Pretreatment, Per Se, Or Post-treatment, Per Se (without Claimed Coating) Patents (Class 427/444)
  • Patent number: 6365025
    Abstract: A multiple station processing chamber used to deposit and/or remove a material on a semiconductor wafer is described. The multiple station processing chamber is comprised of two or more processing stations at which the wafer is exposed to a processing fluid. The processing stations are positioned within the chamber such that the wafer may be moved from station to station while remaining within the chamber. Each station of the multiple station processing chamber may have a fluid containment ring used for containment, disposal, and/or reuse of the electrolyte used to process the wafer at that particular processing station. The wafer is brought to the first processing station on a wafer support and exposed to a first processing fluid, which is then diverted into fluid containment ring for the first processing station. The wafer is then moved to a second processing chamber where the process is repeated with a second processing fluid.
    Type: Grant
    Filed: November 14, 2000
    Date of Patent: April 2, 2002
    Assignee: CuTek Research, Inc.
    Inventors: Chiu H. Ting, William H. Holtkamp
  • Patent number: 6361834
    Abstract: The present invention provides a resist film baking apparatus including a substrate placing block 2 which can be deformed, a baking plate 1 having an inner void 3, and a temperature regulator 4 connected to the baking plate 1 for circulating a temperature regulating liquid 7 in the inner void 3. This configuration enables to uniformly heat a substrate so as to obtain a resist film having a uniform thickness, which in turn enables to obtain an accurate element pattern.
    Type: Grant
    Filed: October 23, 2000
    Date of Patent: March 26, 2002
    Assignee: NEC Corporation
    Inventor: Masaki Shinohara
  • Patent number: 6358428
    Abstract: Method for removing a portion of the binder phase from the surface of a substrate that is composed of particles of at least a first phase joined together by the binder phase, and wherein the surface is etched by contacting it with a gas flow of an etchant gas and a second gas. The second gas is one or more gases that will not react with the substrate or the removed binder phase and will not alter the oxidation state of the substrate during etching.
    Type: Grant
    Filed: July 28, 2000
    Date of Patent: March 19, 2002
    Assignee: TDY Industries, Inc.
    Inventors: Roy V. Leverenz, John Bost
  • Patent number: 6346299
    Abstract: A movable trough is taught for establishing a uniform wetting line on the rear face of a curtain coating hopper lip. The trough can be pivoted or moved linearly into a position such that the hopper lip resides in or proximate to the movable trough. The curtain coating apparatus is then started and the coating solution leaving the hopper lip is intercepted by the trough. The coating solution flowing over the lip fills and floods the movable trough. The flooding of the trough forces the coating solution to substantially wet (to a height on the back side of the lip significantly higher than that of natural product flow) the back side of the hopper lip. The movable trough is then retracted from its position immediately beneath the hopper lip and intercepting the coating solution exiting the hopper lip to thereby allow the free-falling curtain to form and begin impingement on the moving support web to be coated.
    Type: Grant
    Filed: September 13, 2000
    Date of Patent: February 12, 2002
    Assignee: Eastman Kodak Company
    Inventors: David W. Gruszczynski, II, Kenneth J. Ruschak
  • Patent number: 6346326
    Abstract: An adherent, transparent moisture barrier is applied to alkaline earth sulfide phosphor particles by stirring in an anhydrous polar solvent including a fluorinating compound present in a concentration of no higher than 0.02 molar until a transparent fluorine-containing moisture-impervious coating has been applied to the particles. The polar solvent is removed and the coated particles dried. A second moisture barrier can also be applied to ensure long term resistance of the phosphors to degradation by moisture.
    Type: Grant
    Filed: March 10, 1999
    Date of Patent: February 12, 2002
    Assignee: Sarnoff Corporation
    Inventor: Perry Niel Yocom
  • Patent number: 6338877
    Abstract: A method for rapidly imparting hydrophobicity to an oxide solid surface, which comprises exerting a mechanical stimulation to a desired region of a hydrophilicity-imparted oxide solid surface, to change said region to be hydrophobic.
    Type: Grant
    Filed: March 7, 2000
    Date of Patent: January 15, 2002
    Assignee: National Institute for Research in Inorganic Materials
    Inventors: Masayuki Kamei, Takefumi Mitsuhashi
  • Patent number: 6335063
    Abstract: Very low glide height magneto-optical (LGMO) information storage and retrieval media of near field recording (NFR) and mahnetic super-resolution (MSR) types having improved tribological properties when used in ultra-high density storage/retrieval devices employing very small head flying heights on the order of less than about 2 microinches are formed in a front surface magneto-optical (FSMO) configuration utilizing a substrate having at least one deposition surface subjected to a two-step, synergistic treatment comprising tape burnishing/wiping and photolytic treatment in an ozone-containing atmosphere, followed by deposition thereon of the MO layer stack. Enhanced wear and abrasion resistance at very low flying head heights is provided by an ultra-thin, protective flash layer overcoat (FLO)/lubricant topcoat layer system on the media surface. Embodiments of the present invention include single- and dual-sided MO media.
    Type: Grant
    Filed: October 20, 1999
    Date of Patent: January 1, 2002
    Assignee: Seagate Technology LLC
    Inventors: Ga-Lane Chen, Simon Wing-Tat Fung
  • Patent number: 6329058
    Abstract: The present invention relates to metal oxide particles capable of being highly dispersed in organic materials to form transparent colloids and ceramers. The metal oxide particles of the present invention have surfaces attached to a dispersing aid and a degree of crystallinity of greater than 55 percent. The crystallite diameter of the metal oxide particles is greater than about 4 nanometers and less than about 20 nanometers. The present invention also relates to the colloids and ceramers prepared using these metal oxide particles and the methods associated with the preparation of the particles, colloids, and ceramers.
    Type: Grant
    Filed: May 27, 1999
    Date of Patent: December 11, 2001
    Assignee: 3M Innovative Properties Company
    Inventors: David S. Arney, Thomas E. Wood
  • Publication number: 20010041226
    Abstract: A method and a system for regenerating a metal bath contaminated by mixed crystals, particularly a tin bath (17) in a hot-dip coating process. A partial stream of the tin bath (17) is removed from the coating tank (15) and is first of all heated above its liquidus temperature in a heating unit (24). Subsequently, the tin bath is conducted over a cooling unit (27) and, while flowing through a filter (29), is cleaned of mixed crystals coming down as a result of the cooling. The filter 29 is a ceramic foam filter made of silicon carbide. Subsequently, the regenerated tin bath (17a) is heated in a melting tank to process temperature, and returned from there to the coating tank (15).
    Type: Application
    Filed: April 26, 2001
    Publication date: November 15, 2001
    Inventors: Klaus Elbern, Robert Leffers, Albert Rumbach
  • Patent number: 6309712
    Abstract: An apparatus for curing a photocurable coating provided on a fiber, includes an irradiator tube having an upstream end on which an injection assembly is provided, and a downstream end on which an exhaust assembly is provided. The injection assembly receives an inert gas flow. The injection assembly includes a diffuser that splits the inert gas flow into a counter flow and a tube flow. The counter flow is directed counter to the travel direction of the fiber, and the tube flow is directed in a laminar fashion through the irradiator tube. The exhaust assembly has a vent though which the tube flow is drawn, and an air opening provided between a downstream end of the irradiator tube and the exhaust vent.
    Type: Grant
    Filed: October 10, 2000
    Date of Patent: October 30, 2001
    Assignee: Alcatel
    Inventors: Olivier Schuepbach, Carlos Pedrido
  • Publication number: 20010025431
    Abstract: A controller controls the temperature of a hot plate and the degree of vacuum in a tightly closed space to a temperature and a pressure at levels at which a thinner contained in a resist applied to a wafer volatilizes and an acid generator, a quencher, and a polymer chain protecting group practically remain in the resist, for example, during heat processing. More specifically, the controller controls the temperature of the hot plate and the degree of vacuum in the tightly closed space to bring the temperature of the hot plate to about 40° C., and the degree of vacuum in the tightly closed space to approximately 5 Torr. Thereby, the heat processing can be performed for the wafer so that the acid generator is uniformly dispersed in the resist, or the quencher is uniformly formed on the front face of the resist without breakage of the polymer chain protecting group.
    Type: Application
    Filed: March 29, 2001
    Publication date: October 4, 2001
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takahiro Kitano, Yuji Matsuyama, Junichi Kitano
  • Patent number: 6296906
    Abstract: Dielectric films in integrated circuits are annealed in the presence of water to improve their thermal stability and their resistance to damage from ultraviolet radiation.
    Type: Grant
    Filed: September 30, 1999
    Date of Patent: October 2, 2001
    Assignee: Novellus Systems, Inc.
    Inventors: Jim Stimmell, Joe Laia, Ajay Saproo
  • Publication number: 20010019741
    Abstract: A method and apparatus for loading a substrate is applied to a semiconductor manufacturing apparatus in which a substrate is carried in a vacuum-processing chamber, and loaded on a heated processing table, and further is applied with predetermined processing in a cold-wall processing mode. In the method, for example, the substrate is temporarily stopped before being loaded on the processing table. By the temporal stop, the temperature difference between the substrate and the processing table becomes smaller. When the temperature difference becomes smaller, even if the substrate expands due to heat from the processing table, the degree of the change becomes smaller and therefore it is possible to reduce peeling of films deposited on the substrate-loading surface of the processing table.
    Type: Application
    Filed: March 5, 2001
    Publication date: September 6, 2001
    Applicant: ANELVA CORPORATION
    Inventors: Shinichi Inaba, Yosuke Ide
  • Patent number: 6248404
    Abstract: The present invention involves a method for altering preexisting patterns of ink on paper. Used, waste paper is treated such that words, images and pictures are altered to form substantially different and aesthetically pleasing patterns. A chemical activator is applied to waste paper, thereby causing the present ink to diffuse. Optionally, additional inks may be added and further diffused across the paper. Once the treated paper has dried, a new, unique pattern has formed. In this manner, previously unuseable paper becomes suitable for a variety of aesthetic purposes. The resulting paper product may be used for wrapping paper, contact paper, wallpaper or the like.
    Type: Grant
    Filed: August 24, 1999
    Date of Patent: June 19, 2001
    Inventor: Mary Virginia Greene-Mathis
  • Publication number: 20010003011
    Abstract: Decrease in sensitivity can be avoided to obtain a stable and highly sensitized photosensitive layer in a process for preparing a photopolymerizing lithographic plate including a coating step and using rubber rollers before and after the coating site. This is achieved by excluding an antioxidant and/or aging retardant from at least the surface of rubber rollers placed before and after the coating site. The photopolymerizing lithographic plate excellent in its sensitivity as compared with the conventional one can be obtained.
    Type: Application
    Filed: October 7, 1999
    Publication date: June 7, 2001
    Inventor: HIDEHITO SASAKI
  • Patent number: 6238794
    Abstract: A composition, containing carbon black pigment particles of a specific size and an inorganic binder, suitable for use as a color coating on inorganic substrates to provide a greater resistance to fade than conventional coating compositions. The particles have a mean particle size in the range of about 150 nm to about 500 nm and a surface area per weight of particles of about 20 m2/g or less. The composition is useful in producing coated inorganic granules for specific uses, such as roofing granules.
    Type: Grant
    Filed: February 10, 1999
    Date of Patent: May 29, 2001
    Assignee: 3M Innovative Properties Company
    Inventors: Arthur H. Beesley, Christine A. Sobon, Bill L. George, Nancy A. Waletzko
  • Patent number: 6231957
    Abstract: A sheet-shaped flavored film that rapidly disintegrates when placed on the surface of certain substrates and releases a natural or artificial flavor to the substrate to enhance or modify the intrinsic flavor of the substrate is provided. The flavored film includes one or more water-soluble polymers, one or more surfactants, and one or more flavoring agents. The flavored film has numerous applications in the food and food service industry wherein an easy to use, inexpensive and reproducible method of flavoring food products is desired.
    Type: Grant
    Filed: May 6, 1999
    Date of Patent: May 15, 2001
    Inventors: Horst G. Zerbe, Fadia Al-Khalil
  • Patent number: 6217944
    Abstract: An automatic coating apparatus. A rotary atomizing head is washed with the fluid supplied from its front side by a washing nozzle. A coating machine is mounted on a coating robot for moving in arbitrary directions, while an atomizing head washer is located in the vicinity of the coating robot. At the time of a washing operation, the coating robot is actuated to put the rotary atomizing head into a waste liquid collecting container of the atomizing head washer. In this state, thinner is discharged from the washing nozzle toward the front side of the hub member of the rotary atomizing head. Thinner is then allowed to flow into the rotary atomizing head through solvent outlet holes in the hub member to wash off deposited paint from the rotary atomizing head.
    Type: Grant
    Filed: July 12, 1999
    Date of Patent: April 17, 2001
    Assignee: ABB K.K.
    Inventors: Osamu Yoshida, Hidetsugu Matsuda
  • Patent number: 6210755
    Abstract: In a method and evaporation chamber for generating a continuous vapor stream containing a compound in which gallium is present in monovalent form of a vacuum coating method for vacuum coating a substrate, an evaporation substance containing gallium in bivalent or trivalent form, is arranged together with metallic gallium in the evaporation chamber, that is closed on all sides and has a vapor exit opening. The evaporation substance is evaporated, and the vapor is brought into contact with the metallic gallium, causing the bivalent or trivalent gallium to be reduced to monovalent gallium in a vapor stream which subsequently exits in the direction of the substrate via the vapor exit opening.
    Type: Grant
    Filed: November 9, 1999
    Date of Patent: April 3, 2001
    Assignee: Siemens Aktiengesellschaft
    Inventors: Manfred Fuchs, Erich Hell, Detlef Mattern
  • Patent number: 6200432
    Abstract: A substrate which has been heated to a predetermined temperature by a heating unit during sputtering is transferred into an unload-lock chamber having a vacuum pump system and a vent gas introducing system. The unload-lock chamber is provided with a cooling stage which makes surface contact with the substrate so as to forcedly cool the substrate to a predetermined temperature. The substrate is placed on the cooling stage and forcedly cooled. After the substrate is cooled to the predetermined temperature or lower, the vent gas introducing system is operated so that the interior of the unload-lock chamber is returned to the atmospheric pressure ambient. Since the substrate under a high temperature condition does not make contact with the atmospheric pressure ambient, film properties are prevented from being varied.
    Type: Grant
    Filed: November 10, 1999
    Date of Patent: March 13, 2001
    Assignee: Anelva Corporation
    Inventors: Masahiko Kobayashi, Nobuyuki Takahashi
  • Patent number: 6162496
    Abstract: A mixing system with a vessel for supplying a liquid and a device for supplying solid pieces to mix with the liquid. The system has an elongate enclosure with a first end opposing a second end. The enclosure defines a chamber in fluid communication with the vessel to receive the liquid. The chamber also has a inlet and an outlet with the inlet being closer to the first end than the outlet. The chamber receives the pieces from the device through the inlet and issues the pieces through the outlet. A motor driven mixing auger positioned in the chamber between the first and second ends rotates a selected direction about a rotational axis to intermix the liquid and pieces. The auger includes a first helical flight between the inlet and the outlet to convey the pieces from the inlet to the outlet when the shaft is rotated the selected direction. The auger also includes a second helical flight between the first flight and the second end to urge the solid pieces in a direction opposite the first flight.
    Type: Grant
    Filed: January 14, 1999
    Date of Patent: December 19, 2000
    Inventor: David Blue
  • Patent number: 6159555
    Abstract: The invention relates to a method for electrostatic charging of the two outer sides of at least one material web with charges of opposite polarity, prior to the further processing of the at least one material web, with the web being guided through the nip of a pair of rollers that are parallel to one another and are arranged with a short space between them, characterized in that the electrostatic charging of the two outer sides of the at least one material web is performed by the rollers in the nip between them.
    Type: Grant
    Filed: August 9, 1999
    Date of Patent: December 12, 2000
    Assignee: Eltex-Elektrostatik GmbH
    Inventors: Ernst August Hahne, Hermann Kunzig, Franz Knopf
  • Patent number: 6158491
    Abstract: A process for the corrosion protection of copper or copper alloy which process comprises contacting the surface with an aqueous solution of at least one compound of general formula (I), wherein X is N, Y is CR and Z is N, or X is N, Y is N and Z is N or CR or X is CR, Y is N and Z is N, where R is a hydrogen atom or R.sup.1, and R.sup.1 is an alkyl, aryl, aralkyl, halogen, trihalomethyl, amino, heterocyclic, NHR.sup.2, NR.sup.3 R.sup.4, CN, CO.sub.2 H, CO.sub.2 R.sup.5, OH or OR.sup.6 group, where each of R.sup.2 to R.sup.6 independently represents an alkyl, aryl, or aralkyl group.
    Type: Grant
    Filed: August 28, 1997
    Date of Patent: December 12, 2000
    Assignee: Cookson Group PLC
    Inventors: John Reynolds, Andrew McIntosh Soutar, Keith William Peter White, Anthony Williams
  • Patent number: 6149984
    Abstract: In processing an object by irradiating it with laser light, a laser irradiation chamber is evacuated to a pressure value suitable for the intended laser light processing and the laser light processing is performed with the pressure in the chamber kept constant at the above value. Further, electrodes are provided in the laser irradiation chamber, and the inside of the chamber is cleaned by introducing an etching gas into the chamber during or immediately before the laser light irradiation and rendering the etching gas active.
    Type: Grant
    Filed: May 3, 1999
    Date of Patent: November 21, 2000
    Assignee: Semiconductor Energy Laboratory, Inc.
    Inventors: Shunpei Yamazaki, Naoto Kusumoto
  • Patent number: 6148641
    Abstract: An apparatus and method for producing dried, chopped strands from a supply of continuous fiber strands by the direct deposition of wet, chopped strands ejected from a chopping assembly into a drying chamber is disclosed. A transition chute is interposed between the chopping assembly and the drying chamber to guide the chopped strands to pass directly into the drying chamber.
    Type: Grant
    Filed: December 18, 1998
    Date of Patent: November 21, 2000
    Assignee: PPG Industries Ohio, Inc.
    Inventors: John R. Blough, Jerry B. Noftsger, Ronald L. Hawkins
  • Patent number: 6129946
    Abstract: The invention provides a powder coating apparatus, comprising a fresh powder container for receiving fresh powder, a recovery container for receiving powder recovered from the coating process, and a mixing container, which is connected to the fresh powder container and the recovery container via a first powder line and a second powder line, and comprising a control means for adjusting the mass flow rates of powder flowing in the first and the second powder line at a predetermined ratio of fresh powder and recovered powder. A first powder mass sensor is provided in or at the first powder line, and a second powder mass sensor is provided in or at the second powder line, wherein the control means is coupled with the first and the second powder mass sensor to adjust the ratio of the mass flow rates of powder flowing in the first and the second powder line.
    Type: Grant
    Filed: February 16, 1999
    Date of Patent: October 10, 2000
    Assignee: Wagner International AG
    Inventor: Horst Adams
  • Patent number: 6110540
    Abstract: A gas purged counter-electrode prevents the counter-electrode from being covered with dielectric material by flowing gas past a surface of a metal element. The gas purged counter-electrode produces a relatively high-density plasma which effectively acts as the counter-electrode for a coating system. The gas purged counter-electrodes can be used with PECVD or sputtering systems.
    Type: Grant
    Filed: July 12, 1996
    Date of Patent: August 29, 2000
    Assignee: The BOC Group, Inc.
    Inventors: Joseph Countrywood, Sohrab Zarrabian, Abraham I. Belkind, Charlie Sherwood, Frank Jansen
  • Patent number: 6100343
    Abstract: A method for improving surface adhesion characteristics of a polymeric substrate and/or virgin polymeric material in which the portion of the surface of the polymeric substrate and/or virgin polymeric material to be treated is contacted with a composition containing at least one oxidizing agent. The oxidizing agent in the composition is present in a kinetically degrading state capable of producing at least one chemical intermediate which is reactive with the polymeric substrate/virgin polymeric material. Contact between the composition containing the oxidizing agent and the polymeric substrate/virgin polymeric material is maintained for an interval sufficient to produce or modify functional groups in the polymeric substrate/virgin polymeric material. The oxidizing agent of choice is a halogenated bivalent oxygen compound. The oxidizing agent is activated by an activator agent containing at least one carboxylic acid group or derivative thereof.
    Type: Grant
    Filed: November 3, 1998
    Date of Patent: August 8, 2000
    Assignee: Beholz Technology, L.L.C.
    Inventor: Lars Guenter Beholz
  • Patent number: 6077913
    Abstract: A method for improving surface adhesion characteristics of a polymer substrate in which the portion of the surface of the polymeric substrate to be treated is contacted with a fluid material containing at least one oxidizing agent. The oxidizing agent in the fluid material is present in a kinetically degrading state capable of producing at least one chemical intermediate which is reactive with the polymeric substrate. Contact between the fluid containing the oxidizing agent and the polymeric substrate is maintained for an interval sufficient to produce or modify functional groups in the polymeric substrate proximate to its surface. The oxidizing agent of choice is a bivalent oxygen compound. The oxidizing agent is activated by an activator agent containing at least one carboxylic acid group or derivative thereof. The activator agent may be present in the fluid upon initial contact with the polymeric substrate or may be added to the fluid subsequent to initial contact with the polymeric substrate.
    Type: Grant
    Filed: March 26, 1998
    Date of Patent: June 20, 2000
    Assignee: Beholz Technology, L.L.C.
    Inventor: Lars Guenter Beholz
  • Patent number: 6048589
    Abstract: A magnetic disc substrate is provided, which includes a magnetic disc substrate body made of glass and is characterized in that a metal element capable of absorbing light in at least a surface portion of the magnetic disc substrate body, and a texture is formed on a surface of the magnetic disc substrate body. Ions of the metal element are dispersed in the surface portion of the magnetic disc substrate, or the metal element is contained in a composition of the glass constituting the magnetic disc substrate in the form of an oxide. The glass is preferably a crystallized glass a Li.sub.2 O--Al.sub.2 O.sub.3 --SiO.sub.2 based crystallized glass, which particularly preferably contains 65 to 85 wt % of SiO.sub.2, 8 to 15 wt % of Li.sub.2 O, 2 to 8 wt % of Al.sub.2 O.sub.3, 1 to 5 wt % of P.sub.2 O.sub.5 and 1 to 10 wt % of ZrO.sub.2 and has lithium disilicate (Li.sub.2 O.2SiO.sub.2) as a main crystalline phase.
    Type: Grant
    Filed: November 9, 1998
    Date of Patent: April 11, 2000
    Assignee: NGK Insulators, Ltd.
    Inventors: Tomio Suzuki, Fuminori Takeya, Masahiro Abe
  • Patent number: 6045858
    Abstract: A pressure-sensitive adhesive tape having a layer of thermoplastic resin wherein the substrate is provided with a plurality of perforations through its thickness wherein each perforation is surrounded by a burr which is substantially flattened is provided. One useful example of the film is a pressure-sensitive adhesive tape having a layer of pressure-sensitive adhesive.There is also provided a process for producing a film comprising the steps of:Step (A): press protrusions provided on a surface of a roller against a substrate comprising a layer of thermoplastic resin to open a plurality of perforations in the substrate; andStep (B): subjecting the substrate, obtained by Step (A), which has a plurality of perforations to a heat treatment while pressing. The process may have a further step of applying a pressure-sensitive adhesive to at least one surface of the substrate obtained in Step (B).
    Type: Grant
    Filed: August 3, 1998
    Date of Patent: April 4, 2000
    Assignee: Sumika Plastech Co., Ltd.
    Inventor: Shokichi Hamano
  • Patent number: 6027770
    Abstract: A functional polyolefinic(tubular) film combined with an inorganic filler (such as CaCO.sub.3) having a thickness of 5-150 .mu.m, which is applied in a corona discharge at a high voltage current of 50-3,000 W/m.sup.2 /min. A process for manufacturing that film. Products obtained from that film [packaging bag, adhesive-backed sheet and adhesive tape (such as tape for adhesive masking film for coating)].
    Type: Grant
    Filed: April 16, 1998
    Date of Patent: February 22, 2000
    Assignee: Yoshino Kasei Company Limited
    Inventor: Takashi Yoshino
  • Patent number: 5989639
    Abstract: Air bubbles which are entrapped within the cells of an engraved applicator roller are displaced from the cells by wiping the surface of the engraved applicator roller with the bristles of a brush. An elongated brush mounted on a doctor blade head projects into a doctor blade reservoir. The bristles of the brush are disposed for wiping engagement against the engraved surface of an applicator roller which is wetted by liquid coating material. As the engraved applicator roller rotates in contact with the liquid material in the doctor blade reservoir, the bristles of the brush puncture the entrapped air bubbles and sweep the entrapped air away from the cells. The sweeping action of the bristles induces a relatively low pressure condition within the cells, which promotes the flow of liquid material into the cells.
    Type: Grant
    Filed: April 1, 1994
    Date of Patent: November 23, 1999
    Inventor: Steven M. Person
  • Patent number: 5985374
    Abstract: Dehydroxylated, silica-containing, glass surfaces are known to be at least partially terminated by strained siloxane rings. According to the invention, a surface of this kind is exposed to a selected silane compound or mixture of silane compounds under reaction-promoting conditions. The ensuing reaction results in opening of the strained siloxane rings, and termination of surface atoms by chemical species, such as organic or organosilicon species, having desirable properties. These species can be chosen to provide qualities such as hydrophobicity, or improved coupling to a polymeric coating.
    Type: Grant
    Filed: October 17, 1997
    Date of Patent: November 16, 1999
    Assignee: Lucent Technologies Inc.
    Inventors: Alexis Grabbe, Terry Arthur Michalske, William Larry Smith
  • Patent number: 5985048
    Abstract: A method for creating an oxide coating on the surface of a component formed from austenitic stainless steel or nickel alloy steel is set forth. The component has a naturally formed oxide film at the surface. The naturally formed oxide is enhanced through a process comprising at least two steps. In the first step, the component is heated in the presence of circulating dry air for a first period of time at a temperature of approximately 300 degrees centigrade. In the second step, the component is heated in the presence of static dry air at an elevated pressure for a second period of time at a temperature that is higher than the temperature during the first period. The exterior portion of the enhanced oxide coating is removed with an oxidizing treatment whereby an oxide coating having a high ratio of chromium to iron is exposed at the surface of the stainless steel.
    Type: Grant
    Filed: April 7, 1998
    Date of Patent: November 16, 1999
    Assignee: Semitool, Inc.
    Inventors: Raymond W. Wahlert, Arthur H. Tuthill
  • Patent number: 5980991
    Abstract: Firing process and apparatus for uniformly heat-treating a substrate having a film-forming composition thereon, wherein the substrate is subjected to a first soaking step in which the substrate is held for a predetermined time in a first heating chamber whose temperature is maintained at a first value, so that the temperature within the substrate is held at the first value evenly throughout an entire mass of the substrate, and after feeding of the substrate into a second heating chamber whose temperature is maintained at a predetermined second value which is different from the first value by a predetermined difference, the substrate is subjected to a second soaking step in which the substrate is held for a second predetermined time in the second heating chamber, so that the temperature within the substrate is held at the second value evenly throughout the entire mass of the substrate.
    Type: Grant
    Filed: October 23, 1996
    Date of Patent: November 9, 1999
    Assignees: Noritake Co., Ltd., Kyushu Noritake Co., Ltd.
    Inventors: Susumu Sakamoto, Hiroshi Oshima, Hiroyuki Mori, Hironobu Ichihara, Yoji Sato
  • Patent number: 5958524
    Abstract: The invention relates to a process for the surface treatment of at least one portion of an article comprising at least one plastic material, the process comprising a step of fluorination for out most 12 seconds, following a step of an energetic surface oxidation of this portion.
    Type: Grant
    Filed: July 29, 1997
    Date of Patent: September 28, 1999
    Assignee: Solvay (Societe Anonyme)
    Inventors: Claude Dehennau, Zdenek Hruska, Frederic Menu
  • Patent number: 5948523
    Abstract: An improved coldforming tool made of a zone in a tungsten carbide-cobalt cemented carbide is disclosed. The tool, preferably a wire drawing nib, contains WC with a mean grain size of 1.5-2 .mu.m and 5-7 weight % Co and with a carbon content close to saturation level and sufficient to exhibit cobalt magnetic measurements of 92%-98% of that of pure cobalt.
    Type: Grant
    Filed: July 17, 1997
    Date of Patent: September 7, 1999
    Assignee: Sandvik AB
    Inventors: Michael John Carpenter, Gary William Sweetman
  • Patent number: 5942286
    Abstract: The present invention provides a method for selectively allowing film-forming molecules to be chemically adsorbed onto an Si substrate to produce a good and robust organic monomolecular film, wherein molecules with SH groups are chemically adsorbed onto the Si substrate to form a monomolecular film of the molecules by heating an As molecular beam source 4 to allow a monoatomic layer thickness of arsenic to be adsorbed onto the clean surface of the Si substrate set on a sample stage 3 and then immersing the Si substrate terminated by arsenic in a solution containing molecules with SH groups.
    Type: Grant
    Filed: October 18, 1996
    Date of Patent: August 24, 1999
    Assignees: Agency of Industrial Science and Technology, Angstrom Technology Partnership, Sharp Corporation
    Inventors: Hirotaka Ohno, Shangjr Gwo, Hiroshi Tokumoto
  • Patent number: 5916640
    Abstract: An atomizer has a chamber holding a liquid containing particles of a desired material. Aerosol particles are formed by using an aspirating nozzle or ultrasonic vibrator and the aerosol particles are carried in a gas flow. The aerosol particles are treated by increasing the charge on the aerosol particles by contact with a high voltage electrode and the aerosol particles are passed through inertial separator stages to remove large aerosol particles from the flow so they are not discharged from the atomizer.
    Type: Grant
    Filed: September 6, 1996
    Date of Patent: June 29, 1999
    Assignee: MSP Corporation
    Inventors: Benjamin Y. H. Liu, James J. Sun
  • Patent number: 5910338
    Abstract: The present invention discloses a surface structure and a method for preparation of the structure. The surface structure comprises a dielectric material in intimate contact with an underlying material having undercut formations therein which enhance the adhesion of the dielectric material to the surface of the underlying material. Preferred applications for the surface structure include semiconductor processing apparatus such as process chamber interior surfaces and the surfaces of functional elements used within the chamber. Functional elements include an electronic chuck used to hold a semiconductor substrate in place within the process chamber. The surface structure comprises at least one, and preferably a plurality of undercut formations which facilitate mechanical locking of a dielectric layer applied thereover. Preferably the undercut formation is at least one groove which traverses the surface to which the dielectric material is to be applied.
    Type: Grant
    Filed: March 17, 1998
    Date of Patent: June 8, 1999
    Assignee: Applied Materials, Inc.
    Inventor: Arik Donde
  • Patent number: 5888589
    Abstract: This invention relates to a process for producing an anti-scaler product for coating polymerization reactors comprising condensing a naphthol with an aldehydic cross-linking agent, wherein the cross-linking agent is the reaction product of an aldehyde and a hydrosulphite.
    Type: Grant
    Filed: January 22, 1998
    Date of Patent: March 30, 1999
    Assignee: C.I.R.S. S.p.A.
    Inventors: Francesco Carlin, Mario Sattin
  • Patent number: 5879756
    Abstract: Rapid curing of polymer layers on semiconductor substrates is facilitated using variable frequency microwave energy. A semiconductor substrate having a polymer layer thereon is placed in a microwave furnace cavity, and then swept with a range of microwave frequencies. The range of frequencies includes a central frequency selected to rapidly heat the polymer layer. The range of frequencies is selected to generate a plurality of modes within the cavity. The sweep rate is selected so as to avoid damage to the semiconductor substrate and/or any components thereon. The microwave power may be adjusted during frequency sweeping to control the temperature of the polymer layer and the semiconductor substrate. Effluent produced during the curing of the polymer layer may be removed from the furnace cavity.
    Type: Grant
    Filed: October 9, 1997
    Date of Patent: March 9, 1999
    Assignee: Lambda Technologies, Inc.
    Inventors: Zakaryae Fathi, Denise A. Tucker, Richard S. Garard, Jianghua Wei
  • Patent number: 5869140
    Abstract: A surface treatment, especially for titanium and aluminum alloys, forms a sol-gel film covalently bonded on the metal surface to produce strong, durable adhesive bonds between the metal and an organic adhesive without using toxic chemicals and while significantly reducing or eliminating rinse water requirements of traditional anodizing or etching processes. An aqueous sol containing an alkoxyzirconium and an organosilane with an organic acid catalyst and zirconium stabilizer is applied to etched or grit blasted substrates by dipping, spraying, or drenching, to produce bonds in a single application comparable in strength and performance to standard anodize controls. Parameters affecting performance include the sol composition, the Si/Zr ratio, the ratio of sol ingredients, the concentration of the sol, the carrier solvent, solution age, catalysts, surface pretreatment, application method, curing process, and primer used.
    Type: Grant
    Filed: February 7, 1997
    Date of Patent: February 9, 1999
    Assignee: The Boeing Company
    Inventors: Kay Y. Blohowiak, Joseph H. Osborne, Kenneth A. Krienke
  • Patent number: 5863609
    Abstract: A workpiece is processed by abrading a surface of its amorphous coat layer (12) over a substrate (10) such that Ni particles (13) and crystallized compounds (14) of Ni and P are produced locally and only on the surface of the coat layer (12) and along grooves (17) formed by abrading. Mechanical strength and anti-corrosive property of the coat layer can thus be maintained, and ferromagnetic materials can be affixed thereon and can be magnetized in a desired direction.
    Type: Grant
    Filed: August 13, 1996
    Date of Patent: January 26, 1999
    Assignee: Nihon Micro Coating Co., Ltd.
    Inventor: Motokazu Yamamoto
  • Patent number: 5858466
    Abstract: A system for pumping resist to a wafer coating machine includes a line that returns a selected proportion of the resist entering the resist pump to the resist supply tank. The return line to the tank is connected to the pump outlet at a higher point than the pump outlet to the wafer coating machine, and the resist that is returned to the tank carries substantially all of the bubbles that are carried in the resist entering the tank. The bubbles are removed from the resist in the tank and the resist can be used normally.
    Type: Grant
    Filed: June 24, 1996
    Date of Patent: January 12, 1999
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Jen Song Liu, Bii Juno Chang, Jen Shang Fang, Hao Wei Chang
  • Patent number: 5859086
    Abstract: A method is disclosed for modifying a fluoropolymer including the following steps: providing a fluoropolymer surface, adding a solution including a a reactive species to the fluoropolymer surface, and exposing the reduced fluoropolymer surface to ultraviolet radiation in the presence of ozone or oxygen. The method reduces the discoloration of the fluoropolymer.
    Type: Grant
    Filed: August 7, 1997
    Date of Patent: January 12, 1999
    Assignee: Competitive Technologies of PA, Inc.
    Inventors: Michael S. Freund, Lisa M. Regalla, Gang Liu
  • Patent number: 5837330
    Abstract: The substrate of a magnetic recording medium is laser textured employing a dual fiber-optic laser delivery system which enables separate control of nucleation and crystallization. An embodiment of the invention includes laser texturing glass, ceramic and glass-ceramic substrates without microcracking to form a texture comprising uniform protrusions.
    Type: Grant
    Filed: August 28, 1997
    Date of Patent: November 17, 1998
    Assignee: Seagate Technology, Inc.
    Inventor: Jialuo Jack Xuan
  • Patent number: 5837323
    Abstract: A method of improving the surface of polypropylene product characterized is that the surface of polypropylene product is improved by contacting with diluted fluorine gas of concentration of 0.1-10% for 1-30 minutes to make it hydrophilic with the surface contact angle 80 degrees or less.
    Type: Grant
    Filed: August 17, 1995
    Date of Patent: November 17, 1998
    Assignee: Hashimoto Chemical Co., Ltd.
    Inventors: Tugio Hashimoto, Matagoro Maeno, Ryoji Hirayama
  • Patent number: 5837329
    Abstract: By irradiating with high-intensity pulsed laser light of wavelength 9.0.mu. to 11.0.mu. the organic film on rollers, and specifically, the film on photosensitive drums, fixing rollers, rubber rollers, and magnetic rollers used in photocopying equipment, printers, facsimile machines, and other equipment, said film can be removed from the roller surface without damaging the underlying metal layer in any way. Metal cylinders from which film has been removed by this method can either be reused as is, or may be recoated, and then, reused as rollers in photocopying equipment, printers, and facsimile machines.Furthermore, a method is disclosed, wherein laser light irradiation is used to remove film from the surface of various rollers, as is equipment for roller machining and processing.
    Type: Grant
    Filed: August 28, 1996
    Date of Patent: November 17, 1998
    Assignee: Shinozaki Manufacturing Co., Ltd.
    Inventor: Kyoji Kokufuda