface of the conveyor belt act as opposing walls of the "revolving door." The conveyor belt dips as it passes under but against the revolving vanes so as not to interfere with them but to engage at least two of the vanes and define thereby a moving chamber. Preferably, the conveyor belt has ridges or grooves on its surface that engage the edges of the vanes and act to rotate the vane assembly.

Abstract: A system for disposing of refuse-derived fuel ("RDF") and converting the refuse-derived fuel into a fuel gas is described. The system includes a positive pressure combustion chamber and a feed system for feeding the RDF into the combustion chamber at high speed. No compaction of the low density RDF is required. The feed system includes a feed conveyor, first and second air locks with a first conduit between the feed conveyor and the first air lock, and a second conduit between the first and second air locks. Both conduits are generally vertically oriented, but sloped at an angle that prevents bridging of the RDF.

Abstract: Disclosed is a method of manufacturing a printed circuit panel. The method is carried out without a cleanroom, but in a clean room environment. The first step is to place a thin, non-rigid panel in a suitable fixture, for example, for transfer and also for processing. The fixtured panel is then placed in an air tight transfer container, which has a substantially contaminant free atmosphere. The transfer container has a sealed door at one end. The transfer container is then brought into a seaiable, substantially airtight interlock with a process enclosure. This process enclosure also has a substantially contaminant free atmosphere, and a sealed door at one end. An airtight seal is formed between the transfer container and the process enclosure, and also between the surfaces of the two doors. This is to avoid introducing surface contaminants into the process enclosure and transfer container atmospheres. Next, the two doors are opened simultaneously.

Abstract: A fluid flow control for use with a process chamber. In the disclosed embodiment, the process chamber is for ion implantation of a workpiece such as a silicon wafer and the fluid flow control is to assure the flow rates are maintained at values which are efficient in evacuating and pressurizing the chamber do not dislodge particulate contaminants from the process chamber walls. In the disclosed design, wafers are inserted into the chamber by use of a loadlock which avoids the requirement that the process chamber be cyclicly pressurized and depressurized. A diffuser plate intercepts fluid flowing into and out of the process chamber.

Abstract: The present invention is a vacuum fill system for deaerating flowable materials for storage in a container. The vacuum fill system in general has a hollow, cylindrical container connected to a plurality of valves, slide gate valves and a vacuum pump in order to create a vacuum when filled with flowable materials that causes the flowable materials to deaerate and subsequently compact when atmospheric pressure is restored.

Abstract: A vacuum fill system for deaerating flowable materials includes a hollow, cylindrical container connected to a plurality of valves, slide gate valves and a vacuum pump for creating a vacuum when filled with flowable materials that causes the flowable materials to deaerate and subsequently compact when atmospheric pressure is restored.

Abstract: For transferring products from a contaminated enclosure (12) into a second enclosure (16) without contaminating the latter, it is proposed to engage on the contaminated enclosure a transportation container (20), in which is placed an empty transfer chamber (22). After removing the coupled doors (C,F,H) of the contaminated enclosure, the container and the transfer chamber, the products to be transferred are introduced into the latter, without the space surrounding the chamber within the container communicating with the enclosure. This is followed by the reclosing of the coupled doors (C,F,H) and the disconnection of the container (20), in order to transport it and engage it on the second enclosure (16). The coupled doors (B'C', F) of said second enclosure and the container (20) are then opened in order to introduce into said second enclosure the transfer chamber (22) containing the products.

Abstract: A device for transport of material between chambers at different pressures, comprises a feed chamber, a main chamber having an upper housing with an inlet and a lower housing with an outlet. The feed chamber is coupled to the main chamber at the inlet, and a first slide valve opens and closes the inlet. A second slide valve for opening land closing the outlet may be provided. At least one hollow gasket with an essentially closed wall, preferably an inflatable gasket, is provided between the upper housing and the first slide valve for sealing the inlet; and, at least one gasket with an essentially closed wall, preferably an inflatable gasket, may be provided between the lower housing and the second slide valve for sealing the outlet. Alternatively, a first flap valve for opening and closing the inlet is provided which is pivotally coupled to the upper housing at one side.

Abstract: Process for discharging solid particulate products present in a fluidized bed reactor in which the polymerization or copolymerization of alpha-olefins is carried out, in a system consisting of a vessel connected to the reactor by way of a pipe provided with a first valve and connected to a reservoir situated downstream by way of a pipe provided with a second valve, the said method being characterized in that:the two valves consist of continuously rotating plug, valves, these valves being moved in such a way that the two valves are not open at the same time, even partly, and the volume of the vessel comprises between 1/10 and 1/000, and preferably between 1/100 and 1/500 of the volume of fluidized solid contained in the reactor.

Abstract: A loading and unloading airlock apparatus for a vacuum treatment chamber which includes an airlock chamber, a transport mechanism inside the chamber to transport a substrate holder arranged to have substrates detachably mounted thereon, an exhaust port to evacuate the chamber to a vacuum, a gas inlet port to introduce a gas to bring the evacuated chamber back to atmospheric pressure, a rectifying plate provided in the chamber adjacent to and at a predetermined distance away from the substrate holder on that side of the substrate holder upon which the substrates are detachably mounted, and a gas introduction pipe having a gas ejection outlet in said chamber for introducing additional gas in a space defined by the predetermined distance to flow along the surfaces of the substrates and the substrate holder.

Abstract: The swipe transfer assembly is a mechanical assembly which is used in conjunction with glove boxes and other sealed containments. It is used to pass small samples into or out of glove boxes without an open breach of the containment, and includes a rotational cylinder inside a fixed cylinder, the inside cylinder being rotatable through an arc of approximately 240.degree. relative to the outer cylinder. An offset of 120.degree. from end to end allows only one port to be opened at a time. The assembly is made of stainless steel or aluminum and clear acrylic plastic to enable visual observation. The assembly allows transfer of swipes and smears from radiological and other specially controlled environments.

Abstract: A vacuum wafer transport and processing system and method includes a central vacuum chamber having wafer holding means disposed therein. A plurality of wafer transport arms are disposed between the central vacuum chamber and a plurality of wafer process chambers. The wafer transport arms transport wafers between the various process chambers and the central vacuum chamber so that multiple processing steps may be performed in a vacuum.

Abstract: A dust discharging apparatus suitable for use in a dust collector, which comprises series-connected upper and lower dust shoot chambers, each having a swingable discharging valve device to close and open its ceiling opening. In order to prevent dust coating on the seal members of the swingable valves and the wear of same, the swingable valve device uses a downstream-convergent throttle ring, a swingable concave pan-like valve and an upstream divergent bucket fixed to the concave plate. The upper chamber has an exhaust pipe to communicate with the dust hopper, and a suction pipe to permit the chamber to open to the surrounding atmosphere to prevent dust backflow when transferring the dust from the dust hopper to the upper chamber and then from the upper to lower chamber.

Abstract: The lock container is connected to a reactor, which serves to gasify or to combust solid fuels. The lock container serves to remove ash from the reactor. A pressure of at least 2 bars prevails in the reactor. The lock container is pressurized and pressure-relieved in alternation. The pressure relief line communicates with a filter element, which is permeable to gas and substantially impermeable to solids and is disposed within the lock container. When the lock container is filled to the usual level during a pressure relief, at least one half of the filter element is surrounded by ash. The filter element may be tubular.

Abstract: A vacuum device comprises a vacuum working chamber for performing a predetermined process to a material such as substrate and a vacuum prechamber for changing the material. Both the vacuum chambers are coupled by a coupling member so as to communicate the interiors of the respective chambers and the communcation is managed by valve means located for the coupling member. Both vacuum chambers may be constructed so as to be movable or pivotable horizontally with respect to each other. The coupling member may be constructed as an independent member which is inserted between both the vacuum chambers as occasion demands.

Abstract: A vacuum-tight wafer carrier. The wafers are supported at each side by a slightly sloping shelf, so that minimal contact (line contact) is made between the wafer surface and the surface of the shelf. This reduces generation of particulates by abrasion of the surface of the wafer. The door of the vacuum carrier contains elastic elements to press the wafers lightly against the back of the carrier box. Thus, when the door of the box is closed, the wafers are restrained from rattling around, which further reduces the internal generation of particulates.

Abstract: Chip gates are provided adjacent the lower end of an inlet chute to a presteaming vessel for a digester in a pulp production system. The chip gates are operated to maintain a level of chips within the inlet chute sufficient such that the chips preclude egress of noxious odorous gas from the presteaming vessel, while simulataneously the chips are discharged into the vessel.

Abstract: A rotatable substrate holder (6) which has a plurality of substrate pickups in a circular arrangement at equal distances apart is disposed in a vacuum chamber (1). A corresponding number of substrates are driven stepwise on a circular path from an air lock station (8, 9) through at least one coating station (10, 11) to the air lock station. To increase the throughput of substrates, the vacuum chamber (1) has two air lock stations (8, 9) and two coating stations (10, 11) one following the other.

Abstract: A material transfer system is provided having particular utility in cooperation with a liquid jet abrasive cutting system in which a continuous supply of abrasive, particulate material is required for abrasive cutting operations. Primary and secondary hoppers are provided for containing the abrasive particulate material, and the secondary hopper is suitably located at a position adjacent to the work station and remote from the primary hopper. The secondary hopper is provided with a first chamber and a second, lower chamber positioned beneath the first chamber.

Abstract: A novel method and machine are provided for processing workpieces at one or more work-stations under vacuum conditions. The machine comprises means for receiving at atmospheric pressure an object to be processed, an inlet lock that is connected to a vacuum manifold, at least one processing station that is at a pressure at least as low as 10.sup.-1 to 10.sup.-6 mm. Hg., means for conveying work-pieces to be processed into and through the input lock to said at least one processing station so that the pressure within the processing chamber is not adversely affected by introduction of workpieces thereto via the input lock, an output lock, and means for transferring workpieces from said at least one processing station into the output lock so that the pressure in said at least one processing station is not adversely affected by such transfer.

Abstract: A sluice type apparatus for discharging batches of material from a pressurized enclosure has a container with an upper inlet and a lower outlet each closable by a slide gate. Preferably, each slide gate has two slide gate members driven by respective piston cylinder devices so that one gate is closed while the other gate is open and vice versa. At least the slide gate members for opening and closing the inlet are withdrawn from their inlet closing position into a respective outwardly closed or sealed chamber for making it easier to keep the container pressurized. The seals between the chamber entrance slots and the respective slide gate member are not required to be precision seals because any material that may pass into these outwardly closed or sealed chambers is easily removed again.

Abstract: The apparatus comprises a distribution spout and a hopper which has two containers mounted thereabove provided with sealing valves and a metering member. In order to simplify the weighing system, the hopper is independent of the mouth of the furnace and is located inside a sealed chamber. The hopper is suspended by a device which enables it to be coupled to the container which is being emptied and to be uncoupled from the container which is being filled.

Abstract: A system for discharging and cooling hot ash from a coal combustion unit, such as a coal combustor or an associated filter, where the hot ash at a temperature in excess of 700.degree. C. and at superatmospheric pressure is charged to a jacketed, cooled screw conveyor and passed therethrough in contact with a countercurrent flow of a purge gas. The ash is cooled in the screw conveyor to a temperature of below 320.degree. C. and dischaged to a collection hopper, under pressure, while the purge gas and gases evolved from the hot ash are returned to the combustion unit.

Abstract: An automated installation for the rapid thermochemical treatment of parts, notably for the mechanical industry, characterized in that it includes: a transfer lock for the parts under a controlled atmosphere; a plurality of treatment modules of the parts, all said modules being connected to said transfer lock; a loading lock; an unloading lock, and a handling robot for the parts, disposed in said transfer lock in order to provide for the successive transfers of parts between the various modules.

Abstract: A carbon-in-ash monitor uses a fluidized bed furnace to burn any carbon in sampled boiler flue ash and evolve carbon dioxide therefrom. Fluidizing gas (air) is provided to the bed a measured flow rate and a batching arrangement feeds successive batches of ash of measured mass to the furnace at a measured frequency. A CO.sub.2 monitor measures the amount of CO.sub.2 evolved to determine the carbon content of the ash. Batches are provided using a vibratory table to transport ash from a point of supply to the table and a point of delivery of ash in a stream from the table. The vibratory table is horizontal and is driven so that the mode of vibration can be selected to reverse the direction of ash transport.

Abstract: This invention relates to a device comprising a sealing valve carried by a control arm inside a vessel and cooperating with a seat around an opening. The mechanism for operating the valve comprises a hollow rotary support housed about its axis of rotation X in a leaktight bearing on the wall of the vessel and connected to the other end of the control arm by means of a device permitting axial displacement of the valve in relation to its seat. In order to reduce the space required for the movements of the valve, the support of the valve operating mechanism is mounted in such a manner that its axis of rotation X forms an acute angle with the vertical axis of the opening of the vessel.

Abstract: The container communicates through an outlet, which is adapted to be closed with a lock chamber, which is adapted to be emptied and is provided with a pressure-relief valve. When it is desired to empty the lock chamber the volume which is available in the lock chamber for the gas is initially increased so that the pressure in the lock chamber is reduced. Thereafter the lock chamber is opened.

Abstract: A step-dwell transport apparatus and method for use in an in-line controlled environment processing system is disclosed. The transport apparatus employs a plurality of shuttles arranged in series along two parallel rails. Each shuttle carries one or more planar objects through a process chamber, which contains several in-line processing stations. One of the rails guides a queue of abutting shuttles through the process chamber, while the other rail serves as a return path for another queue of abutting shuttles. The shuttles move along each rail, with locomotion along the rail being provided by a pneumatic cylinder and linkage that periodically pushes forward the trailing shuttle in the queue. Transfer mechanisms are provided at each end of the apparatus to transfer individual shuttles from the end of one rail to the beginning of the other rail. Shuttles are supplied to and withdrawn from the process chamber one at a time through in-line air locks.

Abstract: A method of filling a container continually under superatmospheric pressure with flowable granular solids and removing the solids from the container utilizing entrance and discharge locks provided for liquid filling of the locks, gas-pressure equalization between the locks and liquid transfer from the entrance to the discharge lock. A liquid/solid separator is provided for the outflow from the discharge lock and the recovered liquid is stored.

Abstract: A chamber, in which an atmosphere comprising a toxic vapor is established, is pneumatically isolated from the ambient environment. The isolation technique permits objects to be sterilized to be conveyed into and removed from the chamber without leakage of vapor from the chamber or of air into the chamber.

Abstract: An apparatus and method utilize liquid pressurized lock hoppers to feed solids to a high pressure vessel. Solids are introduced to a first lock hopper, and gases are passed to the first lock hopper from a second lock hopper which has previously discharged solids. Liquid is supplied to the first lock hopper so as to attain a pressure equivalent to the pressure of the high pressure vessel. Solids are discharged from the first lock hopper to a high pressure vessel after pressurization.

Abstract: An evacuable wafer processing machine includes a load-lock station, a wafer transfer station separated from the load-lock station by means of a gate-valve and a wafer coating station. Wafers contained within an evacuated wafer box are loaded into the load-lock station. The load-lock station is then closed and evacuated. A pair of pneumatically-operated plungers operable within the load-lock station, pick-up and remove the covers from the wafer box. The gate-valve is opened and the box of wafers is transferred into the wafer transfer station. Within the wafer transfer station, a wafer transfer blade passes vertically through the wafer box to serially transfer the wafers between the transfer station and the wafer coating station. After all the wafers have been coated, the wafer box is transferred through the open gate-valve into the load-lock station, the gate-valve closed and the covers replaced on the wafer box.