C-(s)*-c Wherein * Is At Least Two Patents (Class 522/54)
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Publication number: 20140162044Abstract: An adhesive film for polarizing plates includes core-shell particles, each including a core and a shell surrounding the core. An adhesive composition for the adhesive film includes an epoxy compound, a (meth)acrylic compound, core-shell particles, each core-shell particle including a core and a shell surrounding the core, and a photo-initiator. A polarizing plate includes a polarizer, an optical film on one or both sides of the polarizer, and the adhesive film between the polarizer and the optical film. An optical display apparatus includes the polarizing plate.Type: ApplicationFiled: December 10, 2013Publication date: June 12, 2014Applicant: CHEIL INDUSTRIES INC.Inventors: Tae Hyun Lee, Mi Yeon Yu, Do Heon Lee, In Cheon Han
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Publication number: 20120149798Abstract: To provide a photocurable fluorinated polymer composition which has a high curing rate, shows little shrinkage before and after photocuring and requires no post treatment such as heat treatment after photocuring and whereby it is possible to obtain a cured resin excellent in heat resistance and weather resistance. According to the photocurable fluorinated polymer composition comprising a fluorinated polymer (A) containing polymerized units derived from a fluoroolefin and polymerized units derived from an unsaturated monomer having an oxetanyl group or a substituted oxetanyl group, and a photoreaction initiator (B), of the present invention, it is possible to provide a photocurable fluorinated polymer composition which has a high curing rate, shows little shrinkage before and after photocuring and requires no post treatment such as heat treatment after photocuring and whereby it is possible to obtain a cured resin excellent in heat resistance and weather resistance.Type: ApplicationFiled: February 17, 2012Publication date: June 14, 2012Applicant: Asahi Glass Company, LimitedInventors: Shun SAITO, Hiroshi Nishio, Sho Masuda
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Patent number: 7300747Abstract: The photobase generator of the invention is represented by the following formula 1: wherein Ar, R, A+ and X? are as defined in the specification. Since the photobase generator of the formula 1 absorbs ultraviolet lights of relatively long wavelength and is photolyzed to generate a strong base efficiently, a composition containing the photobase generator and an episulfide compound is easily cured by polymerization under ultraviolet irradiation.Type: GrantFiled: February 7, 2005Date of Patent: November 27, 2007Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Hitoshi Okazaki, Junya Hayakawa, Motoharu Takeuchi, Masahiro Jono, Kenji Ishii
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Patent number: 6294698Abstract: The present invention is directed to new, energy-efficient photoinitiators in the form of organic sulfur-containing compounds. The present invention is also directed to a method of generating reactive species which includes exposing one or more photoinitiators to radiation to form one or more reactive species. Also described are methods of polymerizing unsaturated monomers, methods of curing an unsaturated oligomer/monomer mixture, and methods of laminating using the photoinitiators of the present invention.Type: GrantFiled: April 16, 1999Date of Patent: September 25, 2001Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Ronald S. Nohr, J. Gavin MacDonald
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Patent number: 5707777Abstract: A positive-working light-sensitive composition which comprises:(a) 0.5 to 80% by weight of a compound which has at least one group capable of being decomposed by an acid and whose solubility in an alkaline developer is increased by an acid;(b) 0.01 to 20% by weight of a disulfone compound represented by the following formula (I);R.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 (I)wherein R.sup.1 and R.sup.2 may be the same or different and represent a substituted or unsubstituted alkyl, alkenyl or aryl group; and(c) 5 to 99.49% by weight of a resin insoluble in water and soluble in an alkaline water,wherein the compound of the component (a) has a molecular weight of not more than 2,000 and a boiling point of not less than 150.degree. C. and wherein a film of the composition having a thickness of 1 .mu.m has an optical density determined at 248 nm of not more than 1.4 before exposure to light and the optical density of the composition determined at 248 nm is reduced by exposure to light of 248 nm.Type: GrantFiled: June 6, 1995Date of Patent: January 13, 1998Assignee: Fuji Photo Film Co., Ltd.Inventors: Toshiaki Aoai, Tadayoshi Kokubo
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Patent number: 5641346Abstract: An ink jet ink includes a colorant and a liquid component containing at least one of an epoxy and a vinyl ether. Water may also be dissolved in the liquid component. Preferably, the vinyl ether is ethylene glycol monovinyl ether. An ink jet recording process includes the steps of ejecting an ink jet ink, such as the inks of the present invention, from an orifice to form an image on a recording medium.Type: GrantFiled: December 13, 1995Date of Patent: June 24, 1997Assignee: Xerox CorporationInventors: David Allen Mantell, Bing R. Hsieh, William M. Schwarz, Ian D. Morrison, Michael P. O'Horo, Joseph J. Wysocki, Kurt B. Gundlach, Min-Hong Fu, Dale R. Ims
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Patent number: 5466722Abstract: Polymerization of ethylenically unsaturated monomers such as methyl methacrylate can be initiated in solutions containing monomer and a special non-polymeric initiator with intense ultrasound. The number average molecular weight of the poly(methyl methacrylate) that forms is about 300,000 gmol.sup.-1 as compared with polystyrene standards. The conversion of the polymerization is about 50% for poly(methyl methacrylate). Variations of the polymerization rate with time and the amount of the initiator are explained by a simple reaction mechanism.Type: GrantFiled: January 27, 1994Date of Patent: November 14, 1995Inventors: James O. Stoffer, Oliver C. Sitton
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Patent number: 5411995Abstract: Xanthate, dithiocarbamate and dithiophosphate salts of transition metals, together with a coinitiator selected from organic halogen and tertiary amine compounds provide light activated initiator systems for radically polymerizable ethylenically unsaturated compounds such as (meth)acrylate esters.Type: GrantFiled: April 8, 1993Date of Patent: May 2, 1995Assignee: Loctite CorporationInventor: Darchun B. Yang
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Patent number: 5238782Abstract: A photopolymerizable composition comprises at least one addition polymerizable compound having at least one ethylenically unsaturated bond and at least one photopolymerization initiator represented by the following general formula (I): ##STR1## wherein R.sub.1 to R.sub.4 independently represent hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, hydroxyl group, a substituted or unsubstituted alkoxy group, or a substituted or unsubstituted amino group with the proviso that R.sub.1 to R.sub.4 may form a non-metallic ring together with the carbon atoms bonded thereto; R.sub.5 and R.sub.6 each represents hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a heteroaromatic group, an acyl group, cyano group, an alkoxycarbonyl group, carboxyl group or a substituted alkenyl group with the proviso that R.sub.5 and R.sub.Type: GrantFiled: February 26, 1990Date of Patent: August 24, 1993Assignee: Fuji Photo Film Co., Ltd.Inventors: Koichi Kawamura, Mitsuru Koike
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Patent number: 5230982Abstract: A photohardenable composition comprising a free radical addition polymerizable or crosslinkable compound, an ionic dye/reactive counter ion complex capable of absorbing actinic radiation and producing free radicals which initiate free radical polymerization or crosslinking of the polymerizable or crosslinkable compound, and a disulfide represented by the structure ##STR1## wherein X is selected from the group consisting of S and O except in a specific case in which the disulfide is derived from one or more tetrazolyl groups; n represents 0 or 1; A represents the residue of the ring containing the N, C and X atoms, the ring containing five or six members and, in addition, said ring members may be fused to an aromatic ring; and R.sup.Type: GrantFiled: November 19, 1991Date of Patent: July 27, 1993Assignee: The Mead CorporationInventors: Paul D. Davis, Jacqueline G. Truini, David A. Hutchings
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Patent number: 5217760Abstract: Xanthate, dithiocarbamate and dithiophosphate salts of transition metals, together with a coinitiator selected from organic halogen and tertiary amine compounds provide light activated initiator systems for radically polymerizable ethylenically unsaturated compounds such as (meth)acrylate esters.Type: GrantFiled: July 20, 1990Date of Patent: June 8, 1993Assignee: Loctite CorporationInventor: Darchun B. Yang
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Patent number: 5215860Abstract: Energy polymerizable compositions comprising at least one cyanate monomer and as curing agent an organometallic compound are disclosed. The compositions are useful in applications requiring high performance, such as high temperature performance; in composites, particularly structural composities; structural adhesives; tooling for structural composities; electronic applications such as printed wiring boards and semiconductor encapsulants; graphic arts; injection molding and prepregs; and high performance binders.Type: GrantFiled: August 19, 1988Date of Patent: June 1, 1993Assignee: Minnesota Mining and Manufacturing CompanyInventors: Fred B. McCormick, Katherine A. Brown-Wensley, Robert J. DeVoe
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Patent number: 5061605Abstract: A photopolymerizable composition comprises an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator, wherein it comprises a compound represented by the following general formula (I) as the photopolymerization initiator: ##STR1## (wherein R.sub.1 and R.sub.2 may be the same or different and each independently represents a substituted or unsubstituted alkyl, aryl or alkenyl group or R.sub.1 and R.sub.2 may form a non-metallic ring together with the sulfur atoms to which they are bonded; n is 0, 1 or 2; G.sub.1 and G.sub.2 may be the same or different and each represents a hydrogen atom, a cyano group or a substituted or unsubstituted alkoxycarbonyl, aryloxycarbonyl, acyl, arylcarbonyl, alkylthio, arylthio, alkylsulfonyl, arylsulfonyl or fluoroalkylsulfonyl group, provided that G.sub.1 and G.sub.2 do not simultaneously represent hydrogen atoms or G.sub.1 and G.sub.Type: GrantFiled: April 16, 1991Date of Patent: October 29, 1991Assignee: Fuji Photo Film Co., Ltd.Inventors: Kouichi Kawamura, Mitsumasa Tsuchiya
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Patent number: 5057619Abstract: The present invention provides novel siloxane iniferter compounds, block copolymers made therewith, and a method of making the block copolymers. The siloxane iniferter compounds can be represented by the formula ##STR1## wherein T and X are organic groups selected so that the T-X bond is capable of dissociating upon being subjected to an appropriate energy source to form a terminator free radical of the formula T and an initiator free radical.r.sub.1, R.sub.2, R.sub.5 and R.sub.6 are monovalent moieties selected from the group consisting of hydrogen, C.sub.1-4 alkyl, C.sub.1-4 alkoxy and aryl which can be the same or are different;R.sub.3 and R.sub.4 are monovalent moieties which can be the same or different selected from the group consisting of hydrogen, C.sub.1-4 alkyl, C.sub.Type: GrantFiled: February 26, 1991Date of Patent: October 15, 1991Assignee: Minnesota Mining and Manufacturing Co.Inventors: Ramesh C. Kumar, Milton H. Andrus, Jr., Mieczyslaw H. Mazurek
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Patent number: 5047442Abstract: A photopolymerizable composition comprising a vinylic compound, a sulfur-containing compound and an .alpha.-diketone is disclosed. The sulfur-containing compound may be a mercaptobenzoic acid or a polysulfide.Type: GrantFiled: August 2, 1988Date of Patent: September 10, 1991Assignee: Mitsubishi Rayon Company LimitedInventors: Isao Sasaki, Nobuhiro Mukai
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Patent number: 4918114Abstract: A process for preparing a telechelic vinyl resin of a low molecular weight having alkoxysilylalkyl thioether groups at both termini, which comprises subjecting 1 to 20 parts by weight of one or more of a disulfide compound, 0.01 to 1 part by weight of one or more of a tetrasulfide compound, and 100 parts by weight of a vinyl monomer to photopolymerization reaction, a part of the vinyl monomer being optionally substituted with a monomer having an alkoxysilyl group, and the resin prepared by said process. The resin of the present invention provides a crosslinkable resin having an excellent physical strength after curing and can be used for paints, adhesives, sealants, pressure-sensitive adhesives and the like.Type: GrantFiled: November 30, 1988Date of Patent: April 17, 1990Assignee: Sunstar Giken Kabushiki KaishaInventors: Akira Kuriyama, Hiromu Okamoto
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Patent number: 4826888Abstract: A photopolymerizable composition comprising a vinyl monomer, a mercaptocarboxylic acid/.alpha.-diketone photopolymerization initiator and a storage stabilizer. The composition may admit of a filler, and exhibits excellent mechanical strength, storage stability, color and resistance to coloring, and availability.Type: GrantFiled: April 2, 1986Date of Patent: May 2, 1989Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Isao Sasaki, Nobuhiro Mukai, Hitoshi Ige
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Patent number: 4777190Abstract: A photopolymerizable composition comprising a vinylic compound, a sulfur-containing compound and an .alpha.-diketone is disclosed. The sulfur-containing compound may be a mercaptobenzoic acid or a polysulfide.Type: GrantFiled: August 15, 1985Date of Patent: October 11, 1988Assignee: Mitsubishi Rayon Company LimitedInventors: Isao Sasaki, Nobuhiro Mukai
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Patent number: 4767797Abstract: A linear polymer having a recurring unit represented by the formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each independently is a hydrogen atom, a C.sub.1-10 alkyl group, a C.sub.6-10 cycloalkyl group, an aryl group, or a halogen atom and the ethynyl group is in either meta position or para position to the main polymer chain;and a weight-average molecular weight of 1,000 to 1,000,000. A resin composition consisting essentially of (i) a polymer having a recurring unit represented by the formula (I) or a polymer having a recurring unit represented by the formula (I) and a recurring unit represented by the formula (II): ##STR2## wherein X and Y each independently is a C.sub.6-20 aryl group, a C.sub.1-10 alkyl group, a C.sub.6-10 cycloalkyl group, a silyl group having a C.sub.1-10 alkyl group or a C.sub.Type: GrantFiled: August 25, 1986Date of Patent: August 30, 1988Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Hideo Ai, Yohsuke Koizumi, Naohiro Tsuruta
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Patent number: 4665106Abstract: A radiation curable pressure-sensitive adhesive composition comprising a liquid oligomer having one or more acrylic double bonds in its molecule, a chain transfer agent and an aliphatic polar monomer having a carboxyl group can give an adhesive tape excellent in rubber-like properties, high in cohesive force and good in adhesiveness at low temperatures.Type: GrantFiled: July 23, 1985Date of Patent: May 12, 1987Assignee: Hitachi Chemical Company, Ltd.Inventors: Tomohisa Ohta, Akihiko Dobashi, Hisashige Kanbara, Yasuyuki Seki
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Patent number: 4599155Abstract: There is disclosed a resin composition comprising(A) a spiro ortho ester compound and/or a spiro ortho carbonate compound;(B) an aluminum compound; and(C) a silanol compound or a silicon compound which is capable of generating a silanol group;the amounts of components (B) and (C) being within the range of 0.001 to 10% by weight and 0.1 to 20% by weiht, based on the amount of component (A), respectively.The resin composition of this invention is excellent in volumetric shrinkage performance at curing operation and is good in storability. Therefore, the cured product can be used for a wide variety of industrially valuable applications, such as an ink, a coating, an adhesive, a surface coating, an encapsulation and an electrical insulating material.Type: GrantFiled: September 21, 1984Date of Patent: July 8, 1986Assignee: Kabushiki Kaisha ToshibaInventors: Shuichi Suzuki, Moriyasu Wada, Shuzi Hayase