Abstract: Dioxolane-substituted silicon compounds are prepared by a hydrosilylation reaction between a silicon hydride and an aliphatically unsaturated dioxolane compound. The dioxolane-substituted silicon compounds are thereafter converted to diol-substituted silicon compounds and then to diacrylate-substituted silicon compounds. The latter are useful in a curable coating composition for providing a substrate with an adhesive-releasing coating.

Abstract: A process for the preparation of preceramic metallopolysilanes is described. The process consists of reacting polysilanes with metallic compounds from which can be generated open coordination sites associated with the metallic element. Such open coordination sites can be generated by the reduction of the metallic compound with an alkali metal reducing agent, or by heating a metallic compound which has thermally labile ligands, or by the UV irradiation of a carbonyl-containing metallic compound. The metals which can be incorporated into the polysilane include aluminum, boron, chromium, molybdenum, tungsten, titanium, zirconium, hafnium, vanadium, niobium, and tantalum. These metallopolysilanes are useful, when fired at high temperatures, to form metal-containing ceramic materials.

Abstract: A coated photosensitive material on a support comprising a layer of polyamic acids and polyamic acid aryl esters derived from tetracarboxylic acids or aminodicarboxylic acids containing a benzophenone structural unit and aromatic diamines which are substituted in both ortho-positions by at least one amino group. The material is autophotocrosslinkable and is suitable for producing protective coatings and photographic images, with corresponding polyimides being formed after irradiation by a thermal aftertreatment.

Abstract: Provided herein is an ultraviolet-curable gel composition which comprises an organopolysiloxane as a principal component which is represented by the general structural formula below. ##STR1## where R.sup.1 is a C.sub.4-25 monovalent organic group containing therein 1 to 2 vinyl functional groups; R.sup.2 is a C.sub.1-18 monovalent organic group having no vinyl group capable of addition polymerization; R.sup.3 is a C.sub.2-4 divalent hydrocarbon group; R.sup.4 is a C.sub.1-9 substituted or unsubstituted hydrocarbon group of the same or different kind; a is an integer of 1 to 3; and n is an integer of 5 to 500.

Abstract: A sensitive deep utltraviolet radiation resist suitable for use in two layer lithography is obtained by brominating poly (1-trimethylsilylpropyne). Positive patterned layers are obtained by coating a substrate with the polymer, irradiating it with ultraviolet radiation, baking the polymer and developing the irradiated portions.

Abstract: A positively working resist material is disclosed, comprising a compound having at least one silyl ether group and capable of directly dissociating an Si-O-C bond upon irradiation with far ultraviolet rays, X-rays, an electron beam, or an ion beam. The resist material has high sensitivity to high energy radiation, excellent resistance to dry etching, and can be developed with an alkaline aqueous solution.

Abstract: The present invention is a process for enhancing the permselectivity of a polymeric membrane containing substituted acetylene monomer units without adversely affecting the mechanical properties of the membrane. The process comprises irradiating the surface of the membrane with ultraviolet light while maintaining it in an environment comprising a fluid which is capable of removing surface heat from the polymer film surface without significantly absorbing or depleting the intensity of the ultraviolet rays in the range of 230-280 nm.

Abstract: A method is disclosed for the preparation of ceramic materials or articles by the pyrolysis of vinyl- or allyl-containing preceramic silazane polymers wherein the vinyl- or allyl-containing preceramic silazane polymers are rendered infusible prior to pyrolysis by high energy radiation such as gamma rays or an electron beam. Preceramic polymer compositions containing a vinyl- or allyl-containing silazane polymers and mercapto compounds containing at least two mercapto groups may also be rendered infusible by such high energy radiation. This method is especially suited for the preparation of ceramic fibers.

Abstract: A new polycarbosilastyrene copolymer which comprises recurring carbosilane units of the formula I: ##STR1## and recurring silastyrene units of the formula II: ##STR2## and having easy shaping and sintering properties, is produced by ultra-violet ray treatment and/or heat treatment of a polysilastyrene material and is useful for producing a shaped sintered silicon carbide article by shaping the polycarbosilastyrene copolymer to a desired form, by applying an ultra-violet ray treatment or heat treatment to the shaped article, and by sintering the resultant corss-linked, non-fusible shaped article at an elevated temperature.

Abstract: A method is disclosed for the synthesis of SiH-containing organopolysiloxanes from the corresponding Si-halogen-containing organopolysiloxanes by the reaction with metal hydrides in a liquid reaction medium. The method has the following combiniation of characteristics:(a) the use of a metal hydride being LiH, NaH, KH, CaH.sub.2 or MgH.sub.2 ;(b) the use of ethers as reaction medium;(c) the continuous removal of the metal halide depositing on the surface of the metal hydride particles during the reaction by the action of mechanical energy or ultrasound with formation of a fresh surface.The reaction proceeds practically quantitatively and at low temperatures. It can be applied with particular advantage to industrially obtained mixtures of .alpha.,.omega.-dichloroorganopolysiloxanes.

Abstract: A crosslinkable polyurethane or polyurethane/polyurea comprises the reaction product of a composition comprising a macrodiol or macrodiamine, 2-gl;yceryl acrylate or 2-glyceryl methacrylate, a diisocyanate, and optionally a small glycol or small diamine as chain extender. The performance properties of the polyurethanes and polyurethane/polyureas can be controlled by adjustment of the crosslink level and/or curing parameters.

Abstract: Mercaptan substituted silicon compounds are produced by the reaction of amine with carboxyl. UV curable silicon compositions are produced from such compounds.

Abstract: A method of protecting carbon/carbon composites against oxidation at high temperatures is disclosed. This comprises coating the composite with a hybrid metal alkoxide/organosilicon polymer. The hybrid polymer is prepared by a method comprising mixing an organosilicon polymer having a plurality of Si-H functional groups with a sufficient quantity to undergo a hydrosilylation reaction of a metal alkenoxide, wherein the metal alkenoxide comprises a metal, metalloid or silicon alkoxide containing at least one alkenoxy group; and initiating the hydrosilylation reaction to form the hybrid polymer.

Abstract: A method of producing acryloxy containing organopolysiloxanes by reacting an epoxy containing organopolysiloxane with an acrylic acid or methacrylic acid followed by a reaction with acryloyl chloride or methacryloyl chloride. The novel acryloxy or methacryloxy cyclohexyl containing organopolysiloxanes are useful as compositions which cure by radiation, such as ultraviolet or electron beam. The compositions containing the acryloxy or methacryloxy cyclohexyl containing organopolysiloxanes can also contain other ingredients which are useful in radiation curable compositions, such as photoinitiators in ultraviolet radiation curable compositions.

Abstract: Method of spinning fibers and coating from an organopolysilazane composition that can be crosslinked by an energy input. The organopolysilazane composition comprises an organopolysilazane and a free radical generator in an amount effective to crosslink the organopolysilazane. The energy input capable of generated the radical may be provided in the form of heat, ultraviolet radiation, an electron beam, and the like.The crosslinked organopolysilazane compositions exhibit good thermal behavior and, in particular, can be used, after pyrolysis, as precursors of ceramic products.

Abstract: A resist composition is made resistant to reactive ion etching by admixing therewith a poly(dialkylsilazane).

Abstract: Disclosed is an image-forming material having a high sensitivity to high-energy beams and excellent in dry etching resistance, heat stability and resolution which comprises a copolymer containing a total of 1 to 99 mole-% of at least one of recurring structural units represented by the following formulas [A] and [A'] and 1 to 99 mole-% of at least one recurring structural unit represented by the following formula [B] and having a number-average molecular weight of 500 to 1,000,000: ##STR1## wherein R.sub.1 of the formulas [A] and [A'] represents a hydrogen or halogen atom, or an alkyl group having 1 to 6 carbon atoms, the substituent groups R.sub.

Abstract: A polycarbosilastyrene copolymer which comprises recurring carbosilane units of the formula I: ##STR1## and recurring silastyrene units of the formula II: ##STR2## is useful for producing a shaped sintered silicon carbide article by shaping the polycarbosilastyrene copolymer to a desired form, by applying an ultra-violet ray treatment or heat treatment to the shaped article, and by sintering the resultant cross-linked, non-fusible shaped article at an elevated temperature.

Abstract: The inventive organopolysiloxane composition is curable in two ways, firstly, by the irradiation with ultraviolet light and, secondly, by exposure to a moisture-containing atmospheric air. The principal ingredient of the composition is a diorganopolysiloxane having, in a molecule, at least one isopropenyloxysilyl-substituted ethyl or propyl group bonded to the silicon atom of the polysiloxane chain, which is compounded with a mercaptoalkyl-containing organopolysiloxane, a photosensitizer and, optionally, a curing catalyst for the dealcoholation condensation reaction of the silicon-bonded alkoxy groups under the influence of atmospheric moisture. The composition is advantageous in the improved workability by virtue of the adequate tack-free time or the time taken for surface filming.

Abstract: Homopolymers or copolymers of organometallic, end-capped polyphthalaldehydes containing the repeating unit of formula I ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are each independently of the other hydrogen, halogen, cyano, nitro, carboxyl, hydroxyl, C.sub.1 -C.sub.4 alkoxy, C.sub.1 -C.sub.4 alkylthio or C.sub.1 -C.sub.4 alkoxycarbonyl, and at least one of the substituents R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are a group --Q(R.sup.5).sub.3 or --Q(R.sup.6).sub.3, where Q is Si, Sn, Ge, CH.sub.2 --Si or O--Si, R.sup.5 is C.sub.1 -C.sub.12 alkyl and R.sup.6 is C.sub.6 -C.sub.10 aryl, are suitable for producing dry-developed, plasma-resistant photoresists required for the production of structured images, especially for microelectronics.

Abstract: An organopolysilazane composition that can be crosslinked by an energy input. The organopolysilazane composition comprises an organopolysilazane and a free radical generator in an amount effective to crosslink the organopolysilazane. The energy input capable of generating the radical may be provided in the form of heat, ultraviolet radiation, an electron beam, and the like.The crosslinked organopolysilazane compositions exhibit good thermal behavior and, in particular, can be used, after pyrolysis, as precursors of ceramic products.

Abstract: A method of forming preceramic polymers by mixing (A) an organic polysilane, preferably either a methylpolysilane of the formula [(RSiH).sub.x (RSi).sub.y ].sub.n, (where R is a lower alkyl group having from 1 to about 6 carbon atoms, a cycloalkyl group having from 3 to about 6 carbon atoms, a substituted or unsubstituted lower aryl group having from 6 to about 10 carbon atoms, a tri(lower)alkyl- or di(lower)alkylsilyl group x+y=1, (x and y are each >0 and also x=1, y=0), and n is an integer greater than 1) or a polycarbosilane having repeat units of the formula [R.sup.a Si(H)--(CH.sub.2).sub.q ], [R.sup.a Si(H)--CH.dbd.CH], and [R.sup.a Si(H)--C.tbd.C] (where R.sup.

Abstract: Polyimides which essentially consist of 0.1 to 100 mol % of at least one structural element of the formula I ##STR1## and 99.9 to 0 mol % of at least one structural element of the fomula II and/or III ##STR2## in which and Z' are a tetravalent aromatic radical, Q' is a trivalent aromatic radical, X and X' are a divalent radical of an organic amine are autophotocrosslinkable. They are suitable for the production of protective films and photographic relief images.

Abstract: Block polymer compositions are provided which are useful as positive or negative resists utilizing aryl onium salts in combination with silicone-organic block polymers, such as polydimethylsiloxane-poly-t-butylmethacrylate block polymers. A silicone prepolymer is used in combination with certain polymerizable vinyl monomers such as t-butylmethacrylate. The silicone prepolymer has chemically combined pinacolate groups in the backbone or terminal positions which are capable of generating free-radicals upon thermolysis.

Abstract: The specification describes a composition curable by high-energy radiation in the presence of oxygen which contains conventional monomers, oligomers and/or polymers curable by high-energy radiation besides minor amounts of a natural wax, a solvent extraction product of a natural wax, a wax alcohol, a wax ester and/or a wax carboxylic acid. The specification also describes the preparation of said composition and the use thereof in the formation of coatings.

Abstract: The negative-working photoresist composition of the invention comprises, as the polymeric constituent thereof, a polymeric compound obtained by the anionic living polymerization of a vinylphenyl substituted-vinyl dimethyl silane compound represented by the general formulaCH.sub.2 .dbd.CH--C.sub.6 H.sub.4 --SiMe.sub.2 --CR.sup.1 .dbd.CR.sup.2 R.sup.3,in which Me is a methyl group and R.sup.1, R.sup.2 and R.sup.3 are each a hydrogen atom, methyl group or ethyl group, at least one of the R.sup.1, R.sup.2 and R.sup.3 being not a hydrogen atom, to cause the polymerization only at the styrenic double bond, the other double bond in the same molecule remaining unpolymerized. By virtue of the high density of the double bonds in the polymer molecules, the photoresist composition is highly sensitive to irradiation with actinic rays and capable of giving a patterned photoresist layer having excellent resolving power and resistance against dry etching.

Abstract: A method for cross-linking organopolysilane polymers. The method includes the steps of mixing an organopolysilane with a cross-linking agent to make a reaction mixture. The cross-linking agent includes molecules having at least two carbon-carbon double bonds and a ratio of such bonds to the molecular weight of the molecule of at least 1:150. Radical formation is then induced in the organopolysilane of the reaction mixture to cause formation of a reaction product including cross-linked organopolysilane polymers.

Abstract: A process for the addition of compounds containing silicon-bonded hydrogen to compounds containing aliphatic unsaturation. The process is activated by actinic radiation and is conducted in the presence of a platinum complex having one cyclopentadienyl group that is eta-bonded to the platinum atom and three aliphatic groups that are sigma-bonded to the platinum atom.

Abstract: Novel polymeric photocleavable photoinitiators are prepared by the hydrosilation reaction of an organosilicon hydride grafting agent which has a photoinitiating aromatic-aliphatic ketone derivative of at least one organo group, with a polymer having a plurality of unsaturated olefinic or acetylenic sites in the presence of a hydrosilation catalyst. Preferred polymers are butadiene or alkyl substituted butadiene polymers and copolymers and vinyl functional polyorganosiloxanes. The grafting agents have the formula (hv)--R.sup.8 --R.sup.5 --H wherein (hv) is a photoinitiating aromatic-aliphatic ketone group, R.sup.8 is selected from alkylene, alkenylene, alkylenoxy and oxy groups, and R.sup.5 is selected from ##STR1## the R.sup.6 groups are the same or different organo or halo groups and n is an integer.