Abstract: A method of manufacturing a pellicle for a lithographic apparatus, the method including locally heating the pellicle using radiative heating, and depositing coating material simultaneously on both sides of the pellicle, and pellicles manufactured according to this method. Also disclosed is the use of a multilayer graphene pellicle with a double-sided hexagonal boron nitride coating in a lithographic apparatus.

Abstract: The present invention relates to a method for forming an amorphous layer on one surface of a second substrate through a simple method of performing laser irradiation on a multilayered metal layer provided on a first substrate.

Abstract: A fluid jet ejection device, a method of making a fluid jet ejection head, and a method of improving the plume characteristics of fluid ejected from the fluid jet ejection head. The pharmaceutical drug delivery device includes a cartridge body; and a fluid jet ejection cartridge disposed in the cartridge body. The fluid jet ejection cartridge contains a fluid and an ejection head attached to the fluid jet ejection cartridge. The ejection head contains a plurality of fluid ejectors thereon and a nozzle plate having a plurality of fluid ejection nozzles therein associated with the plurality of fluid ejectors. At least one of the plurality of fluid ejection nozzles has an orthogonal axial flow path relative to a plane defined by the nozzle plate and at least one of the plurality of fluid ejection nozzles has an angled axial flow path relative to a plane define by the nozzle plate.

Abstract: A high-pressure processing system for processing a layer on a substrate includes a first chamber, a support to hold the substrate in the first chamber, a second chamber adjacent the first chamber, a foreline to remove gas from the second chamber, a vacuum processing system configured to lower a pressure within the second chamber to near vacuum, a valve assembly between the first chamber and the second chamber to isolate the pressure within the first chamber from the pressure within the second chamber, a gas delivery system configured to increase the pressure within the first chamber to at least 10 atmospheres while the first chamber is isolated from the second chamber, an exhaust system comprising an exhaust line to remove gas from the first chamber, and a common housing surrounding both the first gas delivery module and the second gas delivery module.

Abstract: A method of manufacturing a mold includes the processes of: arranging a channel member in a recessed groove formed on a surface of a mold body; irradiating an opening part of the recessed groove with a first laser, thereby performing a first build-up welding on a part in the vicinity of the opening part of the recessed groove; and irradiating a region on a surface of the mold body including a region where the first build-up welding has been performed with a second laser, thereby performing a second build-up welding on a region on the surface of the mold body including the region where the first build-up welding has been performed.

Abstract: Methods of embedding a heating circuit in an article fabricated by additive manufacturing. The methods describe techniques such as co-extruding a wire, capable of being heated, along with print material in additive manufacturing of the article, and placing a pre-shaped wire capable of being heated between adjacent layers of the article. A third method includes dispensing a wire, capable of being heated, during the additive manufacturing of the article, and compacting the wire into the printed material. An apparatus for embedding a heating circuit in an article fabricated by additive manufacturing. The apparatus contains a wire dispenser, a cutter to control the length of the wire dispensed, and a compactor capable of embedding the wire capable of being heated into the printed material. An article made by additive manufacturing is disclosed. The article contains at least one heating element embedded in the article during the additive manufacturing process.

Abstract: An additive manufacturing method and machine for an object using at least one powder, capable of limiting risks of dissemination of the powder. The method including the following steps in succession: manufacture a solid block starting from the powder and a sublimatable material, load the solid block in a loading space of the machine; sublimate the material present in the solid block and recover the powder; and additive manufacturing of the object by stacking successive layers made using the powder recovered in the previous step.

Abstract: To better control part quality of 3D printed parts, the temperature of an extruder filament using a secondary heat source is provided. A heat source, such as an infrared heat source, can be used to heat the filament of a 3D printer to the optimum temperature that will enhance welding of the filament to a substrate that it is being printed on or to. Such an optimum temperature can be based upon, in part, the temperature of the substrate. A controller or other intelligent control can be used to receive temperature readings of the substrate and/or filament and then can adjust the temperature of the heating source to optimize the temperature of the filament to better combine the filament to the substrate.

Abstract: Provided are methods and systems for fabricating multimaterial bodies in a layer-wise fashion, which bodies may be used bone-stabilizing implants. The multimaterial bodies include rigid and flexible portions that are integrally formed with one another. The multimaterial bodies may be softened or stiffened in specific areas to match the biological or anatomical features of a bone.

Abstract: There is provided a production method which enables stable formation of a p-type zinc oxide film and also is suitable for enlarging the area of the film. The method for producing a p-type zinc oxide film according to the present invention comprises the steps of: placing a target containing a zinc source and a substrate in a gas atmosphere containing a nitrogen source and an oxygen source and having a gas pressure of 0.1 Pa to 100 Pa, and exposing the target to arc discharge, thereby forming a precursor film containing zinc and oxygen on the substrate; and annealing the precursor film in an oxidizing atmosphere, thereby forming a p-type zinc oxide film.

Abstract: Provided is a method of manufacturing a semiconductor device, which is capable of increasing the controllability of the concentration of carbon in a film by increasing the yield when a boron carbonitride film or a boron nitride film is formed. The method includes forming a film containing boron, carbon and nitrogen or a film containing boron and nitrogen on the substrate by performing, a predetermined number of times, a cycle including supplying a source gas consisting of boron and a halogen element to a substrate and supplying a reactive gas consisting of carbon, nitrogen and hydrogen to the substrate.

Abstract: A process for stabilizing laser energy density on a target surface during pulsed laser deposition of thin films controls the focused laser spot on the target. The process involves imaging an image-aperture positioned in the beamline. This eliminates changes in the beam dimensions of the laser. A continuously variable attenuator located in between the output of the laser and the imaged image-aperture adjusts the energy to a desired level by running the laser in a “constant voltage” mode. The process provides reproducibility and controllability for deposition of electronic thin films by pulsed laser deposition.

Abstract: The present application provides a method for producing a graphene quantum dot using thermal plasma, comprising injecting a carbon source into a thermal plasma jet to pyrolyze the carbon source so as to form a carbon atomic beam and allowing the carbon atomic beam to flow in a tube connected to an anode to produce a graphene quantum dot.

Abstract: A fuel cell module and a method manufacturing the same that improves a contact structure of the inter-connectors to prevent gas leaks, thereby to improving the performance and the durability of the unit cell. The fuel cell module includes a plurality of inter-connectors, wherein at least one of the inter-connectors has a first face contacting a first electrode layer, a second face opposing the first face, and third and fourth faces connecting the first face to the second face, respectively, wherein at least a portion of the at least one of the inter-connectors also contacts an electrolytic layer, wherein a length of the first face of the at least one of the inter-connectors is 20% to 80% of a length of the second face.

Abstract: An optical filter for use in high temperature and rapid changing temperature environments, and method of making the same is provided. The optical filter includes a substrate and a filter layer disposed on the substrate. The filter layer has a porous columnar micro-structure configured to decouple the thermal expansion stress between the substrate and the filter layer when the optical filter is subjected to high temperature. The filter layer may be formed of a material conducive to physical vapor deposition, such as metallic oxide. The filter layer is deposited onto the substrate at an angle.

Abstract: Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces are disclosed herein. In one embodiment, a method includes depositing molecules of a gas onto a microfeature workpiece in the reaction chamber and selectively irradiating a first portion of the molecules on the microfeature workpiece in the reaction chamber with a selected radiation without irradiating a second portion of the molecules on the workpiece with the selected radiation. The first portion of the molecules can be irradiated to activate the portion of the molecules or desorb the portion of the molecules from the workpiece. The first portion of the molecules can be selectively irradiated by impinging the first portion of the molecules with a laser beam or other energy source.

Abstract: A lead-lanthanum-zirconium-titanate (PLZT) capacitor on a substrate formed of glass. The first metallization layer is deposited on a top side of the substrate to form a first electrode. The dielectric layer of PLZT is deposited over the first metallization layer. The second metallization layer deposited over the dielectric layer to form a second electrode. The glass substrate is advantageous as glass is compatible with an annealing process used to form the capacitor.

Abstract: A method for forming a manganese-containing film to be formed between an underlayer and a copper film includes reacting a manganese compound gas with a nitrogen-containing reaction gas to form a nitrogen-containing manganese film on the underlayer; and reacting a manganese compound gas with a reducing reaction gas, thermally decomposing a manganese compound gas, or performing a decomposition reaction on a manganese compound gas through irradiation of energy or active species to form a metal manganese film on the nitrogen-containing manganese film.

Abstract: A stacked substrate is produced using an apparatus including an injector head device. Production includes the steps of providing an injector head device comprising a gas bearing pressure arrangement and injecting bearing gas against opposite substrate surfaces, to balance the substrate without support in a conveying plane in the injector head device. The following steps are performed iteratively: contacting opposite substrate surfaces with a first precursor gas; and with a second precursor gas, first and second precursor gases supplied in first and second deposition spaces are arranged opposite and facing respective sides of the substrate; establishing relative motion between the deposition space and the substrate in the conveying plane; and providing at least one of a reactant gas, plasma, laser-generated radiation, and/or ultraviolet radiation, in any or both reactant spaces for reacting any of the first and second precursor gas after deposition on at least part of the substrate surface.

Abstract: An atmospheric, Laser-based Chemical Vapor Deposition (LCVD) technique provides highly localized deposition of material to mitigate damage sites on an optical component. The same laser beam can be used to deposit material as well as for in-situ annealing of the deposited material. The net result of the LCVD process is in-filling and planarization of a treated site, which produces optically more damage resistant surfaces. Several deposition and annealing steps can be interleaved during a single cycle for more precise control on amount of deposited material as well as for increasing the damage threshold for the deposited material.

Abstract: An ultra-short pulse laser physically and/or chemically modifies a substrate surface. A laser ablation process is configured to form raised surface features on the substrate. The laser also functions as the energy source in a chemical vapor deposition (CVD) process. The laser delivers energy to the substrate with parameters such as pulse energy, size, duration, and spacing sufficient to simultaneously vaporize substrate material and cause the substrate material to react with a controlled environment that includes constituents of a desired coating composition. A battery electrode having a face with microneedle features coated with an active metal compound can be produced by the process. The active metal compound is a lithium-containing compound in a lithium-ion battery.

Abstract: An epitaxial reactor enabling simultaneous deposition of thin films on a multiplicity of wafers is disclosed. During deposition, a number of wafers are contained within a wafer sleeve comprising a number of wafer carrier plates spaced closely apart to minimize the process volume. Process gases flow preferentially into the interior volume of the wafer sleeve, which is heated by one or more lamp modules. Purge gases flow outside the wafer sleeve within a reactor chamber to minimize wall deposition. In addition, sequencing of the illumination of the individual lamps in the lamp module may further improve the linearity of variation in deposition rates within the wafer sleeve. To improve uniformity, the direction of process gas flow may be varied in a cross-flow configuration. Combining lamp sequencing with cross-flow processing in a multiple reactor system enables high throughput deposition with good film uniformities and efficient use of process gases.

Abstract: A film-formation method whereby a minute pattern thin film can be formed on a deposition substrate, without provision of a mask between a material and the deposition substrate. Moreover, a light-emitting element is formed by such a film-formation method, and a high-definition light-emitting device can be manufactured. Through a film-formation substrate in which a reflective layer, a light-absorbing layer and a material layer are formed, the light-absorbing layer is irradiated with light, so that a material contained in the material layer is deposited on a deposition substrate which is disposed to face the film-formation substrate. Since the reflective layer is selectively formed, a film to be deposited on the deposition substrate can be selectively formed with a minute pattern reflecting the pattern of the reflective layer. A wet process can be employed for formation of the material layer.

Abstract: Graphene is used as a replacement for indium tin oxide as a transparent conductive electrode which can be used in an organic light emitting diode (OLED) device. Using graphene reduces the cost of manufacturing OLED devices and also makes the OLED device extremely flexible. The graphene is chemically doped so that the work function of the graphene is shifted to a higher value for better hole injection into the OLED device as compared to an OLED device containing an undoped layer of graphene. An interfacial layer comprising a conductive polymer and/or metal oxide can also be used to further reduce the remaining injection barrier.

Abstract: A transparent conductive electrode stack containing a work function adjusted carbon-containing material is provided. Specifically, the transparent conductive electrode stack includes a layer of a carbon-containing material and a layer of a work function modifying material. The presence of the work function modifying material in the transparent conductive electrode stack shifts the work function of the layer of carbon-containing material to a higher value for better hole injection into the OLED device as compared to a transparent conductive electrode that includes only a layer of carbon-containing material and no work function modifying material.

Abstract: Three dimensional optical structures are described that can have various integrations between optical devices within and between layers of the optical structure. Optical turning elements can provide optical pathways between layers of optical devices. Methods are described that provide for great versatility on contouring optical materials throughout the optical structure. Various new optical devices are enabled by the improved optical processing approaches.

Abstract: An apparatus for atomic layer deposition of a material on a moving substrate comprises a conveying arrangement for moving a substrate along a predetermined planar or curved path of travel and a coating bar having at least one precursor delivery channel. The precursor delivery channel conducts a fluid containing a material to be deposited on a substrate toward the path of travel. When in use, a substrate movable along the path of travel defines a gap between the outlet end of the precursor delivery channel and the substrate. The gap defines an impedance Zg to a flow of fluid from the precursor delivery channel. A flow restrictor is disposed within the precursor delivery channel that presents a predetermined impedance Zfc to the flow therethrough. The restrictor is sized such that the impedance Zfc is at least five (5) times, and more preferably at least fifteen (15) times, the impedance Zg. The impedance Zfc has a friction factor f.

Abstract: A method for applying a fixed image onto at least one surface of a component in an electrochemical device is described. The component is usually formed of an alumina material. An image-forming material is first applied onto the component surface in its green state. The mark or image is applied in a desired pattern by an additive process, such as direct-write or screen-printing. The component is then heated at a sintering temperature sufficient to ensure conversion from the green state into a fired ceramic state. The sintering temperatures are also sufficient to fix the image upon the surface of the component. The image can be read by the human eye, or by various machine-readable techniques. Related methods for monitoring the location and status of a ceramic electrochemical cell component during its manufacture and during other processing steps are also described.

Abstract: Apparatus for atomic layer deposition on a surface of a sheeted substrate, comprising: an injector head comprising a deposition space provided with a precursor supply and a precursor drain; said supply and drain arranged for providing a precursor gas flow from the precursor supply via the deposition space to the precursor drain; the deposition space in use being bounded by the injector head and the substrate surface; a gas bearing comprising a bearing gas injector, arranged for injecting a bearing gas between the injector head and the substrate surface, the bearing gas thus forming a gas-bearing; a conveying system providing relative movement of the substrate and the injector head along a plane of the substrate to form a conveying plane along which the substrate is conveyed.

Abstract: A system or method for applying a protective environmental coating for a gas turbine component. The coating includes a bond layer applied to a substrate comprised of a ceramic matrix composite material and environmental barrier coating layers. The first environmental barrier coating layer is bonded to the substrate by the bond layer. The bond layer comprises silicon and particles consisting of particles of Lanthanum or Cerium.

Abstract: The present invention provides a method of making a high temperature superconductor having a doped, nanoparticulate pinning structure. The method includes providing a nanoparticulate pinning material, providing a cuprate material, doping the nanoparticulate pinning material with a dopant to form a doped nanoparticulate material, depositing a layer of the cuprate material on a substrate, and depositing a layer of the doped nanoparticulate material on the layer of cuprate material. The invention also provides a high temperature superconductor (HTS) having a doped, nanoparticulate pinning structure including a plurality of layers of a cuprate material and a plurality of layers of a doped nanoparticulate pinning material. At least one layer of the doped nanoparticulate pinning material is stacked between two layers of the cuprate material.

Abstract: A method of depositing a material on a work piece surface. The method comprising providing a deposition precursor gas at the work piece surface; providing a purification compound including a nitrogen-containing compound at the work piece surface; and directing a beam toward a local region on the work piece surface, the beam causing decomposition of the precursor gas to fabricate a deposit on the work piece surface, the deposited material including a contaminant, the purification compound causing a reduction in the concentration of the contaminant and providing a deposited material that includes less contamination than a material deposited using the same methodology but without using a purification compound.

Abstract: An apparatus and method is disclosed for synthesizing graphene comprising the steps of providing a substrate and focusing a laser beam in the presence of a carbon doping gas to induce photolytic decomposition of the gas to atomic carbon. The carbon is photolytically reacted with the substrate to grow graphene.

Abstract: The present invention is a method for additive manufacturing in which a metal feedstock is converted to a carbonyl compound (or other gaseous media) and then optical heat patterns are used to direct the deposition of the contained metal into an arbitrary 3-D structure. The optical methods used to guide the metal deposit may include one or more laser beams acting independently or in concert, and/or other optical technologies to apply a pattern of thermal energy, including LCD, LED, LCoS, DLP, or even CRT projection technologies. The metals which may be deposited are limited to those which have compounds which are gaseous at moderate temperatures and which decompose (to a gas and the metal) upon the application of heat or specific chemical binding energies via optical means. Such compounds include (but are not limited to) nickel tetracarbonyl, iron pentacarbonyl, cobalt carbonyl, titanium iodide, and platinum chloro-carbonyl.

Abstract: A cathode thin film for a lithium secondary cell, which uses a cathode active material substituting Sn for Mn in lithium manganese oxide, has a high discharge capacity and an improved cycle property.

Abstract: Methods for improving the adhesion of vacuum deposited coatings to a wide variety of substrates are described herein. The methods include utilizing a thermal source to generate free radical species which are then contacted to the substrate to be coated. Chemical vapor deposition, particularly initiated chemical vapor deposition (iCVD) can be used to form polymer thin films in situ without the need to remove the substrate from the chamber or even return to atmospheric pressure. Significant improvements in substrate adhesion of the subsequently deposited films have been observed over a range of substrate and coating materials.

Abstract: Certain example embodiments relate to a burner for use in combustion deposition depositing a coating on a substrate. An infrared (IR) burner generates radiant energy in an area between the burner and the substrate. A delivery device (1) provides a stream comprising a substantially vaporized precursor and a carrier gas from a location remote from the radiant energy generated by the IR burner, and (2) causes the stream to flow between the substrate and the IR burner. The stream is substantially laminar when exiting the delivery device. The radiant energy is sufficient to cause the precursor in the stream to be combusted and to heat the substrate to allow at least a portion of the combusted precursor to form the coating, directly or indirectly, on the substrate. The burners of certain example embodiments may be used, for example, to combustion deposition deposit metal oxide coatings onto glass substrates.

Abstract: An injection molding tool includes a first mold die having a first tool face and a second mold die having a second tool face. The second mold die is configured to abut the first mold die, wherein the first tool face and second tool face are configured to partially define a part cavity between the first mold die and the second mold die. An induction heating element is embedded into the first mold die such that the induction heating element defines a portion of the first tool face. The induction heating element includes an electrical conductor, an electrically insulating material disposed about the conductor, and a ferromagnetic material disposed adjacent the electrical conductor and electrically insulating material.

Abstract: The present invention is a high-throughput, ultraviolet (UV) assisted metalorganic chemical vapor deposition (MOCVD) system for the manufacture of HTS-coated tapes. The UV-assisted MOCVD system of the present invention includes a UV source that irradiates the deposition zone and improves the thin film growth rate. The MOCVD system further enhances the excitation of the precursor vapors and utilizes an atmosphere of monatomic oxygen (O) rather than the more conventional diatomic oxygen (O2) in order to optimize reaction kinetics and thereby increase the thin film growth rate. In an alternate embodiment, a microwave plasma injector is substituted for the UV source.

Abstract: A method for growing an array of carbon nanotubes includes the steps of: (a) providing a substrate having a first substrate surface and a second substrate surface opposite to the first substrate surface; (b) forming a catalyst film on the first substrate surface; (c) flowing a mixture of a carrier gas and a first carbon source gas over the catalyst film on the first substrate surface; (d) focusing a laser beam on the second substrate surface to locally heat the substrate to a predetermined reaction temperature; and (e) growing an array of the carbon nanotubes on the first substrate surface via the catalyst film.

Abstract: Certain example embodiments of this invention relate to a method of forming a coating on a glass substrate using combustion deposition. A glass substrate having at least one surface to be coated is provided. A reagent is selected. A precursor to be combusted with the reagent is introduced. Using at least one infrared burner, at least a portion of the reagent and the precursor are combusted to form a combusted material, with the combusted material including non-vaporized material. The glass substrate is provided in an area so that the glass substrate is heated sufficiently to allow the combusted material to form the coating, directly or indirectly, on the glass substrate. The coating may be substantially uniform. In certain example embodiments, a silicon oxide coating may be deposited, which increases visible transmission of the glass substrate by at least about 1.7%.

Abstract: A process (200), comprising: a transfer operation (204), including transferring a resistive powder (106) to an electrically insulated element (102); and a converting operating (206), including converting at least some of the resistive powder (106) to a fused heater element (108) by using a laser metal deposition apparatus (110), the fused heater element (108) being fused to the electrically insulated element (102).

Abstract: A method of growing a plurality of free-standing structures comprises providing a plurality of free-standing structures, each free-standing structure having a first end coupled to a substrate, and a terminal end; providing at least one laser beam, the laser beam having a beam waste at a point proximate to the terminal end of the free-standing structure; and moving one of the plurality of freestanding structures or the beam waste to provide a growth zone proximate to the terminal end of each of the free-standing structures such that the free-standing structures grow into the growth zones by addition of decomposing precursor components. The growth rates of each of the free-standing structures are substantially the same.

Abstract: A method for growing a graphene nanoribbon on an insulating substrate having a cleavage plane with atomic level flatness is provided, and belongs to the field of low-dimensional materials and new materials. The method includes the following steps. Step 1: Cleave an insulating substrate to obtain a cleavage plane with atomic level flatness, and prepare a single atomic layer step. Step 2: Directly grow a graphene nanoribbon on the insulating substrate having regular single atomic steps. In the method, a characteristic that nucleation energy of graphene on the atomic step is different from that on the flat cleavage plane is used, and conditions, such as the temperature, intensity of pressure and supersaturation degree of activated carbon atoms, are adjusted, so that the graphene grows only along a step edge into a graphene nanoribbon of an adjustable size. The method is mainly applied to the field of new-type graphene optoelectronic devices.

Abstract: A mass spectrometer includes an Electron Impact (“EI”) or a Chemical Ionisation (“CI”) ion source, and the ion source includes a first coating or surface. The first coating or surface is formed of a metallic carbide, a metallic boride, a ceramic or DLC, or an ion-implanted transition metal.

Abstract: The invention relates to a method for processing a substrate with a focussed particle beam which incidents on the substrate, the method comprising the steps of: (a) generating at least one reference mark on the substrate using the focused particle beam and at least one processing gas, (b) determining a reference position of the at least one reference mark, (c) processing the substrate using the reference position of the reference mark, and (d) removing the at least one reference mark from the substrate.

Abstract: A carbon nanotube material is exposed to ultraviolet rays, and a silicon-containing compound capable of modifying the surface of the carbon nanotube material in combination with the ultraviolet rays is supplied to thereby modify the surface of the carbon nanotube material.

Abstract: The specification describes a method for selectively depositing carbon nanotubes on the end face of an optical fiber. The end face of the optical fiber is exposed to a dispersion of carbon nanotubes while light is propagated through the optical fiber. Carbon nanotubes deposit selectively on the light emitting core of the optical fiber.

Abstract: A thermoelectric material includes powders having a surface coated with an inorganic material. The thermoelectric material includes a thermoelectric semiconductor powder and a coating layer on an outer surface of the thermoelectric semiconductor powders.

Abstract: The invention relates to a vacuum coating method with very high deposition rates at high layer thickness homogeneity and material yield as well as apparatuses for achieving the coating. In order to overcome the existing conflict between layer thickness homogeneity on the one side and material yield and coating rate on the other side reducing the classic vacuum evaporation, the substrate forms the boundary of an essentially closed coating chamber which is supplied by an evaporation source. The walls of this coating chamber as well as all surfaces which are not to be coated are either kept at a certain temperature or provided with a non-stick coating such that the vapor cannot condensate thereon and is scattered back into the coating chamber. Thereby, a very high vapor pressure is created in the coating chamber which leads to a very high condensation rate onto the substrate and to a homogenization of the layer thickness.