Carbonyl Compound Containing Patents (Class 430/923)
-
Patent number: 4970136Abstract: Titanocenes with, for example, .pi.-cyclopentadienyl ligands in which one or two carbo- or heterocyclic aromatic rings are bonded to the titanium, the aromatic rings being substituted by fluorine in at least one of the two ortho-positions relative to the matal-carbon bond and being substituted by at least one free or etherified or esterified polyoxaalkylene radical, are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated substrates.Type: GrantFiled: June 5, 1989Date of Patent: November 13, 1990Assignee: Ciba-Geigy CorporationInventors: Martin Riediker, Eginhard Steiner, Harry Beyeler, Manfred Rembold, Franciszek Sitek
-
Patent number: 4952612Abstract: A polymerizable composition comprises a polymeric precursor selected from the group consisting of (1) at least one ethylenically-unsaturated monomer, (2) at least one epoxy monomer, and (3) polyurethane precursors, and a curing agent comprising an organometallic compound and an onium salt.Type: GrantFiled: August 28, 1987Date of Patent: August 28, 1990Assignee: Minnesota Mining and Manufacturing CompanyInventors: Katherine A. Brown-Wensley, Robert J. Devoe, Michael C. Palazzotto
-
Patent number: 4950696Abstract: An energy polymerizable composition comprises at least one ethylenically-unsaturated monomer, one of polyurethane precursors, and at least one epoxy monomer, and a curing agent comprising an organometallic compound, and an onium salt.Type: GrantFiled: August 28, 1987Date of Patent: August 21, 1990Assignee: Minnesota Mining and Manufacturing CompanyInventors: Michael C. Palazotto, Katherine A. Brown-Wensley, Robert J. DeVoe
-
Patent number: 4889791Abstract: A positive type photoresist material comprises a polymer having structural units each represented by the following formula (I) of; ##STR1## wherein each of R.sup.1, R.sup.2, R.sup.3 and R.sup.6 represents a hydrogen atom or a hydrocarbon residue having 1 to 12 carbon atoms, each or R.sup.4 and R.sup.5 represents a hydrogen atom, a hydroxyl group or a hydrocarbon residue having 1 to 12 carbon atoms and Z represents--CH.sub.2 --.sub.n which n indicates an integer of 0 to 4.Type: GrantFiled: January 31, 1989Date of Patent: December 26, 1989Assignee: Nippon Oil Co., Ltd.Inventors: Shozo Tsuchiya, Nobuo Aoki, Shinichiro Suzuki
-
Patent number: 4868091Abstract: Novel photopolymerizable recording materials, in particular for the production of printing plates and relief plates, can be developed with water or an aqueous alkaline solution and predominantly consist of a photoinitiator-containing mixture of (a) one or more low molecular weight compounds having one or more photopolymerizable olefinically unsaturated double bonds and (b) one or more organic polymeric binders and contain a bisacylphosphine oxide as the photoinitiator.These recording materials are useful for the production of printing plates and relief plates.Type: GrantFiled: October 1, 1987Date of Patent: September 19, 1989Assignee: BASF AktiengesellschaftInventors: Andreas Boettcher, Bernd Bronstert, Gerhard Hoffmann
-
Patent number: 4824765Abstract: Substituted dibenzalketones useful as water-soluble photoinitiators have the formula: ##STR1## wherein R.sup.1 and R.sup.2 are 4, alkyl or, taken together, an aliphatic ring, n=0 or an integer and R.sup.3 and R.sup.4 either are both water-solubilizing groups (a) --X(CH.sub.2).sub.m N.sup.+ R.sup.5.sub.3, (b) --X(CH.sub.2).sub.m COO.sup.- M or (c) --X(CH.sub.2).sub.m SO.sup.-.sub.3 M.sub.5 or one is such a group and the other is (d) a group --NR.sup.5.sub.2, X is --CH.sub.2 --, --O-- or --S--, R.sup.5 is an alkyl group, M is H.sup.+ or a metal cation and m=0. Such a photoinitiator compound is associated with a polymerizable compound in an aqueous photopolymerizable composition.Type: GrantFiled: October 10, 1986Date of Patent: April 25, 1989Inventors: John A. Sperry, Ross A. Balfour
-
Patent number: 4766055Abstract: Disclosed is a photopolymerizable composition which is very sensitive to visible light. The composition comprises a polymerizable compound and a photopolymerization initiator wherein the photopolymerization initiator comprises (a) a particular xanthene or thioxanthene dyestuff, (b) a photosensitizer selected from the group consisting of N-phenylglycine, 2,4,6-tris(trichloromethyl)-1,3,5-triazine, and a mixture of p-dimethylaminobenzoic acid isopentyl ester and 2,4-diisopropylthioxanthone, and (c) a peroxide.Type: GrantFiled: August 1, 1986Date of Patent: August 23, 1988Assignee: Nippon Paint Co., Ltd.Inventors: Masami Kawabata, Koichi Kimoto, Yasuyuki Takimoto
-
Patent number: 4764451Abstract: An image-forming method which comprises:imagewise exposing a light-sensitive material comprising a light-sensitive layer provided on a support wherein the light-sensitive layer contains silver halide, a reducing agent, a polymerizable compound and a photo-polymerization initiator;simultaneously or thereafter developing the light-sensitive material to polymerize the polymerizable compound within the area where the latent image of the silver halide has been formed;pressing the light-sensitive material on an image-receiving material to transfer unpolymerized polymerizable compound to the image-receiving material; andirradiating the image-receiving material with a light.Type: GrantFiled: January 12, 1987Date of Patent: August 16, 1988Assignee: Fuji Photo Film Co., Ltd.Inventor: Shunichi Ishikawa
-
Patent number: 4721734Abstract: Compounds of the formula ##STR1## wherein R.sub.1 is hydrogen, chlorine, phenyl, dialkylamino of 2-4 carbon atoms or alkyl or alkoxy each of up to 18 carbon atoms; R.sub.2 is hydrogen, chlorine, bromine or alkyl or alkoxy each of up to 4 carbon atoms; R.sub.3 and R.sub.4, which can be the same or different, each is hydrogen or alkyl of up to 6 carbon atoms; R.sub.5 is hydrogen or alkyl or alkanoyl each of up to 4 carbon atoms; and R.sub.6 is hydrogen or methyl, with the proviso that not all of R.sub.1 to R.sub.6 simultaneously are hydrogen, are effective photosensitizers, especially for photopolymerization of unsaturated compounds and for hardening of printing dyes.Type: GrantFiled: August 31, 1984Date of Patent: January 26, 1988Assignee: Merck Patent Gesellschaft mit beschrankter HaftungInventors: Juergen Gehlhaus, Manfred Kieser
-
Patent number: 4707432Abstract: A free radical polymerizable composition comprising a free radical polymerizable material and a photoinitiator system therefor comprising appropriate amounts of an alpha-cleavage or homolytic bond cleavage, photoinitiator and a ferrocenium salt, said composition being suitable for use in the preparation of protective layers and photographic images.Type: GrantFiled: September 23, 1985Date of Patent: November 17, 1987Assignee: Ciba-Geigy CorporationInventors: Leslie R. Gatechair, Gary M. Blumenstein, Peter J. Schirmann
-
Patent number: 4684599Abstract: Positive-working imaging compositions comprise a polymeric binder and a quinone sensitizer which provides alkali solubility to the composition when exposed to activating radiation.Type: GrantFiled: July 14, 1986Date of Patent: August 4, 1987Assignee: Eastman Kodak CompanyInventors: Thap DoMinh, James C. Fleming, Michael J. Lindstrom
-
Patent number: 4661434Abstract: A photopolymerizable composition comprising (A) an addition-polymerizable unsaturated compound having two or more ethylenically unsaturated double bonds and (B) a ternary photopolymerization initiator system, comprising a combination of a 4,4'-bis(dialkylamino)benzophenone represented by the following general formula (I), a carbonyl compound represented by the following general formula (IIa) or (IIb), and a compound having a group represented by the following general formula (III): ##STR1## wherein each R, which may be the same or different, represents an alkyl group, a cycloalkyl group or a hydroxyalkyl group, or may be bonded to another R substituent of the same nitrogen atom to form a tetramethylene group, a pentamethylene group or an oxybisethylene group; ##STR2## wherein X represents a single bond, an oxygen atom, a sulfur atom, a substituted or unsubstituted nitrogen atom or a carbonyl group, R.sup.1 and R.sup.Type: GrantFiled: August 16, 1984Date of Patent: April 28, 1987Assignee: Fuji Photo Film Co., Ltd.Inventors: Masayuki Iwasaki, Minoru Maeda, Fumiaki Shinozaki
-
Patent number: 4618564Abstract: Positive images are produced by (i) exposing to actinic radiation in a predetermined pattern a composition supported on a substrate, which composition comprises a film-forming organic material and a substance which releases a sulphonic acid on exposure to actinic radiation, thereby rendering the composition more soluble in the developer in the exposed areas than the unexposed areas, and (ii) treating the composition with the aqueous base developer to remove the unexposed areas. The image-forming process may be used in the production of printing plates and electrical circuits.Type: GrantFiled: May 24, 1985Date of Patent: October 21, 1986Assignee: Ciba-Geigy CorporationInventors: Christopher G. Demmer, Edward Irving
-
Patent number: 4609612Abstract: There are obtained by mixing together approximately equal parts of 1-benzoylcyclohexanol and benzophenone or a benzophenone derivative liquid mixtures which possess a high activity as photoinitiators for the polymerization of ethylenically unsaturated compounds. The level of activity is higher than that of the individual components taken separately.Type: GrantFiled: October 4, 1985Date of Patent: September 2, 1986Assignee: Ciba Geigy CorporationInventors: Godwin Berner, Aloysius H. Manse
-
Patent number: 4584260Abstract: A photopolymerizable composition comprising an addition polymerizable unsaturated compound containing at least two ethylenically unsaturated double bonds in the molecule thereof and photopolymerization initiators, wherein a 4,4'-bis(dialkylamino)benzophenone represented by general formula I below, a benzophenone derivative represented by general formula II below and a compound having a group represented by general formula III below are contained as said photopolymerization initiators: ##STR1## wherein R represents an alkyl, cycloalkyl or hydroxyalkyl group having 1 to 6 carbon atoms or is combined with another R substituted on the same nitrogen atom to form tetramethylene, pentamethylene or oxybisethylene; ##STR2## wherein R.sup.1 represents a hydrogen atom ##STR3## X.sub.1 and X.sub.2 each represents an alkyl group, an alkoxy group, a carboxy group, an alkoxycarbonyl group, an aryloxycarbonyl group or a halogen atom; m and n each represents 0, 1 or 2 and when m and n each represents 2, X.sub.1 and X.sub.Type: GrantFiled: June 6, 1985Date of Patent: April 22, 1986Assignee: Fuji Photo Film Co., Ltd.Inventors: Masayuki Iwasaki, Minoru Maeda, Fumiaki Shinozaki
-
Patent number: 4565769Abstract: Photopolymerizable composition consisting essentially of (A) at least one ethylenically unsaturated monomeric compound, (B) at least one 2,4,5-triarylimidazolyl dimer, (C) sensitizing amount of at least one polymeric sensitizer, weight average molecular weight 10,000 to 300,000, which is the reaction product of (1) a reactive photosensitizer and (2) a reactive polymer as defined herein, and (D) optionally an organic polymeric binder. The compositions are useful in photoresists, chemical milling, toning films and printing plates.Type: GrantFiled: November 21, 1984Date of Patent: January 21, 1986Assignee: E. I. Du Pont de Nemours and CompanyInventors: Thomas E. Dueber, Bruce M. Monroe
-
Patent number: 4563438Abstract: There are obtained by mixing together approximately equal parts of 1-benzoylcyclohexanol and benzophenone or a benzophenone derivative liquid mixtures which possess a high activity as photoinitiators for the polymerization of ethylenically unsaturated compounds. The level of activity is higher than that of the individual components taken separately.Type: GrantFiled: April 26, 1984Date of Patent: January 7, 1986Assignee: Ciba Geigy CorporationInventors: Godwin Berner, Aloysius H. Manser
-
Patent number: 4555474Abstract: A photopolymerizable composition is described, comprising a polymerizable compound having an ethylenically unsaturated bond and a photopolymerization initiator represented by formula (I) ##STR1## wherein Z represents a non-metallic atomic group forming a nitrogen-containing heterocyclic ring; and R represents a substituted or unsubstituted aryl group or a substituted or unsubstituted heterocyclic ring. The photopolymerization initiator (I) greatly improves the sensitivity of the composition.Type: GrantFiled: February 4, 1985Date of Patent: November 26, 1985Assignee: Fuji Photo Film Co., Ltd.Inventors: Kouichi Kawamura, Yoshimasa Aotani, Akira Umehara
-
Patent number: 4548892Abstract: A photopolymerizable composition is described, containing an addition polymerizable, unsaturated compound having two or more ethylenically unsaturated double bonds within the molecule and a photopolymerization initiator, wherein said photopolymerization initiator is an acylhaloacetic acid amide derivative represented by formula (I) ##STR1## wherein Ar represents a substituted or unsubstituted aryl group, X represents a carbonyl or sulfonyl group, Y represents a chlorine atom or a bromine atom, R represents a hydrogen atom, a chlorine atom or a bromine atom, and R.sup.a and R.sup.b each represents a hydrogen atom, a substituted or unsubstituted alkyl group, an aryl group, or an aralkyl group.Type: GrantFiled: January 29, 1985Date of Patent: October 22, 1985Assignee: Fuji Photo Film Co., Ltd.Inventors: Masayuki Iwasaki, Minoru Maeda, Fumiaki Shinozaki, Kouichi Kawamura
-
Patent number: 4515886Abstract: Photosensitive compositions useful as resists for transistors, ICs, etc. comprising a solution of a photosensitive high polymer of a polymer or a copolymer which contains a unit expressed by the following general formula: ##STR1## (where X.sub.1 is an atom of hydrogen or halogen, a halogenated alkyl group of 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms, X.sub.2 is a halogen atom or a halogenated alkyl group having 1 to 4 carbon atoms and R is an aromatic ring or a heterocyclic ring), and a photosensitizing agent dissolved in organic solvents. The photosensitive compositions show marked improvement in photosensitivity and gamma value.Type: GrantFiled: February 13, 1984Date of Patent: May 7, 1985Assignee: Toyo Soda Manufacturing Co., Ltd.Inventors: Tsuguo Yamaoka, Mitsutoshi Fukuda
-
Patent number: 4503140Abstract: Radiation-sensitive polymeric compositions containing metal-carbonyl complexes and the cured insoluble crosslinked resin produced therefrom are disclosed. When coated as a layer on a substrate, the composition is useful as an element in the graphic arts.Type: GrantFiled: May 18, 1982Date of Patent: March 5, 1985Assignee: Minnesota Mining and Manufacturing CompanyInventor: Robin E. Wright
-
Patent number: 4498963Abstract: Peresters of the formula: ##STR1## wherein R is an alkyl group; and ##STR2## is a light-absorbing chromophore group; and use thereof as photoinitiators are provided.Type: GrantFiled: August 29, 1983Date of Patent: February 12, 1985Assignee: Bowling Green State UniversityInventor: Douglas C. Neckers
-
Patent number: 4498964Abstract: Compounds of the formula I, II, III, IV or V ##STR1## in which Ar, X, Y, Y', R.sup.1 to R.sup.5 and R.sup.1' to R.sup.5' are as defined in claim 1, can be used as photoinitiators for the photopolymerization of unsaturated compounds. They can be prepared by a Diels-Alder reaction and/or a Grignard reaction.Type: GrantFiled: June 9, 1983Date of Patent: February 12, 1985Assignee: Ciba-Geigy CorporationInventors: Rinaldo Husler, Werner Rutsch, Kurt Dietliker
-
Patent number: 4447520Abstract: Acylphosphine oxides of the general formula ##STR1## where R.sup.1 is methyl or ethyl, R.sup.2 is a branched or straight-chain alkyl radical or chlorine, alkoxy or hydrogen, R.sup.3 and R.sup.4 are identical or different, and are each alkyl, alkoxy, alkylthio or chlorine and R.sup.5 is hydrogen, chlorine, alkoxy, alkylthio or alkyl, may be used as photoinitiators in photopolymerizable materials.Type: GrantFiled: August 19, 1982Date of Patent: May 8, 1984Assignee: BASF AktiengesellschaftInventors: Andreas Henne, Anton Hesse, Manfred Jacobi, Gunnar Schornick, Rudolf Vyvial, Klaus Holoch
-
Patent number: 4439515Abstract: A light-sensitive composition comprising addition polymerizable ethylenically unsaturated double bond-containing compounds and a photopolymerization initiator comprising (1) at least one compound selected from the group consisting of benzanthrone, substituted benzanthrones (the substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms), 1,2-benzanthraquinone and substituted benzanthraquinones (substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms) and (2) at least one compound selected from the group consisting of 4,4'-di-substituted amino-benzophenones represented by the following general formula (a), p-substituted amino-benzaldehyde derivatives represented by the following general formula (b), 2-(p-substituted amino-phenyl)-1,3-dioxolanes represented by the following general formula (c), 4,4'-bis(substituted amino)-N-benzylideneanilines represented by the followType: GrantFiled: April 14, 1983Date of Patent: March 27, 1984Assignee: Fuji Photo Film Co., Ltd.Inventors: Fumiaki Shinozaki, Yasuo Washizawa, Tomoaki Ikeda, Sho Nakao, Syunichi Kondoh
-
Patent number: 4434035Abstract: Mixtures containing at least one hydroxyalkylphenone of the formula ##STR1## wherein R.sup.1 is H, alkyl of 1-4 C atoms or chlorine, R.sup.2 is H or methyl, R.sup.3 is H or methyl, R.sup.4 is alkyl of 1-6 C atoms and R.sup.5 is alkyl of 1-6 C atoms, and at least one 2-alkylthioxanthone of the formula ##STR2## wherein R.sup.6 is alkyl of 1-8 C atoms, have a considerably increased reactivity in initiating the photopolymerization of ethylenically unsaturated compounds. The polymers fully hardened using these initiator mixtures suffer only little yellowing.Type: GrantFiled: April 4, 1983Date of Patent: February 28, 1984Assignee: Merck Patent Gesellschaft mit beschr/a/ nkter HaftungInventors: J/u/ rgen Eichler, Claus Herz, Karl-Heinz Neisius
-
Patent number: 4419438Abstract: An image reproducing material comprising a supporting sheet bearing a metal or metallic compound layer having a thickness of 100 to 1000 .ANG. and a photosensitive resin layer, which is characterized in that said photosensitive resin layer contains (1) an ethylenically unsaturated compound which is polymerizable by the action of free radical and chain propagative, (2) a compound showing photochromism by radical mechanism, (3) a free radical producing agent and (4) an acitinic light absorber. There is also provided an image formed (reproduced) material obtained by patterned exposing the above image reproducing material and then processing the same, a method for obtaining such image formed material and also a method for dot-etching such image formed material. By the use of these materials and methods, dot-etching can be effected easily and there are obtained sharp images without the formation of pin holes.Type: GrantFiled: March 9, 1982Date of Patent: December 6, 1983Assignee: Toyo Boseki Kabushiki KaishaInventors: Kuniomi Etoh, Toshikiyo Tanaka, Yoshio Katoh, Takeo Sugiura, Yoshiyasu Itoh, Takeo Kohira
-
Patent number: 4385109Abstract: A photopolymerizable recording composition which comprises a mixture, containing a photoinitiator, of (a) a photopolymerizable olefinically unsaturated monomer and (b) an organic polymeric binder, wherein the photoinitiator is an acylphosphine oxide compound of the formula R.sup.1 R.sup.2 PO--CO--R.sup.3, where R.sup.1 and R.sup.2 are certain organic radicals and R.sup.3 is tert.-alkyl or a cyclic radical with two substituents in the ortho-position to the carbonyl group. The recording compositions have a high reactivity when irradiated with UV light and are used in particular for the preparation of printing plates, relief plates and photo-resists.Type: GrantFiled: July 9, 1981Date of Patent: May 24, 1983Assignee: BASF AktiengesellschaftInventors: Peter Lechtken, Bernd Bronstert, Gerhard Hoffmann, Rudolf Vyvial, John Lynch
-
Patent number: 4383025Abstract: Substances (I) capable of being converted into higher-molecular weight materials under the influence of a cationic catalyst, such as 1,2-epoxides, aminoplasts, vinyl monomers and prepolymers, or phenoplasts, are so converted by exposure to actinic radiation in the presence of an aryl- or aroyl- carbamoylsulfoxonium salt (II) of formula ##STR1## where p is zero or 1,q is 1 to 4,Ar denotes an aromatic group,R.sup.6 denotes --H or group --COR.sup.9 or --CONH(CO).sub.r R.sup.10,R.sup.7 denotes an alkyl, alkenyl, cycloalkyl, cycloalkylalkyl, aryl, or aralkyl group,R.sup.8 has the same meaning as R.sup.7 but may alternatively represent a dialkylamino group or, if R.sup.7 denotes alkyl, it may alternatively represent an arylamino group,R.sup.9 and R.sup.10 each denote a saturated or ethylenically unsaturated radical,r is zero or 1,t is 1, 2, or 3, andZ.sup.t- denotes a t-valent anion of a protic acid.Type: GrantFiled: June 29, 1981Date of Patent: May 10, 1983Assignee: Ciba-Geigy CorporationInventors: George E. Green, Edward Irving
-
Patent number: 4368253Abstract: A method for forming an image by a positive resist process comprises:(1) exposing imagewise to actinic radiation a photoresist composition comprising:(a) a film-forming organic material having at least one substituted benzoin group of formula: ##STR1## where R.sup.1 denotes a hydrogen atom, an alkyl, cycloalkyl, cycloalkylalkyl, or aralkyl group or a group --(CH.sub.2).sub.b X; R.sup.2 denotes a hydrogen atom or an alkyl, cycloalkyl, cycloalkylalkyl, aryl or aralkyl group; R.sup.3 denotes a halogen atom or an alkyl, alkoxy, cycloalkyl, cycloalkylalkyl or phenyl group; X denotes a halogen atom, an alkoxy group, a phenoxy group, a group --COOR.sup.4 or a group --OOCR.sup.4, where R.sup.Type: GrantFiled: January 19, 1982Date of Patent: January 11, 1983Assignee: Ciba-Geigy CorporationInventors: George E. Green, John S. Waterhouse
-
Patent number: 4367280Abstract: A photopolymerizable composition comprising, as essential components,(1) a polymerizable compound having at least one ethylenically unsaturated double bond and(2) a photopolymerization initiator, the photopolymerization initiator being a combination of (a) an aromatic carbonyl compound and (b) a p-dialkylamino aromatic carbonyl compound.Type: GrantFiled: March 11, 1981Date of Patent: January 4, 1983Assignee: Fuji Photo Film Co., Ltd.Inventors: Syunichi Kondo, Akihiro Matsufuji, Akira Umehara
-
Patent number: 4347111Abstract: Compounds of the formula ##STR1## wherein R.sub.1 is hydrogen, chlorine, phenyl, dialkylamino of 2-4 carbon atoms or alkyl or alkoxy each of up to 18 carbon atoms; R.sub.2 is hydrogen, chlorine, bromine or alkyl or alkoxy each of up to 4 carbon atoms; R.sub.3 and R.sub.4, which can be the same or different, each is hydrogen or alkyl of up to 6 carbon atoms; R.sub.5 is hydrogen or alkyl or alkanoyl each of up to 4 carbon atoms; and R.sub.6 is hydrogen or methyl, with the proviso that not all of R.sub.1 to R.sub.6 simultaneously are hydrogen, are effective photosensitizers, especially for photopolymerization of unsaturated compounds and for hardening of printing dyes.Type: GrantFiled: November 26, 1979Date of Patent: August 31, 1982Assignee: Merck Patent Gesellschaft mit beschrankter HaftungInventors: Jurgen Gehlhaus, Manfred Kieser
-
Patent number: 4341860Abstract: Photoimaging compositions comprising (A) a cyclohexadienone compound as defined, and at least one of (B.sub.1) a leuco dye or (B.sub.2) addition polymerizable ethylenically unsaturated monomer. A polymer binder can be present in the compositions. The new imaging compositions are useful in photoimaging products such as proofing papers, printout papers, overlay films and photopolymerizable elements useful for printing and photoresist purposes. The compositions have improved thermal stability.Type: GrantFiled: June 8, 1981Date of Patent: July 27, 1982Assignee: E. I. Du Pont de Nemours and CompanyInventor: Peter K. Sysak
-
Patent number: 4297433Abstract: The present invention relates to a method for forming ultra fine patterns on films of polymethyl isopropenyl ketone or a mixture of polymethyl isopropenyl ketone and a benzophenone compound by exposing such films to ultra violet rays in the range of from 1,000 to 3,500 A. The present invention is particularly useful for providing semiconductors having ultra fine patterns and ultra LSI's. The electric or electronic circuits for electronic or electric apparatus and equipment have been produced by wiring resistors, condensers, coils, vacuum tubes and the like necessary components. However, because of various disadvantages such as assembly requiring much time, complication of work, necessity of using large equipment, reasons or causes for errors, limitation of productivity, impossibility of reducing price or cost and the like, the present invention has been developed for printed circuit boards.Type: GrantFiled: November 16, 1978Date of Patent: October 27, 1981Assignee: Tokyo Ohka Kogyo Kabushiki KaishaInventors: Minoru Tsuda, Yoichi Nakamura
-
Patent number: 4289843Abstract: A photopolymerizable element suitable for use in the production of photorelief printing plates comprises a film or sheet, an adhesive layer and a photopolymerizable layer wherein the adhesive layer comprises a non-photopolymerizable plastics binder and a photopolymerization initiator comprising an admixture of a compound of the formula: ##STR1## preferably 4,4'-bis(dimethylamino)-benzophenone in an amount 0.01 to 2.0% by weight based upon the weight of the binder and another photopolymerization initiator in an amount 0.1 to 7% by weight based upon the weight of the binder.Type: GrantFiled: November 21, 1978Date of Patent: September 15, 1981Assignee: Bexford LimitedInventors: David L. Boutle, Stuart C. Rennison, Stuart G. Lambert
-
Patent number: 4278751Abstract: A co-initiator for use in an improved photopolymerization composition, element and method is disclosed. The photopolymerizaton composition comprises an addition-polymerizable compound containing ethylenic unsaturation and the co-initiator which includes a photopolymerization activator and an amine-substituted ketocoumarin sensitizer having an absorption maximum between about 350 and about 550 nm; said activator having the structure ##STR1## wherein Q.sup.1 and Q.sup.2 are each independently hydrogen; alkyl, thioalkyl or alkoxy containing from 1 to about 5 carbon atoms; aryl or aryloxy or benzoyloxy containing from about 6 to 10 carbon atoms; hydroxy; or halogen; or together Q.sup.1 or Q.sup.2 are the necessary atoms to complete a fused heterocyclic or aromatic ring containing from about 4 to 6 ring atoms; and Q.sup.3 is hydrogen or alkyl containing from 1 to about 5 carbon atoms.Type: GrantFiled: November 16, 1979Date of Patent: July 14, 1981Assignee: Eastman Kodak CompanyInventors: Donald P. Specht, Kenneth L. Payne, Samir Y. Farid
-
Patent number: 4268667Abstract: Compositions useful as visible sensitizers for photopolymerizable compositions, the sensitizers being .alpha., .beta.-unsaturated ketones formed by condensing the acetyl or diacetyl derivative of 9,10-dihydro-9,10-ethano(or propano)anthracene with a p-dialkylaminobenzaldehyde; and the photopolymerizable compositions comprising monomer, sensitizer, and initiator, with or without a binder.Type: GrantFiled: April 21, 1980Date of Patent: May 19, 1981Assignee: E. I. Du Pont De Nemours and CompanyInventor: Albert G. Anderson
-
Patent number: 4239848Abstract: There is disclosed a composition, element, and process of imaging, wherein a polymeric binder is rendered photocrosslinkable by virtue of a photoresponsive source of amines, and by virtue of one or more carbonyl groups on the binder which react with said amines to form a carbinolamine.Type: GrantFiled: February 26, 1979Date of Patent: December 16, 1980Assignee: Eastman Kodak CompanyInventors: Anthony Adin, John C. Wilson
-
Patent number: 4235686Abstract: A polymeric composition which is capable of being shaped and which preferably is in the form of a sheet, the composition being formed by partially reacting a mixture of(a) the precursors of a polyurethane comprising at least one polyfunctional compound capable of reacting with isocyanate groups and at least one polyisocyanate, and,(b) the precursors of a cured polyester resin comprising at least one ethylenically unsaturated polyester and at least one ethylenically unsaturated monomer copolymerizable therewith,and the composition containing at least one alpha, alpha diketone as a photosensitive catalyst.Type: GrantFiled: November 4, 1977Date of Patent: November 25, 1980Assignee: Imperial Chemical Industries LimitedInventors: Edward C. Dart, Roger C. Roberts, Antony R. Perry, Jozef Nemcek, Neil B. Graham
-
Patent number: 4221859Abstract: The subject invention relates to photopolymerizable compositions useful for making plastic printing elements for use in photolithography and other photomechanical processes. The photopolymerizable compositions comprise an aqueous mixture of a water-insoluble resin, a water-soluble binder, a crosslinking agent, and a photopolymerization initiator having an alpha-keto ester linkage. In particular, photopolymerization initiators include oxalic acid, sodium oxalate, potassium oxalate, lithium oxalate and urea oxalate. The printing plates prepared from the compositions herein disclosed have improved ink receptivity, good retention of such ink, receptivity even after long continued use, greater durability and excellent binding qualities.Type: GrantFiled: May 4, 1976Date of Patent: September 9, 1980Assignee: Ball CorporationInventors: Gene O. Fanger, George W. Brutchen
-
Patent number: 4199420Abstract: Alkoxymethylbenzophenones having the formula: ##STR1## wherein R is hydrocarbon of 1 to 20 carbon atoms, alkoxy-substituted alkylene where the alkylene moiety has 2 to 12 carbon atoms and the alkoxy 1 to 12 carbon atoms or --(CH.sub.2 CH.sub.2 O).sub.n --R" wherein R" is alkyl of 1 to 12 carbon atoms and n is an integer from 2 to 5; R' is hydrogen, halogen or --CH.sub.2 OR; and x and y are independently selected integers from 1 to 5. The alkoxymethylbenzophenones are useful photoinitiators for compositions comprising photopolymerizable ethylenically unsaturated compounds.Type: GrantFiled: February 9, 1979Date of Patent: April 22, 1980Assignee: Stauffer Chemical CompanyInventor: James M. Photis
-
Patent number: 4189322Abstract: Photopolymerizable compositions for the production of printing plates and relief plates, consisting essentially of a photoinitiator-containing mixture of olefinically unsaturated photopolymerizable compounds with polymeric binders, contain up to 1% by weight of a compound having the structural element of anthrone, e.g. bianthrone and 9,9'-bianthryl, which results in an improved relief image in the production of relief plates.Type: GrantFiled: May 3, 1978Date of Patent: February 19, 1980Assignee: BASF AktiengesellschaftInventors: Gerhard Hoffmann, Dieter Kleuser, Bernd Bronstert
-
Patent number: 4188224Abstract: Anthrone derivatives having hydroxy, ether or hydrocarbyl groups in 10-position, for example 10,10-dimethoxyanthrone, are excellent photoinitiators for the UV-curing of unsaturated systems. Preferable systems are monomeric or oligomeric acrylates and their mixtures.The systems may be used in thin layers as for instance for coatings or printing inks.Type: GrantFiled: April 3, 1978Date of Patent: February 12, 1980Assignee: Ciba-Geigy CorporationInventors: Louis Felder, Rudolf Kirchmayr
-
Patent number: 4175971Abstract: A light-sensitive composition comprising addition polymerizable ethylenically unsaturated double bond-containing compounds and a photopolymerization initiator comprising (1) at least one compound selected from the group consisting of benzanthrone, substituted benzanthrones (the substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms), 1,2-benzanthraquinone and substituted benzanthraquinones (substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms) and (2) at least one compound selected from the group consisting of 4,4'-di-substituted amino-benzophenones represented by the following general formula (a), p-substituted amino-benzaldehyde derivatives represented by the following general formula (b), 2-(p-substituted amino-phenyl)-1,3-dioxolanes represented by the following general formula (c), 4,4'-bis(substituted amino)-N-benzylideneanilines represented by the followType: GrantFiled: September 13, 1977Date of Patent: November 27, 1979Assignee: Fuji Photo Film Co., Ltd.Inventors: Fumiaki Shinozaki, Yasuo Washigawa, Tomoaki Ikeda, Sho Nakao, Syunichi Kondoh