With Nonsiliceous Abradant Patents (Class 451/39)
  • Patent number: 7163449
    Abstract: A hand held abrasive blaster includes a tubular wand housing and an abrasives conduit which extends into the wand housing. The abrasives conduit includes a fixed portion at the rearward end and a rotatable portion at the forward end. A motor rotates the rotatable portion. A pair of spaced apart handles on the exterior surface of the wand housing. The handles are positioned along the exterior of the wand housing at a center of gravity for the wand housing.
    Type: Grant
    Filed: June 24, 2005
    Date of Patent: January 16, 2007
    Assignee: High Production Inc.
    Inventor: Jamie Davis
  • Patent number: 7159425
    Abstract: The shot peening method and apparatus (FIG. 13) of the present invention utilizes control of the shot peening coverage to provide higher surface compression and comparable depth of compression to conventional 100% coverage peening but with reduced cold working providing improved thermal stability and reduction in shot peening time and cost. A preferred embodiment of this invention employs x-ray diffraction (FIG. 13) residual stress and percent cold work determinated by line broadening to establish the optimal degree of coverage for a given material and shot peening intensity.
    Type: Grant
    Filed: September 17, 2004
    Date of Patent: January 9, 2007
    Inventors: Paul S. Prevey, John T. Cammett
  • Patent number: 7134941
    Abstract: A method of plasma assisted CO2 cleaning for dry removal of residual photoresist and sidewall polymer with an etch gas mixture comprising fluorine containing gas, oxygen and hydrogen in N2 or H2O. The process removes polymer residues present on a metal layer on a substrate and on the sidewalls of metal lines and inhibits chlorine-based corrosion while being very selective to exposed Ti, TiN, Al and SiO2. The invention is particularly suited for removing post metal etch polymer residue from top and sidewall of metal lines.
    Type: Grant
    Filed: January 28, 2005
    Date of Patent: November 14, 2006
    Assignee: Nanoclean Technologies, Inc.
    Inventors: Mohamed Boumerzoug, Adel George Tannous
  • Patent number: 7131303
    Abstract: The portion of an orthopaedic implant to which soft tissue adherence is desired is treated by shot peening using microbead having a diameter in the range of about 10 microns–300 microns. This treatment causes indentations on the surface of the implant of about 10 microns to about 50 microns to provide a fine, shallow texturing of the implant that permits the soft tissue to adhere, but is not rough enough that it will interlock with hard tissue.
    Type: Grant
    Filed: November 16, 2005
    Date of Patent: November 7, 2006
    Assignee: Electronics, Inc.
    Inventor: Jack Champaigne
  • Patent number: 7112120
    Abstract: A particle blast system includes a feeder assembly having a rotor with a plurality of pockets formed in the peripheral surface. The transport gas flowpath includes the pockets, such that substantially all transport gas flows through the pockets. The seal adjacent the peripheral surface is actuated by the transport gas pressure to urge its sealing surface against the rotor's peripheral surface. At start up, there is no substantial pressure between the seal and the rotor, reducing start up torque requirements.
    Type: Grant
    Filed: April 17, 2002
    Date of Patent: September 26, 2006
    Assignee: Cold Jet LLC
    Inventors: Michael E. Rivir, Daniel Mallaley, Richard J. Broecker, R. Kevin Dressman, Kevin P. Alford
  • Patent number: 7101260
    Abstract: A method for manufacturing an article where the article has polymeric residue that is to be removed during the manufacture of the article. The article is introduced into a controlled environment of a processing tool that has at least first and second processing chambers. Free radicals are generated from one or more reactant gases and introduced into at least the first processing chamber where they react with the polymeric residue. A cryogenic cleaning medium is supplied into the second processing chamber where it removes the polymeric residue present after the free radicals react with the polymeric residue. The reactant gases are selected to facilitate removal of the polymeric residue with the cryogenic cleaning medium The first and second processing chambers may be dedicated to plasma processing or cryogenic processing or each may provide both plasma processing and cryogenic processing.
    Type: Grant
    Filed: January 28, 2005
    Date of Patent: September 5, 2006
    Assignee: Nanoclean Technologies, Inc.
    Inventors: Adel George Tannous, Khalid Makhamreh
  • Patent number: 7094476
    Abstract: There is provided a surface treated product that moves relatively in a fluid, wherein a surface of the surface treated product has continuous dimples, each dimple having a diameter of 10 to 2500 ?m and a depth of 50 ?m or less. The surface treated product significantly reduces resistance of a fluid to an object in the fluid, and significantly improves a flow state of the fluid.
    Type: Grant
    Filed: June 26, 2003
    Date of Patent: August 22, 2006
    Assignee: Asahi Tec Corporation
    Inventors: Shiro Kawashima, Hiromi Akihori, Matuo Suzuki, Hidekatu Hirahara, Aturo Yamamoto, Katuya Kawamori
  • Patent number: 7056193
    Abstract: The present invention includes a method of producing a planar display device by application of the method. The fine partition walls are formed on the surface of a second substrate that constitutes a second panel by jet processing using an abrasive comprised of a powder of calcium carbonate coated with silicone on the surfaces thereof. Each of the particles constituting the abrasive has a three-dimensional shape comprised of a stack of different-sized triangular or more-angular polygonal layers. The maximum particle diameter of the abrasive is not more than ½ times the width of the fine partition walls, and the mean particle diameter of the abrasive is not more than ? times the width of the fine partition walls.
    Type: Grant
    Filed: March 28, 2005
    Date of Patent: June 6, 2006
    Assignee: Sony Corporation
    Inventors: Eitaro Yoshikawa, Hiroshi Mori, Tomohiro Kimura, Hidehiro Kawaguchi
  • Patent number: 7040961
    Abstract: A plasma assisted cryogenic cleaner for and a method of performing cleaning of a surface that must be substantially free of contaminants has a resiliently mounted nozzle for spraying a cryogenic cleaning medium on the surface. The cleaning is conducted by applying to the substrate surface a mixture of gases selected from the group consisting of oxygen, nitrogen, hydrogen, fluorine, hydrofluorocarbon or a mixture of such gases to both remove the photoresist layer and alter the composition of the residues such that the residues are soluble in water and/or have a weakened bonds that they can be removed with a stream of cryogenic medium. The cryogenic and plasma processes can be performed sequentially or simultaneously.
    Type: Grant
    Filed: July 19, 2004
    Date of Patent: May 9, 2006
    Assignee: Nanoclean Technologies, Inc.
    Inventors: Mohamed Boumerzoug, Adel George Tannous, Khalid Makhamreh
  • Patent number: 7040959
    Abstract: An abrasive jet apparatus is provided which includes an abrasive dispenser defining a compartment for storing a granular abrasive material and at least one metering orifice disposed in open communication therewith for dispensing the granular abrasive material. The apparatus also includes a shutter assembly disposed adjacent the metering orifice, which includes a shutter member angularly displaceable between first and second positions relative to the metering orifice. The shutter member has formed therethrough at least one shutter opening which in the first position is substantially fully aligned with the metering orifice, and in the second position is substantially fully offset therefrom. The apparatus further includes a position actuator operatively coupled to the shutter mechanism for reversibly displacing the shutter member to the first and second positions and a plurality of intermediate positions therebetween for occluding a selective portion of the metering orifice.
    Type: Grant
    Filed: January 19, 2005
    Date of Patent: May 9, 2006
    Assignee: Illumina, Inc.
    Inventors: Brian R. Panuska, Joseph Hammer, Ronald Hammer, Wesley Bachman
  • Patent number: 7040962
    Abstract: An ice blasting apparatus comprises: an ice making device operating a cutting blade to shave off ice freezing on an inner wall of the freezing casing and continuously discharges the shaved ice as flake-shaped ice pellets; an ice mixing tank mixing the ice pellets and water and maintaining the resulting ice slurry at a predetermined concentration with a concentration sensor; and a blast gun blasting the ice slurry. A trimming method is performed on a film insert molding with a film material adhering to a face of a resin molding and extending beyond a periphery edge of the resin molding. A blast gun facing the face with the film adhering to it blasts ice slurry of a required concentration toward the vicinity of the periphery edge of the resin molding to remove the unnecessary portion of the film material extending beyond the periphery edge of the resin molding.
    Type: Grant
    Filed: November 12, 2004
    Date of Patent: May 9, 2006
    Assignee: Fuji Seiki Machine Works, Ltd.
    Inventors: Shinichi Makino, Naokatsu Kojima
  • Patent number: 6991515
    Abstract: A ultra fine particle film forming apparatus is provided which is capable of forming a ultra fine particle film which has ultra fine particles sufficiently bonded together, sufficient density, flat surface and uniform density. A planarized ultra fine particle film forming method for forming a planarized ultra fine particle film from a deposited film of ultra fine particles formed by supplying the ultra fine particles to a substrate, the method comprising one or more of a planarizing step of planarizing a surface of the deposited film of the ultra fine particles supplied to the substrate.
    Type: Grant
    Filed: October 20, 2003
    Date of Patent: January 31, 2006
    Assignee: Secretary of Agency of Industrial Science and Technology
    Inventor: Jun Akedo
  • Patent number: 6981906
    Abstract: A method for milling grooves in a work-piece includes using a manipulator to control impingement angles of abrasive fluidjets traversed across the work-piece. Another method employs multiple fluidjets simultaneously with a plurality of impingement angles. An apparatus is also provided to allow for the simultaneous use of multiple abrasive fluidjets with a plurality of impingement angles.
    Type: Grant
    Filed: June 23, 2003
    Date of Patent: January 3, 2006
    Assignees: Flow International Corporation, The C. A. Lawton Co.
    Inventors: Mohamed A. Hashish, Steven J. Craigen, Timothy J. Ennis, Thomas E. Nettekoven, Michael W. Van Laanen
  • Patent number: 6969303
    Abstract: A method for removing a coating on a surface by applying a treatment composition layer to the coating to be removed. The treatment composition layer is made up of (Is) a first material selected from the compounds of sodium and potassium silicates, sodium and potassium phosphate, calcium silicate, iron and aluminum sulfates. An abrasive is injected against the coating to be removed so that the treatment composition layer and coat to be removed are removed and any hazardous material in the layer to be removed is contained.
    Type: Grant
    Filed: April 18, 2000
    Date of Patent: November 29, 2005
    Assignee: Nextec, Inc.
    Inventors: Thomas C. Rolle, James C. Wachtel, Gary L. Tinklenberg
  • Patent number: 6960118
    Abstract: Disclosed are a method of causing abrasive grains to collide against and contact with an object being treated to form surfaces of the object being treated into a matte, specifically, a rotational magnetic field is applied on magnetic abrasive grains to cause the same to vibratingly move at random to collide against and contact with an object being treated to obtain a matte.
    Type: Grant
    Filed: December 2, 2002
    Date of Patent: November 1, 2005
    Inventor: Motohisa Aoki
  • Patent number: 6960119
    Abstract: A method and system for deflashing mold compound is provided. In one embodiment, a method for dislodging contaminants from an integrated circuit includes directing sublimating particles against a surface of the integrated circuit. Contaminants disposed on the surface of the integrated circuit are abraded with the sublimating particles to dislodge at least a portion of the contaminants.
    Type: Grant
    Filed: May 13, 2004
    Date of Patent: November 1, 2005
    Assignee: Texas Instruments Incorporated
    Inventor: Mohd Hanafi Mohd Said
  • Patent number: 6945853
    Abstract: A cryogenic cleaner for and a method of performing cleaning of a surface that must be substantially free of contaminants utilizing a multi-stage, multi-mode filtered carbon dioxide-containing cleaning medium. Multiple stages and multiple types of filtration/purification are provided to remove contaminants such as hydrocarbons from the medium. In accordance with preferred embodiments, a filtering/purification process is provided that desirably utilizes one or more of: condensation of the hydrocarbon; particulate filtration; chemical filtration using activated filters; and catalytic oxidation. In certain embodiments, a resiliently mounted nozzle is provided for spraying a cryogenic cleaning medium on the surface. The nozzle may be driven in an oscillatory manner at a predetermined amplitude and frequency so the nozzle spray is delivered in a manner to provide pulsing of the spray and to provide as “snow plow” effect on contaminants as the spray delivers the cleaning medium against the surface.
    Type: Grant
    Filed: April 7, 2004
    Date of Patent: September 20, 2005
    Assignee: Nanoclean Technologies, Inc.
    Inventors: Goodarz Ahmadi, Paul E. Lewis, Adel George Tannous, Khalid Makhamreh
  • Patent number: 6938448
    Abstract: A panel, such as is intended for an aircraft wing panel, has continuous ribs extending on one surface. The panel is formed, or given a dihedral bend, by shot peening the ribs at a V-shaped section to expand the V-shaped sections and thus deform the panel. A strong formed panel is thus provided with continuous ribs. Further shot peening steps can be carried out on the panel for further shaping.
    Type: Grant
    Filed: September 5, 2001
    Date of Patent: September 6, 2005
    Assignee: Sonaca NMF Canada Inc.
    Inventors: Steven Kennerknecht, David Cook
  • Patent number: 6935927
    Abstract: A method of a blast process for a junction part between a large-diameter main bore tubularly drilled through an article and a small-diameter branch bore branching off at an angle from the main bore inside the article. A pillar-shaped rod is inserted from a first open end of the main bore to a point close to the junction part before a leading end of the rod blocks the branch bore. A wet slurry made of a mixture of abrasives and water is jetted from a second open end of the main bore into the main bore by use of a squirt gun. The blast of wet slurry is collided with the leading end of the rod and redirected toward the branch bore to drive the abrasives against the junction part located inside the article for removal of burrs therefrom the junction part.
    Type: Grant
    Filed: May 20, 2003
    Date of Patent: August 30, 2005
    Assignee: Fuji Seiki Machine Works Ltd.
    Inventor: Hirotaka Ashizawa
  • Patent number: 6931900
    Abstract: The invention relates to a method for the production of a high-pressure fuel accumulator of an internal engine fitted with an accumulator injection system, wherein a metal hollow pressure accumulator is produced, branches are subsequently made therein for the connection of pressure lines, said branches being respectively provided with a radius on the inner edges thereof leading to a cavity of the pressure accumulator by means of a shot blasting method and a cylindrical lance having a conical tip with a smaller diameter than that of the cavity of the pressure accumulator is guided counter to the direction of the blasting of the balls used for blasting according to said shot blasting method. According to the invention, each inner edge is blasted successively in both directions in which the cavity of the pressure accumulator extends and the lance is respectively guided in an opposite direction.
    Type: Grant
    Filed: March 5, 2004
    Date of Patent: August 23, 2005
    Assignee: Siemens Aktiengesellschaft
    Inventor: Christian Taudt
  • Patent number: 6910937
    Abstract: A method of forming fine partition walls by which fine partition walls with stable shape can be formed with good processing accuracy and at good grinding efficiency by a jet processing technique, a method of producing a planar display device by application of the method, and an abrasive for jet processing to be used in these methods, are disclosed. The fine partition walls are formed on the surface of a substrate by jet processing using an abrasive comprised of a powder of calcium carbonate coated with silicone on the surfaces thereof. Each of the particles constituting the abrasive has a three-dimensional shape comprised of a stack of different-sized triangular or more-angular polygonal layers.
    Type: Grant
    Filed: July 17, 2002
    Date of Patent: June 28, 2005
    Assignee: Sony Corporation
    Inventors: Eitaro Yoshikawa, Hiroshi Mori, Tomohiro Kimura, Hidehiro Kawaguchi
  • Patent number: 6908365
    Abstract: A gentle acting blast media comprising glass-like polysaccharide grit suspended in a compressible carrier component.
    Type: Grant
    Filed: March 31, 2003
    Date of Patent: June 21, 2005
    Assignee: Archer Daniels Midland Company
    Inventors: Cameron Drake, Denis Monette, George Koutlakis
  • Patent number: 6884386
    Abstract: When a sintered body of ceramic is shot-blasted at normal temperatures to plastically deform the crystal structure of the shot-blasted surface to apply residual stress and is heat-treated to recrystallize fine cracks, dislocated cells in the grain boundary are formed, crystals are finely divided, and the fracture toughness is significantly improved. When the sintered body of ceramic is a thin product, an effective toughening can be attained by shot blasting both the front and back sides. After heat treatment, mechanical strength is significantly improved by removing a part of the modified surface layer by an abrasion treatment.
    Type: Grant
    Filed: September 20, 2001
    Date of Patent: April 26, 2005
    Assignees: Sintokogio, Ltd., Sinto V-Cerax, Ltd.
    Inventors: Hiroyasu Saka, Syoji Uchimura, Hideki Morimitsu
  • Patent number: 6878041
    Abstract: A metallic layer is cooled below room temperature, leading to an embrittlement. Subsequently, the metallic layer is stripped by performing a blasting process having a high efficiency because of the brittleness. Additionally, the substrate is prevented from being damaged by using a comparatively low blasting energy.
    Type: Grant
    Filed: December 23, 2002
    Date of Patent: April 12, 2005
    Assignee: Siemens Aktiengesellschaft
    Inventors: Winfried Esser, Ralph Reiche
  • Patent number: 6869890
    Abstract: A processing apparatus is used for processing a workpiece such as a semiconductor wafer. The processing apparatus comprises a cover for covering a portion of a surface, to be processed, of a workpiece, a process chamber formed by the cover and the surface, to be processed, of the workpiece, and a sealing portion provided between the cover and the surface of the workpiece for sealing the process chamber.
    Type: Grant
    Filed: January 3, 2002
    Date of Patent: March 22, 2005
    Assignee: Ebara Corporation
    Inventors: Nobuharu Noji, Hiroshi Sobukawa, Masami Nagayama, Koji Ono, Mutsumi Saito
  • Patent number: 6869334
    Abstract: The invention relates to a process for producing a hard-material-coated component, comprising the following steps: application of a layer of hard material to the component in a PVD coating unit; and structural further processing of the outer surface of the layer of hard material, and to a component produced using the process. Particularly in the case of thick coatings or coatings with a columnar structure, such processes have a problem producing a sufficiently smooth surface on the coating. The problem is solved by the fact that for the structural further processing, the surface of the layer is blasted in a blasting device in order to improve this surface, an inorganic blasting agent with a grain size in the range from 1 ?m to 100 ?m and a sharp-edged grain shape being used.
    Type: Grant
    Filed: May 29, 2000
    Date of Patent: March 22, 2005
    Assignee: Cemecon-Ceramic Metal Coatings-Dr. Ing. Antonius Leyendecker GmbH
    Inventors: Antonius Leyendecker, Hans-Gerd Fuss, Rainer Wenke, Georg Erkens, Stefan Esser, Ingo KĂĽnzel
  • Patent number: 6863594
    Abstract: A cleaning method and a corresponding cleaning device offer adequate protection to individuals, devices and installations, for cleaning component parts of installations that carry an electrical high-voltage and which are not disconnected during cleaning. Towards this end, the component parts to be cleaned are subjected to the action of a two-phase particle stream (PS) consisting of a compressed gas (DGA) serving as a carrier medium and of carbon dioxide ice particles (TP) carried therein. Possible superficial accumulations of dirt are removed from the component parts by way of low-temperature embrittlement and by the kinetic energy of the impacting carbon dioxide particles. The carbon dioxide ice particles themselves sublimate without leaving residues.
    Type: Grant
    Filed: March 15, 2001
    Date of Patent: March 8, 2005
    Inventor: Paul-Eric Preising
  • Patent number: 6852020
    Abstract: A polishing pad for use in chemical mechanical polishing of substrates that being made of a porous structure comprising a matrix consisting of fibers, such as cotton linter cellulose bound with a thermoset resin, such as phenolic resin. The polishing pad surface has voids in which polishing slurry flows during chemical mechanical polishing of substrates, and in which debris formed during the chemical-mechanical polishing of substrates is temporarily stored for subsequent rinsing away. The polishing surface of the pad is ground to form asperities that aid in slurry transport and polishing, as well as opening the porous structure of the pad. The porous pad contains nanometer-sized filler-particles that reinforce the structure, imparting an increased resistance to wear as compared to prior-art pads. Also disclosed is a method of making the polishing pad.
    Type: Grant
    Filed: January 22, 2003
    Date of Patent: February 8, 2005
    Assignee: Raytech Innovative Solutions, Inc.
    Inventors: Angela Petroski, Richard D. Cooper, Paul Fathauer, Marc Andrew Yesnik
  • Patent number: 6852011
    Abstract: In a method of cleaning metal surfaces to be welded together, at least one jet carrying particles of solid carbon dioxide is caused to come into contact with the surfaces, where the solid carbon dioxide is allowed to sublime at the surfaces. The jet is formed by passing a stream of pressurised liquid carbon dioxide through a nozzle under pressure.
    Type: Grant
    Filed: December 3, 2002
    Date of Patent: February 8, 2005
    Assignee: The BOC Group, plc
    Inventors: Jacek Tadeusz Gabzdyl, Walter Mark Veldsman
  • Patent number: 6848973
    Abstract: The invention relates to a method for blast cleaning using ilmenite tailings particles between 10 mesh and 250 mesh as impact abrasive material. Ilmenite tailing particles are a waste product obtained in a beneficiation plant of an ilmenite ore (FeTiO3) metallurgical complex. The particles are preferably washed, dried, and screened before being used as impact abrasive material. They are separated in particle-size range to improve their efficiency for blast cleaning.
    Type: Grant
    Filed: March 13, 2003
    Date of Patent: February 1, 2005
    Assignee: Sable des Forgens
    Inventor: Serge Bellemare
  • Patent number: 6837085
    Abstract: The invention concerns a method for transverse ultrasound peening of blades (2) on a rotor which consists in driving in rotation the wheel (3) bearing the blades (2) about its geometrical axis (6) arranged substantially vertically and in causing the blades (2) to pass through a mist of microbeads produced by a vibrating surface (20) in an active chamber (12) arranged laterally relative to the wheel. The active surface (20) is located beneath the path of the blades (2). Preferably, the active chamber (12) comprises a second vibrating surface above the path of the blades (2). The invention also concerns a machine for implementing said method.
    Type: Grant
    Filed: September 20, 2001
    Date of Patent: January 4, 2005
    Assignee: SNECMA Moteurs
    Inventors: Benoit Jean Henri Berthelet, GĂ©rard Michel Roland Gueldry, Claude Marcel Mons, Marie-Christine Ntsama-Etoundi
  • Patent number: 6817927
    Abstract: This invention relates generally to methods for removing adherent materials, for example, paint, flashes, burrs, photoresists, contaminants, and other materials from various external surfaces. In particular, the method employs an improved media comprising core/shell particles. The media can be propelled against or along the surface by a gaseous or liquid carrier medium or a mixture of gas and liquid to remove the unwanted surface material. In one embodiment, suitable blasting equipment propels the media, via a pressurized air stream, against a surface of an object, for example an airplane skin, to dislodge the material to be removed.
    Type: Grant
    Filed: October 19, 2001
    Date of Patent: November 16, 2004
    Assignee: Eastman Kodak Company
    Inventors: Dennis E. Smith, Christopher J. Puccini, David W. Gruszczynski
  • Patent number: 6783433
    Abstract: A polishing-washing method includes the steps of providing a polishing media containing a fine powder of an RB ceramic and/or CRB ceramic and bringing a medium stream containing the polishing media into contact with the surfaces of a body to be worked. In this method, the polishing media solution obtained after the polishing-washing can be re-used by recycling after simply separating the particles of metal oxides and the particles of removed burrs and cutting metal chips from the solution composition by utilizing a difference in specific gravity.
    Type: Grant
    Filed: April 18, 2002
    Date of Patent: August 31, 2004
    Assignee: Minebea Co., Ltd.
    Inventors: Kazuo Hokkirigawa, Motoharu Akiyama, Noriyuki Yoshimura
  • Publication number: 20040162009
    Abstract: A process and apparatus for surface treating boundary walls of an interior chamber formed in a workpiece. Nozzle members are inserted through access openings which communicate with opposite sides of the interior chamber and are positioned so that discharge openings of the nozzle members are disposed in closely adjacent and directly opposed relationship. High velocity streams of carrier fluid having entrained solid abrasive media therein are simultaneously discharged from the nozzle members so that the opposed streams directly violently impact and are deflected radially outwardly for impact against the surrounding boundary walls. The opposed nozzle members are preferably simultaneously synchronously moved lengthwise of the chamber to effect treating of the boundary walls.
    Type: Application
    Filed: February 19, 2004
    Publication date: August 19, 2004
    Applicant: Roto-Finish Company, Inc.
    Inventor: Steven J. Carpenter
  • Patent number: 6764385
    Abstract: A plasma assisted cryogenic cleaner for and a method of performing cleaning of a surface that must be substantially free of contaminants has a resiliently mounted nozzle for spraying a cryogenic cleaning medium on the surface. The cleaning is conducted by applying to the substrate surface a mixture of gases selected from the group consisting of oxygen, nitrogen, hydrogen, fluorine, hydrofluorocarbon or a mixture of such gases to both remove the photoresist layer and alter the composition of the residues such that the residues are soluble in water and/or have a weakened bonds that they can be removed with a stream of cryogenic medium. The cryogenic and plasma processes can be performed sequentially or simultaneously.
    Type: Grant
    Filed: July 29, 2002
    Date of Patent: July 20, 2004
    Assignee: NanoClean Technologies, Inc.
    Inventors: Mohamed Boumerzoug, Adel George Tannous, Khalid Makhamreh
  • Patent number: 6764386
    Abstract: Apparatus for processing a surface of a substrate includes a chamber containing a cavity that has one side that is open, the chamber wall including a lip surrounding the open side of the cavity. Gas ports, disposed within the chamber wall and opening through the lip, emit a pressurized gas so as to create a gas cushion between the lip and the surface when the open side of the cavity is placed adjacent to the surface, thus creating a seal between the cavity and an environment external to the chamber.
    Type: Grant
    Filed: July 30, 2002
    Date of Patent: July 20, 2004
    Assignee: Applied Materials, Inc.
    Inventor: Yoram Uziel
  • Patent number: 6739956
    Abstract: An apparatus for cleaning a passage in an engine block, such as the oil galley and oil galley legs, in which the passage includes an inlet and an outlet end. The apparatus includes a fixture having an interior passageway with an opening. The fixture is dimensioned to abut against the engine block so that the opening in the fixture registers with the engine block passage outlet. An air induction source is then fluidly connected to the fixture passageway so that, upon actuation of the air induction source, the air induction source inducts air through the engine block passage, through the fixture opening, and through the fixture passageway. A feeder containing abrasive shot is then coupled to the engine block passage inlet so that, upon actuation of the air induction source, the abrasive shot is inducted through the engine block passage and into the fixture passageway.
    Type: Grant
    Filed: October 30, 2001
    Date of Patent: May 25, 2004
    Assignee: Valiant Corporation
    Inventor: Andrew Noestheden
  • Patent number: 6726536
    Abstract: A gentle acting blast media comprising glass-like polysaccharide grit suspended in a compressible carrier component.
    Type: Grant
    Filed: May 17, 2001
    Date of Patent: April 27, 2004
    Assignee: Archer-Daniels-Midland Company
    Inventors: Cameron Drake, Denis Monette, George Koutlakis
  • Patent number: 6719612
    Abstract: A blast cabinet (10) for ice blasting an article, the cabinet comprising a housing (11) having an interior support (19) for supporting the article. At least one ice blast nozzle (80) is disposed inside the housing and operable to direct a high speed stream of ice particles towards the article. In an embodiment the ice blast nozzle(s) is mounted on a articulated mount (82) wherein the nozzle can be articulated. An energy management system (30, 130) comprising a heating system is provided to facilitate the removal of spent ice particles, and prevent ice accumulation in the enclosure. In an embodiment of the blast cabinet, the energy management system (130) includes a piping assembly (36) a heat exchanger (37) both disposed in the housing.
    Type: Grant
    Filed: May 14, 2001
    Date of Patent: April 13, 2004
    Assignee: Universal Ice Blast, Inc.
    Inventors: Sam Visaisouk, Norman W. Fisher
  • Patent number: 6719613
    Abstract: A cryogenic cleaner for and a method of performing cleaning of a surface that must be substantially free of contaminants utilizing a multi-stage, multi-mode filtered carbon dioxide-containing cleaning medium. Multiple stages and multiple types of filtration/purification are provided to remove contaminants such as hydrocarbons from the medium. In accordance with preferred embodiments, a filtering/purification process is provided that desirably utilizes one or more of: condensation of the hydrocarbon; particulate filtration; chemical filtration using activated filters; and catalytic oxidation. In certain embodiments, a resiliently mounted nozzle is provided for spraying a cryogenic cleaning medium on the surface. The nozzle may be driven in an oscillatory manner at a predetermined amplitude and frequency so the nozzle spray is delivered in a manner to provide pulsing of the spray and to provide as “snow plow” effect on contaminants as the spray delivers the cleaning medium against the surface.
    Type: Grant
    Filed: February 7, 2003
    Date of Patent: April 13, 2004
    Assignee: NanoClean Technologies, Inc.
    Inventors: Goodarz Ahmadi, Paul E. Lewis, Adel George Tannous, Khalid Makhamreh, Keith H. Compton
  • Patent number: 6716364
    Abstract: A method of detecting presence of a polishing slurry on a semiconductor wafer subsequent to polishing of the wafer includes the step of adding a chemical marker to the polishing slurry. The method also includes the step of polishing a first side of the wafer in order to remove material from the wafer. In addition, the method includes the step of applying the polishing slurry to the first side of the wafer during the polishing step. Moreover, the method includes the step of ceasing the polishing step when the wafer has been polished to a predetermined level. Yet further, the method includes the step of directing incident electromagnetic radiation onto the wafer subsequent to the ceasing step. The method also includes the step of detecting a physical characteristic of resultant electromagnetic radiation which is produced in response to the incident electromagnetic radiation being directed onto the wafer.
    Type: Grant
    Filed: December 10, 2001
    Date of Patent: April 6, 2004
    Assignee: LSI Logic Corporation
    Inventors: Newell E. Chiesl, III, Gregory L. Burns, Theodore C. Moore
  • Publication number: 20040048562
    Abstract: This invention describes improved polishing pads useful in the manufacture of semiconductor devices or the like. The pads of the present invention have an advantageous hydrophilic polishing material and have an innovative surface topography and texture which generally improves predictability and polishing performance.
    Type: Application
    Filed: September 11, 2003
    Publication date: March 11, 2004
    Inventors: John V.H. Roberts, David B. James, Lee Melbourne Cook
  • Patent number: 6695685
    Abstract: A dry ice blasting system adapted for low gas flow rates at low pressures with small dry ice particles to produce a very small footprint on a surface being cleaned.
    Type: Grant
    Filed: October 12, 2001
    Date of Patent: February 24, 2004
    Assignee: CAE Alpheus, Inc.
    Inventors: Scott M. Stratford, Robert S. Anderson
  • Patent number: 6695679
    Abstract: Apparatus and method to establish permissible ranges of the gas/dry ice ratio in a dry ice blasting stream. Logic and circuitry determine whether a proposed ratio is permissible. If it is, it enables the process to start. If it is not, it forbids operation of the process.
    Type: Grant
    Filed: October 15, 2001
    Date of Patent: February 24, 2004
    Assignee: CAE Alpheus, Inc.
    Inventors: Robert S. Anderson, Scott M. Stafford
  • Patent number: 6694789
    Abstract: A system for shot peening that includes an enclosure in which are provided a workpiece W to be shot peened and a nozzle for projecting the shot particles. A memory stores data for maximizing the anticipated shot-peening intensity at the workpiece based on the predetermined conditions of the shot peening. Then a calculating circuitry determines the conditions of the shot peening to be carried out in the system to maximize an anticipated shot-peening intensity at the workpiece based on the stored data from the memory and the selected type of the shot-peening process to be applied to the workpiece before the shot particles have been actually projected. The nozzle is then actuated under the determined conditions such that it projects the shot particles and directs them onto the workpiece. The shot-peening intensity of the actually projected shot particles at the workpiece is measured by a measuring device.
    Type: Grant
    Filed: April 26, 2002
    Date of Patent: February 24, 2004
    Assignee: Sintokogio, Ltd.
    Inventors: Masatoshi Yamamoto, Hideaki Kaga
  • Publication number: 20040029494
    Abstract: The present invention provides for a new and improved method of aqueous and cryogenic enhanced (ACE) cleaning for semiconductor surfaces as well as the surfaces of metals, dielectric films particularly hydrophobic low k dielectric films, and CMP etch stop films to remove post-CMP contaminants. It is particularly useful for removing contaminants which are 0.3 &mgr;m in size or smaller. The ACE cleaning process is applied to a surface which has undergone chemical-mechanical polishing (CMP). It includes the steps of cleaning the surface with an aqueous-based cleaning process, at least partially drying the surface, and, shortly thereafter, cleaning the surface with a CO2 cryogenic cleaning process. This process removes such contaminants from surfaces which are hydrophobic and hence difficult to clean with aqueous-based cleaning techniques alone.
    Type: Application
    Filed: August 9, 2002
    Publication date: February 12, 2004
    Inventors: Souvik Banerjee, Harlan Forrest Chung
  • Publication number: 20040018803
    Abstract: A plasma assisted cryogenic cleaner for and a method of performing cleaning of a surface that must be substantially free of contaminants has a resiliently mounted nozzle for spraying a cryogenic cleaning medium on the surface. The cleaning is conducted by applying to the substrate surface a mixture of gases selected from the group consisting of oxygen, nitrogen, hydrogen, fluorine, hydrofluorocarbon or a mixture of such gases to both remove the photoresist layer and alter the composition of the residues such that the residues are soluble in water and/or have a weakened bonds that they can be removed with a stream of cryogenic medium. The cryogenic and plasma processes can be performed sequentially or simultaneously.
    Type: Application
    Filed: July 29, 2002
    Publication date: January 29, 2004
    Inventors: Mohamed Boumerzoug, Adel George Tannous, Khalid Makhamreh
  • Patent number: 6676766
    Abstract: A method for cleaning a substrate with sherbet-like composition, comprising mixing the liquid organic agent and pure water in a mixing vessel to form a mixture, supercooling the mixture uniformly at a predetermined temperature while stirring the mixture, wherein the stirring includes creating vortices in the mixture, growing the vortices and diffusing the grown vortices in the mixture, thus providing sherbet-like cleaning composition and moving the sherbet-like cleaning composition relative to the substrate to be cleaned.
    Type: Grant
    Filed: May 2, 2001
    Date of Patent: January 13, 2004
    Assignee: Sprout Co., Ltd.
    Inventors: Riichiro Harano, Masami Furusawa, Satoshi Joya
  • Patent number: 6658907
    Abstract: A method for shot peening wherein peening shot having a Vickers hardness (Hv) in the range of 900-1100 and a Young's modulus of 200,000 MPa or less, is used, and wherein a treated article is obtained by such a method that has a maximum residual compressive stress of 1600 MPa or more and a surface roughness of 5 microns or less.
    Type: Grant
    Filed: June 20, 2002
    Date of Patent: December 9, 2003
    Assignees: Sintokogio, Ltd., Sintobrator, Ltd.
    Inventors: Akihisa Inoue, Junkou Kurosaki, Kiyoshi Okumura, Kouji Kajita
  • Patent number: 6656017
    Abstract: The present invention is a method and apparatus for providing a low-cost and less complex micro-environment for treating a substrate using an impingement cryogenic or steam spray jet. A substrate and fixture is contained within an open-architecture prophylactic or cleaning cell whereupon the substrate and fixture is continuously bathed in a regenerated and re-circulating stream of filtered, inert, dry, heated and ionized atmosphere which bathes both the entire substrate and fixture. This prevents the intrusion of contaminating ambient atmospheres onto critical surfaces. The cleaning cavity is constantly regenerated and re-circulated through the cleaning cell to maintain a majority of the clean atmosphere wherein the clean cavity is pressurized slightly with a small volume of clean dry air or inert gas to prevent the intrusion of ambient atmosphere into the cleaning cell.
    Type: Grant
    Filed: April 24, 2002
    Date of Patent: December 2, 2003
    Inventor: David P. Jackson