Specified Rate-affecting Material Contains Chalcogen Other Than As Oxygen Patents (Class 522/49)
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Patent number: 10858380Abstract: The present disclosure is drawn to a photo active agent which includes a bisacylphosphinic compound in the form of an acid or salt having Structure I: where A and A? are independently aryl or from C2 to C8 lower alkyl; M is H, a monovalent cation, a divalent cation, or mixture thereof; n is 1 or 2; and q is 1 or 2. The photo active agent can be present in a composition that includes from 0.001 wt % to 5 wt % of a dialcohol phosphinic acid precursor or dialcohol phosphinic salt of the bisacylphosphinic compound of Structure I.Type: GrantFiled: April 3, 2017Date of Patent: December 8, 2020Assignee: Hewlett-Packard Development Company, L.P.Inventors: Zhang-Lin Zhou, Marisa Samoshin, Rodney David Stramel
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Patent number: 9694521Abstract: Systems and methods for improving adhesion of an insulating foam to a molded polymeric insulating structure through use of ozone gas for functionalization of molded polymeric surfaces of an internal cavity of the insulating structure.Type: GrantFiled: March 23, 2015Date of Patent: July 4, 2017Assignee: YETI Coolers, LLCInventors: John French, Paul Nugent, Francis Laxamana, Argel Adarlo
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Patent number: 8957224Abstract: A specific type of carbazole photoinitiator is capable of providing radiation curable compositions that are curable by UV LEDs and do not exhibit an unstable yellowing behavior in an image upon storage like ITX.Type: GrantFiled: December 6, 2010Date of Patent: February 17, 2015Assignee: Agfa Graphics NVInventor: Johan Loccufier
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Patent number: 8933142Abstract: 3-Esters and 3-amides of thioxanthone bearing alkyl chains of appropriate length and can be used as photoinitiators or sensitizers in photopolymerizable systems, in particular for the preparation of coatings compatible with the food use.Type: GrantFiled: November 7, 2011Date of Patent: January 13, 2015Assignee: Lamberti SpaInventors: Angelo Casiraghi, Enzo Meneguzzo, Gabriele Norcini, Elena Bellotti, Giovanni Floridi, Giuseppe Li Bassi
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Patent number: 8921442Abstract: A process for the preparation of polymer lattices comprising polymer nanoparticles by a photo-initiated heterophase polymerization includes preparing a heterophase medium comprising a dispersed phase and a continuous phase and at least one of at least one surfactant, at least one photoinitiator, and at least one polymerizable monomer. The at least one polymerizable monomer is polymerized by irradiating the heterophase medium with electromagnetic radiation so as to induce a generation of radicals. The at least one photoinitiator is selected from compounds comprising at least one phosphorous oxide group (P?O) or at least one phosphorous sulfide (P?S) group. The irradiating of the heterophase medium is effected so that a ratio of an irradiated surface of the heterophase medium to a volume of the heterophase medium is at least 200 m?1.Type: GrantFiled: October 17, 2011Date of Patent: December 30, 2014Assignee: Max-Planck-Gesellschaft zur Foerderung der Wissenschaften E. V.Inventors: Peter Seeberger, Hansjoerg Gruetzmacher, Klaus Tauer, Judith Braeuer, Paola Laurino
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Patent number: 8901201Abstract: A durable ambient light curable waterproof liquid rubber coating with volatile organic compound (VOC) content of less than 450 grams per liter made from ethylene propylene diene terpolymer (EPDM) in a solvent, a photoinitiator, an additive, pigments, and fillers, and a co-agent and a method for making the formulation, wherein the formulation is devoid of thermally activated accelerators.Type: GrantFiled: February 12, 2014Date of Patent: December 2, 2014Assignee: Lion Copolymer Geismar, LLCInventors: Michael J. Molnar, Daniel S. Nelson, Arthur J. Fontenot, III, Harold William Young, Jr., Augusto Caesar Ibay, Zhiyong Zhu
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Patent number: 8901199Abstract: The present disclosure relates generally to compositions for natural and artificial nail coatings, and particularly, but not by way of limitation, to polymerizable compositions that provide improved adhesion-promoting and improved solvent-susceptibility.Type: GrantFiled: March 7, 2011Date of Patent: December 2, 2014Assignee: Creative Nail Design, Inc.Inventors: Thong Vu, Chad Conger, Diane Marie Larsen, David Valia, Douglas D. Schoon
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Patent number: 8759412Abstract: A polymerisable photoinitiator according to Formula (I): wherein: R1 and R2 are independently selected from the group consisting of hydrogen, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkaryl group, a substituted or unsubstituted aryl or heteroaryl group, a halogen, an ether group, a thioether group, an aldehyde group, a ketone group, an ester group, an amide group, an amine and a nitro group; R1 and R2 may represent the necessary atoms to form a five to eight membered ring; L represents an n+m-valent linking group comprising 1 to 30 carbon atoms; A represents a radically polymerizable group selected from the group consisting of an acrylate group, a methacrylate group, a styrene group, an acryl amide group, a methacryl amide group, a maleate group, a fumarate group, an itaconate group, a vinyl ether group, an allyl ether group, a vinyType: GrantFiled: October 4, 2011Date of Patent: June 24, 2014Assignee: Agfa Graphics NVInventor: Johan Loccufier
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Publication number: 20130261210Abstract: A process for the preparation of polymer lattices comprising polymer nanoparticles by a photo-initiated heterophase polymerization includes preparing a heterophase medium comprising a dispersed phase and a continuous phase and at least one of at least one surfactant, at least one photoinitiator, and at least one polymerizable monomer. The at least one polymerizable monomer is polymerized by irradiating the heterophase medium with electromagnetic radiation so as to induce a generation of radicals. The at least one photoinitiator is selected from compounds comprising at least one phosphorous oxide group (P?O) or at least one phosphorous sulfide (P?S) group. The irradiating of the heterophase medium is effected so that a ratio of an irradiated surface of the heterophase medium to a volume of the heterophase medium is at least 200 m?1.Type: ApplicationFiled: October 17, 2011Publication date: October 3, 2013Applicant: Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V.Inventors: Peter Seeberger, Hansjoerg Gruetzmacher, Klaus Tauer, Judith Braeuer, Paola Laurino
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Patent number: 8507572Abstract: The present invention relates to functionalizing a surface of an organic material. For example, surfaces of materials having C—H bonds, such as polymers having C—H bonds, can be functionalized. In certain embodiments, a heterobifunctional molecule having a photoactive anchor, a spacer, and a terminal functional group is applied to the surface of an organic material that contains one or more C—H bonds. The heterobifunctional molecule can be bound to any surface having C—H bonds as the photoactive anchor can react with C—H bonds upon irradiation. The terminal functional group has a “click” functionality which can be utilized to functionalize the surface of the organic material with any desired functionalizing moiety having the orthogonal click functionality.Type: GrantFiled: June 8, 2010Date of Patent: August 13, 2013Assignee: The Trustees of Columbia University in the City of New YorkInventors: Jeffrey Lancaster, Nicholas J. Turro, Jeffrey T. Koberstein
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Patent number: 8507725Abstract: Compounds of the formula I or (I?), wherein R1 and R?1 for example are hydrogen, C3-C8cycloalkyl or C1-C12alkyl, R2 and R2? for example are hydrogen; unsubstituted C1-C20alkyl or substituted C1-C20alkyl; and R8 and R9 for example are hydrogen, C1-C12alkyl which optionally is substituted, or phenyl which optionally is substituted; exhibit an unexpectedly good performance in photopolymerization reactions.Type: GrantFiled: May 27, 2009Date of Patent: August 13, 2013Assignee: BASF SEInventors: Akira Matsumoto, Hisatoshi Kura
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Patent number: 8507726Abstract: Photoinitiators mixture comprising (i) at least one compound selected from the group consisting of alpha-hydroxy ketones, monoacylphosphine oxides, bisacylphosphine oxides, ketosulfones, benzil ketals, benzoin ether, phenylglyoxylates, borates and titanocenes; and (ii) at least one compound of the formula (I) or (I?) R1, R?1, R2 and R2? R?9 independently of each other for example are hydrogen or C1-C12alkyl R7, R8, R9, R?8 and R?9 independently of each other for example are hydrogen, C1-C12alkyl which optionally is substituted or phenyl which optionally is substituted, exhibit excellent photoinitiating properties.Type: GrantFiled: October 23, 2009Date of Patent: August 13, 2013Assignee: BASF SEInventors: Katia Studer, Sébastien Villeneuve, Akira Matsumoto, Hisatoshi Kura, Jan Sültemeyer
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Patent number: 8492454Abstract: The present disclosure relates to a nail coating system comprising a basecoat, a color layer, and a topcoat. The system of the present disclosure may be applied to natural and/or pre-existing artificial nail coatings. The present disclosure relates generally to compositions for natural and artificial nail coatings, and particularly, but not by way of limitation, to polymerizable compositions and color layers polymerized therefrom. The disclosure further relates to methods of making a polymerized color layer.Type: GrantFiled: October 5, 2009Date of Patent: July 23, 2013Assignee: Creative Nail Design, Inc.Inventors: Thong H. Vu, Diane Marie Larsen, Chad Conger, Douglas D. Schoon
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Curable composition, color filter and process for production thereof, and solid-state imaging device
Patent number: 8492071Abstract: A curable composition containing (A) a polymerizable compound having an alkyleneoxy group having two or more carbon atoms, (B) a polymerizable compound lacking an alkyleneoxy group having two or more carbon atoms, (C) an i-line absorber, (D) a photopolymerization initiator, (E) an alkali-soluble resin, and (F) a pigment, wherein a mass ratio [(A)/((A)+(B))] is from 0.5 to 0.9, and an i-line transmittance obtainable when the curable composition is formed into a coating film having a thickness of 0.7 ?m, is 10% or less. The curable composition of the invention has enhanced adhesiveness upon forming a micro pattern, and can reduce development residues in unexposed non-cured areas. The curable composition of the invention is suitable for the use in color filters.Type: GrantFiled: March 27, 2009Date of Patent: July 23, 2013Assignee: FUJIFILM CorporationInventor: Hiroshi Taguchi -
Patent number: 8404758Abstract: The invention provides methods for inducing reversible chain cleavage of polymer chains in a crosslinked polymeric material. Reversible cleavage of the polymer backbone is capable of relieving stress in the polymeric material as the bonds reform in a less stressed state. The invention also provides methods for making polymeric materials capable of reversible chain cleavage, materials made by the methods of the invention, and linear monomers containing reversible chain cleavage groups which are useful in the materials and methods of the invention.Type: GrantFiled: May 17, 2011Date of Patent: March 26, 2013Assignee: The Regents of the University of Colorado, a body corporateInventors: Christopher N. Bowman, Timothy F. Scott
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Patent number: 8399537Abstract: The present disclosure relates generally to compositions for natural and artificial nail coatings, and particularly, but not by way of limitation, to polymerizable compositions and adhesion-promoting basecoats polymerized therefrom. The disclosure further relates to methods of making a polymerized basecoat that are more easily removed than artificial nail enhancements and more durable and long lasting than nail polish coatings.Type: GrantFiled: April 4, 2011Date of Patent: March 19, 2013Assignee: Creative Nail Design, Inc.Inventors: Chad Conger, Thong Vu
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Patent number: 8349461Abstract: A photo-curing polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonate compound, and a solvent. The polysiloxane contains less than 30 wt % of a polysiloxane fraction having a molecular weight above 8,000, and 35 wt % to 60 wt % of a polysiloxane fraction having a molecular weight ranging from 500 to 2,000 when calculated from an integral molecular weight distribution curve obtained by plotting cumulative weight percentage versus molecular weight falling within a range between 500 and 50,000 measured by gel permeation chromatography. A protective film formed from the photo-curing polysiloxane composition and an element containing the protective film are also disclosed.Type: GrantFiled: August 19, 2011Date of Patent: January 8, 2013Assignee: Chi Mei CorporationInventors: Ming-Ju Wu, Chun-An Shih
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Patent number: 8263677Abstract: The present disclosure relates generally to compositions for natural and artificial nail coatings, and particularly, but not by way of limitation, to polymerizable compositions and adhesion-promoting basecoats polymerized therefrom. The disclosure further relates to methods of making a polymerized basecoat that are more easily removed than artificial nail enhancements and more durable and long lasting than nail polish coatings.Type: GrantFiled: September 8, 2009Date of Patent: September 11, 2012Assignee: Creative Nail Design, Inc.Inventors: Chad Conger, Thong Vu
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Publication number: 20120181703Abstract: A patternable adhesive composition including at least one alkali soluble resin including an alkali soluble group and an acryloyl group, at least one radically polymerizable compound, at least one thermosettable compound, and at least one photo-radical initiator.Type: ApplicationFiled: November 8, 2011Publication date: July 19, 2012Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Joon-Yong PARK, Yong Seok HAN, Jae Jun LEE, Chul Ho JEONG
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Publication number: 20120021142Abstract: The present invention relates to a liquid crystal alignment layer composition showing excellent adhesive strength to a substrate and a liquid crystal layer and excellent homeotropic alignment of liquid crystals, a liquid crystal alignment layer prepared with the same, a preparation method of the liquid crystal alignment layer, an optical film including the liquid crystal alignment layer, and a display device including the same. According to the present invention, provided are a liquid crystal alignment layer composition which comprises 1-50 wt % of a photocurable resin binder, 0.01-5 wt % of an amine compound selected from the group consisting of primary and secondary amino-based coupling agents, 0.Type: ApplicationFiled: April 8, 2010Publication date: January 26, 2012Inventors: Dae-Hee Lee, Moon-Soo Park
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Patent number: 8053167Abstract: Curable compositions have high sensitivity and excellent developability, and further have good storage properties as required. The compositions include a hydroxythiol compound represented by Formula (1) below and a compound with an ethylenically unsaturated double bond: wherein R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group or an aromatic ring; X is an aliphatic group, an aromatic ring-containing group or a heterocyclic ring-containing group; Y is an ester bond; k and l are each an integer ranging from 1 to 20; m is an integer of 0, 1 or 2; and n is 0 or 1.Type: GrantFiled: November 15, 2007Date of Patent: November 8, 2011Assignee: Showa Denko K.K.Inventors: Katsumi Murofushi, Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori
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Patent number: 8008364Abstract: The present invention provides a pigment dispersion liquid including a pigment, a compound having a cyclic urea structure and having an acid group or a basic group, a dispersant, and a solvent. The pigment may be a pigment having a urea structure or an imide structure. The pigment may also be a pigment having a barbituric skeleton.Type: GrantFiled: July 10, 2008Date of Patent: August 30, 2011Assignee: Fujifilm CorporationInventors: Kazuto Shimada, Yushi Kaneko, Tomotaka Tsuchimura
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Patent number: 7943680Abstract: The invention provides methods for inducing reversible chain cleavage of polymer chains in a crosslinked polymeric material. Reversible cleavage of the polymer backbone is capable of relieving stress in the polymeric material as the bonds reform in a less stressed state. The invention also provides methods for making polymeric materials capable of reversible chain cleavage, materials made by the methods of the invention, and linear monomers containing reversible chain cleavage groups which are useful in the materials and methods of the invention.Type: GrantFiled: February 10, 2006Date of Patent: May 17, 2011Assignee: The Regents of the University of ColoradoInventors: Christopher N. Bowman, Timothy F. Scott
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Patent number: 7893126Abstract: An active ray curable ink-jet ink comprising at least one type of a photo acid generating compound, a cationic polymerizable compound and a pigment, wherein the active ray curable ink-jet ink contains a fatty acid amine salt comprising a fatty acid having a carbon number of 6-18 and a primary, a secondary or a tertiary amine having a carbon number of 4-12 in an amount of 0.01-0.70 weight % based on the total weight of the ink-jet ink.Type: GrantFiled: October 29, 2007Date of Patent: February 22, 2011Assignee: Konica Minolta Medical & Graphic, Inc.Inventor: Toshiyuki Takabayashi
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Patent number: 7893129Abstract: Stable, highly filled cationic dental compositions useful for the production of dental prostheses and dental restoration materials contain: (1) at least one compound which is reactive cationically when activated, advantageously at least one UV- and cationically reactive oxirane-functionalized silicone; (2) at least one dental filler, advantageously SiO2; (3) at least one organic polymer or copolymer dispersant having an amine index less than or equal to 100 mg of potassium hydroxide per gram of dispersant, advantageously a polyurethane/acrylate copolymer or alkylammonium salt thereof; (4) at least one cationic photoinitiator, advantageously iodonium borate; and (5) optionally, at least one photosensitizer.Type: GrantFiled: March 9, 2009Date of Patent: February 22, 2011Assignee: Bluestar Silicones France SASInventor: Jean-Marc Frances
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Patent number: 7893130Abstract: Dental compositions are described which are photocurable by radiation with a wavelength greater than 390 nm. The compositions include a cationically active compound, a dental filler, optionally a dispersant, a cationic photoinitiator and a photosensitizer which is a thioxanthone salt substituted by at least one group containing an ammonium function. The composition has the advantage of remedying the color stability problems of finished dental products after crosslinking.Type: GrantFiled: May 10, 2005Date of Patent: February 22, 2011Assignee: Bluestar Silicones France SASInventor: Jean-Marc Frances
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Patent number: 7879923Abstract: This invention is to provide a method for surface-treatment of a water absorbent resin excelling in water absorption properties. This invention relates to a method for the surface-treatment of a water absorbent resin, which comprises: a) mixing 100 parts by weight of a water absorbent resin, 0.01-20 parts by weight of at least one radical polymerization initiator selected from the group consisting of persulfates, hydrogen peroxide, and azo compounds, and a radically polymerizing compound and b) irradiating the resultant mixture with active energy rays. The treatment particularly exalts the absorption ratio against pressure and the saline flow conductivity.Type: GrantFiled: December 9, 2005Date of Patent: February 1, 2011Assignee: Nippon Shokubai Co., Ltd.Inventors: Makoto Matsumoto, Yoshiro Mitsukami, Hiroyuki Ikeuchi, Kazushi Torii, Taku Iwamura
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Patent number: 7812194Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.Type: GrantFiled: August 30, 2006Date of Patent: October 12, 2010Assignee: FUJIFILM CorporationInventors: Kunihiko Kodama, Toshiaki Aoai
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Patent number: 7763202Abstract: The present disclosure relates to a method of surface treating particulate materials with electromagnetic radiation, in particular a method of cross-linking superabsorbent polymer particles using UV irradiation. The method is carried out with a so-called roll reactor, which comprises a rotating roll and an irradiation source. Radical former molecules can be applied on the surface of superabsorbent polymer particles. The particulate material is fed onto the surface of the roll and is irradiated while moved with the rotating roll. The irradiation source is provided such that the radiation emitted by the irradiation source is able to reach at least part of the particulate material that has been fed onto the surface of the roll. The irradiation source for use in the method of the present disclosure is able to emit UV radiation of a wavelength between 201 nm and 400 nm. The present disclosure also relates to absorbent articles comprising surface treated superabsorbent particles made by said method.Type: GrantFiled: February 22, 2008Date of Patent: July 27, 2010Assignee: The Procter & Gamble CompanyInventors: Torsten Lindner, Aleksey Mikhailovich Pinyayev, Andrew Julian Wnuk
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Patent number: 7745507Abstract: This invention is to provide an absorbent member and a method for making such an absorbent member. The absorbent member comprises modified water absorbent having good production efficiency, good absorbency against pressure, good absorption speed, gel strength, good liquid permeability, and the like. The modified water absorbent resin is made by a method, which comprises (i) a mixing step comprising mixing a water absorbent resin, water, and a water-soluble radical polymerization initiator without addition of an ethylenically unsaturated monomer, to obtain a water absorbent resin composition, and (ii) an irradiating step comprising irradiating said water absorbent resin composition obtained in the mixing step with active energy rays, wherein the surface water content of said water absorbent resin in said water absorbent resin composition at least at any point of time in the irradiating step (ii) is controlled to a level of not lower than 3.0% by weight based on 100% by weight of the water absorbent resin.Type: GrantFiled: April 4, 2007Date of Patent: June 29, 2010Assignee: The Procter & Gamble CompanyInventors: Yoshiro Mitsukami, Makoto Matsumoto, Taku Iwamura
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Patent number: 7714032Abstract: The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.Type: GrantFiled: July 25, 2008Date of Patent: May 11, 2010Assignee: Showa Denko K.K.Inventors: Hirotoshi Kamata, Mina Onishi, Katsumi Murofushi
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Patent number: 7709550Abstract: An ink composition is provided that includes a cationically polymerizable compound (a), a compound (b) that generates an acid when exposed to radiation, a colorant (c), and a salt of a weak acid having a pKa of 4 to 8 (d). There is also provided an inkjet recording method that includes a step of discharging the ink composition onto a recording medium, and a step of irradiating the discharged ink composition with radiation so as to cure the ink composition.Type: GrantFiled: September 7, 2006Date of Patent: May 4, 2010Assignee: FUJIFILM CorporationInventor: Toshiaki Aoai
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Publication number: 20100087563Abstract: Compounds of the formula (I), wherein L1, L2, L3 and L4 independently of one another are hydrogen or an organic substituent; R is for example C1-C20alkyl, C5-C12cycloalkyl, C2-C20alkenyl, substituted C1-C20alkyl; X is O, S, NRa or NCORa; Ra is for example hydrogen or C1-C20alkyl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.Type: ApplicationFiled: September 24, 2007Publication date: April 8, 2010Inventors: Pascal Hayoz, Jean-Luc Birbaum, Stephan Ilg
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Publication number: 20100065871Abstract: An ultra violet light transmitting polymer is obtainable by the polymerisation of at least one compound having a substantially non UV absorbing core group comprising; linear or branched aliphatic hydrocarbons which may contain an aliphatic ring; or polydialkylsiloxanes. The compounds have at least one functional group comprising formula (A), (B) or (C):and each of the groups —R3— are, independently, linking groups which may be present or absent and, where present, may be a C1 to C10 hydrocarbon chain, which may contain an ether linkage. Methods for producing the polymers and uses for the polymers are also described.Type: ApplicationFiled: November 29, 2007Publication date: March 18, 2010Inventors: Richard A. Pethrick, Martin David Dawson, Erdan Gu, Allan R. Mackintosh, Alexander Jan-Christoph Kuehne
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Patent number: 7662899Abstract: An organotellurium compound of the formula (1) is useful as a living radical polymerization initiator and makes possible precision control of molecular weights and molecular weight distributions under mild conditions wherein R1 is C1-C8 alkyl, R2 and R3 are each a hydrogen atom or C1-C8 alkyl, and R4 is aryl, substituted aryl, aromatic heterocyclic group, hydroxycarbonyl or cyano.Type: GrantFiled: July 27, 2007Date of Patent: February 16, 2010Assignee: Otsuka Chemical Co., Ltd.Inventors: Shigeru Yamago, Junichi Yoshida
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Patent number: 7579390Abstract: There is proposed an inkjet ink composition comprising a pigment component to which a resin having a basic terminal is adsorbed, a photo-acid generating agent containing an onium salt, and at least one kind of solvent which can be polymerized under the presence of an acid. The content of multivalent salt included in the onium salt is not more than 20% by weight based on a total weight of onium salt, and the content of the pigment component is confined within the range of 3 to 41% by weight based on the ink composition.Type: GrantFiled: March 8, 2005Date of Patent: August 25, 2009Assignee: Toshiba Tec Kabushiki KaishaInventors: Toru Ushirogouchi, Kazuhiko Ohtsu, Mitsuru Ishibashi, Ryozo Akiyama, Masahi Hiroki
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Publication number: 20090163615Abstract: The present application provides a latent ink-jet ink formulation suitable as solder mask. The composition generally comprises: (a) at least one compound capable of self cross-linking (USM); (b) at least one phenolic resin; (c) at least one solvent; (d) at least one mineral filler; (e) at least one polyol; and (f) at least one photoinitiator.Type: ApplicationFiled: August 31, 2006Publication date: June 25, 2009Inventors: Izhar Halahmi, Shalom Luski, Michal Cohen
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Patent number: 7511083Abstract: A method of preparation of a cross-linked hydrogel by graft copolymerisation, said method comprises the steps of preparing an aqueous solution comprising one or more hydrophilic polymers, a cross-linking agent and a photoinitiator comprising a water-soluble peroxydisulphate, subjecting said solution to irradation and obtaining the cross-linked hydrogel, wherein the hydrophilic polymers are saturated and the cross-linking agent acts as a co-catalyst of cross-linking. The hydrogel is fast to produce and has low toxicity. The hydrogel may be suitable for use in medical devices such as dressings and the like.Type: GrantFiled: October 2, 2003Date of Patent: March 31, 2009Assignee: Coloplast A/SInventors: Flemming Madsen, Niels Joergen Madsen
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Publication number: 20080297888Abstract: Methods are disclosed for curing UV-curable monomers and monomer/polymer mixtures that are in an environment in which they are protected from UV radiation.Type: ApplicationFiled: August 13, 2008Publication date: December 4, 2008Inventor: Shui T. LAI
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Publication number: 20080258345Abstract: The present invention relates to liquid radiation-curing compositions having flexible and elastic material properties in the cured state, consisting of the following components: a) from 5.0 to 99.0% by weight of a di- or polyfunctional polyether (meth)-acrylate compound having a molecular weight of more than 1000 g/mol; b) from 1.00 to 90.0% by weight of a mono-, di- or polyfunctional radiation-curing (meth)acrylate compound having a molecular weight of less than 1000 g/mol as a reactive component or reactive thinner or cross-linking agent for the formation of polymer networks; c) from 0.05 to 10.0% by weight of a free-radical forming photoinitiator; d) from 0.001 to 5.0% by weight of further components; with the proviso that the sum of components a) to d) amounts to 100% by weight.Type: ApplicationFiled: July 15, 2005Publication date: October 23, 2008Inventors: Arthur Thomas Bens, Hermann Seitz, Carsten Tille
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Patent number: 7439302Abstract: A new underlayer composition that exhibits high etch resistance and improved optical properties is disclosed. The underlayer composition comprises a vinyl or acrylate polymer, such as a methacrylate polymer, the polymer comprising at least one substituted or unsubstituted naphthalene or naphthol moiety, including mixtures thereof. Examples of the polymer of this invention include: where each R1 is independently selected from an organic moiety or a halogen; each A is independently a single bond or an organic moiety; R2 is hydrogen or a methyl group; and each X, Y and Z is an integer of 0 to 7, and Y+Z is 7 or less. The organic moiety mentioned above may be a substituted or unsubstituted hydrocarbon selected from the group consisting of a linear or branched alkyl, halogenated linear or branched alkyl, aryl, halogenated aryl, cyclic alkyl, and halogenated cyclic alkyl, and any combination thereof.Type: GrantFiled: August 2, 2005Date of Patent: October 21, 2008Assignee: International Business Machines CorporationInventors: Wu-Song Huang, Sean D. Burns, Mahmoud Khojasteh
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Patent number: 7435526Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.Type: GrantFiled: June 14, 2004Date of Patent: October 14, 2008Assignee: FUJIFILM CorporationInventors: Kunihiko Kodama, Toshiaki Aoai
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Publication number: 20080207792Abstract: The present disclosure relates to a method of surface treating particulate materials with electromagnetic radiation, in particular a method of cross-linking superabsorbent polymer particles using UV irradiation. The method is carried out with a so-called roll reactor, which comprises a rotating roll and an irradiation source. Radical former molecules can be applied on the surface of superabsorbent polymer particles. The particulate material is fed onto the surface of the roll and is irradiated while moved with the rotating roll. The irradiation source is provided such that the radiation emitted by the irradiation source is able to reach at least part of the particulate material that has been fed onto the surface of the roll. The irradiation source for use in the method of the present disclosure is able to emit UV radiation of a wavelength between 201 nm and 400 nm. The present disclosure also relates to absorbent articles comprising surface treated superabsorbent particles made by said method.Type: ApplicationFiled: February 22, 2008Publication date: August 28, 2008Inventors: Torsten Lindner, Aleksey Mikhailovich Pinyayev, Andrew Julian Wnuk
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Publication number: 20080194721Abstract: A multi-photon reactive composition comprises an ethylenically unsaturated liquid polysilazane precursor, a multi-functional thiol additive, a multi-ethylenically-unsaturated additive different from the polysilazane, and a multi-photon photocuring composition. The invention can be used to provide ceramic-based microstructures as, for example, high temperature resistant materials, including devices such as microcombustors, micro-heat-exchangers, sensor and actuator systems, microfluidic devices, and micro-optics systems that can be used independently or integrated into other systems.Type: ApplicationFiled: December 27, 2005Publication date: August 14, 2008Inventors: David S. Arney, Feng Bai
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Publication number: 20080139688Abstract: The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.Type: ApplicationFiled: October 25, 2005Publication date: June 12, 2008Applicant: SHOWA DENKO K.K.Inventors: Hirotoshi Kamata, Mina Onishi, Katsumi Murofushi
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Publication number: 20080045619Abstract: A photo-crosslinkable polyolefin composition comprises a polyolefin, a source of functionality receptive to crosslinking by UV radiation, a cationic photoinitiator and optionally includes a free-radical photoinitiator, a crosslinking accelerator or sensitizer, and other additives such as compatibilizers, inorganic fillers, nanofillers, glass, polymeric and ceramic microspheres, glass fibres, flame retardants, antioxidants, stabilizers, processing aids, foaming agents and pigments. A method for manufacturing a UV-crosslinked polyolefin article comprises forming an article by extruding, moulding or otherwise forming the UV-crosslinkable polyolefin composition and subjecting the article to UV radiation on-line with the extrusion, moulding or other forming operation.Type: ApplicationFiled: February 28, 2007Publication date: February 21, 2008Applicant: SHAWCOR LTD.Inventors: Peter Jackson, Eileen Wan
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Patent number: 7329439Abstract: Solvent-free UV-curable polymer materials derived from miscible blends of reactive organic monomeric, oligomeric and low molecular polymeric systems and organic and inorganic fillers such as polytetrafluoroethylene and talc are provided to form polymer-filler composite compositions for use in the fabrication and repair of electronic components and microelectronic assembly processes. The composition contains a preformed thermoplastic or elastomeric polymer/oligomer with reactive end groups, a monofunctional and/or bifunctional acrylate monomer, a multifunctional (more than two reactive groups) acrylated/methacrylated monomer, a photoinitiator and a fluorocarbon polymer powder as an organic filler which is preferably PTFE and an inorganic filler such as talc. A nano-filler may also be used as the inorganic filler alone or in combination with another inorganic filler such as talc.Type: GrantFiled: September 29, 2004Date of Patent: February 12, 2008Assignee: International Business Machines CorporationInventors: Krishna G. Sachdev, Daniel G. Berger, Kelly M. Chioujones, Brian W. Quinlan
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Publication number: 20070203255Abstract: There are provided a compound represented by the following formula (I), a photopolymerizable composition containing (A) a photopolymerization initiator represented by the formula (I) and (B) a radical polymerizable monomer, a color filter produced by using the photopolymerizable composition, and a process for producing the color filter:Type: ApplicationFiled: February 23, 2007Publication date: August 30, 2007Applicant: FUJIFILM CorporationInventor: Tomoya Sasaki
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Patent number: 7247660Abstract: The invention concerns dental compositions. Said composition comprises (1) a silicone crosslinkable and/or polymerizable by cation process; (2) an efficient amount of at least an initiator such as onium borate; (3) at least a photosensitizer ; and (4) a dental filler present in the composition in a proportion of at least 10 wt. % relative to the composition total weight. Said dental compositions are useful for making dental prostheses or for dental restoration.Type: GrantFiled: February 18, 2004Date of Patent: July 24, 2007Assignee: Rhodia ChimieInventor: Jean-Marc Frances
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Patent number: 7244548Abstract: A photopolymerizing composition and a photopolymerizing recording medium manufactured using the composition, wherein the photopolymerizing composition contains: 1.0-99.0% by weight of at least one kind of polymerizable compound; 0.05-0.5% by weight of at least one kind of photosensitizer selected from among photochromic compounds that change color by incoherent UV light irradiation; 0.2-6.0% by weight of a coinitiator that is activated by visible light in the presence of a photoinduced form of the photochromic compound transformed by incoherent UV light to photopolymerize the polymerizable compound; 0-97.5% by weight of a polymer binding agent; 0-6.0% by weight of a plasticizer; and 0-3.0% by weight of a non-polymerizing solvent. The photopolymerizing recording medium has a high angular diffraction selectivity and thus can be effectively used to manufacture a 3D holographic optical memory with ultra high information storage capacity.Type: GrantFiled: November 22, 2004Date of Patent: July 17, 2007Assignees: Samsung Electronics Co., Ltd., Photochemistry Center of Russian Academy of SciencesInventors: Valery Aleksandrovich Barachevsky, Svetlana Ivanovna Peredereeva, Dmitry Valerevich Nesterenko, Aleksandr Vladimirovich Lyubimov, Viktor Kamilievich Salahutdinov, Mikhail Mikhailovich Krayushkin, Nataliya Timofeovna Sokolyuk, Andrei Leanovich Mikaelyan