Abstract: Disclosed are a silicon-containing cerium composite oxide which is capable of maintaining a large specific surface area even used in a high temperature environment, and which has excellent heat resistance and reducibility, as well as a method for producing the composite oxide and a catalyst for exhaust gas purification employing the composite oxide. The composite oxide contains 2 to 20 mass % silicon in terms of SiO2, has properties of exhibiting a specific surface area of not less than 40 m2/g as measured by the BET method after calcination at 1000° C. for 5 hours, and a reducibility of not lower than 30% as calculated from measurement of temperature-programmed reduction from 50° C. to 900° C. after calcination at 1000° C. for 5 hours, and is suitable for a co-catalyst for a catalyst for exhaust gas purification.
Abstract: A method of synthesizing silica nanoparticles. The method includes hydrolyzing a silica precursor to form a plurality of monomers, each monomer of the plurality comprising a microwave reactive silicon species. The plurality of monomers is irradiated by an energy source configured to generate microwave frequency energy. Irradiation cases the plurality of monomers polymerize into a silica nanoparticle.
Type:
Application
Filed:
May 29, 2014
Publication date:
December 4, 2014
Applicant:
Government of the United States as Represented by the Secretary of the Air Force
Abstract: Catalysts are disclosed comprising fibrous substrates having silica-containing fibers with diameters generally from about 1 to about 50 microns, which act effectively as “micro cylinders.” Such catalysts can dramatically improve physical surface area, for example per unit length of a reactor or reaction zone. At least a portion of the silica, originally present in the silica-containing fibers of a fibrous material used to form the fibrous substrate, is converted to a zeolite (e.g., having a SiO2/Al2O3 ratio of at least about 150) that remains deposited on these fibers. The fibrous substrates possess important properties, for example in terms of acidity, which are useful in hydroprocessing (e.g., hydrotreating or hydrocracking) applications.
Abstract: Provided is a manufacturing method for a refractory filler, comprising melting a raw material batch and cooling the resultant melt to precipitate willemite as a main crystal phase.
Type:
Grant
Filed:
April 18, 2011
Date of Patent:
October 28, 2014
Assignee:
Nippon Electric Glass Co., Ltd.
Inventors:
Tomoko Enomoto, Hiroyuki Okamura, Nobutoshi Ito
Abstract: The present invention provides a pharmaceutical composition for dehydrating, atrophying and eliminating pathological tissues comprising inorganic polymeric ferric salt and/or inorganic polymeric ferric salt composite as its active ingredients, in which the inorganic polymeric ferric salt is polyferric sulfate, and the inorganic polymeric ferric salt composite is selected from a group consisting of poly-silicate ferric salts, polyphosphate ferric salts and their analogue. A surprising medical effect can be reached by treating pathological tissues with the pharmaceutical composition of the present invention which will make the treated pathological tissues dehydrated, atrophied, and absorbed or sloughed off.
Type:
Grant
Filed:
October 14, 2011
Date of Patent:
September 23, 2014
Inventors:
Kuok Leong Tam, Io cheng Tam, Hio man Tam
Abstract: Conductive material is combined with other substances to form a composite material for use as a conductive back face substrate for a thin silicon wafer solar cell. In at least one embodiment, a conductive composite substrate material is fabricated by filling granular conductive material with a mineral or ceramic or other small particulate with a low CTE; the composite is cast and fired so that it has an electrically conductive continuous phase and a discontinuous phase that will control and match the CTE of the substrate to be equal to or close to that of silicon, thereby diminishing the effects of bowing from CTE-mismatch.
Abstract: The paste composition for forming a back electrode of solar cell 10 provided by the present invention contains, as solids, an aluminum powder, a glass powder and a composite powder composed of a particulate composite of a metal oxide with a silicon-containing organic or inorganic compound. This composite powder is contained in an amount of at least 0.01 mass % but less than 0.45 mass % given 100 mass % as the total of the composite powder, the aluminum powder and the glass powder.
Abstract: A susceptor for supporting a crucible includes a body with an interior surface defining a cavity. A coating is disposed on the interior surface to provide a barrier for preventing contact between the body of the susceptor and the crucible disposed within the cavity.
Type:
Application
Filed:
December 26, 2013
Publication date:
July 3, 2014
Inventors:
Shailendra B. Rathod, Richard J. Phillips
Abstract: Granular crystalline silicotitanate (CST) is supplied from an adsorbent raw material supply apparatus into a caustic treatment apparatus. A sodium hydroxide solution of 1 Mol/L in a caustic agent supply apparatus is supplied into the caustic treatment apparatus with the granular CST supplied. After a predetermined quantity of the sodium hydroxide solution is supplied to the caustic treatment apparatus, the supply of the sodium hydroxide solution to the caustic treatment apparatus is stopped. The granular CST is left to stand for 0.5 hour in the state that it is immersed in the sodium hydroxide solution in the caustic treatment apparatus and is subjected to the caustic treatment. After that, the granular CST subjected to the caustic treatment is cleaned by cleaning water in a cleaning water supply apparatus. The respective adsorptive performances of cesium and strontium of the granular CST subjected to the caustic treatment are improved more.
Abstract: Provided is a method of forming a film of metal compound of first and second materials on an object to be processed, one of the first and second materials being metal, which includes: supplying a raw material gas containing the first material to the object such that the first material is adsorbed onto the object; supplying a raw material gas containing the second material to the object with the first material adsorbed thereon such that the second material is adsorbed onto the object with the first material adsorbed thereon; and supplying a third material different from the first and second materials onto the first and second materials adsorbed onto the object such that the first to third materials are chemically combined with one another.
Abstract: A silica having metal ions absorbed thereon and a fabricating method thereof are provided. The silica having metal ions absorbed thereon is a silica having metal ions absorbed thereon and being modified with persulfate salt. The method includes following steps. A solution is provided, and the solution includes silica and persulfate salt therein. The solution is heated to react the silica with the persulfate salt, so as to obtain silica modified with persulfate salt. Metal ion source is added in the solution, the metal ion source dissociates metal ions, and the silica modified with persulfate salt absorbs the metal ions to obtain the silica having metal ions absorbed thereon.
Abstract: The current disclosure relates to a silica-based particle containing at least approximately 5% silica by solid weight, at least approximately 15% alkali metal salt by solid weight; and at least approximately 15% water by total weight. Another embodiment of the disclosure relates to a detergent containing a silica/alkali metal salt particle and also containing at least a surfactant. Still another embodiment relates to a method of producing a silica/alkali metal salt particle. According to the method, one may combine a metal silicate and an amount of at least one acid source sufficient to form silica from the silicate and at least one alkali metal salt from the metal and acid, precipitate the silica to form precipitated silica, and, without washing the precipitated silica to remove the alkali metal salt, form a particle comprising the precipitated silica and at least approximately 15% alkali metal salt by solid weight.
Type:
Grant
Filed:
April 5, 2010
Date of Patent:
April 29, 2014
Assignee:
Paben Proyectos Estrategicos, S.A. de C.V.
Abstract: To improve the reliability of a power storage device. A granular active material including carbon is used, and a net-like structure is formed on part of a surface of the granular active material. In the net-like structure, a carbon atom included in the granular active material is bonded to a silicon atom or a metal atom through an oxygen atom. Formation of the net-like structure suppresses reductive decomposition of an electrolyte solution, leading to a reduction in irreversible capacity. A power storage device using the above active material has high cycle performance and high reliability.
Type:
Application
Filed:
September 20, 2013
Publication date:
April 10, 2014
Applicant:
Semiconductor Energy Laboratory Co., Ltd.
Abstract: The present disclosure relates to a protective layer composition that includes TixSiyA, where A is Cm, CmNl, OnCm, or OnCmNl and x, y, l, m, and n are positive integers. In one implementation, the protective layer composition has a ratio of x over (x+y) in the range of between about 0.1 and about 1.0. In another implementation, the protective layer composition has a ratio of x over (x+y) in the range of between about 0.3 and about 0.9. In yet another implementation, the protective layer composition has a ratio of x over (x+y) that is about 0.6. The protective layer composition may be amorphous. Also, the protective layer composition may include an atomic percentage of Ti that is less than about 20%. In one implementation of the protective layer composition, x is 2, y is 1, and A is C3.
Abstract: The object of this invention is to provide a high quality titanium target for sputtering capable of reducing the impurities that cause generation of particles and abnormal discharge, which is free from fractures and cracks during high power sputtering (high rate sputtering), and capable of stabilizing the sputtering properties and effectively suppressing the generation of particles upon deposition. This invention is able to solve foregoing problems using a high purity titanium target for sputtering containing, as additive components, 3 to 10 mass ppm of S and 0.5 to 3 mass ppm of Si, and in which the purity of the target excluding additive components and gas components is 99.995 mass percent or higher.
Abstract: Advanced environmental barrier coating bond coat systems with higher temperature capabilities and environmental resistance are disclosed. These bond coat systems can be applied to ceramic substrates such as SiC/SiC ceramic matrix composite substrates, and can provide protection from extreme temperature, mechanical loading and environmental conditions, such as in high temperature gas turbines. Example bond coat systems can include either an advanced silicon/silicide component, an oxide/silicate component, or a combination thereof.
Abstract: A method for preparing a composition including synthetic mineral particles, in which: a hydrogel that is a precursor of the synthetic mineral particles is prepared, and the hydrogel is subjected to a hydrothermal treatment, characterized in that at least one step of the hydrothermal treatment is carried out with the addition of at least one carboxylate salt to the treatment medium, the carboxylate salt having the formula R—COOM?, where M? denotes a metal selected from the group consisting of Na and K, and R is selected from H and the alkyl groups that include fewer than 10 carbon atoms.
Type:
Application
Filed:
December 22, 2011
Publication date:
December 26, 2013
Applicants:
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (C.N.R.S.), UNIVERSITE PAUL SABATIER TOULOUSE III
Inventors:
Christophe Le Roux, Francois Martin, Pierre Micoud, Angela Dumas
Abstract: Embodiments of the present disclosure include a process for regenerating a titanium silicalite catalyst by contacting the fouled titanium silicalite catalyst with a regeneration solution that includes at least one oxidizing agent.
Type:
Application
Filed:
February 3, 2012
Publication date:
November 21, 2013
Applicant:
Dow Global Technologies LLC
Inventors:
Hannah L. Crampton, Philip J. Carlberg, Cesar E. Meza
Abstract: A preparation method of zinc manganese silicate is provided. The method includes the following steps: step 1, preparing silicon dioxide sol with distilled water, anhydrous ethanol and tetraethyl orthosilicate; step 2, preparing a mixture solution of a zinc salt and a manganese salt; step 3, adjusting the silicon dioxide sol to be neutral or acidic; step 4, adding the mixture solution of the zinc salt and the manganese salt into the silicon dioxide sol to form a gelatin; step 5, drying the gelatin, keeping the temperature, grinding, reducing with keeping the temperature in a reductive atmosphere to obtain zinc manganese silicate. The preparation method has simple technique and low equipment requirement. The particles of the zinc manganese silicate phosphor prepared by the method have a regular size, uniform shape and good luminescent performance.
Type:
Grant
Filed:
April 27, 2010
Date of Patent:
October 22, 2013
Assignee:
Ocean's King Lighting Science & Technology Co., Ltd.
Abstract: The oxides for semiconductor layers of thin-film transistors according to the present invention include: In; Zn; and at least one element (X group element) selected from the group consisting of Al, Si, Ta, Ti, La, Mg and Nb. The present invention makes it possible to provide oxides for semiconductor layers of thin-film transistors, in which connection thin-film transistors with In—Zn—O oxide semiconductors not containing Ga have favorable switching characteristics and high stress resistance, and in particular, show a small variation of the threshold voltage before and after positive bias stress tests, thereby having high stability.
Abstract: According to example embodiments, a hybrid metal oxide having a network structure includes an oxygen atom that is covalently bonded to a first metal and a second metal. At least one of the first metal and the second metal has two or more oxidation states. A solar cell may have an interlayer including the hybrid metal oxide. According to example embodiments, a hybrid metal oxide may be formed using a sol-gel process from a solution including a first metal precursor and a second metal precursor.
Type:
Application
Filed:
April 5, 2013
Publication date:
October 10, 2013
Applicant:
SAMSUNG ELECTRONICS CO., LTD.
Inventors:
Younhee LIM, Yeong Suk CHOI, Soo Ghang IHN, Jong Hyeok PARK, Jung Kyu KIM
Abstract: An illumination device for a display device, which is formed from a substrate and a plurality of white light-emitting devices disposed on top of the substrate, and can be used as a backlight for a liquid crystal display panel, wherein the white light-emitting devices have a light source and a phosphor that is excited by the light source and emits light, and a fluorescent material with a composition represented by a general formula: M(0)aM(1)bM(2)x?(vm+n)M(3)(vm+n)?yOnNz?n is used as the phosphor.
Type:
Grant
Filed:
November 25, 2009
Date of Patent:
October 8, 2013
Assignees:
Showa Denko K.K., National Institute for Materials Science
Abstract: The present invention provides a method for preparing large particles of titanium-silicalite molecular sieves. The method of the present invention includes the steps of preparing a dispersion solution of a primary crystalline molecular sieve; forming an aggregated particle solution by adding a flocculating agent and a coagulating agent into the dispersion solution; mixing the aggregated particle solution with a synthesis gel to form a mixture; and heat-treating the mixture. The average diameter of the titanium-silicalite molecular sieves in the present invention is more than 5 ?m. In the preparation of cyclohexanone oxime using the molecular sieve of the present invention as the catalyst, the selectivity and conversion rate of cyclohexanone oxime are high, the usage of hydrogen peroxide is enhanced, and the catalyst is easy to be recovered.
Type:
Grant
Filed:
March 29, 2010
Date of Patent:
September 24, 2013
Assignee:
China Petrochemical Development Corporation
Abstract: This oxide for a semiconductor layer of a thin-film transistor contains Zn, Sn and In, and at least one type of element (X group element) selected from an X group comprising Si, Hf, Ga, Al, Ni, Ge, Ta, W and Nb. The present invention enables a thin-film transistor oxide that achieves high mobility and has excellent stress resistance (negligible threshold voltage shift before and after applying stress) to be provided.
Abstract: Catalysts are disclosed comprising fibrous substrates having silica-containing fibers with diameters generally from about 1 to about 50 microns, which act effectively as “micro cylinders.” Such catalysts can dramatically improve physical surface area, for example per unit length of a reactor or reaction zone. At least a portion of the silica, originally present in the silica-containing fibers of a fibrous material used to form the fibrous substrate, is converted to a zeolite (e.g., having a SiO2/Al2O3 ratio of at least about 150) that remains deposited on these fibers. The fibrous substrates possess important properties, for example in terms of acidity, which are useful in hydroprocessing (e.g., hydrotreating or hydrocracking) applications.
Abstract: A method is provided for treating silica sand scrubs (SSS) generated and accumulated as waste in the chloride manufacturing process of titanium dioxide pigment. A hydrothermal process is used to produce sodium silicate solutions of modulus 3.0 to 3.8, and precipitated silicas. In some embodiments, the process uses two specific principal reaction stages. A sodium silicate solution having a low SiO2:Na2O molar ratio, in the range from 2.0 to 2.8, is first produced by reaction of the SSS, as a cost-effective SiO2 source, with aqueous caustic soda. The conversion of this intermediate sodium silicate solution of low modulus to a high SiO2:Na2O molar ratio is made possible by using a SiO2 source that is prepared as precipitated amorphous silica from the intermediate sodium silicate solution produced above.
Type:
Grant
Filed:
October 16, 2012
Date of Patent:
August 20, 2013
Assignee:
The National Titanium Dioxide Co. Ltd. (CRISTAL)
Inventors:
Fadi Mohammed Saeed Trabzuni, Hassan Moenes El Dekki, Chathangat Cheroolil Gopalkrishnan
Abstract: The present invention provides an image forming method and an ink composition used in the method by which deterioration of a head plate which is formed of silicon is suppressed and more precise images are stably formed, where ink containing an inorganic silicate compound is ejected to form an image from an inkjet head having a nozzle plate where SiO2 film is provided on a surface thereof at a side toward the ink ejection direction of the nozzle.
Abstract: A nanoscale calcinated silicate film fabricated on a gold substrate for highly effective, matrix-free laser desorption ionization mass spectrometry (LDI-MS) analysis of biomolecules. The calcinated film is prepared by a layer-by-layer (LbL) deposition/calcination process wherein the thickness of the silicate layer and its surface properties are precisely controlled. The film exhibits outstanding efficiency in LDI-MS with extremely low background noise in the low-mass region, allowing for effective analysis of low mass weight samples and detection of large biomolecules including amino acids, peptides and proteins. Additional advantages for the calcinated film include ease of preparation and modification, high reproducibility, low cost and excellent reusability.
Type:
Application
Filed:
May 18, 2011
Publication date:
June 20, 2013
Applicant:
The Regents of the University of California
Inventors:
Quan Cheng, Jicheng Duan, Matthew James Linman
Abstract: Provided is a manufacturing method for a refractory filler, comprising melting a raw material batch and cooling the resultant melt to precipitate willemite as a main crystal phase.
Type:
Application
Filed:
April 18, 2011
Publication date:
May 23, 2013
Inventors:
Tomoko Enomoto, Hiroyuki Okamura, Nobutoshi Ito
Abstract: There is provided an oxide for semiconductor layers of thin-film transistors, which oxide can provide thin-film transistors with excellent switching characteristics and by which oxide favorable characteristics can stably be obtained even after the formation of passivation layers. The oxide to be used for semiconductor layers of thin-film transistors according to the present invention includes Zn, Sn, and Si.
Abstract: Disclosed herein are diatomite filter aid products with enhanced permeabilities and flow characteristics, and methods for enhancing the permeabilities and flow characteristics of very fine grain, low permeability diatomite ore by, in one embodiment, pre-agglomerating the ore in the presence of less than 10% water and then subjecting the pre-agglomerated ore to at least one calcination process. At least one flux may be used in the at least one calcination process. Also disclosed herein is a method of processing diatomite ore suitable for samples with high wet densities or large amounts of fine particulate matter. Also disclosed herein are methods of producing commercially applicable filter aid products from Hungarian diatomite.
Type:
Grant
Filed:
November 24, 2008
Date of Patent:
April 2, 2013
Assignee:
Imerys Filtration Minerals, Inc.
Inventors:
George Asante Nyamekye, Joseph Levay, John Roulston, John Menear
Abstract: A silica having metal ions absorbed thereon and a fabricating method thereof are provided. The silica having metal ions absorbed thereon is a silica having metal ions absorbed thereon and being modified with persulfate salt. The method includes following steps. A solution is provided, and the solution includes silica and persulfate salt therein. The solution is heated to react the silica with the persulfate salt, so as to obtain silica modified with persulfate salt. Metal ion source is added in the solution, the metal ion source dissociates metal ions, and the silica modified with persulfate salt absorbs the metal ions to obtain the silica having metal ions absorbed thereon.
Abstract: The present invention relates to a method of preparing a spherical mesoporous silica structure containing silver nanoparticles dispersed therein by adding a silver nitrate solution to an aqueous surfactant solution and performing a sol-gel process and to spherical mesoporous silica prepared thereby. The spherical mesoporous silica is cost-effective compared to a conventional method that uses silver nanoparticles as a raw material, because the silver nitrate solution that is inexpensive compared to silver nanoparticles is used. Also, the spherical mesoporous silica can be with high productivity in large amounts, and thus is easily commercialized. Moreover, because silver nanoparticles are incorporated into the pores of the mesoporous silica, the silver nanoparticles are used stably and do not change color and odor. In addition, the spherical mesoporous silica exhibits various additional effects, including far-infrared ray emission and deodorization, attributable to silica.
Abstract: A silica-containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzSaF.B. M comprises at least one metal or metalloid cation S is a sulfur-based species. F optionally exists and F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of about 0.01 to about 100%. The molar ratio of y/x is equal to about 0.01 to about 0.5, the molar ratio of x/z is equal to about 0.5 to about 300 or from about 0.5 to about 100, and the molar ratio of a/z is about 0.5 to about 5. B is a hygroscopic solid at a water to solid molar ratio of 0.1-6 and preferably comprises at least one alkaline earth oxide or lanthanide oxide.
Type:
Grant
Filed:
September 23, 2011
Date of Patent:
February 19, 2013
Assignee:
Nalco Company
Inventors:
Nicholas S. Ergang, Ian Saratovsky, Hung-Ting Chen
Abstract: Inorganic compositions include at least one inorganic compound of iron silicate as it is, or mixed with at least one binding compound able to increase the temperature of the composition when the composition is exposed to irradiation caused by an electromagnetic field or electromagnetic waves and are therefore usable for the production of susceptor materials.
Abstract: A preparation method of zinc manganese silicate is provided. The method includes the following steps: step 1, preparing silicon dioxide sol with distilled water, anhydrous ethanol and tetraethyl orthosilicate; step 2, preparing a mixture solution of a zinc salt and a manganese salt; step 3, adjusting the silicon dioxide sol to be neutral or acidic; step 4, adding the mixture solution of the zinc salt and the manganese salt into the silicon dioxide sol to form a gelatin; step 5, drying the gelatin, keeping the temperature, grinding, reducing with keeping the temperature in a reductive atmosphere to obtain zinc manganese silicate. The preparation method has simple technique and low equipment requirement. The particles of the zinc manganese silicate phosphor prepared by the method have a regular size, uniform shape and good luminescent performance.
Type:
Application
Filed:
April 27, 2010
Publication date:
January 31, 2013
Applicant:
OCEAN'S KING LIGHTING SCIENCE & TECHNOLOGY CO., LTD.
Abstract: A crystalline solid designated IZM-3 is described which has the X ray diffraction diagram given below. Said solid has a chemical composition expressed as the anhydrous base in terms of moles of oxides by the formula aSiO2: bYO2: cR: dF, in which Y represents at least one tetravalent element other than silicon, R represents at least one organic nitrogen-containing species, particularly 1,5-bis(methylpiperidinium)pentane, and F is fluorine, a, b, c and d respectively representing the number of moles of SiO2, YO2, R and F and a is in the range 0.1 to 1, b is in the range 0 to 0.9, c is in the range 0.01 to 0.5 and d is in the range 0 to 0.5.
Abstract: Disclosed is an oxide for a semiconductor layer of a thin film transistor, which, when used in a thin film transistor that includes an oxide semiconductor in the semiconductor layer, imparts good switching characteristics and stress resistance to the transistor. Specifically disclosed is an oxide for a semiconductor layer of a thin film transistor, which is used for a semiconductor layer of a thin film transistor and contains at least one element selected from the group consisting of In, Ga and Zn and at least one element selected from the group X consisting of Al, Si, Ni, Ge, Sn, Hf, Ta and W.
Abstract: The present invention relates to a method for producing inorganic oxide particles, comprising at least the following steps of: coagulating a dispersion obtained by carrying out the hydrolysis reaction and the polycodensation reaction of a metal alkoxide in the presence of a basic catalyst; filtering the dispersion to obtain particles; and drying the particles, wherein the step of coagulating the dispersion is carried out by adding a coagulant comprising at least one compound selected from the group consisting of carbon dioxide, ammonium carbonate, ammonium hydrogen carbonate and ammonium carbamate to the dispersion. The inorganic oxide particles obtained by the method of the present invention have high purity and are excellent in flowability.
Abstract: A visible light sensitive photocatalyst including a compound represented by Formula 1: Aa-xM1xSib-yM2yOc??Formula 1 wherein A is one or more metals selected from Ag, Cu, and Au; M1 is one or more metals selected from Li, Na, K, Rb, and Cs; M2 is one or more metals selected from Ge, Sn, Ti, Zr, and Hf, and 1.7?a?2.3, 0.7?b?1.3, 2.7?c?3.3, 0?x<a, and 0?y<b.
Type:
Application
Filed:
June 14, 2012
Publication date:
December 20, 2012
Applicant:
SAMSUNG ELECTRONICS CO., LTD.
Inventors:
Tae-gon KIM, Tae-hyung KIM, Seoung-jae IM
Abstract: A silica-containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzSaF. M comprises at least one metal or metalloid cation S is a sulfur-based species optionally exists and F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of about 0.01 to about 100%. The molar ratio of y/x is equal to about 0.01 to about 0.5, the molar ratio of x/z is equal to about 0.5 to about 300 or from about 0.5 to about 100, and the molar ratio of a/z is about 0.5 to about 5.
Type:
Grant
Filed:
September 23, 2011
Date of Patent:
December 18, 2012
Assignee:
Nalco Company
Inventors:
Nicholas S. Ergang, Bruce A. Keiser, Richard Mimna
Abstract: The present invention is directed to a method of making metal oxide and mixed metal oxide particles. The method includes treating a mixture formed from a metal source, such as metal alkoxide, a surfactant, and a first alcohol in an aqueous media at a very high metal oxide yield. The mixture is reacted using a catalyst to form metal oxide particles having a desired particle size in said mixture. By washing the particles with an aprotic solvent, the residual carbon content of the particles can be significantly reduced. The method is particularly suitable for forming silica particles. The metal oxide particles can then be heat treated to form synthetic fused metal oxides such as, for example, synthetic fused silica.
Abstract: The present invention is related to a method for isolating a target nucleic acid from a sample comprising said target nucleic acid, comprising the steps of mixing a sample containing said target nucleic acid with a binding solution and a nucleic acid binding matrix, binding at least part of said target nucleic acid to said nucleic acid binding matrix, wherein said nucleic acid binding matrix is treated simultaneously or has been previously treated with at least one compound comprising a metal substance selected from the group consisting of metals of the main groups 13 to 16, semimetals and transition metals for reducing non-target nucleic acid contaminations or wherein said nucleic acid binding matrix is modified with hydrophobic groups. Furthermore, respective kits and reagents are provided with the teaching of the present invention.
Type:
Application
Filed:
May 7, 2012
Publication date:
November 8, 2012
Applicant:
QIAGEN GMBH
Inventors:
Christoph RITT, Christoph ERBACHER, Patrick BAUMHOF
Abstract: The present invention relates to (i) a plant growth-improving agent containing a growth-improving component that increases a concentration of an oxoanion in an area around a plant, the oxoanion being heavier than a sulfate ion and containing four oxygen atoms, (ii) a seed to which such a plant growth-improving agent has been applied, and (iii) a plant growth-improving method including a cultivating step of growing a plant in the presence of such a growth-improving component.
Type:
Application
Filed:
January 26, 2011
Publication date:
November 8, 2012
Applicant:
Incorporated Administrative Agency National Agricu lture and Food Research Organization
Abstract: A method is provided for treating silica sand scrubs (SSS) generated and accumulated as waste in the chloride manufacturing process of titanium dioxide pigment. A hydrothermal process is used to produce sodium silicate solutions of modulus 3.0 to 3.8, and precipitated silicas. In some embodiments, the process uses two specific principal reaction stages. A sodium silicate solution having a low SiO2:Na2O molar ratio, in the range from 2.0 to 2.8, is first produced by reaction of the SSS, as a cost-effective SiO2 source, with aqueous caustic soda. The conversion of this intermediate sodium silicate solution of low modulus to a high SiO2:Na2O molar ratio is made possible by using a SiO2 source that is prepared as precipitated amorphous silica from the intermediate sodium silicate solution produced above.
Type:
Grant
Filed:
September 21, 2011
Date of Patent:
October 16, 2012
Assignee:
The National Titanium Dioxide Co. Ltd. (CRISTAL)
Inventors:
Fadi Mohammed Saeed Trabzuni, Hassan Moenes El Dekki, Chathangat Cheroolil Gopalkrishnan
Abstract: This invention relates to partially ordered and ordered oxynitride perovskites of the general formula ABO2N that are polar insulators. A comprises one or more cations or set of cations that sit in sites derived from the A-site in the perovskite structure. B comprises one or more cations or set of cations that sit in sites derived from the B-site in the perovskite structure. C comprises oxygen, O, with optionally some nitrogen, N, and D comprises N, with optionally some O. The total valence of the cations A+B is equal to the total valence of the anions 2 C+D. Also disclosed are methods of producing such oxynitride perovskites and uses of such oxynitride perovskites.
Abstract: A high-strength sputtering target for forming a protective film for an optical recording medium, obtained by sintering a mixed powder containing, in mol %, 10 to 70% of a zirconium oxide or hafnium oxide and 50% or less (over 0%) of silicon dioxide, and 0.1 to 8.4% of yttrium oxide as necessary, and the remainder containing aluminum oxide, lanthanum oxide, or indium oxide and inevitable impurities, wherein a complex oxide phase of Al6Si2O13, La2SiO5, or In2Si2O7 is formed in a base of the target.
Abstract: A method for producing a complex of metallic nanoparticles and inorganic clay and an organic promoter, wherein the organic promoter is ethanolamine, for example, monoethanolamine (MEA), diethanolamine (DEA) or triethanolamine (TEA). The metallic nanoparticles produced by this method can be stably and uniformly dispersed without adding other reducing agent or dispersant.
Abstract: The present invention is directed to a method of making metal oxide and mixed metal oxide particles. The method includes treating a mixture formed from a metal source, such as metal alkoxide, a surfactant, and a first alcohol in an aqueous media at a very high metal oxide yield. The mixture is reacted using a catalyst to form metal oxide particles having a desired particle size in said mixture. The method is particularly suitable for forming silica particles. The metal oxide particles can then be heat treated to form synthetic fused metal oxides such as, for example, synthetic fused silica.