Chemical Deposition From Liquid Contiguous With Substrate Via Electron Beam Or Light (e.g., Photochemical Liquid Deposition, Etc.) Patents (Class 427/581)
  • Patent number: 6368658
    Abstract: Methods and apparatuses for coating medical devices and the devices thereby produced are disclosed. In one embodiment, the invention includes a method comprising the steps of suspending the medical device in an air stream and introducing a coating material into the air stream such that the coating material is dispersed therein and coats at least a portion of the medical device. In another embodiment, the medical devices are suspended in an air stream and a coating apparatus coats at least a portion of the medical device with a coating material. The coating apparatus may include a device that utilizes any number of alternative coating techniques for coating the medical devices. This process is used to apply one or more coating materials, simultaneously or in sequence. In certain embodiments of the invention, the coating materials include therapeutic agents, polymers, sugars, waxes, or fats.
    Type: Grant
    Filed: April 17, 2000
    Date of Patent: April 9, 2002
    Assignee: Scimed Life Systems, Inc.
    Inventors: Marlene Schwarz, Kathleen Miller, Kalpana Kamath
  • Patent number: 6365220
    Abstract: A process for production of an actively antimicrobial surface for a substrate and for use in a biologically dynamic environment, such as for treating and preventing microbial infections, including a film consisting of at least an antimicrobial element and another electrochemically nobler element and which forms multitudinous galvanic cells with electrolyte-containing biological fluids, such as body fluids from wounds, etc., for releasing the antimicrobial element at the surface.
    Type: Grant
    Filed: January 7, 2000
    Date of Patent: April 2, 2002
    Assignee: Nucryst Pharmaceuticals Corp.
    Inventors: Robert Edward Burrell, Aron Marcus Rosenfeld
  • Patent number: 6268025
    Abstract: Patterned dies made of non-conductive resins may be equipped with integrated electrodes in different manners. It is proved to be difficult to produce high-quality electrodes especially in microstructured dies. A patterned plastic die arranged on a carrier plate is filled with a solution of a metal compound. This solution is irradiated through the carrier plate from the back side of the carrier plate using laser light, ultraviolet light or X-rays. The metal compound is transformed in the immediate vicinity of the base of the structure and a metal layer is deposited on the base of the structure forming the electrodes. The method is suitable for a base of the structure forming a coherent or a non-coherent area. Plastic dies containing integrated electrodes are used for electroless or electrophoretic deposition of materials and for electroplating, in all cases starting from the integrated electrodes, and for analytical methods.
    Type: Grant
    Filed: June 17, 1999
    Date of Patent: July 31, 2001
    Assignee: MicroParts Gesellschaft für Mikrostrukturtechnik mbH
    Inventors: Holger Reinecke, Friedolin Franz Nöker
  • Patent number: 6248658
    Abstract: Submicron-dimensioned metallization patterns are formed on a substrate surface by a photolytic process wherein portions of a metal-compound containing fluid layer on the substrate surface which are exposed through a pattern of submicron-sized openings in an overlying exposure mask are irradiated with UV to near X-ray radiation. Photo-decomposition of the metal-containing compound results in selective metal deposition on the substrate surface according to the exposure mask pattern. When liquid, the fluid layer is prevented from contacting the mask surfaces during photolysis in order to prevent closing off of the very small apertures by deposition thereon. The inventive method is of particular utility in forming multi-level, in-laid, “back-end” metallization of high density integrated circuit semiconductor devices.
    Type: Grant
    Filed: January 13, 1999
    Date of Patent: June 19, 2001
    Assignee: Advanced Micro Devices, Inc.
    Inventor: Matthew S. Buynoski
  • Patent number: 6162278
    Abstract: The method of the invention is based on the unique electron-carrying function of a photocatalytic unit such as the photosynthesis system I (PSI) reaction center of the protein-chlorophyll complex isolated from chloroplasts. The method employs a photo-biomolecular metal deposition technique for precisely controlled nucleation and growth of metallic clusters/particles, e.g., platinum, palladium, and their alloys, etc., as well as for thin-film formation above the surface of a solid substrate. The photochemically mediated technique offers numerous advantages over traditional deposition methods including quantitative atom deposition control, high energy efficiency, and mild operating condition requirements.
    Type: Grant
    Filed: May 12, 1999
    Date of Patent: December 19, 2000
    Assignee: UT.sub.-- Battelle, LLC
    Inventor: Zhong-Cheng Hu
  • Patent number: 6162745
    Abstract: A film forming method includes the steps of forming a solution film, by dropwise supplying a solution containing solid contents in a solvent and volatilizing the solvent, and selectively forming a film of the solid contents on a to-be-processed substrate at predetermined areas, the method comprising the steps of selectively irradiating an energy beam onto that substrate surface to allow the substrate surface to be modified and forming a filmed area having a high affinity for the solvent and a non-filmed area having a low affinity for the solvent, dropwise supplying the solution to the substrate surface and forming the solution film, and volatilizing the solvent from the solution film and, by doing so, forming a solid contents film selectively on the substrate surface selectively at filmed areas.
    Type: Grant
    Filed: August 30, 1999
    Date of Patent: December 19, 2000
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shinichi Ito, Katsuya Okumura, Koutarou Sho
  • Patent number: 6117497
    Abstract: A liquid compound or a compound solution is kept in contact with the surface of a solid material, such as a synthetic resin, glass, metal, or ceramic, radiation selected from ultraviolet radiation, visible radiation, and infrared radiation is irradiated on the interface between the surface of the solid material and the liquid compound or compound solution to optically excite the surface of the solid material and the liquid compound or compound solution, thereby effecting substitution with a chemical species in the liquid compound or compound solution, depositing the chemical species, or performing etching with the chemical species.
    Type: Grant
    Filed: July 7, 1997
    Date of Patent: September 12, 2000
    Assignees: Tokai University, Nitto Denko Corporation
    Inventors: Masataka Murahara, Masakatsu Urairi
  • Patent number: 6117487
    Abstract: A process for forming a metal oxide film by means of a chemical vapor deposition system, which comprises using a complex of a .beta.-diketone compound and a group IV metal glycolate, the complex being represented by formula (I): ##STR1## wherein M represents a metal atom of the group IV; R.sup.1 and R.sup.2 each represent a branched alkyl or cycloalkyl group having 4 to 8 carbon atoms; and R.sup.3 represents a straight-chain or branched alkylene group having 2 to 18 carbon atoms.
    Type: Grant
    Filed: March 24, 1999
    Date of Patent: September 12, 2000
    Assignee: Asahi Denka Kogyo Kabushiki Kaisha
    Inventors: Mitsuo Akutsu, Naohiro Kubota, Akifumi Masuko, Naoki Yamada
  • Patent number: 6077617
    Abstract: Disclosed is a system made by a method for depositing rare-earth boride onto the surface of a substrate which is submerged in an organic solution of borane and a rare-earth halide. Application of electromagnetic radiation, preferably in the visible wavelength range, through a mask near the surface of the submerged substrate, drives the formation and deposition of rare-earth boride onto a substrate in desired patterns.
    Type: Grant
    Filed: November 2, 1999
    Date of Patent: June 20, 2000
    Assignee: Board of Regents of the University of Nebraska
    Inventors: Peter A. Dowben, Zenchen Zhong, David J. Sellmyer
  • Patent number: 6033784
    Abstract: A method of immobilizing a ligand (L) to the surface (P) of a carbon-containing substrate material; said method comprising: a photochemical step of linking of one or more photochemically reactive compounds (Q) to a carbon-containing material surface (P); wherein the photochemically reactive compound (Q) is a quinone compound containing a cyclic hydrocarbon, or from 2 to 10 fused cyclic hydrocarbons, with at least two conjugated carbonyl groups; and wherein the photochemical step comprises irradiation of the photochemically reactive compound (Q) with non-ionizing electromagnetic radiation having a wavelength in the range from UV to visible light.
    Type: Grant
    Filed: October 7, 1997
    Date of Patent: March 7, 2000
    Inventors: Mogens Havsteen Jacobsen, Troels Koch
  • Patent number: 6022596
    Abstract: A method is provided for selectively metallizing one or more three-dimensional materials in an electronic circuit package comprising the steps of forming a layer of seeding solution on a surface of the three-dimensional material of interest, exposing this layer to light of appropriate wavelength, resulting in the formation of metal seed on regions of the three-dimensional material corresponding to the regions of the layer of seeding solution exposed to light; removing the unexposed regions of the layer of seeding solution by subjecting the exposed and unexposed regions of the layer of seeding solution to an alkaline solution. Thereafter, additional metal is deposited, e.g., plated, onto the metal seed using conventional techniques. Significantly, this method does not involve the use of a photoresist, or of a corresponding chemical developer or photoresist stripper.
    Type: Grant
    Filed: July 17, 1996
    Date of Patent: February 8, 2000
    Assignee: International Business Machines Corp.
    Inventors: Thomas H. Baum, Luis J. Matienzo, Cindy Reidsema Simpson, Joseph E. Varsik
  • Patent number: 6013338
    Abstract: An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.
    Type: Grant
    Filed: November 10, 1998
    Date of Patent: January 11, 2000
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Takashi Inushima, Shigenori Hayashi, Toru Takayama, Masakazu Odaka, Naoki Hirose
  • Patent number: 6007876
    Abstract: There is disclosed a method for producing polymer articles having highly functionalized surfaces excellent in biocompatibility, by irradiating the surfaces of a polymer article with an ultraviolet laser beam in a solution containing a biopolymer. According to this method, a polymer article that has surfaces with biocompatibility, can be produced.
    Type: Grant
    Filed: March 24, 1998
    Date of Patent: December 28, 1999
    Assignee: Director-General of Agency of Industrial Science and Technology
    Inventor: Hiroyuki Niino
  • Patent number: 6004633
    Abstract: Patterned dies made of non-conductive resins may be equipped with integrated electrodes in different manners. It is proved to be difficult to produce high-quality electrodes especially in microstructured dies. A patterned plastic die arranged on a carrier plate is filled with a solution of a metal compound. This solution is irradiated through the carrier plate from the back side of the carrier plate using laser light, ultraviolet light or X-rays. The metal compound is transformed in the immediate vicinity of the base of the structure and a metal layer is deposited on the base of the structure forming the electrodes. The method is suitable for a base of the structure forming a coherent or a non-coherent area. Plastic dies containing integrated electrodes are used for electroless or electrophoretic deposition of materials and for electroplating, in all cases starting from the integrated electrodes, and for analytical methods.
    Type: Grant
    Filed: October 3, 1996
    Date of Patent: December 21, 1999
    Assignee: Microparts Gesellschaft
    Inventors: Holger Reinecke, Friedolin Franz Noker
  • Patent number: 5989653
    Abstract: An improved additive process for metallization of substrates is described whereby a catalyst solution is applied to a surface of a substrate. Metallic catalytic clusters can be formed in the catalyst solution on the substrate surface by irradiating the substrate. Electroless plating can then deposit metal onto the portion of the substrate surface having metallic clusters. Additional metallization thickness can be obtained by electrolytically plating the substrate surface after the electroless plating step.
    Type: Grant
    Filed: December 8, 1997
    Date of Patent: November 23, 1999
    Assignee: Sandia Corporation
    Inventors: Ken S. Chen, William P. Morgan, John L. Zich
  • Patent number: 5981094
    Abstract: A cubic form of C.sub.3 N.sub.4 with a zero-pressure bulk modulus exceeding that of diamond. The product is prepared by combining carbon and nitrogen at a pressure of 120,000 to 800,000 atmosphere and a temperature of 1000-3000.degree. C.
    Type: Grant
    Filed: December 17, 1996
    Date of Patent: November 9, 1999
    Assignee: The Carnegie Institution of Washington
    Inventors: David M. Teter, Russell J. Hemley
  • Patent number: 5980637
    Abstract: The present invention is generally directed to a process and a system for transforming a liquid into a solid material using light energy. In particular, a solution containing a parent material in a liquid form is atomized in a reaction vessel and directed towards a substrate. The atomized liquid is exposed to light energy which causes the parent material to form a solid coating on a substrate. The light energy can be provided from one or more lamps and preferably includes ultraviolet light. Although the process of the present invention is well suited for use in many different and various applications, one exemplary application is in depositing a dielectric material on a substrate to be used in the manufacture of integrated circuit chips.
    Type: Grant
    Filed: December 20, 1996
    Date of Patent: November 9, 1999
    Assignee: Steag RTP Systems, Inc.
    Inventors: Rajendra Singh, Rahul Sharangpani
  • Patent number: 5932300
    Abstract: A process for the currentless metallization of electrically non-conductive substrates, includes providing a substrate which is electrically non-conductive; depositing on the substrate a positive lacquer comprising at least one polymer which is UV hardenable, at least one organo-metalllic compound, and a substance which is light-active to provide a positive lacquer coated substrate; irradiating the positive lacquer coated substrate with UV radiation to provide an irradiated coated substrate; and precipitating a metal layer onto the irradiated coated substrate by currentless metallization in a bath effective therefore.
    Type: Grant
    Filed: September 8, 1997
    Date of Patent: August 3, 1999
    Assignee: Robert Bosch GmbH
    Inventors: Lothar Weber, Kurt Schmid, Ralf Haug, Dorothee Kling
  • Patent number: 5894038
    Abstract: The present invention is directed to a process for forming a layer of palladium on a substrate, comprising:preparing a solution of a palladium precursor, wherein the palladium precursor consists ofPd(OOCR.sup.1).sub.m (OOCR.sup.2).sub.nwhereinR.sup.1 is hydrogen, alkyl, alkenyl, alkynyl, --R.sup.3 COOH, alkyl from 1 to 5 carbons substituted with one or two hydroxyl groups,R.sup.2 is hydrogen, alkyl, alkenyl, alkynyl, --R.sup.3 COOH, alkyl from 1 to 5 carbon atoms substituted with one or two hydroxyl groups, --CHO,R.sup.3 is alkyl, and alkyl groups from 1 to 5 carbon atoms substituted with one or two hydroxyl groupsm and n are real numbers or fractions, and m+n=2;applying the palladium precursor to the surface of the substrate;decomposing the palladium precursor by subjecting the precursor to heat.
    Type: Grant
    Filed: February 28, 1997
    Date of Patent: April 13, 1999
    Assignee: The Whitaker Corporation
    Inventors: Sunity Kumar Sharma, Kuldip Kumar Bhasin, Subhash C. Narang, Asutosh Nigam
  • Patent number: 5891530
    Abstract: Methods of producing release coatings, adhesives, primers, and other polymeric coatings are described. A method for producing a release coating on a substrate comprises the steps of applying a polymerizable composition comprising a free radically polymerizable ethylenically unsaturated polysiloxane to a surface of a substrate, and exposing the polymerizable composition to a monochromatic light source having a peak intensity at a wavelength of between about 160 nanometers to 240 nanometers to form a release coating. Methods for producing a pressure sensitive adhesive and other polymeric coatings using a monochromatic light source are also described.
    Type: Grant
    Filed: April 19, 1996
    Date of Patent: April 6, 1999
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Robin E. Wright
  • Patent number: 5882435
    Abstract: Solar cells made of crystalline are metal coated. Combined front side and rear side metal coating based on a thick-film process is proposed, in which even very fine thick-film conductor track structures are sufficiently reinforced by photo-induced currentless deposition of a metal. Well adhering improved conductor track structures for the front side metal coating can be produced using the simplified process.
    Type: Grant
    Filed: July 7, 1997
    Date of Patent: March 16, 1999
    Assignee: Siemens Solar GmbH
    Inventor: Konstantin Holdermann
  • Patent number: 5871823
    Abstract: A hydrophilic coating on a polymeric substrate is prepared by subjecting at least one hydrophilic vinyl monomer to radiation-induced graft polymerization on an activated substrate surface.
    Type: Grant
    Filed: June 9, 1997
    Date of Patent: February 16, 1999
    Assignee: Huels Aktiengesellschaft
    Inventors: Christine Anders, Hartwig Hoecker, Doris Klee, Guenter Lorenz
  • Patent number: 5859086
    Abstract: A method is disclosed for modifying a fluoropolymer including the following steps: providing a fluoropolymer surface, adding a solution including a a reactive species to the fluoropolymer surface, and exposing the reduced fluoropolymer surface to ultraviolet radiation in the presence of ozone or oxygen. The method reduces the discoloration of the fluoropolymer.
    Type: Grant
    Filed: August 7, 1997
    Date of Patent: January 12, 1999
    Assignee: Competitive Technologies of PA, Inc.
    Inventors: Michael S. Freund, Lisa M. Regalla, Gang Liu
  • Patent number: 5834069
    Abstract: A semiconductor catalyst is metalized in situ on a reaction support surface by illuminating at least a portion of the catalyst in the presence of a suitable source of metal to selectively deposit the metal on the illuminated portions. The source of metal can be applied to the reaction support surface either with the catalyst or separately, but is not attached to the catalyst until the structure is illuminated. This causes the metal to be deposited where the catalyst will be illuminated during use and therefore where photopromoted catalytic degradation can occur.
    Type: Grant
    Filed: April 30, 1996
    Date of Patent: November 10, 1998
    Assignee: Zentox Corporation
    Inventors: Elliot Berman, Anatoly Grayfer
  • Patent number: 5750212
    Abstract: This invention relates to a process for the application of conducting metallic, structured coatings on glass substrates, for example, for the manufacture of integrated circuits. The invention relies on placing a negative mask of the structure to be applied into the beam path of an excimer laser. After leaving the mask, the laser beam is directed onto a flat silica glass slice, the back side of which is in contact with a reductive copper bath. The process according to this invention requires exposure times no longer than seconds, after which the process proceeds autocatalytically. It can be stopped as soon as the desired coating thickness has been attained.
    Type: Grant
    Filed: July 30, 1992
    Date of Patent: May 12, 1998
    Assignee: LPKF CAD/CAM Systeme GmbH
    Inventor: Jorg Kickelhain
  • Patent number: 5711999
    Abstract: A method is provided for modifying a photosensitive chemical material which controls exposure to make spectral intensity ratio constant, adjusts the pre-tilt angles of a liquid crystal orientation film easily and accurately, and gives desired properties to the photosensitive chemical material. A photosensitive chemical material is patterned by the photochemical reaction of a photosensitive chemical material. The photosensitive chemical material is irradiated with light emitted from a light source having a line spectrum having almost single wavelength between 200 nm and 300 nm (for example, a low pressure mercury lamp or a laser lamp) according to a pattern to control the reaction of the photosensitive chemical material. Also, the photosensitive chemical material is irradiated with light having a wavelength of 300 nm or longer to make the photosensitive chemical material cause a reaction to occur that selectively generates active oxygen.
    Type: Grant
    Filed: August 28, 1996
    Date of Patent: January 27, 1998
    Assignee: International Business Machines Corporation
    Inventors: Fumiaki Yamada, Yoichi Taira
  • Patent number: 5686150
    Abstract: The present invention relates to a process of depositing metals onto various substrates. Applications for which the present invention may be useful include the formation of catalysts such as those used in electrochemical applications, including fuel cells and the like, refining applications such as oil refining, automotive applications such as automotive catalytic converters, and other similar applications.
    Type: Grant
    Filed: December 15, 1994
    Date of Patent: November 11, 1997
    Assignee: Lanxide Technology Company, LP
    Inventor: Roger Lee Ken Matsumoto
  • Patent number: 5635257
    Abstract: The present invention relates to a process for hydrophilizing a porous material made of a fluorine resin comprising irradiating an ultraviolet laser beam on the porous material impregnated with an aqueous solution of hydrogen peroxide or water-soluble organic solvent. According to the process, the chemically and physically inactive surfaces including the inside of the micropores of the porous materials made of fluorine resins can be sufficiently hydrophilized without deteriorating the excellent heat resistance, chemical resistance and the like of the fluorine resins.
    Type: Grant
    Filed: May 5, 1995
    Date of Patent: June 3, 1997
    Assignees: Kurashiki Boseki Kabushiki Kaisha, Japan Atomic Energy, Radiation Application Development Reserch Institute
    Inventors: Masanobu Nishii, Shunichi Kawanishi, Shunichi Sugimoto, Tadaharu Tanaka, Mitsuru Sano
  • Patent number: 5614269
    Abstract: A method of making a water absorptive article comprising, a fibrous substrate impregnated with a water absorptive, water insoluble polymer, wherein the polymer is intertwined and interlocked with fibers of the fibrous substrate, and the article has high water absorbing capacity.
    Type: Grant
    Filed: December 13, 1994
    Date of Patent: March 25, 1997
    Assignee: Interface, Inc.
    Inventors: Martin G. Hoskins, Connie Hensler
  • Patent number: 5605723
    Abstract: A pattern of a non-volatile high-performance ferroelectric thin film memory is formed by applying a composition containing hydrolytic metal compounds, and a photosensitizer which generates water when irradiated with active rays onto a substrate. The resultant film is exposed to active rays in compliance with a prescribed pattern to form an image and developed with a solvent to remove non-exposed portions, and then the remaining exposed portions are subjected to a heat treatment to convert the exposed portions into a dielectric substance comprising a metal oxide as expressed by the following formula (I):(Bi.sub.2 O.sub.2).sup.2+ (A.sub.m-1 B.sub.m O.sub.3m+1).sup.2-(I)where A is one or more elements selected from the group consisting of Ba, Sr, Pb and Bi; B is one or more elements selected from the group consisting of Ti, Nb and Ta; and m is an integer of from 2 to 5.
    Type: Grant
    Filed: May 2, 1995
    Date of Patent: February 25, 1997
    Assignee: Mitsubishi Materials Corporation
    Inventors: Katsumi Ogi, Tsutomu Atsuki, Hiroto Uchida, Tadashi Yonezawa, Nobuyuki Soyama
  • Patent number: 5603991
    Abstract: This invention is in the general field of surgical instruments and, in particular, catheters. Specifically, it relates to procedures for coating the interior surfaces of surgical devices with a cross-linkable lubricious polymer, preferably one which is hydrophilic. These catheters may be variously used in cardiovascular and endovascular procedures to deliver diagnostic, therapeutic, or vaso-occlusive agents or devices to a target site within a human or animal body and to catheters used to guide other catheters to a particular site in that body. The interior of the catheters are coated using the noted procedure in such a way that the interior is exceptionally slippery and very durable.
    Type: Grant
    Filed: September 29, 1995
    Date of Patent: February 18, 1997
    Assignee: Target Therapeutics, Inc.
    Inventors: David Kupiecki, Thuzar K. Han
  • Patent number: 5595790
    Abstract: An effective non-specular reflector, for use in a Liquid Crystal Display, is formed by first coating a substrate with a two component solution. One component hardens when heated or when exposed to ultraviolet light (optionally through a mask) while the other component remains liquid. The result is a solid layer in which are dispersed multiple liquid regions, some of which break the surface where they are easily removed, leaving behind a roughened surface. Once a high reflectance metal has been deposited onto this surface it becomes an effective nonspecular reflector. Examples of materials for use as the two components are given.
    Type: Grant
    Filed: June 21, 1996
    Date of Patent: January 21, 1997
    Assignee: Industrial Technology Research Institute
    Inventor: Chung-Kuang Wei
  • Patent number: 5582955
    Abstract: Methods for covalently modifying surfaces of various substrates are disclosed, along with various substrates having surfaces modified by such methods. Candidate surfaces include various polymeric, siliceous, metallic, allotrophic forms of carbon, and semiconductor surfaces. The surfaces are exposed to a reagent, having molecules each comprising a nitrenogenic group and a functionalizing group, in the presence of energized charged particles such as electrons and ions, photons, or heat, which transform the nitrenogenic reagent to a nitrene intermediate. The nitrene covalently reacts with any of various chemical groups present on the substrate surface, thereby effecting nitrene addition of the functionalizing groups to the substrate surface. The functionalizing groups can then participate in downstream chemistry whereby any of a large variety of functional groups, including biological molecules, can be covalently bonded to the surface, thereby dramatically altering the chemical behavior of the surface.
    Type: Grant
    Filed: June 26, 1995
    Date of Patent: December 10, 1996
    Assignee: State of Oregon Acting by and through the State Board of Higher Education on Behalf of the University of Oregon
    Inventors: John F. W. Keana, Martin N. Wybourne, Sui X. Cai, Mingdi Yan
  • Patent number: 5534104
    Abstract: In a method for producing a three-dimensional object by successive solidification of superposed layers of the object a deformation of the object caused by shrinkage during the solidification shall be reduced. To this end first of all respective partial regions (6a . . . 6k) of a layer are solidified and simultaneously connected with underlying partial regions of the previously solidified layer to form multilayered cells and thereafter adjacent partial regions of the same layer are interconnected by solidifying narrow connecting regions (8a . . . 8p). The intermediate regions (7) between the individual partial regions are solidified by post-curing.
    Type: Grant
    Filed: May 25, 1994
    Date of Patent: July 9, 1996
    Assignee: EOS GmbH Electro Optical Systems
    Inventors: Hans J. Langer, Johannes Reichle
  • Patent number: 5534311
    Abstract: Structures having a controlled three-dimensional geometry are deposited by lectrostatically focused deposition using charged particle beam and gaseous precursors, or polarizable precursors with or without a charged particle beam. At least one apertured electrode is electrically biased with respect to the substrate surface. The resulting electrostatic field and field gradient focuses the charged particle beam or polarizable gaseous precursor molecules, and controls the three-dimensional geometry of the deposited structure. By this method, an array including many deposited structures may be simultaneously deposited on a single substrate. Thus, the disclosed method provides a fact and simple way of fabricating one or more arrays of three-dimensional structures. The method is particularly useful in the fabrication of arrays of sharp-tipped, cone-shaped conductive structures, such as field emitter tips and contacts.
    Type: Grant
    Filed: May 31, 1995
    Date of Patent: July 9, 1996
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Jonathan L. Shaw, Henry F. Gray
  • Patent number: 5534312
    Abstract: A photoresist-free method for making patterned films of metal oxides, metals, or other metal containing compounds is described. The method involves applying an amorphous film of a metal complex to a substrate. The film may be conveniently applied by spin coating using standard industry techniques. The metal complex used is photoreactive and undergoes a low temperature chemical reaction in the presence of light of a suitable wavelength. The end product of the reactions depends upon the atmosphere in which the reactions take place. Metal oxide films may be made in air. Patterned films may be made by exposing only selected portions of the film to light. Patterns of two or more materials may be laid down from the same film by exposing different parts of the film to light in different atmospheres. The resulting patterned film is generally planar. Separate planarization steps are not generally required.
    Type: Grant
    Filed: November 14, 1994
    Date of Patent: July 9, 1996
    Assignee: Simon Fraser University
    Inventors: Ross H. Hill, Bentley J. Palmer, Alfred A. Avey, Jr., Sharon L. Blair, Chu-Hui W. Chu, Meihua Gao, Wai L. Law
  • Patent number: 5525377
    Abstract: Doped encapsulated semiconductor nanoparticles of a size (<100 .ANG.) which exhibit quantum effects. The nanoparticles are precipitated and coated with a surfactant by precipitation in an organometallic reaction. The luminescence of the particles may be increased by a further UV curing step.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: June 11, 1996
    Assignee: U.S. Philips Corporation
    Inventors: Dennis Gallagher, Rameshwar Bhargava, Jacqueline Racz
  • Patent number: 5512162
    Abstract: The invention is a method for making a metal containing article, comprising the steps of: providing a layer of a porous ground in a selected area; exposing selected regions of the layer of porous ground to light, thereby metallizing the selected regions; repeating the foregoing steps a selected number of times to produce a selected number of layers; and selectively modifying the metallized regions of the layers. The initial metallization can be by electroless or semiconductor photo deposition plating. The subsequent modification of the metallized regions can be by electroless plating, electroplating or sintering. It is also possible, in some instances, to forego the second phase modification, the initial phase having provided the desired parameters. In a third preferred embodiment, the invention is a method using an initial metallization phase effected by exposure of a metal salt, such as a metal halide, to light, thereby inducing activation of the halide.
    Type: Grant
    Filed: August 13, 1992
    Date of Patent: April 30, 1996
    Assignee: Massachusetts Institute of Technology
    Inventors: Emanuel Sachs, Che-Chih Tsao
  • Patent number: 5506007
    Abstract: A process for polymerizing a free-radically polymerizable composition comprising the steps:(a) coating a coatable free-radically polymerizable mixture onto at least one major surface of a web;(b) deoxygenating a liquid inerting medium;(c) immersing the coated web into the deoxygenated liquid inerting medium; and(d) irradiating the immersed coated web with actinic radiation sufficient to effect polymerization of the free-radically polymerizable mixture, while maintaining the liquid inerting medium in an essentially oxygen-free state.
    Type: Grant
    Filed: August 2, 1995
    Date of Patent: April 9, 1996
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Jerry W. Williams, George V. D. Tiers, Jeanne M. Goetzke, Gerald L. Uhl
  • Patent number: 5486384
    Abstract: Process for producing a multi-layer lacquer coating by the application of a coat of clear lacquer including coating agents which are curable exclusively by polymerization in radicalic and/or cationic manner to a dried or crosslinked colored and/or effect-producing basecoat film process is performed in light having a wavelength of over 550 nm or subject to the exclusion of light. The application step is followed by initiation or implementation of curing of the clear-lacquer film by high-energy radiation. The process is particularly suitable for producing multi-layer lacquer coatings in the automobile industry.
    Type: Grant
    Filed: November 5, 1993
    Date of Patent: January 23, 1996
    Assignee: Herberts GmbH
    Inventors: Udo Bastian, Manfred Stein
  • Patent number: 5470617
    Abstract: The present invention relates to a process for modifying the surfaces of the molded materials made of fluorine resins comprising irradiating an ultraviolet laser beam on said surfaces in the presence of an ultraviolet-absorbing compound and a fluorosurfactant. According to the process, the adhesive and wetting properties and the like of the surfaces of the molded materials made of fluorine resins can be remarkably improved.
    Type: Grant
    Filed: October 14, 1994
    Date of Patent: November 28, 1995
    Assignee: Kurashishiki Boseki Kabushiki Kaisha
    Inventors: Masanobu Nishii, Yuichi Shimizu, Shunichi Kawanishi, Shunichi Sugimoto, Masao Endo, Tomohiro Nagase
  • Patent number: 5449534
    Abstract: An anti-reflection film is produced on the panel surface of a cathode-ray tube by:(A) preparing a solution for forming an anti-reflection film, which contains water and a metal alkoxide having the formula,M(OR).sub.nwherein M is a metal selected from the group consisting of Si, Ti, Al, Zr, Sn, In, Sb and Zn; R is an alkyl group having 1-10 carbon atoms; n is an integer of from 1 to 8; and when n is not 1, the alkyl groups represented by R may be the same or different,(B) coating the solution for forming an anti-reflection film on the outermost surface of the panel of a cathode-ray tube, and(C) applying an ultraviolet light to the solution for forming an anti-reflection film coated on said surface to cure the solution to form a transparent film with fine roughness.
    Type: Grant
    Filed: September 9, 1992
    Date of Patent: September 12, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Tomoji Oishi, Sachiko Maekawa, Akira Kato, Masahiro Nishizawa, Yoshifumi Tomita, Kojiro Okude, Kenji Tochigi, Yutaka Misawa
  • Patent number: 5443672
    Abstract: A process is disclosed for coating a circuit board with a photopolymerizable material which is applied by extension at temperatures of 100.degree. to 180.degree. C. followed by distributing the material under pressure by a roller.
    Type: Grant
    Filed: October 4, 1994
    Date of Patent: August 22, 1995
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Reiner Stoll, Britta Schulmeyer
  • Patent number: 5429908
    Abstract: A method for reducing curl in three dimensional computer generated models, created by the sequential exposure of adjacent layers of a photoformable composition, comprising exposing each layer twice, the first exposure being with an image modulated exposure further modulated to produce a series of isolated, anchored islets along the imaged areas, and the second exposure also being image modulated but without the additional modulation, so as to fuse the islets into a continuous solid image.
    Type: Grant
    Filed: April 12, 1993
    Date of Patent: July 4, 1995
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Bronson R. Hokuf, John A. Lawton
  • Patent number: 5424252
    Abstract: An electroless metal or alloy plating solution as a photo-plating solution contains at least one of copper, nickel, cobalt or tin, and a sacrificial reagent which supplies electrons as a result of irreversible oxidative decomposition. A semiconductor is supported on a substrate, and dipped in the photo-plating solution, and the surface of the semiconductor is irradiated with light having a higher level of energy than the exciting energy of the semiconductor. A thick coating containing at least one of copper, nickel, cobalt or tin can be formed on that portion of the semiconductor which has been irradiated with light.
    Type: Grant
    Filed: November 16, 1993
    Date of Patent: June 13, 1995
    Assignee: Kabushiki Kaisha Toyota Chuo Kenkyusho
    Inventor: Shinya Morishita
  • Patent number: 5419968
    Abstract: The invention provides surface-modified hydrophilic fluororesin moldings. The surface of a fluororesin molding is at least partly hydrophilized by irradiating at least part of the fluororesin molding with ultraviolet laser light not longer than 400 nm in wavelength in a state such that the molding is in contact with gas-treated water prepared by introducing into water a gas such as hydrogen gas, nitrogen gas or a rare gas or with some other specific aqueous liquid. The thus-obtained fluororesin moldings are suited for use, for example, as materials of artificial blood vessels excellent in antithrombotic property, and contact lenses free of modification-due discoloration. Further, they are expected to find a wider range of application where their performance characteristics are to be utilized.
    Type: Grant
    Filed: February 4, 1994
    Date of Patent: May 30, 1995
    Assignees: Gunze Limited, Japan Atomic Energy Research Institute, Radiation Application Development Association
    Inventors: Atsushi Okada, Yuichi Shimizu, Shunichi Kawanishi, Masanobu Nishii, Shunichi Sugimoto
  • Patent number: 5411770
    Abstract: The surface of stainless steel can be hardened by coating a silicon nitride gel and then scanning by CO.sub.2 laser to form a surface alloy layer thereon. The thickness and hardness of the surface alloy layer are both uniform. The Vicker's hardness of the layer can be as high as 1200 Hv. This method can be operated in a common atmosphere or nitride atmosphere at normal pressure, therefore it is more economic than ion nitriding or plasma nitriding.
    Type: Grant
    Filed: June 27, 1994
    Date of Patent: May 2, 1995
    Assignee: National Science Council
    Inventors: Wen-Ta Tsai, Ju-Tung Lee, Tai-Hwang Lai
  • Patent number: 5405656
    Abstract: The present invention relates to a solution for catalytic treatment, which is effective for applying a catalyst-metal onto the surface of a substrate, which can provide a film having excellent properties such as adhesion, precision and selectivity through electroless plating or the like, and which does not cause a premature and undesirable decomposition in a bath. The solution for catalytic treatment comprises a catalyst-metal in the form of ions, which permits the deposition of the metal serving as a catalyst on a substrate by applying the solution onto the surface of the substrate and then irradiating the substrate with light rays. The present invention also relates to a method of applying a catalyst onto a substrate and a method of forming an electrical conductor in which such a solution for catalytic treatment is employed.
    Type: Grant
    Filed: December 3, 1993
    Date of Patent: April 11, 1995
    Assignee: Nippondenso Co., Ltd.
    Inventors: Futoshi Ishikawa, Koji Kondo, Masahiro Irie
  • Patent number: 5378508
    Abstract: A method for providing a conductive metal deposit on the surface of a dielectric substrate by applying a composition comprising a mixture of a salt and amine or amide compound to the substrate and subjecting the composition to a continuous wavelength laser beam.
    Type: Grant
    Filed: April 1, 1992
    Date of Patent: January 3, 1995
    Assignees: Akzo Nobel N.V., Northwestern University
    Inventors: Anthony J. Castro, Richard P. Van Duyne, King C. Sheng, Robert J. Bianchini, William J. Parr, Ralph Franklin, Michael J. Natan
  • Patent number: 5362525
    Abstract: A process for modifying surfaces of fluorine resins including irradiating an ultraviolet laser beam on the surfaces in the presence of an inorganic silicon compound. The inorganic silicon compound could be a silicate, silicon oxide, silicon nitride, or silicon carbide.
    Type: Grant
    Filed: December 7, 1993
    Date of Patent: November 8, 1994
    Assignees: Kurashiki Boseki Kabushiki Kaisha, Japan Atomic Energy Research Institute, Radiation Application Development Association
    Inventors: Masanobu Nishii, Yuichi Shimizu, Shunichi Kawanishi, Shunichi Sugimoto, Tadaharu Tanaka, Yosuke Eguchi