Abstract: The invention relates to a method for the photochemical conversion of tachysterol compounds into previtamin D compounds and of trans-vitamin D compounds into cis-vitamin D compounds under the influence of radiation, by exposing the tachysterol compound and trans-vitamin D compound, respectively, dissolved in a suitable solvent system, in the presence of a polymeric photosensitizer consisting of a polymer chain ("backbone") comprising covalently bound sensitizers suitable for the photochemical conversion, to light with a wavelength of preferably between approx. 300 and approx.

Abstract: A photoresist composition is disclosed. The photoresist composition comprises a base resin, a photosensitizer, and a solvent. The base resin comprises polyhydroxystyrene represented by the following structural formula (I): ##STR1## (wherein k is a positive integer). The photosensitizer comprises a polyhalogen compound(s). The photoresist composition of the present invention has dry etching resistance characteristics comparable to those of conventional positive novolak photoresist compositions and can form a resist pattern with a high resolution and vertical sidewall profiles. This makes microprocessing possible.

Abstract: Acridine compounds such as 1,4-butylenebis-.beta.-(acridin-9-yl)acrylate, or the like, are high in light sensitivity and suitable as a photopolymerization initiator.

Abstract: An energy polymerizable composition and process therefore, comprising a cationically polymerizable material and a catalytically effective amount of an ionic salt of an organometallic complex cation as polymerization initiator, said ionic salt of an organometallic complex cation being capable of adding an intermediate strength nucleophile or upon photolysis capable of liberating at least one coordination site, said metal in said organometallic complex cation being selected from elements of Periodic Groups IVB, VB, VIB, VIIB, and VIIIB are disclosed. Certain of the organometallic metallic polymerization initiators are novel cationic salts.

Abstract: Titanocenes with, for example, .pi.-cyclopentadienyl ligands in which one or two carbo- or heterocyclic aromatic rings are bonded to the titanium, the aromatic rings being substituted by fluorine in at least one of the two ortho-positions relative to the metal-carbon bond and being substituted by at least one free or etherified or esterified polyoxaalkylene radical, are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated substrates.

Abstract: Titanocenes containing two 5-membered cyclodienyl gropus, for example cyclopentadienyl, and one or two 6-membered carbocyclic or 5- or 6-membered heterocyclic aromatic rings which are substituted by a fluorine atom in at least one of the two ortho-positions to the titanium-carbon bond and contain, as further substituents, a substituted amino radical, are suitable as photoinitiators for radiation-induced polymerization of ethylenically unsaturated compounds.

Abstract: A photosensitive resin composition suitable for a water-developing type photosensitive resin plate as a patrix of a matrix for a rubber plate which comprises a basic nitrogen containing polyamide; a monomer having polymeric unsaturated bond; a compound of the formula (I): ##STR1## wherein R.sub.1 and R.sub.2 are the same or different and are hydrogen, alkyl, aryl or a derivative thereof; m and n are integers of 0 to 2 and the sum of m and n is 1 to 3; and M is an alkaline metal, an alkaline earth metal or a transition metal, and a N-nitrosoamine compound of the formula (II) of the formula: ##STR2## wherein R.sub.3 and R.sub.4 are the same or different and are halogen, hydroxyl, carboxyl, alkyl, cycloalkyl, optionally substituted aryl or acyl group; X and Y are carbonyl or --O--; and p and q are 1 or 0, or a salt thereof.

Abstract: A photoinitiator composition comprising (1) an aminobenzylidene carbonyl compound and (2) an N-aryl-.alpha.-amino acid is suitable for use in a photo-polymerizable composition comprising (a) an addition-polymerizable compound having a boiling point of 100.degree. C. or higher at an atmospheric pressure and (b) said photoinitiator composition.

Abstract: Titanocenes with, for example, .pi.-cyclopentadienyl ligands in which one or two carbo- or heterocyclic aromatic rings are bonded to the titanium, the aromatic rings being substituted by fluorine in at least one of the two ortho-positions relative to the matal-carbon bond and being substituted by at least one free or etherified or esterified polyoxaalkylene radical, are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated substrates.

Abstract: Titanocenes containing .pi.-cyclopentadienyl ligands, in which one or two carbocyclic or heterocyclic aromatic rings are attached to the metal atom, said aromatic rings being substituted by fluorine in at least one of the two ortho-positions relative to the metal-carbon bonds, are suitable photoinitiators for the photopolymerization of ethylenically unsaturated substrates. They are distinguished by high sensitivity, stability to air and heat, and are very effective in the range from UV light to visible light.

Abstract: The ultraviolet-curable organoploysiloxane composition of the invention comprises (A) an organopolysiloxane having bonded to a silicon atom thereof a silyl-substituted ethyl group represented by the general formula[CH.sub.2 .dbd.CR.sup.1 --CO--O--(--CH.sub.2 --).sub.a --SiR.sup.2.sub.2 --](R.sup.2 .sub.3 Si--O--).sub.c R.sup.2.sub.2--c Si--C.sub.2 H.sub.4 --,in which R.sup.1 is a hydrogen atom or a methyl group, R.sup.2 is a monovalent hydrocarbon group, a is 1, 2 or 3 and c is 1 or 2, and (B) a photopolymerization initiator. The composition is rapidly cured by ultraviolet irradiation into a gel-like material having adhesiveness without the disadvantages of catalyst poisoning and undue volume shrinkage so that the composition is useful as a potting agent in electronic and electric components.

Abstract: In polymer ammonium salts which are formed from a copolymer (A) which can be modified by a polymer-analogous reaction and from one or more amines (B), the copolymer (A) is obtainable by copolymerization of a monomer mixture of(a.sub.1) ethylene,(a.sub.2) acrylic acid and/or methacrylic acid, and(a.sub.3) one or more further monomers from the group consisting of the vinyl esters, vinyl ethers, acrylates, methacrylates, acrylamides and methacrylamides, and the amines (B) are selected from the group consisting of the(b.sub.1) cyclic amines of the general formula I ##STR1## and/or from the group consisting of the (b.sub.2) open-chain amines of the general formula II ##STR2## and/or from the group consisting of (b.sub.3) 1,4-thiazine, N,N',N"-trisvinylmelamine and N,N',N"-triallylmelamine, Z, R.sup.1, R.sup.2 and R.sup.3 having the meanings stated in the description.

Abstract: An adhesive composition which is curable by electromagnetic induction heating when it is applied to various substrates, said adhesive comprising a mixture of(I) An epoxy resin component and(II) A hardener component and(III) From 2 to 60% by weight of (I) and (II) of an electromagnetic energy absorbing material is described.

Abstract: Acryl functional silicone compounds are made by reacting an amine functional silicon compound with a di- or multi-functional acryl compound by a Michael-type addition reaction. These acryl functional silicone compounds are purer than others because no catalyst is used and no by-products are formed. These acryl functional silicone compounds can be used as adhesion promoters and as coating compositions which can be cured by ultraviolet radiation.

Abstract: Photosensitive compositions having surfactant vesicles therein are described. A method is also shown in which the photosensitive vesicle containing an enclosed substance is exposed to light to control the release of the substance.

Abstract: Polyimides which contain aliphatic groups can be radiation-crosslinked with chromophoric aromatic polyazides. Solutions in organic solvents can be used as radiation-sensitive coating agents for preparing insulating or protective coatings and as photoresists having high thermal, mechanical and chemical stability.

Abstract: Substituted dibenzalketones useful as water-soluble photoinitiators have the formula: ##STR1## wherein R.sup.1 and R.sup.2 are 4, alkyl or, taken together, an aliphatic ring, n=0 or an integer and R.sup.3 and R.sup.4 either are both water-solubilizing groups (a) --X(CH.sub.2).sub.m N.sup.+ R.sup.5.sub.3, (b) --X(CH.sub.2).sub.m COO.sup.- M or (c) --X(CH.sub.2).sub.m SO.sup.-.sub.3 M.sub.5 or one is such a group and the other is (d) a group --NR.sup.5.sub.2, X is --CH.sub.2 --, --O-- or --S--, R.sup.5 is an alkyl group, M is H.sup.+ or a metal cation and m=0. Such a photoinitiator compound is associated with a polymerizable compound in an aqueous photopolymerizable composition.

Abstract: A photosensitive resin composition contains a co-polymer of a glycidyl (meth)acrylate or glycidyl (.alpha.-methyl)vinyl ether with a (meth)acrylic amide or ester having a quaternary ammonium salt structure, and an aromatic azide as a photosensitizer. A color filter can be prepared by coating the composition on a substrate, and exposing and developing the coated composition to form a pattern. The resultant pattern is then dyed.

Abstract: A photopolymerizable composition comprises at least one polymerizable compound having at least one ethylenically unsaturated bond therein and at least one photopolymerization initiator and optionally at least one linear organic high molecular weight polymer and characterized in that the photopolymerization initiator comprises a specific combination of two kinds of compounds, for instance, 2,4,6-tris(trichloromethyl)-s-triazine and compound (12) represented by the following formula: ##STR1## The photopolymerizable composition exhibits a high sensitivity to extremely wide range of actinic rays extending from ultraviolet light to visible light and is useful for manufacturing PS plates and photoresist layer for use in making print circuit-boards or the like.

Abstract: Radiation sensitive compositions comprising acrylic or methacrylic acid esters with decreased oxygen inhibition attained by use of minor amounts of N,N'-diorgano dicarboxamide additives. The acrylated ester compositions are suitable for ultraviolet curable coatings.

Abstract: A linear polymer having a recurring unit represented by the formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each independently is a hydrogen atom, a C.sub.1-10 alkyl group, a C.sub.6-10 cycloalkyl group, an aryl group, or a halogen atom and the ethynyl group is in either meta position or para position to the main polymer chain;and a weight-average molecular weight of 1,000 to 1,000,000. A resin composition consisting essentially of (i) a polymer having a recurring unit represented by the formula (I) or a polymer having a recurring unit represented by the formula (I) and a recurring unit represented by the formula (II): ##STR2## wherein X and Y each independently is a C.sub.6-20 aryl group, a C.sub.1-10 alkyl group, a C.sub.6-10 cycloalkyl group, a silyl group having a C.sub.1-10 alkyl group or a C.sub.

Abstract: A dental impression material which comprises a pre-polymer formed by reacting a polyol or combination polyester polyol with a diisocyanate, and then with a hydroxyacrylate or hydroxymethacrylate; along with a metal catalyst, plasticizer, photosensitizer, reducing agent, filler and other additives. The essential characteristics of the polymer portion that makes the system work are that it is a long-chain aliphatic polyester-polyurethane molecule, which when endcapped with hydroxy arcylate moieties, is photo-polymerizable to yield a tear-resistant, highly flexible, medium-durometer elastomer, suitable for use as a dental impression material.

Abstract: The curable organopolysiloxane composition of the invention is formulated with two kinds of crosslinking agents including an organosilane compound having 2 or 3 isopropenyloxy groups in a molecule and an organopolysiloxane having at least 2 mercapto groups in a molecule added to the base ingredient of a hydroxy-terminated diorganopolysiloxane together with a curing catalyst and a photosensitizer. The composition has two-way curability by the condensation reaction in the presence of atmospheric moisture between the silanolic hydroxy groups and the isopropenyloxy groups and by the ultraviolet-induced addition reaction between the isopropenyloxy groups and the mercapto groups to exhibit very reliable curing behavior giving a cured rubbery elastomer having excellent properties.

Abstract: Surfactants which are blocked against surfactant action (identified herein as "photolabile blocked surfactants") by a photolabile protective or masking group but which, on exposure to actinic radiation, become unblocked are provided. Coating compositions in which surfactant is formed on irradiation are provided by blending the photolabile blocked surfactant with polymeric film-forming materials.Compositions containing the photolabile blocked surfactants are useful when employed as protective coatings on various substrates or as the adhesive in a pressure sensitive adhesive tape. Although initially well adhering to a substrate, such compositions may be readily removed from the substrate following exposure of the same to suitable radiation which unblocks the surfactant to permit it to regain its surfactant activity.

Abstract: Titanocenes with .pi.-cyclopentadienyl ligands, in which one or two carbocyclic or heterocyclic aromatic rings are bonded to the metal, the aromatic rings being substituted in at least one of the two ortho-positions relative to the metal-carbon bonds by CF.sub.2 Z (Z=F or substituted or unsubstituted alkyl), are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated compounds. They are distinguished by a high radiation sensitivity, stability to air and thermal effects, and high effectiveness in the range from UV light to visible light.

Abstract: The present invention provides a photosensitive resin composition used to form a top resist layer of a multilayer resist system, the composition comprising a photosensitive polyphenylsilsesquioxane represented by the following general formula (I) of: ##STR1## wherein X is selected from the group consisting of acryloyloxymethyl, methacryloyloxymethyl, and cinnamoyloxymethyl; and l, m and n are zero or positive integers but l and m do not take the value of zero simultaneously; and a bisazide compound added to act as a cross-linking agent.The photosensitive resin composition has high sensitivity to UV light and excellent resistance to reactive ion etching under oxygen gas (O.sub.2 RIE).

Abstract: Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o,o'-dinitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.

Abstract: The negative-working photoresist composition of the invention comprises, as the polymeric constituent thereof, a polymeric compound obtained by the anionic living polymerization of a vinylphenyl substituted-vinyl dimethyl silane compound represented by the general formulaCH.sub.2 .dbd.CH--C.sub.6 H.sub.4 --SiMe.sub.2 --CR.sup.1 .dbd.CR.sup.2 R.sup.3,in which Me is a methyl group and R.sup.1, R.sup.2 and R.sup.3 are each a hydrogen atom, methyl group or ethyl group, at least one of the R.sup.1, R.sup.2 and R.sup.3 being not a hydrogen atom, to cause the polymerization only at the styrenic double bond, the other double bond in the same molecule remaining unpolymerized. By virtue of the high density of the double bonds in the polymer molecules, the photoresist composition is highly sensitive to irradiation with actinic rays and capable of giving a patterned photoresist layer having excellent resolving power and resistance against dry etching.

Abstract: A process is disclosed for producing an abrasion resistant UV curable photopolymerizable composition for coating substrates. The process involves dense grafting and comprises hydrolyzing in an aqueous acidic solution a trialkoxysilane to render it organophillic followed by dispersion with fine silica or alumina. Grafting of the hydrolyzed trialkoxysilane to the silica or alumina is effected through dehydration. The grafted material is then dispersed into intimate contact with one or more photopolymerizable monomers and photoinitiators.

Abstract: A radiation-sensitive composition is described, which is comprised of (1) a polymer containing repeating units of the formula: ##STR1## wherein R.sup.1 is a trivalent or tetravalent aromatic or heteroaromatic residue having 6 to 30 carbon atoms, R.sup.2 is a divalent aromatic or heteroaromatic residue having 6 to 30 carbon atoms, R.sup.3 is hydrogen or an ammonium ion, n is 1 or 2, and COOR.sup.3 is located in an ortho or peri position with respect to the amide linkage, (2) an organic compound having a radiation-dimerizable or radiation-polymerizable olefinic double bond and an amino radical or a quaternary ammonium salt, and (3) an aromatic secondary or tertiary amine compound which is chemically inactive to actinic radiation. This composition has an improved photo-sensitivity or radiation sensitivity and can give highly heat-resistant relief patterns with a good edge sharpness and good mechanical and chemical properties as well as good insulating properties.

Abstract: This invention provides organopolysiloxane materials having cone penetration between about 100 and about 350 (10.sup.-1 mm) and ultimate elongation of at least 100% and having reduced surface tack. This invention provides three methods of obtaining said materials with reduced surface tack. The first method comprises applying to the surface of such material an organic peroxide or a photoinitiator and irradiating the surface with ultraviolet light to further crosslink the surface to reduce or eliminate the tack of the surface. The second method comprises mixing a photoinitiator, such as benzophenone, in an organopolysiloxane fluid, thermally crosslinking the organopolysiloxane fluid to produce the material with the above cone penetration and ultimate elongation then irradiating the surface of the material with ultraviolet light to reduce or eliminate the tack of the surface.