Polymeric Quinone Diazide Patents (Class 430/190)
  • Patent number: 4365019
    Abstract: There are disclosed a resist composition and imaging method wherein the development rate of the composition is improved by using a polyhalogenated heterocyclic sensitivity-enhancing agent.
    Type: Grant
    Filed: August 6, 1981
    Date of Patent: December 21, 1982
    Assignee: Eastman Kodak Company
    Inventors: Robert C Daly, John R. Guild
  • Patent number: 4358522
    Abstract: Provided is a presensitized planographic printing plate requiring no dampening water for use in negative work which comprises a base substrate, a photosensitive layer secured to and overlying the base substrate, and containing an orthoquinonediazide compound and having a content of ethanol-soluble component not higher than 20% by weight, and a silicone rubber layer overlying the photosensitive layer through bonding component. When the printing plate is exposed through a negative film and then treated with a developer, the photosensitive layer in the exposed image areas is dissolved and the corresponding portion of the silicone rubber layer is also removed easily and is obtained image as an exact reproduction of the negative film. Dampening water is not required when printing is carried out.
    Type: Grant
    Filed: August 17, 1981
    Date of Patent: November 9, 1982
    Assignee: Toray Industries Incorporated
    Inventors: Takashi Fujita, Masao Iwamoto
  • Patent number: 4356255
    Abstract: A photosensitive member comprising a photosensitive layer containing an o-quinonediazide compound as a photosensitive agent and an additive, characterized in that the additive is selected from a group consisting of quinone compounds and aromatic ketone compounds, and a method for forming an image using the same.
    Type: Grant
    Filed: June 30, 1980
    Date of Patent: October 26, 1982
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiromichi Tachikawa, Yohnosuke Takahashi, Fumiaki Shinozaki, Tomoaki Ikeda
  • Patent number: 4356254
    Abstract: An image-forming method is described using a light-sensitive material comprising a support and a light-sensitive layer on the support, said light-sensitive layer containing an o-quinonediazide compound as a first component and a basic carbonium dye as a second component; according to this method images can be obtained both by positive working and negative working techniques. Furthermore, images which are free from yellow light fogging can be obtained by use of a laser beam.
    Type: Grant
    Filed: July 7, 1980
    Date of Patent: October 26, 1982
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yohnosuke Takahashi, Hiromichi Tachikawa, Fumiaki Shinozaki, Tomoaki Ikeda
  • Patent number: 4350753
    Abstract: A colored, positive-acting, radiation-sensitive composition whose color is extinguished or greatly decreased in intensity upon irradiation comprising at least one acid-free resin, at least one component which upon irradiation yields acidic and/or free radical products, at least one acid and/or free radical sensitive dyestuff and at least one positive-acting component; positive-acting elements comprising suitable support materials at least one surface of which has been coated with the above composition and lithographic printing plates comprising the above elements, wherein the support materials are lithographically suitable support materials, whch have been imagewise exposed to radiation whereby there is a high contrast, before development, between the colored image areas and less intensely colored or colorless non-image areas, the image areas of said plates being additionally highly stable against aqueous alkaline developers after development to remove the exposed non-image areas of the composition and more h
    Type: Grant
    Filed: June 15, 1981
    Date of Patent: September 21, 1982
    Assignee: Polychrome Corporation
    Inventors: James Shelnut, Eugene Golda, Alan Wilkes, Ken-ichi Shimazu
  • Patent number: 4348471
    Abstract: A colored, positive-acting, radiation-sensitive composition whose color is extinguished or greatly decreased in intensity upon irradiation comprising at least one acid-free resin, at least one acid-sensitive dyestuff and at least one positive-acting component which yields an acidic product upon irradiation; positive-acting elements comprising suitable support materials at least one surface of which has been coated with the above composition and lithographic printing plates comprising the above elements, wherein the support materials are lithographically suitable support materials, which have been imagewise exposed to radiation wherein there is a high contrast, before development, between the colored image areas and less intensely colored or colorless non-image areas, the image areas of said plates being additionally highly stable against aqueous alkaline developers after development to remove the exposed non-image areas of the composition and more highly colored than the non-image areas of the revealed substr
    Type: Grant
    Filed: June 15, 1981
    Date of Patent: September 7, 1982
    Assignee: Polychrome Corporation
    Inventors: James Shelnut, Richard J. Cohen
  • Patent number: 4339521
    Abstract: The invention relates to heat-resistant positive resists based upon precursor stages of highly heat-resistant polymers and light-sensitive diazoquinones, as well as to a method for preparing heat-resistant relief structures of such positive resists. The positive resists of the type mentioned are developed in such a manner that they are heat-resistant as well as have a long storage life and are easily processed. The invention provides for the use of oligomer and/or polymer precursor stages of polyoxazoles in the form of polycondensation products of aromatic and/or heterocyclic dihydroxydiamino compounds and dicarboxylic acid chlorides or esters. The positive resists according to the invention are suitable especially for applications in microelectronics.
    Type: Grant
    Filed: July 18, 1980
    Date of Patent: July 13, 1982
    Assignee: Siemens Aktiengesellschaft
    Inventors: Hellmut Ahne, Eberhard Kuhn, Roland Rubner
  • Patent number: 4336319
    Abstract: A light-solubilizable composition comprising at least one o-quinonediazide compound and at least one alkali-soluble resin compatible therewith as essential components and containing fine particles dispersed therein which:(1) have an average particle size of 500 m.mu. or less;(2) are insoluble in an organic solvent used to coat the light-solubilizable composition and have a hydrophobic surface;(3) are transparent or white; and(4) have a refractive index of 1.3 to 1.7,in an amount of 0.1 to 50% by weight based on said light-solubilizable composition.
    Type: Grant
    Filed: October 22, 1980
    Date of Patent: June 22, 1982
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akira Nagashima, Nobuyuki Kita
  • Patent number: 4334006
    Abstract: A process for forming an image is disclosed wherein a photo-sensitive material composed of a support and a layer of a photo-sensitive composition containing a diazonium compound, an o-quinonediazide compound or an aromatic azide is exposed and developed by heating in intimate contact with a peeling development carrier sheet, and subsequently, peeling the carrier sheet from the photo-sensitive material.
    Type: Grant
    Filed: April 14, 1980
    Date of Patent: June 8, 1982
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masao Kitajima, Hiromichi Tachikawa, Fumiaki Shinozaki, Tomoaki Ikeda
  • Patent number: 4308368
    Abstract: Photosensitive compositions which contain as a photosensitive resin prepared by the condensation of the co-condensated novolak resin of the mixture of phenols such as in a combination of tert-butyl (or tert-octyl) phenol and phenol and/or cresol and formaldehyde, with o-quinonediazido sulfonic (or carboxylic) acid or contain said novolak resin as an additive for a photosensitive o-quinonediazido compound are discosed.
    Type: Grant
    Filed: March 14, 1980
    Date of Patent: December 29, 1981
    Assignee: Daicel Chemical Industries Ltd.
    Inventors: Keiji Kubo, Tetsuo Ishihara
  • Patent number: 4306010
    Abstract: A photosensitive composition useful for making a photosensitive lithographic printing plate are made from a condensation product of sulfonylchloride of o-benzoquinone diazide or o-naphthoquinone diazide and a polyhydric phenol resin obtained by condensing a polyhydric phenol such as resorcinol with a benzaldehyde, an acetophenone, or a benzophenone.
    Type: Grant
    Filed: May 28, 1980
    Date of Patent: December 15, 1981
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Masafumi Uehara, Akio Iwaki, Yoko Ogawa, Fumio Shimada, Masatoshi Matsuzaki
  • Patent number: 4306011
    Abstract: A photosensitive composition useful for making a photosensitive lithographic printing plate are made from a condensation product of sulfonyl chloride of o-benzoquinone diazide or o-naphthoquinone diazide and a polyhydric phenol resin obtained by condensing a polyhydric phenol such as 2-methyl resorcinol with an aldehyde or ketone.
    Type: Grant
    Filed: May 28, 1980
    Date of Patent: December 15, 1981
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Masafumi Uehara, Akio Iwaki, Yoko Ogawa, Fumio Shimada, Masatoshi Matsuzaki
  • Patent number: 4284704
    Abstract: Imaging means, such as a tetrazolium salt, capable of reduction to form a visible image is present in a radiation-sensitive layer in combination with a photoreductant incorporating one or more labile hydrogen atoms and capable of producing a reducing agent precursor in radiation-struck areas of the layer. An image is produced in the layer by processing the layer after imagewise exposure to actinic radiation.
    Type: Grant
    Filed: September 29, 1978
    Date of Patent: August 18, 1981
    Assignee: Eastman Kodak Company
    Inventors: James C. Fleming, Joseph W. Manthey, Ralph T. Brongo
  • Patent number: 4217407
    Abstract: A light-sensitive copying material comprising at least two organic coating layers on a support, at least one of the coating layers being a light-sensitive layer which comprises an O-quinone diazide compound whose alkali solubility is increased by irradiation with active rays.
    Type: Grant
    Filed: December 1, 1976
    Date of Patent: August 12, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masaru Watanabe, Tadao Yoyama, Azusa Ohashi
  • Patent number: 4174222
    Abstract: A gallic acid alkyl ester or a gallic acid aryl ester is reacted in an inert solvent with 3 equivalents of naphthoquinone-(1,2)-diazido-(2)-sulfonyl chloride in the presence of an alkali to effect sulfonylation of 3 hydroxyl groups in the gallic acid moiety whereby a photodecomposable naphthoquinone-(1,2)-diazido-(2)-sulfonic acid ester is obtained. The new naphthoquinonediazido derivative thus obtained is mixed with an alkali-soluble phenol resin such as m-cresol novolac resin or phenol novolac resin to prepare a positive-type photoresist composition having high sensitivity and high resolving power as well as excellent dimensional accuracy and etching-resistance. In addition, this composition forms a good photosensitive film and can be a good ink receptor.
    Type: Grant
    Filed: February 27, 1978
    Date of Patent: November 13, 1979
    Assignee: Tokyo Ohka Kogyo Kabushiki Kaisha
    Inventors: Takashi Komine, Akira Yokota, Hisashi Nakane, Shingo Asaumi, Noboru Okazaki