Abstract: There are disclosed a resist composition and imaging method wherein the development rate of the composition is improved by using a polyhalogenated heterocyclic sensitivity-enhancing agent.
Abstract: Provided is a presensitized planographic printing plate requiring no dampening water for use in negative work which comprises a base substrate, a photosensitive layer secured to and overlying the base substrate, and containing an orthoquinonediazide compound and having a content of ethanol-soluble component not higher than 20% by weight, and a silicone rubber layer overlying the photosensitive layer through bonding component. When the printing plate is exposed through a negative film and then treated with a developer, the photosensitive layer in the exposed image areas is dissolved and the corresponding portion of the silicone rubber layer is also removed easily and is obtained image as an exact reproduction of the negative film. Dampening water is not required when printing is carried out.
Abstract: A photosensitive member comprising a photosensitive layer containing an o-quinonediazide compound as a photosensitive agent and an additive, characterized in that the additive is selected from a group consisting of quinone compounds and aromatic ketone compounds, and a method for forming an image using the same.
Abstract: An image-forming method is described using a light-sensitive material comprising a support and a light-sensitive layer on the support, said light-sensitive layer containing an o-quinonediazide compound as a first component and a basic carbonium dye as a second component; according to this method images can be obtained both by positive working and negative working techniques. Furthermore, images which are free from yellow light fogging can be obtained by use of a laser beam.
Abstract: A colored, positive-acting, radiation-sensitive composition whose color is extinguished or greatly decreased in intensity upon irradiation comprising at least one acid-free resin, at least one component which upon irradiation yields acidic and/or free radical products, at least one acid and/or free radical sensitive dyestuff and at least one positive-acting component; positive-acting elements comprising suitable support materials at least one surface of which has been coated with the above composition and lithographic printing plates comprising the above elements, wherein the support materials are lithographically suitable support materials, whch have been imagewise exposed to radiation whereby there is a high contrast, before development, between the colored image areas and less intensely colored or colorless non-image areas, the image areas of said plates being additionally highly stable against aqueous alkaline developers after development to remove the exposed non-image areas of the composition and more h
Type:
Grant
Filed:
June 15, 1981
Date of Patent:
September 21, 1982
Assignee:
Polychrome Corporation
Inventors:
James Shelnut, Eugene Golda, Alan Wilkes, Ken-ichi Shimazu
Abstract: A colored, positive-acting, radiation-sensitive composition whose color is extinguished or greatly decreased in intensity upon irradiation comprising at least one acid-free resin, at least one acid-sensitive dyestuff and at least one positive-acting component which yields an acidic product upon irradiation; positive-acting elements comprising suitable support materials at least one surface of which has been coated with the above composition and lithographic printing plates comprising the above elements, wherein the support materials are lithographically suitable support materials, which have been imagewise exposed to radiation wherein there is a high contrast, before development, between the colored image areas and less intensely colored or colorless non-image areas, the image areas of said plates being additionally highly stable against aqueous alkaline developers after development to remove the exposed non-image areas of the composition and more highly colored than the non-image areas of the revealed substr
Abstract: The invention relates to heat-resistant positive resists based upon precursor stages of highly heat-resistant polymers and light-sensitive diazoquinones, as well as to a method for preparing heat-resistant relief structures of such positive resists. The positive resists of the type mentioned are developed in such a manner that they are heat-resistant as well as have a long storage life and are easily processed. The invention provides for the use of oligomer and/or polymer precursor stages of polyoxazoles in the form of polycondensation products of aromatic and/or heterocyclic dihydroxydiamino compounds and dicarboxylic acid chlorides or esters. The positive resists according to the invention are suitable especially for applications in microelectronics.
Type:
Grant
Filed:
July 18, 1980
Date of Patent:
July 13, 1982
Assignee:
Siemens Aktiengesellschaft
Inventors:
Hellmut Ahne, Eberhard Kuhn, Roland Rubner
Abstract: A light-solubilizable composition comprising at least one o-quinonediazide compound and at least one alkali-soluble resin compatible therewith as essential components and containing fine particles dispersed therein which:(1) have an average particle size of 500 m.mu. or less;(2) are insoluble in an organic solvent used to coat the light-solubilizable composition and have a hydrophobic surface;(3) are transparent or white; and(4) have a refractive index of 1.3 to 1.7,in an amount of 0.1 to 50% by weight based on said light-solubilizable composition.
Abstract: A process for forming an image is disclosed wherein a photo-sensitive material composed of a support and a layer of a photo-sensitive composition containing a diazonium compound, an o-quinonediazide compound or an aromatic azide is exposed and developed by heating in intimate contact with a peeling development carrier sheet, and subsequently, peeling the carrier sheet from the photo-sensitive material.
Abstract: Photosensitive compositions which contain as a photosensitive resin prepared by the condensation of the co-condensated novolak resin of the mixture of phenols such as in a combination of tert-butyl (or tert-octyl) phenol and phenol and/or cresol and formaldehyde, with o-quinonediazido sulfonic (or carboxylic) acid or contain said novolak resin as an additive for a photosensitive o-quinonediazido compound are discosed.
Abstract: A photosensitive composition useful for making a photosensitive lithographic printing plate are made from a condensation product of sulfonylchloride of o-benzoquinone diazide or o-naphthoquinone diazide and a polyhydric phenol resin obtained by condensing a polyhydric phenol such as resorcinol with a benzaldehyde, an acetophenone, or a benzophenone.
Abstract: A photosensitive composition useful for making a photosensitive lithographic printing plate are made from a condensation product of sulfonyl chloride of o-benzoquinone diazide or o-naphthoquinone diazide and a polyhydric phenol resin obtained by condensing a polyhydric phenol such as 2-methyl resorcinol with an aldehyde or ketone.
Abstract: Imaging means, such as a tetrazolium salt, capable of reduction to form a visible image is present in a radiation-sensitive layer in combination with a photoreductant incorporating one or more labile hydrogen atoms and capable of producing a reducing agent precursor in radiation-struck areas of the layer. An image is produced in the layer by processing the layer after imagewise exposure to actinic radiation.
Type:
Grant
Filed:
September 29, 1978
Date of Patent:
August 18, 1981
Assignee:
Eastman Kodak Company
Inventors:
James C. Fleming, Joseph W. Manthey, Ralph T. Brongo
Abstract: A light-sensitive copying material comprising at least two organic coating layers on a support, at least one of the coating layers being a light-sensitive layer which comprises an O-quinone diazide compound whose alkali solubility is increased by irradiation with active rays.
Abstract: A gallic acid alkyl ester or a gallic acid aryl ester is reacted in an inert solvent with 3 equivalents of naphthoquinone-(1,2)-diazido-(2)-sulfonyl chloride in the presence of an alkali to effect sulfonylation of 3 hydroxyl groups in the gallic acid moiety whereby a photodecomposable naphthoquinone-(1,2)-diazido-(2)-sulfonic acid ester is obtained. The new naphthoquinonediazido derivative thus obtained is mixed with an alkali-soluble phenol resin such as m-cresol novolac resin or phenol novolac resin to prepare a positive-type photoresist composition having high sensitivity and high resolving power as well as excellent dimensional accuracy and etching-resistance. In addition, this composition forms a good photosensitive film and can be a good ink receptor.