Abstract: A system has been disclosed for use in radiographic industrial non-destructive testing materials and personal monitoring, making use therefor, of tabular silver brom(oiod)ide emulsion grains having {111} major faces, an average equivalent circular diameter of at least 0.5 &mgr;m and an average thickness of less than 0.30 &mgr;m, having been chemically sensitized by the steps of adding at least a gold salt in order to provide the surface of said tabular grains with at least 6000 atoms of gold per &mgr;m2 of its grain surface and per (0.1 &mgr;m of thickness)2; and at least a sulfite salt in such an amount that the ratio of the number of gold atoms per &mgr;m2 and (concentration of said sulfite salt, expressed in mmole per mole of silver)2 is at least 200000.

Abstract: This invention discloses compositions that can be polymerized/crosslinked imagewise upon exposure to ionization radiation such as x-ray, electron beam, ion beam, and gamma-ray. This invention also discloses methods of use for these compositions for microfabrication of ceramics, for stereolithography, and for x-ray, e-beam, and ion-beam lithography which can be used for photoresists.

Abstract: A negative resist composition comprising (A) an alkali-soluble polymer, (B) a cross-linking agent forming cross-links between molecules of the alkali-soluble polymer (A) under the action of an acid and (C) a specified acid generator, which can satisfy all of performance requirements concerning sensitivity, resolution, pattern profile and line-edge roughness in the pattern formation by irradiation with electron beams or X-rays.

Abstract: A light exposure method for ultra-fine processing for a semiconductor in which light transmittance of a resist layer in a wavelength range of the extreme ultraviolet (EUV) light is improved to enable ultra-fine processing more elaborate than is possible with conventional methods. In selectively exposing a resist layer to X-rays, a high molecular material obtained by replacing at least a portion of hydrogen atoms of a pre-existing resist material by a substituent containing an alkyl group and/or a substituent containing an aromatic ring is used as a high molecular material of the resist layer. By replacing the hydrogen atoms of the high molecular materials with a substituent containing an alkyl group or a substituent containing an aromatic ring, the proportion of oxygen atoms in an atom of the high molecular materials becomes relatively smaller to suppress optical absorption of the entire high molecular material. The line absorption coefficient in an x-ray wavelength is 3.80&mgr;−1 or less.

Abstract: A radiographic silver halide film material and a radiographic screen/film combination has been disclosed, said material having in at least one light-sensitive layer thereof an emulsion comprising {111} tabular silver halide grains rich in silver bromide, spectrally sensitive to irradiation in the wavelength range between 540 and 555 nm by the presence of a combination of at least one J-aggregating spectrally sensitizing cyanine dye according to the formula (I) and of at least one additional cyanine dye providing a shift of maximum absorption wavelength of said combination of less than 10 nm versus in the absence thereof, wherein said additional cyanine dye is at least one monomethine cyanine dye according to the formula (II), essentially having a solubilizing group or a latent solubilizing group, said dyes having been given in the description and in the claims of the present invention.

Abstract: Thermally developable compositions such thermographic and photothermographic emulsions include certain quaternary phthalazine compounds. These emulsions can be used in thermally developable materials such as thermographic and photothermographic materials to provide improved sensitometric and post processing properties. Such materials can have imaging layers on one or both sides of the support.

Abstract: A process for producing structured or patterned protective and insulating layers includes applying a solution of a photosensitive polyhydroxyamide or polyhydroxyimide to a substrate and drying. The layer is patterned or structured by irradiation with UV light or X-rays through the use of a mask or by guidance of a UV or electron beam and by subsequent aqueous-alkali development. The patterned or structured layer is irradiated over the whole area with UV light and then tempered or heat-treated.

Abstract: An radiographic imaging system for making a radiograph by a radiography apparatus using a photographic combination of a silver halide photographic light sensitive material in combination with intensifying screens, the photographic material comprising a support having a light sensitive silver halide emulsion layer on each both sides of the support, wherein the radiography apparatus conducts making a radiograph under the condition that a distance between a focal point of an X-ray tube and the photographic material is 0.9 to 3.0 m, a distance between the focal point of the X-ray tube and an object and the photographic combination is 0.3 to 1.5 m.

Abstract: A storage phosphor panel for storing image information and an X-ray cassette with such a storage phosphor panel are proposed. The storage phosphor panel contains a carrier layer and a storage phosphor layer, which is applied on the carrier layer. The storage phosphor panel furthermore has a contour for fixing the storage phosphor panel in a cassette.

Abstract: Radiographic films containing cubic grain, high silver chloride emulsions can be used in radiographic imaging assemblies comprising intensifying screens for therapy portal localization imaging. The average silver halide grain size is from about 0.1 to about 0.18 &mgr;m and the silver halide is free of silver halide dopant compounds. These films provide excellent contrast with improved exposure latitude (at least 4:1 when measured at a gamma value of 1.5) for use in various exposure conditions and equipment.

Abstract: The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it is a positive-working radiation-sensitive composition containing polymer the solubility of which is increased in aqueous alkali by the action of acid, and a compound which generates acid by irradiation with radiation, and the ease of occurrence of main chain scission of said polymer by means of radiation is greater than that of polymethyl methacrylate, and it also relates to a positive-working radiation-sensitive composition which is characterized in that it contains an alkali-soluble polymer, a compound having the effect of suppressing the alkali-solubility of said alkali-soluble polymer and the suppression effect of which is lowered or eliminated by the action of acid, and a compound which generates acid by irradiation with radiation, and the ease of occurrence of main chain scission of said alkali-soluble polymer by radiation is greater than that of polymethyl methacrylate.

Abstract: A radiographic film material has been described for recording medical diagnostic images of soft tissue through exposure to light, emitted by a single intensifying screen, after having been subjecting to exposure with X-rays, emitted from an X-ray generating device with a tube voltage of 20 kV to 40 kV, and processing, including development, fixing and drying, within a time of 120 (and more preferably 90) seconds or less, wherein said film is comprised of a transparent film support, front and back major faces and an image-forming portion for providing, when imagewise exposed by light emitted by said intensifying screen and processed, an average contrast or gradient in the range from 3.0 up to 4.5, measured over a density above fog in the range of from 0.25 to 2.

Abstract: A single-side coated light-sensitive silver halide photographic film material has been disclosed, having on one side of a subbed support, one or more light-sensitive silver halide emulsion layer(s) overcoated with an outermost protective layer; and, at the other side of said support, a backing layer, covered with a protective outermost layer, characterized in that at least said backing layer is provided with a layer wherein, besides a cross-linked or cross-linkable first binder an organic component free from cross-linking upon reaction with a hardener is present as a second binder having a low molecular weight.

Abstract: The use of a resist latent image alignment mark in lieu of using dedicated discrete alignment targets defined on a semiconductor wafer and the use of field oxide step heights for alignment during the fabrication of circuit devices are disclosed. A resist latent image alignment mark is formed in a layer of photoresist material and utilized to position a mask for exposing portions of the photoresist to a radiation source to pattern locations for active areas on a semiconductor substrate. A LOCOS isolation structure is then formed around the active areas. The isolation structure is formed such that the depth of the isolation structure is adjusted to a particular radiation source wavelength. The depth of the isolation structure can then be used as a diffraction grating for stepper alignment. Isolation structure height may also be used as a diffraction grating for stepper alignment.

Abstract: This invention discloses compositions that can be polymerized/crosslinked imagewise upon exposure to ionization radiation such as x-ray, electron beam, ion beam, and gamma-ray. This invention also discloses methods of use for these compositions for microfabrication of ceramics, for stereolithography, and for x-ray, e-beam, and ion-beam lithography which can be used for photoresists.

Abstract: A pattern formation material of this invention contains a base polymer including a first unit represented by Chemical Formula 1 and a second unit represented by Chemical Formula 2, and an acid generator: 1

Abstract: Disclosed is a microlens manufacturing method which comprises the step of: positioning a X-ray mask for manufacturing the microlens on an substrate on which a sensitive film is formed, and arranging a rotation axis of the substrate and a central axis of the X-ray mask; applying X-rays to the X-ray mask to expose the sensitive film while fixing the X-ray mask and rotating the substrate; developing the sensitive film to form the microlens; performing an electroplating process on the plating base to form a metal layer; and separating the metal layer from the sensitive film structure and combining the metal layer with a mold frame for injection molding the microlens and manufacturing an injection mold.

Abstract: A method has been described for preparing an ultrathin tabular grain emulsion rich in silver bromide, having {111} major faces, wherein tabular grains having a thickness of less than 0.08 &mgr;m exhibit an average aspect ratio of more than 5:1 and account for at least 75% by number of hexagonal grains and a coefficient of variation on average equivalent surface area of less than 0.50. The process is characterized in that during formation, (a) pH is maintained from 0.8 to 10; (b) a gelatino-peptizer is present in a concentration of 0 to 50 g per liter of dispersing medium, and (c) pBr having a value of at least 1.8 is maintained during grain nucleation and pBr is maintained at less than 2.4 during growth provided that a gelatin peptizer which is free from calcium ions and has a methionine content of less than 30 micromoles per gram of gelatino-peptizer is present.

Abstract: A direct X-ray system for industrial radiography like non-destructive testing applications, and personal monitoring, being particularly less sensitive to pressure phenomena, has been disclosed, said system consisting of a direct X-ray black-and-white negative-working radiographic film material, comprised of a transparent support coated on at least one side thereof with a tabular grain emulsion layer, substantially free from spectrally sensitizing dyes, in which at least 50 percent of total grain projected area of all grains is accounted for by silver bromoiodide tabular grains having an iodide content of less than 5 mole %, based on silver, having an average aspect ratio of at least 2, and having a volume greater than 0.

Abstract: A positive resist composition comprises: a compound capable of directly or indirectly generating a radical (A) on irradiation with an energy ray; or a cyclic ether compound.

Abstract: A copolymer of an acrylate monomer containing fluorine at &agr;-position with a fluorinated hydroxystyrene derivative is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, resolution, transparency, substrate adhesion and plasma etching resistance, and is suited for lithographic microprocessing.

Abstract: Radiographic films exhibit improved visual performance because of the presence of certain colorants that provide more positive a* values without diminishing image tone (b*). Thus, the greenish tint the films may exhibit is reduced. These films provide desired sensitometric properties while they have reduced silver, hydrophilic polymer binder, and hardener coverage on both sides of a transparent support.

Abstract: A black-and-white silver halide photographic film material has been provided, wherein said material has first and second major surfaces, at least one of which is coated with at least one light-sensitive silver halide emulsion layer, overcoated with a protective antistress layer, wherein said emulsion layer(s) have chemically and spectrally sensitized {111} tabular hexagonal emulsion grains or crystals rich in silver bromide in an amount covering at least 50% of the total projective grain surface of all grains, wherein said grains further have an average equivalent volume diameter in the range from 0.3 &mgr;m up to 1.5 &mgr;m and an average grain thickness of less than 0.30 &mgr;m, and an average amount of iodide from 0.05 mole % up to 0.5 mole % based on silver over the whole grain volume, characterized in that said material comprises, in an amount of at least 0.

Abstract: Disclosed is an X-ray mask for use in an exposure apparatus for transferring a circuit pattern onto an exposure substrate by use of an X-ray beam to produce a semiconductor device, wherein the X-ray mask includes an X-ray transmission film having a layered X-ray absorptive material formed thereon, and a holding frame for holding the X-ray transmission film, and wherein the X-ray transmission film is held by the holding frame with an even step-like structure defined at its peripheral portion. With this arrangement, a dust particle adhered to the X-ray mask surface and having a predetermined height can be detected precisely, such that a large integration device can be produced effectively.

Abstract: A chemically and spectrally-sensitized emulsion has been described, wherein said emulsion comprising (100) cubic silver halide grains with an average edge length of from 0.2 up to 1.5 &mgr;m, has been spectrally sensitized by addition at least three trimethine dyes: a main spectral sensitizer added in an amount of at least 85 mole % of all spectral sensitizers added, followed by adding a second spectral sensitizer in an amount of not more than 10 mole % and a third spectral sensitizer in an amount of at most 1 mole % wherein at least said main spectral sensitizer has two benzoxazole rings in its chemical structure, at least said third spectral sensitizer has two benzimidazole rings in its chemical structure and wherein the said second spectral sensitizer has a structure more sterically hindered than the structure of the other spectral sensitizers. A light-sensitive silver halide photographic film material coated with such emulsion and a radiographic screen/film combination has been described.

Abstract: The present invention provides new high resolution resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic processes to effect state-of-the-art lithographies. New nanocomposite resists comprising nanoparticles in a polymer matrix are provided in this invention. New chemically amplified resists that incorporate inorganic moieties as part of the polymer are presented herein, as are new chemically amplified resists that incorporate photoacid generating groups within the polymeric chain. Novel non-chemically amplified yet photosensitive resists, and new organic-inorganic hybrid resists are also provided herein. This invention and the embodiments described herein constitute fundamentally new architectures for high resolution resists.

Abstract: A radiographic imaging assembly has first and second radiographic silver halide films in association with two fluorescent intensifying screens. Between one set of screen and film is a magenta filter having a density of at least 0.3 to provide improved exposure latitude for use in various exposure conditions and equipment. The magenta filter comprises a transparent support having a hydrophilic layer disposed thereon, which layer includes sufficient dyes or pigments that absorb in the range of from about 500 to about 600 nm. These dyes or pigments are dispersed in a hydrophilic binder to provide the desired density. The magenta filter is laminated to one of the screens with its hydrophilic layer in contact with the screen.

Abstract: A radiographic imaging assembly has two different (“asymmetric”) fluorescent intensifying screens on either side of two radiographic silver halide films. The two fluorescent intensifying screens differ in speed by at least 0.1 logE. This imaging assembly provides high contrast images and improved exposure latitude for use in various exposure conditions and equipment. The two films can be the same or different (for example, providing images of different contrast).

Abstract: The present invention relates to a silicon-containing copolymer which includes a maleic anhydride repeating unit, a norbornene repeating unit, and at least one silicon group-containing norbornene repeating unit. The silicon-containing copolymer is suitable for use as a top layer resist in a bilayer resist system.

Abstract: Disclosed is a polymer for use in a chemically amplified resist, a resist composition including such a polymer is suitable for use in a chemically amplified resist, which is sensitive to far ultraviolet rays such as KrF or ArF excimer laser and forms a photoresist pattern having low dependence on and good adhesion to substrate, high transparency in the wavelength range of the above radiation, strong resistance to dry etching, and excellencies in sensitivity, resolution and developability. The resist composition can have a stronger etching resistance with a maximized content of unsaturated aliphatic ring in the polymer and a reduced edge roughness of the photoresist pattern with an alkoxyalkyl acrylate monomer employed.

Abstract: A radiographic imaging assembly has a first radiographic silver halide film that provides high contrast images in association with a second radiographic silver halide film that provides lower contrast images. The combination of two films, with or without one or more fluorescent intensifying screens, provides images with excellent contrast and improved exposure latitude for use in various exposure conditions and equipment. The ratio of contrast of images provided by the first and second radiographic silver halide films is at least 1.25.

Abstract: A radiographic imaging assembly has first and second radiographic silver halide films in association with two fluorescent intensifying screens. Between one set of screen and film is a neutral density filter having a density of at least 0.3 to provide with improved exposure latitude for use in various exposure conditions and equipment. The neutral density filter comprises a transparent support having a hydrophilic neutral density filter layer disposed thereon, which layer includes sufficient silver metal, colloidal carbon, or exposed and processed silver halide in a hydrophilic binder to provide the desired density. The neutral density filter is laminated to one of the screens with its hydrophilic layer in contact with the screen.

Abstract: A radiographic imaging assembly has a first radiographic silver halide film in association with a second radiographic silver halide film wherein the ratio of photographic speed of the two films is greater than 0.15 logE. The combination of two films is used with two fluorescent intensifying screens that also have photographic speeds that differ by at least 0.1 log E. This imaging assembly provides images with excellent contrast and improved exposure latitude for use in various exposure conditions and equipment.

Abstract: A radiographic imaging assembly has a first radiographic silver halide film in association with a second radiographic silver halide film wherein the ratio of photographic speed of the two films is greater than 0.15 logE. The combination of two films, with or without one or more fluorescent intensifying screens, provides images with excellent contrast and improved exposure latitude for use in various exposure conditions and equipment.

Abstract: A radiographic imaging assembly has first and second radiographic silver halide films in association with two fluorescent intensifying screens. Disposed between one set of screen and film is a neutral density filter having a density of at least 0.3 to provide improved exposure latitude for use in various exposure conditions and equipment.

Abstract: A light-sensitive silver halide photographic film material has been provided, said film material comprising a transparent support and on both sides thereof at least one light-sensitive emulsion layer having spectrally and chemically sensitized tabular silver halide grains rich in silver bromide, further having silver iodide in an amount of less than 3 mole % based on silver, with two flat parallel {111} crystal faces, said grains accounting for a total projective surface of said parallel crystal faces in said emulsion of at least 50%, further having an average aspect ratio of at least 2:1, a grain thickness of from 0.05 up to 0.

Abstract: Radiographic films containing cubic grain, high silver chloride emulsions can be used in radiographic imaging assemblies comprising intensifying screens for therapy portal localization imaging. The average silver halide grain size is from about 0.1 to about 0.18 &mgr;m and the silver halide is free of silver halide dopant compounds. These films provide excellent contrast with improved exposure latitude for use in various exposure conditions and equipment.

Abstract: The use of a resist latent image alignment mark in lieu of using dedicated discrete alignment targets defined on a semiconductor wafer and the use of field oxide step heights for alignment during the fabrication of circuit devices are disclosed. A resist latent image alignment mark is formed in a layer of photoresist material and utilized to position a mask for exposing portions of the photoresist to a radiation source to pattern locations for active areas on a semiconductor substrate. A LOCOS isolation structure is then formed around the active areas. The isolation structure is formed such that the depth of the isolation structure is adjusted to a particular radiation source wavelength. The depth of the isolation structure can then be used as a diffraction grating for stepper alignment. The height of the isolation structure can also be used as a diffraction grating for stepper alignment.

Abstract: A semiconductor device on a wafer is formed by lithography with the following steps of: coating (13) a lithography resist onto said wafer in a coating means (5), exposing (14) said wafer to an irradiation through a reticle in an exposure tool (4), stabilizing (15) said lithography resist for activating chemical reaction and developing said lithography resist in said predetermined areas in a developer means (6) so as to reveal a predetermined lithography resist pattern on the wafer surface, stabilizing (16) the lithography resist in a stabilization means (7) for strengthening said pattern on the wafer surface, performing (17) a metrology inspection of said lithography resist pattern on said wafer surface in a metrology tool (8), etching, wet processing or implanting ions (18) into said wafer in a processing cell (9), wherein said metrology inspection is performed by atomic force microscopy in a atomic force microscopy module (11) immediately after developing and baking said lithography resist adjacent to said

Abstract: A radiographic silver halide film material and a radiographic screen/film combination has been disclosed, said material having in at least one light-sensitive layer thereof an emulsion comprising {111} tabular silver halide grains rich in silver bromide, spectrally sensitive to irradiation in the wavelength range between 540 and 555 nm by the presence of a combination of at least one J-aggregating spectrally sensitizing cyanine dye according to the formula (I) and of at least one additional cyanine dye providing a shift of maximum absorption wavelength of said combination of less than 10 nm versus in the absence thereof, wherein said additional cyanine dye is at least one monomethine cyanine dye according to the formula (II), essentially having a solubilizing group or a latent solubilizing group, said dyes having been given in the description and in the claims of the present invention.

Abstract: A multilayer light-sensitive silver halide photographic negative image type material and a method to prepare said material has been described, said material comprising on at least one side of a support a multilayer composition of at least two layers of negative image type silver halide emulsions adjacent to each other, wherein the emulsion layer closest to the said support comprises tabular emulsion crystals selected from the group consisting of silver chloride, silver chlorobromide, silver chloroiodide and silver chlorobromoiodide having a {111} crystal habit and silver chloride, silver chlorobromide, silver chloroiodide and silver chlorobromoiodide having a {100} crystal habit and wherein the adjacent layer(s) farther from the said support comprise(s) essentially cubic emulsion crystals selected from the group consisting of silver chloride, silver chlorobromide and silver bromide, wherein the essentially cubic grains are less sensitive than the tabular grains and wherein the said tabular

Abstract: A light exposure method in which, when a resist layer is selectively exposed to one of X-rays containing soft X-rays, vacuum ultraviolet light rays and ultraviolet rays containing extreme ultraviolet light rays for patterning the resist layer to a pre-set shape, a high molecular material having pre-set oxygen content ratio (n0) and density (&rgr;) is applied to form a resist layer having a film thickness not less than 250 nm. Since the high molecular material having the pre-set oxygen content ratio (n0) and density (&rgr;) is used, a resist pattern of a better shape may be obtained even if the resist layer is of an increased thickness of not less than 250 nm. Since the film thickness of the resist layer is not less than 250 nm, it is possible to construct a lithographic process superior in etching resistance to realize ultra-fine machining than was heretofore possible.

Abstract: X-radiation sensitive photothermographic imaging materials contain X-radiation sensitive phosphors in association with photosensitive silver halide. These phosphors provide an increase in imaging sensitivity and improved image contrast. Both intensifying and storage phosphors can be used.

Abstract: A multilayer light-sensitive silver halide photographic negative image type material and a method to prepare said material has been described, said material comprising on at least one side of a support a multilayer composition of at least two layers of negative image type silver halide emulsions adjacent to each other, wherein the emulsion layer closest to the said support comprises tabular emulsion crystals selected from the group consisting of silver chloride, silver chlorobromide, silver chloroiodide and silver chlorobromoiodide having a {111} crystal habit and silver chloride, silver chlorobromide, silver chloroiodide and silver chlorobromoiodide having a {100} crystal habit and wherein the adjacent layer(s) farther from the said support comprise(s) essentially cubic emulsion crystals selected from the group consisting of silver chloride, silver chlorobromide and silver bromide, wherein the essentially cubic grains are less sensitive than the tabular grains and wherein the said tabular

Abstract: Radiographic films containing cubic grain, high silver chloride emulsions can be used in radiographic imaging assemblies comprising intensifying screens for therapy portal imaging. The average silver halide grain size is from about 0.1 to about 0.18 &mgr;m. These films provide excellent contrast with improved exposure latitude for use in various exposure conditions and equipment.

Abstract: There are provided a photosensitive resin composition containing at least a polymer compound having a sugar structure, which has at least two species of functional groups cleavable in the presence of an acid, and a photo acid generator generating an acid by radiation of an electromagnetic wave or a beam of an electrically charged particle, and in addition, a resist composition, a method for fabricating a patterned substrate for fabricating a semiconductor device and the like, and a device such as a highly integrated semiconductor and the like.

Abstract: A direct X-ray system for industrial radiography, like non-destructive testing applications, and personal monitoring, being particularly less sensitive to pressure phenomena, has been disclosed, said system consisting of a direct X-ray black-and-white negative-working radiographic film material, comprised of a transparent support coated on at least one side thereof with a tabular grain emulsion layer, substantially free from spectrally sensitizing dyes, in which at least 50 percent of total grain projected area of all grains is accounted for by silver bromoiodide tabular grains having an iodide content of less than 5 mole %, based on silver, having an average aspect ratio of at least 2, and having a volume greater than 0.

Abstract: A film material has been provided with emulsions comprising {111} tabular silver halide grains rich in silver bromide, spectrally sensitive to irradiation in the wavelength range shorter than 420 nm by the presence of at least one blue spectral sensitizer and of at least one azacyanine dye, the formula of which has been given in the description and in the claims. A radiographic screen/film combination or system has also been provided comprising a duplitized film sandwiched between a pair of supporting or self-supporting X-ray intensifying screens, characterized in that i) said pair of supported or self-supporting X-ray intensifying screens essentially consists of luminescent phosphor particles emitting at least 50% and more preferably at least 80% of their emitted radiation in the wavelength range shorter than 420 nm, ii) said film corresponds with the film material disclosed hereinbefore.

Abstract: A system has been disclosed for use in radiographic industrial non-destructive testing materials and personal monitoring, making use therefor, of tabular silver brom(oiod)ide emulsion grains having {111} major faces, an average equivalent circular diameter of at least 0.5 &mgr;m and an average thickness of less than 0.30 &mgr;m, having been chemically sensitized by the steps of adding at least a gold salt in order to provide the surface of said tabular grains with at least 6000 atoms of gold per &mgr;m2 of its grain surface and per (0.1 &mgr;m of thickness)2; and at least a sulfite salt in such an amount that the ratio of the number of gold atoms per &mgr;m2 and (concentration of said sulfite salt, expressed in mmole per mole of silver)2 is at least 200000.

Abstract: A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), 1