Abstract: Provided is an energy ray-curable elastomer composition which can increase the inter-crosslinking point molecular weight without changing the kind of an energy ray-curable compound before cured and which provides an oligomer-cured substance having a braking elongation compatible with a processability, to be specific, an energy ray-curable elastomer composition containing (A) an energy ray-curable compound having a (meth)acryloyl group and (B) a polythiol compound having 2 to 6 mercapto groups in a molecule, wherein a functional group number ratio of the (meth)acryloyl group in the above composition to the mercapto group in the component (B) is 100:0.1 to 100:5n (n is the number of the mercapto group in a molecule of the polythiol compound).

Abstract: An oxetane-cyclic epoxy compound represented by Formula 1: where R1 is hydrogen, a methyl group or an ethyl group.

Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that serves as a base resin. R1 is a monovalent group that includes at least two groups of —CO—, —NH—, —S—, and —SO2—, the at least two groups being each identical or different. A is a divalent hydrocarbon group or a divalent fluorohydrocarbon group having 1 to 5 carbon atoms. R is a fluorine atom or a hydrogen atom. a is an integer from 1 to 4. In a case where a plurality of R are present, each of the plurality of R is either identical or different. M+ is a monovalent cation.

Abstract: A composition including an actinic radiation or thermally curable polyorganosiloxane ionomer having one or more reactive groups, for example, vinyl, acrylate, epoxy groups.

Abstract: The present invention relates to the use of a R—N2+ diazonium salt carrying an aromatic group R, for grafting of the aromatic group onto insulating, semiconductor, binary or ternary compound or composite material surfaces, the diazonium salt being present at a concentration close to its solubility limit, notably at a concentration higher than 0.05 M, and preferably varying between approximately 0.5 M to approximately 4 M.

Abstract: The use of at least one diazonium salt bearing an initiator function, for forming an undercoat obtained by grafting a graft derived from the diazonium salt and bearing an initiator function at the surface of a conductive or semiconductive material on the undercoat, and for forming on the undercoat a polymeric layer obtained by polymerization, in particular free radical polymerization, in situ of at least one monomer, initiated from the initiator function.

Abstract: An ultraviolet curable resin composition, which comprises a cationic photopolymerization initiator (B) and a urethane prepolymer (A) having a structure represented by the general formula (1); (wherein R1 and R2 each independently represent an alkylene group, R3, R4 and R5 each independently represent an alkyl group or hydrogen atom, R6 and R7 each independently represent an alkylene group having 2 to 4 carbon atoms, a represents 0 or 1, and b and c each independently represent an integer of 0 to 10).

Abstract: A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.

Abstract: The present invention provides a curable composition comprising a compound having a partial structure represented by the following formula (I) and a partial structure represented by the following formula (II): wherein in formula (I), A represents a group capable of forming a four- or more-membered bivalent alicyclic alkyl group with neighboring carbon atoms; and in formula (II), R1 represents an alkylene, a cycloalkylene, or an arylene group, and n represents an integer of 1 or more.

Abstract: The present invention provides an ink composition, and inkjet recording method, a printed material, a production method of a planographic printing plate, and a planographic printing plate. The ink composition of the present invention contains a cationically polymerizable compound, a compound that generates an acid when irradiated with a radiation ray, and an onium salt compound that generates an organic acid compound having a basic nitrogen atom when irradiated with a radiation ray.

Abstract: Disclosed is a photosensitive resin composition. The composition comprises [A] an alkali-soluble resin, [B] a photoactive compound and [C] a solvent. The alkali-soluble resin is a copolymer including at least one structural unit with an aziridine group. The composition exhibits good storage stability, high sensitivity, high UV transmittance, high residual film ratio, improved coating uniformity and excellent pattern-forming properties. Further disclosed is an organic insulating film formed using the composition. The organic insulating film has excellent resistance to solvents and chemicals.

Abstract: An ultraviolet-curable silicone composition for a release paper including (A) 100 parts by mass of a specific organopolysiloxane having a polymerization degree of 8 to 20 and containing one epoxy group, and (C) an effective quantity of an onium salt photoinitiator. In a preferred embodiment, the composition further includes (B) 10 to 1,000 parts by mass of at least one specific organopolysiloxane containing a plurality of epoxy groups. In another preferred embodiment, the composition has a viscosity of not more than 100 mPa·s. The composition has a peel strength that exhibits a positive dependency on the peel speed when peeled from a hot-melt pressure-sensitive adhesive, and can therefore be used to produce a release paper capable of reducing peeling noise. Further, because the composition has a low viscosity, it exhibits excellent wetting of substrates having significant unevenness, even in a solventless form.

Abstract: A photosensitive adhesive composition of the polymerizable resin type, the hardening of which occurs by polymerization and/or reticulation, includes:—initiators for at least one chain polymerization reaction to guarantee the hardening of the composition and a sufficient quantity of at least one bifunctional monomer, including a photolabile center with at least one photolabile entity and at least two polymerizable units, connected by covalent skeletons to the photolabile center and located away from the cleavage sites of the photolabile center, such that the composition loses the integrity and adhesivity thereof under the influence of a reticulating radiation causing the cleavage of the photolabile sites. The composition is particularly of application in dentistry.

Abstract: An ultraviolet curable lubricious coating including at least one lubricious polymer and at least one oxygen-insensitive crosslinkable polymer, methods of making and using the same, and articles coated therewith.

Abstract: A new underlayer composition that exhibits high etch resistance and improved optical properties is disclosed. The underlayer composition comprises a vinyl or acrylate polymer, such as a methacrylate polymer, the polymer comprising at least one substituted or unsubstituted naphthalene or naphthol moiety, including mixtures thereof. Examples of the polymer of this invention include: where each R1 is independently selected from an organic moiety or a halogen; each A is independently a single bond or an organic moiety; R2 is hydrogen or a methyl group; and each X, Y and Z is an integer of 0 to 7, and Y+Z is 7 or less. The organic moiety mentioned above may be a substituted or unsubstituted hydrocarbon selected from the group consisting of a linear or branched alkyl, halogenated linear or branched alkyl, aryl, halogenated aryl, cyclic alkyl, and halogenated cyclic alkyl, and any combination thereof.

Abstract: The present invention relates to novel polymeric compositions that exhibit Reverse Thermal Gelation (RTG) properties for use as Support Materials (SM) in the manufacture of three-dimensional objects. These polymers are Temperature Sensitive Polymers that respond with a significant change of properties to a small change in temperature. Temperature Sensitive Polymers exhibit cloud point (CP) or lower critical solution temperature (LCST) in aqueous solutions. Water-soluble Temperature Sensitive Polymers are chosen to give low viscosity liquid at low temperature when dissolved in water and by that to permit easy dispensing at low temperature. Raising the temperature above their gelation temperature (Tgel) will result in solidification of the composition. At its gel position the material has favorable characteristics as a support and building material. The gel layers have the appropriate toughness and dimensional stability to support the model layers during the building process.

Abstract: A photo-crosslinkable polyolefin composition comprises a polyolefin, a source of functionality receptive to crosslinking by UV radiation, a cationic photoinitiator and optionally includes a free-radical photoinitiator, a crosslinking accelerator or sensitizer, and other additives such as compatibilizers, inorganic fillers, nanofillers, glass, polymeric and ceramic microspheres, glass fibres, flame retardants, antioxidants, stabilizers, processing aids, foaming agents and pigments. A method for manufacturing a UV-crosslinked polyolefin article comprises forming an article by extruding, moulding or otherwise forming the UV-crosslinkable polyolefin composition and subjecting the article to UV radiation on-line with the extrusion, moulding or other forming operation.

Abstract: The present invention provides visible light sensitive and ultraviolet (UV) light sensitive composition for DNA transfer comprising acid sensitive polyacetals developed as DNA/RNA delivery agents, a photoacid generator and optionally a photosensitizer.

Abstract: A single- or multi-photon reactive composition comprises a liquid polysilazane precursor, a multifunctional acrylate additive, and a single- or multi-photon photocuring composition. The invention can be used to provide ceramic-based microstructures as, for example, high temperature resistant materials, including devices such as microcombustors, micro-heat-exchangers, sensor and actuator systems, microfluidic devices, and micro-optics systems that can be used independently or integrated into other systems.

Abstract: Reactive adhesive compositions that can be activated with actinic radiation, manipulated for an extended time and then cured thermally are disclosed. The prepolymer mixture for the reactive adhesive contains a catalyst component and a monomer/oligomer component. The monomer or oligomer is chosen from oxetane monomers, oxirane monomers, oxetane oligomers and oxirane oligomers. The oxirane monomers and oligomers have at least one oxygen or sulfur of an ether or thioether in a position two or three carbons removed from the oxygen of the oxirane.

Abstract: Actinic ray curable inks is disclosed. The ink contains at least one kind of epoxidized fatty acid ester or epoxidized fatty acid glyceride, as well as by further containing an oxetane compound, a cation polymerization initiator and a colorant.

Abstract: A radiation-curable fiber optic coating composition for an inner primary coating includes a coloring agent, preferably a dye or a dye precursor, compatible with the fiber of the fiber optic and capable of imparting a pre-selected color to the inner primary coating, or another coating. The coloring agent can be a reactive dye. Any of the dyes preferably is stabilized by a stabiliser in the colored coating layer, or, preferably, in a more exterior layer.

Abstract: Described is a coating composition adapted to enhance the adhesion of a polymeric coating or film applied to a substrate. The coating composition is interposed between the substrate and the polymeric coating and comprises (a) at least one coupling agent, partial hydrolysates thereof or mixtures thereof in a concentration greater than 25 weight percent, based on the weight of the total composition, and (b) an adhesion enhancing amount of an epoxy-containing material having at least two epoxy groups. The coating composition is substantially free of photochromic materials and colloidal particles chosen from silica, alumina or mixtures thereof. Also described is a process for using the coating composition and articles coated with the composition and additional coatings and films which can be photochromic.

Abstract: Compositions that can be photopolymerized by a cationic initiator at an accelerated rate include at least one epoxy monomer, at least one cationic photoinitiator, and a photosensitizer/accelerator. The accelerator is a phenolic resole, or a compound having a structure according to the formula R1(CR2R3OH)n, wherein R1 is selected from phenyl, polycyclic aryl, and polycyclic heteroaryl, each optionally substituted with one or more electron donating group substituted phenyl; R2 and R3 are independently selected from hydrogen, alkyl, aryl, alkylaryl, substituted alkyl, substituted aryl and substituted alkylaryl; and n is an integer from 1 to 10.

Abstract: Disclosed is a gas-generating, pressure-sensitive adhesive composition comprising a pressure-sensitive, ultraviolet irradiation-curable adhesive (A) containing a photoinitiator, wherein the adhesive (A) transmits therethrough an ultraviolet radiation, and a gas generator compound (B) which generates a gas upon irradiation thereof with an ultraviolet radiation, wherein the gas generator compound (B) is operably combined with the pressure-sensitive, ultraviolet irradiation-curable adhesive (A), so that, in operation, when the gas-generating, pressure-sensitive adhesive composition which is adhered to an adherend is irradiated with an ultraviolet radiation, the gas generator compound (B) generates a gas and the gas effuses at an interface between the gas-generating, pressure-sensitive adhesive composition and the adherend to thereby facilitate release of the adherend from the gas-generating, pressure-sensitive adhesive composition.

Abstract: An acid generating agent useful for imaging photosensitive elements selected from compounds of formulae (I), (II) and (III). wherein R1 is selected from the group consisting of an unsubstituted and substituted hydrocarbon or aryl group; wherein X is selected from the group consisting of oxygen, sulfur and selenium; wherein Y is selected from the group consisting of sulfur, selenium and tellurium; wherein Ar1 is selected from the group consisting of an unsubstituted and substituted aryl group; wherein R2, R3 and R4 are individually selected from the group consisting of an unsubstituted and substituted hydrocarbon or aryl group or any two of them are bonded together to form a ring structure; and wherein R5 and R6 are individually selected from the group of an unsubstituted and substituted hydrocarbon or aryl group, or are bonded to each other to form a ring structure.

Abstract: Disclosed are UV absorbers that contain a labile functional group capable of initiating free radical polymerization.

Abstract: A cationic photocatalyst composition and a photocurable composition utilizing cationic polymerization are provided which can present sufficient open time and adhesion. The cationic photocatalyst composition contains a photosensitive onium salt and a compound represented by the following formula (1). The photocurable composition contains the cationic photocatalyst composition and an epoxy compound having at least one epoxy group per molecule. Formula (1) [Compound B] (wherein R and R′ are suitably selected from hydrogen, halogen, saturated hydrocarbon groups, unsaturated hydrocarbon groups, substituting groups comprising any suitable combination of elements such as carbon, hydrogen, oxygen, nitrogen and sulfur; and l and n each is an integer of 2 or larger).

Abstract: A radiation-sensitive patterning composition comprising:

Abstract: A radiation-curable fiber optic coating composition for an inner primary coating includes a coloring agent, preferably a dye or a dye precursor, compatible with the fiber of the fiber optic and capable of imparting a pre-selected color to the inner primary coating, or another coating. The coloring agent can be a reactive dye. Any of the dyes preferably is stabilized by a stabiliser in the colored coating layer, or, preferably, in a more exterior layer.

Abstract: A composition suitable for use in dental medicine and/or dentistry polymerizable by cationic polymerization consists of one or more epoxy compounds, a plasticizer, a catalyst for hardening by ring opening, a catalyst for hardening by light and an accelerator consisting of a non alkaline tertiary amine. At radiation with a light having a wavelength of 340-500 nm the composition hardens practically free of contraction and adhesiveness.

Abstract: The invention disclosed includes a coating composition for siliceous surfaces. The coating includes at least one component from the group consisting of poly(alkoxy)silane, poly(halo)silane, alkoxysilane, halosilane, and mixtures thereof and a catalyst compound which generates a proton to hydrolyze the component when exposed to radiation. Preferably, the catalyst is a photo-acid. The invention also includes a method of coating the optical fiber. The aforementioned coating is applied to an exterior surface of the fiber. A proton is generated to promote the hydrolysis of the component. The invention further includes a method of accelerating adhesion between the exterior surface of the article and the coating. The inventive coating is applied to the surface of the fiber and the coating is exposed to a radiation source.

Abstract: A positive photoresist composition for exposure to a far ultraviolet ray which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, (B) a resin which contains a repeating unit corresponding to hydroxystyrene and solubility of which increases in an alkaline developing solution by the action of an acid, and (C) (1) at least one solvent selected from the group consisting of propylene glycol monomethyl ether acetate and propylene glycol monomethyl ether propionate, and (2) at least one solvent selected from the group consisting of propylene glycol monomethyl ether and ethoxyethyl propionate. The positive photoresist composition of the present invention is suitable for exposure to a far ultraviolet ray, particularly a KrF excimer laser beam, is improved in line edge roughness and micro grain, is excellent in uniformity of carting on a substrate and has less particles in its resist solution.

Abstract: Provided is a positive photoresist composition which comprises (A) a resin which contains a repeating unit represented by formula (I) shown below and a repeating unit represented by formula (II) shown below and whose solubility in an alkaline developing solution increases by the action of an acid and (B) a compound which generates an acid upon irradiation with an actinic ray or radiation, wherein R1, R2 and R3 each independently represents an alkyl group, a haloalkyl group, a halogen atom, an alkoxy group, a trialkylsilyl group or a trialkylsilyloxy group; and n represents 0 or 1, wherein M represents an atomic group necessary for forming an alicyclic structure, which may be substituted, together with the connected two carbon atoms (C—C); and R11 and R12 each independently represents a hydrogen atom, a cyano group, a halogen atom or an alkyl group which may be substituted.

Abstract: The present invention provides a polymerizable composition comprising (a) an alicyclic alkane having at least one oxetanyl group and at least one epoxy group within the same molecule and (b) a compound capable of initiating cationic polymerization under irradiation of an active energy ray and/or under heat exhibits high activity in the photo- or heat-cationic ring-opening polymerization exhibiting high activity, e.g., rapid polymerizability, rapid curability, under irradiation of an active energy ray and/or under heat. The present invention also provides a polymerization product thereof.

Abstract: In order to offer coatings with improved resistance to solvents which can be prepared by cationic polymerization under irradiation, the choice is made of a composition comprising at least one monomer, oligomer or polymer of general formula (I): in which: A1 is chosen from polyester blocks, polyurethane blocks, hydrocarbon-comprising backbones of mono- or polycarboxylic acid and addition products of a polycarboxylic acid and of a cycloaliphatic diepoxide, m is a number from 1 to 6, R1 is a cycloaliphatic group carrying a hydroxyl group situated in the a position with respect to the oxygen atom to which R1 is bonded, R2 is a second cycloaliphatic group carrying an oxirane group situated at the chain end, and B is chosen from one or more covalent bonds, an oxygen atom and linear, branched or cyclic hydrocarbon-comprising radicals.

Abstract: A photosensitive resin composition comprising an aromatic polyimide precursor, wherein a 10 &mgr;m thick layer of precursor has light transmittance at a wavelength of 365 nm of at least 1% and a 10 &mgr;m thick polyimide film made from the resin composition by imidation ring closure and deposited on a silicon substrate results in a residual stress of at most 25 MPa. The composition can be patterned through i-line exposure followed by development with alkaline solutions, and can be imidized into low-stress polyimide patterns. Electronic components having the polyimide patterns have high reliability.

Abstract: A positive photoresist composition which comprises (A) a resin having a group which decomposes by the action of an acid to increase solubility in an alkaline developing solution, and (B) a compound which generates an aliphatic or aromatic carboxylic acid substituted with at least one fluorine atom upon irradiation with an actinic ray or radiation.

Abstract: Vinyl ether compounds having the formula: R—O—X—O—CH═CH2 wherein R is a radical having the formula: R1—CFH—CF2— or R1—CF═CF—, wherein R1 is an unsubstituted or substituted aliphatic radical, unsubstituted or substituted cyclic aliphatic radical, an unsubstituted or substituted aromatic radical, an unsubstituted or substituted araliphatic radical, or an unsubstituted or substituted heterocyclic radical, and X is an unsubstituted or substituted aliphatic radical, an unsubstituted or substituted cyclic aliphatic radical, unsubstituted or substituted aromatic radical, unsubstituted or substituted araliphatic radical or an unsubstituted or substituted heterocyclic radical. Curable compositions containing the vinyl ether compounds and methods in which the substrate coating layers of the vinyl ether compositions are cured, particularly on optical devices, are also disclosed, as well as polymers polymerized from the vinyl ether compounds.

Abstract: A positive photoresist composition comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, (B) a resin which is insoluble or sparingly soluble in alkali but becomes soluble in alkali by the action of an acid, and (C) a nitrogen-containing compound containing at least one partial structure represented by formula (I) shown below in its molecule: 1

Abstract: A positive photoresist composition for exposure to a far ultraviolet ray which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, (B) a resin which contains a repeating unit corresponding to hydroxystyrene and solubility of which increases in an alkaline developing solution by the action of an acid, and (C) (1) at least one solvent selected from the group consisting of propylene glycol monomethyl ether acetate and propylene glycol monomethyl ether propionate, and (2) at least one solvent selected from the group consisting of propylene glycol monomethyl ether and ethoxyethyl propionate. The positive photoresist composition of the present invention is suitable for exposure to a far ultraviolet ray, particularly a KrF excimer laser beam, is improved in line edge roughness and micro grain, is excellent in uniformity of carting on a substrate and has less particles in its resist solution.

Abstract: A positive acting, photoimageable composition having, a photoacid generator capable of generating an acid upon exposure to actinic radiation, an organic acid anhydride polymer, an epoxy, a nitrogen-containing curing catalyst, and an optional phenol-containing monomer or polymer. A photographic element has this composition coated and dried on a substrate. A positive acting image is produced by imagewise exposing the element to actinic radiation, optionally postbaking and development with a liquid developer.

Abstract: Described is a process for producing an adherent organic polymeric layer on organic polymeric substrates following the steps of (a) treating the surface of the polymeric substrate to provide reactive groups; (b) applying to the treated surface a polymerizable composition of a surface modifying amount of an organofunctional silane, a catalyzing amount of material which generates acid upon exposure to actinic radiation, and a solvating amount of solvent; (c) exposing the coated surface to an adhesion improving amount of actinic radiation; and (d) applying and curing a photochromic or non-photochromic polymer-forming composition on the coated surface. Also described are articles produced by the process.

Abstract: An electronic package assembly where a low profile integrated circuit chip package is soldered to an organic (e.g., epoxy resin) substrate, e.g., a printed circuit board or card, the projecting conductive leads of the integrated circuit chip package and the solder which substantially covers these leads (and respective conductors on the substrate) having been substantially covered with ultraviolet photocured encapsulant material (e.g., an epoxy resin or a cyanate with a photoinitiator and silica) to provide reinforcement for the solder-lead connections. The encapsulant material is dispensed about the solder and lead joints following solder reflow and solidification so as to substantially surround the solder and any portions of the leads not covered with solder.

Abstract: An epoxy resin composition according to the present invention is one initiating cationic polymerization upon irradiation with energy rays. The epoxy resin composition is formed of at least bisphenol epoxy resin (A) as an active ingredient, epoxy resin (B) shown in the following formula and cationic polymerization catalyst (C).

Abstract: A copolymer of maleimide derivative and acrylic acid, represented by Formula I, is of high etch resistance and thermal resistance and can be used for photoresist in submicrolithography.

Abstract: A coating formulation suitable for use in preparing thermal transfer ribbons is provided which is curable by UV radiation or visible light. The coating formulation forms thermal transfer layers that produce printed images when used in a thermal transfer printer. The coating formulation comprises a photoreactive monomer or oligomer, a photoinitiator and a sensible material. Also provided are printers which use these ribbons and processes for preparing them.

Abstract: An ionic compound comprising at least one group A.sup.+ X.sup.-, comprising:a cationic group A.sup.+ selected from the group consisting of biaryliodonium, arylsulfonium, arylacylsulfonium, diazonium and organometallic cations comprising a transition metal complexed with at least one unsaturated cyclic compound comprising 4-12 carbon atoms, said cationic group being part of a polymer chain; whereinX.sup.- is an imide anion, [FSO.sub.2 NSO.sub.2 R'.sub.F ].sup.- or [R.sub.F CH.sub.2 OSO.sub.2 NSO.sub.2 R'.sub.F ].sup.- or [(R.sub.F).sub.2 CHOSO.sub.2 NSO.sub.2 R'.sub.F ].sup.-, or a methylide anion [FSO.sub.2 C(Q)SO.sub.2 R'.sub.F ].sup.-, or a [R.sub.F CH.sub.2 OSO.sub.2 C(Q)SO.sub.2 R'.sub.F ].sup.- or [(R.sub.F).sub.2 CHOSO.sub.2 C(Q)SO.sub.2 R'.sub.F ].sup.31 .

Abstract: A method of generating reactive species which includes exposing a photoreactor composition to radiation, in which the photoreactor composition comprises a wavelength-specific sensitizer associated with one or more reactive species-generating photoinitiators. Also described are methods of polymerizing unsaturated monomers and curing an unsaturated oligomer/monomer mixture.

Abstract: In the preparation of a rubber-modified molding material, in a first stage, a first mixture (A) contains at least one alkyl acrylate or methacrylate (a) of the formula (I) ##STR1## where R.sup.1 is hydrogen or methyl and R.sup.2 is alkyl of 1 to 32 carbon atoms, at least one first monomer (b) which forms free radicals on thermal decomposition and, if required, a second monomer (c) or a plurality thereof is polymerized, preferably with free radicals, to give a rubber (B),in a second stage, the resulting rubber (B) is mixed with a third monomer (d) or a plurality thereof, preferably dissolved or swollen therein, to form a second mixture (C), andin a third stage, the second mixture (C) is polymerized with free radicals to give the rubber-modified molding material (D).