Organosilicon Containing Coating Material Patents (Class 427/515)
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Patent number: 8784947Abstract: To provide a composition comprising a silsesquioxane compound that is capable of producing a coating film with excellent heat resistance and scratch resistance, and that has excellent compatibility with general polymerizable unsaturated compounds as well as polymerizable unsaturated compounds with high polarity. A silsesquioxane compound comprising organic groups each directly attached to a silicon atom of the compound, at least one of the organic groups being an organic group having one or more urethane bonds and one (meth)acryloyloxy group.Type: GrantFiled: October 3, 2013Date of Patent: July 22, 2014Assignee: Kansai Paint Co., Ltd.Inventors: Akinori Nagai, Yoshiaki Chino, Masami Kobata, Osamu Isozaki
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Publication number: 20140186543Abstract: Disclosed are compositions that include: a) a thiol-terminated polymer; and b) a sulfur-containing ethylenically unsaturated silane. Related products, such as sealants, that include polymers derived from such compositions, are also disclosed.Type: ApplicationFiled: March 7, 2014Publication date: July 3, 2014Applicant: PRC-DeSoto International, Inc.Inventors: Raquel Keledjian, Renhe Lin, Chandra Rao, Bruce Virnelson
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Publication number: 20140186542Abstract: An anti-finger print hard coating resin composition is described that includes a high hardness ultra-violet (UV) curable resin having a weight percent of about 5% to about 99% and including at least one of siloxane compound and urethane acrylate compound; a UV curable fluoro-based compound having a weight percent of about 0.02% to about 2% with respect to the high hardness UV curable resin; an optical initiator having a weight percent of about 0.1% to about 10% with respect to the high hardness-UV curable resin; and an arylate monomer of residual amount.Type: ApplicationFiled: December 11, 2013Publication date: July 3, 2014Applicant: LG Display Co., Ltd.Inventors: Hye-Ran PARK, Won-Jin CHOI
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Publication number: 20140178698Abstract: A curable silsesquioxane polymer, a composition including such polymer, an article having a layer disposed thereon that includes the curable polymer and/or the cured polymer, and a method of forming a cured coating, wherein the curable silsesquioxane polymer includes a three-dimensional branched network having the formula: wherein: the oxygen atom at the * is bonded to another Si atom within the three-dimensional branched network; R is an organic group comprising an ethylenically unsaturated group; n is an integer of greater than 3; and the —OH groups are present in an amount of at least 15 wt-% of the polymer.Type: ApplicationFiled: May 31, 2013Publication date: June 26, 2014Inventor: Jitendra S. Rathore
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Publication number: 20140147598Abstract: A coating method for producing an electrically insulating coating on a bearing component, wherein, in a first step, a substance mixture comprising at least a) a silane and/or siloxane compound, b) a metal alcoholate, and c) PEEK and/or PTFE in the form of a dispersion is applied to the bearing component and, in a second step, is solidified on the component surface by means of a laser beam.Type: ApplicationFiled: April 17, 2012Publication date: May 29, 2014Applicant: SCHAEFFLER TECHNOLOGIES AG & CO. KGInventors: Juergen Windrich, Tim Matthias Hosenfeldt, Helmut Schillinger
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Publication number: 20140134362Abstract: The present invention, provides a barrier laminate comprising an inorganic layer and an organic layer disposed on the surface of the inorganic layer, wherein the organic layer comprises a silane coupling agent denoted by general formula (1) below: The barrier laminate maintains both barrier properties and adhesion between an organic layer and an inorganic layer, even when incorporated into an element.Type: ApplicationFiled: January 30, 2014Publication date: May 15, 2014Applicant: FUJIFILM CORPORATIONInventors: Eijiro IWASE, Atsushi MUKAI, Jiro TSUKAHARA
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Publication number: 20140127518Abstract: A water vapor barrier film that has high water vapor barrier performance, and further is excellent in water resistance, heat resistance, transparency, and smoothness; and a method for producing the same; and an electronic equipment using the same are provided. A water vapor barrier film containing at least one water vapor barrier layer, and at least one protective layer, on a base material having gas permeability, wherein the water vapor barrier layer is a layer formed by applying a coating liquid containing polysilazane, drying the applied coating liquid to form a film, and then by irradiating the film with vacuum ultraviolet light, and the protective layer is a layer formed by applying a coating liquid containing polysilozane, drying the applied coating liquid to form a film, and then by irradiating the film with vacuum ultraviolet light.Type: ApplicationFiled: June 7, 2012Publication date: May 8, 2014Applicant: Konica Minolta , Inc.Inventor: Wataru Ishikawa
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Patent number: 8703838Abstract: The invention provides an improved unsaturated polyester prepared from the polycondensation of unsaturated diacid monomers or unsaturated acid anhydride mononers and polyol monomers and, optionally, one or more saturated aliphatic or aromatic diacid monomers or anhydride monomers thereof. The improvement comprises 0.5 to 50 weight percent, based on the total monomer weight, of a hydroxyalkyl-functional siloxane of formula (1) below. The invention also relates to a UV curable coating formulation containing a siloxane-functional unsaturated polyester resin, a vinyl ether functional diluents and a photoinitiator. The invention further provides a method of preparing an article with a low-surface energy coating. According to the method, at least one surface of an article with a coating formulation of the invention; and the coating is then cured as described above with UV light to form a low-surface energy coating on the surface.Type: GrantFiled: February 20, 2009Date of Patent: April 22, 2014Assignee: NDSU Research FoundationInventors: Dean C. Webster, Neena Ravindran, Ankit Vora
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Publication number: 20140106151Abstract: Provided are a gas barrier film which has extremely excellent gas barrier performance and high durability, a manufacturing method thereof, and an electronic device using the same. The gas barrier film having at least two gas barrier layers which contain at least Si, O and N and are laminated on a substrate, in which the total thicknesswise composition distribution of the gas barrier layers includes both a thicknesswise continuous region which has a thickness of 20 nm or more and satisfies the following composition range (A) and a thicknesswise continuous region which has a thickness of 50 nm or more and satisfies the following composition range (B) in this order from the substrate side. (A): when the composition of the gas barrier layer is represented by SiOwNx, w?0.8, x?0.3, and 2w+3x?4, and (B): when the composition of the gas barrier layer is represented by SiOyNz, 0<y?0.55 and z?0.55, and 2y+3z?4.Type: ApplicationFiled: June 13, 2012Publication date: April 17, 2014Applicant: KONICA MINOLTA , INC.Inventor: Takahiro Mori
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Publication number: 20140093651Abstract: The invention describes methodological approach and process for preparation of variable compositions of water-(hydrophobic), oil- and dust-repellent multi-component mixtures containing non-cyclic silanes, siloxanes, hydrocarbons, silane-carbons), cyclic molecular compounds (cyclic-silanes, hydrocarbons, silane-carbons and their derivatives) and other hydrophobic molecular components (as separate molecular substances or as molecular substitutes within the silanes and/or the cyclic compound molecules). Such methodological approach offers best flexibility for repellant mixtures preparation in achieving highly repellant properties, durability and long-lasting (permanent) bonding for specific surface applications and for preparation of other subsequent types of repellant surfacing solutions such as paints or sealing agents, textiles and else.Type: ApplicationFiled: July 20, 2013Publication date: April 3, 2014Inventors: Hristem Mitkov Dyanov, Paoula Hristemova Dyanova, Radu Chiorean
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Patent number: 8668961Abstract: Methods of making titania coatings having self cleaning properties, and associated articles are provided. In certain example instances, a substrate supports a layer comprising titanium dioxide. The substrate may support multiple layers. In certain examples, the titanium dioxide layer is made using a process involving a titania precursor and a photomonomer. The titanium dioxide coating may be applied as a liquid directly or indirectly on a substrate, then permitted to cure. After curing using ultraviolet radiation and/or electron beams, the resulting coating may inhibit fouling, be antireflective, be highly durable, self cleaning and/or hydrophilic in certain instances.Type: GrantFiled: July 31, 2008Date of Patent: March 11, 2014Assignee: Guardian Industries Corp.Inventor: Desaraju V. Varaprasad
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Publication number: 20140030441Abstract: To provide a composition comprising a silsesquioxane compound that is capable of producing a coating film with excellent heat resistance and scratch resistance, and that has excellent compatibility with general polymerizable unsaturated compounds as well as polymerizable unsaturated compounds with high polarity. A silsesquioxane compound comprising organic groups each directly attached to a silicon atom of the compound, at least one of the organic groups being an organic group having one or more urethane bonds and one (meth)acryloyloxy group.Type: ApplicationFiled: October 3, 2013Publication date: January 30, 2014Applicant: Kansai Paint Co., Ltd.Inventors: Akinori Nagai, Yoshiaki Chino, Masami Kobata, Osamu Isozaki
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Publication number: 20140010971Abstract: The present invention is drawn to a method for manufacturing antistatic UV-cured hard-coatings on optical articles, comprising (a) coating an organic or mineral optical substrate with an essentially anhydrous solution containing from 20% to 90% by weight, relative to the total dry matter of the solution, of at least one non hydrolyzed epoxyalkyltrialkoxysilane and at least 3.2% by weight, relative to the total dry matter of the solution, of at least one photoinitiator selected from the group consisting of triarylsulfonium salts, diaryliodonium salts, and mixtures thereof, (b) curing the resulting coating by irradiation with UV-radiation, said method not comprising any hydrolysis step before the UV curing step.Type: ApplicationFiled: July 2, 2013Publication date: January 9, 2014Inventor: Robert Valeri
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Publication number: 20140001075Abstract: A glass container and related methods of manufacturing and coating glass containers. The glass container includes an inorganic-organic hybrid coating over at least a portion of an exterior surface of a glass substrate.Type: ApplicationFiled: July 2, 2012Publication date: January 2, 2014Inventors: Michael P. Remington, JR., Pramod K. Sharma, Daniel Baker
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Publication number: 20140004360Abstract: Efficiently produced is a release liner including a plant-derived film as a substrate and having a good appearance, releasability, and adhesion. A method according to the present invention produces a release liner having a plant-derived film substrate and, on at least one side thereof, a release coat layer derived from a thermosetting silicone resin. The method includes the steps as follows: Step A of applying a thermosetting silicone release agent to at least one side of a plant-derived film substrate, the release agent containing 100 parts by weight of a thermosetting silicone resin and 0.05 to 0.55 part by weight of a curing catalyst; Step B of drying at 40° C. to 90° C. for 10 to 60 seconds after Step A; Step C of applying an ultraviolet ray at 50 to 300 mJ/cm2 after Step B; and Step D of aging at 30° C. to 70° C. for 12 to 240 hours after Step C.Type: ApplicationFiled: March 7, 2012Publication date: January 2, 2014Applicant: NITTO DENKO CORPORATIONInventors: Hitoshi Takahira, Satomi Yoshie, Shigeki Ishiguro, Hiroki Senda
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Publication number: 20140001181Abstract: A glass container and related methods of manufacturing and coating glass containers. The glass container includes an inorganic-organic hybrid coating over at least a portion of an exterior surface of a glass substrate.Type: ApplicationFiled: July 2, 2012Publication date: January 2, 2014Inventors: Pramod K. Sharma, Carol A. Click
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Publication number: 20130337161Abstract: An organic-inorganic composite film containing an organic-inorganic composite including an inorganic compound particle and a polymer bonded to the inorganic compound particles. A percentage of voids in the film is 3 to 70 volume % with reference to a volume of the film.Type: ApplicationFiled: February 20, 2012Publication date: December 19, 2013Applicant: ASAHI KASEI CHEMICALS CORPORATIONInventors: Mitsuyo Akimoto, Kenya Tanaka
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Patent number: 8603588Abstract: Disclosed is a composition comprising a hydrolysate of an alkoxysilane compound, a hydrolysate of a siloxane compound represented by Formula (1), a surfactant, and an element having an electronegativity of 2.5 or less. In Formula (1), RA and RB independently represent a hydrogen atom, a phenyl group, —CaH2a+1, —(CH2)b(CF2)cCF3 or —CdH2d?1, RA and RB are not both hydrogen atoms simultaneously, RC and RD independently represent a single bond that links a silicon atom and an oxygen atom to form a cyclic siloxane structure, or each independently represent a hydrogen atom, a phenyl group, —CaH2a+1, —(CH2)b(CF2)cCF3, or —CdH2d?1, a represents an integer of 1 to 6, b represents an integer of 0 to 4, c represents an integer of 0 to 10, d represents an integer of 2 to 4, and n represents an integer of 3 or greater.Type: GrantFiled: March 30, 2009Date of Patent: December 10, 2013Assignee: Mitsui Chemicals, Inc.Inventors: Kazuo Kohmura, Hirofumi Tanaka
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Publication number: 20130309412Abstract: A method for manufacturing a composite article of polytetrafluoroethylene and silicone includes: (a) providing a UV-curable silicone: (b) applying the UV-curable silicone to a polytetrafluoroethylene backing; and (c) exposing the UV-curable silicone to UV radiation sufficient to cure the silicone.Type: ApplicationFiled: May 3, 2013Publication date: November 21, 2013Applicant: Momentive Performance Materials Inc.Inventors: Melvin Richard Toub, Vincent Joseph Colarossi
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Patent number: 8563129Abstract: The invention relates polysilazane-containing coatings for increasing the light permeability of sun-facing covers of solar cells. The coating for surfaces contains at least one polysilazane of formula (1) —(SiRR?R?—NR??1)n- (1), wherein R?, R?, R?? are the same or different or represent an optionally substituted alkyl, aryl, vinyl or (trialkoxysilyl)alkyl group, n being an integer and n being chosen in such a manner that the perhydropolysilazane has a number average molecular weight of 150 to 150,000 g/mol, a solvent and a catalyst. The cured coating has a thickness of at least 0.50-10 micrometer, preferably 0.2 to 5 micrometer, especially preferred 0.5 to 1.5 micrometer. It is especially suitable as transmission-promoting coating for use in sun-facing covers of solar cells.Type: GrantFiled: April 17, 2009Date of Patent: October 22, 2013Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.Inventors: Klaus Rode, Hartmut Wiezer, Sandra Stojanovic, Hubert Liebe, Lars Blankenburg
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Publication number: 20130260146Abstract: Methods of crossliiiking functional and nonfunctional silicones are described. The methods include exposing the silicones to ultraviolet radiation having a spectrum comprising at least one intensity peak below 240 nm in an inert atmosphere. Articles prepared by such methods, including release liners and adhesive articles are also described.Type: ApplicationFiled: October 13, 2011Publication date: October 3, 2013Applicant: 3M INNOVATIVE PROPERTIES COMPANYInventors: Robin E. Wright, Margaux B. Mitera, Jayshree Seth
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Patent number: 8541062Abstract: Methods for making multi-layered anti-reflective coatings are disclosed. Un-solgel precursor compositions may be prepared having inorganic oxide precursors and UV curable acrylic monomer mixtures, deposited on a substrate, and subsequently the coated substrate may be cured by exposure to electromagnetic radiation, such as UV radiation. The coating layers may be heated using a temperature sufficient to burn off organic content and form a multi-layer anti-reflective coating. Substrates comprising such coatings and photovoltaic devices comprising such substrates and coatings are also disclosed.Type: GrantFiled: September 28, 2009Date of Patent: September 24, 2013Assignee: Guardian Industries Corp.Inventor: Desaraju V. Varaprasad
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Patent number: 8518530Abstract: The present invention relates to a production method for an ultra-low-dielectric-constant film, in which ratios are optimised in a mixed solution having a matrix consisting of a poly (alkyl silsesquioxane) copolymer and a porogen represented by Chemical formula 1, and in which this mixed solution is subjected to ultraviolet curing during a heat treatment. The ultra-low-dieletric-constant film of the present invention can be used as an intermediate insulating film for next generation semiconductors instead of the SiO2 dielectric films currently used, since pores of from 1 to 3 nm are uniformly distributed at from 10 to 30% and a very high degree of mechanical elasticity of from 10.5 to 19 GPa is achieved at a low dielectric constant from 2.12 to 2.4.Type: GrantFiled: February 19, 2010Date of Patent: August 27, 2013Assignee: Industry-University Cooperation Foundation Sogang UniversityInventors: Hee-Woo Rhee, Hyun Sang Choi, Seong-Gyu Min, Bum Suk Kim, Bo ra Shin
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Patent number: 8496849Abstract: Disclosed is a liquid crystal orientating agent which contains a liquid crystal orientating polyorganosiloxane obtained by reacting a specified reactive polyorganosiloxane typified by the hydrolysis condensate of 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane and a reactive compound which includes a specified compound typified by stearic acid. The liquid crystal orientating agent of this invention can form liquid crystal orientating films which have excellent liquid crystal orientating properties, a high level of heat resistance and light resistance, exhibit little reduction of voltage retention even in high temperature environments and when irradiated with light of high intensity, and excellent residual image characteristics, and it also has excellent storage stability.Type: GrantFiled: January 29, 2009Date of Patent: July 30, 2013Assignee: JSR CorporationInventors: Kenichi Sumiya, Toshiyuki Akiike, Tsutomu Kumagai, Eiji Hayashi
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Publication number: 20130190695Abstract: A medical article is provided including a chamber formed from a cyclic polyolefin having an inner surface in sliding engagement with an exterior surface of a sealing member, the inner surface of the chamber being coated with a composition including a first mixture of organopolysiloxanes having different molecular weights and a viscosity ranging from about 5,000 centistokes to about 100,000 centistokes; and a sealing member having an exterior surface coated with a second mixture of organopolysiloxanes having different molecular weights and having a viscosity ranging from about 10,000 centistokes to about 500,000 centistokes, the coatings being adhered to the surfaces by crosslinking induced by irradiation with an isotope, electron beam, or ultraviolet radiation.Type: ApplicationFiled: March 11, 2013Publication date: July 25, 2013Applicant: BECTON, DICKINSON AND COMPANYInventor: Becton, Dickinson and Company
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Publication number: 20130092239Abstract: Disclosed is a method of manufacturing a gas barrier film possessing a substrate in the form of a belt and provided thereon, a gas barrier layer containing silicon oxide, possessing a coating step in which a coating solution comprising a polysilazane compound is coated on the substrate to form a coating film, and a UV radiation exposure step in which the coating film is exposed to the vacuum UV radiation emitted from the plural light sources facing the substrate while moving the substrate on which the coating film is formed relatively to the plural light sources, the plural light sources each exhibiting even illuminance along a width direction of the substrate to form a gas barrier layer, and provided is a method of manufacturing a gas barrier film by which the gas barrier film suitable for production coupled with roll-to-roll system, exhibiting excellent gas barrier performance can be prepared.Type: ApplicationFiled: June 23, 2011Publication date: April 18, 2013Applicant: Konica Minolta Holdings, Inc.Inventor: Takahiro Mori
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Publication number: 20130072592Abstract: A cured thin film may be easily prepared, by curing a photocurable silicone resin composition containing: (A) an organopolysiloxane having two or more alkenyl groups within each molecule, (B) an organohydrogenpolysiloxane having two or more hydrogen atoms bonded to silicon atoms within each molecule, and (C) a photoactive catalyst, by: (i) applying the composition to a substrate, (ii) obtaining a thin film in a semi-cured state by irradiating the applied coating with light, and (iii) heating the thin film in a semi-cured state to achieve complete curing, wherein the spectrum of the light irradiated in step (ii) has a maximum peak in a wavelength region from 300 nm to 400 nm, and the spectral irradiance of light of any wavelength within the wavelength region shorter than 300 nm is not more than 5% of the spectral irradiance of light of the maximum peak wavelength.Type: ApplicationFiled: September 14, 2012Publication date: March 21, 2013Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Kenichi INAFUKU, Miyuki WAKAO, Tsutomu KASHIWAGI
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Patent number: 8399068Abstract: The present invention relates to a liquid crystal aligning agent which contains at least one selected from the group consisting of a polysiloxane having a structure represented by the following formula (S-0) and synthesized through the step of hydrolyzing or hydrolyzing/condensing a silane compound in the presence of an alkali metal compound or an organic base, a hydrolysate thereof and a condensate of the hydrolysate: (in the above formula (S-0), R is a group having an alkyl group with 4 to 20 carbon atoms, a fluoroalkyl group with 1 to 20 carbon atoms or a cyclohexyl group, or a group having 17 to 51 carbon atoms and a steroid skeleton, and YI is a hydroxyl group, an alkoxyl group having 1 to 10 carbon atoms, an alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 10 carbon atoms).Type: GrantFiled: August 20, 2008Date of Patent: March 19, 2013Assignee: JSR CorporationInventors: Toshiyuki Akiike, Tsutomu Kumagai, Shoichi Nakata, Kenichi Sumiya, Eiji Hayashi
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Patent number: 8394728Abstract: A film deposition method includes the steps of: coating a solution containing a polysilane compound on a substrate to form a coating film and then carrying out a first thermal treatment in an inert atmosphere, thereby forming the coating film into a silicon film; forming a coating film containing a polysilane compound on the silicon film and then carrying out a second thermal treatment in an inert atmosphere or a reducing atmosphere, thereby forming the coating film into a silicon oxide precursor film; and carrying out a third thermal treatment in an oxidizing atmosphere, thereby forming the silicon oxide precursor film into a silicon oxide film and simultaneously densifying the silicon film.Type: GrantFiled: January 27, 2010Date of Patent: March 12, 2013Assignee: Sony CorporationInventors: Hirotaka Akao, Yuriko Kaino, Takahiro Kamei, Masaki Hara, Kenichi Kurihara
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Patent number: 8394457Abstract: Disclosed is a precursor composition comprising: a compound selected from a compound represented by the formula: Si(OR1)4 and a compound represented by the formula Ra(Si)(OR2)4?a (in the formulas R1 represents a monovalent organic group; R represents a hydrogen atom, a fluorine atom or a monovalent organic group; R2 represents a monovalent organic group; and a is an integer ranging from 1 to 3, provided that R, R1 and R2 may be the same or different from one another) a thermally degradable organic compound; an element having a catalyst activity; urea; and the like. A porous thin film produced from the precursor composition is irradiated with ultraviolet ray, and then subjected to gas-phase reaction with a hydrophobic compound. A porous thin film thus prepared can be used for the manufacture of a semiconductor device.Type: GrantFiled: May 16, 2007Date of Patent: March 12, 2013Assignee: Ulvac, Inc.Inventors: Nobutoshi Fujii, Takahiro Nakayama, Kazuo Kohmura, Hirofumi Tanaka
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Publication number: 20130059105Abstract: Methods for producing an at least partially cured layer by applying a layer including a (meth)acrylate-functional siloxane to a surface of a substrate, and irradiating the layer in a substantially inert atmosphere with a short wavelength polychromatic ultraviolet light source having a peak intensity at a wavelength of from about 160 nanometers to about 240 nanometers to at least partially cure the layer. Optionally, the layer is at a curing temperature greater than 25° C. In some embodiments, the layer has a thickness of about 0.1 micrometers to about 1 micrometer. In certain embodiments, the layer is substantially free of a photoinitiator and/or an organic solvent. In some particular embodiments, irradiating the layer with a short wavelength polychromatic ultraviolet light source takes place in an inert atmosphere including no greater than 50 ppm oxygen. The substantially cured layer may be a release layer or a low adhesion backsize (LAB).Type: ApplicationFiled: August 21, 2012Publication date: March 7, 2013Inventors: Robin E. Wright, Margaux B. Mitera, Richard L. Walter, Jayshree Seth, Janet A. Venne
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Patent number: 8377634Abstract: This invention relates to acrylic functional resin compositions. More particularly, this invention relates to Poly [organ-co-(meth)acryloxyorgano]silsequioxane resins that are curable upon exposure to ultraviolet radiation with photo initiator or upon heating with or without a free radical generator. The resin compositions have high storage stability at room temperature and produces films that are useful as planarization layer, interlayer dielectric, passivation layer, gas permeable layer, negative photoresist, antireflective coating, conformal coating and IC packaging.Type: GrantFiled: June 3, 2005Date of Patent: February 19, 2013Assignee: Dow Corning CorporationInventors: John Dean Albaugh, Gregory Scott Becker, Sina Maghsoodi, Eric Scott Moyer, Sheng Wang, Craig Rollin Yeakle
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Patent number: 8361561Abstract: Provided may be a method of manufacturing a silicon (Si) film by using a Si solution process. According to the method of manufacturing the Si film, the Si film may be manufactured by preparing a Si forming solution. The ultraviolet rays (UV) may be irradiated on the prepared Si forming solution. The Si forming solution may be coated on a substrate and a solvent in the Si forming solution may be coated on the substrate. An electron beam may be irradiated on the Si forming solution from which the solvent is removed.Type: GrantFiled: March 4, 2010Date of Patent: January 29, 2013Assignee: Samsung Electronics Co., Ltd.Inventors: Jung-hyun Lee, Dong-joon Ma
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Publication number: 20130017497Abstract: The present disclosure relates to methods and systems for synthesis of bridged-hydropentacene, hydroanthracene and hydrotetracene from the precursor compounds pentacene derivatives, tetracene derivatives, and anthracene derivatives. The invention further relates to methods and systems for forming thin films for use in electrically conductive assemblies, such as semiconductors or photovoltaic devices.Type: ApplicationFiled: July 2, 2012Publication date: January 17, 2013Applicant: ACADEMIA SINICAInventors: Tahsin J. CHOW, Chung-Chih WU, Ta-Hsien CHUANG, Hsing-Hung HSIEH, Hsin-Hui HUANG
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Publication number: 20130011617Abstract: A versatile silicone resin reflective substrate which exhibits high reflectance of high luminance light from an LED light source over a wide wavelength from short wavelengths of approximately 340-500 nm, which include wavelengths from 380-400 nm near lower limit of the visible region, to longer wavelength in the infra-red region. The silicone resin reflective substrate has a reflective layer which contains a white inorganic filler powder dispersed in a three-dimensional cross linked silicone resin, the inorganic filler powder having a high reflective index than the silicone resin. The reflective layer is formed on a support body as a film, a solid, or a sheet. The silicone resin reflective substrate can be easily formed as a wiring substrate, a packaging case or the like, and can be manufactured at low cost and a high rate of production.Type: ApplicationFiled: December 24, 2010Publication date: January 10, 2013Applicant: ASAHI RUBBER INC.Inventors: Masutsugu Tasaki, Naoto Igarashi, Akira Ichikawa, Tsutomu Odaki, Maimi Yoshida
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Publication number: 20130010245Abstract: The present invention provides a liquid crystal display device that can prevent a decrease in the VHR and image sticking on the display screen because of residual DC voltage, and also can produce favorable alignment conditions; and a production method thereof. The liquid crystal display device of the present invention includes: a pair of substrates; a liquid crystal layer that contains liquid crystal molecules and is disposed between the pair of substrates; and an alignment film that is disposed on a liquid crystal layer side of at least one of the pair of substrates, the alignment film containing a polyamic acid or a polyimide with an imidization ratio of less than 100%, the liquid crystal display device including a monomolecular film on the alignment film.Type: ApplicationFiled: February 24, 2011Publication date: January 10, 2013Applicant: SHARP KABUSHIKI KAISHAInventors: Masanobu Mizusaki, Youhei Nakanishi, Takeshi Noma
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Patent number: 8349911Abstract: Production of a composition based on silanes for the scratch-resistant, hydrophobic, aqueous coating of metals, plastics, chemical products, ceramic materials, concrete and glass.Type: GrantFiled: July 2, 2008Date of Patent: January 8, 2013Assignee: Evonik Degussa GmbHInventor: Adolf Kuehnle
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Patent number: 8304031Abstract: The present invention relates to a liquid crystal aligning agent containing a radiation sensitive polyorganosiloxane which is obtained by reacting at least one selected from the group consisting of a polyorganosiloxane having a recurring unit represented by the following formula (1), a hydrolysate thereof and a condensate of the hydrolysis with a cinnamic acid derivative having at least one group selected from the group consisting of a carboxyl group, a hydroxyl group, —SH, —NCO, —NHR (R is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms), —CH?CH2 and —SO2Cl: (in the formula (1), X1 is a monovalent organic group having an epoxy group, and Y1 is a hydroxyl group, an alkoxyl group having 1 to 10 carbon atoms, an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 20 carbon atoms).Type: GrantFiled: August 20, 2008Date of Patent: November 6, 2012Assignee: JSR CorporationInventors: Toshiyuki Akiike, Tsutomu Kumagai
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Publication number: 20120276394Abstract: A process for producing a resin substrate having a hard coating layer on at least one side of a resin substrate, comprising, in the following order, a step of applying a hard coating composition containing an organopolysiloxane to at least one side of the resin substrate to form a coating film of the composition, and then applying a first heat treatment to the coating film to form a cured film; an irradiation step of applying a Xe2 excimer light irradiation treatment to the cured film in an atmosphere having an oxygen concentration of at most 5 vol %; and a step of applying an oxidation treatment to the cured film obtained by the irradiation step and then further applying a second heat treatment to form the hard coating layer.Type: ApplicationFiled: July 5, 2012Publication date: November 1, 2012Applicant: Asahi Glass Company, LimitedInventors: Kyoko Yamamoto, Takashi Shibuya
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Patent number: 8298622Abstract: Methods for producing a silica aerogel coating by: producing a wet gel formed by the hydrolysis and polymerization of an alkoxysilane having an ultraviolet-polymerizable unsaturated group; organically modifying the wet gel with an organic-modifying agent to obtain an organically modified silica having a modification ratio of 10-30% based on a total amount of Si—OH in the wet gel; coating a dispersion of the organically modified silica on a substrate to form a layer; and subjecting the layer of the organically modified silica to ultraviolet irradiation and baking, wherein the silica aerogel coating includes the organically modified silica and wherein the silica aerogel coating has a refractive index in the range of 1.05-1.2.Type: GrantFiled: April 21, 2006Date of Patent: October 30, 2012Assignee: Pentax Ricoh Imaging Company, Ltd.Inventors: Hiroyuki Nakayama, Kazuhiro Yamada, Yasuhiro Sakai, Maki Yamada
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Patent number: 8298456Abstract: The present invention relates to a silicone resin composition including a silicone resin and metal oxide fine particles dispersed therein, the silicone resin being obtained by reacting a siloxane derivative having at least one selected from the group consisting of an alkoxysilyl group and a silanol group at a molecular end thereof and having a weight-average molecular weight (Mw) as determined by a gel permeation method of 300 to 6,000, with silica fine particles having silanol groups on a surface thereof.Type: GrantFiled: January 31, 2011Date of Patent: October 30, 2012Assignee: Nitto Denko CorporationInventor: Keisuke Hirano
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Patent number: 8277903Abstract: The present disclosure relates to methods and systems for synthesis of bridged-hydropentacene, hydroanthracene and hydrotetracene from the precursor compounds pentacene derivatives, tetracene derivatives, and anthracene derivatives. The invention further relates to are methods and systems for forming thin films for use in electrically conductive assemblies, such as semiconductors or photovoltaic devices.Type: GrantFiled: March 2, 2009Date of Patent: October 2, 2012Assignee: Academia SinicaInventors: Tahsin J. Chow, Chung-Chih Wu, Ta-Hsien Chuang, Hsing-Hung Hsieh, Hsin-Hui Huang
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Patent number: 8268403Abstract: A method of forming an organic silica film includes forming a coating including a silicon compound having an —Si—O—Si— structure and an —Si—CH2—Si— structure on a substrate, heating the coating, and curing the coating by applying ultraviolet radiation.Type: GrantFiled: April 28, 2005Date of Patent: September 18, 2012Assignee: JSR CorporationInventors: Masahiro Akiyama, Hisashi Nakagawa, Tatsuya Yamanaka, Atsushi Shiota, Takahiko Kurosawa
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Publication number: 20120219804Abstract: A layered body (1) is provided in which a first layer (3) is deposited at one side on at least one surface of a resin substrate (2), a second layer (4) is deposited on the other side of the first layer (3) opposite to the one side thereof at which the first layer (3) is deposited on the resin substrate (2), the first layer (3) is a first organic-inorganic hybrid layer containing a (meth)acrylic resin and a silane compound, and the second layer (4) is a second organic-inorganic hybrid layer obtained by curing a composition made of a solution obtained by hydrolysis and condensation using a composition which contains a silane compound (A) containing at least one epoxy group and represented by the following Formula (1), an aluminum alkoxide (B) represented by the following Formula (2) and a tetrafunctional silane compound (C) represented by the following Formula (3): Si(R1)p(OR2)4-p??Formula (1); Al(OR3)3??Formula (2); and Si(OR4)4??Formula (3).Type: ApplicationFiled: February 28, 2011Publication date: August 30, 2012Inventors: Kazuho Uchida, Tsutomu Ando, Daisuke Nakajima, Jiong Liu, Ken Eberts
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Publication number: 20120214003Abstract: This invention relates to a process for applying a shatterproof coating to the surface of a glass item, comprising the following steps: (a) applying, on at least one portion of the surface of a glass item, a polymerisable composition comprising (i) a resin selected from the group consisting of polyurethane resins, polyester resins, acrylic resins, silicone resins and/or their mixes, in water or in an organic solvent; (ii) an adhesion promoter based on an organosilane compound; (iii) possibly a UV photo-initiator; (b) evaporating the water or the organic solvent; (c) polymerising said composition, forming on the glass item a shatterproof coating film capable of containing the dispersion of the glass fragments that may form in the event of the breakage of the item. The process also preferably comprises a step for the application of an additional anti-wear coating film on top of the shatterproof coating.Type: ApplicationFiled: February 16, 2012Publication date: August 23, 2012Applicant: BORMIOLI LUIGI S.P.A.Inventor: Simone Baratta
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Patent number: 8247037Abstract: A coating for metals containing a polysilazane solution or a mixture of polysilazanes of the general formula (I) —(SiR?R?-NR??)n—??(1) wherein R?, R? and R?? are identical or different and independently represent hydrogen or an optionally substituted alkyl, aryl, vinyl or (trialkoxysilyl)alkyl radical, wherein n is a whole number and n is dimensioned in such a way that the polysilazane has a number-average molecular weight of 150 to 150 000 g/mol, in a solvent and at least one catalyst. The invention also relates to a method for the production of the coating.Type: GrantFiled: October 25, 2005Date of Patent: August 21, 2012Assignee: AZ Electronic Materials (Luxembourg) S.a.r.L.Inventors: Stefan Brand, Andreas Dierdorf, Hubert Liebe, Andreas Wacker
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Publication number: 20120183784Abstract: Described is a UV-curable sealant composition, which is preferably a one part sealant. The one part sealant is made from urethane acrylate, acrylate ester, precipitated silica, and photoinitiator. More specifically, the one part sealant is made from about 15-35 weight percent aliphatic and/or alicyclic urethane acrylates, about 40-70 weight percent of acrylate esters, about 0-10 weight percent of precipitated silica, and about 3-8 weight percent of photoinitiator. Also described are methods of applying UV-curable sealant composition to a surface such as a floor and UV curing the UV-curable sealant composition, thereby extending the life of the surface.Type: ApplicationFiled: July 28, 2009Publication date: July 19, 2012Applicant: PHOTOKINETIC COATINGS & ADHESIVES, LLCInventor: Geoffrey Russell
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Patent number: 8221878Abstract: A photocurable coating composition is provided comprising (1) porous or hollow inorganic oxide fine particles, (2) a hydrolytic condensate of a bissilane compound or a cohydrolytic condensate of a bissilane compound and another hydrolyzable organosilicon compound, and (3) a photoacid generator. Due to the presence of voids in the resin, the cured coating has a low refractive index.Type: GrantFiled: February 5, 2010Date of Patent: July 17, 2012Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yuji Yoshikawa, Kazuharu Sato
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Publication number: 20120147323Abstract: Described are methods for covalently attaching one or more functional compounds to an ophthalmic lens. The method involves (a) contacting the lens with a functional compound, wherein the functional compound comprises at least one group capable of forming a covalent bond with the lens upon exposing the lens to irradiation and/or heat; and (b) irradiating and/or heating the lens produced in step (a) to covalently attach the functional compound to the lens. Also described herein are ophthalmic lens produced by the methods described herein.Type: ApplicationFiled: December 13, 2011Publication date: June 14, 2012Inventor: Angelika Maria Domschke
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Publication number: 20120114869Abstract: Disclosed is a film-forming method wherein a manganese-containing film is formed on a substrate having a surface to which an insulating film and a copper wiring line are exposed. The film-forming method includes forming a manganese-containing film on the copper wiring line by a CVD method which uses a manganese compound.Type: ApplicationFiled: January 13, 2012Publication date: May 10, 2012Applicant: TOKYO ELECTRON LIMITEDInventors: Hidenori MIYOSHI, Masamichi Hara