Abstract: An atmospheric chemical vapor deposition process for laying down a magnesium oxide coating on a moving glass substrate through the reaction of an organic ester and an organomagnesium compound. The resulting article has a magnesium oxide coating which can be of substantial thickness because of the high deposition rates attainable with the novel process. Preferably, the coating deposition rates resulting from the method of the present invention may be greater than or equal to 15 ? per second.

Abstract: An article comprising a turbine component other than an airfoil having a metal substrate and a ceramic corrosion resistant coating overlaying the metal substrate. This coating has a thickness up to about 5 mils (127 microns) and comprises a ceramic metal oxide selected from the group consisting of zirconia, hafnia and mixtures thereof. This coating can be formed by a method comprising the following steps: (a) providing a turbine component other than an airfoil comprising the metal substrate; (b) providing a gel-forming solution comprising a ceramic metal oxide precursor; (c) heating the gel-forming solution to a first preselected temperature for a first preselected time to form a gel; (d) depositing the gel on the metal substrate; and (e) firing the gel at a second preselected temperature above the first preselected temperature to form the ceramic corrosion resistant coating comprising the ceramic metal oxide.

Abstract: Metal films are deposited with uniform thickness and excellent step coverage. Copper metal films were deposited on heated substrates by the reaction of alternating doses of copper(I) N,N?-diisopropylacetamidinate vapor and hydrogen gas. Cobalt metal films were deposited on heated substrates by the reaction of alternating doses of cobalt(II) bis(N,N?-diisopropylacetamidinate) vapor and hydrogen gas. Nitrides and oxides of these metals can be formed by replacing the hydrogen with ammonia or water vapor, respectively. The films have very uniform thickness and excellent step coverage in narrow holes. Suitable applications include electrical interconnects in microelectronics and magnetoresistant layers in magnetic information storage devices.

Abstract: A method is provided for applying a coating over a substrate surface of an engine component. The method includes inserting the engine component within a deposition chamber, heating the deposition chamber to a temperature between 325° C. and 500° C., supplying one or more precursors to the heated deposition chamber, subjecting the engine component to the one or more precursors for about five hours to form an inert oxide layer over the substrate surface of the engine component having a thickness of approximately 1-5 microns.

Abstract: The present invention provides for titanium oxide-based photocatalysts having a general formula of TiO2-X-?CXN? and self-cleaning materials that are prepared by substituting O of pure TiO2 with C and N. A preparation method comprising a process for forming thin films of TiO2-X-?CXN? by using gases such as Ar, N2, CO2, CO and O are used for reactive sputtering, and a process of heat treating at around 500° C., thereby crystallizing, is provided. The titanium oxide-based photocatalysts having a general formula of TiO2-X-?CXN? and self-cleaning materials according to the present invention have a smaller optical bandgap compared to pure titanium oxides, and therefore, the photocatalysts can be activated under the visible light range. In addition, they comprise only pure anatase crystallization phase, and since the crystallized particles are small in size, the efficiency and self-cleaning effect of the photocatalysts are very high.

Abstract: The invention relates to a transparent substrate based on glass or one or more polymers, or a ceramic or glass substrate, or a substrate made of architectural material of the type comprising a wall render, a concrete slab or block, architectural concrete, roof tile, material of cementitious composition, terracotta, slate, stone, metal surface or a fibrous substrate, based on glass of the mineral insulation wool type, or glass reinforcement yarns. This substrate is distinguished in that it is provided, on at least part of its surface, with a coating whose mesoporous structure exhibits photocatalytic properties and comprises at least partially crystallized titanium oxide. Process for manufacturing this substrate, its application in glazing, as architectural material or as mineral insulation wool is also described.

Abstract: A method for producing a ceramic thermal barrier coating on a component part for use in compressor and turbine components by a vapor depositing process is disclosed. The method includes: a) provision of a ceramic vapor for depositing on the component part; b) depositing of the ceramic vapor on the component part to form a thermal barrier coating having a columnar structure, the columns being oriented substantially perpendicular to a surface of the component part; and c) varying of at least one method parameter during method step b) in such a way that the resultant thermal barrier coating has columns of alternating decreasing and increasing diameters. A thermal barrier coating is also disclosed. The thermal barrier coating has a ceramic thermal barrier coating having a columnar structure and the columns are oriented substantially perpendicular to a surface of the corresponding part. The columns have alternately decreasing and increasing diameters.

Abstract: A method for forming a coated substrate is disclosed. The method includes depositing an undercoating layer on a substrate; and depositing a functional coating on the undercoating layer, the functional coating comprising at least one material that can be present in at least two crystal structures, wherein the at least two crystal structures are present at and exposed surface of the functional coating, wherein the undercoating layer comprises at least two different materials wherein a first material at the exposed surface provides a first surface area and a second different material at the exposed surface provides a second surface area.

Abstract: In the method, silver is protected against tarnishing using an Atomic Layer Deposition method. In the Atomic Layer Deposition method, a thin film coating is formed 5 on the surface of silver by depositing successive molecule layers of the coating material. For example aluminium oxide (Al 2O3) or zirconium oxide may be used as the coating material.

Abstract: A magnetic recording medium which is provided on a nonmagnetic substrate 1 with at least an orientation-controlling layer 3 for controlling the orientation of a layer formed directly thereon, a perpendicularly magnetic layer 4 having an easily magnetizing axis oriented mainly perpendicularly relative to the nonmagnetic substrate 1, and a protective layer 5 and characterized in that the perpendicularly magnetic layer 4 includes two or more magnetic layers, that at least one of the magnetic layers is a layer 4a having Co as a main component and containing Pt as well and containing an oxide and that at least another of the magnetic layers is a layer 4b having Co as a main component and containing Cr as well and containing no oxide.

Abstract: A vapor deposition process for depositing TiO2 and a vapor desposition process for depositing SiO2 are alternately repeated in a multi-layer film forming process. A refractive index that a thin film formed by each vapor depositing will provide is individually determined prior to each relative vapor depositing, and vapor deposition control data is prepared based on such a refractive index. Each vapor deposition is controlled by using a relative vapor deposition control data thus prepared. Therefore, each vapor deposition process can be accurately controlled according to the refractive index of a thin film even if repeated vapor deposition processes change the refractive index. Accordingly, a multilayer film having desired optical characteristics can be formed.

Abstract: A method of forming a laminate and a method of manufacturing a photovoltaic device using the laminate are provided. The laminate forming method includes a first step of forming an intermediate layer on a base member, and a second step of forming a metal layer on the intermediate layer, the adhesion of the metal layer to the base member being lower than that of the intermediate layer, the reflectance of the metal layer being higher than that of the intermediate layer. The rate of formation of the metal layer is increased at an intermediate stage in the second step. The laminate thereby formed has improved characteristics and is capable of maintaining improved reflection characteristics and adhesion even under high-temperature and high-humidity conditions or during long-term use.

Abstract: The invention relates to a tool, especially a cutting tool, comprising a substrate member onto which at least one layer is deposited by means of CVD, and a method for the chemical vapor deposition of a two-phase layer on a sintered part. According to the invention, the single deposited layer or at least one of the layers is provided with a TiCN phase, TiOCN phase, TiOC phase, or TiC phase and an additional phase consisting of ZrO2 and/or HfO2. CH3CN, C5H5N, or C6H6 is used in the gas atmosphere for producing such a layer in addition to TiCl4, HfCl4, and/or ZrCl4 and CO2, the remainder being composed of H2 and/or Ar.

Abstract: A composite structure forming method comprises the steps of first pre-treating brittle material fine particles to impart an internal strain to the brittle material fine particles, secondly causing the brittle material fine particles in which the internal strain has been created to collide with a substrate surface at high speed or applying a mechanical impact force to the brittle material fine particles containing the internal strain therein provided on the substrate surface, to deform or fracture the brittle material fine particles, re-joining the fine particles through active new surfaces generated by the deformation or fracture, forming an anchor section made of polycrystalline brittle material of which part bites into the substrate surface at a boundary section between the new surfaces and the substrate, and further forming a structure made of polycrystalline brittle material on the anchor section.

Abstract: A metal alkoxide compound represented by the following general formula (1), wherein each of R1 to R8 is independently a hydrogen atom or a methyl group; M is a titanium, a zirconium or a hafnium atom.

Abstract: Embodiments of the present invention relate to coating deposition and coatings for dental and orthopedic devices that provide prevention or reduction of ion leakage and, in some situations, improved aesthetic appearances.

Abstract: The invention provides a method of fabricating a buffer layer on a substrate. In particular, the method, according the invention, fabricates a ZnO layer serving as the buffer layer on the substrate, such as a sapphire substrate, a Si substrate, a SiC substrate, or a glass substrate.

Abstract: It is an object of the present invention to provide an oxygen reduction electrode having excellent oxygen reduction catalysis ability. In a method of manufacturing a manganese oxide nanostructure having excellent oxygen reduction catalysis ability and composed of secondary particles which are aggregations of primary particles of manganese oxide, a target plate made of manganese oxide is irradiated with laser light to desorb the component substance of the target plate, and the desorbed substance is deposited on a substrate facing substantially parallel to the aforementioned target plate.

Abstract: The object of the present invention is to provide a rare-earth magnet having a sufficient corrosion resistance, and a method of manufacturing the same. The rare-earth element in accordance with a preferred embodiment comprises a magnet body containing a rare-earth element, and a protective layer formed on a surface of the magnet body. The protective layer in accordance with a preferred embodiment includes a first layer covering the magnet body and containing a rare-earth element, and a second layer covering the first layer and containing substantially no rare-earth element. Another protective layer in accordance with a preferred embodiment comprises an inner protective layer and an outer protective layer successively from the magnet body side. The outer protective layer is any of an oxide layer, a resin layer, a metal salt layer, and a layer containing an organic-inorganic hybrid compound.

Abstract: A method is provided for applying a coating over a substrate surface of an engine component. The method includes inserting the engine component within a deposition chamber, heating the deposition chamber to a temperature between 325° C. and 500° C., supplying one or more precursors to the heated deposition chamber, subjecting the engine component to the one or more precursors for about five hours to form an inert oxide layer over the substrate surface of the engine component having a thickness of approximately 1-5 microns.

Abstract: A micro-optical element is produced through vapor deposition techniques, such as atomic layer deposition. An optical structure having a surface with uneven structures is exposed to one or more precursor vapors to create a self-limiting film growth on the surface of the optical structure. The film thickness may be increased and controlled by subsequent exposures. The resulting film conforms to surface structures having varying complex dimensions.

Abstract: The present invention provides a method of forming a thin film containing a metal oxide as the main component, the film thickness of which is relatively uniform, at a high film deposition rate over a wide area and over a long time. The present invention is a method for forming a thin film containing a metal oxide as the main component on a substrate using a mixed gas stream containing a metal chloride, an oxidizing material, and hydrogen chloride, by a thermal decomposition method at a film deposition rate of 4500 nm/min. or greater, performing at least one selected from: 1) prior to mixing the metal chloride and the oxidizing material in the mixed gas stream, contacting hydrogen chloride with at least one selected from the metal chloride and the oxidizing material, and 2) forming a buffer layer in advance on a surface of the substrate on which the thin film containing a metal oxide as the main component is to be formed.

Abstract: A corrosion resistant component of semiconductor processing equipment such as a plasma chamber comprises zirconia toughened ceramic material as an outermost surface of the component. The component can be made entirely of the ceramic material or the ceramic material can be provided as a coating on a substrate such as aluminum or aluminum alloy, stainless steel, or refractory metal. The zirconia toughened ceramic can be tetragonal zirconia polycrystalline (TZP) material, partially-stabilized zirconia (PSZ), or a zirconia dispersion toughened ceramic (ZTC) such as zirconia-toughened alumina (tetragonal zirconia particles dispersed in Al2O3). In the case of a ceramic zirconia toughened coating, one or more intermediate layers may be provided between the component and the ceramic coating. To promote adhesion of the ceramic coating, the component surface or the intermediate layer surface may be subjected to a surface roughening treatment prior to depositing the ceramic coating.

Abstract: A bismuth yttrium titanate (BYT) film having the composition of formula (I) has enhanced residual polarization and electric fatigue properties with excellent ferroelectric property, and therefore, it can be advantageously used in an electric or electronic device including a FRAM device: Bi4-xYxTi3O12??(I) wherein x is an integer of 0.1 to 2.

Abstract: A catalyst material for carbon nanotube synthesis includes a uniform dispersion of host particles on a substrate. The host particles themselves include catalyst nanoparticles that are effective to catalyze nanotube syntheses reactions and provide nucleation sites. Methods for preparing catalyst materials include co-sputtering a catalytic species and a host species to form a precursor thin film on a substrate, followed by an oxidation reaction of the precursor thin film in air. The precursor thin film can be patterned on the substrate to limit the locations of the catalyst material to well-defined areas. Methods for nanotube synthesis employ CVD in conjunction with the catalyst materials of the invention. During the synthesis, the catalyst nanoparticles catalyze carbon nanotubes to grown from a carbon-containing gas.

Abstract: A reactor vessel is provided with a solvent in a supercritical PVT state for use in depositing films on a deposition substrate. A metal organic precursor is dissolved in the supercritical solvent, as is a reaction agent. A chemical reaction deposits a film, such as a metal film on a semiconducting wafer, and reaction byproducts including a ligand ensue from the chemical reaction. Effluent from the reactor vessel is submitted to a precursor-forming agent that reacts with the ligand to rejuvenate the precursor. Alternatively, the precursor-forming agent can be used for point-of-use formation of the precursor with or without recycle of reaction byproducts.

Abstract: Metal ketoiminate or diiminate complexes, containing copper, silver, gold, cobalt, ruthenium, rhodium, platinum, palladium, nickel, osmium, or indium, and methods for making and using same are described herein. In certain embodiments, the metal complexes described herein may be used as precursors to deposit metal and metal-containing films on a substrate through, for example, atomic layer deposition or chemical vapor deposition conditions.

Abstract: A hafnium-containing material is presented for forming a film having excellent vaporization stability and higher film formation rate. Also a method for producing the film is presented. The hafnium-containing material for film formation has a bond of a hafnium atom with a nitrogen atom, or a bond of a hafnium atom and an oxygen atoms. Zr content contained in the material is equal to or less than 650 ppm.

Abstract: An embossable film for creating holograms and diffraction gratings and methods of producing the embossable films are provided. The embossable film includes a base layer and a co-extruded embossable layer that is coated with a transparent high refractive index (HRI) coating prior to embossing.

Abstract: A method of selectively depositing a ferroelectric thin film on an indium-containing substrate in a ferroelectric device includes preparing a silicon substrate; depositing an indium-containing thin film on the substrate; patterning the indium containing thin film; annealing the structure; selectively depositing a ferroelectric layer by MOCVD; annealing the structure; and completing the ferroelectric device.

Abstract: The present invention relates to intensely colored red effect pigments comprising iron oxide-coated SiO2 flakes, where the total thickness of the effect pigments is not greater than 500 nm (+/?30 nm). The present invention likewise relates to processes for the preparation of these pigments in which SiO2 flakes are coated with iron oxide, where the thicknesses of the SiO2 flakes and of the iron-oxide layers are selected in such a way that the total thickness of the red effect pigments is not greater than 500 nm (+/?30 nm), and to the use of these pigments in cosmetics, paints, coatings, plastics, films, in security printing, in security features in documents and identity papers, for coloring seed, for coloring foods or in medicament coatings and for the preparation of pigment compositions and dry preparations.

Abstract: Polycrystals with a MgO purity of at least 99.0%, a relative density of at least 90.0%, a sulfur S content of 0.01 to 50 ppm, a chlorine Cl content of 0.01 to 50 ppm, a nitrogen N content of 0.01 to 200 ppm, and a phosphorus P content of 0.01 to 30 ppm. Even when vapor deposition is conducted using electron beam deposition, almost no splash occurs, and the film characteristics of the product MgO film can also be improved.

Abstract: A process for the production of durable photocatalytically active self-cleaning coating on glass by contacting a hot glass surface with a fluid mixture of titanium chloride, a source of oxygen and a tin precursor. The coating preferably comprises less than 10 atom % tin in the bulk of the coating and preferably there is a greater atomic percent tin in the surface of the coating than there is in the bulk of the coating. Preferably, the coating is durable to abrasion and humidity cycling.

Abstract: Chelate complexes of calcium, strontium and barium formed with ligands that are beta-ketiminate compounds having a scorpion tail; intermediate compounds useful in producing the aforementioned complexes; a method for producing such complexes, and the use of such complexes for depositing layers containing calcium, barium or strontium.

Abstract: This invention provides methods of retentate chromatography for resolving analytes in a sample. The methods involve adsorbing the analytes to a substrate under a plurality of different selectivity conditions, and detecting the analytes retained on the substrate by desorption spectrometry. The methods are useful in biology and medicine, including clinical diagnostics and drug discovery.

Abstract: A method employing rapid vapor deposition (RVD) deposits a dielectric material on small features of a substrate surface. The resulting dielectric film is thicker, faster growing, shows better gap fill performance and has improved film properties compared to films resulting from silicon precursors with identical alkoxy substituents on silicon. The method includes the following two principal operations: exposing a substrate surface to a metal-containing precursor gas to form a substantially saturated layer of metal-containing precursor on the substrate surface; and exposing the substrate surface to a mixed alkoxy-substituted silicon-containing precursor gas to form the dielectric film.

Abstract: A thermal barrier coating, or TBC, and method for forming the TBC. The TBC is formed of a thermal-insulating material that contains yttria-stabilized zirconia (YSZ) alloyed with at least a third oxide. The TBC is formed to also contain elemental carbon, and may potentially contain carbides and/or a carbon-containing gas that forms from the thermal decomposition of carbon. The TBC is characterized by lower density and thermal conductivity, high temperature stability and improved mechanical properties. To exhibit the desired effect, the third oxide is more particularly one that increases the lattice strain energy of the TBC microstructure as a result of having an ion size that is sufficiently different than a zirconium ion.

Abstract: The present invention is related to methods and apparatus for processing weak ferroelectric films on semiconductor substrates, including relatively large substrates, e.g., with 300 millimeter diameter. A ferroelectric film of zinc oxide (ZnO) doped with lithium (Li) and/or magnesium (Mg) is deposited on a substrate in a plasma assisted chemical vapor deposition process such as an electron cyclotron resonance chemical vapor deposition (ECR CVD) process. Zinc is introduced to a chamber through a zinc precursor in a vaporizer. Microwave energy ionizes zinc and oxygen in the chamber to a plasma, which is directed to the substrate with a relatively strong field. Electrically biased control grids control a rate of deposition of the plasma. The control grids also provide Li and/or Mg dopants for the ZnO to create the ferroelectric film. A desired ferroelectric property of the ferroelectric film can be tailored by selecting an appropriate composition of the control grids.

Abstract: A method of manufacturing a glazing panel having a solar factor (FS) of less than 70% and being composed of a vitreous substrate and a tin/antimony oxide coating layer provided on the vitreous substrate and having a Sb/Sn molar ratio ranging from 0.01 to 0.5, preferable 0.03 to 0.5, the method including the steps of providing reactants in gaseous phase which comprise tin and antimony compounds, which are present in an amount effective to form the tin/antimony oxide coating layer; and forming the tin/antimony oxide coating layer pyrolytically on the vitreous substrate from the reactants in gaseous phase to provide the glazing panel having a solar factor (FS) of less than 70%.

Abstract: A chemical vapor deposition material comprising a ruthenium compound having a ligand represented by the following formula: wherein R1, R2 and R3 are each independently a hydrogen atom, fluorine atom, trifluoromethyl group or hydrocarbon group having 1 to 10 carbon atoms, and a method of forming a ruthenium film from the chemical vapor deposition material by chemical vapor deposition. A high-quality ruthenium film even when it is very thin can be obtained.

Abstract: A coating for silicon based materials such as those used in high temperature, aqueous environments. An aspect of the invention is directed to an article including a silicon based substrate, a bond coat comprising silicon, and a barrier coat. The barrier coat includes an aluminate such as an alkaline earth metal aluminate or a rare earth aluminate. The barrier coat may be an intermediate coat between the bond coat and a top coat, or it may be the top coat.

Abstract: A process for the production of a heat-treatable low emissivity coated glass that comprises the steps of depositing an underlayer onto a glass substrate and subsequently depositing a reflective metal layer by a vacuum deposition process, wherein the underlayer is deposited by a pyrolytic deposition process. Preferably an anti-reflection layer is deposited by a vacuum deposition process on to the coated glass after deposition of the reflective metal layer. The underlayer may comprise a silicon oxide, the reflective metal layer may comprise silver and the anti-reflection layer may comprise a metal oxide, especially tin oxide or zinc oxide. The coated glass preferably has an emissivity of below 0.2 after heat treatment in an oxidising atmosphere.

Abstract: A gas turbine component, such as a turbine disk or a turbine seal element, is protected by depositing an oxide coating on the gas turbine component. The deposition is performed by a vapor deposition process such as metal-organic chemical vapor deposition (MOCVD) to a coating thickness of from about 0.2 to about 50 micrometers, preferably from about 0.5 to about 3 micrometers. The deposited oxide may be an oxide of aluminum, silicon, tantalum, titanium, and chromium.

Abstract: An interface forming method includes forming a first layer containing a first chemical element and chemisorbing on the first layer an interface layer containing at least one monolayer of the first chemical element intermixed with a second chemical element different from the first chemical element. A second layer comprising the second chemical element can be formed on the interface layer. The first layer might not substantially contain the second chemical element, the second layer might not substantially contain the first chemical element, or both. An apparatus can include a first layer containing a first chemical element, an interface layer chemisorbed on the first layer, and a second layer containing a second element on the interface layer. The interface layer can contain at least one monolayer of the first chemical element intermixed with a second chemical element different from the first chemical element.

Abstract: A thermal barrier coating system having an improved life as a result of a preoxidation treatment applied to a single phase platinum aluminide bond coat. After coating the substrate to form a diffusion platinum aluminum bond coat, the surface finish of the bond coat was grit blasted with an inert grit of preselected size at a preselected pressure to achieve a predetermined surface finish. After the grit blasting, but before application of the ceramic top coat of yttria-stabilized zirconia (YSZ), the coating was preoxidized to form a thin alumina scale by heat treating the diffusion platinum aluminide bond coat at an elevated temperature at a preselected partial pressure of oxygen.

Abstract: Metal oxide films such as lithium niobate are formed in an amorphous state on a substrate such as lithium niobate and can be readily etched by conventional liquid or dry etchants. The amorphous film may then be converted by annealing to a crystalline form well suited to formation of electro-optical devices.

Abstract: A coating for a silicon based material such as those used in high temperature environments. An aspect of the invention is directed to an environmental barrier coating including a silicon bond coat, and intermediate coat, and a top coat. The intermediate coat may comprise tantalum aluminate, niobium aluminate, or a mixture of the two. The intermediate coat is resistant to solid-state suburface reactions with the bond coat and the top coat and is substantially inert to reactions with silica at high temperatures.

Abstract: A niobium doped tin oxide coating is applied onto a glass substrate to produce a low emissivity (low E) glass. The coating can optionally be doped with both niobium and other dopant(s), such as fluorine. The low emissivity glass has properties comparable or superior to conventional low E glass with fluorine doped tin oxide coatings.

Abstract: The invention provides a stubstrate for an electronic device including a conductive oxide layer which is formed by epitaxial growth with cubic crystal (100) orientation or pseudo-cubic crystal (100) orientation and which contains a metal oxide having a perovskite structure, a method for manufacturing a substrate for an electronic device, and an electronic device provided with such a substrate for an electronic device. A stubstrate for an electronic device includes a Si substrate, a buffer layer which is formed by epitaxial growth on the Si substrate and which contains a metal oxide having a NaCl structure, and a conductive oxide layer which is formed by epitaxial growth with cubic crystal (100) orientation or pseudo-cubic crystal (100) orientation on the buffer layer and which contains a metal oxide having a perovskite structure. The Si substrate is preferably a (100) substrate or a (110) substrate from which a natural oxidation film is not removed.

Abstract: A coating system and method for reducing the tendency for hydrocarbon fluids, such as fuels and oils, to form carbonaceous deposits that adhere to the walls of a containment article. Of particular concern are carbonaceous deposits that form at temperatures below about 650° F. (about 345° C.). The coating system combines an outermost layer of platinum with a ceramic barrier layer. The coating system has been shown to significantly reduce the formation of carbonaceous deposits at temperatures between about 220° F. and 650° F. (about 105° C. to about 345° C.), as well as reduce the adhesion of such deposits. The platinum outermost layer also serves as a radiation shield to reduce heat transfer from the containment article to the hydrocarbon fluid. The outermost layer is preferably deposited as an extremely thin film by chemical vapor deposition. The barrier layer is deposited to a thickness sufficient to prevent interdiffusion of the platinum outermost layer with the containment wall.