Abstract: A circular air flow pattern is created in a small oven cavity having a convection system including a convection cover which is mounted to and defines a duct in combination with a rear wall of the oven cavity. The convection cover includes an intake at one end portion arranged adjacent a first side wall of the oven cavity and a plurality of exhaust openings formed in another end portion arranged adjacent a second side wall of the oven cavity, with the convection cover progressively tapering through multiple sections. The rear wall can include an elongated recess over which the convection cover extends in forming the duct.

Abstract: What is aimed at is provision of an inexpensive and efficient saccharification method for lignocellulose using a thermostable xylanase and provision of a mutant xylanase that has a substitute amino acid residue, and that exhibits stable activity even under severe conditions in which enzymes easily inactivate, and that provides an initial rate of reaction not significantly reduced as compared to a wild-type xylanase corresponding to the mutant xylanase. Provided is a method of producing a saccharified product of lignocellulose, including contacting a lignocellulosic raw material with a thermostable xylanase, and a mutant xylanase that provides an initial rate of reaction that is at least 70% of that provided by a wild-type xylanase corresponding thereto, that has a xylanase activity after heat treatment at 50° C. for 24 hours that is at least 50% of its xylanase activity before the heat treatment, and that has a substitute amino acid residue.

Abstract: A circular air flow pattern is created in a small oven cavity having a convection system including a convection cover which is mounted to and defines a duct in combination with a rear wall of the oven cavity. The convection cover includes an intake at one end portion arranged adjacent a first side wall of the oven cavity and a plurality of exhaust openings formed in another end portion arranged adjacent a second side wall of the oven cavity, with the convection cover progressively tapering through multiple sections. The rear wall can include an elongated recess over which the convection cover extends in forming the duct.

Abstract: A work is subjected to a heat treatment in a heat-treating furnace. First, the work is carried into the heat-treating furnace. The work in the heat-treating furnace is immersed in a heat source solvent. In the heat-treating furnace, a superheated steam atmosphere is formed. The work is exposed in the heat-treating furnace under the superheated steam atmosphere. Then, the work is carried out of the heat-treating furnace.

Abstract: A hydrogen vacuum furnace (100) is provided with a process chamber (1) wherein a subject (10) to be heated is stored; a heating chamber (2) wherein a heater lamp (25) is stored; and a crystal board (3) for separating the subject (10) and the heater lamp (25) one from the other. In the hydrogen vacuum furnace (100), the subject (10) is heated by a radiant ray applied from the heater lamp (25). The process chamber (1) and the heating chamber (2) are provided with gas feed ports (11, 21) and exhaust ports (12, 22), respectively, for feeding and exhausting a gas. When the subject (10) is being heated, atmospheric pressure in each chamber is adjusted so that the heating chamber (2) is under positive pressure to the process chamber (1) by feeding or exhausting the gas.

Abstract: A heating apparatus including: a first heating part and a second heating part between which a substrate having a coating film is disposed at a substrate position in the film thickness direction; and a distance control part which controls at least one of a first distance between the substrate position and the first heating part and a second distance between the substrate position and the second heating part.

Abstract: The present invention relates to a pressing arrangement for treatment of articles by hot pressing and in particular to a pressing arrangement for hot isostatic pressing of containers holding substances. The method comprises: placing containers including the substance in a load compartment in the furnace and loading a pressure medium into the pressure vessel and substantially all pressure medium flowing out from the furnace chamber (18) passes at least one substance capturing module, which may include the walls of the guiding passage, at least one condensation element (35) in the guiding passage, filters (41, 43) arranged in the guiding passage, before making contact with the pressure vessel including the top and bottom closures (8, 9).

Abstract: An erasing apparatus includes a path configured to carry a sheet, and an erasing unit arranged on the path and configured to erase an image on the sheet by heating the sheet. The erasing apparatus further includes a fan configured to blow air downstream from the erasing unit in a sheet carrying direction, and a shutter disposed between the fan and the erasing unit and movable to control the amount of air blown by the fan from reaching the erasing unit.

Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber providing an inner space in which a process with respect to a substrate is performed, a heating plate on which the substrate is placed, the heating plate being fixedly disposed within the chamber, a heater spaced from a lower portion of the heating plate to heat the heating plate, and a lift module lifting the heater.

Abstract: A nozzle device for a furnace, having a central supply pipe, on which at least one nozzle opening and a feed connection for connecting the nozzle device to a gas supply are provided, the gas supply feeding a gas into the nozzle device flowing through the nozzle device and issuing from the at least one nozzle opening, and also relates to a furnace for heat treating a steel flat product. The nozzle device and the furnace by simple means ensure that the respective heat treatment produces uniform results in an optimum way. This is achieved by the nozzle device having a first section, in which it has a smaller effective nozzle opening cross-section than in a second section which seen in the flow direction of the gas issuing from the respective feed connection and flowing through the nozzle device is arranged further away from the feed connection in question.

Abstract: A sintering apparatus comprising a furnace core tube having an opening in a top end through which the soot deposition body is inserted, and having atmospheric gas introduced therein from below and expelled upward; a shaft from which the soot deposition body hangs; a lid that has the shaft inserted therethrough and can cover the opening; a heating furnace that heats the soot deposition body; an internal lid in a top portion of the furnace core tube that divides the top portion of the furnace core tube into an upper region and a lower region; and a gas flow path that connects the two regions to each other and has the atmospheric gas flow therethrough. Total cross-sectional area, relative to movement direction of the atmospheric gas, of the gas flow path is less than cross-sectional area, relative to movement direction of the atmospheric gas, of the furnace core tube.

Abstract: The present invention is directed to a method for preparing a permanent magnet, and more specifically, to a method for preparing a high-performance sintered Nd—Fe—B permanent magnet, in order to solve the problems of increased brittleness or high cost present in the permanent magnet prepared by the existing process. A method for preparing a sintered Nd—Fe—B permanent magnet includes the following steps: (1) ingredient calculation and raw material preparation in which calculating ingredients and preparing raw materials according to the ingredient formula of the resultantly sintered Nd—Fe—B permanent magnet in mass fraction, i.e., (NdA?XREX)A(Febal?yMy)balB0.95˜1.03, in which A %+(0.95˜4.03)%+bal %=100%; then dividing the raw materials into a rare earth Fe—B compound and rare earth metals, the formula of the rare earth Fe—B compound in mass fraction being (Nd28?aREa)28(Febal?yMy)balB0.95˜1.03 and that of the rare earth metals being (NdA?28?bREb)A?28.

Abstract: Provided is a technology for uniformly increasing atmosphere temperature while rapidly achieving a desired uniform atmosphere composition. A combustion apparatus is provided with: a combustion part including a combustion space with a combustible gas inlet which is opened toward the combustion space for allowing the entry of a combustible gas, an air inlet which is opened toward the combustion space for allowing the entry of air, and a combustion gas outlet for discharging a combustible gas to the outside; and a regulated gas through channel part including a regulated gas outlet for discharging the gas prepared into a desired composition to the outside, the regulated gas outlet located adjacent to the combustion gas outlet and having an opening facing the combustion gas immediately after being discharged from the combustion gas outlet.

Abstract: A device for heating a substrate according to a predetermined temperature profile for crystallizing a material on the substrate includes: a housing, at least a process chamber situated inside the housing and provided with a first and second opening for passing through a substrate, an inlet for introducing a process gas which includes the material in vapour phase into the chamber, at least two transport rollers attached to the housing for transporting the substrate into the chamber. The device further includes passage spaces for preventing the escape of process gas from the chamber to a space between the chamber and housing, which are situated near respective ends of the transport rollers in the chamber, the respective passage spaces having a first passage opening on an inner wall of the chamber, a second passage opening on an outer wall of the chamber and a first flange fixed around the transport roller.

Abstract: A method of manufacturing a honeycomb structure including a honeycomb unit includes forming a honeycomb molded body having a plurality of cells extending from a first end face to a second end face of the honeycomb molded body along a longitudinal direction of the honeycomb molded body and separated by a plurality of cell walls, placing the honeycomb molded body in a degreasing apparatus so that the first end face faces downward and the second end face faces upward, feeding introduced gas into the degreasing apparatus, degreasing the honeycomb molded body at a temperature of approximately 200° C. to approximately 400° C., and firing the degreased honeycomb molded body at a temperature of approximately 500° C. to approximately 900° C. to obtain the honeycomb unit.

Abstract: Substrate heat treatment apparatus and method are provided. According to an embodiment of the present invention, there is provided a substrate heat treatment apparatus including an inner shell configured to form a substrate housing space to house at least one substrate, an outer shell configured to cover the inner shell, and having at least one gas hole, and at least one heater configured to heat the substrate, wherein the at least one gas hole is configured to allow a first gas to be injected into a space between the inner shell and the outer shell.

Abstract: A continuous sintering method for rare earth permanent magnetic alloy comprises: connecting a preparation chamber, a glove chamber and a sealed transmission chamber, a sealed chamber, a charging chamber, a preheating chamber, a heating and de-airing chamber, a sintering chamber and a cooling chamber one after another. A press formed blank of rare earth permanent magnetic alloy powder is transmitted under oxygen free condition, and processed with heating and de-airing, sintering and cooling. The preparation chamber, the glove chamber and the sealed transmission chamber are transmitted by bottom rollers, transmissions of other chambers are provided on a top portion of each chamber, and conveyed by roller rails. The rollers of the charging rack are suspended on rails of the transmissions. The drawer model charging rack is capable of loading multiple charging box.

Abstract: An industrial furnace (1) into which protective gas is admitted for the heat treatment of batches (5) of metal workpieces is described. The heat treating furnace includes an entrance lock (2) which can be sealed with respect to the surrounding environment by means of a first gas-tight closure device (2.2.1). The heat treating furnace also includes a third gas-tight closure device (3.1) disposed between a heat treatment chamber (3) of the furnace and a quenching facility (4) at the exit of the heat treatment chamber. With the foregoing arrangement a pressure of the protective gas admitted into the heat treatment chamber (3) can be maintained during loading and unloading of a batch of metal workpieces (5). The entrance lock may be configured as a dual-chamber vertical arrangement or as a single chamber horizontal arrangement.

Abstract: A heat treatment apparatus includes: a reaction tube processing a plurality of substrates; a support member supporting the reaction tube; a flange protruding outwardly from a lower end of the reaction tube: a concave portion formed in an outer periphery of the flange; and a rotatable roller installed in a top surface of the support member. The rotatable roller engages the concave portion and positions the reaction tube in a circumferential direction.

Abstract: A heat treatment apparatus is provided with a reaction tube having a furnace opening formed at a lower end thereof, a lid body configured to hermetically seal the furnace opening of the reaction tube, a heat treatment boat supported on the lid body through a leg, and a rotating shaft extending through the lid body. The rotating shaft is connected to a lower end of the leg and configured to rotate the leg. The lid body is provided with a surrounding ring protruding upward to surround the lower end of the leg. An inert gas is supplied from an inert gas supply unit to a space between the lid body and the rotating shaft and discharged from a space between the lower end of the leg and the surrounding ring into the reaction tube.

Abstract: A method and apparatus for rapid thermal annealing comprising a plurality of lamps affixed to a lid of the chamber that provide at least one wavelength of light, a laser source extending into the chamber, a substrate support positioned within a base of the chamber, an edge ring affixed to the substrate support, and a gas distribution assembly in communication with the lid and the base of the chamber. A method and apparatus for rapid thermal annealing comprising a plurality of lamps comprising regional control of the lamps and a cooling gas distribution system affixed to a lid of the chamber, a heated substrate support with magnetic levitation extending through a base of the chamber, an edge ring affixed to the substrate support, and a gas distribution assembly in communication with the lid and the base of the chamber.

Abstract: A heating module for heating solid matter, such as balls, to a determined temperature. The module includes a heating pot including a crucible for receiving the matter to be heated, and a burner for heating the crucible and the matter to be heated; and a cover that is mounted in removable manner on the heating pot so as to close the crucible.

Abstract: A heat treatment container for a vacuum heat treatment apparatus according to an exemplary embodiment includes a bottom portion and a sidewall, and a support protruding inward.

Abstract: An apparatus and a method of manufacturing direct reduction iron and a reduction firing apparatus. The apparatus has a reduction furnace including a left chamber, a right chamber, a material containing device, a step mechanism, a slag distributing device, a charging device, heating burners, a fume extraction path, a charging device, a material receiving tank and a slag discharging path. The method includes the following steps: distributing and charging the slag in the material containing device; carrying and sending the material containing device through a preheating station, a heating station and a reduction station sequentially. Meanwhile, heating the material to be reduced by a combustion of fuel with the heating burners; discharging the reduced material into the material receiving tank; placing the material device from which the material is discharged into the feeding side of the other chamber, then a next work circulation begins.

Abstract: Provided is a heat treatment container for a vacuum heat treatment apparatus. The heat treatment container includes a bottom and a sidewall. An exhaust passage is defined in an upper portion of the sidewall.

Abstract: Furnace for melting inorganic salts, comprising a container (1), at least one inlet area (2) for solid inorganic salts, at least one outlet area (3) for molten inorganic salts and at least one heat exchanger tube (5) or coil. Each heat exchanger tube (5) includes an inlet section (5a) connected to the outer side wall of the container (1), a spiral section (5b) substantially along the inner side walls of the container (1) defining an internal space (6), with this spiral section (5b) arranged in a substantially horizontal plane, and an outlet section (5c) which is substantially vertical and goes downwards towards the bottom area or upwards towards the top area of the container (1). This furnace provides better safety and performance than previously known furnaces.

Abstract: A method is described for preheating annealing material (4, 5) in a hood-type annealing system, comprising annealing bases (1, 2) which accommodate the annealing material (4, 5) under a protective cover (7) in a protective gas atmosphere, with the annealing material (4) to be subjected to a heat treatment in a protective cover (7) being preheated with the help of a gaseous heat carrier which flows in a cycle around the protective covers (7) on the outside and absorbs heat from annealing material (5) which is already heat-treated in a protective cover (7) and emits it to the annealing material (4) to be preheated in the other protective cover (7).

Abstract: A dental oven comprising a firing chamber for the heat treatment of dental restoration parts. The firing chamber is connected to a negative pressure source via a suction line. A valve arrangement is located between the firing chamber and the suction line with the aid of which the suction line is closable towards the firing chamber in order to maintain a negative pressure in the firing chamber. The suction line between the valve arrangement and the negative pressure source is ventilatable via an ambient air connection.

Abstract: The invention relates to a method for producing a high temperature superconductor (HTSC) from a strip including an upper side precursor layer and which, for continuous sintering of the precursor layer within a furnace in the presence of a fed-in reaction gas, is drawn across a support. A furnace for performing the method is also described.

Abstract: A multi-pipe external-heating coal decomposition equipment, comprising a airtight kiln body; a channel for impelling and decomposing coal is formed in the kiln body, which has a coal inlet, a coal outlet and a collecting pipe for coal decomposition gas; a heat transfer chamber is formed between the channel and inner wall of the kiln body, which is connected with a high temperature gas heating facility and comprises a heated gas outlet. Because the channel for impelling and decomposing coal is set in a kiln body with high temperature, so a vast of heat gas in high temperature kiln body surrounds the channel and its heat conducts and radiates to the pulverized coal in the channel. Thus, the pulverized coal can fully absorb the heat to be heated for decomposing to the gas, coal tar and coal with high heat-value in the channel.

Abstract: The invention discloses a coal decomposition equipment including an airtight kiln body with an inlet and an outlet, wherein a flame gas pipeline heating facility is set in the kiln body and a channel for impelling and decomposing coal is formed between the flame gas pipeline heating facility and an inner wall of the kiln body; and a coal decomposition gas collecting pipe is provided on the kiln body to communicate with the channel. Since the present invention makes the vast thermal conduction produced by the flame gas pipeline heating facility and radiate to the coal power in the coal substance impel decomposition channel. The pulverized coal fully absorbs the heat so as to be heated and decomposed to the gas, coal tar gas and coal with a higher heat-value in the channel.

Abstract: A heating apparatus including: a first heating part and a second heating part between which a substrate having a coating film is disposed at a substrate position in the film thickness direction; and a distance control part which controls at least one of a first distance between the substrate position and the first heating part and a second distance between the substrate position and the second heating part.

Abstract: A method and apparatus for thermal processing of semiconductor substrates is disclosed. Each lamp of a lamp assembly is immersed in a thermally conductive atmosphere comprising oxygen. As the lamps are operated, the oxygen reacts with carbon containing species. Consumed oxygen is replaced over time until the thermal conductivity of the atmosphere falls below a tolerance threshold. The atmosphere is then evacuated and replaced.

Abstract: An apparatus for performing reactive thermal treatment of thin film photovoltaic devices includes a furnace having a tubular body surrounded by heaters and cooling devices. The apparatus includes cooled doors at ends of the furnace separated from a central portion of the furnace by baffles. The cooled doors facilitate increased convection within the furnace and improve temperature uniformity.

Abstract: Provided is a rotary hearth furnace which can stir exhaust gas within a furnace, to efficiently burn flammable gas within the exhaust gas and to efficiently heat an object to be heated, and which can contribute to reduction of specific energy consumption and improvement of productivity. A rotary hearth furnace (1) has therein a series of zone spaces (3) which are divided by vertical walls (2) hanging from a ceiling (1c). Among the zone spaces (3), the zone space to which an exhaust gas duct (4) is attached is constructed as an exhaust zone (3a). An oxygen-containing gas supply unit (5) is provided in the vicinity of the lower edge of the vertical wall (2) which divides the exhaust zone (3a) from the other zone spaces (3). Further, the exhaust gas duct (4) is disposed on the outer periphery side or the inner periphery side from the center of the width of the zone space (3).

Abstract: In a method of making a component for a motor vehicle, a metal part in the form of a plate, semifinished product, or a formed part, is heated in a fluidized bed of a fluidized bed furnace. The fluidized bed is being fluidized by a fluid, e.g. gas. Subsequently; the metal part is subjected to a forming, hardening or aging process.

Abstract: A system and method for reducing warpage of a semiconductor wafer. The system includes a device for securing the semiconductor wafer in a heating area. The device includes a holding mechanism for securing an edge of the semiconductor wafer. The device further includes a pressure reducing device that reduces the pressure underneath the semiconductor device, which further secures the semiconductor device in the heating area. The heating area includes a plurality of heating and cooling zones in which the semiconductor wafer is subjected to various temperatures.

Abstract: A frame supporting a containment chamber, the containment chamber is preferably configured to enclose and confine a process chamber. A heat source module is disposed between the containment chamber and the process chamber, while a thermal regulation cavity is maintained between the heat source module and the process chamber. Preferably, at least one fluid inlet box is in fluidic communication with the thermal regulation cavity, in which the fluid inlet box provides a plate valve that mitigates the flow of fluids from the thermal regulation cavity through the fluid inlet box and to an environment external to the thermal regulation cavity. Additionally, the preferred fluid inlet box further includes a flow adjustment structure interacting with the plate valve to control fluid flow from the environment external to the thermal regulation cavity past the plate valve and into thermal regulation cavity.

Abstract: A method is described for preheating annealing goods in a hood-type annealing installation, comprising two annealing bases (1, 2) which accommodate the annealing goods (3, 4) under a protective cover (7, 8), with the annealing goods (3) to be subjected to a heat treatment under a protective cover (8) being preheated with the help of a gaseous heat carrier which is guided in a cycle between two protective covers (7, 8) and absorbs heat from annealing goods (4) which are heat-treated in a protective cover (7) and emits it to the annealing goods (3) to be preheated in the other protective cover (8). In order to avoid contaminations of the heat-treated annealing goods (4) it is proposed that the heat carrier flow guided in a cycle flows around the two protective covers (7, 8) on the outside, whereas a protective gas is circulated within the protective covers (7, 8).

Abstract: An electric wire comprises a non-oxidized conductor of copper alloy having no outer coating and in direct contact with a PTFE-based sheath. It is fabricated as follows: providing a copper alloy conductor without an outer coating; forming a sheath of a PTFE-based material around the conductor; and heating the wire in order to evaporate the lubricant and sinter the sheath. In order to avoid oxidizing the copper during the heating step, the wire is heated mainly in an atmosphere having a low oxygen content. The lubricant evaporation and/or sintering line for stabilizing the sheath of the electric wire comprises one or more ovens, each having an enclosure in which an atmosphere having a low oxygen content is maintained.

Abstract: A convection oven with laminar airflow and/or moisture injection. A radial airflow fan is used to provide a circulating airflow that is substantially even and substantially turbulence free. The circulating airflow is provided to an oven chamber via a plurality of egress ports that rim a divider wall disposed between the oven chamber and a fan chamber. The airflow interleaves with a plurality of pans in the oven chamber to provide a laminar airflow. Moisture is injected into the circulating airflow either upstream of the fan or by flashing water onto the hot blades of the fan from either the low pressure side or the high pressure side of the fan.

Abstract: Reactor vessels with transmissive surfaces for producing hydrogen-based fuels and structural elements, and associated systems and methods. A chemical reactor in accordance with a particular embodiment includes a reactor vessel having a reaction zone, a hydrogen donor source coupled in fluid communication with the reaction zone, and a steam source coupled in fluid communication with the reaction zone. The reactor further includes a transmissive surface at the reaction zone, with the transmissive surface being transmissive to a reactant entering the reaction zone and/or radiant energy entering the reaction zone.

Abstract: The invention relates to a method for producing a high temperature superconductor (HTSC) from a strip including an upper side precursor layer and which, for continuous sintering of the precursor layer within a furnace in the presence of a fed-in reaction gas, is drawn across a support. A furnace for performing the method is also described.

Abstract: There is provided a sintering furnace for a ceramic product and a sintering method using the same. A sintering furnace for a ceramic product according to an aspect of the invention may include: a furnace body having an insulating material provided therein; at least one setter arranged in the furnace body and having a ceramic molded product loaded on an upper side thereof; a heater supplying heat to the ceramic molded product; and a gas supply device disposed under the setter or around the heater so that a uniform temperature gradient is maintained inside the furnace body. According to an aspect of the invention, there is provided a sintering furnace for a ceramic product and a sintering method using the same that can prevent changes in the characteristics of a ceramic product by a temperature gradient during sintering by reducing temperature variations inside a sintering furnace.

Abstract: A frame supporting a containment chamber, the containment chamber is preferably configured to enclose and confine a process chamber. A heat source module is disposed between the containment chamber and the process chamber, while a thermal regulation cavity is maintained between the heat source module and the process chamber. Preferably, at least one fluid inlet box is in fluidic communication with the thermal regulation cavity, in which the fluid inlet box provides a plate valve that mitigates the flow of fluids from the thermal regulation cavity through the fluid inlet box and to an environment external to the thermal regulation cavity. Additionally, the preferred fluid inlet box further includes a flow adjustment structure interacting with the plate valve to control fluid flow from the environment external to the thermal regulation cavity past the plate valve and into thermal regulation cavity.

Abstract: The present invention has an object to provide burning equipment that can prevent uneven burning and increase productivity. The burning equipment of the present invention includes: a furnace body (13) having an inner space in which a powdery or granular subject to be treated (11) is burned; a gas ejection portion (21) having an opening for ejecting an atmospheric gas from above the subject to be treated (11) which is conveyed in the inner space of the furnace body (13); a gas supply portion (18) for supplying the atmospheric gas from a side wall (13c) of the furnace body (13) to the gas ejection portion (21); and a heating portion (24a, 24b) for controlling temperature distribution in the inner space of the furnace body (13).

Abstract: A microwave heating system comprises a microwave applicator cavity; a microwave power supply to deliver power to the applicator cavity; a dielectric support to support a generally planar workpiece; a dielectric gas manifold to supply a controlled flow of inert gas proximate to the periphery of the workpiece to provide differential cooling to the edge relative to the center; a first temperature measuring device configured to measure the temperature near the center of the workpiece; and, a second temperature measuring device configured to measure the temperature near the edge of the workpiece. The gas flow is controlled to minimize the temperature difference from center to edge, and may be recipe driven or controlled in real time, based on the two temperature measurements. The method is particularly useful for monolithic semiconductor wafers, various semiconducting films on substrates, and dielectric films on semiconducting wafers.

Abstract: Provided is a heat treatment apparatus in which a large-sized substrate can be rapidly heated and rapidly cooled with high uniformity, and a heat treatment method using the heat treatment apparatus. The heat treatment apparatus includes: a first chamber of which one side is opened; a second chamber of which one side is opened; a device for moving the first and the second chambers; a heating device; a gas introduction port; a gas exhaust port; and a jig for longitudinally fixing a substrate, in which the substrate is rapidly heated while the first and the second chambers are connected, and rapidly cooled by separating the chambers to move the substrate away from a heat storage portion of the heating device or the like. Further, the heat treatment method includes the heat treatment apparatus, and a method for manufacturing a semiconductor device using an oxide semiconductor is included.

Abstract: There is provided a stage structure which can prevent the formation of a cool spot in the central portion of a stage, thereby preventing breakage of the stage, and can enhance the in-plane uniformity of heat treatment of a processing object. The stage structure, provided in a treatment container of a heat treatment apparatus, for placing thereon a semiconductor wafer W as a processing object to be heat treated, includes: a stage 52 for placing the processing object on it; and a cylindrical support post 54 jointed to the center of the lower surface of the stage and supporting the stage. A heat reflecting section 56 is provided at an upper position within the support post and close to the lower surface of the stage. The use of the heat reflecting section 56 prevents the formation of a cool spot in the central portion of the stage 54.

Abstract: The invention relates to a method for producing a high temperature superconductor (HTSC) from a strip including an upper side precursor layer and which, for continuous sintering of the precursor layer within a furnace in the presence of a fed-in reaction gas, is drawn across a support. A furnace for performing the method is also described.