Silicon Containing Coating Supply Or Source Patents (Class 427/568)
  • Patent number: 5428089
    Abstract: Diorganopolysiloxane compositions are provided with excellent heat resistance, especially diorganopolysiloxane compositions that are suitable for synthetic fiber lubricants. The diorganopolysiloxane composition is a mixture of (A) a diorganopolysiloxane oil and (B) an amino-group-containing diorganopolysiloxane, and has an average amino equivalent in the range of 10,000-1,000,000 and a viscosity at 25.degree. C. in the range of 10-100,000 cs.
    Type: Grant
    Filed: July 7, 1994
    Date of Patent: June 27, 1995
    Assignee: Dow Corning Toray Silicon Co., Ltd.
    Inventors: Hiroki Ishikawa, Tsutomu Naganawa, Isao Ona
  • Patent number: 5413820
    Abstract: A reactive ionized cluster beam deposition method according to this invention is embodied by utilizing two vacuum subregions partitioned by a partition wall formed with an opening. A closed heating crucible and an ionization accelerating unit are disposed in one vacuum subregion partitioned by the partition wall. A substrate is also disposed in the other vacuum subregion, and at the same time a reactive gas is introduced thereinto. Degrees of vacuums in the two vacuum subregions partitioned by the partition wall are equal to or different from each other. Particularly, a gas concentration in the latter vacuum subregion is enhanced. Then, the ionized cluster beams formed in the former vacuum subregion are introduced into the latter vacuum subregion via the opening of the partition wall and react to the reactive gas within the latter vacuum subregion. The ionized cluster beams reacting to the reactive gas impinge on the substrate, thereby forming the deposited film on the substrate surface.
    Type: Grant
    Filed: July 28, 1993
    Date of Patent: May 9, 1995
    Assignee: Tokyo Serofan Co., Ltd.
    Inventor: Akira Hayashi
  • Patent number: 5298759
    Abstract: Ultraviolet (UV) light from a lamp (12) or laser (38) is provided for cracking Group V and Group VI species comprising clusters (dimers and tetramers) or metal-organic molecules to form monomers (atoms). The UV radiation interacts with a molecular beam (14) of Group V and Group VI species following their generation in a source cell (16), which may be an effusion source in molecular beam epitaxy (MBE) apparatus, a thermal cracker cell in gas-source MBE apparatus, or a gas injector cell in metal-organic MBE apparatus (MOMBE). As configured, the UV light source and associated elements comprise a unit, termed herein a "photo-cracker cell" (10). The photo-cracker cell includes an elliptical reflective cavity (18), which defines two foci. The source of UV light is located along one focus and the path of the molecular beam is located along the other focus substantially parallel thereto.
    Type: Grant
    Filed: February 19, 1993
    Date of Patent: March 29, 1994
    Assignee: Hughes Aircraft Company
    Inventors: Peter D. Brewer, John A. Roth
  • Patent number: 5281656
    Abstract: The present invention relates to coating compositions comprising a vinyl- or higher alkenyl-enblocked polydiorganosiloxane, a silicon-bonded hydrogen endblocked polydiorganosiloxane, a platinum catalyst, and an inhibitor which increase the release force of pressure sensitive adhesives (PSA's) adhered thereto. The compositions of the present invention can additionally comprise an organohydrogenpolysiloxane crosslinker. The present invention further relates to a method of release control by crosslink density (or bulk modulus) control.
    Type: Grant
    Filed: December 30, 1992
    Date of Patent: January 25, 1994
    Assignee: Dow Corning Corporation
    Inventors: LeRoy E. Thayer, John D. Jones, Eugene D. Groenhof
  • Patent number: 5266398
    Abstract: An amorphous thin film as a solid lubricant having a low coefficient of friction. It is composed of silicon (Si), oxygen (O), carbon (C), and hydrogen (H), and has a composition defined by the formula: Si.sub.x (O.sub.m, C.sub.n, H.sub.l-m-n).sub.1-x where, x=0.03-0.02, m=0.05-0.5, =0.1-0.9, and 0.6.ltoreq.m+n.ltoreq.0.95. This thin film exhibits extremely low friction stably from the beginning of sliding. It has superior wear resistance owing to its high hardness.
    Type: Grant
    Filed: September 17, 1992
    Date of Patent: November 30, 1993
    Assignee: Kabushiki Kaisha Toyota Chuo Kenkyusho
    Inventors: Tatsumi Hioki, Kazuyuki Oguri
  • Patent number: 5244698
    Abstract: A process for forming a deposited film comprises introducing into a film forming space housing a substrate therein an active species (A) formed by decomposition of a compound containing silicon and a halogen and an active species (B) formed from a chemical substance for film formation which is chemically mutually reactive with said active species (A) separately from each other, then providing them with discharge energy and thereby allowing both the species to react chemically with each other to form a deposited film on the substrate.
    Type: Grant
    Filed: April 12, 1991
    Date of Patent: September 14, 1993
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shunichi Ishihara, Shigeru Ohno, Masahiro Kanai, Shunri Oda, Isamu Shimizu