Hetero Sulfur Ring Patents (Class 522/53)
  • Publication number: 20080275153
    Abstract: The present invention relates to an ultraviolet curable resin of the present invention which is prepared from alkyl(meth)acrylates, glycidyl(meth)acrylate, and substituted or unsubstituted acrylic acid, wherein the resin contains terminal vinyl group in amount of at least 50 wt % based on the resin and its glass transition temperature (Tg) is in a range of from 40˜100° C. The present invention also relates to a resin composition containing the ultraviolet curable resin.
    Type: Application
    Filed: August 16, 2007
    Publication date: November 6, 2008
    Applicant: CHANG CHUN PLASTICS CO., LTD.
    Inventors: Kuen-Yuan Hwang, An-Pang Tu, Ping-Chieh Wang, Chie-Wei Yang
  • Patent number: 7405308
    Abstract: Triarylsulfonium salts of formula I or II are useful as initiators for cationic photopolymerizations: wherein Ar1 and Ar2 are independently polycyclic aryl, substituted aryl, heteroaryl, substituted heteroaryl, or aryl or heteroaryl, pendant from a polymer chain; and MtXn? is a complex anion selected from PF6?, SbF6?, AsF6?, GaF6?, BF4?, (C6F5)4B? and CF3SO2)3C?.
    Type: Grant
    Filed: November 16, 2004
    Date of Patent: July 29, 2008
    Assignee: Rensselaer Polytechnic Institue
    Inventor: James V. Crivello
  • Patent number: 7354957
    Abstract: Compounds of formula (I): {where n is a number from 1 to 6; R3 is hydrogen, methyl or ethyl; A represents a group of formula —[O(CHR2CHR1)a]y—,—[O(CH2)bCO]y—, or —[O(CH2)bCO]y—,—[O(CHR2CHR1)a]-(where one of R1 and R2 is hydrogen and the other is hydrogen, methyl or ethyl); a is from 1 to 2; b is from 4 to 5; y is from 3 to 10, Q is a residue of a polyhydroxy compound having 2 to 6 hydroxy groups; and x is greater than 1 but no greater than the number of available hydroxyl groups in Q} and esters thereof are useful as photoinitiators for the preparation of energy-curable compositions, such as printing inks
    Type: Grant
    Filed: September 24, 2002
    Date of Patent: April 8, 2008
    Assignee: Sun Chemical Corporation
    Inventor: Shaun Lawrence Herlihy
  • Publication number: 20080076847
    Abstract: Composition with at least one polymerizable binder and a polymerization initiator, which contains at least one acylgermane according to general Formula (I), in which R0 is a substituted or unsubstituted C1-18-alkyl radical or an acyl group; R1 and R2 are H, an acyl group or have one of the meanings given for R3; R3 is a branched or linear C1-18-alkyl radical which can be unsubstituted or substituted one or more times by —O—, —NH—, —NR—, —S— or interrupted by other groups, trimethylsilyl, hal-(CH3)2Si—[OSi(CH3)2]r?, (CH3)3Si—[OSi(CH3)2]r—, —COOH, —COO—R10, —CO—NR11R12, —CO-vinyl, —CO-phenyl, phenyl-C1-4-alkyl, phenyl, naphthyl or biphenyl, C5-12 cycloalkyl, a 5 or 6-membered O, S or N-containing heterocyclic ring, halogen, OH, an aromatic C6-30 radical which can be substituted or unsubstituted and/or interrupted by O, S or —NR—, or a branched, cyclic or linear C1-20 alkyl, -alkenyl, -alkoxy or -alkenoxy radical; m is 1, 2 or 3; n is 0 or 1 and p is 0 or 1; and the use of acyl germanes of Formula (I) for ex
    Type: Application
    Filed: April 2, 2007
    Publication date: March 27, 2008
    Applicant: IVOCLAR VIVADENT AG
    Inventors: Norbert Moszner, Ulrich Salz, Urs Karl Fischer, Robert Liska, Heinrich Gruber, Beate Ganster
  • Patent number: 7285310
    Abstract: An active energy ray curable ink which is quickly polymerized by an active energy ray, high in crosslinking degree of a cured material formed, excellent in adhesive property, low in viscosity, excellent in long-term storability and also excellent in ejection stability, and an ink-jet recording process, an ink cartridge, a recording unit and an ink-jet recording apparatus using such an ink are provided. In the active energy ray curable aqueous ink comprising at least water and a polymerizable material which is radically polymerized by an active energy ray, the polymerizable material is a water-soluble polymerizable material represented by the following general formula (I).
    Type: Grant
    Filed: September 6, 2005
    Date of Patent: October 23, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tsuyoshi Kanke, Hiromitsu Kishi, Hiromichi Noguchi, Yutaka Kurabayashi
  • Patent number: 7262231
    Abstract: The invention provides compounds which can generate amine by irradiation with light and are excellent both in photodecomposability and in reactivity and compatibility with amine-curable compounds, and photo-setting compositions containing the compounds. The compounds are carbamoyloxyimino compounds represented by the structural formula (I); and the compositions each comprise one or more of the carbamoyloxyimino compounds and an amine-curable compound. In the formula (I), R1 is an n-valent organic group; R2 and R3 are each hydrogen or an aromatic or aliphatic group; and n is an integer of 1 or above.
    Type: Grant
    Filed: August 16, 2005
    Date of Patent: August 28, 2007
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Hideaki Ishizawa, Hiroji Fukui, Takeo Kuroda
  • Patent number: 7256221
    Abstract: Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.
    Type: Grant
    Filed: November 7, 2003
    Date of Patent: August 14, 2007
    Assignee: Corning Incorporated
    Inventors: Kelsee L. Coykendall, Paul G. Dewa, Robert Sabia, David C. Sauer, Paul J. Shustack, Kamal K. Soni
  • Patent number: 7244548
    Abstract: A photopolymerizing composition and a photopolymerizing recording medium manufactured using the composition, wherein the photopolymerizing composition contains: 1.0-99.0% by weight of at least one kind of polymerizable compound; 0.05-0.5% by weight of at least one kind of photosensitizer selected from among photochromic compounds that change color by incoherent UV light irradiation; 0.2-6.0% by weight of a coinitiator that is activated by visible light in the presence of a photoinduced form of the photochromic compound transformed by incoherent UV light to photopolymerize the polymerizable compound; 0-97.5% by weight of a polymer binding agent; 0-6.0% by weight of a plasticizer; and 0-3.0% by weight of a non-polymerizing solvent. The photopolymerizing recording medium has a high angular diffraction selectivity and thus can be effectively used to manufacture a 3D holographic optical memory with ultra high information storage capacity.
    Type: Grant
    Filed: November 22, 2004
    Date of Patent: July 17, 2007
    Assignees: Samsung Electronics Co., Ltd., Photochemistry Center of Russian Academy of Sciences
    Inventors: Valery Aleksandrovich Barachevsky, Svetlana Ivanovna Peredereeva, Dmitry Valerevich Nesterenko, Aleksandr Vladimirovich Lyubimov, Viktor Kamilievich Salahutdinov, Mikhail Mikhailovich Krayushkin, Nataliya Timofeovna Sokolyuk, Andrei Leanovich Mikaelyan
  • Patent number: 7226957
    Abstract: A method for producing polymers with controlled molecular weight and desired end functionalities and the resulting polymers. The method comprises a) forming a microemulsion comprising monomer, water, and an effective amount of an effective surfactant, b) adding to the microemulsion an amount of a water-soluble photo-initiator system wherein the initiator system produces one type of monomer-soluble radical active centers and wherein the radical active centers contain desired end group functionalities for a polymer or oligomer, and c) illuminating the microemulsion to photoinitiate polymerization of the monomer wherein the illuminating is according to a temporal and spatial illumination scheme, and wherein the amount of the initiator system and the temporal illumination scheme are chosen to produce a desired molecular weight of the polymer or oligomer. The microemulsion can further comprise an effective amount of an effective co-surfactant. The method can be used to produce polymers and copolymers.
    Type: Grant
    Filed: November 3, 2003
    Date of Patent: June 5, 2007
    Assignee: University of Iowa Research Foundation
    Inventors: Alec Scranton, Kaveri Jain
  • Patent number: 6867242
    Abstract: The invention relates to a method for producing a sealed impregnation and/or release coating of flat joints, in particular of cylinder-head gaskets such as composite seals, metallic joints and multi-layered steel joints. The invention uses a silicone composition including at least a polyorganosiloxane A crosslinkable by a cationic and/or radical process by appropriate crosslinking functional groups, for example, of the alkenyl ether, acrylic, acrylate, epoxide and/or oxethane type; at least an initiator salt B selected among onium borates or an organometallic complex; and at least a reactive diluent C including a nonorganosilicon or organosilicon compound comprising in its structure at least a crosslinking functional group and optionally a secondary functional group different from the crosslinking functional group but capable of chemically reacting with a crosslinking functional group, for example of the hydroxyl, alkoxy and/or carboxyl type.
    Type: Grant
    Filed: June 8, 2000
    Date of Patent: March 15, 2005
    Assignee: Rhodia Chimie
    Inventors: Jean-Marc Frances, Olivier Loubet
  • Patent number: 6864300
    Abstract: A photoreactive adhesive composition which is of the one-pack type, has excellent workability, cures upon irradiation with light, and can have sufficient initial adhesion strength and heat resistance immediately after bonding. The photoreactive adhesive composition comprises a urethane prepolymer and a compound which generates an amine upon irradiation with light, wherein the amine-generating compound is a cobalt/amine complex, O-acyloxime, or carbamic acid derivative.
    Type: Grant
    Filed: March 27, 2001
    Date of Patent: March 8, 2005
    Assignee: Sekisui Chemical Co., Ltd.
    Inventor: Hideaki Ishizawa
  • Patent number: 6824858
    Abstract: A photocurable and thermosetting composition which is useful in forming a matte film and can be developed with an aqueous alkaline solution is provided. The composition comprises (A) a photosensitive prepolymer obtained by causing a saturated or unsaturated polybasic acid anhydride to react with a hydroxyl group of an esterification product of a novolak type epoxy compound and an unsaturated monocarboxylic acid, (B) a carboxyl group-containing copolymer resin, (C) a photopolymerization initiator, (D) a diluent, (E) a polyfunctional epoxy compound having at least two epoxy groups in its molecule, and, when necessary, (F) an inorganic filler. The composition may further comprise (G) an epoxy resin curing agent. This composition can be advantageously used for the formation of a solder resist on a printed circuit board.
    Type: Grant
    Filed: August 13, 2002
    Date of Patent: November 30, 2004
    Assignee: Taiyo Ink Manufacturing Co., Ltd.
    Inventors: Satoru Iwaida, Yoshihiro Ohno, Masayuki Isono, Akio Sekimoto
  • Patent number: 6790875
    Abstract: An useful aqueous photocurable resin composition is provided. The aqueous photocurable resin composition of the present invention comprises at least water, a polymerizable material polymerizable with radical initiation and a water-soluble photopolymerization initiator which generates a radical with light, wherein the polymerizable material has at least two polymerizable functional groups and one anionic functional group.
    Type: Grant
    Filed: September 14, 2001
    Date of Patent: September 14, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiromichi Noguchi, Yuko Suga, Hiroyuki Maeda, Masako Shimomura
  • Patent number: 6784222
    Abstract: An electroconductive coating composition which function as a sealer/primer includes (a) a radiation curable, polymerizable compound, (b) a photoinitiator and (c) a conductive pigment. The conductive pigment may be a mixture of pigment including a blend of conductive pigments as well as conductive pigment. Conductivity enhancers may, also, be added. The polymerizable compound is, preferably, a U curable acrylate functional compound which may be monofunctional or polyfunctional. The composition is particularly useful for sealing and priming SMC panels.
    Type: Grant
    Filed: March 6, 2002
    Date of Patent: August 31, 2004
    Inventors: Frank David Zychowski, Joseph C. Sgro
  • Patent number: 6709804
    Abstract: A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with a photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or polyimide and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprises coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition forms a resin layer having excellent heat resistance.
    Type: Grant
    Filed: February 19, 2003
    Date of Patent: March 23, 2004
    Assignees: Riken, Sumitomo Bakelite Company, Ltd.
    Inventors: Yusuke Tajima, Kazuo Takeuchi, Yasuo Shigemitsu, Etsu Takeuchi
  • Publication number: 20030082355
    Abstract: A photocurable and thermosetting composition which is useful in forming a matte film and can be developed with an aqueous alkaline solution is provided. The composition comprises (A) a photosensitive prepolymer obtained by causing a saturated or unsaturated polybasic acid anhydride to react with a hydroxyl group of an esterification product of a novolak type epoxy compound and an unsaturated monocarboxylic acid, (B) a carboxyl group-containing copolymer resin, (C) a photopolymerization initiator, (D) a diluent, (E) a polyfunctional epoxy compound having at least two epoxy groups in its molecule, and, when necessary, (F) an inorganic filler. The composition may further comprise (G) an epoxy resin curing agent. This composition can be advantageously used for the formation of a solder resist on a printed circuit board.
    Type: Application
    Filed: August 13, 2002
    Publication date: May 1, 2003
    Inventors: Satoru Iwaida, Yoshihiro Ohno, Masayuki Isono, Akio Sekimoto
  • Patent number: 6555592
    Abstract: A photothermosetting composition is described which contains a base resin (A), a photopolymerizable photomonomer or photooligomer (B), a photoinitiator (C), an epoxide compound containing at least two epoxy groups (D), and an organic solvent. The base resin (A) an epoxide compound (a) containing at least two epoxy groups, an unsaturated monobasic acid (b), a saturated or unsaturated dibasic acid (c), and a saturated or unsaturated acid anhydride (d) according to the ratio of (a)/(b)/(c) of 1:0.90˜0.95:0.025˜0.050 and the acid value of the base resin is in the range of 40˜49 mg KOH/g. This photothermosetting component was coating on the substrate, and then dried by baking, exposed by light, developed, irradiated by ultraviolet light or heated, and cured to form a solder mask.
    Type: Grant
    Filed: February 27, 2001
    Date of Patent: April 29, 2003
    Assignee: Advance Materials Corporation
    Inventors: Chao-Hui Tseng, Fu-Lung Chen
  • Patent number: 6528231
    Abstract: A photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or a polyimide. A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with the photosensitive resin composition and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprise coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition can form a resin layer having excellent heat resistance.
    Type: Grant
    Filed: January 24, 2000
    Date of Patent: March 4, 2003
    Assignees: Riken, Sumitomo Bakelite Company, Ltd.
    Inventors: Yusuke Tajima, Kazuo Takeuchi, Yasuo Shigemitsu, Etsu Takeuchi
  • Patent number: 6489374
    Abstract: The invention relates to &agr;-ammonium alkenes, iminium alkenes and amidinium alkenes in the form of their tetraaryl- or triaryl-alkylborate salts that can be converted photochemically into amines, imines or amidines, and to a process for the preparation thereof. The invention relates also to compositions polymerisable or crosslinkable under basic conditions comprising such &agr;-ammonium alkenes, iminium alkenes or amidinium alkenes in the form of their tetra- or tri-arylalkylborate salts, to a method of carrying out photochemically induced, base-catalysed reactions, and to the use of such compounds as photoinitiators for base-catalysed reactions.
    Type: Grant
    Filed: February 16, 2001
    Date of Patent: December 3, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Gisèle Baudin, Sean Colm Turner, Allan Francis Cunningham
  • Patent number: 6485886
    Abstract: New oxime derivatives of formula (I) or. (II), wherein m is 0 or 1; R1 inter alia is phenyl, naphthyl, anthracyl, phenanthryl or a heteroaryl radical; R′1 is for example C2-C12alkylene, phenylene, naphthylene; R2 is CN; R3 is C2-C6haloalkanoyl, halobenzoyl, a phosphoryl or an organosilyl group; R4, R5, R10 and R11 inter alia are hydrogen, C1-C6alkyl, C1-C6alkoxy; R6 inter alia is hydrogen phenyl, C1-C12alkyl; R7 and R8 inter alia are hydrogen, C1-C12alkyl; or R7 and R8, together with the nitrogen atom to which they are bonded, form a 5-, 6 or 7-membered ring; R9 is for example C1-C12alkyl; and A inter alia is S, O, NR7a; are useful as latent acids, especially in photoresist applications.
    Type: Grant
    Filed: April 24, 2001
    Date of Patent: November 26, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Hitoshi Yamato, Toshikage Asakura, Jean-Luc Birbaum, Kurt Dietliker
  • Patent number: 6451869
    Abstract: Cyclopentadienylplatinum (IV) compounds having C7-20 aromatic radical substitution on the cyclopentadienyl ring have been found to impart enhanced cure speed and shelf-life stability to irradiation-curable silicone mixtures.
    Type: Grant
    Filed: September 13, 2000
    Date of Patent: September 17, 2002
    Assignee: General Electric Company
    Inventor: Matthew David Butts
  • Patent number: 6432616
    Abstract: The present invention provides a water soluble polymer which is prepared by the following steps. First, a carboxyl group-containing polymer is reacted with an alkaline reagent so that a portion of the carboxyl groups are reacted in an amount sufficient to make the polymer water soluble. Then, the polymer obtained is reacted with an epoxide containing unsaturated bonds and/or heteroatoms so that 1 to 100 mole percent of the remaining carboxyl groups of the polymer are reacted with the epoxide to form ester groups via a ring-opening reaction of epoxides, wherein the heteroatom can be silicon, nitrogen, phosphorus or sulfur. The water soluble polymer of the present invention can be used as a photosensitive resin. When the photoresist composition is used for preparing printed ciruit boards, it exhibits high photosensitivity, good water dispersability, storage stability, and good adhesion to copper. In addition, the problem of sticking to the mask can be prevented.
    Type: Grant
    Filed: August 7, 2000
    Date of Patent: August 13, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Tsing-Tang Song, Shung-Jim Yang, Hsiu-Mei Chen, Yi-Hua Liu
  • Patent number: 6429235
    Abstract: An energy-curable polymer-forming composition for making a pressure sensitive adhesive includes an unsaturated oligomer resin and an adhesive promoter which increases the peel strength of the adhesive without reducing its tack. The composition also includes a tackifier and various other optional components such as photoinitiator, chain extender, reactive diluent and the like.
    Type: Grant
    Filed: September 15, 1999
    Date of Patent: August 6, 2002
    Assignee: Cognis Corporation
    Inventors: Ulrike Varlemann, Ning Chen, Arifin Marzuki, Ramesh Narayan
  • Patent number: 6312553
    Abstract: An adhesive silicone elastomer film obtained by forming a radiation-curable silicone rubber composition into a film and curing the resulting film by radiation; the composition including (A) an oily organopolysiloxane, (B) a radiation sensitizer and (C) an alkoxysilane and/or a partial hydrolysis-condensation product thereof. The oily organopolysiloxane includes, e.g., a compound represented by the formula: This film can be produced in a short time as clean films easy to handle and having a uniform shape, can rationalize work steps when used, and also has a low elasticity and sufficient heat resistance, adhesiveness and workability. This film is useful in the covering or bonding of articles.
    Type: Grant
    Filed: December 20, 1999
    Date of Patent: November 6, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Tsutomu Kashiwagi
  • Patent number: 6284185
    Abstract: An ultraviolet-curable adhesive composition comprising a photopolymerization initiator whose molar absorption coefficient at a wavelength of 360-450 nm is at least 400 and an ultraviolet-curable compound. The adhesive composition of this invention can bond substrates which show transmittances of 0.01-20% to all of energy beams of a wavelength of 280-380 nm, to one another such as base boards for an optical disk.
    Type: Grant
    Filed: March 9, 2000
    Date of Patent: September 4, 2001
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Kiyohisa Tokuda, Kazuhiko Ishii
  • Publication number: 20010018467
    Abstract: A method of priming a sheet molding compound (SMC) part. The method includes applying a photopolymerizable priming composition to a surface of the SMC part. The priming composition includes a polymerizable component, a photoinitiating component, and a conductive component. The method also includes irradiating the priming composition with light to initiate a polymerization reaction. The priming composition polymerizes on the SMC part substantially without releasing volatile solvents.
    Type: Application
    Filed: December 20, 2000
    Publication date: August 30, 2001
    Inventor: Robert Dunkle
  • Publication number: 20010012596
    Abstract: Compounds of the formulae I, II, III, IV and V 1
    Type: Application
    Filed: December 12, 2000
    Publication date: August 9, 2001
    Inventors: Kazuhiko Kunimoto, Hidetaka Oka, Masaki Ohwa, Junichi Tanabe, Hisatoshi Kura, Jean-Luc Birbaum
  • Patent number: 6265458
    Abstract: The present invention is directed to new, energy-efficient, photoinitiators having the following general formula: wherein of X1 is a conjugated system such as one or more aryl groups or substituted aryl groups; Z1 is —O, —S, an alkyl group having from one to six carbon atoms, an ester moiety, a ketone moiety, an amine moiety, an imine moiety, an ether moiety, an aryl or substituted aryl group, a metal or non-metal, or a metal or non-metal containing group, such as a zinc-containing group or a boron-containing group, respectively; and M1 is an alkyl group, a substituted alkyl group, or forms a five-member ring with Z1. The present invention is also directed to a method of generating a reactive species, which includes exposing one or more photoinitiators to radiation to form one or more reactive species.
    Type: Grant
    Filed: September 28, 1999
    Date of Patent: July 24, 2001
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Ronald S. Nohr, John Gavin MacDonald
  • Patent number: 6235807
    Abstract: A curing process for cationically polymerisable monomers, which comprises applying a composition comprising: (a) at least one cationically polymerisable monomer, (b) as photoinitiator at least one iodonium salt containing an SbF6, PF6 or BF4 anion, (c) one pigment, and (d) at least one sensitiser, to a substrate, irradiating it with light having a wavelength of 200-600 nm and then heat-postcuring it, is distinguished by little yellowing of the cured formulation.
    Type: Grant
    Filed: December 14, 1998
    Date of Patent: May 22, 2001
    Assignee: Ciba Specialty Chemicals Corporation
    Inventor: Ljubomir Misev
  • Patent number: 6211262
    Abstract: A corrosion resistant coating for metal surfaces curable with actinic radiation. The blend uses acrylate resin, photoinitiator and a corrosion preventing agent such as a metal surface passivator, overbased calcium sulfonate/calcium carbonate, a barrier pigment, or a combination of two or more of these agents.
    Type: Grant
    Filed: April 20, 1999
    Date of Patent: April 3, 2001
    Assignee: Spectra Group Limited, Inc.
    Inventors: Alexandre Mejiritski, Thomas Marino, Violeta Lungu, Dustin Martin, Douglas Neckers
  • Patent number: 6210517
    Abstract: A radiation curable precursor coating composition for the preparation of a non-blocking, heat activatable adhesive includes a curable acrylic material, a curable elastomeric material, and a hydrocarbon tackifier material having a softening temperature ranging from approximately 50° C. to approximately 200° C., wherein when the acrylic material and the elastomeric material are cured, the coating composition is non-blocking at room temperature, but when the coating composition is heated to a temperature above both the softening temperature of the hydrocarbon tackifier and the Tg of the coating composition, the coating composition becomes adhesive.
    Type: Grant
    Filed: April 13, 1999
    Date of Patent: April 3, 2001
    Assignee: Diversified Chemical Technologies, Inc.
    Inventors: Rajan Eadara, Mooil Chung, David Wen-Lung Chang, Weichen Chi
  • Patent number: 6207726
    Abstract: A photocurable prepreg composition which is characterized by easy control of a B stage state of a thermosetting resin such as an unsaturated polyester resin or an epoxy acrylate resin, excellent storage stability, and remarkable curability after being shaped; as well as a production method therefor. A photocurable prepreg composition which contains an unsaturated polyester resin and/or an epoxy acrylate resin; at least two photopolymerization initiators with photosensitivity in different wavelength ranges; and an inorganic or an organic fiber-reinforcing material and/or filler, and which composition is treated with light of a specific wavelength such that at least one photopolymerization initiator and radical-polymerizable unsaturated groups remain partially in said resin; a production method therefor; and formed articles produced therefrom.
    Type: Grant
    Filed: February 11, 1999
    Date of Patent: March 27, 2001
    Assignees: Showa Denko Kabushiki Kaisha, Showa Highpolymer Co., Ltd.
    Inventors: Kazuo Ohtani, Tomio Yamamoto, Hidetake Sendai, Shuichi Sugita, Hirotoshi Kamata, Takeo Watanabe
  • Patent number: 6180317
    Abstract: An improved photoimagable cationically polymerizable epoxy based coating material is provided, that is suitable for use on a variety of substrates including epoxy-glass laminate boards cured with dicyandiamide. The material includes an epoxy resin system consisting essentially of between about 10% and about 80% by weight of a polyol resin which is a condensation product of epichlorohydrin and bisphenol A having a molecular weight of between about 40,000 and 130,000; and between about 35% and 72% by weight of an epoxidized glycidyl ether of a brominated bisphenol A having a softening point of between about 60° C. and about 110° C. and a molecular weight of between about 600 and 2,500. Optionally, a third resin may be added to the resin system. To this resin system is added about 0.
    Type: Grant
    Filed: November 18, 1991
    Date of Patent: January 30, 2001
    Assignee: International Business Machines Corporation
    Inventors: Robert David Allen, Richard Allen Day, Donald Herman Glatzel, William Dinan Hinsberg, John Richard Mertz, David John Russell, Gregory Michael Wallraff
  • Patent number: 6162841
    Abstract: New betaketosulfonic derivatives, the process for their preparation, the photopolymerizable systems containing the same and their application as polymerization photoinitiators for inks, and particularly for inks having high content of pigments are described.
    Type: Grant
    Filed: March 3, 1998
    Date of Patent: December 19, 2000
    Assignee: Lamberti S.p.A.
    Inventors: Paola Giaroni, Piero Di Battista, Giuseppe Li Bassi
  • Patent number: 6140385
    Abstract: Novel substituted diaryl ketones, photopolymerization compositions including the compounds, and methods using the same are disclosed. Polymerization of compositions which include the compounds of the invention may be activated by irradiating the composition with ultraviolet light using conventional techniques and radiation sources to give greatly improved cure speeds. The compounds of the invention also show a significantly elevated level of reactivity at a narrow wavelength band, with a peak emission wavelength at or near 308 nm. Because of the increased level of activity, the photoinitiator can be used in considerably lower amounts.
    Type: Grant
    Filed: September 30, 1998
    Date of Patent: October 31, 2000
    Assignee: First Chemical Corporation
    Inventors: Joseph Stanton Bowers, Jr., Rajamani Nagarajan, Charles Uriah Pittman, Jr., E. Sonny Jonsson
  • Patent number: 6087066
    Abstract: This invention relates to polyvinyl acetals containing the units A, B, C and D, whereinA is present in an amount of 0.5 to 20 wt.-% and is of the formula ##STR1## B is present in an amount of 15 to 35 wt.-% and is of the formula ##STR2## C is present in an amount of 10 to 50 wt.-% and is of the formula ##STR3## wherein R.sup.1 is an alkyl group with up to 4 carbons, which is optionally substituted by an acid group, or a phenyl group, to which an acid group is attached, wherein the phenyl group optionally comprises 1 to 2 further substituents selected from halos, amino, methoxy, ethoxy, methyl and ethyl groups, or is a group X--NR.sup.6 --CO--Y--COOH, wherein X is an aliphatic, aromatic or araliphatic spacer group, R.sup.6 is hydrogen or an aliphatic, aromatic or araliphatic moiety and Y is a saturated or unsaturated chain- or ring-shaped spacer group, and this unit C may be contained several times with various moieties R.sup.1 independent of one another, and D is present in an amount of 25 to 70 wt.
    Type: Grant
    Filed: October 14, 1999
    Date of Patent: July 11, 2000
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Harald Baumann, Celin Savariar-Hauck, Hans-Joachim Timpe
  • Patent number: 6087070
    Abstract: The invention relates to organic compounds having a molecular weight of less than 1000 comprising at least one structural unit of the formula (I) ##STR1## in which R.sub.1 is an aromatic or heteroaromatic radical which is capable of absorbing light in the wavelength range from 200 to 650 nm and in doing so brings about cleavage of the adjacent carbon-nitrogen bond.The compounds represent photoinitiators for base-catalyzable reactions. Other subjects of the invention are base-polymerizable or crosslinkable compositions comprising compounds having a structural unit of the formula I, a method of implementing photochemically induced, base-catalyzed reactions, and the use of the compounds as photoinitiators for base-catalyzed reactions.
    Type: Grant
    Filed: March 16, 1998
    Date of Patent: July 11, 2000
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Sean Colm Turner, Gisele Baudin
  • Patent number: 6057078
    Abstract: Compounds of the formula I ##STR1## in which n and o are a number from 0 to 50, m is a number from 1 to 50, u and v are 0 or 1, and at least one of the indices u and v is 1, R.sub.1, R.sub.2, R.sub.2a, R.sub.3 and R.sub.4 independently of one another are, for example, aromatic hydrocarbons, R.sub.5, if n and o are 0, is for example C.sub.1 -C.sub.12 alkyl and, if n and/or o are greater than 0, or if n and o are 0 and at the same time only one index u or v is 1, R.sub.5 may additionally, for example, be an aromatic hydrocarbon, at least one of the radicals R.sub.1, R.sub.2, R.sub.2a, R.sub.3, R.sub.4 and R.sub.5 being an aromatic hydrocarbon radical which is sterically hindered ortho to the boron atom, X is, for example, C.sub.1 -C.sub.20 alkylene, phenylene, biphenylene, etc., and Z is a radical which is able to form positive ions, are suitable as photoinitiators, both the compounds per se and their combination with dyes or other electron acceptors.
    Type: Grant
    Filed: July 23, 1998
    Date of Patent: May 2, 2000
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Allan Francis Cunningham, Martin Kunz, Hisatoshi Kura
  • Patent number: 6025408
    Abstract: Novel thioxanthone derivatives and mixtures thereof and methods of making and using the same are disclosed. The novel thioxanthone derivatives can be liquid at room temperature and display highly active photoinitiation and photopolymerization properties.
    Type: Grant
    Filed: March 27, 1997
    Date of Patent: February 15, 2000
    Assignee: First Chemical Corporation
    Inventors: Eric Lee Williams, Ruicheng Ran, Charles Uriah Pittman, Jr., Joseph Stanton Bowers, Jr., August John Muller
  • Patent number: 5998496
    Abstract: A compound of the general formula:A-L.sup.+ D.sup.-where A is a moiety which absorbs radiation and enters an excited state in which it accepts an electron; D.sup.- is a moiety which donates an electron to the excited state A and releases a free radical; and L.sup.+ is a cationic linking group which tethers electron acceptor moiety A to electron donor moiety D.sup.-. Cationic linking moiety L.sup.+ has the formula:-L'-G-where L' is a moiety which forms a stable radical with acceptor moiety A upon transfer of an electron from donor moiety D.sup.- to electron acceptor moiety A, and G is a moiety which forms a leaving group upon transfer of the electron from donor moiety D.sup.- to acceptor moiety A.
    Type: Grant
    Filed: August 19, 1996
    Date of Patent: December 7, 1999
    Assignee: Spectra Group Limited, Inc.
    Inventors: Salah A. Hassoon, Ananda M. Sarker, Douglas C. Neckers
  • Patent number: 5948514
    Abstract: A photocurable and thermosetting resin composition developable with an aqueous alkali solution is disclosed. The composition comprises in combination: (A) a photosensitive prepolymer soluble in a dilute aqueous alkali solution obtained by esterifying an epoxy resin represented by the following general formula (1) with (meth)acrylic acid and further adding an acid anhydride thereto until an acid value reaches a level in the range of 60 to 120 mg KOH/g, (B) a diglycidyl ether type epoxy compound containing two epoxy groups in the molecular unit thereof, (C) a photopolymerization initiator, and (D) a diluent at such ratios of combination that said epoxy compound (B) accounts for a proportion in the range of 5 to 120 parts by weight and said photopolymerization initiator (C) for a proportion in the range of 0.1 to 30 parts by weight, based on 100 parts by weight of said photosensitive prepolymer (A): ##STR1## wherein X represents CH.sub.2, C(CH.sub.3).sub.2, or SO.sub.
    Type: Grant
    Filed: June 5, 1996
    Date of Patent: September 7, 1999
    Assignee: Taiyo Ink Manufacturing Co., Ltd.
    Inventors: Shigeru Komori, Kazuo Suda, Masao Arima, Miyako Juni
  • Patent number: 5945462
    Abstract: The present invention relates to an aqueous-based coating composition for forming strippable, protective coating for protecting surfaces, such as glass, metal, ceramic, plastic or other materials of construction. More specifically, the compositions and coatings formed therefrom of this invention are particularly useful in connection with protecting precision surfaces, such as optical lenses, including but not limited to ophthalmic lenses, telescopic lenses, microscopic lenses, and the like, which protection is desirably only of a temporary nature.
    Type: Grant
    Filed: October 2, 1997
    Date of Patent: August 31, 1999
    Assignee: Loctite Corporation
    Inventor: Peter A. Salamon
  • Patent number: 5925719
    Abstract: A substantially ester-free, acid-functional thiol-functional resin is prepared via the reaction of an epoxy compound with a thiolacetic acid in the presence of an amine catalyst and heat to form a thioacetate derivative which is hydrolyzed to yield an ester-free, .beta.-hydroxy thiol-functional resin. The .beta.-hydroxy thiol-functional resin can then be reacted with a material capable of insert a group conferring aqueous-base developability such as a cyclic anhydride.
    Type: Grant
    Filed: June 19, 1997
    Date of Patent: July 20, 1999
    Assignee: MacDermid, Incorporated
    Inventors: John S. Hallock, Donald E. Herr
  • Patent number: 5916984
    Abstract: A process for preparing thioxanthone and derivatives thereof is disclosed. In the process, an aromatic compound, such as cumene, is reacted with thiosalicylic acid (TSA) or dithiosalicylic acid (DTSA) in the presence of sulfuric acid. The reaction mixture, which includes thioxanthone or a derivative thereof, is thereafter distilled under reduced pressure to recover the thioxanthone compound.
    Type: Grant
    Filed: August 25, 1997
    Date of Patent: June 29, 1999
    Assignee: First Chemical Corporation
    Inventors: Amy Lisa Bearson, John Robert Ira Eubanks, Alan Daniel Farmer, Franklin Dewitt Ford, Diana Boney Haydel, August John Muller
  • Patent number: 5866261
    Abstract: A composition of matter comprising:(a) about 60 to about 99 parts by weight of a curable epoxypolyorganosiloxane;(b) about 1 to about 40 parts by weight of a crosslinkable silicone hydride resin having no epoxy functionality; and(c) about 0.1 to about 5 parts by weight of an curing agent, which, upon exposure to actinic radiation is capable of curing components (a) and (b);wherein the total amount of components (a) and (b) is 100 parts by weight and wherein said composition demonstrates surface release properties when coated and cured onto a substrate is provided. The composition is particularly useful in articles of manufacture where release properties are desired.
    Type: Grant
    Filed: December 20, 1996
    Date of Patent: February 2, 1999
    Assignee: Rhodia Inc.
    Inventors: Stuart R. Kerr, III, Reeshemah Beaty
  • Patent number: 5852067
    Abstract: A near infrared rays-curing putty composition containing (A) a polymerizable ethylenically unsaturated group-containing resin, (B) a polymerizable ethylenically unsaturated compound and (C) a near infrared rays polymerization initiator, said near infrared rays polymerization initiator (C) being a near infrared rays-absorbing cationic dye and a resin powder consisting of gelation polymer fine particles.
    Type: Grant
    Filed: November 15, 1996
    Date of Patent: December 22, 1998
    Assignees: Showa Denko K. K., Kansai Paint Co., Ltd.
    Inventors: Hajime Sukejima, Shinji Tomita, Shuichi Sugita, Kazuhiko Ooga
  • Patent number: 5844017
    Abstract: The present invention describes a prepolymer of aliphatic polyoxaesters containing amines and/or amido groups having polymerizable end groups that may be used to produce surgical devices such as sutures, sutures with attached needles, molded devices, and the like.
    Type: Grant
    Filed: November 17, 1997
    Date of Patent: December 1, 1998
    Assignee: Ethicon, Inc.
    Inventors: Dennis D. Jamiolkowski, Rao S. Bezwada
  • Patent number: 5837746
    Abstract: Compounds of the formulaRG--A--INwherein IN is a photoinitiator basic structure A is a spacer group and RG is a functional reactive group can be employed as coreactive photoinitiators for photo-polymerization of systems containing ethylenically unsaturated compounds.
    Type: Grant
    Filed: June 23, 1997
    Date of Patent: November 17, 1998
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Manfred Kohler, Jorg Ohngemach, Eike Poetsch, Rudolf Eidenschink, Gerhard Greber, Dieter Dorsch, Jurgen Gehlhaus, Konrad Dorfner, Hans Ludwig Hirsch
  • Patent number: 5824716
    Abstract: This invention relates to dicyclopentyl-oxyethyl methacrylate acrylic copolymer latices forming photocurable coalesced films and prepared by adding a photoinitiator to the latex, and which are useful for preparing lacquers and paints, particularly for building facades.
    Type: Grant
    Filed: July 19, 1996
    Date of Patent: October 20, 1998
    Assignee: Elf Atochem S.A.
    Inventors: Xavier Coqueret, Pierre Rousseau, Christophe Verge
  • Patent number: 5807905
    Abstract: Compounds of the formula I ##STR1## in which n and o are a number from 0 to 50, m is a number from 1 to 50, u and v are 0 or 1, and at least one of the indices u and v is 1, R.sub.1, R.sub.2, R.sub.2a, R.sub.3 and R.sub.4 independently of one another are, for example, aromatic hydrocarbons, R.sub.5, if n and o are 0, is for example C.sub.1 -C.sub.12 alkyl and, if n and/or o are greater than 0, or if n and o are 0 and at the same time only one index u or v is 1, R.sub.5 may additionally, for example, be an aromatic hydrocarbon, at least one of the radicals R.sub.1, R.sub.2, R.sub.2a, R.sub.3, R.sub.4 and R.sub.5 being an aromatic hydrocarbon radical which is sterically hindered ortho to the boron atom, X is, for example, C.sub.1 -C.sub.20 alkylene, phenylene, biphenylene, etc., and Z is a radical which is able to form positive ions, are suitable as photoinitiators, both the compounds per se and their combination with dyes or other electron acceptors.
    Type: Grant
    Filed: November 21, 1996
    Date of Patent: September 15, 1998
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Allan Francis Cunningham, Martin Kunz, Hisatoshi Kura