Abstract: The present invention relates to a method for the creation of dynamic artworks from static artworks; comprising of designing, fabrication, painting, creating & printing of artworks of a specific and precise calibrated colour and shade arrangement in the forms, images, shapes and backgrounds or the artworks, followed by illuminating these static artworks of diverse sizes, using specific lighting sequences and transitions of specifically calibrated colour ranges and shades; that dynamically transform the colours, luminosities and perception of forms, images, shapes and backgrounds in the static artworks, making them into dynamic animated artworks.

Abstract: A self-priming resist may be formed from a first random copolymer forming a resist and a polymer brush having the general formula poly(A-r-B)-C-D, wherein A is a first polymer unit, B is a second polymer unit, wherein A and B are the same or different polymer units, C is a cleavable unit, D is a grafting group and r indicates that poly(A-r-B) is a second random copolymer formed from the first and second polymer units. The first random copolymer may be the same or different from the second random polymer. The self-priming resist can create a one-step method for forming an adhesion layer and resist by using the resist/brush blend.

Abstract: A liquid crystal display device includes: a liquid crystal display panel that includes red color filters, green color filters, and blue color filters; and an illumination device that illuminates the liquid crystal display panel with white light. The illumination device includes light-emitting elements that emit blue light, a green phosphor that absorbs a portion of the blue light emitted from the light-emitting elements and then emits green light, and a red phosphor that absorbs a portion of the blue light emitted from the light-emitting elements and then emits red light. The blue color filters are made of a colored material that contains a dye, and the chromaticity values x and y of the white light emitted from the illumination device satisfy the relationships 0.24<x and 0.24<y.

Abstract: A method of creating an image film negative capable of masking non-image areas of one or more layers of liquid photopolymer during a step of imagewise exposing the one or more layers of liquid photopolymer to actinic radiation. The method includes the steps of (a) providing an image film negative comprising a negative of an image on the image film negative, wherein the negative of the image comprises a pattern of opaque areas; and (b) inkjet printing a filtering layer on portions of the image film negative not covered by the pattern of opaque areas, wherein the portions of the image film negative comprise portions where it is desirable to modulate intensity of actinic radiation in a subsequent exposure step.

Abstract: A security element includes a transparent film, a first layer and a second layer. The first layer includes a first metal arranged on the transparent film in a first pattern. The second layer includes a second metal being a baser metal than the first metal arranged over the first layer in a second pattern. Each of the first and second patterns is composed of metallic regions and metal-free regions. The metal-free regions of the second pattern overlap with the metal-free regions of the first pattern. The metallic regions of the first pattern overlap with the metal-free regions of the second pattern.

Abstract: A system for forming a micro-truss structure including a reservoir having walls and a flat bottom configured to hold a volume of a liquid photomonomer configured to form a photopolymer when exposed to light, a partially transparent mask secured to, or being, the bottom of the reservoir, a release layer on the mask configured to resist adhesion by the photopolymer, and a blocker positioned a first distance below the mask. The system also includes a light source positioned below the blocker configured to produce collimated light suitable for causing conversion of the photomonomer into the photopolymer, and to which the blocker is opaque, and a first mirror, oblique to the blocker, configured to reflect the light from the light source around the blocker and through the mask and into the reservoir. The blocker is positioned to block a straight path of light from the light source to the mask.

Abstract: An exposure method is provided. The exposure method includes coating a photo-curable material on a substrate, and exposing a portion of the photo-curable material by providing a first light source through an optical fiber to form a first photo-cured material. The optical fiber includes a light output end and a cone portion that tapers toward the light output end. The photo-curable material not exposed by the first light source is removed while leaving the first photo-cured material. Exposure equipment for performing the exposure method and a 3-dimensional structure formed thereby are also described.

Abstract: A pattern forming method includes: (a) forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition (I) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (b) exposing the first film; (c) developing the exposed first film using a developer containing an organic solvent to form a first negative pattern; (e) forming a second film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition (II) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (f) exposing the second film; and (g) developing the exposed second film using a developer containing an organic solvent to form a second negative pattern in this order.

Abstract: The invention relates to a masking layer. The masking layer produced by coating a white-color photosensitive resin composition on a peripheral region of a transparent substrate, developing the white-color photosensitive resin composition to obtain a patterned composition layer, coating a gray-color photosensitive resin composition on the cured composition layer and developing the gray-color photosensitive resin composition, so that the gray-color photosensitive resin composition is cured to obtain the masking layer having an optical density (O.D.) of ?3.5. The masking layer is adapted for use on a touch panel or a flat panel display device. The masking layer shows a white color appearance when viewed from outside and serves as a white color decoration around the peripheral region of the device. The masking layer further comprises a gray colored sub-layer to mask the electrical circuitry disposed beneath the masking layer.

Abstract: Methods for fabricating integrated circuits are provided. In one example, a method for fabricating an integrated circuit includes patterning a first photoresist layer overlying a mask blank that is mounted on a first chuck to form a first patterned photoresist layer. The mask blank is selectively etched using the first patterned photoresist layer to form a first patterned mask. The first patterned mask is mounted on a second chuck and a non-flatness compensation is determined. The first patterned mask is mounted on the first chuck and a second photoresist layer is patterned overlying the first patterned mask to form a second patterned photoresist layer. The second patterned photoresist layer includes a device pattern that has been adjusted using the non-flatness compensation. The first patterned mask is selectively etched using the second patterned photoresist layer to form a second patterned mask.

Abstract: A method for forming a device having nanopillar and cap structures on a substrate in which the substrate is first coated with a first resist having a first exposure dose to electron beam radiation, and that after coating the first resist with a second resist having a second exposure dose less than the first resist. Electron beam lithography is then used sequentially to form the nanopillars and cap structures or, alternatively, a template for the nanopillar and cap structures.

Abstract: A pattern forming method contains: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a step of exposing a multi-layered film having the first film and the second film, and (iv) a step of developing the first film and the second film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Abstract: A method for manufacturing an electrode for a display apparatus includes printing and drying a conductive paste on a substrate, and printing a glass paste on the dried conductive paste, followed by patterning.

Abstract: A method of fabricating a substrate-HSQ resist material in which the substrate is selected from germanium (Ge) or gallium arsenide (GaAs) comprises the steps of pretreating a surface of the substrate to provide halogen termination of the substrate surface such that surface oxide is removed, and applying a HSQ resist to the surface. Removal of surface oxide allows the use of aqueous HSQ developers without causing damage to the surface. Also disclosed is a substrate-HSQ resist material, in which the substrate is selected from germanium or gallium arsenide, suitable for use in nanodevice fabrication and comprising a germanium or gallium arsenide substrate having a surface bearing a high resolution HSQ resist film or layer, in which the substrate has a halogen terminated surface.

Abstract: There is provided a pattern forming method comprising: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a step of exposing a multi-layered film having the first film and the second film, and (iv) a step of developing the first film and the second film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Abstract: A method for fabricating a pellicle of an EUV mask is provided. An insulation layer is formed over a silicon substrate, and a mesh is formed over the insulation layer. A frame exposing a rear surface of the insulation layer is formed by selectively removing a center portion of a rear surface of the silicon substrate. A membrane layer is deposited over the mesh and an exposed top surface of the insulation layer which is adjacent to the mesh. A rear surface of the membrane layer is exposed by selectively removing the portion of the insulation layer which is exposed by the frame.

Abstract: A method of producing a data carrier with a marking is disclosed. The data carrier includes a laser-markable portion and a beam-modifying portion adjacent the laser-markable portion. The beam-modifying portion has a beam modifying property. The method includes irradiating a laser beam through the beam-modifying portion to allow the beam modifying property thereof to modify at least one beam property to produce a resultant laser beam. This resultant laser beam creates a marking with a visual impression corresponding to the resultant laser beam at the laser-markable portion. The method further includes modifying the beam modifying property of at least a part of the beam-modifying portion through which the laser beam is irradiated for creating the marking so that the exact same resultant beam is difficult to be obtained thereat. A data carrier thereby produced is also disclosed.

Abstract: A description is given of methods and devices for product marking of objects using a light-sensitive layer applied to the objects and a light source. The invention may be used, for example, to simultaneously mark or label a first plurality of objects at a first time with individual marks or labels, and to mark or label a second plurality of objects at a second time with individual marks or labels.

Abstract: Waste reduction, including hazardous waste reduction in photoimaging processes can be accomplished by improving diffusional resolution of cationic curable compositions. The addition of fluorinated polymers including fluorinated surfactants provides improved diffusional resolution in cationic and/or radical based photoimaging formulations allowing for image accuracy improvements, and reduced product and process waste quantity and disposal cost. These fluorinated surfactants also allow for increased cure speed, and non-hazardous constituent formulations that result in less wasted material and time.

Abstract: A method of producing an image in the crystalline colloidal array is disclosed. The method includes providing an ordered array of particles received within a curable matrix composition; curing a first portion of the matrix composition, wherein the first cured portion diffracts radiation at a first wavelength; curing another portion of the matrix composition, wherein the other cured portion diffracts radiation at another wavelength; and exposing the array to radiation to exhibit an image.

Abstract: Provided is a novel silicone copolymer which exhibits high absorption even in a far-ultraviolet region of 200 nm or more, and also is soluble in an alkaline reagent since it has a phenolic hydroxyl group. The silicone copolymer comprises a silsesquioxane having a phenol unit and comprises a silsesquioxane having a condensed polycyclic hydrocarbon.

Abstract: The present invention allows for online image processing. A sample embodiment of the method comprises the steps of determining graphical layers (predetermined graphical layers), steps (predetermined steps), and image processing parameters for creating an image. A substitute layer maybe obtained from a remote User. The predetermined steps may be repeated using predetermined graphical layers and the substitute layer, thus, creating a new image. The image may be further delivered to the User. If the User is not satisfied, the graphical layers, steps, or image processing parameters may be changed and method repeated. Described systems and methods may allow users to create complex digital images using remote servers, without the use of graphical tools on the user's computer. Even users without substantial technical or artistic skills may create complex digital images.

Abstract: A method and article of manufacture for three-dimensional structures having micron dimensions includes coating a substrate with layers of photo resist. Each layer of photo resist is exposed with its own two-dimensional mask defining one slice of an object. Subsequent layers of photo resist are exposed with different patterns. Once all layers have been fabricated and exposed to identify two-dimensional features for the layer, the multiple layers are developed to removed photo resist which has not been exposed. The layered structure represents a three-dimensional object where the depth dimension is defined by the photo resist layer thickness. By decreasing the wavelength of the light exposure, it is possible to confine exposure to a single layer of photo resist.

Abstract: Provided are a mask pattern including a silicon-containing self-assembled molecular layer, a method of forming the same, and a method of fabricating a semiconductor device. The mask pattern includes a resist pattern formed on a semiconductor substrate and the self-assembled molecular layer formed on the resist pattern. The self-assembled molecular layer has a silica network formed by a sol-gel reaction. To form the mask pattern, first, the resist pattern is formed with openings on an underlayer covering the substrate to expose the underlayer to a first width. Then, the self-assembled molecular layer is selectively formed only on a surface of the resist pattern to expose the underlayer to a second width smaller than the first width. The underlayer is etched by using the resist pattern and the self-assembled molecular layer as an etching mask to obtain a fine pattern.

Abstract: The present invention allows for online image processing. A sample embodiment of the system comprises an Image Processing Means with one or more predetermined graphical layers, residing on the Image Processing Means The Image Processing Means has the ability to obtain one or more substitute layers and repeat a set of predetermined steps using predetermined layers and substitute layers to create a new image. A sample embodiment of the method comprises the steps of determining graphical layers (predetermined graphical layers) and steps (predetermined steps) for creating an image. A substitute layer maybe obtained from a remote User. The predetermined steps may be repeated using predetermined graphical layers and the substitute layer, thus, creating a new image. The image may be further delivered to the User. Described systems and methods may allow users to create complex digital images using remote servers, without the use of graphical tools on the user's computer.

Abstract: A double exposure method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a desired pattern to be printed on the substrate into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating the substrate with a first positive tone resist layer and a thin second positive tone resist layer on top of a target layer which is to be patterned with the desired dense line pattern. The second resist material is absorbing exposure radiation during a first patterning exposure and after development during a second patterning exposure to prevent exposure above energy-to-clear of at least a portion of the first resist material underneath exposed portions of the second resist material layer.

Abstract: An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization products of the oxetane-containing compound.

Abstract: The invention relates to a value document, especially a banknote, having a sequence of layers into which visually and/or mechanically perceptible identifiers in the form of patterns, letters, numbers or images are introduced by the action of laser radiation. According to the present invention, the sequence of layers includes a marking layer (22) composed of an ink mixture (24, 26) exhibiting a laser-radiation-absorbing mixture component (26) and a laser-radiation-transparent mixture component (24), the identifiers being visually and/or mechanically perceptible due to an irreversible change in the optical properties of the ink mixture (24, 26), effected by the action of the laser radiation.

Abstract: Thermally curable undercoat composition comprising for producing a bilayer relief image comprising: a) a polymer of Structure I comprising repeating units of Structure II, III, and IV b) a phenolic crosslinker; c) a thermal acid generator (TAG); and d) a solvent.

Abstract: Various manufacturing techniques may be employed to construct an appliqué for use in an instrument cluster. In one commonly employed technique, an appliqué may be formed by applying different colored ink layers onto a surface of a polycarbonate sheet using a silk screen printing. In some instance, an edge of an underlying ink layer may cause a visible step line on the face of the appliqué. To reduce or eliminate these visible step lines, an outer boundary area of the printing layers invention are defined as a dispersing dot pattern.

Abstract: An anti-copy film is disclosed. The film has a light transmissive imageable substrate having opposing first and second surfaces. Each surface has an image receptive coating. Complementary positive and negative images are disposed on the first and second surfaces such that an imaged area on the first surface is in registration with a non-imaged area on the second surface. The anti-copy film appears substantially opaque when viewed orthogonally to and appears partially transparent when viewed obliquely to either the first or second surfaces.

Abstract: Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a combination of two different polymeric binders one of which has an acid number of at least 30, which combination of polymers provides improved post-development bakeability (more quickly baked or cured at lower temperatures) and desired digital speed with no loss in chemical resistance.

Abstract: A surface graft material including a substrate and a surface graft polymer chain, wherein the surface graft polymer chain includes a photocleavable moiety at one of its terminals, and the surface graft polymer chain is directly bonded to a surface of the substrate by a covalent bond between the photocleavable moiety and the substrate. A graft pattern formation method comprising exposing the graft material to cleave the photocleavable moiety in the exposed area, and removing the graft polymer chain from the exposed are to form a surface graft polymer chain pattern. A conductive pattern material and a metal particle pattern material using the graft pattern.

Abstract: Major surface of a substrate having an optical waveguide and a modulation electrode is pasted to a base substrate through a thermosetting resin, and then the rear surface of the substrate is machined thus making thin the entirety. Subsequently, the rear surface of the substrate thus rendered thin is subjected to machining or laser machining to form a thin part, which is further subjected to machining or laser machining to form a first thin part at a part, including the optical waveguide, of the thin part and a second thin part thinner than the first thin part contiguously thereto. Thereafter, the rear surface of the substrate is pasted to the major surface of a supporting substrate through a thermosetting resin and the base substrate is stripped thus obtaining an optical modulator.

Abstract: Method for producing an exposed substrate, which has at least two different image areas. The substrate is provided with at least two photoresist layers, which are adjusted to the type of image areas to be produced.

Abstract: Single-layer and multilayer imageable elements have a substrate and at least one imageable layer and can be used to prepare positive-working lithographic printing plates. The imageable elements also include a radiation absorbing compound and a solvent-resistant polymer binder comprising an —N(R)—C(?X)—N(R?)—S(?O)2— moiety that is attached to the polymer backbone, wherein X is O or S, R and R? are independently hydrogen, halo, or an alkyl group having 1 to 6 carbon atoms. This solvent-resistant polymer binder is located in the imageable layer closest to the substrate and provides improved chemical resistance.

Abstract: Multilayer, positive working, thermally imageable, bakeable imageable elements have a substrate, an underlayer, and a top layer. The underlayer comprises a polymeric material that comprises, in polymerized form from about 5 mol % to about 30 mol % of recurring units derived from an ethylenically unsaturated polymerizable monomer having a carboxy group; from about 20 mol % to about 75 mol % of recurring units derived from N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, or a mixture thereof; and from about 3 mol % to about 50 mol % of recurring units derived from a compound represented by the formula: CH2?C(R2)—C(O)—NH—CH2—OR1, in which R1 is C1 to C12 alkyl, phenyl, C1 to C12 substituted phenyl, C1 to C12 aralkyl, or Si(CH3)3; and R2 is hydrogen or methyl. Other materials, such as a resin or resins having activated methylol and/or activated alkylated methylol groups, such as a resole resin, may be present in the underlayer.

Abstract: Positive-working imageable elements are prepared by providing a first layer and second layers onto a substrate. Both layers include the same or different radiation absorbing compounds dispersed within different polymeric binders. After both layers are dried, they are heat treated at from about 40 to about 90° C. for at least 4 hours under conditions that inhibit the removal of moisture from the dried first and second layers. This method of preparation provides elements with improved imaging speed and good shelf life.

Abstract: A positive-working imageable element comprises inner and outer layers and an infrared radiation absorbing compound such as an IR absorbing dye. The inner layer includes a first polymeric material. The ink receptive outer layer includes a second polymeric binder comprising pendant carboxy groups that provides improved chemical resistance to the imageable element and reduced residue from development.

Abstract: A positive-working imageable element comprises inner and outer layers and a radiation absorbing compound such as an IR absorbing dye. The inner layer includes a first polymeric material. The ink receptive outer layer includes a second polymeric binder comprising a polymer backbone and an —X—C(?T)—NR—S(?O)2— moiety that is attached to the polymer backbone, wherein —X— is an oxy or —NR?— group, T is O or S, R and R? are independently hydrogen, halo, or an alkyl group having 1 to 6 carbon atoms. After thermal imaging, the element can be developed using an alkaline developer. Use of the particular second polymeric binder reduces sludging in the developer. Its dissolution rate in the developer is slow enough to resist developer attack in the non-imaged areas of the outer layer but rapid enough for the second polymeric binder to be quickly loosened from imaged areas and kept suspended or dissolved for a considerable time.

Abstract: A positive-working imageable element comprises inner and outer layers and a radiation absorbing compound such as an IR absorbing dye. The inner layer includes a polymeric material that is removable using an alkaline developer. An ink receptive outer layer is not removable using an alkaline developer before its exposure to imaging radiation. The outer layer includes a polymer binder having pendant epoxy groups that are substantially unreacted during exposure.

Abstract: A display panel includes a transparent image recording sheet having electrophotographically formed thereon at least a background portion, wherein space factor of pinholes per unit area of the background portion is no greater than 1×10?2%. A method of manufacturing the display panel is also disclosed. The background portion has a transparent optical density of 3.0 or greater and an image portion has a transparent optical density of 1.0 or less, and preferably 0.1 to 1. A toner used for electrophotographically forming the background portion and the image portion has a number average molecular weight of 1,000 to 6,000 and a weight average molecular weight of 30,000 to 150,000 as measured by gel permeation chromatography with respect to a portion of the toner dissolved in tetrahydrofuran, and has respective molecular weight distribution peaks in molecular weight ranges of 1000 to 10,000 and 100,000 to 1,500,000.

Abstract: Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a polymer that is removable using an alkaline developer and in which from about 1 to about 50 mol % of its recurring units are derived from one or more of the ethylenically unsaturated polymerizable monomers represented by the following Structure (I): CH2?C(R1)C(?O)NR2(CR3R4)nOH ??(I) wherein R1, R2, R3, and R4 are independently hydrogen, lower alkyl, or phenyl, and n is 1 to 20. The imageable elements having improved resistance to development and printing chemicals and solvents.

Abstract: This invention discloses a releasable adhesion layer having good adhesion during high temperature fabrication process in the absence of light, and delaminating at a lower temperature in the presence of light. One embodiment of this invention is a film of polymer whose thermal decomposition temperature changes drastically upon photoexposure. These materials, prior to photoexposure, can withstand temperatures in the range of approximately 200° C. to 300° C. without decomposition, yet decompose at around 100° C. with photoexposure. The releasable adhesion layer can be used in a thermal transfer element, sandwiching a donor substrate and a transfer layer having a plurality of multicomponent transfer units. In the absence of light, the releasable adhesion layer can sustain high temperature processing of these multicomponent transfer units. By photoexposing according to a pattern, the photoexposed multicomponent transfer units can be selectively released at a low temperature to transfer to a receptor.

Abstract: This patent relates to an imaging member comprising a vacuous polymer base having adhered thereto an image formed on a transparent polymer sheet, wherein said vacuous polymer base has a density of less than 0.7 grams/cc and a modulus to density ratio of between 1500 and 4000 and wherein said image is in contact with said vacuous polymer base.

Abstract: The invention relates to a photographic article comprising a base material carrying at least one layer comprising a photographic image formed by combination of dyes formed from couplers wherein areas of said photo image are colored without dyes formed by couplers.

Abstract: The present invention provides a positive-working, thermally imageable element generally comprising a multi-layered imageable coating. The invention provides an imageable element comprising a substrate, an ink-receptive top layer, and an underlayer, the underlayer including a specific copolymer described herein. The copolymer can be a polymer comprising constitutional units derived from: a) a monomer having a cyclic urea group; b) a monomer comprising an N-substituted maleimide; c) a (meth)acrylamide or (meth)acrylate monomer; and d) a (meth)acrylic acid or vinyl benzoic acid monomer. In another embodiment, the copolymer can be a polymer comprising constitutional units derived from: a) a monomer having a cyclic urea group; b) a (meth)acrylic acid or vinyl benzoic acid monomer; c) and a (meth)acrylonitrile monomer. The imageable element may be used to prepare a lithographic printing plate that is resistant to press chemistry and can optionally be baked to increase press runlength.

Abstract: A photographic article. According to one embodiment, the photographic article comprises: a first image area comprising a photographic film negative of an image; and a second image area, different than the first image area, comprising a positive image of the image.

Abstract: Thermally imageable elements useful as lithographic printing plate precursors are disclosed. The elements comprise a substrate, an underlayer over the substrate, and a top layer over the underlayer. The top layer comprises a co-polymer that comprises, in polymerized form, norbornene or a norbornene derivative. The resulting lithographic printing plates have good resistance to pressroom chemicals.

Abstract: A method for forming a conductive layer is disclosed, which has the following steps. First, a substrate is provided, and then a patterned photoresist layer having an undercut is formed on the substrate. After that, at least one conductive layer is deposited on the substrate. Finally, the patterned photoresist layer is lifted off; wherein the shape of the conductive layer remaining on the substrate is complementary to that of the patterned photoresist layer.