Spectral Sensitizer Containing Patents (Class 430/926)
-
Patent number: 5045434Abstract: A visible radiation sensitive composition comprising:(A) a photosetting resin containing a photosensitive group capable of crosslinking or polymerizing by photoirradiation,(B) a sensitizer represented by the formula (i): ##STR1## wherein R.sub.1 and R.sub.2 are the same or different lower alkyl, and R.sub.3 is a hydrogen atom, lower alkyl group, alkoxyalkyl group, hydroxyalkoxyalkyl group or alkoxycarbonylalkyl group, and(C) a polymerization initiator.Type: GrantFiled: December 18, 1990Date of Patent: September 3, 1991Assignee: Kansai Paint Co., Ltd.Inventors: Ichiro Yoshihara, Motoko Okuhara, Takao Yamamoto, Naozumi Iwasawa, Yasuo Doi, Tsukasa Ohyama, Kazuhiko Murayama, Yoriaki Matsuzaki, Susumu Kasamatsu, Keisuke Takuma, Kimitoshi Kato
-
Patent number: 4997745Abstract: A photosensitive composition comprising a trihalomethyl-s-triazine compound and a photosensitizer, wherein the photosensitizer being a dye having a reduction potential not more than 0.10 volt higher than the reduction potential of the trihalomethyl-s-triazine compound, and a photopolymerizable composition employing the photosensitive composition.Type: GrantFiled: August 11, 1989Date of Patent: March 5, 1991Assignee: Fuji Photo Film Co., Ltd.Inventors: Kouichi Kawamura, Hirotaka Matsumoto, Jun Yamaguchi
-
Patent number: 4985470Abstract: A photopolymerizable composition which comprises an addition-polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator system, characterized in that said photopolymerization initiator system essentially consists of:(a) a p-dialkylaminostyrene derivative or p-dialkylaminophenylbutadiene derivative represented by the general formula ##STR1## wherein R.sup.1 and R.sup.2 independently represent an alkyl group; Y represents a divalent atom or atomic group selected from the group consisting of --O--, --S-- and --CH.dbd.Type: GrantFiled: June 30, 1986Date of Patent: January 15, 1991Assignee: Mitsubishi Kasei CorporationInventors: Hideki Nagasaka, Noriaki Takahashi
-
Patent number: 4959297Abstract: Photopolymerizable compositions comprising:(1) at least one vinyl monomer capable of undergoing free radical polymerization,(2) a visible light or ultraviolet light responsive photoinitiator system comprising:(a) a diaryliodonium salt,(b) a pigment, insoluble in the photopolymerizable composition, said pigment also serving as a sensitizer,(c) one or more electron donating compounds, and, optionally,(3) adjuvants.The three component photoinitiator system of this invention can increase, by several orders of magnitude, the rate of ultraviolet light or visible light photocuring of vinyl monomers.Type: GrantFiled: November 22, 1989Date of Patent: September 25, 1990Assignee: Minnesota Mining and Manufacturing CompanyInventor: Michael C. Palazzotto
-
Patent number: 4957851Abstract: An image forming medium is provided which has an image forming layer comprising a monomolecular film of a diacetylene derivative compound or its built-up film and a radiation absorbing layer. The diacetylene derivative compound may be polymeric. An image forming device employing the image forming medium is also provided.Type: GrantFiled: September 6, 1988Date of Patent: September 18, 1990Assignee: Canon Kabushiki KaishaInventors: Yoshinori Tomida, Hiroshi Matsuda, Kunihiro Sakai, Yukuo Nishimura, Takashi Nakagiri, Toshihiko Miyazaki
-
Patent number: 4940649Abstract: Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, optionally a polymeric binder, a photopolymerization initiator, a color-forming system composed of a color former and a photooxidant, a certain 4-phenylpyridine as sensitizer and optionally further additive and/or auxiliary substances.Type: GrantFiled: May 17, 1988Date of Patent: July 10, 1990Assignee: BASF AktiengesellschaftInventors: Reinhard Aldag, Peter Neumann, Andreas Boettcher, Thomas Bluemel, Friedrich Seitz, Friedrich-Wilhelm Raulfs
-
Patent number: 4940645Abstract: Imaging materials employing photosensitive microcapsules having improved film speed are disclosed wherein the microcapsules contain a photoinitiator system including an absorber, a coinitiator and an autoxidizer; the absorber is a compound such as an aromatic ketone, the coinitiator and the autoxidizer are different but may be compounds such as N,N-dialkylanilines; the coinitiator and autoxidizer are selected such that free radical generation and oxygen consumption occur with optimum efficiency thereby providing an imaging material having high film speed.Type: GrantFiled: January 19, 1989Date of Patent: July 10, 1990Assignee: The Mead CorporationInventors: Paul D. Davis, Gary F. Hillenbrand, Paul C. Adair
-
Patent number: 4939069Abstract: Disclosed is a photopolymerizable composition which is very sensitive to light, especially visible light having a wave length of 600 to 700 nm. The photopolymerizable composition comprising a polymerizable compound having an ethylenically unsaturated double bond and a photopolymerization initiator wherein the photopolymerization initiator comprises (a) a specific sensitizer and (b) a radical forming agent.Type: GrantFiled: November 10, 1988Date of Patent: July 3, 1990Assignee: Nippon Paint Co., Ltd.Inventors: Masami Kawabata, Masahiko Harada, Yasuyuki Takimoto
-
Patent number: 4912012Abstract: A photosensitive recording medium having a multiplicity of microcapsules formed on a substrate, and a developer material, each microcapsule having a photosensitive resin and a chromogenic material which reacts with the developer layer to form a colored image spot. The microcapsules comprising a plurality of microcapsule groups which are sensitive to radiations having different wavelength bands, or which are sensitive to different intensities of the radiation. An image recording system is provided with an illuminating device for generating radiations of different wavelengths falling within the wavelength bands of the microcapsule groups, or a radiation of variable intensity. The recording system has a selector for selecting at least one of the radiations of the different wavelengths, or one of the intensity levels of the radiation, in order to adjust the contrast of the images formed on the medium, with respect to non-image areas on the medium.Type: GrantFiled: September 1, 1988Date of Patent: March 27, 1990Assignee: Brother Kogyo Kabushiki KaishaInventors: Naoyuki Hatta, Satoshi Furukawa
-
Patent number: 4910107Abstract: An optical recording-reproducing method comprising the step of irradiating a radiation for polymerization on an optical recording medium having a recording layer containing at least one selected from the group consisting of azulenium salt compounds, pyrylium dyes, diene compounds, croconic methine dyes and polymethine compounds (hereinafter called the group B) and a diacetylene derivative compound; the step of irradiating a radiation corresponding to a recording information to thereby change the color at the irradiated portion of the recording layer; and the step of reading the recorded information by irradiating a reading light with a shorter wavelength than said radiation on said recording layer. Also, an optical recording-reproducing device utilizes the above-mentioned method.Type: GrantFiled: June 23, 1989Date of Patent: March 20, 1990Assignee: Canon Kabushiki KaishaInventors: Haruki Kawada, Hiroshi Matsuda, Takashi Nakagiri, Yoshinori Tomida, Kenji Saito, Toshiaki Kimura, Toshihiko Miyazaki, Ken Eguchi, Yukuo Nishimura, Kunihiro Sakai
-
Patent number: 4894314Abstract: Photoinitiator compositions are disclosed which contain 3,3'-carbonyl bis(7-diethylaminocoumarin); an alkyl ester of a p-dialkylamino benzoic acid; and either camphorquinone or a 2,4,5-triphenylimidazolyl dimer. Photoinitiators are also provided which contain 3,3'-carbonyl bis(7-diethylaminocoumarin); an alkyl ester of a p-dialkylamino benzoic acid; camphorquinone and a 2,4,5-triphenylimidazolyl dimer. These latter photoinitiators are particularly useful in photopolymerizable compositions which are polymerized by exposure to visible laser light.Type: GrantFiled: November 16, 1988Date of Patent: January 16, 1990Assignee: Morton Thiokol, Inc.Inventors: Robert Barr, Leo Roos, Lawrence Crane
-
Patent number: 4889792Abstract: Photopolymerizable compositions comprising:(1) at least one vinyl monomr capable of undergoing free radical polymerization,(2) a visible light or ultraviolet light responsive photoinitiator system comprising:(a) a diaryliodonium salt,(b) a pigment, insoluble in the photopolymerizable composition, said pigment also serving as a sensitizer,(c) one or more electron donating compounds, and, optionally,(3) adjuvants.The three component photoinitiator system of this invention can increase, by several orders of magnitude, the rate of ultraviolet light or visible light photocuring of vinyl monomers.Type: GrantFiled: December 9, 1987Date of Patent: December 26, 1989Assignee: Minnesota Mining and Manufacturing CompanyInventor: Michael C. Palazzotto
-
Patent number: 4837106Abstract: A recording material comprising (i) an addition polymerizable compound having at least one ethylenic unsaturated double bond, (ii) a photopolymerization initiator composition and (iii) at least one component capable of causing a color reaction, wherein components (i), (ii) and (iii) are contained in microcapsules; and wherein said photopolymerization initiator composition (ii) comprises the following components (a), (b) and (c), whereby the light sensitivity of the recording material is improved:(a) a photo-absorbent having a molecular extinction coefficient of 10.sup.3 or more at a maximum absorption wavelength;(b) a hexaaryl-biimidazole; and(c) a heterocyclic mercapto compound of general formula (I): ##STR1## where Z is a non-metallic atomic group for formation of a nitrogen-containing heterocyclic nucleus.Type: GrantFiled: December 29, 1986Date of Patent: June 6, 1989Assignee: Fuji Photo Film Co., Ltd.Inventors: Shun-ichi Ishikawa, Tadao Imagawa, Minoru Maeda, Fumiaki Shinozaki
-
Patent number: 4810618Abstract: A photopolymerizable composition comprises at least one polymerizable compound having at least one ethylenically unsaturated bond therein and at least one photopolymerization initiator and optionally at least one linear organic high molecular weight polymer and characterized in that the photopolymerization initiator comprises a specific combination of two kinds of compounds, for instance, 2,4,6-tris(trichloromethyl)-s-triazine and compound (12) represented by the following formula: ##STR1## The photopolymerizable composition exhibits a high sensitivity to extremely wide range of actinic rays extending from ultraviolet light to visible light and is useful for manufacturing PS plates and photoresist layer for use in making print circuit-boards or the like.Type: GrantFiled: January 11, 1988Date of Patent: March 7, 1989Assignee: Fuji Photo Film Co., Ltd.Inventors: Mitsuru Koike, Koichi Kawamura
-
Patent number: 4806446Abstract: A photosensitive recording medium having a multiplicity of microcapsules formed on a substrate, and a developer material, each microcapsule having a photosensitive resin and a chromogenic material which reacts with the developer layer to form a colored image spot. The microcapsules comprise a plurality of microcapsule groups which are sensitive to radiations having different wavelength bands, or which are sensitive to different intensities of the radiation. An image recording system is provided with an illuminating device for generating radiations of different wavelengths falling within the wavelength bands of the microcapsule groups, or a radiation of variable intensity. The recording system has a selector for selecting at least one of the radiations of the different wavelengths, or one of the intensity levels of the radiation, in order to adjust the contrast of the images formed on the medium, with respect to non-image areas on the medium.Type: GrantFiled: April 6, 1987Date of Patent: February 21, 1989Assignee: Brother Kogyo Kabushiki KaishaInventors: Naoyuki Hatta, Satoshi Furukawa
-
Patent number: 4789619Abstract: A positive-working radiation-sensitive mixture is described that contains (a) a radiation-sensitive compound which forms a strong acid under the action of actinic radiation, (b) a compound with at least one C--O--C bond cleavable by acid, (c) a binder which is insoluble in water but soluble in aqueous-alkaline solutions, and (d) a polymethine dye. The polymethine dyes used are hemioxonol dyes or symmetrical cyanine dyes. In the light-sensitive mixture, these dyes effect high sensitization and high image sharpness contrast which, in addition, is substantially irreversible.Type: GrantFiled: November 24, 1986Date of Patent: December 6, 1988Assignee: Hoechst AktiengesellschaftInventors: Hans Ruckert, Joachim Knaul
-
Patent number: 4782006Abstract: An optical recording method comprises the steps of:(A) irradiating a radiation corresponding to a recording information on an optical recording medium having a recording layer containing a diacetylene derivative and at least one selected from the group (hereinafter called the group B) consisting of azulenium salt compounds, pyrylium dyes, diene compounds, croconic methine dyes and polymethine compounds, thereby forming a latent image; and(B) irradiating a radiation on the recording medium having said latent image formed thereon to thereby visualizing said latent image.Type: GrantFiled: December 10, 1986Date of Patent: November 1, 1988Assignee: Canon Kabushiki KaishaInventors: Yukuo Nishimura, Ken Eguchi, Kunihiro Sakai, Haruki Kawada, Hiroshi Matsuda, Takashi Nakagiri, Toshihiko Miyazaki, Yoshinori Tomida, Toshiaki Kimura, Kenji Saito
-
Patent number: 4766055Abstract: Disclosed is a photopolymerizable composition which is very sensitive to visible light. The composition comprises a polymerizable compound and a photopolymerization initiator wherein the photopolymerization initiator comprises (a) a particular xanthene or thioxanthene dyestuff, (b) a photosensitizer selected from the group consisting of N-phenylglycine, 2,4,6-tris(trichloromethyl)-1,3,5-triazine, and a mixture of p-dimethylaminobenzoic acid isopentyl ester and 2,4-diisopropylthioxanthone, and (c) a peroxide.Type: GrantFiled: August 1, 1986Date of Patent: August 23, 1988Assignee: Nippon Paint Co., Ltd.Inventors: Masami Kawabata, Koichi Kimoto, Yasuyuki Takimoto
-
Patent number: 4755450Abstract: Spectral sensitizing dyes which sensitize photoinitiators and disperse in aqueous solutions are desirable in photosensitive systems where precise color rendition is important.Type: GrantFiled: April 22, 1986Date of Patent: July 5, 1988Assignee: Minnesota Mining and Manufacturing CompanyInventors: James F. Sanders, David B. Olson
-
Patent number: 4698286Abstract: Disclosed are plasma developable photoresist compositions that possess photosensitivity to 436 n.m. light and maintain this photosensitivity for suitable periods of time after coating are obtainable. These compositions comprise perylene, certain perylene derivatives, or certain coumarin derivatives as photosensitizers in combination with N-vinyl monomers, haloalkene photoinitiators, and suitable polymeric binders in a suitable solvent.Type: GrantFiled: June 3, 1985Date of Patent: October 6, 1987Assignee: Hercules IncorporatedInventor: Wayne R. Messer
-
Patent number: 4696876Abstract: Novel photopolymerizable compositions are provided which comprise a dye sensitizer, a linear polyethylenimine as a polymerization initiator and a free radical polymerizable ethylenic unsaturated monomer.In the preferred embodiments, the linear polyethylenimine is used in combination with lithium acrylate.Type: GrantFiled: May 12, 1986Date of Patent: September 29, 1987Assignee: Polaroid CorporationInventor: John J. Cael
-
Patent number: 4689288Abstract: Photosensitive film which is photosensitive in a given wavelength range comprises at least one silicon-containing polymer, at least one salt which can be converted into a Brunsted acid by irradiation and optionally at least one photosensitizer. The silicon-containing polymer-based photosensitive film can be used as a masking resin in a lithography process for producing electronic components.Type: GrantFiled: September 19, 1985Date of Patent: August 25, 1987Assignee: Commissariat a l'Energie AtomiqueInventors: Francois Buiguez, Louis Giral, Charles Rosilio, Francois Schue
-
Patent number: 4661434Abstract: A photopolymerizable composition comprising (A) an addition-polymerizable unsaturated compound having two or more ethylenically unsaturated double bonds and (B) a ternary photopolymerization initiator system, comprising a combination of a 4,4'-bis(dialkylamino)benzophenone represented by the following general formula (I), a carbonyl compound represented by the following general formula (IIa) or (IIb), and a compound having a group represented by the following general formula (III): ##STR1## wherein each R, which may be the same or different, represents an alkyl group, a cycloalkyl group or a hydroxyalkyl group, or may be bonded to another R substituent of the same nitrogen atom to form a tetramethylene group, a pentamethylene group or an oxybisethylene group; ##STR2## wherein X represents a single bond, an oxygen atom, a sulfur atom, a substituted or unsubstituted nitrogen atom or a carbonyl group, R.sup.1 and R.sup.Type: GrantFiled: August 16, 1984Date of Patent: April 28, 1987Assignee: Fuji Photo Film Co., Ltd.Inventors: Masayuki Iwasaki, Minoru Maeda, Fumiaki Shinozaki
-
Patent number: 4657942Abstract: A photopolymerizable composition is described, comprising an addition polymerizable compound having at least two ethylenically unsaturated bonds in the molecule, at least one photopolymerization initiator, and at least one of 2-mercapto-5-substituted thiadiazole compounds represented by formulae (I) and (II) ##STR1## wherein R represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkylthio group, or a substituted or unsubstituted aralkylthio group; and R' represents a substituted or unsubstituted alkylene group. The composition has a remarkably good photosensitivity.Type: GrantFiled: January 27, 1986Date of Patent: April 14, 1987Assignee: Fuji Photo Film Co., Ltd.Inventors: Masayuki Iwasaki, Minoru Maeda, Sadao Fujikura
-
Patent number: 4614704Abstract: A method and composition for increasing the cure depth of a solder mask coating at a low UV energy level. The stable composition, which includes a UV curable compound and a photoinitiator, is characterized by the presence of triphenylphosphite in the composition.Type: GrantFiled: June 21, 1985Date of Patent: September 30, 1986Assignee: M&T Chemicals Inc.Inventors: Paul L. K. Hung, Mark L. Lavach
-
Patent number: 4588664Abstract: Novel photopolymerizable compositions are provided which comprise a dye sensitizer, a branched polyethylenimine as a polymerization initiator and a free radical polymerizable ethylenic unsaturated monomer.In the preferred embodiments, the branched polyethylenimine is used in combination with lithium acrylate. This combination provides dry coatings which may be stored for extended periods prior to being activated for imaging, and which produce volume holograms of very high resolution and diffraction efficiency.Type: GrantFiled: August 20, 1984Date of Patent: May 13, 1986Assignee: Polaroid CorporationInventors: Herbert L. Fielding, Richard T. Ingwall
-
Patent number: 4587200Abstract: A photopolymerizable composition is disclosed, comprising a polymerizable compound having at least one ethylenic unsaturated double bond and a photopolymerization initiator, where the photopolymerization initiator is a combination of (A) acridine having a substituted or unsubstituted phenyl group at 9-position and (B) a heterocyclic compound having a thiol group connected to a 5- to 7-membered heterocyclic ring containing at least one nitrogen atom. The photopolymermizable composition is useful for preparation of lithographic plates and photoresists and as an adhesive, printing ink or coating material.Type: GrantFiled: June 5, 1984Date of Patent: May 6, 1986Assignee: Fuji Photo Film Co., Ltd.Inventors: Koji Tamoto, Akira Umehara
-
Patent number: 4576891Abstract: Photosensitive microcapsules having radiation absorbers associated therewith such that the sensitivity of the microcapsules is reduced over a portion of their spectral sensitivity range; the spectral sensitivity of the microcapsules is thereby adjusted such that three sets of microcapsules having distinctly different spectral sensitivities and individually containing color formers for full color imaging can be provided on a single support surface and discriminately exposed in a manner which corresponds to the red, green and blue components of an original.Type: GrantFiled: June 15, 1984Date of Patent: March 18, 1986Assignee: The Mead CorporationInventors: Paul C. Adair, Amy L. Burkholder
-
Patent number: 4562141Abstract: Compositions which can be polymerised by radiation and are based on surface-active, conjugated diacetylene compounds of the formula H(CH.sub.2).sub.m --C.tbd.C--C.tbd.C--(CH.sub.2).sub.n --A in which m and n=0 or 1-30 and m+n is at least 10 and A is a polar group, and which contain mixtures of such diacetylene compounds or are mixed with surface-active substances, are particularly suitable for use as a high-resolution photographic recording material.Type: GrantFiled: September 21, 1983Date of Patent: December 31, 1985Assignee: Ciba Geigy CorporationInventor: Bernd Tieke
-
Patent number: 4548890Abstract: Aqueous dispersions comprising water, a cationically curable compound, and a photosensitive onium salt, and preferably other ingredients such as sensitizers, fillers, and plasticizers, are useful for making printing screens, lithographic plates, and printed circuit resists. After exposure, the un-cured composition is easily removed by washing with water.Type: GrantFiled: March 30, 1984Date of Patent: October 22, 1985Assignee: Sericol Group LimitedInventors: Peter Dickinson, Michael Ellwood
-
Patent number: 4544622Abstract: A negative-acting photoresist imaging system is provided having a substrate, a metal layer, a latently sensitized, crosslinkable, negative-acting photoresist base layer, and a negative-acting photoresist layer. The system may further have an organic protective coat between the metal layer and the base layer, a matte top layer, and/or an antistatic layer on the back side of the substrate.Type: GrantFiled: July 19, 1984Date of Patent: October 1, 1985Assignee: Minnesota Mining and Manufacturing CompanyInventor: William L. Kausch
-
Patent number: 4540649Abstract: A water developable, photopolymerizable composition and printing plates prepared from such composition are disclosed. The photopolymerizable composition includes at least one water soluble polymer, such as polyvinyl alcohol or partially saponified polyvinyl acetate, at least one photopolymerization initiator, and the condensation reaction product of N-methylol acrylamide, N-methylol methacrylamide, N-alkyloxymethyl acrylamide or N-alkyloxymethyl methacrylamide with a melamine derivative of the following formula: ##STR1## wherein, R.sub.1 is CH.sub.2 OR, R.sub.2 is H or CH.sub.2 OR, and R is C.sub.1 -C.sub.4 alkyl. A thermal polymerization inhibitor may also be included in the composition.Plates prepared from the composition demonstrate improved hardness and water resistance, compared to previously known photopolymerizable compositions, and also achieve excellent image quality.Type: GrantFiled: September 12, 1984Date of Patent: September 10, 1985Assignee: Napp Systems (USA) Inc.Inventor: Kiyomi Sakurai
-
Patent number: 4519883Abstract: Glyoxylate photoinitiators are sensitized for photoinitiation by the use of at least one terphenyl sensitizer.Type: GrantFiled: June 6, 1983Date of Patent: May 28, 1985Assignee: Stauffer Chemical CompanyInventor: Francis A. Via
-
Patent number: 4517266Abstract: A holographic recording material comprising a polymer containing vinylcarbazole rings, a cyclic cis-.alpha.-dicarbonyl compound capable of forming a radical by light irradiation and a dye as a photosensitizer or a spectral sensitizer. A hologram can be obtained by exposing the holographic recording material to an interference pattern of a radiation to form a holographic interference pattern, subjecting the material to a swelling treatment in a first medium, and then subjecting the material to a contraction treatment in a second medium.Type: GrantFiled: January 18, 1983Date of Patent: May 14, 1985Assignee: Fujitsu LimitedInventors: Kasumi Ikegami, Hirofumi Okuyama
-
Patent number: 4515886Abstract: Photosensitive compositions useful as resists for transistors, ICs, etc. comprising a solution of a photosensitive high polymer of a polymer or a copolymer which contains a unit expressed by the following general formula: ##STR1## (where X.sub.1 is an atom of hydrogen or halogen, a halogenated alkyl group of 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms, X.sub.2 is a halogen atom or a halogenated alkyl group having 1 to 4 carbon atoms and R is an aromatic ring or a heterocyclic ring), and a photosensitizing agent dissolved in organic solvents. The photosensitive compositions show marked improvement in photosensitivity and gamma value.Type: GrantFiled: February 13, 1984Date of Patent: May 7, 1985Assignee: Toyo Soda Manufacturing Co., Ltd.Inventors: Tsuguo Yamaoka, Mitsutoshi Fukuda
-
Patent number: 4504573Abstract: A high sensitivity photopolymerizable composition is disclosed. The composition includes a polymerizable compound having an ethylenically unsaturated bond and a photopolymerizable initiator represented by the general formula (I). ##STR1## The substituents within general formula (I) are defined within the specification. The composition has improved sensitivity and the initiator provides an increased polymerization rate. The composition may further include Michler's ketone and a N-methyl-2-benzoyl-.beta.-naphthothiazolin.Type: GrantFiled: March 22, 1984Date of Patent: March 12, 1985Assignee: Fuji Photo Film Co., Ltd.Inventors: Shun-ichi Ishikawa, Teruo Nagano, Koji Tamoto, Fumiaki Shinozaki
-
Patent number: 4454218Abstract: Photopolymerizable compositions comprising (a) at least one ethylenically unsaturated compound, (b) at least one photoinitiator or photoinitiator system, (c) sensitizing amount of an N-alkylindolylidene or N-alkylbenzothiazolylidene alkanone as defined, and optionally (d) at least one organic polymeric binder. The compositions, in layer form are useful in printing plates, litho films, photoresists, solder mask and for making image proofs. The products show sensitization to visible light.Type: GrantFiled: September 13, 1982Date of Patent: June 12, 1984Assignee: E. I. Du Pont de Nemours and CompanyInventors: Thomas E. Dueber, William J. Link, deceased
-
Patent number: 4407927Abstract: By adding a compound represented by the following general formulas: ##STR1## to a conventional photoresist composition comprising a cyclized product of conjugated diene homopolymer or copolymer and a photo-crosslinking agent soluble in an organic solvent, an image having a high degree of resolution can be obtained even when a base board having a surface of a high reflectance is used, with a high reproducibility and without being affected by prebaking conditions.Type: GrantFiled: June 3, 1982Date of Patent: October 4, 1983Assignee: Japan Synthetic Rubber Co., Ltd.Inventors: Yoichi Kamoshida, Toshiaki Yoshihara, Yoshiyuki Harita, Kunihiro Harada
-
Patent number: 4356247Abstract: A light-sensitive composition particularly suitable for making light-sensitive lithographic printing plates is described composed of a mixture of a sensitizer and a photo-crosslinkable polymer, or a mixture of a sensitizer, a compound including a light-sensitive azido group and a polymer reactive with a decomposate of azido groups to be formed upon exposure to light, and a sensitizer represented by the formula (I) ##STR1## wherein A represents a non-metallic atomic group necessary for forming a heterocyclic ring containing nitrogen; R.sub.1 represents an alkyl group or a substituted alkyl group; R.sub.2 represents hydrogen, an alkyl group, a substituted alkyl group, an aryl group, or a substituted aryl group; and Y and Z each represents an oxygen atom or a sulfur atom.Type: GrantFiled: October 27, 1980Date of Patent: October 26, 1982Assignee: Fuji Photo Film Co., Ltd.Inventors: Yoshimasa Aotani, Teruo Kojima, Eiji Nakakita
-
Patent number: 4356252Abstract: A photosensitive element which comprises a support bearing a layer of negative-working tonable photoimaging composition comprising at least one organic polymeric binder (a), a photosensitizer (b) which generates an acid upon absorption of actinic radiation, and at least one compound taken from the group of ##STR1## as defined, binder (a) being plasticized by the decomposition product of either compound (c) or (d) or the combination thereof. The photosensitive element is useful in making color proofs.Type: GrantFiled: May 4, 1981Date of Patent: October 26, 1982Assignee: E. I. Du Pont de Nemours and CompanyInventor: Ross A. Lee
-
Patent number: 4297433Abstract: The present invention relates to a method for forming ultra fine patterns on films of polymethyl isopropenyl ketone or a mixture of polymethyl isopropenyl ketone and a benzophenone compound by exposing such films to ultra violet rays in the range of from 1,000 to 3,500 A. The present invention is particularly useful for providing semiconductors having ultra fine patterns and ultra LSI's. The electric or electronic circuits for electronic or electric apparatus and equipment have been produced by wiring resistors, condensers, coils, vacuum tubes and the like necessary components. However, because of various disadvantages such as assembly requiring much time, complication of work, necessity of using large equipment, reasons or causes for errors, limitation of productivity, impossibility of reducing price or cost and the like, the present invention has been developed for printed circuit boards.Type: GrantFiled: November 16, 1978Date of Patent: October 27, 1981Assignee: Tokyo Ohka Kogyo Kabushiki KaishaInventors: Minoru Tsuda, Yoichi Nakamura
-
Patent number: 4294909Abstract: A photosensitive element which comprises a support bearing a layer of negative-working tonable photoimaging composition comprising at least one organic polymeric binder (a), a photosensitizer (b) which generates an acid upon absorption of actinic radiation, and at least one compound taken from the group of ##STR1## as defined, binder (a) being plasticized by the decomposition product of either compound (c) or (d) or the combination thereof. The photosensitive element is useful in making color proofs.Type: GrantFiled: December 26, 1979Date of Patent: October 13, 1981Assignee: E. I. Du Pont de Nemours and CompanyInventor: Ross A. Lee
-
Patent number: 4288513Abstract: To accelerate printing of resist materials on a CRT color panel, an additive is incorporated into the resist to enhance cross-linking upon exposure to actinic radiation.Type: GrantFiled: April 5, 1978Date of Patent: September 8, 1981Assignee: GTE Laboratories IncorporatedInventors: Kurt B. Kilichowski, Peter Cukor, Charles Brecher
-
Patent number: 4287289Abstract: A novel photoresist composition is proposed which is very advantageously employed in the photoetching process for the manufacture of various kinds of electronic devices such as transistors, ICs, LSIs and the like. The photoresist composition of the invention comprises a cyclized rubber as the base component and a specified azobenzene compound as a photoextinction agent for preventing halation in the exposure of the photoresist films to ultraviolet light. The advantages of the inventive photoresist composition over the conventional ones are obtained in the remarkable stability of the halation preventing effect even after a prebaking treatment of the photoresist films at an elevated temperature to remove the solvent from the photoresist films applied on to the substrate surfaces owing to the unexpectedly small sublimation of the azobenzene compound contained in the photoresist films.Type: GrantFiled: June 19, 1979Date of Patent: September 1, 1981Assignee: Tokyo Ohka Kogyo Kabushiki KaishaInventor: Takayuki Sato
-
Patent number: 4276369Abstract: The present invention relates to a method for forming ultra fine patterns on films of polymethyl isopropenyl ketone or a mixture of polymethyl isopropenyl ketone and a benzophenone compound by exposing such films to ultra violet rays in the range of from 1,000 to 3,500 A. The present invention is particularly useful for providing semiconductors having ultra fine patterns and ultra LSI's. The electric or electronic circuits for electronic or electric apparatus and equipment have been produced by wiring resistors, condensers, coils, vacuum tubes and the like necessary components. However, because of various disadvantages such as assembly requiring much time, complication of work, necessity of using large equipment, reasons or causes for errors, limitation of productivity, impossibility of reducing price or cost and the like, the present invention has been developed for printed circuit boards.Type: GrantFiled: November 6, 1978Date of Patent: June 30, 1981Assignee: Tokyo Ohka Kogyo Kabushiki KaishaInventors: Minoru Tsuda, Yoichi Nakamura
-
Patent number: 4275139Abstract: A positive-working light-sensitive copying material, in particular for the preparation of planographic printing plates, is described, the light-sensitive layer of which contains an ester or amide of a o-naphthoquinone diazide-sulfonic or -carboxylic acid, an alkali-soluble, water-insoluble phenolic resin and a condensation product of a hydroxybenzophenone and formaldehyde. The material is distinguished by an increased light-sensitivity.Type: GrantFiled: November 1, 1979Date of Patent: June 23, 1981Assignee: Hoechst AktiengesellschaftInventor: Paul Stahlhofen
-
Patent number: 4248959Abstract: This invention relates to an improvement in a photochemical process for the preparation of printing plates wherein a printing plate comprising a photosensitive composition coated on a support is exposed to a pattern of laser light, the intensity of which light is modulated in accordance with an input source of information, and said printing plate is subsequently developed by removal from said support of that portion of the photosensitive coating composition which is not exposed to said pattern of laser light, the improvement comprising utilizing a pattern of laser light generated by a laser, and utilizing as a photosensitive composition a mixture consisting essentially of: (1) a negative-working condensate of a para-amino benzene diazonium compound present in an effective amount sufficient to sensitize said photosensitive composition to laser light, and (2) a colorant capable of absorbing light in the spectral range between about 450 -550 nm, said colorant selectively sensitizing the condensate to said laserType: GrantFiled: December 7, 1978Date of Patent: February 3, 1981Assignee: American Hoechst CorporationInventors: William Jeffers, Douglas Seeley, Raimund J. Faust, Shuchen Liu