Coating By Vacuum Deposition Patents (Class 430/128)
  • Patent number: 11495746
    Abstract: The present invention relates to indane derivatives of the formula (I) and mixtures thereof, wherein X is selected from groups of the formula -A-(NAr2), wherein A is a chemical bond or phenylene which is unsubstituted or substituted by 1, 2 or 3 substituents selected from C1-C6-alkyl and C1-C6-alkoxy; Ar is unsubstituted or substituted aryl, wherein two groups Ar bound to the same nitrogen atom may together with the nitrogen atom also form a fused ring system having 3 or more than 3 unsubstituted or substituted rings; and the variables Y, n, m, k and l are as defined in the claims and the description. The invention further relates to methods for preparing such compounds and their use in organic electronics, in particular as hole transport material or electron blocking material.
    Type: Grant
    Filed: May 11, 2018
    Date of Patent: November 8, 2022
    Assignee: Dottikon ES Holding AG
    Inventors: Sascha Dorok, Marcus Papmeyer, Carsten Fleck
  • Patent number: 11439979
    Abstract: Provided is a method of making colloidal selenium nanoparticles. The method includes the steps as follows: Step (A): providing a reducing agent and an aqueous solution containing a selenium precursor; Step (B): mixing the aqueous solution containing the selenium precursor and the reducing agent to form a mixture solution in a reaction vessel and heating the mixture solution to undergo a reduction reaction and produce a composition containing selenium nanoparticles, residues and a gas, and guiding the gas out of the reaction vessel, wherein an amount of the residues is less than 20% by volume of the mixture solution; and Step (C): dispersing the selenium nanoparticles with a medium to obtain the colloidal selenium nanoparticles. The method has advantages of simplicity, safety, time-effectiveness, cost-effectiveness, high yield and eco-friendliness.
    Type: Grant
    Filed: July 23, 2020
    Date of Patent: September 13, 2022
    Assignee: TRIPOD NANO TECHNOLOGY CORPORATION
    Inventors: Chung-Jung Hung, Chun-Lun Chiu, Chia-Chi Chang, Hsin-Chang Huang, Teng-Chieh Hsu, Meng-Hsiu Chih, Jim-Min Fang
  • Patent number: 10615360
    Abstract: An organic light emitting element according to an example embodiment of the present disclosure includes: an anode and a cathode facing each other; an emission layer between the anode and the cathode; an electron transfer layer between the emission layer and the cathode; and a buffer layer between the cathode and the electron transfer layer, wherein the buffer layer includes an inorganic metal halide having p-type semiconductor characteristics.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: April 7, 2020
    Assignee: Samsung Display Co., Ltd.
    Inventors: Dong Chan Kim, Won Jong Kim, Eung Do Kim, Dong Kyu Seo, Ji Hye Lee, Da Hea Im, Sang Hoon Yim, Yoon Hyeung Cho, Won Suk Han
  • Patent number: 9428518
    Abstract: A sensitizer in a dye-sensitized solar cell, including a compound of formula (I?) where: R1 and R2 are hydrogen, a halogen, an alkyl group, a cycloalkyl group, an aryl group, a hetaryl group, an alkoxy group, an aryloxy group, an arylthio group, a hetaryloxy group, a hetarylthio group, a diarylamino group, or a dialkylamino group; m, n are each independently an integer from 0-4; X is sulfur, oxygen, or NR3, where R3 is hydrogen, an alkyl group, a cycloalkyl group, an aryl group, or a hetaryl group; Y1 is oxygen or N—Z-A, where A is —COOM, —SO3M, or —PO3M, where M is hydrogen, an alkali metal cation, or [NR?]4+, where each R? is independently hydrogen or an alkyl group, and where Z is C1-C6-alkylene or 1,4-phenylene, where the phenylene radical is optionally substituted by one or more alkyl, nitro, cyano, and halogen substituents.
    Type: Grant
    Filed: March 12, 2014
    Date of Patent: August 30, 2016
    Assignees: BASF SE, Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V.
    Inventors: Henrike Wonneberger, Neil Gregory Pschirer, Flavio Luiz Benedito, Ingmar Bruder, Robert Send, Yulian Zagranyarski, Chen Li, Klaus Muellen, Long Chen, Artem Nikolaevich Skabeev
  • Publication number: 20130302734
    Abstract: The present invention provides a deposition film forming apparatus including a reaction container, an exhaust device and an exhaust gas flow path for causing a material gas to flow from the reaction container to the exhaust device, wherein the exhaust gas flow path includes a portion whose cross section expands with a step with respect to a direction in which the material gas flows and the deposition film forming apparatus further includes a cleaning gas flow device for causing the cleaning gas to directly flow into a region closer to the exhaust device side than the step of the exhaust gas flow path, a deposition film forming method using the deposition film forming apparatus and a method of manufacturing an electrophotographic photosensitive member using the deposition film forming method.
    Type: Application
    Filed: July 18, 2013
    Publication date: November 14, 2013
    Inventors: Kazuto HOSOI, Kazuyoshi AKIYAMA, Yukihiro ABE, Motoya YAMADA
  • Publication number: 20130137024
    Abstract: In an electrophotographic photosensitive member having a surface layer containing a polymer obtainable by polymerization of a compound having a chain-polymerizable functional group, the compound having a chain-polymerizable functional group includes a compound represented by formula (1).
    Type: Application
    Filed: November 29, 2012
    Publication date: May 30, 2013
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: CANON KABUSHIKI KAISHA
  • Publication number: 20130065177
    Abstract: A method for manufacturing an electrophotographic photosensitive member using plasma CVD includes steps of placing a cylindrical base member in a reactor which can be evacuated, the reactor having an electrode therein, so as to be spaced apart from the electrode, introducing a raw material gas for deposited film formation into the reactor, and applying an alternating voltage of a rectangular wave having a frequency in the range of 3 kHz to 300 kHz between the electrode and the cylindrical base member so that a potential at one of the electrode and the cylindrical base member with respect to a potential at the other becomes alternately positive and negative, to decompose the raw material gas, and forming a deposited film on the cylindrical base member. The magnitude of the potential difference between the electrode and the cylindrical base member is selectively controlled.
    Type: Application
    Filed: September 10, 2012
    Publication date: March 14, 2013
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Satoshi Kojima, Kazunari Ooyama, Yukihiro Abe
  • Patent number: 8295732
    Abstract: The present invention relates to an electrophotographic photosensitive member including a photosensitive layer formed on an outer circumferential surface of a cylindrical body. The cylindrical body includes a plurality of chamfers formed between an end surface and the outer circumferential surface. A chamfer arranged nearest an inner circumferential surface of the cylindrical body has a crossing angle of not less than 3° and not more than 25° relative to the end surface. The cylindrical body may include a recess formed between the end surface and the outer surface. The end surface may be formed to have pearskin. The present invention also relates to a method of manufacturing the electrophotographic photosensitive member. In the manufacturing method, a plurality of cylindrical bodies is supported by a supporting body in a manner that the end surfaces are positioned at contacting portions of adjacent cylindrical bodies.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: October 23, 2012
    Assignee: Kyocera Corporation
    Inventor: Kouichi Nakano
  • Patent number: 8123967
    Abstract: A method for producing an article having a decorative coating includes depositing at least a first coating layer onto at least a portion of a substrate using a physical or chemical vapor deposition method in a vacuum chamber at sub-atmospheric pressure, the first coating layer comprising a first material having a first color. The method also includes patterning the first coating layer using a non-uniform patterning process to form a patterned coating layer having penetrations through which a portion of an underlying surface is visible, the underlying surface comprising a second material and having a second color that is visually contrasting to the first color. The patterned first coating layer comprises a decorative pattern comprising features distinguishable by an unaided human eye.
    Type: Grant
    Filed: July 1, 2008
    Date of Patent: February 28, 2012
    Assignee: Vapor Technologies Inc.
    Inventors: Bryce Anton, Richard P. Welty, Patrick Sullivan
  • Patent number: 7588873
    Abstract: A method of cleaning and coating a used organic photoconductive drum is disclosed. Using this method remanufacturers can reliably reuse certain used organic photoconductive drums which could not be reused without this method. The method comprises providing a used organic photoconductive drum, cleaning the surface of the used organic photoconductive drum, applying a new surface layer comprising a non-volatile non-polar dielectric fluid such as a silicone oil with a viscosity of less than 200 cSt at 40 degrees Celsius. The resulting liquid surface on the used organic photoconductive drum provides wear resistance, and improved electrical characteristics allowing the used organic photoconductive drum to be used at least a second time.
    Type: Grant
    Filed: October 23, 2007
    Date of Patent: September 15, 2009
    Assignee: Static Control Components, Inc.
    Inventors: Edwin H. Swartz, Roderick Craig Boone, John Edward Pickett, Lawrence Dale Lewis
  • Patent number: 7381510
    Abstract: An electrophotographic photosensitive member is disclosed having a first area layer and a second area layer on a substrate. The first area layer and the second area layer are formed by deposition using different methods, and an intermediate layer is provided therebetween. The intermediate layer is changed continuously in composition in such a manner that the composition at the surface in contact with the first area layer is approximately the same as the composition of the first area layer and that the composition at the surface in contact with the second area layer is approximately the same as the composition of the second area layer, whereby the various characteristics of the electrophotographic photosensitive member is prevented from deteriorating.
    Type: Grant
    Filed: June 2, 2005
    Date of Patent: June 3, 2008
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuyoshi Akiyama, Takahisa Taniguchi
  • Patent number: 7338738
    Abstract: In an electrophotographic photosensitive member having a support at least the surface of which is conductive, and a photoconductive layer formed thereon containing an amorphous material composed chiefly of silicon, the photoconductive layer has two or more layer regions, and protuberances in a layer region adjoining to a layer region that is closest to the free surface of the electrophotographic photosensitive member have been stopped from growing at the surface of that layer region in which the protuberances occur. The protuberances has been stopped from growing not to become so large as to appear as image defects on images. Also disclosed is a process for producing such an electrophotographic photosensitive member.
    Type: Grant
    Filed: December 12, 2003
    Date of Patent: March 4, 2008
    Assignee: Canon Kabushiki Kaisha
    Inventors: Satoshi Kojima, Kazuhiko Takada, Hironori Ohwaki
  • Patent number: 7229730
    Abstract: The invention provides a process for producing a negative-charging electrophotographic photosensitive member which can improve the adherence between a first layer and a second layer without lowering the effect of lessening image defects and realize a reduction in overall costs, a negative-charging electrophotographic photosensitive member produced by the process, and an electrophotographic apparatus. In the process for producing a negative-charging electrophotographic photosensitive member, a first layer is deposited on a substarte, at least the vertexes of protuberances are removed, the substrate with the first layer deposited theron is placed in a film forming furnace, the first layer surface is plasma-treated with a gas containing at least a Group 13 element in the periodic table and a dilution gas composed of at least one selected from hydrogen, argon and helium, and a layer formed of a non-single-crystal material is deposited as the second layer on the first layer.
    Type: Grant
    Filed: January 27, 2006
    Date of Patent: June 12, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Jun Ohira, Satoshi Kojima, Makoto Aoki, Kazuto Hosoi
  • Patent number: 7033717
    Abstract: An electrophotographic photosensitive member production process is provided having the steps of placing a cylindrical substrate having a conductive surface in a first film-forming chamber, and decomposing a source gas with high-frequency power to deposit on the cylindrical substrate a first layer formed of a non-single-crystal material, taking out of the first film-forming chamber the cylindrical substrate with the first layer deposited thereon, and placing the cylindrical substrate with the first layer deposited thereon in a second film-forming chamber, and decomposing a source gas with a high-frequency power to deposit on the first layer a second layer having an upper-part blocking layer formed of a non-single-crystal material. Even where abnormal growth portions called spherical protuberances are present on the photosensitive member surface, they can be made not to appear on images, and image defects can vastly be remedied.
    Type: Grant
    Filed: July 31, 2003
    Date of Patent: April 25, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventors: Satoshi Kojima, Toshiyuki Ehara, Hideaki Matsuoka, Junichiro Hashizume, Ryuji Okamura, Koji Hitsuishi, Hironori Ohwaki, Kazuto Hosoi
  • Patent number: 7033721
    Abstract: The invention provides a method for producing an electrophotographic photosensitive member such that even if abnormal grown portions called spherical protrusions 203 exist on the surface of the photosensitive member, they do not appear on images, thus making it possible to considerably alleviate image defects.
    Type: Grant
    Filed: July 31, 2003
    Date of Patent: April 25, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventors: Junichiro Hashizume, Toshiyuki Ehara, Hideaki Matsuoka, Ryuji Okamura, Koji Hitsuishi, Satoshi Kojima, Hironori Ohwaki, Kazuto Hosoi
  • Patent number: 6861373
    Abstract: A vacuum processing method that includes placing an article to be processed in a reaction container and simultaneously supplying at least two high-frequency powers having mutually different frequencies to at least one high-frequency electrode to generate plasma in the reaction container by the high-frequency powers introduced into the reaction container from the high-frequency electrode(s), thereby processing the article. The frequencies and power values of the at least two high-frequency powers supplied satisfy required relationships.
    Type: Grant
    Filed: December 11, 2001
    Date of Patent: March 1, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventors: Makoto Aoki, Toshiyasu Shirasuna, Hiroaki Niino, Kazuyoshi Akiyama, Hitoshi Murayama, Shinji Tsuchida, Daisuke Tazawa, Yukihiro Abe
  • Patent number: 6846600
    Abstract: A process for producing an electrophotographic photosensitive member comprising the steps of depositing a non-single crystal material composed basically of silicon atoms, on a cylindrical substrate in a deposition chamber, thereafter once taking the substrate with film out of the deposition chamber, then returning it to the deposition chamber, and thereafter again depositing thereon a non-single-crystal material composed basically of carbon atoms. In another embodiment, the process comprises the steps of depositing on a cylindrical substrate a photoconductive layer formed of a non-single crystal material, subjecting to surface processing the deposited film having protrusions present at its surface, and depositing on the processed surface a surface protective layer formed of a non-single-crystal material. Also disclosed is the electrophotographic photosensitive member thus obtained, and an electrophotographic apparatus having that member.
    Type: Grant
    Filed: January 31, 2002
    Date of Patent: January 25, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventors: Toshiyuki Ehara, Junichiro Hashizume, Masaya Kawada, Tetsuya Karaki, Hironori Ohwaki, Kunimasa Kawamura, Ryuji Okamura, Kazuto Hosoi
  • Patent number: 6753123
    Abstract: A process for manufacturing an electrophotographic photosensitive member is disclosed in which a source gas is decomposed by the use of a high-frequency power in a rector to deposit sequentially on a conductive substrate i) a photoconductive layer comprised of an amorphous material composed chiefly of silicon atoms and ii) a surface layer comprised of an amorphous material composed chiefly of carbon atoms and containing hydrogen atoms. The process has the steps of forming the photoconductive layer in a first reactor, and forming the surface layer in a second reactor. This process can produce an electrophotographic photosensitive member having an a-Si photoconductive layer and a-C:H surface layer or a-C:H(Si) surface layer in a good efficiency and at a low cost. Also disclosed is an electrophotographic photosensitive member manufacturing apparatus which carries out the process.
    Type: Grant
    Filed: June 27, 2002
    Date of Patent: June 22, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ryuji Okamura, Junichiro Hashizume, Kazuto Hosoi
  • Patent number: 6687624
    Abstract: The relationship between the stress &sgr; and the strain &egr; is firstly established in step 100 with short-term tests as a function of the temperature T. In steps 101 to 104, a Findley model is extended in such a way as to obtain a relationship between the strain &egr; and the stress &sgr; as a function of the time t and the temperature T. The two models are combined in steps 105 and 106, so as to obtain overall a relationship between the stress &sgr; and the strain &egr; as a function of the time t and the temperature T.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: February 3, 2004
    Assignee: Bayer Aktiengesellschaft
    Inventors: Bahman Sarabi, Martin Wanders, Dietmar Wächtler, Andreas Wende
  • Patent number: 6632578
    Abstract: A process for producing an electrophotographic light-receiving member having a conductive support and a light-receiving member having a photoconductive layer formed on the surface of the conductive support and composed of a non-single crystal material containing silicon atoms as a main component, hydrogen atoms and/or halogen atoms. The photoconductive layer is formed at a flow rate (X) sccm of n Si supply gas and a discharge space volume (Z) cm3 satisfying (A) and a flow rate (X) sccm of the Si supply gas and density (Y) W/cm3 of the electric power input to the discharge space satisfying the following relation (B) wherein 3×10−3≦X/Z≦1×10−2  (A) and 3×10−4≦Y/X≦7×10−4  (B).
    Type: Grant
    Filed: September 27, 2002
    Date of Patent: October 14, 2003
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroaki Niino, Satoshi Kojima, Shinji Tsuchida
  • Publication number: 20030143478
    Abstract: A process for producing an electrophotographic light-receiving member having a conductive support and a light-receiving member having a photoconductive layer formed on the surface of the conductive support and composed of a non-single crystal material containing silicon atoms as a main component, hydrogen atoms and/or halogen atoms.
    Type: Application
    Filed: September 27, 2002
    Publication date: July 31, 2003
    Inventors: Hiroaki Niino, Satoshi Kojima, Shinji Tsuchida
  • Publication number: 20030124449
    Abstract: A process for manufacturing an electrophotographic photosensitive member is disclosed in which a source gas is decomposed by the use of a high-frequency power in a rector to deposit sequentially on a conductive substrate i) a photoconductive layer comprised of an amorphous material composed chiefly of silicon atoms and ii) a surface layer comprised of an amorphous material composed chiefly of carbon atoms and containing hydrogen atoms. The process has the steps of forming the photoconductive layer in a first reactor, and forming the surface layer in a second reactor. This process can produce an electrophotographic photosensitive member having an a-Si photoconductive layer and a-C:H surface layer or a-C:H(Si) surface layer in a good efficiency and at a low cost. Also disclosed is an electrophotographic photosensitive member manufacturing apparatus which carries out the process.
    Type: Application
    Filed: June 27, 2002
    Publication date: July 3, 2003
    Inventors: Ryuji Okamura, Junichiro Hashizume, Kazuto Hosoi
  • Publication number: 20030049558
    Abstract: A vacuum processing method including placing an article to be processed in a reaction container and simultaneously supplying at least two high-frequency powers having different frequencies to the same high-frequency electrode to generate plasma in the reaction container by the high-frequency powers introduced into the reaction container from the high-frequency electrode. The frequencies and power values of the at least two high-frequency powers supplied satisfy the required relationship. Also, disclosed are a semiconductor device manufacturing method, a semiconductor device and a vacuum processing apparatus.
    Type: Application
    Filed: December 11, 2001
    Publication date: March 13, 2003
    Inventors: Makoto Aoki, Toshiyasu Shirasuna, Hiroaki Niino, Kazuyoshi Akiyama, Hitoshi Murayama, Shinji Tsuchida, Daisuke Tazawa, Yukihiro Abe
  • Patent number: 6444387
    Abstract: An image bearing material including a matrix resin and, within the matrix resin, a core/shell graft copolymer including a core including one or more polymers and a shell including a graft polymer which has a linear chain connected with the core and which is formed from one or more monomers. The image bearing material is preferably used for a surface layer of an electrophotographic photoreceptor, an intermediate transfer medium, and the like image bearing members to improve the abrasion resistance thereof.
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: September 3, 2002
    Assignee: Ricoh Company Limited
    Inventors: Kohkoku Ri, Masaomi Sasaki, Kazukiyo Nagai, Shinichi Kawamura
  • Publication number: 20020115012
    Abstract: In an image-forming apparatus having at least i) an electrophotographic photosensitive member having at least a photoconductive layer and a surface layer on a conductive substrate, ii) a developing means having a toner, and iii) a charging means, the photoconductive layer comprises a non-single-crystal material composed chiefly of silicon, the surface layer comprises a non-single-crystal carbon film containing at least hydrogen and has a dynamic hardness in the range of from 4.90×109 to 1.76×1010 Pa (500 to 1,800 kgf/mm2), the charging means has a charging member kept in contact with the electrophotographic photosensitive member, forming a contact zone therewith, charges the electrophotographic photosensitive member electrostatically upon application of a voltage, and the toner is a magnetic toner having toner particles containing at least a binder resin and a magnetic material, and an inorganic fine powder, having an average circularity of from 0.950 to 1.
    Type: Application
    Filed: November 14, 2001
    Publication date: August 22, 2002
    Inventors: Junichiro Hashizume, Ryuji Okamura, Kazuto Hosoi
  • Patent number: 6322942
    Abstract: A xerographic photoreceptor primarily formed by amorphous silicon material is disclosed, wherein the xerographic photoreccptor is a photosensitive drum used in copying and manufactured by the plasma enhanced low pressure chemical vapor deposition system. Such a drum has a higher resolution, and a longer lifetime. In this structure, an Al2O3 oxidization layer is grown on an aluminum substrate. Then a n type hydrogenated amorphous silicon blocking layer is grown on the aluminum substrate with Al2O3 oxidization layer. Then an intrinsic hydrogenated amorphous silicon charge generating transmission layer is grown on the n type hydrogenated amorphous silicon blocking layer. Finally a hydrogenated amorphous carbon surface protecting layer is grown on the intrinsic hydrogenated amorphous silicon charge generation transport layer for forming a xerographic photoreceptor with a multiple layer structure.
    Type: Grant
    Filed: April 27, 2000
    Date of Patent: November 27, 2001
    Assignee: National Science Council of Republic of China
    Inventors: Jung-Chuan Chou, Hsu-Ying Yang, Chau-Yun Jen
  • Patent number: 6313953
    Abstract: Systems and methods of achieving optimal light transmittance through a gas and light transmittance region. This invention is directed at the application of specific activated carbon based materials for the protection of imaging lenses which are targeting optimal transmittance at specific wavelengths. Specifically, it outlines a use of a specific type of carbon to obtain improved/constant transmittance at a specific wavelength or range of wavelengths. In addition, it also presents the use of a mixture of activated carbon types in order to obtain improved/constant transmissions over a broad range of wavelengths.
    Type: Grant
    Filed: January 15, 1999
    Date of Patent: November 6, 2001
    Assignee: Donaldson Company, Inc.
    Inventor: Andrew James Dallas
  • Patent number: 6197471
    Abstract: A new photoreceptor is provided which comprises a conductive substrate and a photoconductive layer of 5 micra or less in thickness on the substrate. The photoreceptor has a dark decay greater than 20 seconds and contains less than 5% total hydrogen. The substrate is selected from the group consisting of alloys of aluminum, chromium, iron, molybdenum, nickel or tungsten. In addition, the substrate can be a nonconductive material, such as plastic, provided with an electrically conductive layer. A new method for making the improved photoreceptor comprises providing a conductive substrate and forming a photoconductive layer of 5 micra or less in thickness on said substrate by depositing an amorphous material containing silicon and hydrogen atoms wherein said substrate has a negative potential between −40 and −100 volts during the forming of said layer.
    Type: Grant
    Filed: March 25, 1998
    Date of Patent: March 6, 2001
    Assignee: Coulter International Corp.
    Inventors: Marshall Donnie Graham, Gary L. Dorer
  • Patent number: 6156472
    Abstract: To provide an electrophotographic photosensitive member manufacturing method capable of preventing a substrate from corroding in working of the substrate and obtaining a high-quality image free from image defects and image density unevenness, the method of manufacturing an electrophotographic photosensitive member comprises the step of forming a functional film made of an amorphous material on the surface of an aluminum substrate by reduced-pressure vapor deposition, wherein the surface of the substrate is cleaned with the water containing an inhibitor as a specific component before the step of forming an electrophotographic photosensitive member.
    Type: Grant
    Filed: November 5, 1998
    Date of Patent: December 5, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yoshio Segi, Hideaki Matsuoka, Hiroyuki Katagiri, Yasuyoshi Takai
  • Patent number: 6124072
    Abstract: There is disclosed a photoconductor for use in an electrophotographic apparatus. The photoconductor includes a conductive substrate and a photoconductive layer formed on the conductive substrate. The photoconductive layer includes an As.sub.2 Se.sub.3 alloy containing 36% to 40% by weight of As and doped with 1,000 to 20,000 parts per million of iodine. A method of manufacturing a photoconductor is also disclosed, which includes forming a photoconductive layer by vapor deposition on a conductive substrate and thermally treating the photoconductive layer at a temperature between 100 and 200 degrees Celsius for a period between 30 and 80 minutes. Advantageously, the photoconductor of the present invention is able to provide high quality images at high printing speeds.
    Type: Grant
    Filed: November 18, 1999
    Date of Patent: September 26, 2000
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Akio Arai, Makoto Fujii, Kazuya Adachi
  • Patent number: 5976745
    Abstract: With a plasma being generated between a cathode electrode to which a high-frequency power is applied and an electrically conductive substrate opposed to the electrode in a reaction vessel the pressure of which can be reduced, a photoconductive layer having the matrix of silicon atoms is deposited on a substrate to be processed, a surface layer comprised of non-monocrystal carbon containing hydrogen is provided on the photoconductive layer, a surface of the surface layer is etched to fluorinate the surface, the surface roughness Rz by etching is controlled below 1000 .ANG., the fluorine contained in the surface layer is made present within 50 .ANG.
    Type: Grant
    Filed: September 5, 1997
    Date of Patent: November 2, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Makoto Aoki, Shigenori Ueda, Junichiro Hashizume
  • Patent number: 5958644
    Abstract: In a reactor capable of reducing an internal pressure thereof, a non-single-crystalline material layer containing at least one kind of carbon atoms, hydrogen atoms or nitrogen atoms is formed and etched on a non-single-crystalline photoconductive layer mainly composed of silicon atoms, formed on a substrate, under application of a high-frequency power of 50 MHz to 450 MHz, and the formation and the etching are alternately repeated plural times to form a surface layer.A light-receiving member having such a surface layer does not damage cleaning performance over a long period of time, hardly allows adhesion of corona discharge products, and can be free from faint images, smeared images and uneven image density even if no heating means for the drum is provided.
    Type: Grant
    Filed: April 24, 1996
    Date of Patent: September 28, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shigenori Ueda, Junichiro Hashizume, Makoto Aoki, Shinji Tsuchida
  • Patent number: 5910342
    Abstract: A process for forming a deposition film on a substrate comprises introducing separately a precursor or activated species formed in a decomposition space (B) and activated species formed in a decomposition space (C), into the deposition space wherein the film is formed on the substrate.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: June 8, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masaaki Hirooka, Kyosuke Ogawa, Shunichi Ishihara, Isamu Shimizu
  • Patent number: 5900342
    Abstract: There is provided an electrophotographic element and method of making the electrophotographic element comprising a conductive support, a charge generation layer and a charge transport layer, said electrophotographic element having thereon a protective layer of a fluorinated diamond-like carbon wherein the fluorine content of the outermost surface of the fluorinated diamond-like carbon layer is between about 25 and about 65 atomic percent based on the total composition of the outermost surface of the protective layer. The protective layer provides for a low surface energy coating having a long process lifetime without causing latent image spread or degradation of photosensitivity.
    Type: Grant
    Filed: April 26, 1996
    Date of Patent: May 4, 1999
    Assignee: Eastman Kodak Company
    Inventors: Susan A. Visser, Paul M. Borsenberger
  • Patent number: 5882830
    Abstract: A photoconductive element comprising: an electrically conductive base; at least one active layer comprising an organic material, said at least one active layer being capable of charge generation and charge transport; and an outermost multilayer protective overcoat comprising at least one sol-gel layer and at least one outermost diamond-like carbon layer comprising fluorine.
    Type: Grant
    Filed: April 30, 1998
    Date of Patent: March 16, 1999
    Assignee: Eastman Kodak Company
    Inventors: Susan A. Visser, Robin J. Cowdery-Corvan, David S. Weiss
  • Patent number: 5849446
    Abstract: A light receiving member comprising a electrically conductive substrate, a photoconductive layer composed of a non-single crystalline material containing at least silicon atoms as a matrix formed on said substrate by decomposing a silicon-containing raw material gas, and a surface protective layer composed of a non-single crystalline carbon material containing hydrogen formed on said photoconductive layer by decomposing a raw material gas comprising at least a hydrocarbon using a high frequency power with an oscillation frequency of 50 MHz to 450 MHz, wherein a 20 .ANG. or more thick surface side layer region of said surface protective layer composed of said non-single crystalline carbon material is etched at an etching speed of 0.1 to 50 .ANG./sec. by means of a fluorine-containing plasma produced by decomposing a fluorine-containing gas using a high frequency power with an oscillation frequency of 50 MHz to 450 MHz such that said surface protective layer has a thickness of 100 to 10000 .ANG.
    Type: Grant
    Filed: January 21, 1997
    Date of Patent: December 15, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventors: Junichiro Hashizume, Shigenori Ueda, Makoto Aoki
  • Patent number: 5849455
    Abstract: A plasma processing method and a plasma processing apparatus are provided in which a deposition film is formed, on a substrate serving also as an electrode, by application of high frequency power ranging from 20 MHz to 450 MHz with simultaneous application of DC voltage ranging from 30 to 300 V or -30 to -300 V and/or AC voltage ranging from 30 to 600 V to the substrate in an evacuatable reaction chamber. This method make it practicable to uniformize the plasma and the film thickness distribution independently of the discharge frequency and the applied high frequency power, thereby broadening the allowable range of conditions of the processing such as film formation and the allowable range of the design of the apparatus.
    Type: Grant
    Filed: December 13, 1995
    Date of Patent: December 15, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shigenori Ueda, Junichiro Hashizume, Shinji Tsuchida
  • Patent number: 5846612
    Abstract: Provided is a process for efficiently forming a high-quality deposited film at a high deposition rate in the quality equivalent to or higher than that of films formed by the RF plasma CVD process. A stock gas is introduced under a reduced pressure into a reaction container provided with a cathode electrode inside and a high-frequency power in the range of 50 to 300 MHz is supplied to the cathode electrode, whereby ions of the stock gas with energy of 40 or more eV are made to hit against a substrate, thereby forming a deposited film thereon.
    Type: Grant
    Filed: April 3, 1996
    Date of Patent: December 8, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventors: Satoshi Takaki, Atsushi Yamagami, Nobuyuki Okamura
  • Patent number: 5783351
    Abstract: A method of making a multiactive photoconductive elements is disclosed. The method uses a knurl free planar polymeric support having beads protruding from one surface. An element comprising such supports is also disclosed.
    Type: Grant
    Filed: January 11, 1996
    Date of Patent: July 21, 1998
    Assignee: Eastman Kodak Company
    Inventor: David Michael Woytek
  • Patent number: 5766811
    Abstract: A method for stably manufacturing, with improved reproducibility, a good amorphous silicon electrophotographic photosensitive member improved in potential characteristics such as chargeability and photo-response as well as in the effect of reducing photo-memory and defects which cause spot image defects. A film is formed by plasma CVD on a base of the photosensitive member by using electromagnetic waves having a frequency of 13.56 MHz or higher as power for forming plasma under conditions that the spatial potential of plasma generated by the electromagnetic waves with respect to a base of the photosensitive member is not higher than 120 V and the current density of ions incident upon the base is not lower than 0.4 mA/cm.sup.2.
    Type: Grant
    Filed: March 13, 1996
    Date of Patent: June 16, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hitoshi Murayama, Satoshi Kojima
  • Patent number: 5753401
    Abstract: A method of making a multiactive photoconductive elements is disclosed. The method uses a knurl free planar polymeric support having beads protruding from one surface. An element comprising such supports is also disclosed.
    Type: Grant
    Filed: January 11, 1996
    Date of Patent: May 19, 1998
    Assignee: Eastman Kodak Company
    Inventors: David Michael Woytek, Douglas Edward Garman
  • Patent number: 5635327
    Abstract: An electrophotographic photoreceptor and process for preparing the same, the photoreceptor comprising a conductive substrate having thereon a photoconductive layer and a surface layer in this order, the photoconductive layer comprising amorphous silicon containing at least one of hydrogen and a halogen, and the surface layer comprising a dried and/or cured product under a reduced pressure of an inorganic or organic high molecular weight material containing fine particles of a conductive metal oxide dispersed therein.
    Type: Grant
    Filed: May 24, 1995
    Date of Patent: June 3, 1997
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Yuzuru Fukuda, Shigeru Yagi, Taketoshi Higashi
  • Patent number: 5624776
    Abstract: An electrophotographic photosensitive member comprising a substrate and a light receiving layer composed of a silicon-containing non-single crystal material disposed on said substrate, characterized in that said light receiving layer contains a plurality of columnar structure regions each grown from a nucleus situated in said light receiving layer wherein said plurality of columnar structure regions are arranged substantially in parallel to the thicknesswise direction of said light receiving layer and at a density in the range of 5/cm.sup.2 to 500/cm.sup.2.
    Type: Grant
    Filed: February 18, 1994
    Date of Patent: April 29, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tetsuya Takei, Hirokazu Ohtoshi, Takehito Yoshino, Ryuji Okamura, Yasuyoshi Takai
  • Patent number: 5585149
    Abstract: A layer of amorphous silicon containing H, preferably 10-40 atomic % H, which is used as a photoconductive layer for electrophotographic photosensitive member, is formed by plasma CVD using a silane gas of a higher than monosilane.
    Type: Grant
    Filed: May 23, 1995
    Date of Patent: December 17, 1996
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yutaka Hirai, Toshiyuki Komatsu, Katsumi Nakagawa, Teruo Misumi, Tadaji Fukuda
  • Patent number: 5582947
    Abstract: A photoconductive member, comprises a support for a photoconductive member and an amorphous layer which is constituted of silicon atoms as matrix containing at least one of hydrogen atom and halogen atom and exhibits photoconductivity, said amorphous layer having a layer region containing carbon atoms in at least a part thereof, the content of the carbon atoms in said layer region being distributed unevenly in the direction of the thickness of said layer.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: December 10, 1996
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shigeru Shirai, Junichiro Kanbe, Tadaji Fukuda
  • Patent number: 5576060
    Abstract: A CVD process of forming a hydrogenated amorphous silicon film comprising not more than 40 atomic percent of hydrogen atoms is disclosed, which comprises introducing a silicon-containing gas and a gas containing impurity for controlling conductivity of said film into a film-forming space, wherein the concentration of the gas containing the impurity is controlled during film formation to vary the content of the impurity in the thickness direction of the amorphous silicon film.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: November 19, 1996
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yutaka Hirai, Toshiyuki Komatsu, Katsumi Nakagawa
  • Patent number: 5561024
    Abstract: An image forming member for electrophotography constructed with a substrate and a photoconductive layer formed thereon, wherein the photoconductive layer comprising an amorphous material containing therein silicon atom as the matrix and halogen atom as the constituent atom.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: October 1, 1996
    Inventors: Tadaji Fukuda, Toshiyuki Komatsu
  • Patent number: 5545503
    Abstract: A printing member for electrostatic photocopying, comprises a substrate having a conductive surface and a photoelectric-sensitive, electrically chargeable layer deposited on the conductive surface of the substrate. The electrically chargeable layer has a non-single crystal semiconductor layer having a built-in-potential, or the non-single crystal semiconductor layer and an insulating or semi-insulating layer.
    Type: Grant
    Filed: September 12, 1994
    Date of Patent: August 13, 1996
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventor: Shunpei Yamazaki
  • Patent number: 5532102
    Abstract: Disclosed is an apparatus for evaporation of a vacuum evaporatable material onto a substrate, said apparatus comprising (a) a walled container for the vacuum evaporatable material having a plurality of apertures in a surface thereof, said apertures being configured so that the vacuum evaporatable material is uniformly deposited onto the substrate; and (b) a source of heat sufficient to effect evaporation of the vacuum evaporatable material from the container through the apertures onto the substrate, wherein the surface of the container having the plurality of apertures therein is maintained at a temperature equal to or greater than the temperature of the vacuum evaporatable material.
    Type: Grant
    Filed: March 30, 1995
    Date of Patent: July 2, 1996
    Assignee: Xerox Corporation
    Inventors: Philip H. Soden, Arnold L. Pundsack
  • Patent number: 5503955
    Abstract: A piezo-active charge retentive member, such as a photoreceptor, has a grounded electrode layer separating a photoreceptive layer and a piezo-active layer. External vibration sources become unnecessary since supplying an A.C. voltage across the piezo-active layer to the grounded electrode layer causes the piezo-active layer, and thus the entire photoreceptor, to vibrate. Vibration of the photoreceptor enhances the transfer of development powder from the photoreceptor to the transfer material, such as a sheet of paper. Vibration of the photoreceptor also improves the development of images and assists the cleaning of residual development powder from the photoreceptor surface.
    Type: Grant
    Filed: December 16, 1993
    Date of Patent: April 2, 1996
    Assignee: Xerox Corporation
    Inventors: Christopher Snelling, Joseph Mammino, Dale R. Mashtare