Abstract: Disclosed is a photopolymerizable composition which comprises (i) a sensitizing dye represented by the following formula (I-1), (ii) a titanocene compound, and (iii) an addition polymerizable compound having at least one ethylenically unsaturated double bond: wherein A and B each represents —S—, NR3, or NR4; R3 and R4 each represents a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group; Y1 and Y2 each represents a non-metallic atomic group to form a basic nucleus of a dye together with the adjacent A or B, and the adjacent carbon atoms; R1 and R2 each represents a monovalent non-metallic atomic group, or they may be bonded to each other to form an aliphatic or aromatic ring.

Abstract: A photosensitive lithographic form plate that can be directly prepared by using digital signals from a computer or the like by using an infrared laser or the like (i.e., a photosensitive lithographic form plate that can be directly prepared), through using an image-forming material that can be directly inscribed with heat generated by irradiation of a laser light and is suitable for use in a lithographic form plate. The image-forming material used in the present invention comprises an infrared light absorbing agent having a hydrophobic group which changes to hydrophilic due to heat. The image-forming material may further contain a macromolecular binder insoluble in water and soluble in an aqueous solution of an alkali, or a macromolecular binder that is decomposed by heat or with an acid and becomes soluble in water or an alkali. In an exposed portion of the photosensitive layer, the infrared light absorbing agent is decomposed due to heat by irradiation of infrared light, and an acid is generated.

Abstract: A photosensitive composition comprising a photoacid generator for forming an acid by exposing to far ultraviolet light, a pH indicator coloring so as to exhibit an absorption band at the i-line wavelength region in the presence of the acid, and an i-line photosensitizer chemically changing by exposing to the i-line; and methods for patterning and for manufacturing a semiconductor device using such a photosensitive composition. The photosensitive composition enables etching, fine pattern formation and semiconductor device manufacturing to simplify.

Abstract: A positive photosensitive composition showing a difference in solubility in an alkali developer as between an exposed portion and a non-exposed portion, which comprises, as components inducing the difference in solubility, (a) a photo-thermal conversion material, and (b) a high molecular compound, of which the solubility in an alkali developer is changeable mainly by a change other than a chemical change.

Abstract: A positive image can be obtained from a positive-working element that is sensitive to infrared radiation. The element comprises an imaging layer containing an alkali-soluble reactive resin (such as a phenolic resin), an infrared radiation absorbing compound, a thermochemical acid generating compound, and a dissolution inhibitor that has acid-cleavable C—O—C groups. Upon laser exposure, a Bronsted acid is generated which then breaks the bonds of the C—O—C groups, allowing the exposed regions of the reactive resin to be solubilized in an alkaline developer solution.

Abstract: A photosensitive composition for short wave exposure use, which comprises (i) a sensitizing dye as a 1,3-dihydro-1-oxo-2H-indene derivative having a specified structure, (ii) an activator compound that generates chemical changes by its interaction with an electronic excitation condition induced by light absorption of the sensitizing dye represented by formula (I) and thereby produces at least any one of radicals, acids and bases and (iii) a compound whose physical or chemical characteristics are changed and maintained by undergoing reaction with at least one of radicals, acids and bases.

Abstract: Radiation-sensitive compositions comprising

Abstract: The present invention relates to novel monomers for preparing photoresist polymers, polymers thereof, and photoresist compositions using the same.

Abstract: There are disclosed a light-sensitive composition which comprises (A) a polymer having a phenyl group substituted by a vinyl group at a side chain, (B) a photopolymerization initiator and (C) a sensitizer which sensitizes the photo-polymerization initiator, or a light-sensitive composition which comprises (A′) a polymer, the above-mentioned (B) and (C), and (D) a monomer having at least two phenyl groups each of which is substituted by a vinyl group in the molecule of the monomer; and a method of forming a relief image which comprises coating the light-sensitive composition as mentioned above on a support, exposing the composition by exposure or scanning exposure and developing the same to form a relief image on the support.

Abstract: Photochemical acid progenitors in combination with dihydroperimidine squarylium dyes have been found to be particularly effective at generating acid upon irradiation with near-infrared radiation. It has been found that dihydroperimidine squarylium dyes that are particularly useful in this invention have an oxidation potential greater than about 0.5 V relative to SCE as measured in dichloromethane.

Abstract: A photosensitive composition comprising (a) an ethylenically unsaturated double bond-containing compound, (b) a sensitizing dye and (c) a photopolymerization initiator, wherein the sensitizing dye is a phthalocyanine compound showing the maximum absorption within a range of from 750 to 1,200 nm.

Abstract: A chemically amplified resist contains the following components: a polymer with carboxylic acid anhydride groups and tert-butylester, tert-butoxycarbonyloxy, tetrahydrofuranyl, or tetrahydropyranyl groups; a photoreactive compound which, when exposed or electron-irradiated, releases a sulfonic acid having a pKa value>0.5 (acid former); a compound that can enter into a reversible chemical reaction with the sulfonic acid (buffer compound); and a solvent.

Abstract: A photosensitive composition comprising (a) an ethylenically unsaturated double bond-containing compound, (b) a sensitizing dye and (c) a photopolymerization initiator, wherein the sensitizing dye is a phthalocyanine compound showing the maximum absorption within a range of from 750 to 1,200 nm.

Abstract: A chemically amplified resist for electron beam lithography contains the following components: a polymer with dissolution-inhibiting groups that can be cleaved with acid catalysis, a photo-reactive compound, which upon electron irradiation releases a sulfonic acid with a pKa value ≦2.5 (photo acid generator), an electron-beam-sensitive sensitizer enhancing the exposure sensitivity of the resist, such as a fluorene derivative, and a solvent.

Abstract: A photocurable composition containing at least a radical polymerizable unsaturated group-bearing compound, a metal allene compound, a squalilium dye, and N,N-dimethylaniline. The photocurable composition is polymerized and cured by generation of radicals upon receipt of low energy of visible light having long wavelengths or near infrared light.

Abstract: An imaging member, such as a negative-working printing plate or on-press cylinder, can be prepared with a hydrophilic imaging layer comprised of a heat-sensitive hydrophilic polymer having ionic moieties and an infrared radiation sensitive dye having multiple sulfo groups. The heat-sensitive polymer and IR dye can be formulated in water or water-miscible solvents to provide highly thermal sensitive imaging compositions. In the imaging member, the polymer reacts to provide increased hydrophobicity in areas exposed to energy that provides or generates heat. For example, heat can be supplied by laser irradiation in the IR region of the electromagnetic spectrum. The heat-sensitive polymer is considered "switchable" in response to heat, and provides a lithographic image without wet processing.

Abstract: A photopolymerizable composition comprising (A) an ethylenically unsaturated compound, (B) a cyanine dye and (C) a photopolymerization initiator, wherein the cyanine dye of component (B) is a cyanine dye of a structure having hetero atoms connected via a polymethine chain, and the polymethine chain has at least one substituent of the following formula (.alpha.): ##STR1## wherein Q.sup.1 and Q.sup.2 are optional substituents, which may be connected to form a ring.

Abstract: An electron beam negative working resist composition is diclosed including: (A) an alkali-soluble resin, (B) an acid-crosslinkable substance, (C) an acid generating agent, and (D) a sensitizing substance, the sensitizing substance (D) being a substance which serves to accumulate electrons or energy through electron beam exposure and to reemit the accumulated electrons or energy into a resist film. Thus, the electron beam negative working resist composition can achieve a desired high sensitivity.

Abstract: A photoresist composition for use in lithographic processes in the fabrication of semiconductor devices such as integrated circuit structures is disclosed. The photoresist composition includes a monomeric sensitizer bounding to a base-soluble long chain polymer.

Abstract: An object of the present invention is to provide a positive type photosensitive composition for infrared lasers which is used with regard to a directly producible printing plate in which handling places are not restricted and in which developing latitude is excellent. This positive type photosensitive composition for infrared lasers comprises at least one aqueous alkaline solution-soluble polymer compound having at least one of the following functional groups (a-1) to (a-3):(a-1) a phenolic hydroxyl group,(a-2) a sulfonamide group and(a-3) an active imide groupand a compound represented by the following general formula I-(1) or the like.

Abstract: A negative photoresist composition is disclosed which is excellent in sensitivity and resolution, tenaciously adheres to substrates, and can be advantageously used in practical production processes. Two 1,4-dihydropyridine derivatives each having a specific structure are incorporated as photosensitizers into a polyamic acid to obtain the negative photoresist composition.

Abstract: An excellently thermostable visible light-sensitive composition comprising (A) a polymer having carboxyl group(s) or a polymer having carboxyl group(s) and hydroxyphenyl group(s), or (A') a polymer having carboxyl group(s) and (A") a polymer having hydroxyphenyl group(s); (B) a compound having at least two vinyl ether groups per molecule, (C) a compound, which generates an acid when irradiated with a visible light; and (D) a sensitizing dye, and a process for pattern formation using such a composition are disclosed.

Abstract: A photosensitive recording material comprises a support and microcapsules provided thereon, wherein the microcapsules comprises a photopolymerizable unsaturated group-containing compound and a phosphine compound represented by the following general formula: ##STR1## where R.sup.1, R.sup.2 and R.sup.3 indicate a hydrogen atom, a C.sub.1 to C.sub.20 alkyl, aryl or aralkyl group, --OR.sup.4, or --SR.sup.4 where R.sup.4 indicates a hydrogen atom or a C.sub.1 to C.sub.20 alkyl, aryl or aralkyl group, and these may be substituted by a halogen atom or a C.sub.1 to C.sub.20 alkoxy, alkoxycarbonyl, acyloxy, alkanoyl, cyano, hydroxy or amino group.

Abstract: A photosensitive resin composition for photoresist which is highly sensitive and can directly form an image using a laser is disclosed. Said composition comprises (A) an unsaturated resin having carboxyl group(s) which is obtained by firstly reacting 0.8 to 1.3 moles of an ethylenic unsaturated monocarboxylic acid with 1 mole of an epoxy group of a homopolymer or copolymer of ethylenic unsaturated monomer having an epoxy group to obtain an unsaturated resin which is then reacted with a dibasic acid anhydride, (B) ethylenic unsaturated compound without epoxy group, and (C) photopolymerization initiator.

Abstract: A positive photosensitive composition comprising an alkali-soluble organic high molecular substance having phenolic hydroxyl groups and an acid color forming dye.

Abstract: A visible light curable resin composition containing a photocurable resin, a photoreaction initiator and a photosensitizer having the formula (1). The composition has a very high sensitivity to a general-purpose visible light laser, so that a high-speed scanning exposure is possible by the laser, and an extremely fine high resolution can be obtained. In addition, the composition can be used for coating or printing under safelight irradiating conditions and under bright circumstantial conditions without any thickening of the composition, and hence the composition can exert excellent noticeable effects in points of safe operativity, operational efficiency and the stability of products. Formula (1) is as follows: ##STR1## wherein rings X.sub.1 and X.sub.2 are each an optionally substituted pyrrole ring; Y is H, CN, optionally substituted alkyl, aralkyl, aryl, heteroaryl or alkenyl group; and Z.sub.1 and Z.sub.

Abstract: According to the present invention there is provided a heat-sensitive imaging element for making lithographic printing plates comprising a lithographic base having a hydrophilic surface, a hydrophobic first layer that is sensitive to heat including at least a hydrophobic polymer and a compound that is capable of converting light into heat, said layer having a decreased or increased capacity for being penetrated and/or solubilized by an aqueous developer upon exposure to actinic light, characterized in that said imaging element comprises a second layer located between the first layer and the hydrophilic surface and including a dispersed hydrophobic thermoplastic polymer latex, said second layer being soluble or dispersible in an aqueous solution.

Abstract: A photosensitive lithographic form plate that can be directly prepared by using digital signals from a computer or the like by using an infrared laser or the like (i.e., a photosensitive lithographic form plate that can be directly prepared), through using an image-forming material that can be directly inscribed with heat generated by irradiation of a laser light and is suitable for use in a lithographic form plate. The image-forming material used in the present invention comprises an infrared light absorbing agent having a hydrophobic group which changes to hydrophilic due to heat. The image-forming material may further contain a macromolecular binder insoluble in water and soluble in an aqueous solution of an alkali, or a macromolecular binder that is decomposed by heat or with an acid and becomes soluble in water or an alkali. In an exposed portion of the photosensitive layer, the infrared light absorbing agent is decomposed due to heat by irradiation of infrared light, and an acid is generated.

Abstract: The present invention provides a visible laser-curable photosensitive composition wherein a photocuring resin having photosensitive group which is crosslinkable or polymerizable upon light exposure, is mixed with a photopolymerization inititor system consisting of a coumarin type pigment of particular structure and a titanocene compound. This composition has an unexpectedly high sensitivity to visible laser.

Abstract: This invention relates to polyvinyl acetals containing the units A, B, C and D, whereinA is present in an amount of 0.5 to 20 wt.-% and is of the formula ##STR1## B is present in an amount of 15 to 35 wt.-% and is of the formula ##STR2## C is present in an amount of 10 to 50 wt.-% and is of the formula ##STR3## wherein R.sup.1 is an alkyl group with up to 4 carbons, which is optionally substituted by an acid group, or a phenyl group, to which an acid group is attached, wherein the phenyl group optionally comprises 1 to 2 further substituents selected from halos, amino, methoxy, ethoxy, methyl and ethyl groups, or is a group X--NR.sup.6 --CO--Y--COOH, wherein X is an aliphatic, aromatic or araliphatic spacer group, R.sup.6 is hydrogen or an aliphatic, aromatic or araliphatic moiety and Y is a saturated or unsaturated chain- or ring-shaped spacer group, and this unit C may be contained several times with various moieties R.sup.1 independent of one another, and D is present in an amount of 25 to 70 wt.

Abstract: A lithographic printing plate precursor comprising on a support a radiation sensitive composition which comprises (1) a novolac resin, (2) a condensing agent for the novolac resin which is either a methylol polyvinyl phenol compound or a bishydroxymethyl compound, (3) a radiation sensitive latent acid generating compound, and (4) an infra-red sensitizing dye.

Abstract: The present invention provides a negative-type image recording material which does not smudge non-image portions during printing, which provides excellent film strength of recorded image portions, and which exhibits press life. Particularly when the material is used for recording with a variety of laser devices that emit infrared rays, the material enables direct plate making from computer digital data. The negative-type image recording material of the invention contains (A) a polymer having a heterocyclic group containing an unsaturated bond therein, (B) a cross-linking agent that cross-links with the aid of an acid, and (C) a compound that generates an acid upon exposure to light or heat.

Abstract: A non-chemically enhanced type positive resist composition includes an alkali-soluble novolak resin, a quinonediazide type sensitizer and at least one of the following compounds (a) and (b):(a) an acid-generator which is decomposed by the action of an alkali developer and generates an acid, and(b) compounds represented by the following formula (IV) or (V): ##STR1## wherein each of R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7 and R.sup.8 independently represents hydrogen, halogen, hydroxy, alkyl, alkoxy, aryl or nitro, each of R.sup.9 and R.sup.10 independently represents hydrogen, halogen, alkyl, aryl, nitro, a group of --(CH.sub.2).sub.n --OR.sup.11 or a group of --(CH.sub.2).sub.n --COOR.sup.12 in which R.sup.11 represents hydrogen, alkyl, aryl or alkanoyl and R.sup.12 represents hydrogen, alkyl or aryl, and n is a number from 0 to 3 and R.sup.13 represents hydrogen, halogen, alkyl, alkoxy or aryl.

Abstract: A positive-working lithographic printing plate is used to provide a positive image without a post-exposure baking step and without any floodwise exposure steps. The printing plate includes an imaging layer that is imageable using an infrared radiation laser. The imaging layer consists essentially of a phenolic resin and an infrared radiation absorbing compound.

Abstract: A visible radiation sensitive composition is described which comprises a binder, one or more polymerizable compounds containing at least one polymerizable group, and one or more dyes having an absorption range in the emission range of the radiation source, characterized in that said composition comprises as an initiator an initiator system consisting of a metallocene as a photoinitiator and an onium compound as a coinitiator. The visible radiation sensitive composition shows an increased radiation sensitivity compared to the known radiation sensitive compositions and is especially suitable for recording materials such as printing plates, which can, in particular, also be exposed by means of laser radiation in the visible range.

Abstract: A photopolymerizable composition which comprises a compound having one or more addition-polymerizable ethylenically unsaturated bonds and a specific oxime ether compound. The photopolymerizable composition has high sensitivity to actinic rays in a wide region, ranging from ultraviolet to visible light, and gives a photosensitive material which has improved film strength in exposed areas.

Abstract: Heat-sensitive imaging element for making positive working printing plates according to the present invention there is provided a heat-sensitive imaging element for making positive working lithographic printing plates comprising on a lithographic base a layer comprising a polymer, soluble in an aqueous alkaline solution and an IR-radiation sensitive top layer. Upon image-wise exposure the capacity of the aqueous alkaline solution to penetrate and/or solubilize the top layer is changed. Image-wise exposure can be performed with an infrared laser with a short as well as with a long pixel well time.The obtained positive working printing plates have excellent printing properties and an improved infrared sensitivity.

Abstract: A photocurable composition comprises an unsaturated group-containing compound as a base material, a metal arene compound as a photopolymerization initiator and an aniline compound as a photosensitizer. As the photosensitizer aniline compound, any one or both of 2,6-diisopropyl-N,N-dimethylaniline and 2,4,6,N,N-pentamethylaniline is/are used.

Abstract: According to the present invention there is provided a heat sensitive imaging element comprising a lithographic base with a hydrophilic surface, an image forming layer including a hydrophobic thermoplastic polymer latex and a compound capable of converting light into heat being present in said image forming layer or a layer adjacent thereto, characterized in that the heat-sensitive imaging element comprises a barrier layer between the lithographic base having a hydrophilic surface and the image forming layer, said barrier layer and said image forming layer being removable in an aqueous solution with a pH of at least 5.

Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a low molecular weight anthracene dye compounds. It has been found that these dye compounds can significantly reduce or even eliminate undesired reflections of exposure radiation, particularly deep U.V. exposure radiation such as 248 nm, as well as function as effective sensitizer compounds, enabling effective imaging at higher wavelengths, particularly I-line exposures.

Abstract: There is described a lithographic plate which comprises a base coated with a photopolymerisable composition which comprises a polymeric binder, at least one free-radically polymerisable ethylenically unsaturated compound and as the photoinitiator combination a metallocene compound, N-phenyl glycine or a substituted N-phenyl glycine or an N-phenyl glycine derivative together with a third component which is a substance which helps in the reaction initiation but also increases the sensitivity of the photopolymerisable composition to a desired region of the spectrum.

Abstract: A negative type image recording material comprising (A) an onium salt compound having sulfonic acid as the counter ion to generate sulfonic acid decomposed by light or heat, (B) a cross-linking agent cross-linkable by an acid such as a phenol derivative preferably having at least two hydroxymethyl or alkoxymethyl groups bonded to a benzene ring, (C) a polymer compound having an alkaline-soluble group such as a novolak resin, and (D) an infrared ray absorbing agent which is a dye or pigment to absorb an infrared ray having a wavelength of 720 to 1,200 nm. The negative type image recording material can allow direct production of a form plate from digital data, and provide excellent storability, a good latitude of heat treatment conditions after exposure, and excellent plate wear upon printing.

Abstract: A light sensitive composition and a manufacturing method of a planographic printing plate employing the same are disclosed, the composition comprising a radical generating agent and a dye represented by the following formula (1), (2) or (3): ##STR1##

Abstract: A photosensitive composition can be used to prepare negative-working photosensitive elements such as lithographic printing plates. The composition includes a first photocrosslinkable aromatic resin having photocrosslinkable groups and a number average molecular weight of at least about 1500. Also included is a polymerizable monomer, a photocrosslinkable polyester, a photoinitiator, and an aromatic thiazoline photosensitizer. The photosensitive resins are present at a total weight ratio to the monomer of at least 1.5:1.

Abstract: A photosensitive recording medium comprising a base material and formed thereon a photosensitive layer containing at least yellow color-forming particles containing a first photosensitive component having a maximum hardening sensitivity to light with wavelength L1, magenta color-forming particles containing a second photosensitive component having a maximum hardening sensitivity to light with wavelength L2 and cyan color-forming particles containing a third photosensitive component having a maximum hardening sensitivity to light with wavelength L3. All the wavelengths L1, L2 and L3 are wavelengths longer than 500 nm.

Abstract: A negative type image recording material capable of processing directly from computer and other digital data, with excellent printing durability at the time of printing and lack of staining. The negative type image recording material includes (A) a polymer containing the structure represented by the following general formula (I) in the polymer side chain, (B) a compound which cross-links in the presence of acid, and (C) a compound which generates an acid in the presence of light or heat: ##STR1## wherein, Ar.sub.1 represents an arylene group having 20 or less carbon atoms which may be substituted; X.sub.1 represents NR.sub.2, O, S or SiR.sub.3 R.sub.4 ; X.sub.2 represents NR.sub.5, O, S or SiR.sub.6 R.sub.7 ; R.sub.1 represents a hydrocarbon group having 20 or less carbon atoms which may be substituted; R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6 and R.sub.

Abstract: Improved photopolymerization initiator systems are comprised of a spectral sensitizer that sensitizes in the ultraviolet or visible regions of the spectrum and an N-aryl, O-aryl or S-aryl polycarboxylic acid co-initiator. The improved initiator systems are incorporated in photo-polymerizable compositions containing one or more addition-polymerizable ethylenically-unsaturated compounds to form compositions suitable for the preparation of radiation-sensitive layers in lithographic printing plates adapted to be imagewise-exposed with ultraviolet- or visible-light-emitting lasers such as argon-ion lasers and frequency doubled Nd:YAG lasers. Such plates are able to effectively meet the dual requirements of very high photospeed and very good shelf-life required in computer-to-plate systems.

Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.

Abstract: Radiation-sensitive compositions, printing plates containing such compositions, imageable by infrared and ultraviolet/visible radiation and imaging method using same. The compositions comprise a thermal-activated acid generator; a crosslinking resin; a binder resin comprising a polymer containing reactive pendant groups selected from hydroxy, carboxylic acid, sulfonamide, and alkoxymethylamides; an infrared absorber; and optionally a UV/visible radiation-activated acid generator for UV/visible sensitization.

Abstract: Improved photopolymerization initiator systems are comprised of a spectral sensitizer that sensitizes in the ultraviolet or visible regions of the spectrum and an N-aryl, O-aryl or S-aryl polycarboxylic acid co-initiator. The improved initiator systems are incorporated in photo-polymerizable compositions containing one or more addition-polymerizable ethylenically-unsaturated compounds to form compositions suitable for the preparation of radiation-sensitive layers in lithographic printing plates adapted to be imagewise-exposed with ultraviolet- or visible-light-emitting lasers such as argon-ion lasers and frequency doubled Nd:YAG lasers. Such plates are able to effectively meet the dual requirements of very high photospeed and very good shelf-life required in computer-to-plate systems.