With Silicon-containing Reactant Or Polymer Derived Therefrom Patents (Class 525/487)
  • Patent number: 11472988
    Abstract: Some embodiments of the present disclosure relate to an adhesive formulation comprising a high viscosity silyl modified polymer. In some embodiments, the adhesive formulation may further comprise additional components, such as but not limited to, at least one moisture scavenger, at least one adhesion promoter, at least one catalyst, at least one filler, at least one plasticizer, at least one antioxidant, or any combination thereof. In some embodiments, the adhesive formulation may exclude a low viscosity polymer. In some embodiments, the adhesive formulation may include a low viscosity polymer in no more than a specified amount. At least one method of using the adhesive formulation and at least one roofing system comprising the adhesive formulation are also described herein.
    Type: Grant
    Filed: November 4, 2021
    Date of Patent: October 18, 2022
    Assignee: BMIC LLC
    Inventors: Lingtao Yu, Linlin Xing
  • Patent number: 9850411
    Abstract: The invention relates to the use of an adhesive composition to provide a bonding in a wet environment. The invention also relates to a method for providing a bonding in a wet environment.
    Type: Grant
    Filed: July 5, 2013
    Date of Patent: December 26, 2017
    Assignee: BOSTIK SA
    Inventor: David Goubard
  • Patent number: 8632881
    Abstract: A glass fiber product comprises glass fibers treated with a coating composition comprising a synthetic resin and a mixture of an acetylene glycol or an ethylene oxide-propylene oxide block or random adduct thereof and a polyoxyalkylene alkyl ether having an HLB of 8 to 18 or a sulfur-containing surfactant.
    Type: Grant
    Filed: January 28, 2009
    Date of Patent: January 21, 2014
    Assignee: Nissin Chemical Industry Co., Ltd.
    Inventors: Toru Mizusaki, Shuichiro Shinohara
  • Patent number: 8367771
    Abstract: A composition for producing an organic insulator is provided which comprises an organic-inorganic hybrid material (as defined). The hybrid material shows high solubility in organic solvents and monomers, and superior adhesion to substrates. In addition, the hybrid material displays a high dielectric constant and a high degree of crosslinking. Based on these advantages, the composition comprising the organic-inorganic hybrid material can be utilized during the fabrication of various electronic devices by a wet process. A method for producing the organic insulator while utilizing the composition also is provided, as well as the resulting organic insulator, and an organic thin film transistor which incorporates the resulting insulating layer.
    Type: Grant
    Filed: February 13, 2009
    Date of Patent: February 5, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung Han Shin, Jae Jun Lee, Chang Ju Kim, Sang Yoon Lee
  • Patent number: 8216673
    Abstract: Glass fiber-treating agent which includes: (A) 5-95% by weight of an acetylene glycol or an ethylene oxide and/or a propylene oxide adduct of an acetylene glycol; and (B) 5-95% by weight of a silicone surfactant which may be polyoxyalkylene-modified. The glass fiber-treating agent reduces dynamic and static surface tension and contact angle. The glass fiber-treating agent provides excellent wetting, penetration, and antifoaming properties when glass fibers are treated therewith.
    Type: Grant
    Filed: August 2, 2006
    Date of Patent: July 10, 2012
    Assignees: Nissin Chemical Industry Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Toru Mizusaki, Shuichiro Shinohara, Akira Yamamoto, Masaki Tanaka
  • Patent number: 8093105
    Abstract: An underfill composition is formulated to increase the surface tension thereof for use in capillary underfilling of an integrated circuit die that is coupled to a mounting substrate. A method includes mixing a surface tension-increasing additive with a bulk polymer and a hardener and allowing the underfill composition to flow between the integrated circuit die and the mounting substrate. An article is achieved by the method. The article can be assembled into a computing system.
    Type: Grant
    Filed: May 23, 2011
    Date of Patent: January 10, 2012
    Assignee: Intel Corporation
    Inventors: Rahul N. Manepalli, Saikumar Jayaraman
  • Patent number: 7948090
    Abstract: An underfill composition is formulated to increase the surface tension thereof for use in capillary underfilling of an integrated circuit die that is coupled to a mounting substrate. A method includes mixing a surface tension-increasing additive with a bulk polymer and a hardener and allowing the underfill composition to flow between the integrated circuit die and the mounting substrate. An article is achieved by the method. The article can be assembled into a computing system.
    Type: Grant
    Filed: December 20, 2006
    Date of Patent: May 24, 2011
    Assignee: Intel Corporation
    Inventors: Rahul N. Manepalli, Saikumar Jayaraman
  • Patent number: 7521100
    Abstract: The present invention relates to a sealant for liquid crystals having extremely low contamination nature to a liquid crystal, excellent coatability and bondability to a substrate, long service life and pot life and high adhesive strength. A sealant for liquid crystals of the present invention is characterized by comprising (a) an epoxy resin represented by general formula (1): (wherein a represents an integer of 2 to 4; n represents 0 to 3 (average value); R represents a divalent hydrocarbon group of 2 to 6 carbon atoms; A represents a polyvalent aromatic group; and G represents a glycidyl group, provided that when n is 0, (a) an epoxy resin represented by general formula (1) is a bisphenol S-type.), (b) a thermo-curing agent, (c) and a filler having average particle diameter of not larger than 3 ?m.
    Type: Grant
    Filed: April 6, 2004
    Date of Patent: April 21, 2009
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Masahiro Imaizumi, Toyofumi Asano, Naoyuki Ochi, Masahiro Hirano, Sumio Ichimura, Masaru Kudo, Katsuhiko Oshimi, Masataka Nakanishi, Yasumasa Akatsuka, Eiichi Nishihara, Masayuki Itai
  • Patent number: 7438958
    Abstract: The present invention provides a liquid crystal sealing composition and a liquid crystal display panel excellent in adhesion, moisture permeation resistance and heat resistance and superior for use in a sheet press heating bonding system. The liquid crystal sealing composition comprises (1) an alkoxysilyl group-containing modified epoxy resin obtained by de-alcohol condensation reaction of (a) an epoxy resin having at least one hydroxyl group in one molecule and (b) an alkoxysilyl group-containing compound, (2) a heat latent epoxy curing agent, (3) a filler having an average particle diameter of 0.1 to 10 ?m, and if necessary (4) an epoxy resin having at least 1.2 epoxy groups on average in one molecule, (5) an aprotic solvent having a boiling point in the range of 140 to 220° C., compatible with epoxy resin and inert to an epoxy group, and (6) other additives.
    Type: Grant
    Filed: October 24, 2003
    Date of Patent: October 21, 2008
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Takahisa Miyawaki, Kenichi Yashiro, Kei Nagata
  • Patent number: 7378484
    Abstract: A phenolic resin that increases its toughness by polydimethylsiloxane and a process of preparing the same is provided. Polydimethylsiloxane is added as a coupling agent in a ?-glycidoxypropyltrimethoxysilane-modified phenolic resin to improve the compatibility between polydimethylsiloxane and the phenolic resin. Then, tetraethoxysilane is added to conduct hydrolysis condensation and obtain tougher and thermally stable phenolic resin.
    Type: Grant
    Filed: March 31, 2005
    Date of Patent: May 27, 2008
    Assignee: Chung Shan Institute of Science and Technology
    Inventors: Jeng-Chang Yang, Chen-Chi Martin Ma, Hon-Bin Chen, Chin-Yih Chen
  • Patent number: 7247683
    Abstract: A no flow fluxing underfill having a hardener component comprising a phenolic component and an anhydride component in a molar ratio of phenolic component to anhydride component of between about 0.1:1 and about 2:1; or between about 0.8:1 and about 1.2:1. An underfill preparation method involving blending an epoxy component and a phenolic component, heating the blend, and cooling the blend, prior to incorporation of an anhydride component.
    Type: Grant
    Filed: August 5, 2004
    Date of Patent: July 24, 2007
    Assignee: Fry's Metals, Inc.
    Inventors: James M. Hurley, Mark Wilson, Xiaoyun Ye
  • Patent number: 7112634
    Abstract: A thermosetting resin composition is produced by heat treating a mixture of a polyaddition thermosetting resin, a silicic compound of the formula wherein R is an organic group containing a functional group that causes an addition reaction with the curing agent and R5 and R6 are independently a methyl group or an ethyl group, and water and adding a curing agent of the polyaddition thermosetting resin to the mixture that has undergone heat treatment.
    Type: Grant
    Filed: January 8, 2004
    Date of Patent: September 26, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Yuichi Satsu, Harukazu Nakai, Akio Takahashi, Masao Suzuki, Katsuo Sugawara
  • Patent number: 6797790
    Abstract: The polymeric composition for friction elements comprises a co-polymer between (I) a resin containing phenolic groups and a reticulation agent, and (II) an organopolysiloxane resin containing terminal silanol groups. A part at least of the phenolic groups is bound to the terminal silanol groups. A process of the preparation of the above polymeric composition may comprise the following steps: a) mixing (I) a resin containing the phenolic groups and the reticulation agent, (II) containing the terminal silanol groups, and (III) an epoxy resin or the epoxidisesd organopolysiloxane; b) curing the mixture for a period of time sufficient to complete substantially the reaction between the phenolic groups and the terminal silanol groups, c) post-heating the product obtained under b).
    Type: Grant
    Filed: April 23, 2002
    Date of Patent: September 28, 2004
    Assignee: Nisshinbo Industries, Inc.
    Inventors: Vasilios Kanellopoulos, Isabelle Louis-Joseph-Dogue, Vincent Daniel McGinniss, Duryodhan Mangaraj, Tomoki Tsuchiy Nakamura
  • Patent number: 6790581
    Abstract: A phenolic resin/silicone resin hybrid compound is obtained by effecting hydrolytic condensation of an organooxysilane in the co-presence of a phenolic resin. The hybrid compound is used as the base polymer in a resist for endowing a resist film with excellent adhesion to a metal substrate.
    Type: Grant
    Filed: October 11, 2002
    Date of Patent: September 14, 2004
    Assignee: Shin-Etsu Chemical Company, Limited
    Inventors: Hideto Kato, Tomoyoshi Furihata
  • Publication number: 20040132927
    Abstract: The invention relates to high purity fluoropolymers and processes for making such materials. These polymers are particularly suited for applications in the semiconductor industry. The process comprises removal of unstable polymer end groups by fluorination and removal of heavy metal impurities by extraction with an aqueous acid medium.
    Type: Application
    Filed: December 22, 2003
    Publication date: July 8, 2004
    Applicant: 3M Innovative Properties Company
    Inventors: Thomas J. Blong, Denis Duchesne, Gernot Loehr, Albert Killich, Tilman Zipplies, Ralph Kaulbach, Herbert Strasser
  • Patent number: 6693164
    Abstract: The invention relates to high purity fluoropolymers and processes for making such materials. These polymers are particularly suited for applications in the semiconductor industry. The process comprises removal of unstable polymer end groups by fluorination and removal of heavy metal impurities by extraction with an aqueous acid medium.
    Type: Grant
    Filed: May 23, 2001
    Date of Patent: February 17, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Thomas J. Blong, Denis Duchesne, Gernot Loehr, Albert Killich, Tilman Zipplies, Ralph Kaulbach, Herbert Strasser
  • Patent number: 6528595
    Abstract: A composition useful as a sealant, coating, a potting agent for a printed circuit board, a prepreg or an adhesive comprises a compound (A) wherein all or a part of the oxirane rings in an epoxy compound is replaced with thiirane rings represented by the following formula (1): or compound (A) and compound (B) which contains oxirane rings and no thiirane ring in the molecule, wherein the ratio of oxirane ring/thiirane ring is from 90/10 to 10/90.
    Type: Grant
    Filed: October 6, 2000
    Date of Patent: March 4, 2003
    Assignee: The Yokohama Rubber Co., Ltd.
    Inventors: Masahiro Ikawa, Hiroyuki Okuhira, Keisuke Chino
  • Patent number: 6476174
    Abstract: A process for preparing silica-based organic-inorganic hybrid resin using sol-gel process. Phenol is used as catalyst to reduce the gel time of the sol-gel process and cyclosiloxane is used as modifier to increase the toughness of the resultant inorganic-organic hybrid resin.
    Type: Grant
    Filed: June 15, 2001
    Date of Patent: November 5, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Ming-Shi Lee, Chin-I Lin, Chao-Kang Chang, Ching-Jiuh Kang, Kuei-Lan Peng
  • Patent number: 6441106
    Abstract: The present invention provides a curing agent for epoxy resin containing a siloxane-modified phenol resin (3) obtained by dealcoholization condensation reaction between a phenol resin (1) and a hydrolyzable alkoxysilane (2). The present invention further provides an epoxy resin composition comprising an epoxy resin and the above-mentioned curing agent for epoxy resin. The present invention further provides a method for preparing a siloxane-modified phenol resin (3) characterized by subjecting a phenol resin (1) and a hydrolyzable alkoxysilane (2) to dealcoholization condensation reaction.
    Type: Grant
    Filed: September 12, 2000
    Date of Patent: August 27, 2002
    Assignee: Arakawa Chemical Industries, Ltd.
    Inventors: Hideki Goda, Shoji Takeda
  • Publication number: 20020082328
    Abstract: The present invention relates to a polypropylene resin composition and more particularly, to the polypropylene resin composition comprising a high crystalline polypropylene, an ethylene-&agr;-olefin elastomer, an inorganic filler, an organic peroxide and a crosslinking assistant. This polypropylene resin composition exhibits excellent scratch resistance, rigidity, heat resistance, and impact strength and thus, it can be suitable for automobile interior materials such as glove box, console, center crash pad and the like.
    Type: Application
    Filed: September 28, 2001
    Publication date: June 27, 2002
    Inventors: Young-Hwan Yu, Tae-Won Whang, Young-Bong Song, Hun-Uck Chung
  • Patent number: 6337363
    Abstract: The present invention discloses an epoxy resin composition with a non-halogen, non-phosphorus flame retardant, which comprises (a) 100 parts by weight of an epoxy resin; (b) 40-60 parts by weight of a phenolic novolac hardener; and (c) 5-60 parts by weight of a silica-novolac hybrid resin solution as a flame retardant.
    Type: Grant
    Filed: September 28, 2000
    Date of Patent: January 8, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Ming-Shi Lee, Ching-Jiuh Kang, Kuei-Lan Peng
  • Patent number: 6239212
    Abstract: A curable coating composition is described comprising a carbamate functional material, a crosslinking agent and a hydroxyl functional polysiloxane component. Coatings prepared with this coating composition can be cured and coated with additional coating(s), providing good intercoat adhesion to the subsequent coating.
    Type: Grant
    Filed: October 23, 1998
    Date of Patent: May 29, 2001
    Assignee: BASF Corporation.
    Inventor: Marvin L. Green
  • Patent number: 6210811
    Abstract: An epoxy resin composition comprising an epoxy resin containing 0-10% by weight of a 2-nucleus compound and 50-100% by weight of 3 to 5-nucleus compounds combined and having a dispersity (Mw/Mn) of 1.0-1.7, an inorganic filler, a curing catalyst, and optionally a phenolic resin, and having a Tg of lower than 15° C. in an uncured state is effective in forming a flexible film which is easy to work at room temperature. A laminate film includes a layer of the epoxy resin composition and a protective layer. By sealing a semiconductor chip with the film, there is obtained a semiconductor package having improved heat resistance, improved moisture resistance, low stress property.
    Type: Grant
    Filed: September 24, 1999
    Date of Patent: April 3, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tsuyoshi Honda, Miyuki Wakao, Hisashi Shimizu, Toshio Shiobara
  • Patent number: 6107370
    Abstract: A single pack siliconized epoxy coating has been discovered that requires neither heat nor mixing with a catalytic curing agent immediately prior to application. The coating is comprised of an epoxy resin, a silanol based polydimethylsiloxane, an amine functional silicone polymer, and a distilled fatty nitrile. After homogenous blending of the compound, the composition is stored in air tight containers with a shelf life of over two years.
    Type: Grant
    Filed: January 4, 1999
    Date of Patent: August 22, 2000
    Assignee: Aegis Coating Technologies
    Inventor: John R. Bowlin
  • Patent number: 6077500
    Abstract: Higher generation radially layered copolymeric dendrimers having a hydrophilic poly(amidoamine) or a hydrophilic poly(propyleneimine) interior and a hydrophobic organosilicon exterior are prepared by first reacting a hydrophilic dendrimer having --NH.sub.2 surface groups with an organosilicon compound, and then hydrosilating the resulting copolymeric dendrimer with another organosilicon compound in the presence of a noble metal catalyst. In an alternate embodiment, the radially layered copolymeric dendrimers are prepared by reacting a hydrophilic dendrimer having --NH.sub.2 surface groups directly with an organosilicon dendron or organosilicon hyperbranched polymer.
    Type: Grant
    Filed: March 18, 1999
    Date of Patent: June 20, 2000
    Assignees: Dow Corning Corporation, Dendritech, Incorporated
    Inventors: Petar R. Dvornic, Agnes M. deLeuze-Jallouli, Michael James Owen, Susan Victoria Perz
  • Patent number: 6042910
    Abstract: A polyarylene sulfide resin composition comprising (A) a polyarylene sulfide resin, (B) an aliphatic or saturated cyclic polycarbodiimide resin or a precursor thereof, and preferably (C) reactive silicone compound grains, and (D) a polyethylene naphthalate resin or (E) a filler, which improves excellent properties exhibited by polyarylene sulfide resins, and which is also endowed with an excellent adhesion characteristics to adhesives such as epoxy resins. In addition, a molded article obtained by molding a polyarylene sulfide resin composition endowed with such excellent properties is useful as a container for accommodating an electric component material. Such a molded article may also be used as an electronic component having conductive portions which are totally or partially accommodated in the container, wherein the conductive portions are seled by a sealant encapsulated in the container.
    Type: Grant
    Filed: January 29, 1998
    Date of Patent: March 28, 2000
    Assignee: Idemitsu Petrochemical Co., Ltd.
    Inventors: Satoru Kinouchi, Tomoyoshi Murakami, Shigemasa Suzuki
  • Patent number: 5916944
    Abstract: Disclosed is a method of forming tamper-proof coatings on electronic devices. The method comprises applying a coating of a silica precursor resin and a filler onto the electronic device, wherein the filler is one which reacts in an oxidizing atmosphere to liberate enough heat to damage the electronic device. The coated electronic device is then heated at a temperature sufficient to convert the silica precursor resin to a silica containing ceramic matrix.
    Type: Grant
    Filed: September 29, 1997
    Date of Patent: June 29, 1999
    Assignee: Dow Corning Corporation
    Inventors: Robert Charles Camilletti, Loren Andrew Haluska, Keith Winton Michael
  • Patent number: 5821314
    Abstract: This invention provides a thermosetting composition comprising (A) a compound (A-1) containing an epoxy group or groups and a reactive silicon group or groups as essential functional group components in the same molecule, or a mixture (A-2) of an epoxy group-containing compound and a reactive silicon group-containing compound, and (B) an organotin catalyst, a thermosetting composition comprising (A) a compound (A-3) containing (i) an epoxy group or groups, (ii) a reactive silicon group or groups and (iii) a hydroxyl group or groups and/or a carboxyl group or groups as essential functional group components in the same molecule, or a mixture (A-4) of at least two types of compounds, each compound containing at least one member selected from the class consisting of functional group components (i) to (iii), and all of the functional group components (i) to (iii) being present in said mixture, and (B) an organotin catalyst; and methods of forming a finish coat using these thermosetting compositions.
    Type: Grant
    Filed: December 13, 1996
    Date of Patent: October 13, 1998
    Assignee: Kansai Paint Company, Limited
    Inventors: Satoshi Ikushima, Yasumasa Okumura, Osamu Isozaki, Minoru Tsunoda
  • Patent number: 5739218
    Abstract: Radially layered copoly-dendrimers having unusual surface properties and novel applications have been synthesized and characterized. These are the first copolymeric dendrimers composed of a hydrophilic poly(amidoamine) (PAMAM) interior with hydrophobic organosilicon surfaces. These dendrimers have been prepared by surface modifications of an ethylene diamine core PAMAM dendrimer with (3-acryloxypropyl)methyldimethoxysilane, (3-acryloxypropyl)bis(vinyldimethylsiloxy)methylsilane, (3-acryloxypropyl)tris(trimethylsiloxy)silane, chloromethyltrimethylsilane, and chloromethyldimethylvinylsilane, to varying degrees of surface coverage. The obtained products were characterized by .sup.1 H, .sup.13 C, and .sup.29 Si NMR, and by DSC and TGA. The dendrimers with less completely covered organosilicon surfaces are water soluble, and have considerable surface activity, the best of which lowered the surface tension of water to less than 30 mN/m.
    Type: Grant
    Filed: June 2, 1997
    Date of Patent: April 14, 1998
    Assignees: Dow Corning Corporation, Michigan Molecular Institute
    Inventors: Petar R. Dvornic, Agnes M. deLeuze-Jallouli, Douglas Swanson, Michael James Owen, Susan Victoria Perz
  • Patent number: 5668224
    Abstract: Poly(alkylene dicarboxylate) polymers and copolymers having tetraalkyl- or trialkylammonium ion end groups and methods of synthesis, thereof. The methylene-containing copolymers, in general, adhere to glass and metals, including aluminum, iron, and copper. Poly(methylene-co-ethylene terephthalate) is a clear film useful in the protection of metals or glass from corrosion or scratching. Glass may be bound to glass or to metal using the polymers of the present invention or metal to metal seals may be made.
    Type: Grant
    Filed: November 22, 1994
    Date of Patent: September 16, 1997
    Assignee: Baylor University
    Inventors: A. G. Pinkus, Rajan Hariharan
  • Patent number: 5476884
    Abstract: Disclosed is a semiconductor-encapsulating epoxy resin composition comprising (A) an epoxy resin. (B) a curing agent, and (C) fused silica which has been surface-treated with a silane coupling agent having a secondary amino group. This composition has a good moldability and reliability, and a good solder dipping stability.
    Type: Grant
    Filed: September 28, 1994
    Date of Patent: December 19, 1995
    Assignee: Toray Industries, Inc.
    Inventors: Keiji Kayaba, Yasushi Sawamura, Masayuki Tanaka
  • Patent number: 5432233
    Abstract: The present invention provides a low viscosity curable resin composition and coating composition containing the same which has a decreased solvent content. The coating composition provides a cured film having not only excellent acid resistance but also good weather resistance and mar resistance without an adverse effect to the environment. The curable resin composition comprises (a) a hydroxyl and carboxyl group containing silicone polymer, (b) a carboxyl and carboxylate group containing polymer, and (c) a hydroxyl and epoxy group containing polymer.
    Type: Grant
    Filed: September 9, 1993
    Date of Patent: July 11, 1995
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Seigo Miyazoe, Tsuneyoshi Hisai, Akira Fushimi, Kazuhiko Takeoka, Yoshitaka Okude, Takeo Kurauchi
  • Patent number: 5428057
    Abstract: The present invention relates to a modified epoxy resin, a method for the preparation thereof and an epoxy resin composition using the modified epoxy resin. In particular, it relates to a modified epoxy resin of the general formula (I) which is prepared by incorporating a monomaleimide having a carboxy group useful as a heat resistance-improving agent of a resin composition containing an epoxy resin and maleimides into an epoxy resin, and an epoxy resin composition for sealing a semiconductor element having the improved heat resistance and moldability by the modified epoxy resin. ##STR1## wherein, R represents a hydrogen atom or an alkyl group having from 1 to 10 carbon atoms (C.sub.1 to C.sub.10), andn is 0 to 100, and m is 1 to 100.
    Type: Grant
    Filed: April 30, 1991
    Date of Patent: June 27, 1995
    Assignee: Cheil Industries, Inc.
    Inventors: Whan G. Kim, Tai Y. Nam
  • Patent number: 5409995
    Abstract: A curable composition which comprises (C) a non-polymeric organic curing agent having at least two hydrosilyl groups in a molecule, (D) an organic polymer having at least one alkenyl group in a molecule, and (E) a hydrosilylation catalyst has rapid curability and good depth curability, and gives a homogeneous cured material having good mechanical properties.
    Type: Grant
    Filed: March 8, 1993
    Date of Patent: April 25, 1995
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Takahisa Iwahara, Makoto Chiba, Tomoko Takahara, Kazuya Yonezawa
  • Patent number: 5362775
    Abstract: An epoxy resin composition comprising (i) an epoxy resin, (ii) a phenolic curing agent, (iii) an organophosphorous curing agent, (iv) alumina, and (v) a separating means for separating the organophosphorous curing agent and the alumina, which may be a coating over the surfaces of the organophosphorous curing agent.
    Type: Grant
    Filed: March 24, 1992
    Date of Patent: November 8, 1994
    Assignees: Nippondenso Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Akira Shintai, Hiroshi Shibata, Toshio Shiobara, Koji Futatsumori, Seizi Katayama, Yasutaka Yoshida
  • Patent number: 5354829
    Abstract: A polymeric reaction product is disclosed that is a silylated polyamine-containing polymer having moieties from fatty acid moieties and/or chain extenders as difunctional organo moieties and free amine moieties and hydrolyzed and/or hydrolyzable organofunctional silane moieties and that is at least water dispersible. The reactants that produce this product are a polyamine-containing polymer with fatty acid moieties and free amine moieties and at least one amine-reactable organo functional alkoxysilane or its hydrolysis products. The former reactant results from the reaction of a polyamine-containing polymer with free amine moieties with fatty acids alone or in mixtures with other fatty acids and/or dimer acids. The polymeric reaction product is combined with a predominant amount of water to form a fiber treating formulation that can reside on the surface of one or more treated fibers.
    Type: Grant
    Filed: June 30, 1992
    Date of Patent: October 11, 1994
    Assignee: PPG Industries, Inc.
    Inventors: Robert G. Swisher, Richard P. Beaver, Robert G. Briody, Louis J. Nehmsmann
  • Patent number: 5340851
    Abstract: A thermosetting resin composition contains (A) a mixture of an imide compound having an allyl-free maleimide group and an imide compound having an allyl-containing imide group, (B) an epoxy resin, (C) a phenolic resin, and optionally, (D) an aromatic polymer/organo-polysiloxane copolymer. Component (B) and/or (C) includes a compound containing a naphthalene ring having a double bond conjugated with an aromatic ring. The composition is easily workable and well adhesive and cures to products having improved mechanical strength, hot-water resistance, low thermal expansion, and minimized water absorption.
    Type: Grant
    Filed: February 12, 1993
    Date of Patent: August 23, 1994
    Assignee: Shin-Etsu Chemical Company, Ltd.
    Inventors: Toshio Shiobara, Hisashi Shimizu, Minoru Takei
  • Patent number: 5319005
    Abstract: An epoxy resin molding material for sealing of electronic components comprising(A) an epoxy resin;(B) a phenolic compound;(C) a resin mixture obtained bydispersing, in a form of particulates, in a dispersion medium which is a portion or all of at least one of the epoxy resin and the phenolic compound, a mixture of a vinyl group-containing organopolysiloxane and a .tbd.SiH group-containing organopolysiloxane whose total volatile loss after heating at 105.degree. C. for three hours is not more than 3% by weight, and allowing the vinyl group-containing organopolysiloxane and the .tbd.SiH group-containing organopolysiloxane to react with each other and to cure; and(D) an inorganic filleris excellent in thermal shock resistance, soldering resistance, moisture resistance, thermal stability, moldability and marking properties.
    Type: Grant
    Filed: January 27, 1992
    Date of Patent: June 7, 1994
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Shinsuke Hagiwara, Hiroyuki Kuriya, Shigeki Ichimura
  • Patent number: 5312878
    Abstract: A thermosetting resin composition comprising (A) a naphthalene ring-bearing epoxy resin, (B) a dicyclopentadiene-modified phenolic resin, and (C) an inorganic filler is suitable for encapsulating semiconductor devices since the composition cures into a product having a low coefficient of expansion, good adhesion and low moisture absorption.
    Type: Grant
    Filed: October 1, 1992
    Date of Patent: May 17, 1994
    Assignee: Shin-Etsu Chemical Company, Limited
    Inventors: Toshio Shiobara, Kazutoshi Tomiyoshi, Takayuki Aoki, Hatsuji Shiraishi
  • Patent number: 5306747
    Abstract: An epoxy resin composition for encapsulating a semiconductor device includes a flexibilizer constituted by a pre-reaction product of an epoxy resin and a modified silicone oil having hydroxyphenyl groups, as well as a flexibilizer constituted by a pre-reaction product of a phenol resin and a modified silicone oil having epoxy groups. Furthermore, an epoxy resin is used as a chief material, and a curing agent is added. The epoxy resin composition is heat resistant and moisture resistant, and has a low modulus of elasticity, a low coefficient of expansion, and a high glass transition temperature equivalent to or higher than that of a conventional epoxy resin composition.
    Type: Grant
    Filed: May 29, 1992
    Date of Patent: April 26, 1994
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Hiromi Ito, Ichiro Takahashi
  • Patent number: 5302672
    Abstract: A 1,1-bis(2,7-diglycidyloxy-1-naphthyl)alkane as an epoxy resin; a 1,1-bis(2,7-dihydroxy-1-naphthyl)alkane as an intermediate for said epoxy resin; a process for producing said intermediate comprising reacting 2,7-dihydroxy-1-naphthalene and an aldehyde; a process for producing said epoxy resin comprising reacting said intermediate and an epihalohydrin; and an epoxy resin composition comprising said epoxy resin and a curing agent. The epoxy resin has a low melt viscosity while exhibiting excellent heat resistance.
    Type: Grant
    Filed: February 26, 1992
    Date of Patent: April 12, 1994
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Ichiro Ogura, Shunji Ehara, Taku Kitamura, Hiroshi Sakata
  • Patent number: 5298548
    Abstract: An epoxy resin composition comprising (A) a naphthalene ring-containing epoxy resin, (B) a biphenyl-containing epoxy resin, (C) a specific phenolic resin, and (D) an inorganic filler shows good flow and cures to products having low modulus of elasticity, especially at temperatures above Tg, a low coefficient of expansion, high Tg irrespective of low stresses, and minimized water absorption. Then semiconductor devices encapsulated with the present composition remain highly reliable even after being subject to thermal shocks upon surface mounting.
    Type: Grant
    Filed: May 20, 1992
    Date of Patent: March 29, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shiobara, Takayuki Aoki, Kazutoshi Tomiyoshi, Hisashi Shimizu, Takashi Tsuchiya
  • Patent number: 5266612
    Abstract: An epoxy resin composition for sealing semiconductor elements comprising o-cresol-novolak type epoxy resins, curing agents, curing accelerators, inorganic fillers, plasticizers and imide-epoxy resins having the formula (I) is disclosed. Use of the imide-epoxy resin in an amount of 0.1 to 20.0% by weight improves the heat and moisture resistant properties of the epoxy resin composition. ##STR1## wherein, R.sub.1 and R.sub.2 denote independently H or (CH.sub.2)nCH.sub.3 radical,n denotes 0 or an integer of 1 above.
    Type: Grant
    Filed: January 6, 1993
    Date of Patent: November 30, 1993
    Assignee: Cheil Industries, Inc.
    Inventors: Whan G. Kim, Ji Y. Lee
  • Patent number: 5258139
    Abstract: An adhesive composition comprising (a) an epoxy resin obtained by reacting a 1,3-bis(dicarboxyphenyl)-1,1,3,3-tetrasubustituted disiloxane dianhydride with an alcohol or alcohol derivative, followed by reaction with an epoxy compound having two or more epoxy groups, or an epoxy resin obtained by reacting a 1,3-bis(dicarboxyphenyl)-1,1,3,3-tetrasubstituted disiloxane with an epoxy compound having two or more epoxy groups and (b) a curing agent is suitable for bonding semiconductor chips to a copper frame with a small warpage of the chips.
    Type: Grant
    Filed: April 19, 1991
    Date of Patent: November 2, 1993
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Nobuo Ichimura, Mitsuo Yamazaki, Kohei Fujita, Hidetaka Satou, Yasuo Miyamoto, Masao Kawasumi, Tohru Kikuchi
  • Patent number: 5252686
    Abstract: A novel siloxane polymer having at least 1 mol % of a structural unit derived from a cyclic heat addition product between a diene compound of formula (I) or (II) and an olefin or acetylene compound of formula (III), (IV) or (V): ##STR1## and a positive working light-sensitive composition comprising the siloxane polymer.
    Type: Grant
    Filed: August 28, 1992
    Date of Patent: October 12, 1993
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshiaki Aoai, Kazuyoshi Mizutani
  • Patent number: 5250637
    Abstract: An epoxy resin composition comprising an epoxy resin, a curing agent and an inorganic filler is adapted for semiconductor encapsulation. A fluorinated organic silicon compound is blended in the composition as a coupling agent whereby the composition is improved in adhesion and moisture resistance.
    Type: Grant
    Filed: November 25, 1992
    Date of Patent: October 5, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shiobara, Kazutoshi Tomiyoshi, Yasuo Tarumi, Hiromasa Yamaguchi
  • Patent number: 5234995
    Abstract: New silanes containing at least two oxazolidinic moieties can be defined by means of the general formula: ##STR1## wherein X.sub.1, X.sub.2, X.sub.3 and X.sub.4 have the meaning as reported in the specification, and each one of A.sub.1, A.sub.2 and A.sub.3 represents from 0 to a plurality of siloxane radicals--SiO--and are better defined in the text of the specification.These compounds are useful as crosslinking agents for moisture-hardening systems based on polyisocyanates, of acrylate polymers and of polyepoxides in compositions for coatings, sealants and adhesive agents.
    Type: Grant
    Filed: October 31, 1991
    Date of Patent: August 10, 1993
    Assignee: Enichem Synthesis S.p.A.
    Inventor: Alberto Greco
  • Patent number: 5235005
    Abstract: A curable polyimide resin is blended with (a) an organic silicon compound having a functional group selected from an epoxy group and an amino group or (b) a copolymer of an aromatic polymer and an organic silicon compound. The resulting polyimide resin composition can be cured without inducing a crack. It is suitable for the encapsulation of semiconductor devices as well as for molding and powder coating.
    Type: Grant
    Filed: October 21, 1991
    Date of Patent: August 10, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shiobara, Koji Futatsumori, Shinichi Jingu
  • Patent number: 5206111
    Abstract: A silylated polymeric binder, which is soluble or swellable in alkali, bears a plurality of at least one of aliphatic and aromatic hydroxyl groups, at least a portion of which are derivatized by units of the formulae I and II:[(A--B.sub.n).sub.m C]--[(D.sub.o E.sub.p)BC].sub.u (I)and[(D.sub.o E.sub.p)BC].sub.v (II)which are side chains of the polymeric binder, whereinA denotes a silanyl group containing at least 2 silicon atoms in total linked to each other, but not more than 3 silicon atoms linked to each other in an unbranched chain of silicon atoms;B denotes a bridging group;C denotes a functional group which has formed a covalent bond with an aromatic, aliphatic, or cycloaliphatic hydroxyl group of the binder, the group D, or the group E;D denotes a grafted monohydric or polyhydric aliphatic alcohol;E denotes a grafted monohydric or polyhydric aromatic alcohol;n denotes 0 or 1;m denotes 1 or 2; ando, p, u and v each denote 0 or 1.
    Type: Grant
    Filed: January 10, 1991
    Date of Patent: April 27, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Peter Wilharm, Gerhard Buhr, Juergen Fuchs
  • Patent number: 5190995
    Abstract: Epoxy resin compositions comprising (A) an epoxy resin of formula (1), (B) a curing agent based on a novolak type phenol resin and/or a triphenolalkane resin of formula (2), and (C) an inorganic filler are suitable for encapsulating semiconductor elements because they show good flow behavior upon casting and cure into less stressed products having improved mechanical strength, Tg, and moisture resistance. ##STR1## R.sup.1 is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, OG is ##STR2## m is 0, 1 or 2, n is 1 or 2, and l is 0, 1, 2 or 3.
    Type: Grant
    Filed: January 24, 1991
    Date of Patent: March 2, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shiobara, Kazutoshi Tomiyoshi