Abstract: Cationically curable adhesives and sealants with increased viscosities and improved rheological control and good storage stability are prepared using a cationically curable monomer and a thickening polymer which is the alkylation reaction product of poly(4-hydroxystyrene) or poly(2-hydroxystyrene) with a compound RX where R is allyl, methallyl, crotyl or prenyl and X is Cl, Br or I. The cationically curable monomer suitably includes at least one alkenyloxystyrene monomer. Such thickened adhesives are useful as edge sealants for flat panel display devices. A-stage curing of the adhesive with UV irradiation allows for near ambient temperature fixturing of the device assemblies and B-stage thermal curing of the adhesive can be conducted at much lower temperatures than are needed for glass frit sealants. The B-stage cured products have thermal resistance, outgassing and substrate adhesion properties adequate for flat panel display devices.

Abstract: An active energy ray-curable resin composition, particularly an active energy ray-curable coating composition, both comprising:(A) a resin having oxetane functional groups and epoxy groups in the molecule, and(B) a photo-induced cationic polymerization initiator.

Abstract: The invention relates to a positive-working radiation-sensitive mixture containing a) a polymeric binder having acid-labile groups and b) a compound which forms a strong acid on irradiation, in which the binder simultaneously contains units of the formulae I, II and IIIR.sup.1 --OH (I),R.sup.1 --O--CO.sub.2 R.sup.2 (II)R.sup.1 --O--CH.sub.2 --CHR.sup.3 --OH (III).The mixture is used to coat radiation-sensitive recording material which can be used to produce printing plates and photoresists.

Abstract: A photosensitive resin composition comprising the following components (A), (B) and (C): (A) a photopolymerizable urethane (meth)acrylate compound containing at least two acryloyl or methacryloyl groups, (B) an alkali-soluble polymer compound having an acid value of from 50 to 250 mgKOH/g, and (C) a photopolymerization initiator, wherein the photosensitive resin composition has an electrical insulation resistance of 8.0.times.10.sup.9 to 1.0.times.1.0.sup.14 .OMEGA..multidot.cm after photocuring. A photosensitive resin laminated film comprising a flexible film, a photosensitive layer provided on the flexible film, and a releasable film layer provided on the photosensitive layer, wherein the photosensitive layer comprises the above photosensitive resin composition.

Abstract: Silicone release agents comprising propenyl-ether functionalized silicones exhibit a rapid cationic induce photo-cure. Such propenyl-ether functionalized silicones are synthesized by the hydrosilation of various .alpha.-allyloxy-.omega.-(1-propenoxy) alkanes with various linear and cyclic hydrogen functional siloxanes.

Abstract: The present invention relates to a negative-working photosensitive composition comprising a diazonium compound and a polymer binder, said polymer binder being:(1) an AB type, ABA type or BAB type block copolymer of:(i) a block (A) having a unit having the following formula (I): ##STR1## and (ii) a block (B) having a unit (II) which having the following formula and being free from unit (I): ##STR2## or (2) a block copolymer obtained by subjecting to radical polymerization.(i) an azo group-containing polyurethane (C) which contains a unit (C1) having the following formula (III) and a unit (C2) having the following formula (IV) in the molecule and which has a weight-average molecular weight of 2,000-200,000; and(ii) a polymerizable monomer having the following formula (I').--R.sup.7 --NH--CO--O--R.sup.8 --N.dbd.N --R.sup.8 --O--CO--NH--(III)--R.sup.9 --NH--CO--O--R.sup.

Abstract: The present invention discloses stabilizers for formulations containing photoacid precursors and cationically polymerizable materials. The stabilizers have a limited solubility in the formulations and are in solubility equilibrium in the formulation. The stabilizers being present as a solid phase in the formulation in excess of their solubility limit, the concentration of the stabilizers is continuously replenished as the stabilizer reacts with undesired free acid.

Abstract: The present invention relates to a radiation curable silicone release coating composition comprising an alicyclic epoxy-functional silicone graft copolymer and a photocuring catalyst. The release coatings of this invention upon curing by exposure to UV light form release films that are highly adhesive for a variety of substrates, have an excellent coatability, and its release resistance can be adjusted over a wide range of values.

Abstract: The invention relates to a positive-working radiation-sensitive mixture containing a) a polymeric binder having acid-labile groups and b) a compound which forms a strong acid on irradiation, in which the binder simultaneously contains units of the formulae I, II and IIIR.sup.1 --OH (I) ,R.sup.1 --O--CO.sub.2 R.sup.2 (II)R.sup.1 --O--CH.sub.2 --CHR.sup.3 --OH (III).The mixture is used to coat radiation-sensitive recording material which can be used to produce printing plates and photoresists.

Abstract: Epoxysilicone polymers partially or completely functionalized by a fluorescent, photo-sensitizing, or simultaneously fluorescing and photo-sensitizing substituent bonded to the silicone polymer by means of a carbon oxygen carbon bond provide fluorescent dye marking compounds for silicone compositions that are particularly useful in determining the quality of release coatings made therewith.

Abstract: Acid-sensitive polymers and imageable articles employing them are disclosed. In particular, photosensitive compositions are disclosed comprising: (a) a photoinitiator which generates an acid upon exposure to radiation; and (b) a polymer having acid labile groups pendant from the polymer backbone, said acid labile pendant groups comprising at least one each of A and B wherein A has the formula --T-(C.dbd.O)OCR.sup.1 R.sup.2 OR.sup.3, and B has the formula --T-(C.dbd.O)OR.sup.4 Si(R.sup.5).sub.3, wherein R.sup.1 and R.sup.2 each represent H or an alkyl group with the proviso that at least one of R.sup.1 and R.sup.2 must be hydrogen; R.sup.3 represents an alkyl group; or any two of R.sup.1, R.sup.2, and R.sup.3 may together form a ring group having from 3 to 36 carbon atoms; R.sup.5 represents an alkyl group, aryl group, an alkoxy group, an aryloxy group, an acyloxy group, or a trialkylsiloxy group; and R.sup.4 and T represents a divalent linking group wherein T is bonded to the polymer backbone and R.sup.

Abstract: The invention relates to monomers of the formulae R.sup.1 -SO.sub.2 -N(CO-OR.sup.2)-R3-O-CO-CR.sup.4 =CH.sub.2 and R.sup.1 -N(CO-OR.sup.2) -SO.sub.2 -R.sup.3 -O-CO-CR.sup.4 =CH.sub.2, in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, C.sub.3 -C.sub.11) alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) -R.sup.3 -N(CO-OR.sup.2)-SO.sub.2 -R.sup.1 (I) and/or -R.sup.3 -SO.sub.2 -N(CO-OR.sup.2)-R.sup.

Abstract: A photosensitive composition which comprises, as essential components:(A) a polymer having carboxyl group(s) and hydroxyphenyl group(s), or (A') a polymer having carboxyl group(s) and (A") a polymer having hydroxyphenyl group(s),(B) a compound having at least two vinyl ether groups in the molecule, and(C) a compound which generates an acid when irradiated with an actinic ray, and which is useful as a positive type photoresist having high resolution and excellent formability of fine image pattern, a material for printing, etc.; and a process for pattern formation using said composition.

Abstract: The present invention relates to an improved chemically amplified photoresist composition comprising (i) a photosensitive acid generator and (ii) a polymer comprising the reaction product of hydroxystyrene with acrylate, methacrylate or a mixture of acrylate and methacrylate.

Abstract: A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1): ##STR1## wherein R.sup.1 represents a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.2 represents --OR.sup.3 or --NR.sup.4 R.sup.5 in which R.sup.3 is a hydrogen atom, a straight-chain alkyl group, a cyclic alkyl group, an aryl group, an aralkyl group, a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.4 and R.sup.5, which may be the same or different, are hydrogen atoms, straight-chain alkyl groups, cyclic alkyl groups, aralkyl groups or aryl groups, and (B) a radiation-sensitive acid forming agent.

Abstract: The present invention provides a photo-setting conductive coating composition which is used as an antistatic material constituting articles wherein static electrification must be avoided, such as storage vessels for semi-conductor wafers, electronic/electric parts, floor/wall coverings for a production factory of semi-conductors, etc.The photo-setting conductive coating composition comprising 100 parts by weight of an antimony oxide-containing tin oxide powder (a) having a particle size of 0.01 to 0.4 .mu.m, 10 to 100 parts by weight of a (meth)acrylate compound (b) having at least two (meth)acryloyl groups in a molecule, 10 to 100 parts by weight of an acetal resin (c) having a residual hydroxyl group of 20 to 80 molar %, 0.1 to 10 parts by weight of a photopolymerization initiator (d) and 100 to 1000 parts by weight of an organic solvent (e).

Abstract: A silicone composition capable of being cured by both a moisture-curing mechanism and an ultraviolet (UV) curing mechanism is provided. The silicone composition comprises:1 a reactive organosiloxane prepared by a condensation reaction of a silicone (1) represented by the general formula ##STR1## where R.sup.1 and R.sup.2 are each an organo group, and a is a number corresponding to a kinematic viscosity of 25-50,000 cSt, measured at 25.degree. C., with a vinyl ether silane compound represented by the general formula: ##STR2## where m and n are each an integer of 1 to 5, R.sup.3 and R.sup.4 are each an alkyl group having 1 to 3 carbon atoms or allyl, and b is 0 or 1;2 0-70 parts by weight of a silicone oil having trimethylsilyl group as an end group;3 a catalytic amount of a photopolymerization catalyst; and4 a catalytic amount of a silicone moisture-curing catalyst.

Abstract: Radiation sensitive compositions, processes for using the compositions, and articles of manufacture comprising the compositions. The photoimageable compositions of the invention comprises a radiation sensitive component, a resin binder and a polybutadiene that comprises one or more internal epoxide groups. In preferred aspects, the compositions of the invention further comprise a crosslinking agent such as a melamine or an epoxidized material, or mixtures thereof.

Abstract: A novel siloxane polymer having at least 1 mol % of a structural unit derived from a cyclic heat addition product between a diene compound of formula (I) or (II) and an olefin or acetylene compound of formula (III), (IV) or (V): ##STR1## and a positive working light-sensitive composition comprising the siloxane polymer.

Abstract: A photosensitive composition comprising a sensitizing amount of light-sensitive diazonium compound and a polyurethane resin binder in an amount sufficient to improve physical property of the composition, wherein said polyurethane resin has at least one group selected from a phosphonic acid group, a phosphoric acid group and ester groups thereof in an amount sufficient to improve adhesion to a support. The photosensitive composition of the present invention provides an excellent adhesion to a support, an excellent developability with an aqueous alkali developer, and a high printing durability.

Abstract: Compositions for photocurable coatings are disclosed. The compositions comprise (a) an epoxidized vegetable oil, (b) a low molecular weight epoxy resin, (c) a photoinitiator for cationic polymerization and (d) a wax. Processes for making and using the coatings are also disclosed as are containers coated according to the invention.

Abstract: A light-sensitive composition comprising a diazonium compound and a polymer binder wherein the polymer binder comprises structural units represented by the following formula (I); ##STR1## wherein X represents a single bond, an ester bond or an amide bond; and Y represents a polymer group comprising structural units represented by the following formula (II); ##STR2## where Z represents ##STR3## R.sup.1 and R.sup.3 represent hydrogen atom or methyl group; R.sup.2 and R represent a single bond or a divalent bridging group; and R.sup.5 and R.sup.6 represent hydrogen atom or optionally substituted hydrocarbon group having 1 to 15 carbon atoms; and R.sup.7 represents an optionally substituted hydrocarbon group having 1 to 15 carbon atoms. The present light-sensitive composition exhibits extremely enhanced sensitivity and hence gives sufficient image formation with a short light exposure time.

Abstract: A radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture comprises a polymer having appendent azide-substituted aromatic ester groups and sulphonyl urethane groups. The radiation sensitive compound is produced by a process in which some hydroxyl and/or epoxide groups of a polymer are reacted with an azide substituted carboxylic acid or ester forming derivative thereof, and some hydroxyl groups are reacted with a sulphonyl isocyanate.

Abstract: A cationically initiated curable resin system is provided using polyester dicyclopentadiene oligomer blended with monomer having vinyl ether end groups and a cationic initiator. A process for preparing the resin system and a process of coating are also provided.

Abstract: A photopolymerizable composition comprises a photopolymerizable ethylenically unsaturated compound having at least two terminal ethylene groups, a photopolymerization initiator and an organic polymer binder, wherein the photopolymerization initiator is an aromatic sulfonic acid salt of an onium compound. The composition has high sensitivity to actinic rays over a wide range of wavelength extending from ultraviolet to visible region and thus can be used for preparing a lithographic printing plate, a resin-letterpress plate, a resist or photomask for making a printed board, a monochromatic and colored sheet for transfer or color-development and a color-developing sheet.

Abstract: An optical molding composition is used for casting and does not cause irritation to the skin or possess a bad smell. This composition comprises1. an actinic radiation-curable, radical-polymerizable organic compound comprising(1) one or more polythiol compounds and(2) one or more polyene compounds each having at least two actinic radiation-reactive carbon-to-carbon double bonds in the molecule, and2. an actinic radiation-sensitive radical polymerization initiator.

Abstract: Disclosed is a graft polymer comprising a polyurethane graft backbone and grafted-on chains comprising vinyl alcohol units and units with lateral styrylpyridinium or styrylquinolinium groups, and also a photocurable mixture comprising the graft polymer and a photosensitive compound, such as a photosensitizer of a negative-working diazo compound. The mixture is suited for the production of printing plates, in particular planographic printing plates, and photoresists. Printing plates prepared from the mixture are distinguished by high photospeed, good developability with aqueous solutions and long print runs.

Abstract: Acid sensitized photoresists with enhanced photospeed are provided. The photoresist compositions include a polymer binder and/or a polymerizable compound and an acid sensitive group which enables patterning of the resist composition, and acid generating photoinitiator, and an hydroxy aromatic compound which enhances the speed of the resist composition under imaging radiation.

Abstract: A radiation sensitive mixture suitable for producing relief patterns contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation,wherein the polymeric binder (a) contains from 5 to 35 mol % of monomer units having acid labile groups as copolymerized or cocondensed units or acid labile groups introduced by polymer analaogous reaction.

Abstract: A new polymer family is shown for use in high sensitivity, high resolution photoresists. A liquid apply resist includes a polymer binder of t-butyl methacrylate/methylmethacrylate/methacrylic acid and an initiator which generates acid upon exposure to radiation.

Abstract: This invention relates to carbazole diazonium salts which are used in pre-polymer or polymer compositions as sources of photoinitiated strong acids in such developments as imaging films where strong acids are needed to effect polymerization of the film or to remove protective groups.

Abstract: Radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture is based on a polymer including a plurality of structural units represented by the formula: ##STR1## in which, R represents H or CH.sub.3 ; each R.sub.1, which may be the same or different represents H or alkyl; R.sub.2 represents a single bond or a substituted or unsubstituted divalent radical; Ar represents a substituted or unsubstituted divalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or NH; A represents an anion; Y represents a carbonyl oxy or aromatic radical; and n is an integer equal to or greater than 1.

Abstract: A photosensitive composition is described, which contains a diazonium salt polycondensation product and a polymeric binder which is soluble or at least swellable in aqueous-alkaline solutions and comprises a reaction product of a trimellitic anhydride, the free carboxyl group of which is esterified with an alcohol containing a urethane group, with a polymer containing hydroxyl groups and having no further functional groups capable of reaction with acid anhydrides. The composition yields an increased print run and has, at the same time, good storability and developability.

Abstract: Photoresist compositions suitable for deep UV and excimer laser lithography are disclosed that are mixtures of a photoacid and a polymer having imide residues to which acid labile groups are attached. These compositions provide high resolution, high contrast and high sensitivity in the deep UV (wavelength of 250-300 nm), mid-UV (wavelength of 300-350 nm) or conventional (wavelength of 350-450 nm) exposure bands. The compositions are also suitable for exposure at wavelengths commonly associated with excimer laser sources (248, 308 nm) or for exposure by X-radiation.In the compositions disclosed, the imide group ##STR1## can be blocked with certain groups, X, to form compounds containing the structure ##STR2## which have solubility properties different from the unblocked imide. These groups, X, can be cleaved by acid under the proper conditions to regenerate the unblocked imide.

Abstract: Photosensitive compositions having surfactant vesicles therein are described. A method is also shown in which the photosensitive vesicle containing an enclosed substance is exposed to light to control the release of the substance.

Abstract: Heat stable, negative resist compositions are provided for use, particularly in deep ultraviolet light X-ray and electron beams. The composition comprises an acid generating onium salt photoinitiator, a source of polyfunctional activated aromatic rings and a source of polyfunctional carbonium ions, with at least one of said sources being a polymer.

Abstract: A process for preparing radiation polymerizable acrylate-functional organopolysiloxane-urethane copolymers by reacting aminofunctional polysiloxanes with acrylated urethane oligomers in the presence of a solvent.

Abstract: A resin composition of excellent ultra-violet ray curing property and remarkably improved adhesive force to a base material to form a cured coating film, the resin composition being composed of cationically polymerizable compound, photo-initiator, phenoxy resin, and polyhydric alcohol.

Abstract: Supported initiators for the radiation-activated polymerization of cationically-polymerizable compounds, particularly epoxide group-containing compounds, are described. The supported initiators comprise a particulate carrier and a photocatalytic ionic salt. The supported initiators are especially useful for the polymerization of cationically-polymerizable compounds in which the ionic salt alone is not soluble.

Abstract: Polyfunctional cationically polymerizable styryloxy compounds of the formula ##STR1## where R.sup.1 is H or methyl; R.sup.2 is hydrocarbyl, hydrocarbyl interrupted by ether oxygen atoms, or halo substituted hydrocarbyl; R.sup.3 is H, lower alkyl, or alkoxy; G is any multivalent organic or inorganic radical free of amino or aliphatic thiol groups; and n is an integer of two or more.

Abstract: Described herein are compositions suitable for photocopolymerization comprising (a) an epoxide containing two or more epoxy groups, and (b) a hydroxyl substituted cycloaliphatic monoepoxide. The composition may additionally contain a poly (active hydrogen) organic compound and/or a photoinitiator. A coating produced from such a composition has a good combination of properties. Especially preferred are compositions further containing a vinyl cycloaliphatic monoepoxide and diazonium or onium photoinitiator.