Specified Rate-affecting Material Contains Chalcogen Other Than As Oxygen Patents (Class 522/49)
  • Patent number: 10858380
    Abstract: The present disclosure is drawn to a photo active agent which includes a bisacylphosphinic compound in the form of an acid or salt having Structure I: where A and A? are independently aryl or from C2 to C8 lower alkyl; M is H, a monovalent cation, a divalent cation, or mixture thereof; n is 1 or 2; and q is 1 or 2. The photo active agent can be present in a composition that includes from 0.001 wt % to 5 wt % of a dialcohol phosphinic acid precursor or dialcohol phosphinic salt of the bisacylphosphinic compound of Structure I.
    Type: Grant
    Filed: April 3, 2017
    Date of Patent: December 8, 2020
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Zhang-Lin Zhou, Marisa Samoshin, Rodney David Stramel
  • Patent number: 9694521
    Abstract: Systems and methods for improving adhesion of an insulating foam to a molded polymeric insulating structure through use of ozone gas for functionalization of molded polymeric surfaces of an internal cavity of the insulating structure.
    Type: Grant
    Filed: March 23, 2015
    Date of Patent: July 4, 2017
    Assignee: YETI Coolers, LLC
    Inventors: John French, Paul Nugent, Francis Laxamana, Argel Adarlo
  • Patent number: 8957224
    Abstract: A specific type of carbazole photoinitiator is capable of providing radiation curable compositions that are curable by UV LEDs and do not exhibit an unstable yellowing behavior in an image upon storage like ITX.
    Type: Grant
    Filed: December 6, 2010
    Date of Patent: February 17, 2015
    Assignee: Agfa Graphics NV
    Inventor: Johan Loccufier
  • Patent number: 8933142
    Abstract: 3-Esters and 3-amides of thioxanthone bearing alkyl chains of appropriate length and can be used as photoinitiators or sensitizers in photopolymerizable systems, in particular for the preparation of coatings compatible with the food use.
    Type: Grant
    Filed: November 7, 2011
    Date of Patent: January 13, 2015
    Assignee: Lamberti Spa
    Inventors: Angelo Casiraghi, Enzo Meneguzzo, Gabriele Norcini, Elena Bellotti, Giovanni Floridi, Giuseppe Li Bassi
  • Patent number: 8921442
    Abstract: A process for the preparation of polymer lattices comprising polymer nanoparticles by a photo-initiated heterophase polymerization includes preparing a heterophase medium comprising a dispersed phase and a continuous phase and at least one of at least one surfactant, at least one photoinitiator, and at least one polymerizable monomer. The at least one polymerizable monomer is polymerized by irradiating the heterophase medium with electromagnetic radiation so as to induce a generation of radicals. The at least one photoinitiator is selected from compounds comprising at least one phosphorous oxide group (P?O) or at least one phosphorous sulfide (P?S) group. The irradiating of the heterophase medium is effected so that a ratio of an irradiated surface of the heterophase medium to a volume of the heterophase medium is at least 200 m?1.
    Type: Grant
    Filed: October 17, 2011
    Date of Patent: December 30, 2014
    Assignee: Max-Planck-Gesellschaft zur Foerderung der Wissenschaften E. V.
    Inventors: Peter Seeberger, Hansjoerg Gruetzmacher, Klaus Tauer, Judith Braeuer, Paola Laurino
  • Patent number: 8901201
    Abstract: A durable ambient light curable waterproof liquid rubber coating with volatile organic compound (VOC) content of less than 450 grams per liter made from ethylene propylene diene terpolymer (EPDM) in a solvent, a photoinitiator, an additive, pigments, and fillers, and a co-agent and a method for making the formulation, wherein the formulation is devoid of thermally activated accelerators.
    Type: Grant
    Filed: February 12, 2014
    Date of Patent: December 2, 2014
    Assignee: Lion Copolymer Geismar, LLC
    Inventors: Michael J. Molnar, Daniel S. Nelson, Arthur J. Fontenot, III, Harold William Young, Jr., Augusto Caesar Ibay, Zhiyong Zhu
  • Patent number: 8901199
    Abstract: The present disclosure relates generally to compositions for natural and artificial nail coatings, and particularly, but not by way of limitation, to polymerizable compositions that provide improved adhesion-promoting and improved solvent-susceptibility.
    Type: Grant
    Filed: March 7, 2011
    Date of Patent: December 2, 2014
    Assignee: Creative Nail Design, Inc.
    Inventors: Thong Vu, Chad Conger, Diane Marie Larsen, David Valia, Douglas D. Schoon
  • Patent number: 8759412
    Abstract: A polymerisable photoinitiator according to Formula (I): wherein: R1 and R2 are independently selected from the group consisting of hydrogen, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkaryl group, a substituted or unsubstituted aryl or heteroaryl group, a halogen, an ether group, a thioether group, an aldehyde group, a ketone group, an ester group, an amide group, an amine and a nitro group; R1 and R2 may represent the necessary atoms to form a five to eight membered ring; L represents an n+m-valent linking group comprising 1 to 30 carbon atoms; A represents a radically polymerizable group selected from the group consisting of an acrylate group, a methacrylate group, a styrene group, an acryl amide group, a methacryl amide group, a maleate group, a fumarate group, an itaconate group, a vinyl ether group, an allyl ether group, a viny
    Type: Grant
    Filed: October 4, 2011
    Date of Patent: June 24, 2014
    Assignee: Agfa Graphics NV
    Inventor: Johan Loccufier
  • Publication number: 20130261210
    Abstract: A process for the preparation of polymer lattices comprising polymer nanoparticles by a photo-initiated heterophase polymerization includes preparing a heterophase medium comprising a dispersed phase and a continuous phase and at least one of at least one surfactant, at least one photoinitiator, and at least one polymerizable monomer. The at least one polymerizable monomer is polymerized by irradiating the heterophase medium with electromagnetic radiation so as to induce a generation of radicals. The at least one photoinitiator is selected from compounds comprising at least one phosphorous oxide group (P?O) or at least one phosphorous sulfide (P?S) group. The irradiating of the heterophase medium is effected so that a ratio of an irradiated surface of the heterophase medium to a volume of the heterophase medium is at least 200 m?1.
    Type: Application
    Filed: October 17, 2011
    Publication date: October 3, 2013
    Applicant: Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V.
    Inventors: Peter Seeberger, Hansjoerg Gruetzmacher, Klaus Tauer, Judith Braeuer, Paola Laurino
  • Patent number: 8507572
    Abstract: The present invention relates to functionalizing a surface of an organic material. For example, surfaces of materials having C—H bonds, such as polymers having C—H bonds, can be functionalized. In certain embodiments, a heterobifunctional molecule having a photoactive anchor, a spacer, and a terminal functional group is applied to the surface of an organic material that contains one or more C—H bonds. The heterobifunctional molecule can be bound to any surface having C—H bonds as the photoactive anchor can react with C—H bonds upon irradiation. The terminal functional group has a “click” functionality which can be utilized to functionalize the surface of the organic material with any desired functionalizing moiety having the orthogonal click functionality.
    Type: Grant
    Filed: June 8, 2010
    Date of Patent: August 13, 2013
    Assignee: The Trustees of Columbia University in the City of New York
    Inventors: Jeffrey Lancaster, Nicholas J. Turro, Jeffrey T. Koberstein
  • Patent number: 8507725
    Abstract: Compounds of the formula I or (I?), wherein R1 and R?1 for example are hydrogen, C3-C8cycloalkyl or C1-C12alkyl, R2 and R2? for example are hydrogen; unsubstituted C1-C20alkyl or substituted C1-C20alkyl; and R8 and R9 for example are hydrogen, C1-C12alkyl which optionally is substituted, or phenyl which optionally is substituted; exhibit an unexpectedly good performance in photopolymerization reactions.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: August 13, 2013
    Assignee: BASF SE
    Inventors: Akira Matsumoto, Hisatoshi Kura
  • Patent number: 8507726
    Abstract: Photoinitiators mixture comprising (i) at least one compound selected from the group consisting of alpha-hydroxy ketones, monoacylphosphine oxides, bisacylphosphine oxides, ketosulfones, benzil ketals, benzoin ether, phenylglyoxylates, borates and titanocenes; and (ii) at least one compound of the formula (I) or (I?) R1, R?1, R2 and R2? R?9 independently of each other for example are hydrogen or C1-C12alkyl R7, R8, R9, R?8 and R?9 independently of each other for example are hydrogen, C1-C12alkyl which optionally is substituted or phenyl which optionally is substituted, exhibit excellent photoinitiating properties.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: August 13, 2013
    Assignee: BASF SE
    Inventors: Katia Studer, Sébastien Villeneuve, Akira Matsumoto, Hisatoshi Kura, Jan Sültemeyer
  • Patent number: 8492454
    Abstract: The present disclosure relates to a nail coating system comprising a basecoat, a color layer, and a topcoat. The system of the present disclosure may be applied to natural and/or pre-existing artificial nail coatings. The present disclosure relates generally to compositions for natural and artificial nail coatings, and particularly, but not by way of limitation, to polymerizable compositions and color layers polymerized therefrom. The disclosure further relates to methods of making a polymerized color layer.
    Type: Grant
    Filed: October 5, 2009
    Date of Patent: July 23, 2013
    Assignee: Creative Nail Design, Inc.
    Inventors: Thong H. Vu, Diane Marie Larsen, Chad Conger, Douglas D. Schoon
  • Patent number: 8492071
    Abstract: A curable composition containing (A) a polymerizable compound having an alkyleneoxy group having two or more carbon atoms, (B) a polymerizable compound lacking an alkyleneoxy group having two or more carbon atoms, (C) an i-line absorber, (D) a photopolymerization initiator, (E) an alkali-soluble resin, and (F) a pigment, wherein a mass ratio [(A)/((A)+(B))] is from 0.5 to 0.9, and an i-line transmittance obtainable when the curable composition is formed into a coating film having a thickness of 0.7 ?m, is 10% or less. The curable composition of the invention has enhanced adhesiveness upon forming a micro pattern, and can reduce development residues in unexposed non-cured areas. The curable composition of the invention is suitable for the use in color filters.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: July 23, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Hiroshi Taguchi
  • Patent number: 8404758
    Abstract: The invention provides methods for inducing reversible chain cleavage of polymer chains in a crosslinked polymeric material. Reversible cleavage of the polymer backbone is capable of relieving stress in the polymeric material as the bonds reform in a less stressed state. The invention also provides methods for making polymeric materials capable of reversible chain cleavage, materials made by the methods of the invention, and linear monomers containing reversible chain cleavage groups which are useful in the materials and methods of the invention.
    Type: Grant
    Filed: May 17, 2011
    Date of Patent: March 26, 2013
    Assignee: The Regents of the University of Colorado, a body corporate
    Inventors: Christopher N. Bowman, Timothy F. Scott
  • Patent number: 8399537
    Abstract: The present disclosure relates generally to compositions for natural and artificial nail coatings, and particularly, but not by way of limitation, to polymerizable compositions and adhesion-promoting basecoats polymerized therefrom. The disclosure further relates to methods of making a polymerized basecoat that are more easily removed than artificial nail enhancements and more durable and long lasting than nail polish coatings.
    Type: Grant
    Filed: April 4, 2011
    Date of Patent: March 19, 2013
    Assignee: Creative Nail Design, Inc.
    Inventors: Chad Conger, Thong Vu
  • Patent number: 8349461
    Abstract: A photo-curing polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonate compound, and a solvent. The polysiloxane contains less than 30 wt % of a polysiloxane fraction having a molecular weight above 8,000, and 35 wt % to 60 wt % of a polysiloxane fraction having a molecular weight ranging from 500 to 2,000 when calculated from an integral molecular weight distribution curve obtained by plotting cumulative weight percentage versus molecular weight falling within a range between 500 and 50,000 measured by gel permeation chromatography. A protective film formed from the photo-curing polysiloxane composition and an element containing the protective film are also disclosed.
    Type: Grant
    Filed: August 19, 2011
    Date of Patent: January 8, 2013
    Assignee: Chi Mei Corporation
    Inventors: Ming-Ju Wu, Chun-An Shih
  • Patent number: 8263677
    Abstract: The present disclosure relates generally to compositions for natural and artificial nail coatings, and particularly, but not by way of limitation, to polymerizable compositions and adhesion-promoting basecoats polymerized therefrom. The disclosure further relates to methods of making a polymerized basecoat that are more easily removed than artificial nail enhancements and more durable and long lasting than nail polish coatings.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: September 11, 2012
    Assignee: Creative Nail Design, Inc.
    Inventors: Chad Conger, Thong Vu
  • Publication number: 20120181703
    Abstract: A patternable adhesive composition including at least one alkali soluble resin including an alkali soluble group and an acryloyl group, at least one radically polymerizable compound, at least one thermosettable compound, and at least one photo-radical initiator.
    Type: Application
    Filed: November 8, 2011
    Publication date: July 19, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Joon-Yong PARK, Yong Seok HAN, Jae Jun LEE, Chul Ho JEONG
  • Publication number: 20120021142
    Abstract: The present invention relates to a liquid crystal alignment layer composition showing excellent adhesive strength to a substrate and a liquid crystal layer and excellent homeotropic alignment of liquid crystals, a liquid crystal alignment layer prepared with the same, a preparation method of the liquid crystal alignment layer, an optical film including the liquid crystal alignment layer, and a display device including the same. According to the present invention, provided are a liquid crystal alignment layer composition which comprises 1-50 wt % of a photocurable resin binder, 0.01-5 wt % of an amine compound selected from the group consisting of primary and secondary amino-based coupling agents, 0.
    Type: Application
    Filed: April 8, 2010
    Publication date: January 26, 2012
    Inventors: Dae-Hee Lee, Moon-Soo Park
  • Patent number: 8053167
    Abstract: Curable compositions have high sensitivity and excellent developability, and further have good storage properties as required. The compositions include a hydroxythiol compound represented by Formula (1) below and a compound with an ethylenically unsaturated double bond: wherein R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group or an aromatic ring; X is an aliphatic group, an aromatic ring-containing group or a heterocyclic ring-containing group; Y is an ester bond; k and l are each an integer ranging from 1 to 20; m is an integer of 0, 1 or 2; and n is 0 or 1.
    Type: Grant
    Filed: November 15, 2007
    Date of Patent: November 8, 2011
    Assignee: Showa Denko K.K.
    Inventors: Katsumi Murofushi, Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori
  • Patent number: 8008364
    Abstract: The present invention provides a pigment dispersion liquid including a pigment, a compound having a cyclic urea structure and having an acid group or a basic group, a dispersant, and a solvent. The pigment may be a pigment having a urea structure or an imide structure. The pigment may also be a pigment having a barbituric skeleton.
    Type: Grant
    Filed: July 10, 2008
    Date of Patent: August 30, 2011
    Assignee: Fujifilm Corporation
    Inventors: Kazuto Shimada, Yushi Kaneko, Tomotaka Tsuchimura
  • Patent number: 7943680
    Abstract: The invention provides methods for inducing reversible chain cleavage of polymer chains in a crosslinked polymeric material. Reversible cleavage of the polymer backbone is capable of relieving stress in the polymeric material as the bonds reform in a less stressed state. The invention also provides methods for making polymeric materials capable of reversible chain cleavage, materials made by the methods of the invention, and linear monomers containing reversible chain cleavage groups which are useful in the materials and methods of the invention.
    Type: Grant
    Filed: February 10, 2006
    Date of Patent: May 17, 2011
    Assignee: The Regents of the University of Colorado
    Inventors: Christopher N. Bowman, Timothy F. Scott
  • Patent number: 7893126
    Abstract: An active ray curable ink-jet ink comprising at least one type of a photo acid generating compound, a cationic polymerizable compound and a pigment, wherein the active ray curable ink-jet ink contains a fatty acid amine salt comprising a fatty acid having a carbon number of 6-18 and a primary, a secondary or a tertiary amine having a carbon number of 4-12 in an amount of 0.01-0.70 weight % based on the total weight of the ink-jet ink.
    Type: Grant
    Filed: October 29, 2007
    Date of Patent: February 22, 2011
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventor: Toshiyuki Takabayashi
  • Patent number: 7893129
    Abstract: Stable, highly filled cationic dental compositions useful for the production of dental prostheses and dental restoration materials contain: (1) at least one compound which is reactive cationically when activated, advantageously at least one UV- and cationically reactive oxirane-functionalized silicone; (2) at least one dental filler, advantageously SiO2; (3) at least one organic polymer or copolymer dispersant having an amine index less than or equal to 100 mg of potassium hydroxide per gram of dispersant, advantageously a polyurethane/acrylate copolymer or alkylammonium salt thereof; (4) at least one cationic photoinitiator, advantageously iodonium borate; and (5) optionally, at least one photosensitizer.
    Type: Grant
    Filed: March 9, 2009
    Date of Patent: February 22, 2011
    Assignee: Bluestar Silicones France SAS
    Inventor: Jean-Marc Frances
  • Patent number: 7893130
    Abstract: Dental compositions are described which are photocurable by radiation with a wavelength greater than 390 nm. The compositions include a cationically active compound, a dental filler, optionally a dispersant, a cationic photoinitiator and a photosensitizer which is a thioxanthone salt substituted by at least one group containing an ammonium function. The composition has the advantage of remedying the color stability problems of finished dental products after crosslinking.
    Type: Grant
    Filed: May 10, 2005
    Date of Patent: February 22, 2011
    Assignee: Bluestar Silicones France SAS
    Inventor: Jean-Marc Frances
  • Patent number: 7879923
    Abstract: This invention is to provide a method for surface-treatment of a water absorbent resin excelling in water absorption properties. This invention relates to a method for the surface-treatment of a water absorbent resin, which comprises: a) mixing 100 parts by weight of a water absorbent resin, 0.01-20 parts by weight of at least one radical polymerization initiator selected from the group consisting of persulfates, hydrogen peroxide, and azo compounds, and a radically polymerizing compound and b) irradiating the resultant mixture with active energy rays. The treatment particularly exalts the absorption ratio against pressure and the saline flow conductivity.
    Type: Grant
    Filed: December 9, 2005
    Date of Patent: February 1, 2011
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Makoto Matsumoto, Yoshiro Mitsukami, Hiroyuki Ikeuchi, Kazushi Torii, Taku Iwamura
  • Patent number: 7812194
    Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
    Type: Grant
    Filed: August 30, 2006
    Date of Patent: October 12, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Toshiaki Aoai
  • Patent number: 7763202
    Abstract: The present disclosure relates to a method of surface treating particulate materials with electromagnetic radiation, in particular a method of cross-linking superabsorbent polymer particles using UV irradiation. The method is carried out with a so-called roll reactor, which comprises a rotating roll and an irradiation source. Radical former molecules can be applied on the surface of superabsorbent polymer particles. The particulate material is fed onto the surface of the roll and is irradiated while moved with the rotating roll. The irradiation source is provided such that the radiation emitted by the irradiation source is able to reach at least part of the particulate material that has been fed onto the surface of the roll. The irradiation source for use in the method of the present disclosure is able to emit UV radiation of a wavelength between 201 nm and 400 nm. The present disclosure also relates to absorbent articles comprising surface treated superabsorbent particles made by said method.
    Type: Grant
    Filed: February 22, 2008
    Date of Patent: July 27, 2010
    Assignee: The Procter & Gamble Company
    Inventors: Torsten Lindner, Aleksey Mikhailovich Pinyayev, Andrew Julian Wnuk
  • Patent number: 7745507
    Abstract: This invention is to provide an absorbent member and a method for making such an absorbent member. The absorbent member comprises modified water absorbent having good production efficiency, good absorbency against pressure, good absorption speed, gel strength, good liquid permeability, and the like. The modified water absorbent resin is made by a method, which comprises (i) a mixing step comprising mixing a water absorbent resin, water, and a water-soluble radical polymerization initiator without addition of an ethylenically unsaturated monomer, to obtain a water absorbent resin composition, and (ii) an irradiating step comprising irradiating said water absorbent resin composition obtained in the mixing step with active energy rays, wherein the surface water content of said water absorbent resin in said water absorbent resin composition at least at any point of time in the irradiating step (ii) is controlled to a level of not lower than 3.0% by weight based on 100% by weight of the water absorbent resin.
    Type: Grant
    Filed: April 4, 2007
    Date of Patent: June 29, 2010
    Assignee: The Procter & Gamble Company
    Inventors: Yoshiro Mitsukami, Makoto Matsumoto, Taku Iwamura
  • Patent number: 7714032
    Abstract: The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
    Type: Grant
    Filed: July 25, 2008
    Date of Patent: May 11, 2010
    Assignee: Showa Denko K.K.
    Inventors: Hirotoshi Kamata, Mina Onishi, Katsumi Murofushi
  • Patent number: 7709550
    Abstract: An ink composition is provided that includes a cationically polymerizable compound (a), a compound (b) that generates an acid when exposed to radiation, a colorant (c), and a salt of a weak acid having a pKa of 4 to 8 (d). There is also provided an inkjet recording method that includes a step of discharging the ink composition onto a recording medium, and a step of irradiating the discharged ink composition with radiation so as to cure the ink composition.
    Type: Grant
    Filed: September 7, 2006
    Date of Patent: May 4, 2010
    Assignee: FUJIFILM Corporation
    Inventor: Toshiaki Aoai
  • Publication number: 20100087563
    Abstract: Compounds of the formula (I), wherein L1, L2, L3 and L4 independently of one another are hydrogen or an organic substituent; R is for example C1-C20alkyl, C5-C12cycloalkyl, C2-C20alkenyl, substituted C1-C20alkyl; X is O, S, NRa or NCORa; Ra is for example hydrogen or C1-C20alkyl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
    Type: Application
    Filed: September 24, 2007
    Publication date: April 8, 2010
    Inventors: Pascal Hayoz, Jean-Luc Birbaum, Stephan Ilg
  • Publication number: 20100065871
    Abstract: An ultra violet light transmitting polymer is obtainable by the polymerisation of at least one compound having a substantially non UV absorbing core group comprising; linear or branched aliphatic hydrocarbons which may contain an aliphatic ring; or polydialkylsiloxanes. The compounds have at least one functional group comprising formula (A), (B) or (C):and each of the groups —R3— are, independently, linking groups which may be present or absent and, where present, may be a C1 to C10 hydrocarbon chain, which may contain an ether linkage. Methods for producing the polymers and uses for the polymers are also described.
    Type: Application
    Filed: November 29, 2007
    Publication date: March 18, 2010
    Inventors: Richard A. Pethrick, Martin David Dawson, Erdan Gu, Allan R. Mackintosh, Alexander Jan-Christoph Kuehne
  • Patent number: 7662899
    Abstract: An organotellurium compound of the formula (1) is useful as a living radical polymerization initiator and makes possible precision control of molecular weights and molecular weight distributions under mild conditions wherein R1 is C1-C8 alkyl, R2 and R3 are each a hydrogen atom or C1-C8 alkyl, and R4 is aryl, substituted aryl, aromatic heterocyclic group, hydroxycarbonyl or cyano.
    Type: Grant
    Filed: July 27, 2007
    Date of Patent: February 16, 2010
    Assignee: Otsuka Chemical Co., Ltd.
    Inventors: Shigeru Yamago, Junichi Yoshida
  • Patent number: 7579390
    Abstract: There is proposed an inkjet ink composition comprising a pigment component to which a resin having a basic terminal is adsorbed, a photo-acid generating agent containing an onium salt, and at least one kind of solvent which can be polymerized under the presence of an acid. The content of multivalent salt included in the onium salt is not more than 20% by weight based on a total weight of onium salt, and the content of the pigment component is confined within the range of 3 to 41% by weight based on the ink composition.
    Type: Grant
    Filed: March 8, 2005
    Date of Patent: August 25, 2009
    Assignee: Toshiba Tec Kabushiki Kaisha
    Inventors: Toru Ushirogouchi, Kazuhiko Ohtsu, Mitsuru Ishibashi, Ryozo Akiyama, Masahi Hiroki
  • Publication number: 20090163615
    Abstract: The present application provides a latent ink-jet ink formulation suitable as solder mask. The composition generally comprises: (a) at least one compound capable of self cross-linking (USM); (b) at least one phenolic resin; (c) at least one solvent; (d) at least one mineral filler; (e) at least one polyol; and (f) at least one photoinitiator.
    Type: Application
    Filed: August 31, 2006
    Publication date: June 25, 2009
    Inventors: Izhar Halahmi, Shalom Luski, Michal Cohen
  • Patent number: 7511083
    Abstract: A method of preparation of a cross-linked hydrogel by graft copolymerisation, said method comprises the steps of preparing an aqueous solution comprising one or more hydrophilic polymers, a cross-linking agent and a photoinitiator comprising a water-soluble peroxydisulphate, subjecting said solution to irradation and obtaining the cross-linked hydrogel, wherein the hydrophilic polymers are saturated and the cross-linking agent acts as a co-catalyst of cross-linking. The hydrogel is fast to produce and has low toxicity. The hydrogel may be suitable for use in medical devices such as dressings and the like.
    Type: Grant
    Filed: October 2, 2003
    Date of Patent: March 31, 2009
    Assignee: Coloplast A/S
    Inventors: Flemming Madsen, Niels Joergen Madsen
  • Publication number: 20080297888
    Abstract: Methods are disclosed for curing UV-curable monomers and monomer/polymer mixtures that are in an environment in which they are protected from UV radiation.
    Type: Application
    Filed: August 13, 2008
    Publication date: December 4, 2008
    Inventor: Shui T. LAI
  • Publication number: 20080258345
    Abstract: The present invention relates to liquid radiation-curing compositions having flexible and elastic material properties in the cured state, consisting of the following components: a) from 5.0 to 99.0% by weight of a di- or polyfunctional polyether (meth)-acrylate compound having a molecular weight of more than 1000 g/mol; b) from 1.00 to 90.0% by weight of a mono-, di- or polyfunctional radiation-curing (meth)acrylate compound having a molecular weight of less than 1000 g/mol as a reactive component or reactive thinner or cross-linking agent for the formation of polymer networks; c) from 0.05 to 10.0% by weight of a free-radical forming photoinitiator; d) from 0.001 to 5.0% by weight of further components; with the proviso that the sum of components a) to d) amounts to 100% by weight.
    Type: Application
    Filed: July 15, 2005
    Publication date: October 23, 2008
    Inventors: Arthur Thomas Bens, Hermann Seitz, Carsten Tille
  • Patent number: 7439302
    Abstract: A new underlayer composition that exhibits high etch resistance and improved optical properties is disclosed. The underlayer composition comprises a vinyl or acrylate polymer, such as a methacrylate polymer, the polymer comprising at least one substituted or unsubstituted naphthalene or naphthol moiety, including mixtures thereof. Examples of the polymer of this invention include: where each R1 is independently selected from an organic moiety or a halogen; each A is independently a single bond or an organic moiety; R2 is hydrogen or a methyl group; and each X, Y and Z is an integer of 0 to 7, and Y+Z is 7 or less. The organic moiety mentioned above may be a substituted or unsubstituted hydrocarbon selected from the group consisting of a linear or branched alkyl, halogenated linear or branched alkyl, aryl, halogenated aryl, cyclic alkyl, and halogenated cyclic alkyl, and any combination thereof.
    Type: Grant
    Filed: August 2, 2005
    Date of Patent: October 21, 2008
    Assignee: International Business Machines Corporation
    Inventors: Wu-Song Huang, Sean D. Burns, Mahmoud Khojasteh
  • Patent number: 7435526
    Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
    Type: Grant
    Filed: June 14, 2004
    Date of Patent: October 14, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Toshiaki Aoai
  • Publication number: 20080207792
    Abstract: The present disclosure relates to a method of surface treating particulate materials with electromagnetic radiation, in particular a method of cross-linking superabsorbent polymer particles using UV irradiation. The method is carried out with a so-called roll reactor, which comprises a rotating roll and an irradiation source. Radical former molecules can be applied on the surface of superabsorbent polymer particles. The particulate material is fed onto the surface of the roll and is irradiated while moved with the rotating roll. The irradiation source is provided such that the radiation emitted by the irradiation source is able to reach at least part of the particulate material that has been fed onto the surface of the roll. The irradiation source for use in the method of the present disclosure is able to emit UV radiation of a wavelength between 201 nm and 400 nm. The present disclosure also relates to absorbent articles comprising surface treated superabsorbent particles made by said method.
    Type: Application
    Filed: February 22, 2008
    Publication date: August 28, 2008
    Inventors: Torsten Lindner, Aleksey Mikhailovich Pinyayev, Andrew Julian Wnuk
  • Publication number: 20080194721
    Abstract: A multi-photon reactive composition comprises an ethylenically unsaturated liquid polysilazane precursor, a multi-functional thiol additive, a multi-ethylenically-unsaturated additive different from the polysilazane, and a multi-photon photocuring composition. The invention can be used to provide ceramic-based microstructures as, for example, high temperature resistant materials, including devices such as microcombustors, micro-heat-exchangers, sensor and actuator systems, microfluidic devices, and micro-optics systems that can be used independently or integrated into other systems.
    Type: Application
    Filed: December 27, 2005
    Publication date: August 14, 2008
    Inventors: David S. Arney, Feng Bai
  • Publication number: 20080139688
    Abstract: The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
    Type: Application
    Filed: October 25, 2005
    Publication date: June 12, 2008
    Applicant: SHOWA DENKO K.K.
    Inventors: Hirotoshi Kamata, Mina Onishi, Katsumi Murofushi
  • Publication number: 20080045619
    Abstract: A photo-crosslinkable polyolefin composition comprises a polyolefin, a source of functionality receptive to crosslinking by UV radiation, a cationic photoinitiator and optionally includes a free-radical photoinitiator, a crosslinking accelerator or sensitizer, and other additives such as compatibilizers, inorganic fillers, nanofillers, glass, polymeric and ceramic microspheres, glass fibres, flame retardants, antioxidants, stabilizers, processing aids, foaming agents and pigments. A method for manufacturing a UV-crosslinked polyolefin article comprises forming an article by extruding, moulding or otherwise forming the UV-crosslinkable polyolefin composition and subjecting the article to UV radiation on-line with the extrusion, moulding or other forming operation.
    Type: Application
    Filed: February 28, 2007
    Publication date: February 21, 2008
    Applicant: SHAWCOR LTD.
    Inventors: Peter Jackson, Eileen Wan
  • Patent number: 7329439
    Abstract: Solvent-free UV-curable polymer materials derived from miscible blends of reactive organic monomeric, oligomeric and low molecular polymeric systems and organic and inorganic fillers such as polytetrafluoroethylene and talc are provided to form polymer-filler composite compositions for use in the fabrication and repair of electronic components and microelectronic assembly processes. The composition contains a preformed thermoplastic or elastomeric polymer/oligomer with reactive end groups, a monofunctional and/or bifunctional acrylate monomer, a multifunctional (more than two reactive groups) acrylated/methacrylated monomer, a photoinitiator and a fluorocarbon polymer powder as an organic filler which is preferably PTFE and an inorganic filler such as talc. A nano-filler may also be used as the inorganic filler alone or in combination with another inorganic filler such as talc.
    Type: Grant
    Filed: September 29, 2004
    Date of Patent: February 12, 2008
    Assignee: International Business Machines Corporation
    Inventors: Krishna G. Sachdev, Daniel G. Berger, Kelly M. Chioujones, Brian W. Quinlan
  • Publication number: 20070203255
    Abstract: There are provided a compound represented by the following formula (I), a photopolymerizable composition containing (A) a photopolymerization initiator represented by the formula (I) and (B) a radical polymerizable monomer, a color filter produced by using the photopolymerizable composition, and a process for producing the color filter:
    Type: Application
    Filed: February 23, 2007
    Publication date: August 30, 2007
    Applicant: FUJIFILM Corporation
    Inventor: Tomoya Sasaki
  • Patent number: 7247660
    Abstract: The invention concerns dental compositions. Said composition comprises (1) a silicone crosslinkable and/or polymerizable by cation process; (2) an efficient amount of at least an initiator such as onium borate; (3) at least a photosensitizer ; and (4) a dental filler present in the composition in a proportion of at least 10 wt. % relative to the composition total weight. Said dental compositions are useful for making dental prostheses or for dental restoration.
    Type: Grant
    Filed: February 18, 2004
    Date of Patent: July 24, 2007
    Assignee: Rhodia Chimie
    Inventor: Jean-Marc Frances
  • Patent number: 7244548
    Abstract: A photopolymerizing composition and a photopolymerizing recording medium manufactured using the composition, wherein the photopolymerizing composition contains: 1.0-99.0% by weight of at least one kind of polymerizable compound; 0.05-0.5% by weight of at least one kind of photosensitizer selected from among photochromic compounds that change color by incoherent UV light irradiation; 0.2-6.0% by weight of a coinitiator that is activated by visible light in the presence of a photoinduced form of the photochromic compound transformed by incoherent UV light to photopolymerize the polymerizable compound; 0-97.5% by weight of a polymer binding agent; 0-6.0% by weight of a plasticizer; and 0-3.0% by weight of a non-polymerizing solvent. The photopolymerizing recording medium has a high angular diffraction selectivity and thus can be effectively used to manufacture a 3D holographic optical memory with ultra high information storage capacity.
    Type: Grant
    Filed: November 22, 2004
    Date of Patent: July 17, 2007
    Assignees: Samsung Electronics Co., Ltd., Photochemistry Center of Russian Academy of Sciences
    Inventors: Valery Aleksandrovich Barachevsky, Svetlana Ivanovna Peredereeva, Dmitry Valerevich Nesterenko, Aleksandr Vladimirovich Lyubimov, Viktor Kamilievich Salahutdinov, Mikhail Mikhailovich Krayushkin, Nataliya Timofeovna Sokolyuk, Andrei Leanovich Mikaelyan