Abstract: A method and device for treating a gas stream comprising at least one non-halogenated carbonaceous compound and optionally at least one halogenated organic compound. The gas stream, at 100.degree. C. to 650.degree. C. and in the presence of oxygen is contacted with a first catalyst in a first catalyst zone. The first catalyst comprises a first catalytic material deposited on a low acidity support material. In this zone, the non-halogenated compound is selectively reacted to form innocuous materials such as water and carbon monoxide. This can be followed by contacting the gas stream with a second catalyst in a second catalyst zone. The second catalyst comprises a second catalytic material deposited on a high acidity support material. In this zone, the halogenated organic compounds are reacted.

Abstract: A reactive membrane for removing impurities, such as water, oxygen and organic compounds, from a gas is provided. The reactive membrane includes a porous inorganic substrate having exposed surfaces and at least one carbon layer, which is modified to present active sites, deposited on the exposed surfaces. The active sites include metal species which are at least partially deoxygenated and are chemically bonded to the carbon layer. Methods of forming the reactive membrane and of removing impurities from a gas with the membrane are also provided.

Abstract: Solid residues formed as byproducts during the refining of sugars (e.g., beet sugar or cane sugar) are employed to sorb acidic gases such as oxides of sulfur or nitrogen. Calcines of the solid residues can also be used. Sorption of acidic gases from gaseous mixtures containing acidic gases is thus accomplished.

Abstract: A method and apparatus for cleaning a flue-gas stream containing hydrogen chloride and sulfur dioxide are disclosed. The flue gas is treated in a wet cleaner (5), thereafter injected with lime (9) and filtered through a filter (13). The method and apparatus are distinguished by the fact that a pan of the flue-gas is bypassed the wet cleaner (5) through a conduit (15), to join the remainder of the flue-gas stream before the filter (13). In this way, hydrogen chloride in the bypassed stream is reacted with injected lime to form calcium chloride, which promotes the sulfur-dioxide separation upon the injection of lime.

Abstract: A process for recovery of halocarbons from a gas mixture containing the halocarbon and acid gas components comprises the steps of contacting the gas mixture with a dry scrubber to remove the acid gas components from the gas mixture and yield a first effluent gas mixture containing the halocarbon. The first effluent gas mixture is contacted with an adsorbent which is selective for the halocarbon component of the first effluent gas mixture to adsorb the halocarbon component and yield a second effluent gas. The adsorbed halocarbon is recovered by desorbing same from the adsorbent. The process of contacting with adsorbent can be carried out in at least two adsorbent beds joined at inlet and outlet ends thereof to gas feed and gas discharge manifolds, respectively.

Abstract: The process for separating toxic organic substances from a dust-containing exhaust gas from a sintering process, particularly a process of sintering iron ore, includes bringing the entire exhaust gas from a sintering conveyor into contact with clays, layer silicate, and diatomaceous earth or mixtures thereof within a gas-solids suspension for a reaction time of from 0.5 to 10 seconds above the dew point at a temperature from 90.degree. to 180.degree. C. and at a velocity from 6 to 200 meters per second. The median particle diameter, d.sub.50, of the solid adsorption agent in the gas-solids suspension is from 5 to 100 micrometers and the mean suspension density of the gas-solids suspension is from 5 to 500 g solids per sm.sup.3 exhaust gas. The dust and other solids are subsequently jointly separated from the gas-solids suspension, and part of the separated solids is again contacted with the exhaust gas from the sintering conveyor. An apparatus for carrying out the process is also described.

Abstract: The invention is a method for reducing halide content of a synthesis gas stream by mixing a metal compound of potassium oxide, potassium hydroxide, potassium bicarbonate, potassium carbonate, sodium oxide, sodium hydroxide, sodium bicarbonate, or sodium carbonate, with a carbonaceous feed material which contains halide-containing compounds; gasifying the carbonaceous feed material in an entrained flow gasifier under gasifying conditions thus producing a synthesis gas containing hydrogen and carbon monoxide; where the metal compound vaporizes and the vaporized metal compound reacts with the halide from the halide-containing compounds, thus producing a vaporized metal halide; cooling the vaporized metal halide, thus producing solid metal halide particles; passing the synthesis gas stream to a solids removal unit for removing the solid metal halide particles; and recovering the synthesis gas stream substantially free of halide-containing compounds.

Abstract: A method and apparatus for minimizing the environmental release of acids and toxic organic compounds from a waste incinerator-air pollution control train. The apparatus comprises an incinerator, a gas cooling means such as a waste heat boiler or quench chamber, a means for the partial removal of acid gases and dioxins by contact with either finely-divided alkaline solids or alternatively, by an alkaline solution in a spray drier-absorber, a dry solids collection means such as a fabric filter or electrostatic precipitator, a wet scrubber means for residual metal, dioxin/acid gas removal and an induced draft fan. In the method of this invention, the final wet scrubber stage operates without alkaline neutralization, but under scrubber acid concentrations and operating conditions that provide an exhaust gas within compliance limits of emission regulations. The contaminated liquor blowdown from the wet scrubber, which contains toxic organics and acids, is recycled back into the incinerator.

Abstract: A process and device for the treatment of fluid, such as flue gas. A moving bed reactor has several reaction chambers. The reaction chambers are located in parallel flow locations. A solid bulk material is located in the reaction chambers. The fluid flows through the reaction chambers in parallel, from bottom to top of each reaction chamber. As the fluid flows through the reaction chambers, the fluid interacts with the bulk material to alter the fluid. Specifically, the bulk material absorbs and/or acts as a catalyst to remove impurities from the fluid. Flow through each of the reaction chambers can be interrupted without interruption of flow through the other reaction chambers. Some of the bulk material in each reaction chamber can be removed, as a layer, from the bottom and a replacement amount can be added, as a layer to the top.

Abstract: There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gaseous halogenide such as chlorine, hydrogen chloride, dichlorosilane, silicon tetrachloride, phosphorus trichloride, chlorine trifluoride, boron trichloride, boron trifluoride, tungsten hexafluoride, silicon tetrafluoride, fluorine, hydrogen fluoride and hydrogen bromide into contact with a cleaning agent comprising zinc oxide, aluminum oxide and an alkali compound to remove the above halogenide. The above process is extremely effective for promptly and efficiently removing the above gaseous halogenide that is contained in the gas discharged from semiconductor manufacturing process.

Abstract: There is disclosed a process for purifying a halogen-containing gas (halogen gas such as chlorine, fluorine alone or diluted with an inert gas) which comprises bringing the halogen-containing gas into contact with a purifying agent comprising a hydroxide of an alkaline earth metal such as strontium hydroxide and an iron oxide such as triiron tetraoxide to efficiently remove hydrogen halogenides such as hydrogen chloride and hydrogen fluoride along with moisture that are contained as impurities in the halogen-containing gas. The above process enables the formation of a non-corrosive halogen-containing gas having an extremely high purity and capable of being favorably used as etching gas for silicon films, aluminum alloy films, etc. in a semiconductor manufacturing process.

Abstract: The present invention is directed to a process for preventing the formation of dioxin and/or furan during combustion of composite combustible materials in a combustion chamber. The process includes passing the generated combustion gas in a flow from the combustion chamber to a dedusting device, cooled and purified while maintaining the SO.sub.3 content in the combustion gas flow from about 7 to about 500 mg/m.sup.3 and at a temperature of from about 300 .degree. to about 800.degree. C., The process allows at least surface regions of particles of meal dusts contained in the combustion gas to be converted to sulfates and thereby prevent formation of dioxins and furan. The invention also includes a steam generator for carrying out the process whose steel structures coming into contact with the combustion gases are either alloyed or coated with tungsten and/or vanadium on the combustion-gas side.

Abstract: Toxic metal vapor phase compounds, and in particular, mercury and cadmium, are removed from waste incinerator combustion gases by contact with dry alkaline material and dry activated carbon followed by solids separation. The resulting gas is subjected to quench/wet scrubbing with recycle hydrochloric acid solution formed in situ by absorption of HCl from the gas. Blowdown liquid withdrawn from the recycle acid liquor, may be recycled to the incinerator or further treated by neutralization, precipitation, and filtration of the precipitated toxic metals.

Abstract: A method for decomposing volatile organic halogenated compounds in water containing such compounds and metal ions by removing the metal ions from the water and then contacting the deionized water with a reducing agent in the presence of a catalyst. The volatile organic halogenated compounds are efficiently decomposed with a small energy requirement and low cost to eliminate, thus, making the water safe.

Abstract: Scavenger compositions useful for purifying process gas streams, such as process gas streams, such as hydrogen, nitrogen, noble gases, diborane, and hydride gases from Groups IVA-VIA of the Periodic Table, such as arsine, phosphine, silane, germane, hydrogen selenide, and hydrogen telluride, and mixtures thereof, to remove water, oxygen, and other oxidant and Lewis acid impurities therefrom, such scavenger comprising a porous, high surface area inert support having thereon an active scavenging species, formed by the deposition on the support of a Group IA metal and pyrolysis thereof at a selected elevated temperature on said support.

Abstract: Environmental release of carcinogenic polychlorinated dibenzo-dioxins and polychlorinated dibenzo-furan compounds that typically result from combustion of materials containing chlorine or hydrochloric acid-generating components is minimized by preferential sorption of the precursor reactants on sorbents added to exhaust gas at high temperatures containing such precursors prior to conversion of the precursors to carcinogenic compounds normally occurring as the exhaust gas is cooled.

Abstract: The invention relates to a method for reducing the emission of organic products of incomplete combustion in the off-gases of incineration systems, wherein the off-gas containing the organic products is treated at a temperature from 150.degree. C. to 500.degree. C., under oxidative conditions, with a denox catalyst or a modified denox catalyst. A method is also provided wherein a denox catalyst may be utilized for removing organic products and nitrogen oxides from off-gases.

Abstract: A method for reducing gaseous emission of halogen compounds in a fluidized bed reactor in which the fine particles entrained in flue gases are used to form a temporary layer of particles on the baghouse filter to absorb halogen gases.

Abstract: A method of treatment of a liquid or gaseous fluid to decompose volatile organic halogenated compounds therein comprises bringing the fluid containing volatile organic halogenated compounds in contact with a reducing agent in the presence of a metal catalyst and optionally thereafter treating the thus treated fluid with at least one of an adsorption treatment, a thermal decomposition and a biological decomposition treatment. The method efficiently decomposes the volatile organic halogenated compounds contained in a fluid, such as water or a gas, with a small expenditure of energy and at low cost and renders the fluid harmless to the environment.

Abstract: A method treating effluent gases including exposing the gases to silicon or a silicon rich alloy or substances at an elevated temperature.

Abstract: Waste gases are purified by adding reagent and/or absorbent which reacts with pollutants in the gases to the gases, and then introducing the gases into a wetting reactor for activating the reagent or absorbent contained in the gases. The gases are introduced into a drying zone of the reactor and then passed upwardly into a wetting zone. The reagent or absorbent which has reacted partly or completely with the pollutants is separated from the gas by a filter in the upper section of the reactor and particles are intermittently detached from the filter and fall downwardly into an ash layer in the bottom of the reactor. The ash layer is capable of homogenizing wet particles and water droplets which fall downwardly from the wetting zone, and typically is at least about 25 cm thick. A mechanical mixer/grinder may be provided in the ash layer for mixing the particles and droplets and grinding lumps in the ash layer into particles.

Abstract: The present invention relates to a method of treating various chlorine-containing materials such as wastes, biological sludges and even metal concentrates in a circulating fluidized bed reactor (1) or a grate furnace at a high temperature of over 830.degree. C. and of cooling the resultant process gases for minimizing the amount of polyhalogenated aromatic compounds in the process gases. The process gases are cooled to a temperature below 250.degree. C. at a cooling velocity exceeding 1000.degree. C. per second. Cooling is preferably effected in a circulating fluidized bed reactor (2).

Abstract: A per-fluorocarbon containing gas is treated by contacting per-fluorocarbon contained within the gas with calcium hydride at a temperature in a range of between about 450 and 900.degree. C. The calcium hydride can be contained in a bed mixed with silicon or calcium oxide and such bed can be used in conjunction with a downstream bed of calcium oxide to remove any hydrogen fluoride produced. Also, an upstream bed of calcium fluoride can be used to treat acid gases in case of semiconductor processing applications of the present invention.

Abstract: Disclosed is a process for the degradation of highly toxic halogenated organic compounds, in particular polychlorinated dibenzodioxins (PCDD) and dibenzofurans (PCDF), contained in gases containing no SO.sub.2 by oxidation using preferably hydrogen peroxide. The SO.sub.2 -free gas is passed, in the presence of hydrogen peroxide, over a substantially inorganic solid contact catalyst, in particular pyrogenic or precipitated silica or aluminum silicate. A residual PCDD/PCDF content of below 0.1 ng TE/Nm.sup.3 may be achieved in the thus treated gas; the highly toxic compounds are oxidized on the solid contact catalyst.

Abstract: A process is disclosed for separating HF from organics by passing a mixture of HF and organics through a column or bed containing a polymer which sorbs the HF leaving an essentially pure organic stream. The HF may be recovered from the polymer, or the organics may be recovered with reduced HF concentration. The HF and organics may form an azeotropic or azeotrope-like mixture.

Abstract: A process, using regenerable adsorption materials, for purifying exhaust gases that have been contaminated with at least SO.sub.2, a heavy metal such as mercury and additional toxic gases such as dioxins and furans is disclosed. The process includes adsorbing the exhaust gases where the gas if freed of SO.sub.2, heavy metal and additional toxic gases, and optionally subjecting the gas from the adsorber to further treatment. The contaminated adsorber material is subjected to an oxygen-free regeneration process and the gas from the regeneration process is scrubbed and subsequently processed into pure sulfuric acid in a nitric oxide-sulphuric acid plant.

Abstract: A method is disclosed of improving the Hg removing capability of flue gas purification processes for coal-fired power plant flue gases using spray drying absorption systems. By adjusting the chloride content of the flue gas or the absorbent a permanent high Hg removal is achieved.

Abstract: Disclosed herein is a method for disposing of organohalogen compounds by oxidative decomposition to make them harmless, without secondarily forming carbon monoxide and halogen gas, said method comprising catalytically reacting waste gas at a temperature between 150.degree.-600.degree. C. with a catalyst containing as catalyst component A a composite oxide of two or more metals selected from the group consisting of Si, Ti, and Zr, and as catalyst component B an oxide of one or more metals selected from the group consisting of V, Mo, Sn, Ce, and W. According to a preferred embodiment, the catalyst may additionally contain as catalyst component C, in the form of simple substance or oxide, one or more metals selected from the group consisting of Cr, Mn, Fe, Cu, Ru, Rh, Pd, Pt, and Au.

Abstract: There is disclosed a process for cleaning a gas containing a nitrogen fluoride especially nitrogen trifluoride as the harmful component which comprises bringing the gas into contact with a cleaning agent comprising zirconium or a zirconium-based alloy such as Zr-Fe, Zr-Cu, Zr-Ni, Zr-Al, Zr-Mg, Zr-Ca, Zr-Zn, Zr-La and Zr-Ce to remove the harmful component at 100.degree. to 800.degree. C., especially 150.degree. to 500.degree. C. The process is capable of efficiently removing nitrogen fluoride, especially nitrogen trifluoride at a relatively low temperature without generating a harmful byproduct such as nitrogen oxide, and thus exhibits excellent effect on the cleaning of exhaust gas from semiconductor manufacturing process, etc.

Abstract: A gas treatment method and apparatus for use in connection with processes of etching semiconductor devices or of plasma enhanced chemical vapor deposition onto semiconductor materials. In accordance with the method and apparatus, the exhaust gases are introduced into first and second stages while heating the first and second stages. The stages can be contained within a heated cartridge. The first stage contains silicon or a silicon-rich alloy or a silicon-rich substance in a particulate form and a partial coating of copper or a copper rich substance in intimate contact with the silicon, the silicon-rich alloy or the silicon-rich substance. The second stage contains calcium oxide, a calcium oxide containing material, or a soda lime containing medium.

Abstract: In accordance with this invention, a waste gas containing toxic NF.sub.3 gas is contacted with a honeycomb structure of a carbonaceous material to thereby convert NF.sub.3 into nontoxic CF.sub.4 and N.sub.2 gases with high efficiency.

Abstract: A method of cooling hot flue or process gases containing halogenous compounds in two successively located circulating fluidized bed reactors. In the first reactor the gases are cooled to a temperature of >400.degree. C. In the second reactor the gases are rapidly cooled to below a temperature zone of 250.degree.-400.degree. C. In the first reactor the gases are brought into contact with a catalytic material capable of destroying polyhalogenous compounds. A retention time of 1-10 seconds, preferably 2-5 seconds, is provided for the gases in the first reactor.

Abstract: There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gaseous halogenide such as chlorine, hydrogen chloride, dichlorosilane, silicon tetrachloride, phosphorus trichloride, chlorine trifluoride, boron trichloride, boron trifluoride, tungsten hexafluoride, silicon tetrafluoride, fluorine, hydrogen fluoride and hydrogen bromide into contact with a cleaning agent comprising zinc oxide, aluminum oxide and an alkali compound to remove the above halogenide. The above process is extremely effective for promptly and efficiently removing the above gaseous halogenide that is contained in the gas discharged from semiconductor manufacturing process or leaked suddenly from a gas bomb in an emergency.

Abstract: By reaction of Cl and ClO radicals with alkaline cations, such as K.sub.2 O.sub.2, Na.sub.2 O.sub.2, CaO, CaO . MgO, Ca(OH).sub.2, CaCO.sub.3, (Ca Mg) (CO.sub.3).sub.3, Na.sub.2 CO.sub.3, NaHCO.sub.3 and NaHCO.sub.3 . Na.sub.2 CO.sub.3 . 2 H.sub.2 O, these radicals are either bound in ultraviolet radiation stable crystalline inorganic lattices or in high stability alkaline salt solutions. Since most of these salts are hygroscopic, they are able to pick up water vapor from the atmosphere, increase in size, and fall through the stratosphere and troposphere resulting in a faster removal rate than would otherwise occur.

Abstract: Process for adsorbing undesirable constituents from a waste gas by feeding the waste gas through at least one reaction chamber filled with lumpy or granular adsorbent, and through at least one adsorption layer. The adsorbent is introduced into the reaction chamber and discharged therefrom through several separate feed and discharge hoppers in a grid-like distribution. The waste gas is guided in part from the side transversely to the adsorption layer and in part vertically through the reaction chamber by introducing the waste gas between the separate feed hoppers from above to flow downward through an exposed upper surface of the adsorbent in such a manner that the adsorbent in all zones of the reaction chamber participates practically uniformly in the adsorption.

Abstract: Halogen-containing waste gases resulting from the dry etching step of the process of fabricating semiconductor devices are rendered harmless by removing the halogen compounds concomitant with said waste gases. Waste gases containing halogen compounds are treated by bringing them into contact first with activated carbon and then into contact with a member selected from the group consisting of an alkali agent and a ferric oxide, at a linear velocity of about 3-50 cm/min at ambient temperature, volume ratios of said activated carbon to the alkali agent or the ferric oxide in terms of a substantially dried base being about 2-4, and said alkali agent being selected from a group consisting of calcium hydroxide, calcium oxide, magnesium hydroxide and magnesium oxide.

Abstract: An HCl adsorbent, and method of making and using the adsorbent, the adsorbent comprising an activated alumina promoted with an alkali metal in an amount such that if calculated as alkali metal oxide, the adsorbent contains at least about 5% by weight alkali metal oxide.

Abstract: Impurities such as oxygen and moisture can be removed from sulfur hexafluoride by contacting the impure gas with the reaction product of sulfur hexafluoride and a lithium-substituted macroreticulate polymer.

Abstract: A stable processing of a waste gas containing halogen-containing materials is rendered possible without fear of increase of the pressure loss or clogging of a louver unit near the waste gas inlet in a second moving bed due to accumulation of the halogen components. This can be accomplished by a process for the desulfurization and denitrification of a waste gas containing halogen-containing materials in addition to SO.sub.x and NO.sub.

Abstract: A catalyst is disclosed for treating gas streams containing organic compounds such as halogenated organic compounds. The catalyst is comprised of vanadium oxide, zirconium oxide and at least one oxide of manganese, cerium or cobalt.Also disclosed is a process for treating gas streams using such catalysts.

Abstract: A method for removing detrimental organic chlorine compounds such as polychlorinated dibenzo-p-dioxins and polychlorinated dibenzofurans from a combustion waste gas, which comprises the steps of: bringing organic chlorine compounds contained in a combustion waste gas at a temperature within a range of from 150.degree. to 350.degree. C. into contact with a catalyst comprising at least one selected from the group consisting of platinum, palladium, ruthenium, manganese, copper, chromium and iron and oxides thereof, which catalyst is supported on the surface of a carrier containing at least titanium oxide, Aluminum oxide and silicon oxide, to cause a decomposition reaction of the organic chlorine compounds, thereby removing organic chlorine compounds from the combustion waste gas at a high efficiency.

Abstract: A process for purifying waste gases containing polyhalogenated compounds, in particular dioxins and furans, which waste gases accumulate, for example, in a garbage incinerator 1, are directed through a filter 3, which contains an adsorption agent, e.g., activated coke. The adsorption agent, loaded with harmful substances, in particular dioxins and furans, is transported under an inert gas to another processing operation or to storage. During this transportation step, the dioxins and furans are decomposed in heating zones 11 and cooling zones 12, with the preferred decomposition temperature being about 250.degree.-450.degree. C.

Abstract: A catalyst composition including component A and component B, the component A being a carrier, preferably having a honeycomb structure, and being a single-component oxide or a multi-component composite oxide of at least one metal of titanium, silicon and zirconium, and the component B being a catalyst component deposited on the carrier of component A and being at least one member selected from the group of noble metals and other specifically limited metals and their oxides, is very effective for decomposing and removing poisonous organic chlorine compounds, such as dioxin and the like, or poisonous organic chlorine compound-forming substances contained in an exhaust gas exhausted from an incinerator of an incineration plant provided with the incinerator and a dust collector. In addition, and the generation of the poisonous organic chlorine compound from the incineration plant can be prevented.

Abstract: The present invention provides a method for the decomposition of chlorofluorocarbons to hydrofluoric acid, hydrochloric acid and carbon dioxide by the chlorofluorocarbons' reaction with water at a temperature of 200 .degree. C. or higher and in the presence of a catalyst material consisting of a metal selected from the group consisting of Ti, Zr, Nb and an alloy consisting of at least two elements selected from the same group. The catalyst material may also be composed of an alloy consisting of up to 80 atomic % of at least one element selected from the group consisting of Ni and Co and the substantial balance of being at least one element selected from the group consisting of Ti, Zr and Nb. The metallic catalyst materials of the present invention have a very high catalytic activity for the decomposition of flons at relatively low temperatures and can retain their high activity during the decomposition process, even if they are converted into fluorides.

Abstract: A method and apparatus for minimizing the environmental release of acids and toxic organic compounds from a waste incinerator-air pollution control train. The apparatus comprises an incinerator, a gas cooling means such as a waste heat boiler or quench chamber, a means for the partial removal of acid gases and dioxins by contact with either finely-divided alkaline solids or alternatively, by an alkaline solution in a spray drier-absorber, a dry solids collection means such as a fabric filter or electrostatic precipitator, a wet scrubber means for residual metal, dioxin/acid gas removal and an induced draft fan. In the method of this invention, the final wet scrubber stage operates without alkaline neutralization, but under scrubber acid concentrations and operating conditions that provide an exhaust gas within compliance limits of emission regulations. The contaminated liquor blowdown from the wet scrubber, which contains toxic organics and acids, is recycled back into the incinerator.

Abstract: A treatment equipment of exhaust gas containing organic halogen compounds using a catalytic decomposition unit packed with decomposition catalyst for organic halogen compounds having strong acidic sites and a wash tower for removing hydrogen halide gas generated by the decomposition of the organic halogen compounds.

Abstract: A method of refining tungsten hexafluoride containing molybdenum hexafluoride as an impurity includes the step of contacting the tungsten hexafluoride with at least one metal selected from the group consisting of Mo, W, Cu, Ni, Fe, Co, Zn, Ti, Al, Ca and Mg at a temperature ranging from 100.degree. to 500.degree. C. Molybdenum hexafluoride is efficiently removed from the tungsten hexafluoride by the method.

Abstract: This invention relates to a process for the production of a usable or storable product with a low susceptibility to elutriation by water. This product is produced from residues containing halides obtained from a waste gas cleaning process. The halide containing residues as components of a crude dust having a CaO/SiO.sub.2 ratio between 1.7 and 3.4, are subjected to a thermal treatment to produce chlorosilicates. The waste gases formed during the thermal treatment for chlorosilicate production are subjected to a preliminary cleaning, and are then transported to the waste gas cleaning system of a refuse incineration plant. The residues occurring during the preliminary cleaning can be added to the crude dust.

Abstract: This invention relates to gas treatment apparatus and methods and particularly, but not exclusively, to such apparatus and methods for use with exhaust products from semi-conductor manufacturing process.A reactor column 10 has an inlet 11 at the bottom and an outlet 12. Between the inlet and outlet it is divided into three sequential stages containing: silicon or silicon containing materials; lime or soda lime and copper oxide or copper oxide reagents.

Abstract: A process for adding an amine having a pKa of between 5 and 8 to a petroleum refinery distillation unit for the purpose of neutralizing acidic species contained in the hydrocarbon feedstock. The use of these amines raises the dew point pH sufficiently to prevent corrosion of the metallic surfaces of the overhead equipment while reducing the potential for the precipitation of amine salts.