Hetero Sulfur Ring Patents (Class 522/53)
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Publication number: 20080275153Abstract: The present invention relates to an ultraviolet curable resin of the present invention which is prepared from alkyl(meth)acrylates, glycidyl(meth)acrylate, and substituted or unsubstituted acrylic acid, wherein the resin contains terminal vinyl group in amount of at least 50 wt % based on the resin and its glass transition temperature (Tg) is in a range of from 40˜100° C. The present invention also relates to a resin composition containing the ultraviolet curable resin.Type: ApplicationFiled: August 16, 2007Publication date: November 6, 2008Applicant: CHANG CHUN PLASTICS CO., LTD.Inventors: Kuen-Yuan Hwang, An-Pang Tu, Ping-Chieh Wang, Chie-Wei Yang
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Patent number: 7405308Abstract: Triarylsulfonium salts of formula I or II are useful as initiators for cationic photopolymerizations: wherein Ar1 and Ar2 are independently polycyclic aryl, substituted aryl, heteroaryl, substituted heteroaryl, or aryl or heteroaryl, pendant from a polymer chain; and MtXn? is a complex anion selected from PF6?, SbF6?, AsF6?, GaF6?, BF4?, (C6F5)4B? and CF3SO2)3C?.Type: GrantFiled: November 16, 2004Date of Patent: July 29, 2008Assignee: Rensselaer Polytechnic InstitueInventor: James V. Crivello
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Patent number: 7354957Abstract: Compounds of formula (I): {where n is a number from 1 to 6; R3 is hydrogen, methyl or ethyl; A represents a group of formula —[O(CHR2CHR1)a]y—,—[O(CH2)bCO]y—, or —[O(CH2)bCO]y—,—[O(CHR2CHR1)a]-(where one of R1 and R2 is hydrogen and the other is hydrogen, methyl or ethyl); a is from 1 to 2; b is from 4 to 5; y is from 3 to 10, Q is a residue of a polyhydroxy compound having 2 to 6 hydroxy groups; and x is greater than 1 but no greater than the number of available hydroxyl groups in Q} and esters thereof are useful as photoinitiators for the preparation of energy-curable compositions, such as printing inksType: GrantFiled: September 24, 2002Date of Patent: April 8, 2008Assignee: Sun Chemical CorporationInventor: Shaun Lawrence Herlihy
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Publication number: 20080076847Abstract: Composition with at least one polymerizable binder and a polymerization initiator, which contains at least one acylgermane according to general Formula (I), in which R0 is a substituted or unsubstituted C1-18-alkyl radical or an acyl group; R1 and R2 are H, an acyl group or have one of the meanings given for R3; R3 is a branched or linear C1-18-alkyl radical which can be unsubstituted or substituted one or more times by —O—, —NH—, —NR—, —S— or interrupted by other groups, trimethylsilyl, hal-(CH3)2Si—[OSi(CH3)2]r?, (CH3)3Si—[OSi(CH3)2]r—, —COOH, —COO—R10, —CO—NR11R12, —CO-vinyl, —CO-phenyl, phenyl-C1-4-alkyl, phenyl, naphthyl or biphenyl, C5-12 cycloalkyl, a 5 or 6-membered O, S or N-containing heterocyclic ring, halogen, OH, an aromatic C6-30 radical which can be substituted or unsubstituted and/or interrupted by O, S or —NR—, or a branched, cyclic or linear C1-20 alkyl, -alkenyl, -alkoxy or -alkenoxy radical; m is 1, 2 or 3; n is 0 or 1 and p is 0 or 1; and the use of acyl germanes of Formula (I) for exType: ApplicationFiled: April 2, 2007Publication date: March 27, 2008Applicant: IVOCLAR VIVADENT AGInventors: Norbert Moszner, Ulrich Salz, Urs Karl Fischer, Robert Liska, Heinrich Gruber, Beate Ganster
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Patent number: 7285310Abstract: An active energy ray curable ink which is quickly polymerized by an active energy ray, high in crosslinking degree of a cured material formed, excellent in adhesive property, low in viscosity, excellent in long-term storability and also excellent in ejection stability, and an ink-jet recording process, an ink cartridge, a recording unit and an ink-jet recording apparatus using such an ink are provided. In the active energy ray curable aqueous ink comprising at least water and a polymerizable material which is radically polymerized by an active energy ray, the polymerizable material is a water-soluble polymerizable material represented by the following general formula (I).Type: GrantFiled: September 6, 2005Date of Patent: October 23, 2007Assignee: Canon Kabushiki KaishaInventors: Tsuyoshi Kanke, Hiromitsu Kishi, Hiromichi Noguchi, Yutaka Kurabayashi
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Patent number: 7262231Abstract: The invention provides compounds which can generate amine by irradiation with light and are excellent both in photodecomposability and in reactivity and compatibility with amine-curable compounds, and photo-setting compositions containing the compounds. The compounds are carbamoyloxyimino compounds represented by the structural formula (I); and the compositions each comprise one or more of the carbamoyloxyimino compounds and an amine-curable compound. In the formula (I), R1 is an n-valent organic group; R2 and R3 are each hydrogen or an aromatic or aliphatic group; and n is an integer of 1 or above.Type: GrantFiled: August 16, 2005Date of Patent: August 28, 2007Assignee: Sekisui Chemical Co., Ltd.Inventors: Hideaki Ishizawa, Hiroji Fukui, Takeo Kuroda
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Patent number: 7256221Abstract: Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.Type: GrantFiled: November 7, 2003Date of Patent: August 14, 2007Assignee: Corning IncorporatedInventors: Kelsee L. Coykendall, Paul G. Dewa, Robert Sabia, David C. Sauer, Paul J. Shustack, Kamal K. Soni
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Patent number: 7244548Abstract: A photopolymerizing composition and a photopolymerizing recording medium manufactured using the composition, wherein the photopolymerizing composition contains: 1.0-99.0% by weight of at least one kind of polymerizable compound; 0.05-0.5% by weight of at least one kind of photosensitizer selected from among photochromic compounds that change color by incoherent UV light irradiation; 0.2-6.0% by weight of a coinitiator that is activated by visible light in the presence of a photoinduced form of the photochromic compound transformed by incoherent UV light to photopolymerize the polymerizable compound; 0-97.5% by weight of a polymer binding agent; 0-6.0% by weight of a plasticizer; and 0-3.0% by weight of a non-polymerizing solvent. The photopolymerizing recording medium has a high angular diffraction selectivity and thus can be effectively used to manufacture a 3D holographic optical memory with ultra high information storage capacity.Type: GrantFiled: November 22, 2004Date of Patent: July 17, 2007Assignees: Samsung Electronics Co., Ltd., Photochemistry Center of Russian Academy of SciencesInventors: Valery Aleksandrovich Barachevsky, Svetlana Ivanovna Peredereeva, Dmitry Valerevich Nesterenko, Aleksandr Vladimirovich Lyubimov, Viktor Kamilievich Salahutdinov, Mikhail Mikhailovich Krayushkin, Nataliya Timofeovna Sokolyuk, Andrei Leanovich Mikaelyan
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Patent number: 7226957Abstract: A method for producing polymers with controlled molecular weight and desired end functionalities and the resulting polymers. The method comprises a) forming a microemulsion comprising monomer, water, and an effective amount of an effective surfactant, b) adding to the microemulsion an amount of a water-soluble photo-initiator system wherein the initiator system produces one type of monomer-soluble radical active centers and wherein the radical active centers contain desired end group functionalities for a polymer or oligomer, and c) illuminating the microemulsion to photoinitiate polymerization of the monomer wherein the illuminating is according to a temporal and spatial illumination scheme, and wherein the amount of the initiator system and the temporal illumination scheme are chosen to produce a desired molecular weight of the polymer or oligomer. The microemulsion can further comprise an effective amount of an effective co-surfactant. The method can be used to produce polymers and copolymers.Type: GrantFiled: November 3, 2003Date of Patent: June 5, 2007Assignee: University of Iowa Research FoundationInventors: Alec Scranton, Kaveri Jain
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Patent number: 6867242Abstract: The invention relates to a method for producing a sealed impregnation and/or release coating of flat joints, in particular of cylinder-head gaskets such as composite seals, metallic joints and multi-layered steel joints. The invention uses a silicone composition including at least a polyorganosiloxane A crosslinkable by a cationic and/or radical process by appropriate crosslinking functional groups, for example, of the alkenyl ether, acrylic, acrylate, epoxide and/or oxethane type; at least an initiator salt B selected among onium borates or an organometallic complex; and at least a reactive diluent C including a nonorganosilicon or organosilicon compound comprising in its structure at least a crosslinking functional group and optionally a secondary functional group different from the crosslinking functional group but capable of chemically reacting with a crosslinking functional group, for example of the hydroxyl, alkoxy and/or carboxyl type.Type: GrantFiled: June 8, 2000Date of Patent: March 15, 2005Assignee: Rhodia ChimieInventors: Jean-Marc Frances, Olivier Loubet
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Patent number: 6864300Abstract: A photoreactive adhesive composition which is of the one-pack type, has excellent workability, cures upon irradiation with light, and can have sufficient initial adhesion strength and heat resistance immediately after bonding. The photoreactive adhesive composition comprises a urethane prepolymer and a compound which generates an amine upon irradiation with light, wherein the amine-generating compound is a cobalt/amine complex, O-acyloxime, or carbamic acid derivative.Type: GrantFiled: March 27, 2001Date of Patent: March 8, 2005Assignee: Sekisui Chemical Co., Ltd.Inventor: Hideaki Ishizawa
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Patent number: 6824858Abstract: A photocurable and thermosetting composition which is useful in forming a matte film and can be developed with an aqueous alkaline solution is provided. The composition comprises (A) a photosensitive prepolymer obtained by causing a saturated or unsaturated polybasic acid anhydride to react with a hydroxyl group of an esterification product of a novolak type epoxy compound and an unsaturated monocarboxylic acid, (B) a carboxyl group-containing copolymer resin, (C) a photopolymerization initiator, (D) a diluent, (E) a polyfunctional epoxy compound having at least two epoxy groups in its molecule, and, when necessary, (F) an inorganic filler. The composition may further comprise (G) an epoxy resin curing agent. This composition can be advantageously used for the formation of a solder resist on a printed circuit board.Type: GrantFiled: August 13, 2002Date of Patent: November 30, 2004Assignee: Taiyo Ink Manufacturing Co., Ltd.Inventors: Satoru Iwaida, Yoshihiro Ohno, Masayuki Isono, Akio Sekimoto
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Patent number: 6790875Abstract: An useful aqueous photocurable resin composition is provided. The aqueous photocurable resin composition of the present invention comprises at least water, a polymerizable material polymerizable with radical initiation and a water-soluble photopolymerization initiator which generates a radical with light, wherein the polymerizable material has at least two polymerizable functional groups and one anionic functional group.Type: GrantFiled: September 14, 2001Date of Patent: September 14, 2004Assignee: Canon Kabushiki KaishaInventors: Hiromichi Noguchi, Yuko Suga, Hiroyuki Maeda, Masako Shimomura
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Patent number: 6784222Abstract: An electroconductive coating composition which function as a sealer/primer includes (a) a radiation curable, polymerizable compound, (b) a photoinitiator and (c) a conductive pigment. The conductive pigment may be a mixture of pigment including a blend of conductive pigments as well as conductive pigment. Conductivity enhancers may, also, be added. The polymerizable compound is, preferably, a U curable acrylate functional compound which may be monofunctional or polyfunctional. The composition is particularly useful for sealing and priming SMC panels.Type: GrantFiled: March 6, 2002Date of Patent: August 31, 2004Inventors: Frank David Zychowski, Joseph C. Sgro
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Patent number: 6709804Abstract: A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with a photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or polyimide and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprises coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition forms a resin layer having excellent heat resistance.Type: GrantFiled: February 19, 2003Date of Patent: March 23, 2004Assignees: Riken, Sumitomo Bakelite Company, Ltd.Inventors: Yusuke Tajima, Kazuo Takeuchi, Yasuo Shigemitsu, Etsu Takeuchi
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Publication number: 20030082355Abstract: A photocurable and thermosetting composition which is useful in forming a matte film and can be developed with an aqueous alkaline solution is provided. The composition comprises (A) a photosensitive prepolymer obtained by causing a saturated or unsaturated polybasic acid anhydride to react with a hydroxyl group of an esterification product of a novolak type epoxy compound and an unsaturated monocarboxylic acid, (B) a carboxyl group-containing copolymer resin, (C) a photopolymerization initiator, (D) a diluent, (E) a polyfunctional epoxy compound having at least two epoxy groups in its molecule, and, when necessary, (F) an inorganic filler. The composition may further comprise (G) an epoxy resin curing agent. This composition can be advantageously used for the formation of a solder resist on a printed circuit board.Type: ApplicationFiled: August 13, 2002Publication date: May 1, 2003Inventors: Satoru Iwaida, Yoshihiro Ohno, Masayuki Isono, Akio Sekimoto
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Patent number: 6555592Abstract: A photothermosetting composition is described which contains a base resin (A), a photopolymerizable photomonomer or photooligomer (B), a photoinitiator (C), an epoxide compound containing at least two epoxy groups (D), and an organic solvent. The base resin (A) an epoxide compound (a) containing at least two epoxy groups, an unsaturated monobasic acid (b), a saturated or unsaturated dibasic acid (c), and a saturated or unsaturated acid anhydride (d) according to the ratio of (a)/(b)/(c) of 1:0.90˜0.95:0.025˜0.050 and the acid value of the base resin is in the range of 40˜49 mg KOH/g. This photothermosetting component was coating on the substrate, and then dried by baking, exposed by light, developed, irradiated by ultraviolet light or heated, and cured to form a solder mask.Type: GrantFiled: February 27, 2001Date of Patent: April 29, 2003Assignee: Advance Materials CorporationInventors: Chao-Hui Tseng, Fu-Lung Chen
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Patent number: 6528231Abstract: A photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or a polyimide. A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with the photosensitive resin composition and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprise coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition can form a resin layer having excellent heat resistance.Type: GrantFiled: January 24, 2000Date of Patent: March 4, 2003Assignees: Riken, Sumitomo Bakelite Company, Ltd.Inventors: Yusuke Tajima, Kazuo Takeuchi, Yasuo Shigemitsu, Etsu Takeuchi
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Patent number: 6489374Abstract: The invention relates to &agr;-ammonium alkenes, iminium alkenes and amidinium alkenes in the form of their tetraaryl- or triaryl-alkylborate salts that can be converted photochemically into amines, imines or amidines, and to a process for the preparation thereof. The invention relates also to compositions polymerisable or crosslinkable under basic conditions comprising such &agr;-ammonium alkenes, iminium alkenes or amidinium alkenes in the form of their tetra- or tri-arylalkylborate salts, to a method of carrying out photochemically induced, base-catalysed reactions, and to the use of such compounds as photoinitiators for base-catalysed reactions.Type: GrantFiled: February 16, 2001Date of Patent: December 3, 2002Assignee: Ciba Specialty Chemicals CorporationInventors: Gisèle Baudin, Sean Colm Turner, Allan Francis Cunningham
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Patent number: 6485886Abstract: New oxime derivatives of formula (I) or. (II), wherein m is 0 or 1; R1 inter alia is phenyl, naphthyl, anthracyl, phenanthryl or a heteroaryl radical; R′1 is for example C2-C12alkylene, phenylene, naphthylene; R2 is CN; R3 is C2-C6haloalkanoyl, halobenzoyl, a phosphoryl or an organosilyl group; R4, R5, R10 and R11 inter alia are hydrogen, C1-C6alkyl, C1-C6alkoxy; R6 inter alia is hydrogen phenyl, C1-C12alkyl; R7 and R8 inter alia are hydrogen, C1-C12alkyl; or R7 and R8, together with the nitrogen atom to which they are bonded, form a 5-, 6 or 7-membered ring; R9 is for example C1-C12alkyl; and A inter alia is S, O, NR7a; are useful as latent acids, especially in photoresist applications.Type: GrantFiled: April 24, 2001Date of Patent: November 26, 2002Assignee: Ciba Specialty Chemicals CorporationInventors: Hitoshi Yamato, Toshikage Asakura, Jean-Luc Birbaum, Kurt Dietliker
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Patent number: 6451869Abstract: Cyclopentadienylplatinum (IV) compounds having C7-20 aromatic radical substitution on the cyclopentadienyl ring have been found to impart enhanced cure speed and shelf-life stability to irradiation-curable silicone mixtures.Type: GrantFiled: September 13, 2000Date of Patent: September 17, 2002Assignee: General Electric CompanyInventor: Matthew David Butts
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Patent number: 6432616Abstract: The present invention provides a water soluble polymer which is prepared by the following steps. First, a carboxyl group-containing polymer is reacted with an alkaline reagent so that a portion of the carboxyl groups are reacted in an amount sufficient to make the polymer water soluble. Then, the polymer obtained is reacted with an epoxide containing unsaturated bonds and/or heteroatoms so that 1 to 100 mole percent of the remaining carboxyl groups of the polymer are reacted with the epoxide to form ester groups via a ring-opening reaction of epoxides, wherein the heteroatom can be silicon, nitrogen, phosphorus or sulfur. The water soluble polymer of the present invention can be used as a photosensitive resin. When the photoresist composition is used for preparing printed ciruit boards, it exhibits high photosensitivity, good water dispersability, storage stability, and good adhesion to copper. In addition, the problem of sticking to the mask can be prevented.Type: GrantFiled: August 7, 2000Date of Patent: August 13, 2002Assignee: Industrial Technology Research InstituteInventors: Tsing-Tang Song, Shung-Jim Yang, Hsiu-Mei Chen, Yi-Hua Liu
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Patent number: 6429235Abstract: An energy-curable polymer-forming composition for making a pressure sensitive adhesive includes an unsaturated oligomer resin and an adhesive promoter which increases the peel strength of the adhesive without reducing its tack. The composition also includes a tackifier and various other optional components such as photoinitiator, chain extender, reactive diluent and the like.Type: GrantFiled: September 15, 1999Date of Patent: August 6, 2002Assignee: Cognis CorporationInventors: Ulrike Varlemann, Ning Chen, Arifin Marzuki, Ramesh Narayan
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Patent number: 6312553Abstract: An adhesive silicone elastomer film obtained by forming a radiation-curable silicone rubber composition into a film and curing the resulting film by radiation; the composition including (A) an oily organopolysiloxane, (B) a radiation sensitizer and (C) an alkoxysilane and/or a partial hydrolysis-condensation product thereof. The oily organopolysiloxane includes, e.g., a compound represented by the formula: This film can be produced in a short time as clean films easy to handle and having a uniform shape, can rationalize work steps when used, and also has a low elasticity and sufficient heat resistance, adhesiveness and workability. This film is useful in the covering or bonding of articles.Type: GrantFiled: December 20, 1999Date of Patent: November 6, 2001Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hiroshige Okinoshima, Tsutomu Kashiwagi
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Patent number: 6284185Abstract: An ultraviolet-curable adhesive composition comprising a photopolymerization initiator whose molar absorption coefficient at a wavelength of 360-450 nm is at least 400 and an ultraviolet-curable compound. The adhesive composition of this invention can bond substrates which show transmittances of 0.01-20% to all of energy beams of a wavelength of 280-380 nm, to one another such as base boards for an optical disk.Type: GrantFiled: March 9, 2000Date of Patent: September 4, 2001Assignee: Nippon Kayaku Kabushiki KaishaInventors: Kiyohisa Tokuda, Kazuhiko Ishii
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Publication number: 20010018467Abstract: A method of priming a sheet molding compound (SMC) part. The method includes applying a photopolymerizable priming composition to a surface of the SMC part. The priming composition includes a polymerizable component, a photoinitiating component, and a conductive component. The method also includes irradiating the priming composition with light to initiate a polymerization reaction. The priming composition polymerizes on the SMC part substantially without releasing volatile solvents.Type: ApplicationFiled: December 20, 2000Publication date: August 30, 2001Inventor: Robert Dunkle
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Publication number: 20010012596Abstract: Compounds of the formulae I, II, III, IV and V 1Type: ApplicationFiled: December 12, 2000Publication date: August 9, 2001Inventors: Kazuhiko Kunimoto, Hidetaka Oka, Masaki Ohwa, Junichi Tanabe, Hisatoshi Kura, Jean-Luc Birbaum
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Patent number: 6265458Abstract: The present invention is directed to new, energy-efficient, photoinitiators having the following general formula: wherein of X1 is a conjugated system such as one or more aryl groups or substituted aryl groups; Z1 is —O, —S, an alkyl group having from one to six carbon atoms, an ester moiety, a ketone moiety, an amine moiety, an imine moiety, an ether moiety, an aryl or substituted aryl group, a metal or non-metal, or a metal or non-metal containing group, such as a zinc-containing group or a boron-containing group, respectively; and M1 is an alkyl group, a substituted alkyl group, or forms a five-member ring with Z1. The present invention is also directed to a method of generating a reactive species, which includes exposing one or more photoinitiators to radiation to form one or more reactive species.Type: GrantFiled: September 28, 1999Date of Patent: July 24, 2001Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Ronald S. Nohr, John Gavin MacDonald
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Patent number: 6235807Abstract: A curing process for cationically polymerisable monomers, which comprises applying a composition comprising: (a) at least one cationically polymerisable monomer, (b) as photoinitiator at least one iodonium salt containing an SbF6, PF6 or BF4 anion, (c) one pigment, and (d) at least one sensitiser, to a substrate, irradiating it with light having a wavelength of 200-600 nm and then heat-postcuring it, is distinguished by little yellowing of the cured formulation.Type: GrantFiled: December 14, 1998Date of Patent: May 22, 2001Assignee: Ciba Specialty Chemicals CorporationInventor: Ljubomir Misev
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Patent number: 6211262Abstract: A corrosion resistant coating for metal surfaces curable with actinic radiation. The blend uses acrylate resin, photoinitiator and a corrosion preventing agent such as a metal surface passivator, overbased calcium sulfonate/calcium carbonate, a barrier pigment, or a combination of two or more of these agents.Type: GrantFiled: April 20, 1999Date of Patent: April 3, 2001Assignee: Spectra Group Limited, Inc.Inventors: Alexandre Mejiritski, Thomas Marino, Violeta Lungu, Dustin Martin, Douglas Neckers
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Patent number: 6210517Abstract: A radiation curable precursor coating composition for the preparation of a non-blocking, heat activatable adhesive includes a curable acrylic material, a curable elastomeric material, and a hydrocarbon tackifier material having a softening temperature ranging from approximately 50° C. to approximately 200° C., wherein when the acrylic material and the elastomeric material are cured, the coating composition is non-blocking at room temperature, but when the coating composition is heated to a temperature above both the softening temperature of the hydrocarbon tackifier and the Tg of the coating composition, the coating composition becomes adhesive.Type: GrantFiled: April 13, 1999Date of Patent: April 3, 2001Assignee: Diversified Chemical Technologies, Inc.Inventors: Rajan Eadara, Mooil Chung, David Wen-Lung Chang, Weichen Chi
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Patent number: 6207726Abstract: A photocurable prepreg composition which is characterized by easy control of a B stage state of a thermosetting resin such as an unsaturated polyester resin or an epoxy acrylate resin, excellent storage stability, and remarkable curability after being shaped; as well as a production method therefor. A photocurable prepreg composition which contains an unsaturated polyester resin and/or an epoxy acrylate resin; at least two photopolymerization initiators with photosensitivity in different wavelength ranges; and an inorganic or an organic fiber-reinforcing material and/or filler, and which composition is treated with light of a specific wavelength such that at least one photopolymerization initiator and radical-polymerizable unsaturated groups remain partially in said resin; a production method therefor; and formed articles produced therefrom.Type: GrantFiled: February 11, 1999Date of Patent: March 27, 2001Assignees: Showa Denko Kabushiki Kaisha, Showa Highpolymer Co., Ltd.Inventors: Kazuo Ohtani, Tomio Yamamoto, Hidetake Sendai, Shuichi Sugita, Hirotoshi Kamata, Takeo Watanabe
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Patent number: 6180317Abstract: An improved photoimagable cationically polymerizable epoxy based coating material is provided, that is suitable for use on a variety of substrates including epoxy-glass laminate boards cured with dicyandiamide. The material includes an epoxy resin system consisting essentially of between about 10% and about 80% by weight of a polyol resin which is a condensation product of epichlorohydrin and bisphenol A having a molecular weight of between about 40,000 and 130,000; and between about 35% and 72% by weight of an epoxidized glycidyl ether of a brominated bisphenol A having a softening point of between about 60° C. and about 110° C. and a molecular weight of between about 600 and 2,500. Optionally, a third resin may be added to the resin system. To this resin system is added about 0.Type: GrantFiled: November 18, 1991Date of Patent: January 30, 2001Assignee: International Business Machines CorporationInventors: Robert David Allen, Richard Allen Day, Donald Herman Glatzel, William Dinan Hinsberg, John Richard Mertz, David John Russell, Gregory Michael Wallraff
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Patent number: 6162841Abstract: New betaketosulfonic derivatives, the process for their preparation, the photopolymerizable systems containing the same and their application as polymerization photoinitiators for inks, and particularly for inks having high content of pigments are described.Type: GrantFiled: March 3, 1998Date of Patent: December 19, 2000Assignee: Lamberti S.p.A.Inventors: Paola Giaroni, Piero Di Battista, Giuseppe Li Bassi
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Patent number: 6140385Abstract: Novel substituted diaryl ketones, photopolymerization compositions including the compounds, and methods using the same are disclosed. Polymerization of compositions which include the compounds of the invention may be activated by irradiating the composition with ultraviolet light using conventional techniques and radiation sources to give greatly improved cure speeds. The compounds of the invention also show a significantly elevated level of reactivity at a narrow wavelength band, with a peak emission wavelength at or near 308 nm. Because of the increased level of activity, the photoinitiator can be used in considerably lower amounts.Type: GrantFiled: September 30, 1998Date of Patent: October 31, 2000Assignee: First Chemical CorporationInventors: Joseph Stanton Bowers, Jr., Rajamani Nagarajan, Charles Uriah Pittman, Jr., E. Sonny Jonsson
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Patent number: 6087066Abstract: This invention relates to polyvinyl acetals containing the units A, B, C and D, whereinA is present in an amount of 0.5 to 20 wt.-% and is of the formula ##STR1## B is present in an amount of 15 to 35 wt.-% and is of the formula ##STR2## C is present in an amount of 10 to 50 wt.-% and is of the formula ##STR3## wherein R.sup.1 is an alkyl group with up to 4 carbons, which is optionally substituted by an acid group, or a phenyl group, to which an acid group is attached, wherein the phenyl group optionally comprises 1 to 2 further substituents selected from halos, amino, methoxy, ethoxy, methyl and ethyl groups, or is a group X--NR.sup.6 --CO--Y--COOH, wherein X is an aliphatic, aromatic or araliphatic spacer group, R.sup.6 is hydrogen or an aliphatic, aromatic or araliphatic moiety and Y is a saturated or unsaturated chain- or ring-shaped spacer group, and this unit C may be contained several times with various moieties R.sup.1 independent of one another, and D is present in an amount of 25 to 70 wt.Type: GrantFiled: October 14, 1999Date of Patent: July 11, 2000Assignee: Kodak Polychrome Graphics LLCInventors: Harald Baumann, Celin Savariar-Hauck, Hans-Joachim Timpe
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Patent number: 6087070Abstract: The invention relates to organic compounds having a molecular weight of less than 1000 comprising at least one structural unit of the formula (I) ##STR1## in which R.sub.1 is an aromatic or heteroaromatic radical which is capable of absorbing light in the wavelength range from 200 to 650 nm and in doing so brings about cleavage of the adjacent carbon-nitrogen bond.The compounds represent photoinitiators for base-catalyzable reactions. Other subjects of the invention are base-polymerizable or crosslinkable compositions comprising compounds having a structural unit of the formula I, a method of implementing photochemically induced, base-catalyzed reactions, and the use of the compounds as photoinitiators for base-catalyzed reactions.Type: GrantFiled: March 16, 1998Date of Patent: July 11, 2000Assignee: Ciba Specialty Chemicals CorporationInventors: Sean Colm Turner, Gisele Baudin
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Patent number: 6057078Abstract: Compounds of the formula I ##STR1## in which n and o are a number from 0 to 50, m is a number from 1 to 50, u and v are 0 or 1, and at least one of the indices u and v is 1, R.sub.1, R.sub.2, R.sub.2a, R.sub.3 and R.sub.4 independently of one another are, for example, aromatic hydrocarbons, R.sub.5, if n and o are 0, is for example C.sub.1 -C.sub.12 alkyl and, if n and/or o are greater than 0, or if n and o are 0 and at the same time only one index u or v is 1, R.sub.5 may additionally, for example, be an aromatic hydrocarbon, at least one of the radicals R.sub.1, R.sub.2, R.sub.2a, R.sub.3, R.sub.4 and R.sub.5 being an aromatic hydrocarbon radical which is sterically hindered ortho to the boron atom, X is, for example, C.sub.1 -C.sub.20 alkylene, phenylene, biphenylene, etc., and Z is a radical which is able to form positive ions, are suitable as photoinitiators, both the compounds per se and their combination with dyes or other electron acceptors.Type: GrantFiled: July 23, 1998Date of Patent: May 2, 2000Assignee: Ciba Specialty Chemicals CorporationInventors: Allan Francis Cunningham, Martin Kunz, Hisatoshi Kura
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Patent number: 6025408Abstract: Novel thioxanthone derivatives and mixtures thereof and methods of making and using the same are disclosed. The novel thioxanthone derivatives can be liquid at room temperature and display highly active photoinitiation and photopolymerization properties.Type: GrantFiled: March 27, 1997Date of Patent: February 15, 2000Assignee: First Chemical CorporationInventors: Eric Lee Williams, Ruicheng Ran, Charles Uriah Pittman, Jr., Joseph Stanton Bowers, Jr., August John Muller
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Patent number: 5998496Abstract: A compound of the general formula:A-L.sup.+ D.sup.-where A is a moiety which absorbs radiation and enters an excited state in which it accepts an electron; D.sup.- is a moiety which donates an electron to the excited state A and releases a free radical; and L.sup.+ is a cationic linking group which tethers electron acceptor moiety A to electron donor moiety D.sup.-. Cationic linking moiety L.sup.+ has the formula:-L'-G-where L' is a moiety which forms a stable radical with acceptor moiety A upon transfer of an electron from donor moiety D.sup.- to electron acceptor moiety A, and G is a moiety which forms a leaving group upon transfer of the electron from donor moiety D.sup.- to acceptor moiety A.Type: GrantFiled: August 19, 1996Date of Patent: December 7, 1999Assignee: Spectra Group Limited, Inc.Inventors: Salah A. Hassoon, Ananda M. Sarker, Douglas C. Neckers
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Patent number: 5948514Abstract: A photocurable and thermosetting resin composition developable with an aqueous alkali solution is disclosed. The composition comprises in combination: (A) a photosensitive prepolymer soluble in a dilute aqueous alkali solution obtained by esterifying an epoxy resin represented by the following general formula (1) with (meth)acrylic acid and further adding an acid anhydride thereto until an acid value reaches a level in the range of 60 to 120 mg KOH/g, (B) a diglycidyl ether type epoxy compound containing two epoxy groups in the molecular unit thereof, (C) a photopolymerization initiator, and (D) a diluent at such ratios of combination that said epoxy compound (B) accounts for a proportion in the range of 5 to 120 parts by weight and said photopolymerization initiator (C) for a proportion in the range of 0.1 to 30 parts by weight, based on 100 parts by weight of said photosensitive prepolymer (A): ##STR1## wherein X represents CH.sub.2, C(CH.sub.3).sub.2, or SO.sub.Type: GrantFiled: June 5, 1996Date of Patent: September 7, 1999Assignee: Taiyo Ink Manufacturing Co., Ltd.Inventors: Shigeru Komori, Kazuo Suda, Masao Arima, Miyako Juni
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Patent number: 5945462Abstract: The present invention relates to an aqueous-based coating composition for forming strippable, protective coating for protecting surfaces, such as glass, metal, ceramic, plastic or other materials of construction. More specifically, the compositions and coatings formed therefrom of this invention are particularly useful in connection with protecting precision surfaces, such as optical lenses, including but not limited to ophthalmic lenses, telescopic lenses, microscopic lenses, and the like, which protection is desirably only of a temporary nature.Type: GrantFiled: October 2, 1997Date of Patent: August 31, 1999Assignee: Loctite CorporationInventor: Peter A. Salamon
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Patent number: 5925719Abstract: A substantially ester-free, acid-functional thiol-functional resin is prepared via the reaction of an epoxy compound with a thiolacetic acid in the presence of an amine catalyst and heat to form a thioacetate derivative which is hydrolyzed to yield an ester-free, .beta.-hydroxy thiol-functional resin. The .beta.-hydroxy thiol-functional resin can then be reacted with a material capable of insert a group conferring aqueous-base developability such as a cyclic anhydride.Type: GrantFiled: June 19, 1997Date of Patent: July 20, 1999Assignee: MacDermid, IncorporatedInventors: John S. Hallock, Donald E. Herr
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Patent number: 5916984Abstract: A process for preparing thioxanthone and derivatives thereof is disclosed. In the process, an aromatic compound, such as cumene, is reacted with thiosalicylic acid (TSA) or dithiosalicylic acid (DTSA) in the presence of sulfuric acid. The reaction mixture, which includes thioxanthone or a derivative thereof, is thereafter distilled under reduced pressure to recover the thioxanthone compound.Type: GrantFiled: August 25, 1997Date of Patent: June 29, 1999Assignee: First Chemical CorporationInventors: Amy Lisa Bearson, John Robert Ira Eubanks, Alan Daniel Farmer, Franklin Dewitt Ford, Diana Boney Haydel, August John Muller
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Patent number: 5866261Abstract: A composition of matter comprising:(a) about 60 to about 99 parts by weight of a curable epoxypolyorganosiloxane;(b) about 1 to about 40 parts by weight of a crosslinkable silicone hydride resin having no epoxy functionality; and(c) about 0.1 to about 5 parts by weight of an curing agent, which, upon exposure to actinic radiation is capable of curing components (a) and (b);wherein the total amount of components (a) and (b) is 100 parts by weight and wherein said composition demonstrates surface release properties when coated and cured onto a substrate is provided. The composition is particularly useful in articles of manufacture where release properties are desired.Type: GrantFiled: December 20, 1996Date of Patent: February 2, 1999Assignee: Rhodia Inc.Inventors: Stuart R. Kerr, III, Reeshemah Beaty
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Patent number: 5852067Abstract: A near infrared rays-curing putty composition containing (A) a polymerizable ethylenically unsaturated group-containing resin, (B) a polymerizable ethylenically unsaturated compound and (C) a near infrared rays polymerization initiator, said near infrared rays polymerization initiator (C) being a near infrared rays-absorbing cationic dye and a resin powder consisting of gelation polymer fine particles.Type: GrantFiled: November 15, 1996Date of Patent: December 22, 1998Assignees: Showa Denko K. K., Kansai Paint Co., Ltd.Inventors: Hajime Sukejima, Shinji Tomita, Shuichi Sugita, Kazuhiko Ooga
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Patent number: 5844017Abstract: The present invention describes a prepolymer of aliphatic polyoxaesters containing amines and/or amido groups having polymerizable end groups that may be used to produce surgical devices such as sutures, sutures with attached needles, molded devices, and the like.Type: GrantFiled: November 17, 1997Date of Patent: December 1, 1998Assignee: Ethicon, Inc.Inventors: Dennis D. Jamiolkowski, Rao S. Bezwada
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Patent number: 5837746Abstract: Compounds of the formulaRG--A--INwherein IN is a photoinitiator basic structure A is a spacer group and RG is a functional reactive group can be employed as coreactive photoinitiators for photo-polymerization of systems containing ethylenically unsaturated compounds.Type: GrantFiled: June 23, 1997Date of Patent: November 17, 1998Assignee: Ciba Specialty Chemicals CorporationInventors: Manfred Kohler, Jorg Ohngemach, Eike Poetsch, Rudolf Eidenschink, Gerhard Greber, Dieter Dorsch, Jurgen Gehlhaus, Konrad Dorfner, Hans Ludwig Hirsch
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Patent number: 5824716Abstract: This invention relates to dicyclopentyl-oxyethyl methacrylate acrylic copolymer latices forming photocurable coalesced films and prepared by adding a photoinitiator to the latex, and which are useful for preparing lacquers and paints, particularly for building facades.Type: GrantFiled: July 19, 1996Date of Patent: October 20, 1998Assignee: Elf Atochem S.A.Inventors: Xavier Coqueret, Pierre Rousseau, Christophe Verge
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Patent number: 5807905Abstract: Compounds of the formula I ##STR1## in which n and o are a number from 0 to 50, m is a number from 1 to 50, u and v are 0 or 1, and at least one of the indices u and v is 1, R.sub.1, R.sub.2, R.sub.2a, R.sub.3 and R.sub.4 independently of one another are, for example, aromatic hydrocarbons, R.sub.5, if n and o are 0, is for example C.sub.1 -C.sub.12 alkyl and, if n and/or o are greater than 0, or if n and o are 0 and at the same time only one index u or v is 1, R.sub.5 may additionally, for example, be an aromatic hydrocarbon, at least one of the radicals R.sub.1, R.sub.2, R.sub.2a, R.sub.3, R.sub.4 and R.sub.5 being an aromatic hydrocarbon radical which is sterically hindered ortho to the boron atom, X is, for example, C.sub.1 -C.sub.20 alkylene, phenylene, biphenylene, etc., and Z is a radical which is able to form positive ions, are suitable as photoinitiators, both the compounds per se and their combination with dyes or other electron acceptors.Type: GrantFiled: November 21, 1996Date of Patent: September 15, 1998Assignee: Ciba Specialty Chemicals CorporationInventors: Allan Francis Cunningham, Martin Kunz, Hisatoshi Kura