Specified Rate-affecting Material Contains Nitrogen Patents (Class 522/65)
  • Publication number: 20110269866
    Abstract: The present invention relates to a photo-curable and thermo-curable resin composition and a dry film solder resist make it possible to provide the dry film solder resist having superior heat-resistance and dimensional stability while exhibiting more improved alkali developing property. The resin composition may comprises an acid-modified oligomer having carboxyl group (—COOH) and photo-curable functional group; a photo-polymerizable monomer comprising a compound having a structure of that 3- or more functional epoxy acrylate groups are bonded to a heterocyclic structure containing nitrogen, and a functional group having carboxyl group is bonded to at least one epoxy acrylate group; a thermo-curable binder having thermo-curable functional group; and a photo-initiator.
    Type: Application
    Filed: July 11, 2011
    Publication date: November 3, 2011
    Applicant: LG CHEM, LTD.
    Inventors: Woo-Jae JEONG, Byung-Ju CHOI, Bo-Yun CHOI, Kwang-Joo LEE, Min-Su JEONG
  • Publication number: 20110269867
    Abstract: A novel alkali-soluble polymer compound including a dehydrogenated pimaric acid and/or its isomer as a repeating unit, and a photosensitive resin composition including the alkali-soluble polymer compound as an effective binder matrix are provided. A photosensitive resin composition using the alkali-soluble polymer compound including a dehydrogenated resin acid has excellent photosensitivity and developing characteristics cause a less deformation in a firing process, has excellent elasticity. Thus, the photosensitive resin composition is advantageous for curing various transparent photosensitive materials, in particular, materials of column spacers, an overcoat, a passivation layer, or the like, used for fabricating color filters of an LCD.
    Type: Application
    Filed: April 28, 2011
    Publication date: November 3, 2011
    Applicant: LG CHEM. LTD.
    Inventors: Keon Woo LEE, Sang Kyu KWAK, Chang Soon LEE, Hye Hyeon KIM
  • Patent number: 8048613
    Abstract: An alkali development-type solder resist includes (A) a carboxyl group-containing photosensitive resin obtained by reacting (a) a compound having two or more cyclic ether or thioether groups in the molecule with (b) an unsaturated monocarboxylic acid, reacting the product with (c) a polybasic acid anhydride, reacting the resulting resin with (d) a compound having a cyclic ether group and an ethylenic unsaturated group in the molecule, and reacting the product additionally with (c) a polybasic acid anhydride, (B) an oxime ester-based photopolymerization initiator containing a specific oxime ester group, (C) a compound having two or more ethylenic unsaturated groups in the molecule, and (D) a thermosetting component, wherein the dry film obtained by applying the composition has an absorbance of 0.3 to 1.2 per 25 ?m of the film thickness at a wavelength of 350 to 375 nm.
    Type: Grant
    Filed: October 13, 2008
    Date of Patent: November 1, 2011
    Assignee: Taiyo Ink Mfg. Co., Ltd.
    Inventors: Nobuhito Itoh, Yoko Shibasaki, Kenji Kato, Masao Arima
  • Publication number: 20110242468
    Abstract: A liquid crystal display panel, including: a pixel electrode formed on a first substrate; an alignment layer formed on the pixel electrode, wherein the alignment layer includes an alignment layer material and aligns first liquid crystal molecules in a direction substantially perpendicular to the pixel electrode; and a photo hardening layer formed on the alignment layer, wherein the photo hardening layer includes a photo hardening layer material and aligns second liquid crystal molecules to be tilted with respect to the pixel electrode, wherein the alignment layer material and the photo hardening layer material have different polarities from each other.
    Type: Application
    Filed: February 1, 2011
    Publication date: October 6, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kyong-Sik Choi, Myung-Jae Park, Min-Wook Park, Sung-Hoon Kim, Gak-Seok Lee, Woo-Jung Shin, Jun-Hyup Lee, Keun-Chan Oh, Sang-Gyun Kim, Su-Jeong Kim, Seung-Beom Park, Youn-Hak Jeong
  • Patent number: 8029877
    Abstract: There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (h) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.
    Type: Grant
    Filed: June 8, 2010
    Date of Patent: October 4, 2011
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Shinji Hayashi, Shunsuke Sega, Hiromu Taguchi, Mitsutaka Hasegawa
  • Patent number: 8008366
    Abstract: A process for producing a cured coating is provided that includes a step of forming on a substrate layer of a curable composition that includes at least one compound represented by Formula (I) and a step of curing the layer of the curable composition by irradiation with electron beam. In formula (I) , Q1 denoted a cyano group or a —COX2 group, X1 denoted a hydrogen atom, organic residue, or polymer chain bonded to carbon atom CA via a heteroatom, or a halogen atom, X2 denoted a hydrogen atom, organic residue, or polymer chain boned to the carbonyl group via a heteroatom, or a halogen atom, Ra and Rb independently denote a hydrogen atom, a halogen atom, a cyano group, or an organic residue, and X1 and X2, Ra and Rb, and X1 and Ra or Rb may be bonded to each other to form a cyclic structure. There is also provided an electron beam-curable composition that includes a compound represented by Formula (I).
    Type: Grant
    Filed: February 7, 2008
    Date of Patent: August 30, 2011
    Assignee: FUJIFILM Corporation
    Inventor: Kazuto Kunita
  • Publication number: 20110189253
    Abstract: The disclosure is directed to a composition includes a macromer having a polymeric backbone comprising units with a 1,2-diol or 1,3-diol structure and at least two pendant chains bearing crosslinkable groups, an amphiphilic comonomer, and a crosslinking initiator, wherein the composition has a setting time of less than about 3 minutes. The disclosure is further directed to a kit and a method of making the above-mentioned composition.
    Type: Application
    Filed: January 29, 2010
    Publication date: August 4, 2011
    Applicant: WARSAW ORTHOPEDIC, INC.
    Inventors: Sean M. Haddock, Susan J. Drapeau, Thomas Andrew Simonton
  • Patent number: 7989555
    Abstract: Symmetrical polyols, polyol esters, polyesters, polyurethanes, triazoles, and polyvinylethers derived from glycerol and methods of making the symmetrical polyols, polyesters, polyurethanes, polyhydroxyvinylethers and triazoles are discussed. Also provided is a method of making serinol.
    Type: Grant
    Filed: May 21, 2007
    Date of Patent: August 2, 2011
    Assignee: Global Agritech, Inc.
    Inventor: Dharma R. Kodali
  • Patent number: 7964654
    Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.
    Type: Grant
    Filed: September 14, 2010
    Date of Patent: June 21, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Glenn H. McGall, Andrea Cuppoletti
  • Publication number: 20110123929
    Abstract: Provided are an oxime compound represented by General Formula (1), a photosensitive composition containing the oxime compound as a photopolymerization initiator, a production method for a color filter using the photosensitive composition, and a color filter obtained by the production method: in General Formula (1), R1 represents a hydrogen atom, an acyl group, an alkoxycarbonyl group or an aryloxylcarbonyl group, each of which may have a substituent; R2 represents or R2s each represent a halogen atom, an alkyl group, an aryl group, an alkyloxy group, an aryloxy group, an alkylthio group, an arylthio group or an amino group; m is an integer of 0 to 4; when m is an integer of 2 or more, R2s may be linked together to form a ring; and A represents a 4-, 5-, 6- or 7-membered ring.
    Type: Application
    Filed: August 1, 2007
    Publication date: May 26, 2011
    Applicant: FUJIFILM Corporation
    Inventors: Akinori Fujita, Takashi Tamura, Kimi Ikeda, Daisuke Kashiwagi
  • Patent number: 7935742
    Abstract: An ink composition is provided that includes (A) one type of compound (monomer (A)) selected from the group consisting of a difunctional (meth)acrylic acid ester or amide having an alkylene group of 6 to 12 carbons, and a difunctional vinyl ether having an alkylene group of 6 to 12 carbons, (B) a polymerization initiator, and (C) a colorant. There is also provided an inkjet recording method that includes a step (a) of discharging the ink composition onto a recording medium and a step (b) of irradiating the discharged ink composition with actinic radiation so as to cure the ink composition. Furthermore, a process for producing a lithographic printing plate is provided that includes a step (a?) of discharging the ink composition onto a hydrophilic support and a step (b?) of irradiating the discharged ink composition with actinic radiation so as to cure the ink composition, thus forming a hydrophobic image on the hydrophilic support by curing the ink composition.
    Type: Grant
    Filed: February 12, 2007
    Date of Patent: May 3, 2011
    Assignee: FUJIFILM Corporation
    Inventor: Seishi Kasai
  • Publication number: 20110086936
    Abstract: Disclosed is a sealant composition for a liquid crystal display device, the sealant composition including a (meta) acrylate compound as expressed in Chemical Formula 1 below
    Type: Application
    Filed: May 27, 2010
    Publication date: April 14, 2011
    Inventors: Ki In SON, Joo Hyun Park, Gyu Won Cho
  • Patent number: 7914641
    Abstract: A sealing material for a flat panel display contains 100 parts by weight of a compound (A) containing at least one epoxy group in the molecule, and 0.01 to 40 parts by weight of a compound (B) that generates a base upon irradiation. The compound (B) that generates a base upon irradiation is preferably a compound that generates a tertiary amine upon irradiation. The sealing material has favorable curability at low temperature, and a long pot life at room temperature, and does not cause deterioration of display members with ionic components and acids.
    Type: Grant
    Filed: October 2, 2006
    Date of Patent: March 29, 2011
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Yugo Yamamoto, Yuichi Ito
  • Publication number: 20110069130
    Abstract: A multifunctional Type II photoinitiator according to Formula (I): wherein X represents a structural moiety according to Formula (II): wherein: A represents a Norrish Type II initiating group; and L represents a divalent linking group positioning the Norrish Type II initiating group A and the CR2R3-group in a 1-5 to a 1-9 position wherein position 1 is defined as the first atom in the aromatic or alicyclic ring of A to which L is covalently bonded and the position 5 to 9 is defined as the carbon atom of the CR2R3-group to which L is covalently bonded, with the proviso that L does not contain an amine. Radiation curable compositions and inks include the multifunctional Type II photoinitiator.
    Type: Application
    Filed: May 28, 2009
    Publication date: March 24, 2011
    Applicant: AGFA GRAPHICS NV
    Inventors: Johan Loccufier, Jaymes Van Luppen
  • Patent number: 7910312
    Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: March 22, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
  • Publication number: 20110065824
    Abstract: A curable composition for imprints excellent in adhesiveness to a substrate is disclosed. The composition comprises an oxime ester compound (A) and a polymerizable monomer (B), and the content of the polymerizable monomer (B) falls within a range of 80% by mass or more, relative to all ingredients of the composition except for a solvent.
    Type: Application
    Filed: September 14, 2010
    Publication date: March 17, 2011
    Applicant: FUJIFILM Corporation
    Inventors: Akinori FUJITA, Tomotaka Tsuchimura
  • Patent number: 7896484
    Abstract: An ink jet recording apparatus comprising a color ink container having a capacity V1 accommodating therein a solvent polymerizable in the presence of an acid and a colorant, a reaction liquid container having a capacity V2 (V2<V1) accommodating therein a reaction liquid comprising a solvent, and a photo-acid generating agent capable of generating an acid when irradiated with light, a stirring container mixing the color ink and the reaction liquid at a mixing ratio of S1:S2 (the color ink:the reaction liquid) to prepare a recording ink, a color ink supply means feeding the color ink to the stirring container, a reaction liquid supply means feeding the reaction liquid to the stirring container, an ink jet recording head ejecting the recording ink to a recording medium, and a supply tube feeding the recording ink to the recording head.
    Type: Grant
    Filed: June 5, 2008
    Date of Patent: March 1, 2011
    Assignees: Kabushiki Kaisha Toshiba, Toshiba Tec Kabushiki Kaisha
    Inventors: Masashi Hiroki, Kazuhiko Ohtsu, Yoshito Endo, Toru Ushirogouchi, Ryozo Akiyama
  • Publication number: 20110028585
    Abstract: The object of the present invention is to provide a photobase generator capable of efficiently generating amines (tertiary amines and amidine) high in catalytic activity by sensing light with a wavelength of from 350 to 500 nm (especially, from 400 to 500 nm). The present invention is a photobase generator characterized in being represented by general formula (1) or (2). Y+ is a quaternary ammonio group of general formula (3) to (5), and X? is a counter anion selected from among a borate anion, a phenolate anion, and a carboxylate anion.
    Type: Application
    Filed: March 18, 2009
    Publication date: February 3, 2011
    Applicant: SAN-APRO LIMITED
    Inventors: Atsushi Shiraishi, Hideki Kimura
  • Publication number: 20110009521
    Abstract: The invention provides an epoxy nanocomposite material for dental therapy, which can be applied to direct or indirect clinical restoration, dental core-post system, and dental brace etc. The epoxy nanocomposite filling material provided by the invention can be polymerized with various curing agents to form the polymer with low shrinkage.
    Type: Application
    Filed: February 5, 2010
    Publication date: January 13, 2011
    Applicant: National Taiwan University
    Inventors: Wei-Fang Su, Sheng-Hao Hsu, Yun-Yuan Tai, Min-Huey Chen
  • Patent number: 7862996
    Abstract: Protective groups which may be cleaved with an activatable deprotecting reagent are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: January 4, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
  • Patent number: 7863344
    Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.
    Type: Grant
    Filed: November 3, 2008
    Date of Patent: January 4, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Glenn H. McGall, Andrea Cuppoletti
  • Publication number: 20100272979
    Abstract: Diamine compounds, which in particular are useful as precursors for the production of liquid crystal alignment layers, are represented by the general formula I: wherein A1 represents an organic group of 1 to 40 carbon atoms; A2 represents a hydrogen atom or an organic group of 1 to 40 carbon atoms.
    Type: Application
    Filed: May 14, 2010
    Publication date: October 28, 2010
    Applicant: Rolic AG
    Inventors: Guy Marck, Olivier Muller
  • Publication number: 20100261018
    Abstract: Curable adhesive compositions are provided that exhibit a high refractive index.
    Type: Application
    Filed: April 12, 2010
    Publication date: October 14, 2010
    Applicant: PixelOptics, Inc.
    Inventors: Yassin Turshani, Omar Mohamed Buazza
  • Patent number: 7812063
    Abstract: The invention relates to a flame-retardant resin formulation comprising respectively at least one flame-retardant component, one alkali-soluble component, one polymerizable monomer, one photoinitiator, and one epoxy component, which comprises, as flame-retardant component, a phosphinic salt of the formula (I), in which R1 and R2 are identical or different and, independently of one another, are C1-C6-alkyl, linear or branched, and/or aryl; M is Mg, Ca, Al, Sb, Sn, Ge, Ti, Zn, Fe, Zr, Ce, Bi, Sr, Mn, Li, Na, K, and/or a protonated nitrogen base, and m is from 1 to 4. This novel flame-retardant resin formulation is preferably used as solder resist.
    Type: Grant
    Filed: January 11, 2008
    Date of Patent: October 12, 2010
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Mathias Dietz, Harald Bauer, Werner Krause
  • Publication number: 20100253888
    Abstract: Disclosed is a coloring composition including a pigment, a transparent resin, a monomer having an ethylenic unsaturated double bond, and a photo-polymerization initiator, wherein a ratio (M/P) of weight (M) of the monomer having an ethylenic unsaturated double bond to weight (P) of the transparent resin is confined to a range of 0.12 to 1.35, and the coloring composition is adapted to be employed in a manufacturing method of a color filter including coating a surface of a substrate with the coloring composition, irradiating a filter segment-forming region or a black matrix-forming region of the coated coloring composition film with a laser beam having a wavelength of 340 nm to 380 nm, thereby curing the irradiated region, and removing uncured portion of the coated coloring composition film to form the filter segment or the black matrix.
    Type: Application
    Filed: June 17, 2010
    Publication date: October 7, 2010
    Applicant: TOPPAN PRINTING CO., LTD.
    Inventors: Hideyo Tanaka, Isao Shigemori, Yusuke Iida, Mari Iwasaki, Kenro Sunahara, Morihide Miyamura, Takeshi Ikeda, Eishi Aoki, Genki Harada, Azumi Sato
  • Publication number: 20100249262
    Abstract: An oxime ester compound of formula (I) useful as a photopolymerization initiator. A photopolymerization initiator having the oxime ester compound as an active ingredient is activated through efficient absorption of light of long wavelength, e.g., 405 nm or 365 nm, to exhibit high sensitivity. In formula (I), R1 and R2 are each R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 are each hydrogen, a C1-C20 alkyl group, C6-C30 aryl group, a C7-C30 arylalkyl group, or a C2-C20 heterocyclic group; R3 and R4 are each R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, halogen, or a hydroxyl group; a and b is each 0 to 4; X is oxygen, sulfur, selenium, CR31R32, CO, NR33, or PR34; and R31, R32, R33, and R34 each have the same meaning as R1.
    Type: Application
    Filed: December 25, 2007
    Publication date: September 30, 2010
    Applicant: ADEKA CORPORATION
    Inventors: Daisuke Sawamoto, Nobuhide Tominaga
  • Patent number: 7803850
    Abstract: A compound that exhibits excellent color tone stability and physical properties as well as excellent photopolymerization activity over a wide region from near-ultraviolet to visible region, permitting relaxed operation under ambient light, so that wide application can be found in the dental field and photopolymerization industry; and a relevant photopolymerization initiator and hardenable composition. In particular, there is provided a novel camphorquinone derivative having an acylphosphine oxide group [—(C?O)—(P?O)<] in each molecule. Further, there is provided a photopolymerization initiator comprising the camphorquinone derivative having an acrylphosphine oxide group [—(C?O)—(P?O)<] in each molecule as an indispensable component, loaded with at least one member selected from among a polymerization accelerator, a photoacid generator, a photosensitizer and a (bis)acylphosphine oxide, and provided a hardenable composition comprising the initiator.
    Type: Grant
    Filed: March 13, 2006
    Date of Patent: September 28, 2010
    Assignee: Kabushiki Kaisha Shofu
    Inventors: Kunio Ikemura, Kensuke Ichizawa, Yoshiyuki Jogetsu
  • Patent number: 7795324
    Abstract: A novel polymeric initiator is disclosed comprising a dendritic polymer core with at least one initiating functional group as an end group. The dendritic polymeric core is preferably a hyperbranched polymer. The polymeric initiators are useful in radiation curable compositions such as varnishes, lacquers and printing inks and are especially useful in radiation curable inkjet inks.
    Type: Grant
    Filed: June 28, 2005
    Date of Patent: September 14, 2010
    Assignee: Agfa Graphics, N.V.
    Inventors: Johan Loccufier, Luc Vanmaele, Jaymes Van Luppen, Roland Claes, Yu Chen, Holger Frey
  • Publication number: 20100222447
    Abstract: A photo-crosslinkable polyolefin composition comprises a polyolefin, a source of functionality receptive to crosslinking by UV radiation, a cationic photoinitiator and optionally includes a free-radical photoinitiator, a crosslinking accelerator or sensitizer, and other additives such as compatibilizers, inorganic fillers, nanofillers, glass, polymeric and ceramic microspheres, glass fibres, flame retardants, antioxidants, stabilizers, processing aids, foaming agents and pigments. A method for manufacturing a UV-crosslinked polyolefin article comprises forming an article by extruding, moulding or otherwise forming the UV-crosslinkable polyolefin composition and subjecting the article to UV radiation on-line with the extrusion, moulding or other forming operation.
    Type: Application
    Filed: May 14, 2010
    Publication date: September 2, 2010
    Applicant: SHAWCOR LTD.
    Inventors: Peter Jackson, Eileen Wan
  • Patent number: 7781763
    Abstract: Disclosed herein is a composition including a perfluoropolyether derivative, a photosensitive polymer or a copolymer thereof, and a photocuring agent, a passivation layer, organic thin film transistor, and electronic device including the same, a method of forming the passivation layer and methods of fabricating the organic thin film transistor and electronic device. The organic thin film transistor may prevent or reduce oxygen and moisture from infiltrating thereinto, and thus may prevent or reduce the degradation of the performance thereof caused by ambient air, prevent or reduce the deterioration thereof, and may more easily be formed into a pattern, thereby exhibiting characteristics suitable for use in electronics.
    Type: Grant
    Filed: March 31, 2008
    Date of Patent: August 24, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung Seok Hahn, Do Hwan Kim, Bon Won Koo, Sang Yoon Lee, Hyun Sik Moon
  • Publication number: 20100184880
    Abstract: The present invention provides a photocurable pressure-sensitive adhesive composition which has sufficient adhesion before being irradiated with light, and after being irradiated with light, keeps a sufficient pot life and has a short cure-completion time at a room temperature. A cured product produced from the composition has high adhesion force to adherends difficult to be attached, and excellent durability. The photocurable pressure-sensitive adhesive composition comprises a crosslinking compound (A) that is crosslinkable by the action of a base, a photobase generator (B) which becomes active upon light irradiation to generate a base, and a tackifying component (C).
    Type: Application
    Filed: June 4, 2008
    Publication date: July 22, 2010
    Inventor: Hiroji Fukui
  • Patent number: 7758930
    Abstract: There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (h) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.
    Type: Grant
    Filed: April 20, 2009
    Date of Patent: July 20, 2010
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Shinji Hayashi, Shunsuke Sega, Hiromu Taguchi, Mitsutaka Hasegawa
  • Publication number: 20100168266
    Abstract: Provided are a photosensitive resin and a photosensitive resin composition comprising the photosensitive resin. The photosensitive resin has the structure of Formula 1, which is described in the specification. The photosensitive resin and the photosensitive resin composition have good sensitivity, improved resistance to heat and chemicals, and excellent storage stability. Further provided are a method for preparing the photosensitive resin and a cured product of the photosensitive resin composition.
    Type: Application
    Filed: August 20, 2008
    Publication date: July 1, 2010
    Applicant: LG CHEM, LTD.
    Inventors: Min Young Lim, Sung Hyung Kim, Han Soo Kim, Yoon Hee Heo, Dae Hyun Kim, Ji Heum Yoo, Sun Hwa Kim
  • Patent number: 7696257
    Abstract: An oxime ester compound represented below is useful as a photopolymerization initiator. A photopolymerization initiator including this as an active constituent has high sensitivity and causes no concern about coloration or contamination. (X represents a halogen atom or alkyl group. R1, R2, and R3 each independently represent R, OR, COR, SR, CONRR?, or CN, wherein R and R? each represent an alkyl group, an aryl group, an aralkyl group, or a heterocyclic group; these groups may be substituted with (a) halogen atom(s) and/or (a) heterocyclic group(s); the alkylene moiety in the alkyl or aralkyl group may be interrupted by (an) unsaturated bond(s), (an) ether bond(s), (a) thioether bond(s), or (an) ester bond(s); and R and R? may form a ring. Y1 represents an oxygen, sulfur, or selenium atom; A represents a heterocyclic group; m represents an integer 0-4; p represents an integer 0-5; and q represents 0 or 1.
    Type: Grant
    Filed: August 3, 2005
    Date of Patent: April 13, 2010
    Assignee: Adeka Corporation
    Inventors: Mitsuo Akutsu, Daisuke Sawamoto, Yasunori Kozaki, Toshihiko Murai
  • Publication number: 20100080973
    Abstract: The present invention relates to a composition for preparing an excellent protecting film with high strength, wear resistance, and excellent barrier property by low temperature hardening, a protecting film prepared therefrom, a substrate comprising the same, and a component or device comprising the same. The composition comprises an organosiloxane polymer a), a photobase generator b), and an organic solvent c).
    Type: Application
    Filed: September 18, 2007
    Publication date: April 1, 2010
    Inventors: Jeong-man Son, Minjin Ko, Myungsun Moon, Byung-Ro Kim, Jaeho Cheong
  • Publication number: 20100009290
    Abstract: Photosensitive polybenzoxazine compositions include a photosensitive additive such as an o-diazoquinone and a polymer comprising a repeating unit represented by the following formula (I) wherein R1 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R2 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R4 comprises a hydrophilic group, a hydrophilic group protected by an acid-cleavable group, a hydrophilic group protected by a base-cleavable group, a cross-linkable group, or combinations thereof, and i represents an integer of 1 or more. The photosensitive compositions may be formed by combining a precursor polymer with a photosensitive additive and a solvent, patterning the precursor polymer, and heating the precursor polymer at a thermal processing temperature in a range of from about 180° C. to about 300° C. to convert the precursor polymer into the final polymer.
    Type: Application
    Filed: December 3, 2006
    Publication date: January 14, 2010
    Applicants: CENTRAL GLASS CO., LTD., GEORGIA TECH RESEARCH CORPORATION, Office of Technology Licensing
    Inventors: Kazuhiro Yamanaka, Clifford Henderson, Michael Romeo, Kazuhiko Maeda
  • Publication number: 20090311479
    Abstract: A method of manufacturing a color filter, includes forming a colored coated film on a substrate using a colored composition containing a pigment, a monomer having an ethylenic unsaturated double bond and photo-polymerization initiator, irradiating a filter segment-forming region or a black matrix-forming region of the colored coated film with an excimer laser beam having a wavelength of 308 nm (XeCL) at a dosage sufficient to achieve a cumulative light exposure of 1-150 mJ/cm2, thereby curing the irradiated region, removing uncured portions of the colored coated film to form the filter segment or the black matrix, and repeating the above-described steps plural times, thereby forming filter segments of at least two colors and/or a black matrix.
    Type: Application
    Filed: July 9, 2009
    Publication date: December 17, 2009
    Inventors: Isao Shigemori, Morihide Miyamura, Toshio Waku, Yusuke Iida, Kenro Sunahara, Kohei Matsui, Takeshi Ikeda, Hideyo Tanaka, Eishi Aoki, Genki Harada
  • Publication number: 20090298961
    Abstract: Multicomponent systems comprising (A) a component which contains isocyanate-reactive functional groups, is free from isocyanate groups, and contains reactive functional groups having bonds which can be activated with actinic radiation, or is free from these functional groups, and (B) a component which contains isocyanate groups, is free from isocyanate-reactive functional groups, and contains reactive functional groups having bonds which can be activated with actinic radiation, or is free from these functional groups, one of the two components, (A) or (B), containing functional groups having bonds which can be activated with actinic radiation, and component (A) comprising (L) a light stabilizer, selected from the group consisting of low molecular mass, oligomeric and polymeric light stabilizers which contain at least one isocyanate-reactive functional group and (P) a photoinitiator which contains at least one isocyanate-reactive functional group; processes for preparing them, and their use for
    Type: Application
    Filed: November 15, 2005
    Publication date: December 3, 2009
    Applicant: Basf Coatings AG
    Inventors: Hubert Baumgart, Lars Hoffman, Bjoern Feldmann, Uwe Conring, Melanie Glomb
  • Publication number: 20090284698
    Abstract: The present invention relates to an ink composition, and more particularly, to an ink composition that comprises a) a binder polymer; b) a polymerizable compound that has an ethylenical unsaturation bond; c) a thermal initiator or photo-initiator; d) I) a solvent that has a boiling point of 180° C. or more, II) a solvent that has a hydroxyl group, and III) a solvent that has a boiling point of less than 180° C.; and e) a pigment, a color filter that is manufactured by using the same, and a display device that includes the same. When the ink composition according to the present invention is used in an inkjet method, it is possible to improve a contrast ratio according to excellent dispersion of fine pigment and improve an initial jetting property by using reduction of volatility.
    Type: Application
    Filed: May 14, 2009
    Publication date: November 19, 2009
    Inventors: Mi-Kyoung Kim, Dae-Hyun Kim, Hyun-Sik Kim, Duk-Sik Ha, Dong-Chang Choi, Han-Soo Kim, Min-A Yu
  • Publication number: 20090215919
    Abstract: A material which comprises a polyrotaxane and a polymer and is crosslinked by irradiation with light. In the material, which comprises a first polyrotaxane and a polymer, the first polyrotaxane comprises a first cyclic molecules, a first linear molecule with which the first cyclic molecules are clathrated in a splitted state, and first blocking groups disposed respectively at both ends of the first linear molecule so as to prevent the first cyclic molecules from being released from the first linear molecule. The first polyrotaxane combines with at least part of the polymer through the first cyclic molecules by photocrosslinking reaction.
    Type: Application
    Filed: February 21, 2006
    Publication date: August 27, 2009
    Applicant: THE UNIVERSITY OF TOKYO
    Inventors: Kohzo Ito, Masatoshi Kidowaki
  • Publication number: 20090202749
    Abstract: There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (h) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.
    Type: Application
    Filed: April 20, 2009
    Publication date: August 13, 2009
    Inventors: Shinji HAYASHI, Shunsuke SEGA, Hiromu TAGUCHI, Mitsutaka HASEGAWA
  • Patent number: 7572559
    Abstract: The invention provides a colorant-containing curable composition including a colorant and a solvent, wherein the colorant includes a compound represented by Formula (I) and/or a tautomer thereof, and the solvent includes at least one selected from the group consisting of cyclohexanone, cyclopentanone, propyleneglycol methyl ether, propyleneglycol methyl ether acetate, a lactate ester, and diacetone alcohol. The invention further provides a color filter manufactured by using the colorant-containing composition and a manufacturing method of the color filter.
    Type: Grant
    Filed: August 28, 2006
    Date of Patent: August 11, 2009
    Assignee: FUJIFILM Corporation
    Inventor: Katsumi Araki
  • Publication number: 20090163615
    Abstract: The present application provides a latent ink-jet ink formulation suitable as solder mask. The composition generally comprises: (a) at least one compound capable of self cross-linking (USM); (b) at least one phenolic resin; (c) at least one solvent; (d) at least one mineral filler; (e) at least one polyol; and (f) at least one photoinitiator.
    Type: Application
    Filed: August 31, 2006
    Publication date: June 25, 2009
    Inventors: Izhar Halahmi, Shalom Luski, Michal Cohen
  • Publication number: 20090092767
    Abstract: A stable viscosity coating composition, a method of forming the stable viscosity coating composition and a method for using the stable viscosity coating composition in a micro-molding imprint lithographic process, such as Step and Flash Imprint Lithography is disclosed. The stable viscosity coating composition may include at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and a stabilizer, wherein the stabilizer may be 9-anthracenemethanol, a substituted 9-anthracenemethanol, phenothiazine, or a substituted phenothiazine. The coating composition may include a radiation sensitive photoacid generator (PAG). The method of forming the coating composition comprises combining at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and at least one stabilizer.
    Type: Application
    Filed: December 16, 2008
    Publication date: April 9, 2009
    Inventors: Frances Anne Houle, Hiroshi Ito
  • Publication number: 20090045396
    Abstract: Disclosed herein is a composition including a perfluoropolyether derivative, a photosensitive polymer or a copolymer thereof, and a photocuring agent, a passivation layer, organic thin film transistor, and electronic device including the same, a method of forming the passivation layer and methods of fabricating the organic thin film transistor and electronic device. The organic thin film transistor may prevent or reduce oxygen and moisture from infiltrating thereinto, and thus may prevent or reduce the degradation of the performance thereof caused by ambient air, prevent or reduce the deterioration thereof, and may more easily be formed into a pattern, thereby exhibiting characteristics suitable for use in electronics.
    Type: Application
    Filed: March 31, 2008
    Publication date: February 19, 2009
    Inventors: Jung Seok Hahn, Do Hwan Kim, Bon Won Koo, Sang Yoon Lee, Hyun Sik Moon
  • Publication number: 20090047633
    Abstract: Dental compositions comprising a polymerizable compound, filler system of nanometer-sized silica particles, and polymerization system capable of being activated by light are provided. The compositions further contain a solvent such as a mixture of 1-butanol and acetone and may contain water. The nanometer-sized silica particles, having an average particle size of about 1 nm to about 100 nm, are uniformly dispersed within the resin. The compositions can be applied as a polish, sealant, bleach guard, or other coating material to the surfaces of dental restorations and teeth. Self-etching and non-self-etching compositions are provided. The cured coating forms a protective, durable film that enhances the shine and luster of the restorations and teeth.
    Type: Application
    Filed: May 12, 2008
    Publication date: February 19, 2009
    Inventors: Xin Huo, Michael O'Connor, Robert Size
  • Publication number: 20090041923
    Abstract: A medical device having a lubricious coating on at least a section of the medical device, and a method of coating a medical device, the lubricious coating being a network of a hydrophilic compound cross-linked to itself and interlocked with a network of a cross-linked polymerized multifunctional monomer or polymer. The coating can include one or more agents which provide enhanced adhesion of the coating on the device, or which provide faster hydration of the coating and/or improved lubricity. Additionally, the lubricious coating can be provided with one or more therapeutic or diagnostic agents, and in one embodiment the agent elutes relatively quickly in a concentrated release from the lubricious coating upon hydration of the coating.
    Type: Application
    Filed: August 6, 2007
    Publication date: February 12, 2009
    Applicant: ABBOTT CARDIOVASCULAR SYSTEMS INC.
    Inventors: Tung-Liang Lin, Jeong S. Lee, Emmanuel Biagtan, David Burkett
  • Publication number: 20080318188
    Abstract: The present invention provides polymerizable dental compositions comprising a dimer acid-derived monomer such as a dimer acid-derived di(meth)acrylate monomer.
    Type: Application
    Filed: December 29, 2004
    Publication date: December 25, 2008
    Applicant: The Regents of the University of Colorado
    Inventors: Jeffrey W. Stansbury, Christopher N. Bowman, Marianela Trujillo
  • Publication number: 20080305707
    Abstract: [Problems] To provide a radiation curable resin having an extremely low possibility of contaminating liquid crystals, and a liquid crystal sealing material using such a photopolymerization initiator. [Means for Solving Problems] A liquid crystal sealing material characterized by comprising (a) a radiation curable resin represented by the general formula (1) below, (b) a photopolymerization initiator and (c) a filler having an average particle diameter of not more than 3 ?m.
    Type: Application
    Filed: October 12, 2005
    Publication date: December 11, 2008
    Applicant: NIPPON KAYAKU KABUSHIKI KAISHA
    Inventors: Masahiro Imaizumi, Yasumasa Akatuka, Naoyuki Ochi, Eiichi Nishihara, Masaru Kudou, Toyohumi Asano, Naoki Toneda, Masahiro Hirano
  • Publication number: 20080299324
    Abstract: Printed images with excellent image quality, adhesion and durability are prepared by applying an ink to a printable surface which contains one or more components containing reactive groups followed by exposing the surface with the applied ink to ultra-violet light, high intensity visible light, or electron beam radiation. The surfaces of typically non-adherent substrates, such as polyolefins and PET are rendered adherent using this method without plasma, corona or flame treatment. The reactive groups include ethylenically unsaturated groups such as vinyl, vinyl ether, allyl, methacrylate, acrylate etc, epoxides, hydroxyl, amines, acidic groups, basic groups and free radical generating groups. The images exhibit good resolution, edge acuity and permanence.
    Type: Application
    Filed: May 27, 2008
    Publication date: December 4, 2008
    Inventors: Andrew S. Naisby, Sebastien Villeneuve, Stephan Ilg, Amalia Di Matteo