Abstract: A chip for holding DNA samples and method of making same by masking a silicon substrate for spaced apart wells with a photoabrasive masking material, blasting the masked surface with microabrasive beads to produce roughened wells in the substrate and forming an oxide coating over the masked and roughened surface of the substrate.

Abstract: A fluid jet cutting method and apparatus for cutting an object from a sheet. In one embodiment, a fluid jet stream is directed against a glass sheet to cut an annular disk substrate for use in a data storage device. The sheet is supported by first, second and third support members. The support surfaces of the second and third support members are respectively positioned inside central openings in the first and second support members. A vacuum pulls the sheet against the support surface of at least the second support member. Preferably, plural central openings in the first support member accommodate plural second and third support members, whereby plural substrates are cut from the sheet. The sheet preferably includes plural layers removably adhered to one another, whereby plural substrates are simultaneously formed by a single fluid jet stream. A protective layer may cover at least one surface to the sheet.

Abstract: Method and apparatus for cleaning ceramic surfaces of parts used, for example, and without limitation, in semiconductor processing equipment. In particular, one embodiment of the present invention is a method for cleaning a ceramic part that includes steps of: (a) treating the surface using one or more first mechanical processes; (b) treating the surface using one or more chemical processes; (c) plasma conditioning the surface; and (d) treating the surface using one or more second mechanical processes.

Abstract: A blast nozzle is provided with a converging inlet portion, a venturi orifice and a diverging fan-shaped outlet portion. The converging inlet portion and orifice have a round cross section and the diverging fan-shaped outlet portion has an elliptical cross section from beyond the orifice to an outlet.

Abstract: Disclosed are a method of causing abrasive grains to collide against and contact with an object being treated to form surfaces of the object being treated into a matte, specifically, a rotational magnetic field is applied on magnetic abrasive grains to cause the same to vibratingly move at random to collide against and contact with an object being treated to obtain a matte.

Abstract: A metallic layer is cooled below room temperature, leading to an embrittlement. Subsequently, the metallic layer is stripped by performing a blasting process having a high efficiency because of the brittleness. Additionally, the substrate is prevented from being damaged by using a comparatively low blasting energy.

Abstract: A nozzle apparatus for use with an abrasive fluid jet cutting system, and its method of construction and operation, are disclosed that reduce the wear and erosion problems typically experienced in the cutting jet's nozzle. This improved nozzle apparatus comprises (a) a nozzle having an entry port for receiving a slurry consisting of a carrier fluid and abrasive particles, an inner wall for directing the flow of the slurry, and an outlet port through which the slurry exits the nozzle, (b) wherein at least a portion of the nozzle wall is porous, and (c) a lubricating fluid chamber that surrounds the porous portion of the outer wall of the nozzle, the chamber having a port where a lubricating fluid enters the chamber, with the chamber port connecting to an input pipe which connects to a filter for filtering contaminants that might clog the pores of the porous portion of the nozzle.

Abstract: Apparatus for processing a surface of a substrate includes a chamber containing a cavity that has one side that is open, the chamber wall including a lip surrounding the open side of the cavity. Gas ports, disposed within the chamber wall and opening through the lip, emit a pressurized gas so as to create a gas cushion between the lip and the surface when the open side of the cavity is placed adjacent to the surface, thus creating a seal between the cavity and an environment external to the chamber.

Abstract: A method of cleaning gas turbine compressors using crushed, solid, sublimable material, such as dry ice, which can be used in during low temperature conditions, poses no risk of ice formation, clogging cooling hole passages, or degrading the emissions from the turbine.

Abstract: A method for manufacturing a dielectric waveguide at a low manufacturing cost, the dielectric waveguide comprising a pair of conductor plates approximately parallel to each other and the dielectric strip provided therebetween, which can form a dielectric strip having accurate individual dimensions without generating cracks and chips during processing. The method comprises the steps of forming a resist pattern on a green sheet containing at least a powdered inorganic material and an organic binder, removing a predetermined amount of the green sheet corresponding to an opening in the resist pattern by the use of a mask, removing the resist pattern, and firing the green sheet. In the step of removing the predetermined amount of the green sheet, the rate of removal is continuously or intermittently changed along the depth direction of the green sheet.

Abstract: In a method of cleaning metal surfaces to be welded together, at least one jet carrying particles of solid carbon dioxide is caused to come into contact with the surfaces, where the solid carbon dioxide is allowed to sublime at the surfaces. The jet is formed by passing a stream of pressurised liquid carbon dioxide through a nozzle under pressure.

Abstract: A cryogenic cleaner for and a method of performing cleaning of a surface that must be substantially free of contaminants utilizing a multi-stage, multi-mode filtered carbon dioxide-containing cleaning medium. Multiple stages and multiple types of filtration/purification are provided to remove contaminants such as hydrocarbons from the medium. In accordance with preferred embodiments, a filtering/purification process is provided that desirably utilizes one or more of: condensation of the hydrocarbon; particulate filtration; chemical filtration using activated filters; and catalytic oxidation. In certain embodiments, a resiliently mounted nozzle is provided for spraying a cryogenic cleaning medium on the surface. The nozzle may be driven in an oscillatory manner at a predetermined amplitude and frequency so the nozzle spray is delivered in a manner to provide pulsing of the spray and to provide as “snow plow” effect on contaminants as the spray delivers the cleaning medium against the surface.

Abstract: Improved cleanability and contamination prevention are provided in a wet milling apparatus for the production of pharmaceutical grade milled products. The advantages are provided by a milling agitator that is characterized by a smooth, seamless agitating surface, without crevices or seams which might accumulate contamination and which might prevent removal of contamination during cleaning. The use of polymeric milling media reduces wear on the agitator and permits the agitator to be constructed with permanent, smooth welded joints. Seamless joints are also provided on the interior of the milling chamber and sanitary, threadless fasteners are provided for the media separation screen and other milling chamber fittings.

Abstract: A silicon wafer is sand blasted using a sand blasting abrasive material containing a chelating agent which is selected from the group consisting of, for example, the following compounds (1) to (4) and salts thereof: (1) Nitrilotriacetic acid (NTA) (2) Ethylenediaminetetraacetic acid (EDTA) (3) Diethylenediamine-N,N,N″,N″-pentaacetic acid (DTPA) (4) Cyclohexanediaminetetraacetic acid (CyDTA).

Abstract: The invention relates to a cleaning method and to a corresponding cleaning device, which offer adequate protection to individuals, devices and installations, for cleaning component parts of installations that carry an electrical high-voltage and are not disconnected during cleaning. To this end, the component parts to be cleaned are subjected to the action of a two-phase particle stream (PS) consisting of a compressed gas (DGA) serving as a carrier medium and of carbon dioxide ice particles (TP) carried therein. Possible superficial accumulations of dirt are removed from the component parts by means of low-temperature embrittlement and by the kinetic energy of the impacting carbon dioxide particles. The carbon dioxide ice particles themselves sublimate without leaving residues.

Abstract: Humidity within the workspace of a cryogenic aerosol spray cleaning system is controlled by circulating the workspace atmosphere through a dehumidifier. Advantageously, the need for purging of the workspace atmosphere prior to each cleaning cycle is eliminated. A system and method are thereby provided for cleaning of large workspaces. The system amd method of the invention are especially well-suited, economical, and practical for cleaning operations in which a dry air or inert gas purge of a large volume cleaning chamber would be impractical.

Abstract: A workpiece includes an aperture bordering a surface at a shifting edge. A stream of pliant shot is discharged in a carrier fluid at the edge with a shallow angle of incidence. And, the workpiece is rotated to sweep the shot stream along the shifting edge for abrasion thereof.

Abstract: When the glass pane (3) is cut with a water jet which is pointed against the glass pane (3) from a nozzle (7) with high pressure, a water surge is directed at the glass pane (3) on the side opposite the action site of the cutting water jet to a point which is opposite the nozzle (7). The water jet which is cutting the glass pane (3) is captured damped by the water surge without its atomizing and rebounding onto the back-of the glass pane (3).

Abstract: A method for cleaning an inorganic surface of a virgin semiconductor processing component by directing a flow of frozen CO2 pellets upon the surface. After cleaning, the component is packaged for transport and installation into a furnace used for processing semiconductor wafers.

Abstract: A method of cleaning a component or a unit of an image forming apparatus which has been contaminated by a toner used for image forming includes the steps of blasting a target surface of the component or unit which has been contaminated by the toner with dry ice, and supplying a detergent to the target surface when the target surface is blasted with dry ice. In addition, a type or concentration of the detergent is adjusted in accordance with a type of the toner used for image forming.

Abstract: A method for cleaning a semiconductor processing component is provided. The process calls for directing a stream of cleaning media at a surface of the component, the cleaning media including zirconia. After cleaning with the cleaning media, frozen CO2 (dry ice) pellets may be directed at the surface to further clean the component.

Abstract: This invention relates generally to methods for removing adherent materials, for example, paint, flashes, burrs, photoresists, contaminants, and other materials from various external surfaces. In particular, the method employs an improved media comprising core/shell particles. The media can be propelled against or along the surface by a gaseous or liquid carrier medium or a mixture of gas and liquid to remove the unwanted surface material. In one embodiment, suitable blasting equipment propels the media, via a pressurized air stream, against a surface of an object, for example an airplane skin, to dislodge the material to be removed.

Abstract: A cryogenic cleaner for and a method of performing cleaning of a surface that must be substantially free of contaminants has a resiliently mounted nozzle for spraying a cryogenic cleaning medium on the surface. The nozzle is driven in an oscillatory manner at a predetermined amplitude and frequency so the nozzle spray is delivered in a manner to provide pulsing of the spray and to provide as “snow plow” effect on contaminants as the spray delivers the cleaning medium against the surface. The surface is transported past the nozzle, and the cleaning occurs in an enclosed controlled environment.

Abstract: A cryogenic cleaner for and a method of performing cleaning of a surface that must be substantially free of contaminants has a resiliently mounted nozzle for spraying a cryogenic cleaning medium on the surface. The nozzle is driven in an oscillatory manner at a predetermined amplitude and frequency so the nozzle spray is delivered in a manner to provide pulsing of the spray and to provide as “snow plow” effect on contaminants as the spray delivers the cleaning medium against the surface. The surface is transported past the nozzle, and the cleaning occurs in an enclosed controlled environment.

Abstract: The present invention provides a cleaning method in accordance with a degree of soiling and a type of contaminant on a surface to be cleaned of a cleaning target. In the method of cleaning a cleaning target, such as an electrical component, with dry ice, during a process of blasting the dry ice toward the surface to be cleaned from a location where the dry ice is stored, a size of the dry ice is adjusted, so cleaning is performed while a cleaning performance of the dry ice is changed in accordance with the type of soiling or contaminant on the surface to be cleaned.

Abstract: Cleaning compositions which, as powder or as aqueous formulation based on sodium bicarbonate, sodium chloride and/or sugar, comprise a water-soluble polymeric polycarboxylate as dispersant with the exception of those formulations containing only sodium bicarbonate and polyaspartic acids and/or their salts, to the use of these cleaning compositions for the abrasive cleaning of hard surfaces. A method for cleaning surfaces contaminated with deposits using these cleaning compositions.

Abstract: A shield is placed next to a workpiece to form a passage therebetween. The workpiece and shield are rotated, and a stream of abrasive shot is blasted toward the spinning workpiece and shield to periodically enter the passage to selectively abrade the workpiece.

Abstract: A water jet peening apparatus which can carry out an efficient peening work on a large-diameter cylindrical structure by injecting a jet stream which contains air bubbles caused by cavitation at a low angle of incidence is provided. The apparatus is comprised of a nozzle which introduces a high pressure water and injects a water jet stream containing air bubbles caused by cavitation at the cylindrical structure disposed in water, wherein the angle of injection of the jet stream is smaller than 45 degrees relative to a tangent of the cylindrical structure.

Abstract: Equipment and methods for the rapid and easy cleaning of metal forming dies while in a press and operating at elevated temperatures. The invention features the physical removal of excess lubricant collecting on the hot surface of the forming dies under operating conditions so that no lubricant-induced flaws occur on the show surface of the formed part for optimized production of high quality parts. Special and effector tooling is supplied with high velocity air which draws in solid CO2 which sublimes into pressurize streams of gaseous CO2 that is discharged through nozzles onto the forming surfaces of hot forming dies after a number of lubricated parts have been formed therewith to physically sweep foreign matter including lubricants from the die surfaces. A robot is employed to move the activated end effector in predetermined paths across the dies for fully sweeping and cleaning the forming surfaces. The gas then dissipates.

Abstract: An abrasive water treatment method and apparatus includes supporting a metal workpiece on a workpiece support and arranging a nozzle above a target surface of the workpiece so that the nozzle is pointed towards the target surface of the workpiece. A pressurized fluid having entrained abrasive particles is then generated and discharged through the nozzle and toward the target surface of the workpiece. The nozzle is located a texturing standoff distance from the target surface such that the periphery of the pressurized fluid stream discharged from the nozzle expands after being discharged from the nozzle and prior to impinging upon the target surface of the workpiece. As a result, a textured surface is created on the workpiece.

Abstract: A blanked plate-like metal member for use as an element of a belt in a continuously variable transmission has an recess including an undercut therein. A stream of a liquid mixed with particle members is ejected toward an edge to be beveled of the recess thereby to bevel the recess. After the edge is beveled by deburring the edge, the recess is finished by removing a bulge formed on an outer surface of the edge by deburring the edge.

Abstract: A blast cabinet (10) for ice blasting an article, the cabinet comprising a housing (11) having an interior support (19) for supporting the article. At least one ice blast nozzle (80) is disposed inside the housing and operable to direct a high speed stream of ice particles towards the article. In an embodiment the ice blast nozzle(s) is mounted on a articulated mount (82) wherein the nozzle can be articulated. An energy management system (30, 130) comprising a heating system is provided to facilitate the removal of spent ice particles, and prevent ice accumulation in the enclosure. In an embodiment of the blast cabinet, the energy management system (130) includes a piping assembly (36) a heat exchanger (37) both disposed in the housing.

Abstract: A method for cleaning ceramic workpieces such as SiC boats used in semiconductor fabrication is disclosed. The method comprises washing a virgin or used ceramic workpiece with a strong acid and then using a pelletized CO2 cleaning process on the acid-washed component. The inventive method has been found to produce a workpiece having a very low level of metallic and particulate contaminants on its surface.

Abstract: Systems and methods for prevention of condensation of ambient water vapor due to evaporation of frozen carbon dioxide particles used to clean data storage tapes. Various embodiments maintain conditions under which condensation cannot form in the ambient environment immediately surrounding a portion of a rigid surface on which the tape is maintained in thermodynamic contact and under tension (e.g., a metallic capstan around which the tape is wrapped).

Abstract: The present invention is a method and apparatus for providing a low-cost and less complex micro-environment for treating a substrate using an impingement cryogenic or steam spray jet. A substrate and fixture is contained within an open-architecture prophylactic or cleaning cell whereupon the substrate and fixture is continuously bathed in a regenerated and re-circulating stream of filtered, inert, dry, heated and ionized atmosphere which bathes both the entire substrate and fixture. This prevents the intrusion of contaminating ambient atmospheres onto critical surfaces. The cleaning cavity is constantly regenerated and re-circulated through the cleaning cell to maintain a majority of the clean atmosphere wherein the clean cavity is pressurized slightly with a small volume of clean dry air or inert gas to prevent the intrusion of ambient atmosphere into the cleaning cell.

Abstract: A portable, diver-operated cryogenic freezing unit cleans surfaces underwater. A housing has a first chamber that contains cryogenic liquid, such as liquid nitrogen, and a second chamber is disposed adjacent to an end portion that fits about contaminating matter on a surface underwater. A valve vents cryogenic liquid from the first chamber to expand as gas in the second chamber. The vented cryogenic liquid and gas freeze a slug of water and the contaminating matter on the surface within the end portion. The housing is bent, twisted or otherwise displaced to break or pry-away and remove the frozen slug of water and contaminating matter from the surface to thereby clean it. A method of cleaning a surface underwater using the cryogenic freezing unit is described.

Abstract: An apparatus for planarizing a surface of a semiconductor wafer includes a wafer support configured to receive the semiconductor wafer so that the surface of the semiconductor wafer projects from the wafer support. The apparatus also includes a polishing member configured in the form of an endless unitary belt which is devoid of seams. The endless unitary belt is (i) positioned in contact with the surface of the semiconductor wafer and (ii) capable of moving in a linear direction relative to the surface of the semiconductor wafer so as to planarize the surface of the semiconductor wafer. An associated method of linearly planarizing a surface of a semiconductor is also described.

Abstract: Disclosed is a dry cleaning apparatus and method using cluster for cleaning a surface of a specimen such as semiconductor wafer. The cleaning method first forms a neutral cluster no having polarity by passing a cleaning gas such as argon, nitrogen, or carbon dioxide gas through a sand glass-shaped nozzle. The formed neutral cluster is injected at an acute angle with respect to a surface of the specimen, thereby removing particles or organic remnants attached on the surface of the specimen without damaging the surface of the specimen.

Abstract: The invention concerns a method for the mechanochemical treatment of a material characterised in that to improve said material surface properties by mechanochemical anchoring, such as in particular its adhesive capacity during subsequent assembling, or to improve its use properties by producing composite structure surface coatings, consisting in projecting on said material particles with laminated structure consisting of a core and a coating comprising at least a polymer and optionally a chemical agent, in conditions such that said particles and/or fragments resulting from their fracturing are embedded and/or penetrate into said material. The invention is applicable in dentistry, the biomedical field, motor industry, avionics, printing industries, agro-industry, mechanical industries.

Abstract: A water jet peening apparatus which can carry out an efficient peening work on a large-diameter cylindrical structure by injecting a jet stream which contains air bubbles caused by cavitation at a low angle of incidence is provided. The apparatus is comprised of a nozzle which introduces a high pressure water and injects a water jet stream containing air bubbles caused by cavitation at the cylindrical structure disposed in water, wherein the angle of injection of the jet stream is smaller than 45 degrees relative to a tangent of the cylindrical structure.

Abstract: A process including providing a member having an exposed outer metal surface and propelling irregularly shaped solid carbon dioxide granules against the exposed outer metal surface with sufficient force to alter the texture of the outer metal surface to a predetermined surface roughness.

Abstract: A method of cleaning gas turbine compressors using crushed, solid, sublimatable material, such as dry ice, which can be used in during low temperature conditions, poses no risk of ice formation, clogging cooling hole passages, or degrading the emissions from the turbine.

Abstract: A method for producing a turbine airfoil that is coated with a beta phase, high aluminum content coating, such as substantially stoichiometric NiAl, and which has a surface finish suitable for application of a ceramic topcoat. The method involves impacting the coating with preselected particles of a preselected size so that the brittle coating is not adversely affected by chipping or breakage. The impacting produces a surface finish of 120 micro-inches or better so that a ceramic thermal barrier layer can be applied over the coating. The preferred method of improving the surface finish utilizes steel balls having a diameter of about 0.033″ and a peening intensity of no greater than about 6 A.

Abstract: The object of this invention is to clean a machine and device soiled in accordance with an atmosphere, where it has been used, to make it be suitable for recycle. In order to achieve this object, a cleaning target such as a unit or component including an electrical component is cleaned while dry ice and a detergent simultaneously act on a surface to be cleaned of the cleaning target.

Abstract: The object of this invention is to provide a cleaning method in accordance with the degree of soil and type of contaminant of a surface to be cleaned of a cleaning target. In order to achieve this object, in a method of cleaning a cleaning target, including an electrical component, with dry ice, during a process of blasting dry ice toward a surface to be cleaned from a location where the dry ice is stored, a size of the dry ice is adjusted, so cleaning is performed while a cleaning performance of the dry ice is changed in accordance with a type of soil or contaminant of the surface to be cleaned.

Abstract: The present invention discloses a cut wire method of producing a ferrous shot and a cut-wire type ferrous shot for shot-blasting having a hardness of Hv 200 to 300 and a low work hardening ability. Further, the present invention describes a process of using a cut-wire type ferrous shots, comprising preparing the cut-wire type ferrous shots and a ferrous object and projecting the shots to the ferrous object to remove foreign material from the ferrous object.

Abstract: A method of planarizing a semiconductor wafer having a polishing endpoint layer that includes a ligand is disclosed. One step of the method includes polishing a first side of the wafer in order to remove the ligand from the wafer. Another step of the method includes determining that a chelating agent has bound the ligand due to the polishing step removing the ligand of the polishing endpoint layer. The method also includes the step of terminating the polishing step in response to determining that the chelating agent has bound the ligand. A polishing system is also disclosed which detects a polishing endpoint based upon a chelating agent binding a ligand of a polishing endpoint layer of a semiconductor device.

Abstract: An apparatus for spraying a liquid on the surface of assemblies that are moving through wash and rinse stations.

Abstract: An apparatus for removing labels from a housing is provided. The apparatus includes a tank for storing a medium at a pressure above ambient pressure. The apparatus also includes a medium conduit in communication with the tank for transporting the medium therefrom. The conduit defines a opening therein. The medium exiting the conduit at the opening is adapted to remove labels from the housing.

Abstract: A pressurized delivery system for abrasive particulate material includes a storage container adapted to contain the abrasive particulate material therein, an input pressure line adapted to communicate with a pressurized source, and a fluidizing pressure line communicating with the input pressure line and an inlet opening in the storage container. A back-pressure pressure line communicates with an unoccupied portion of the storage container and an output pressure line. The output pressure line, into which the abrasive particulate material is fed from the storage container, communicates with the input pressure line, the back-pressure pressure line, and an outlet opening of storage container. During operation, pressurized gas is released through the inlet opening and into the storage container such that the abrasive particulate material adjacent the outlet opening is fluidized and maintained flowable so as to achieve consistent flow of the abrasive particulate material through the outlet opening.