P-type Or N-type Silicon Containing (e.g., Silicon Doped With A Group Iiia, Or A Group Va Element) Patents (Class 430/57.7)
  • Patent number: 6635397
    Abstract: A negative-charging electrophotographic photosensitive member comprising an aluminum-based substrate and a silicate film and a light-receiving layer in this order. The silicate film has a layer thickness of 0.5 nm to 15 nm and comprises at least aluminum atoms, silicon atoms and oxygen atoms. The light-receiving layer has at least a lower-part charge injection blocking layer formed of a non-single crystal silicon film comprising at least silicon atoms, nitrogen atoms and oxygen atoms, not doped with any impurities, a photoconductive layer formed of a non-single crystal silicon film comprising at least silicon atoms, an upper-part charge injection blocking layer formed of a non-single crystal silicon film comprising at least silicon atoms, carbon atoms and atoms belonging to the Group 13 of the periodic table, and a surface protective layer formed of a non-single crystal silicon film comprising at least silicon atoms and containing carbon atoms.
    Type: Grant
    Filed: April 23, 2002
    Date of Patent: October 21, 2003
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ryuji Okamura, Junichiro Hashizume, Kazuto Hosoi
  • Publication number: 20030104293
    Abstract: A negative-charging electrophotographic photosensitive member comprising an aluminum-based substrate and a silicate film and a light-receiving layer in this order. The silicate film has a layer thickness of 0.5 nm to 15 nm and comprises at least aluminum atoms, silicon atoms and oxygen atoms. The light-receiving layer has at least a lower-part charge injection blocking layer formed of a non-single crystal silicon film comprising at least silicon atoms, nitrogen atoms and oxygen atoms, not doped with any impurities, a photoconductive layer formed of a non-single crystal silicon film comprising at least silicon atoms, an upper-part charge injection blocking layer formed of a non-single crystal silicon film comprising at least silicon atoms, carbon atoms and atoms belonging to the Group 13 of the periodic table, and a surface protective layer formed of a non-single crystal silicon film comprising at least silicon atoms and containing carbon atoms.
    Type: Application
    Filed: April 23, 2002
    Publication date: June 5, 2003
    Inventors: Ryuji Okamura, Junichiro Hashizume, Kazuto Hosoi
  • Patent number: 6379852
    Abstract: An electrophotographic light-receiving member comprising a conductive support and provided thereon a photoconductive layer formed of a non-single-crystal material mainly composed of silicon atom and containing hydrogen atom and an element belonging to Group IIIb of the periodic table; wherein the photoconductive layer has hydrogen atom content, an optical band gap and a characteristic energy obtained from the exponential tail of light absorption spectra, all in specific ranges, and has on the surface side thereof a second layer region that absorbs a prescribed amount of light incident on the photoconductive layer and on the support side thereof the other first layer region; the element belonging to Group IIIb of the periodic table being contained in the second layer region in an amount made smaller than that in the first layer region.
    Type: Grant
    Filed: September 10, 1997
    Date of Patent: April 30, 2002
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shinji Tsuchida, Hiroaki Niino, Satoshi Kojima
  • Publication number: 20020009660
    Abstract: An electrophotographic light-receiving member has a conductive support and a light-receiving member having a photoconductive layer formed on the surface of the conductive support and composed of a non-single crystal material containing silicon atoms as a main component, hydrogen atoms and/or halogen atoms. The non-single crystal material which constitutes the photoconductive layer has an optical band gap of 1.8 eV to 1.85 eV, and the characteristic energy of an exponential tail obtained from a light absorption spectrum of the non-single crystal material is 50 meV to 55 meV. The electrophotographic light-receiving member is simultaneously improved in its charge performance, environmental stability and exposure memory, and has excellent potential characteristics and image properties.
    Type: Application
    Filed: December 23, 1996
    Publication date: January 24, 2002
    Inventors: HIROAKI NIINO, SATOSHI KOJIMA, SHINJI TSUCHIDA
  • Publication number: 20010055721
    Abstract: An electrophotographic light-receiving member comprising a conductive support and provided thereon a photoconductive layer formed of a non-single-crystal material mainly composed of silicon atom and containing hydrogen atom and an element belonging to Group IIIb of the periodic table; wherein the photoconductive layer has hydrogen atom content, an optical band gap and a characteristic energy obtained from the exponential tail of light absorption spectra, all in specific ranges, and has on the surface side thereof a second layer region that absorbs a prescribed amount of light incident on the photoconductive layer and on the support side thereof the other first layer region; the element belonging to Group IIIb of the periodic table being contained in the second layer region in an amount made smaller than that in the first layer region.
    Type: Application
    Filed: September 10, 1997
    Publication date: December 27, 2001
    Inventors: SHINJI TSUCHIDA, HIROAKI NIINO, SATOSHI KOJIMA
  • Patent number: 6294299
    Abstract: An electrophotographic light-receiving member has a conductive support and a photoconductive layer composed of a non-monocrystalline material comprising silicon atoms as a matrix, hydrogen and/or halogen atoms, and an element belonging to Group IIIb of the periodic table. The photoconductive layer has from the surface side toward the conductive support side, a third layer region that absorbs 50-90% of incident image exposure light and a second layer region that absorbs 60-90% of pre-exposure light incident on the photoconductive layer. The Group IIIb element is present such that its content decreases from the conductive support side to the surface side. In three embodiments the photoconductive layer has, respectively: 10-30 at. % H; 10-20 at. % H and 25-40 at % H; an optical band gap of 1.75-1.85 eV, 1.65-1.75 eV and 1.80-1.90 eV and a characteristic energy of each of 50-55 meV.
    Type: Grant
    Filed: August 20, 1998
    Date of Patent: September 25, 2001
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shinji Tsuchida, Hiroaki Niino, Satoshi Kojima, Daisuke Tazawa
  • Publication number: 20010009747
    Abstract: An electrophotographic light-receiving member is disclosed which comprises a conductive support; and a light-receiving layer provided on the conductive support and having a photoconductive layer composed of a non-monocrystalline material comprising silicon atoms as a matrix, hydrogen and/or halogen atoms, and an element belonging to Group IIIb of the periodic table, wherein the photoconductive layer has from the surface side toward the conductive support side, a third layer region that absorbs a specified range of amount of image exposure light incident on the photoconductive layer, a second layer region that is other than the third layer region of a layer region that absorbs a specified range of amount of pre-exposure light incident on the photoconductive layer, and a first layer region that is other than the third and the second layer regions of the photoconductive layer, and wherein the element belonging to Group IIIb of the periodic table is contained in the photoconductive layer such that the content of
    Type: Application
    Filed: August 20, 1998
    Publication date: July 26, 2001
    Inventors: SHINJI TSUCHIDA, HIROAKI NIINO, SATOSHI KOJIMA, DAISUKE TAZAWA