Processes Of Treating A Solid Polymer Or Sicp Derived From Silicon Containing Reactant; Or Compositions Therefore Patents (Class 522/148)
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Patent number: 5539013Abstract: The invention relates to silicone-polyether linear block copolymers of the formula ##STR1## wherein, R is hydrogen or a C.sub.(1-8) alkyl, alkoxyl or haloalkyl radical or a monovalent epoxy-functional organic radical;R.sup.1 is hydrogen or a C.sub.(1-8) alkyl or alkoxyl radical, or a monovalent epoxy-functional organic radical;provided that at least two R or R.sup.1 groups are either hydrogen or monovalent epoxy-functional organic radicals;R.sup.2 is a divalent alkylene radical;R.sup.3 is a C.sub.(2-6) alkyl or alkoxyl radical;n is a positive integer of about 4 to about 400;m is a whole number of from 0 to about 50; and,each of R, R.sup.1, R.sup.2, and R.sup.3, may be unsubstituted or substituted The invention also relates to UV-curable compositions comprising the above-described compound, with or without a UV-detectable dye marker, and a process for making such a compound.Type: GrantFiled: December 16, 1994Date of Patent: July 23, 1996Assignee: General Electric CompanyInventors: Richard P. Eckberg, Robert F. Agars, Brian D. Shepherd
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Patent number: 5532288Abstract: Process for the preparation of a polysilane crosslinked by ioning radiation and process for the production of a composite material having a polysilane matrix. The preparation process consists of subjecting to ionizing radiation chosen from among X-rays and an electron bombardment, a formulation crosslinkable by ionizing radiation incorporating at least one polysilane having at least one vinyl termination.Type: GrantFiled: March 29, 1995Date of Patent: July 2, 1996Assignee: Aerospatiale Societe Nationale IndustrilleInventors: Daniel Beziers, Evelyne Chataignier, Patrick Noireaux
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Patent number: 5486578Abstract: The present invention relates to curable silicone coatings containing silicone resins. More particularly the present invention relates to curable silicone coating compositions comprising an olefinic organopolysiloxane, an organohydrogensiloxane, a platinum catalyst, and silicone resins in which the resins are prepared by a continuous method whereby the ratio of reactants is kept constant thus producing less variation in the final silicone resin that is produced. The silicone resins provide beneficial release properties when added to curable silicone coating compositions.Type: GrantFiled: December 20, 1994Date of Patent: January 23, 1996Assignee: Dow Corning CorporationInventors: Leslie E. Carpenter, II, Robert A. Ekeland
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Patent number: 5486442Abstract: An alternating copolymer comprising a repeating unit of the formula:-Z-(X-Y).sub.n - (I)wherein n is at least 2, X is O, S, Se or Te, and Y and Z are independently an aromatic or substituted aromatic group, and at least one other repeating unit, which is useful as a photosensitive material used in a spatial light modulator.Type: GrantFiled: July 13, 1993Date of Patent: January 23, 1996Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Akio Takimoto, Hirofumi Wakemoto, Eiichiro Tanaka, Masanori Watanabe, Junko Asayama, Hisahito Ogawa, Shigehiro Sato, Fumiko Yokotani
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Patent number: 5483017Abstract: This invention relates to a new class of novel inorganic-organic hybrid thermosetting polymers and ceramics that are formed from novel linear polymers of varying molecular weight and varying carborane content. These novel organoboron thermoset polymers and ceramics contain an unsaturated cross-linked moiety.Type: GrantFiled: November 7, 1994Date of Patent: January 9, 1996Assignee: The United States of America as represented by the Secretary of the NavyInventors: Teddy M. Keller, David Y. Son
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Patent number: 5461088Abstract: Liquid radiation-curable formulation, in particular for stereolithography, based on at least one compound that contains free radically polymerisable groups, and at least one photoinitiator suitable for the polymerisation, which formulation additionally contains a polyoxyalkylene-polysiloxane block copolymer that is selected from copolymers of the chemical formulaeR.sup.1 --(OC.sub.c H.sub.2c).sub.d --{[T]--(C.sub.c H.sub.2c O).sub.d-1 --(C.sub.c H.sub.2c)}.sub.g --OR.sup.1 (I) ##STR1## wherein: R.sup.1 is a hydrogen atom or a C.sub.1 -C.sub.8 alkyl group;R.sup.2 is a methyl or phenyl group;[T] is a polysiloxane group [PS] terminated as described in the specification in more detail;[PS] is the group of formula ##STR2## and [Alk] is an alkylene group of 3 to 10 carbon atoms, as well as novel block copolymers of formulae (I) and (II). The cured formulations have, inter alia, superior impact strength.Type: GrantFiled: August 18, 1994Date of Patent: October 24, 1995Assignee: Ciba-Geigy CorporationInventors: Jean-Pierre Wolf, Adrian Schulthess, Bettina Steinmann, Max Hunziker
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Patent number: 5453456Abstract: Fluoroaluminosilicate dental cement glasses are treated with an aqueous silanol treating solution and optionally with an additional organic compound. The treated glasses form cements with improved strength. The silanol can be ethylenically-unsaturated and can contain acidic groups, and, if so, is novel in its own right.Type: GrantFiled: May 3, 1994Date of Patent: September 26, 1995Assignee: Minnesota Mining and Manufacturing CompanyInventors: Sumita B. Mitra, Scott R. Culler, Bing Wang
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Patent number: 5449588Abstract: A photosensitive resin composition containing 0.5 to 15 parts by weight of a compound generating an acid by light irradiation in 100 parts by weight of a polyamic acid amide having an alkoxysilane having a specified structure at its terminals are provided,which composition has superior resolution properties, a small shrinkage of volume, a superior adhesion onto a substrate, and can prepare a polyimide by baking.Type: GrantFiled: May 27, 1994Date of Patent: September 12, 1995Assignee: Chisso CorporationInventors: Hirotoshi Maeda, Eiji Watanabe, Kouichi Katou, Kouichi Kunimune
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Patent number: 5449705Abstract: The present invention provides a silicon-containing polyamic acid derivative which is represented by the formula (VI) ##STR1## and which has a logarithmic viscosity number of 0.1 to 5.0 dl/g at 30.degree. C. in N-methyl-2-pyrrolidone, said silicon-containing polyamic acid derivative being obtained by reacting A mol of a tetracarboxylic acid derivative, B mol of a diamine, and C mol of an aminosilicon compound so as to meet the relations of the equations (IV) and (V): ##EQU1## A photosensitive resin composition using this silicon-containing polyamic acid derivative can be easily manufactured, permits the formation of a negative type sharp relief pattern, can inhibit film reduction at the time of curing by baking, and is excellent in adhesive properties to substrates, heat stability and shelf stability.Type: GrantFiled: April 19, 1994Date of Patent: September 12, 1995Assignee: Chisso CorporationInventors: Eiji Watanabe, Kouichi Katou, Hirotoshi Maeda, Kouichi Kunimune
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Patent number: 5442024Abstract: A photosensitive polyimide precursor composition of the present invention comprises a polyimide precursor represented by the formula (6)(OR.sup.5).sub.k R.sup.4.sub.3-k Si--R.sup.3 --X--Z (6)and having a logarithmic viscosity number of 0.1 to 5.0 dl/g measured in N-methyl-2-pyrrolidone at 30.degree. C. and a compound capable of generating an acid by light irradiation, said polyimide precursor being obtained by reacting A mol of a tetracarboxylic dianhydride, B mol of a diamine, and C mol of an aminosilane so as to meet the relations of the equations: ##EQU1## This composition not only has practical photosensitivity but also inhibits the reduction of film thickness due to curing and development, and it is also excellent in shelf stability in varnish and adhesive properties to a substrate such as a silicon wafer or the like.Type: GrantFiled: April 26, 1994Date of Patent: August 15, 1995Assignee: Chisso CorporationInventors: Kouichi Kunimune, Hirotoshi Maeda, Kouichi Katou, Eiji Watanabe
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Patent number: 5426132Abstract: Ultraviolet curable polymerizable systems having a built-in secondary curing mechanism are disclosed. The polymerizable coating system is a one component system comprising at least one alkoxysilyl-urethaneacrylate or methacrylate, an acrylate or methacrylate or vinyl ether diluent. The coating systems may include a polymerization initiator of the cationic or free radical photoinitiator type, and a metal catalyst. The coating system is UV curable, and also possesses an additional cure mechanism.Type: GrantFiled: February 14, 1994Date of Patent: June 20, 1995Assignee: CasChem, Inc.Inventor: Kamlesh Gaglani
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Patent number: 5407970Abstract: The invention relates to adhesive compositions comprising terpolymers C.sub.6 to C.sub.10 unsaturated .alpha.-olefin monomers, C.sub.2 to C.sub.5 .alpha.-olefin monomers and polyene monomers and an effective amount of photoactive cross-linking agent to cross-link composition upon radiation from a source of active radiation.Type: GrantFiled: April 13, 1993Date of Patent: April 18, 1995Assignee: Minnesota Mining and Manufacturing CompanyInventors: James R. Peterson, Gaddam N. Babu
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Patent number: 5393641Abstract: A novel radiation-sensitive resin composition having high sensitivity and high O.sub.2 -RIE resistance is otained by blending 0.5 g of poly(di-t-butoxysiloxane), 50 mg of triphenylsulfonium trifluoromethanesulfonate as acid-producing agent, and 4 ml of 2-methoxyethyl acetate as solvent.Type: GrantFiled: June 6, 1994Date of Patent: February 28, 1995Assignee: Oki Electric Industry Co., Ltd.Inventors: Toshio Ito, Miwa Sakata
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Patent number: 5372908Abstract: A photosensitive composition comprises a polysilane having a repeating unit represented by formula (1) and a compound which generates an acid upon exposure to light: ##STR1## wherein each of R.sup.1 and R.sup.2 independently represents a hydrogen atom, a substituted or nonsubstituted alkyl group having 1 to 18 carbon atoms, a substituted or nonsubstituted aryl group having 6 to 18 carbon atoms, or a substituted or nonsubstituted aralkyl group having 7 to 22 carbon atoms. This photosensitive composition exhibits a high-sensitivity, and can be formed into a polysilane film pattern having a high-resolution, when it is subjected to exposure to Deep UV light, an EB, an X-ray, or the like, hard baking, and development under appropriate conditions. When an aromatic ring substituted by a hydroxyl group, a substituted or nonsubstituted alkoxyl group, or a substituted or nonsubstituted siloxyl group is introduced in one of side chains R.sup.1 and R.sup.Type: GrantFiled: July 8, 1992Date of Patent: December 13, 1994Assignee: Kabushiki Kaisha ToshibaInventors: Shuji Hayase, Yoshihiko Nakano, Yukihiro Mikogami
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Patent number: 5370971Abstract: A photopolymerizable composition comprising:(a) an aromatic epoxy resin derivative containing, per kilogram of the resin, 0.3 to 10 mole equivalents of a polymerizable unsaturated group and 0.1 to 3 mole equivalents of a specific aprotic onium salt-containing group,(b) a polysiloxane having a specific polysiloxane chain in a molecule, and containing 0.01 to 5 mole equivalents, per kilogram of the polysiloxane, of the aprotic onium salt-containing group, and(c) a photopolymerization initiator.Said photopolymerizable composition can form a resist film excellent in adhesion to a substrate, heat resistance, chemical resistance, impact resistance and solder plating property, and is suitable as a solder resist in particular.Type: GrantFiled: October 29, 1992Date of Patent: December 6, 1994Assignee: Kansai Paint Co., Ltd.Inventors: Tetsuo Ogawa, Kenji Seko, Tetsu Maki, Naozumi Iwasawa
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Patent number: 5371116Abstract: Vulcanizable organopolysiloxane compositions comprise a hydroxy-terminated organopolysiloxane, an acrylic or methacryllc functional alkoxy silane, a divalent tin compound, an alkoxy-.alpha.-silyl ester, a photopolymerization initiator, and a curing catalyst whereby the composition is cured by UV irradiation and/or by the action of moisture in air. The composition has good shelf stability and can yield rubber elastomers having good physical properties.Type: GrantFiled: July 13, 1993Date of Patent: December 6, 1994Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takafumi Sakamoto, Masatoshi Arai, Kei Miyoshi
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Patent number: 5348839Abstract: Disclosed are compositions which are useful for forming photodelineable coatings on substrates. The compositions contain a solvent, hydrogen silsesquioxane resin and an initiator which generates free radicals upon exposure to radiation.Type: GrantFiled: March 22, 1993Date of Patent: September 20, 1994Assignee: Dow Corning CorporationInventors: Loren A. Haluska, Keith W. Michael
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Patent number: 5331020Abstract: Organosilicon compounds with a siloxane portion and groups of the general formula --OR'OCH.dbd.CHR" (i) linked via an Si--O--C bond, wherein R' is a divalent hydrocarbon radical or a group --R.degree.--(OR.degree.).sub.n --, wherein R.degree. is alkylene and n is from 1 to 12, R" is H or alkyl are useful in radiation curable compositions, in which they are mixed with an initiator. The compositions are particularly useful in UV radiation curable relase coatings.Type: GrantFiled: August 16, 1993Date of Patent: July 19, 1994Assignee: Dow Corning LimitedInventors: Scott S. D. Brown, Peter C. Hupfield, Peter Y. K. Lo, Richard G. Taylor
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Patent number: 5310604Abstract: A method for monitoring the coating weight, uniformity, defects or markings present in a coating of a composition applied to a substrate comprises the steps:a) providing a substrate with a functional coating of a composition comprising an effective amount of uvescer that absorbs radiant energy, i.e., has an excitation energy, of wavelength .lambda..sub.1 and emits radiant energy of wavelength .lambda..sub.2 ;b) scanning the coating with radiant energy having a wavelength within wavelength .lambda..sub.1 ;c) detecting the radiant energy of wavelength .lambda..sub.2 emitted by the coating; andd) optionally, correlating the emitted radiant energy to independently measured standard coating weights or thicknesses, of the coating so as to measure coating weight, thickness, uniformity, defects, or markings.Type: GrantFiled: August 13, 1993Date of Patent: May 10, 1994Assignee: Minnesota Mining and Manufacturing CompanyInventors: Kurt C. Melancon, George V. D. Tiers
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Patent number: 5308887Abstract: The present invention provides a silicone/acrylic based pressure-sensitive adhesive composition, adhesive, and adhesive tapes prepared therefrom.Type: GrantFiled: May 23, 1991Date of Patent: May 3, 1994Assignee: Minnesota Mining & Manufacturing CompanyInventors: Chan U. Ko, Mark D. Purgett, Kurt C. Melancon, Donald H. Lucast, Daniel K. McIntyre
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Patent number: 5304582Abstract: This invention relates to production of a super long conjugated polymer to be used for a molecular device, etc. According to this invention, an acetylene derivative is previously oriented and formed into a monomolecular film on the surface of a substrate and its acetylenic group is polymerized by a catalyst or by irradiation of an energy beam while keeping the orientation. Since the respective molecules are oriented and aligned on the substrate surface, the polymerization reaction readily proceeds, and after the polymerization the resulting polyacetylene molecules are prevented from the breakage of conjugated bonds caused by thermal agitation or twisting of the polyacetylene molecules. Accordingly, a polyacetylene or polyacene type polymer having long conjugated bonds can be obtained easily.Type: GrantFiled: October 13, 1992Date of Patent: April 19, 1994Assignee: Matsushita Electric Industrial Co., Ltd.Inventor: Kazufumi Ogawa
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Patent number: 5304583Abstract: This invention relates to production of a super long conjugated polymer to be used for a molecular device, etc. According to this invention, an acetylene derivative is previously oriented and formed into a monomolecular film on the surface of a substrate and its acetylenic group is polymerized by a catalyst or by irradiation of an energy beam while keeping the orientation. Since the respective molecules are oriented and aligned on the substrate surface, the polymerization reaction readily proceeds, and after the polymerization the resulting polyacetylene molecules are prevented from the breakage of conjugated bonds caused by thermal agitation or twisting of the polyacetylene molecules. Accordingly, a polyacetylene or polyacene type polymer having long conjugated bonds can be obtained easily.Type: GrantFiled: October 13, 1992Date of Patent: April 19, 1994Assignee: Matsushita Electric Industrial Co., Ltd.Inventor: Kazufumi Ogawa
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Patent number: 5292779Abstract: This invention relates to a new class of novel inorganic-organic hybrid polymers that are formed from linear inorganic-organic hybrid polymers of varying molecular weight. These new high temperature oxidatively stable thermosetting polymers are formed from linear polymeric materials having repeat units that contain at least one alkynyl group for cross-linking purposes and at least one bis(silyl or siloxanyl)carboranyl group. These novel organoboron thermoset polymers contain an unsaturated cross-linked hydrocarbon moiety.Type: GrantFiled: December 17, 1992Date of Patent: March 8, 1994Assignee: The United States of America as represented by the Secretary of the NavyInventors: Teddy M. Keller, Leslie J. Henderson
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Patent number: 5262277Abstract: A photosensitive resin composition comprising (A) a polymer obtained by reacting an isocyanate compound having an ethylenic unsaturated group with a polymer which is a reaction product of a tetracarboxylic acid dianhydride and a diamine, and (B) a photoinitiator, can provide a thick film excellent in heat resistant, adhesiveness, flexibility, electrical and mechanical properties, and is particularly suitable for producing a photosensitive element.Type: GrantFiled: January 22, 1992Date of Patent: November 16, 1993Assignee: Hitachi Chemical Company, Inc.Inventors: Kuniaki Sato, Yasunori Kojima, Shigeo Tachiki, Tohru Kikuchi, Toshiaki Ishimaru, Nobuyuki Hayashi, Mitsumasa Kojima
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Patent number: 5240813Abstract: Novel polysilphenylenesiloxanes having a three-dimensional mesh structure of silphenylenesiloxane core surrounded by triorganosilyl groups, which have a good sensitivity to ionizing radiations such as deep ultraviolet rays, electron beams and X-rays, a high softening point of 400.degree. C. or more, and a good resistance to O.sub.2 -plasma etching, and exhibit a high contrast and low swelling. These polysiphenylenesiloxanes are useful as a resist material, especially a top layer resist of the bi-level resist system and an interlevel dielectric or heat-resisting protective layer. The resist material has a high resolution because of a high contrast, low swelling and high thermal resistance thereof.Type: GrantFiled: November 15, 1990Date of Patent: August 31, 1993Assignee: Fujitsu LimitedInventors: Keiji Watanabe, Akira Oikawa, Shun-ichi Fukuyama, Masaaki Yamagami, Takahisa Namiki
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Patent number: 5231157Abstract: Novel siloxane copolymers are described having an average of at least two alkenyloxy groups of the formula--OCR.sup.2 .dbd.CH.sup.2 CH.sub.3,in which R.sup.2 represents hydrogen or a methyl radical.These siloxane copolymers are prepared by reacting in a first stage, an organic compound (1) containing more than two aliphatic double bonds of the formula OCHR.sup.2 CR.sup.2 =CH.sub.2 where R.sup.2 is the same as above, with an organopolysiloxane (2) having at least one Si-bonded hydrogen atom per molecule in the presence of a catalyst (3) which promotes addition of the Si-bonded hydrogen to an aliphatic double bond and in a second stage heating the siloxane copolymer in the presence of a catalyst (4) which promotes shifting of the terminal double bond to form copolymers having an internal double bond.Type: GrantFiled: January 31, 1991Date of Patent: July 27, 1993Assignee: Wacker-Chemie GmbHInventors: Christian Herzig, Doris Gilch
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Patent number: 5204380Abstract: A method of forming modified preceramic polymers comprising mixing organopolysilanes having a plurality of Si--H functional groups with an effective amount of a metallocene compound, and allowing the mixture to undergo a dehydrogenative reaction is disclosed. Pyrolysis of the modified polymer provides in high yields ceramic residues that approach stoichiometric SiC in composition. Preferably the organopolysilane starting material contains a plurality of tertiary Si--H bonds and has the general formula of [(RSiH).sub.x (RSi).sub.y ].sub.n where the sum of the coefficients x and y equal 1, n is an integer greater than 1, R is a lower alkyl group having from 1 to about 8 carbon atoms, a substituted or unsubstituted lower alkenyl group having from 2 to about 8 carbon atoms, a cycloalkyl group having from 3 to about 10 carbon atoms, substituted or unsubstituted aryl group having from 6 to about 10 carbon atoms.Type: GrantFiled: August 29, 1991Date of Patent: April 20, 1993Assignee: Massachusetts Institute of TechnologyInventors: Dietmar Seyferth, Henry J. Tracy, Jennifer L. Robison
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Patent number: 5204381Abstract: Hybrid sol-gel materials comprise silicate sols cross-linked with linear polysilane, polygermane, or poly(silane-germane). The sol-gel materials are useful as optical identifiers in tagging and verification applications and, in a different aspect, as stable, visible light transparent non-linear optical materials. Methyl or phenyl silicones, polyaryl sulfides, polyaryl ethers, and rubbery polysilanes may be used in addition to the linear polysilane. The linear polymers cross-link with the sol to form a matrix having high optical transparency, resistance to thermooxidative aging, adherence to a variety of substrates, brittleness, and a resistance to cracking during thermal cycling.Type: GrantFiled: April 20, 1992Date of Patent: April 20, 1993Assignee: The United States of America as represented by the United States Department of EnergyInventor: John M. Zeigler
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Patent number: 5188864Abstract: An adhesion promoter for use with ultraviolet radiation curable siloxane composition is made by combining an alkoxysilicon compound of the formula(RO).sub.3 Si--X--Si(OR).sub.3and a compound capable of catalyzing the reaction between two alkoxy groups or an alkoxy group and a hydroxyl group. Ultraviolet radiation curable siloxane compositions with the improved adhesion are obtained by mixing the adhesion promoter with a mixture which has at least one ultraviolet radiation activatable siloxane polymer and a photoinitiator. These compositions can be used as optical fiber coatings, conformal coatings, and other coating application where adhesion to a substrate is important.Type: GrantFiled: April 2, 1991Date of Patent: February 23, 1993Assignee: Dow Corning CorporationInventors: Chi-long Lee, Michael A. Lutz
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Patent number: 5178959Abstract: Novel epoxy-functional fluorosilicones and UV-curable compositions containing these epoxy-functional fluorosilicones in combination with onium salt photoinitiators are provided, the UV-curable compositions having improved cure efficiency and improved solvent and fuel resistance as compared to epoxy-functional silicones containing only non-fluorinated organic groups. Such compositions are useful as conformal coatings, optical fiber coatings, and electrical encapsulation.Type: GrantFiled: March 27, 1991Date of Patent: January 12, 1993Assignee: General Electric CompanyInventors: Richard P. Eckberg, Edwin R. Evans
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Patent number: 5176982Abstract: Disclosed is a photosensitive resin composition for forming a polyimide film pattern. The composition contains a polyamic acid and at least one silyl ketone compound represented by general formula (II) given below, ##STR1## where each of R.sup.3 to R.sup.16 is a are substituted or unsubstituted alkyl group having 1 to 12 carbon atoms or a substituted or unsubstituted aromatic group having 6 to 14 carbon atoms, each of R.sup.5 to R.sup.16 may be a substituted or unsubstituted silyl group, and each of l, m, n, s, t and u is 0 or 1, at least one of l, m, n, s, t and u being 1. The composition further contains a sensitizer, as required. A semiconductor substrate is coated with the composition, followed by exposing the coating through a predetermined mask and subsequently developing and heat-treating the coating so as to form a polyimide film pattern.Type: GrantFiled: July 5, 1991Date of Patent: January 5, 1993Assignee: Kabushiki Kaisha ToshibaInventors: Yukihiro Mikogami, Shuzi Hayase, Yoshihiko Nakano
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Patent number: 5086087Abstract: The invention relates to a composition containing UV curable unsaturated monomers and/or oligomers, a photoinitiator and colloidal silica with an organosilane compound, a polyalkoxysilane being used as organosilane compound and the composition containing an acid catalyst.Type: GrantFiled: March 24, 1989Date of Patent: February 4, 1992Assignee: Stamicarbon B.V.Inventor: Tosko A. Misev
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Patent number: 5082686Abstract: There is provided a curable substantially uniform mixture of an epoxy silicone, polyarylonium salts and a compatibilizer in the form a mixture of a long chain alkyl substituted phenol and an alkane diol. The curable mixture is convertable to a non-toxic, tack free adherent release coating for pressure sensitive adhesives.Type: GrantFiled: December 3, 1990Date of Patent: January 21, 1992Assignee: General Electric CompanyInventors: James L. Desorcie, Michael J. O'Brien
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Patent number: 5077083Abstract: Ultraviolet curable compositions useful for coating electrical devices are formed from an epoxy functional compound, a silanol functional compound, and a cationic photoinitiator. Ultraviolet radiation curable composition formed from an epoxy resin, a silanol functional compound, a carbonol functional polyether polysiloxane, and a cationic photoinitiator are useful as coatings.Type: GrantFiled: May 15, 1991Date of Patent: December 31, 1991Assignee: Dow Corning CorporationInventors: Michael A. Lutz, Allen B. Puder, William E. Willy, Leon D. Crossman
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Patent number: 5070116Abstract: Organosilicon-metal polymers are prepared by mixing an organosilicon polymer containing a multiplicity of Si-H and/or Si-Si functional groups with a sufficient quantity of a metal carbonyl for the metal carbonyl to be incorporated into the organosilicon polymer. These polymers can be used to prepare ceramics.Type: GrantFiled: February 7, 1991Date of Patent: December 3, 1991Assignee: Massachusetts Institute of TechnologyInventors: Dietmar Seyferth, Christine A. Sobon, Jutta Borm
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Patent number: 5070118Abstract: Polysiloxane is produced containing both acrylic or methacrylic and benzoyl functions which is self-sensitized to UV radiation.Type: GrantFiled: January 22, 1991Date of Patent: December 3, 1991Assignee: General Electric CompanyInventor: Richard P. Eckberg
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Patent number: 5064876Abstract: An adhesion promoter which is a silane or polysiloxane having in each molecule at least one organic group possessing aliphatic unsaturated group and at least one organic group possessing amino group or having in each molecule at least one organic group possessing both aliphatic unsaturation and an amino group is useful for improving the adhesion of radiation curable organopolysiloxane compositions to substrates.Type: GrantFiled: July 31, 1989Date of Patent: November 12, 1991Assignee: Toray Silicone Company, Ltd.Inventors: Yuji Hamada, Shosaku Sasaki, Hiroshi Masaoka
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Patent number: 5063254Abstract: A polysiloxane comprising a linear polydiorganosiloxane chain joined at one terminus to an acrylic-functional end group, and joined at its other end to a cross-linked MTQ moiety comprising a multiplicity of monofunctional siloxane units (M), trifunctional siloxane units (T), and tetrafunctional siloxane units (Q), wherein the concentration ratio of M units to the sum of T units and Q units, M/(T+Q), in the MTQ moiety is from about 0.55 to about 0.75, and wherein the number of siloxy repeating units in the linear polydiorganosiloxane chain is from 25 to 1,000. The M and or /T units may also contain (meth)acrylate groups. The MTQ/silicone hybrid resins of the invention are curable by UV radiation, to provide high tensile strength silicone compositions having utility in potting and conformal coating apllications.Type: GrantFiled: November 27, 1989Date of Patent: November 5, 1991Assignee: Loctite CorporationInventor: Steven T. Nakos
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Patent number: 5059669Abstract: An adhesion promoter which is a silane or polysiloxane having in each molecule at least one organic group possessing aliphatic unsaturated group and at least one organic group possessing amino group or having in each molecule at least one organic group possessing both aliphatic unsaturation and an amino group is useful for improving the adhesion of radiation curable organopolysiloxane compositions to substrates.Type: GrantFiled: November 19, 1987Date of Patent: October 22, 1991Assignee: Toray Silicone Company, Ltd.Inventors: Yuji Hamada, Shosaku Sasaki, Hiroshi Masaoka
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Patent number: 5057550Abstract: Ultraviolet curable compositions useful for coating electrical devices are formed from an epoxy functional compound, a silanol functional compound, and a cationic photoinitiator. Ultraviolet radiation curable composition formed from an epoxy resin, a silanol functional compound, a carbonol functional polyether polysiloxane, and a cationic photoinitiator are useful as coatings.Type: GrantFiled: December 4, 1989Date of Patent: October 15, 1991Assignee: Dow Corning CorporationInventors: Michael A. Lutz, Allen B. Puder, William E. Willy, Leon D. Crossman
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Patent number: 5010118Abstract: There is provided a curable substantially uniform mixture of an epoxysilicone, a polyarylonium salt and a compatibilizer in the form a mixture of a long chain alkyl substituted phenol and an alkane diol. The curable mixture is convertable to a non-toxic, tack free adherent release coating for pressure sensitive adhesives.Type: GrantFiled: June 22, 1989Date of Patent: April 23, 1991Assignee: General Electric CompanyInventors: James L. Desorcie, Michael J. O'Brien
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Patent number: 4988743Abstract: Polysiloxane is produced containing both acrylic or methacrylic and benzoyl functions which is self-sensitized to UV radiation.Type: GrantFiled: March 21, 1988Date of Patent: January 29, 1991Assignee: General Electric CompanyInventor: Richard P. Eckberg
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Patent number: 4975472Abstract: A curable organopolysiloxane composition having condensation-curing properties and ultraviolet-curing properties, comprising (A) a diorganopolysiloxane having a viscosity of 50 to 200,000 cSt, both ends of each molecule thereof being blocked with a silanol group, (B) a silane compound, (C) an (alkyl)acrylic acid derivative, (D) a catalyst for condensation and (E) a sensitizer.Type: GrantFiled: May 5, 1989Date of Patent: December 4, 1990Assignee: Toshiba Silicone Co., Ltd.Inventors: Tsuneo Motegi, Yasuji Matsumoto
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Patent number: 4968524Abstract: The present invention relates to an electric material, and particularly it relates to an organic substance having a polyacetylene linkage which exhibits electrical conductivity and nonlinear optical effect.More particularly, the present invention provides a process for producing an organic substance having a polyacetylene linkage which can be utilized, for example, as an electric material, said process comprising immersing a substrate having a hydrophilic surface in a solution of a substance containing an acetylene (--C.tbd.C--) group and a chlorosilane (--SiCl.sub.3) group dissolved in a nonaqueous organic solvent, thereby subjecting the substance containing an acetylene group and a chlorosilane group to chemical adsorption on the surface of the substrate, subjecting said substance to polymerization reaction by the use of radiation such as X-rays, electron beams, .gamma.-rays, or the like, and thereby producing a polyacetylene.Type: GrantFiled: October 12, 1988Date of Patent: November 6, 1990Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Kazufumi Ogawa, Hideharu Tamura, Norihisa Mino
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Patent number: 4954580Abstract: Epoxysiloxanes having, per molecule, at least two groupings of the formula ##STR1## in which R.sup.1 and R.sup.2 independently of one another are C.sub.1 -C.sub.10 alkyl, C.sub.1 -C.sub.10 alkyoxy, C.sub.3 -C.sub.8 cycloalkyl, C.sub.6 -C.sub.10 aryl, benzyl or a halogen atom and in which each grouping of the formula I in each case is attached directly to a silicon atom of the siloxane radical, are suitable for use as epoxy resins. They can be used together with customary epoxy resin curing agents, for example, for the production of adhesives, sealing materials, lacquers or encapsulating resins, and afford products having excellent properties. The epoxysiloxanes according to the invention are also valuable reactive thinners and flexibilizers for curable epoxy resin mixtures.Type: GrantFiled: November 21, 1988Date of Patent: September 4, 1990Assignee: Ciba-Geigy CorporationInventor: Sheik A. Zahir
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Patent number: 4954364Abstract: A method is provided for enhancing the controlled release characteristics of paper or plastic substrates by applying onto the substrate, a UV curable mixture of an epoxysilicone, an arylonium salt catalyst, such as a diaryliodoniumhexafluoroantimonate and a controlled release additive such as a phenolpropyl-substituted methyldisiloxane or an alkylphenol, such as dodecylphenol. The treated plastic or paper substrate is then subjected to UV irradiation to effect a tack-free cure of the UV curable mixture on the substrate.Type: GrantFiled: June 22, 1989Date of Patent: September 4, 1990Assignee: General Electric CompanyInventors: Judith Stein, Tracey M. Leonard, James L. Desorcie
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Patent number: 4952657Abstract: Organopolysiloxane for use in release coating compositions arre modified to control release values by substitution with phenolic compounds.Type: GrantFiled: July 29, 1988Date of Patent: August 28, 1990Assignee: General Electric CompanyInventors: Karen D. Riding, Judith Stein, Richard P. Eckberg, James L. Desorcie, Tracey M. Leonard
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Patent number: 4921880Abstract: An adhesion promoter for use with ultraviolet radiation curable siloxane composition is made by combining an alkoxysilicon compound of the formula(RO).sub.3 Si--X--Si(OR).sub.3and a compound capable of catalyzing the reaction between two alkoxy groups or an alkoxy group and a hydroxyl group. Ultraviolet radiation curable siloxane compositions with the improved adhesion are obtained by mixing the adhesion promoter with a mixture which has at least one ultraviolet radiation activatable siloxane polymer and a photoinitiator. These compositions can be used as optical fiber coatings, conformal coatings, and other coating application where adhesion to a substrate is important.Type: GrantFiled: August 15, 1988Date of Patent: May 1, 1990Assignee: Dow Corning CorporationInventors: Chi-Long Lee, Michael A. Lutz
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Patent number: 4921926Abstract: A curable polyorganosiloxane composition is disclosed, comprising: (A) 100 parts by weight of polyorganosiloxane having at least two hydroxyl groups or hydrolyzable groups bonded to a silicon atom in the molecule thereof and having a viscosity at 25.degree. C. of 10 to 1,000,000 cSt, (B) 0 to 2,000 parts by weight of polyorganosiloxane having at least two alkenyl groups bonded to a silicon atom in the molecule thereof and having a viscosity at 25.degree. C. of 10 to 1,000,000 cSt, (C) 0.5 to 20 parts by weight of an organosilicon compound having more than 2 (on the average) hydrolyzable groups bonded to a silicon atom in the molecule thereof, (D) 0 to 10 parts by weight of a catalyst for a condensation reaction, and (E) 0.1 to 5 parts by weight of an organic peroxide, wherein at least 0.01 mol % of all organic groups bonded to a silicon atom as contained in (A) to (C) is an alkenyl group. The composition has both condensation reaction curability and ultraviolet ray curability.Type: GrantFiled: November 16, 1988Date of Patent: May 1, 1990Assignee: Toshiba Silicone Co., Ltd.Inventors: Tsuneo Motegi, Yasuji Matsumoto, Kiyoshi Takeda, Shuji Chiba
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Patent number: 4914143Abstract: An improved silica-containing curable coating composition is described herein. The composition has an alkaline pH and contains a dialkyldialkoxysilane/alkyltrialkoxysilane mixture and a dispersion of ammonium-stabilized colloidal silica having an average particle size no greater than about 5-10 millimicrons. Methods for preparing such compositions are also disclosed, as are thermoplastic articles which include the cured protective coatings.Type: GrantFiled: April 25, 1988Date of Patent: April 3, 1990Assignee: General Electric CompanyInventor: Gautam A. Patel