Abstract: The invention pertains to a process for the manufacture of a fluoropolymer film, to the fluoropolymer film obtainable therefrom and to use of said fluoropolymer film in electrochemical and photo-electrochemical devices.

Abstract: The present invention pertains to a process for manufacturing a semi-crystalline fluoropolymer, to the fluoropolymer obtainable by said process and to uses of said fluoropolymer in various applications.

Abstract: A composition comprising at least one fluoropolymer and at least one solvent, wherein the solvent comprises a branched, partially fluorinated ether and wherein the partially fluorinated ether corresponds to the formula: CpF2p+1—O—CqH2q+1 wherein q is an integer from 1 to and 5 and p is an integer from 5 to 11; and wherein the fluoropolymer is a copolymer comprising at least 90% by weight (based on the total weight of the polymer, which is 100% by weight) of units derived from tetrafluoroethene (TFE) and one or more perfluorinated alkyl ethers selected from ethers corresponding to the general formula Rf—O—(CF2)n—CF?CF2 wherein n is 1 in which case the ether is an allyl ether, or 0 in which case the ether is a vinyl ether and Rf represents a perfluoroalkyl residue which may be interrupted once or more than once by an oxygen atom. Also provided are methods of preparing the compositions and methods for coating substrate with the compositions.

Abstract: The present invention is a composition comprising (a) a coating base selected from a water-dispersed coating, an epoxy polymer coating, an alkyd coating, a Type I urethane coating, or an unsaturated polyester coating; and (b) a fluorinated ester compound represented by Formula (I): where A is —OH, a C1-C18 alkyl, —CH2COOH, —CH2OH, or (CH2CH2O)a(CH2CH(CH3)O)bH; a and b are 0 to 3; s is 0 to 2; Y is a linear or branched alkylene organic group having r+s+t substitutions; x is 0 or 1; Q is —C(O)O— or —OC(O)—; Z is —(CH2)yS— or —(CH2CH2O)m(CH2CH(CH3)O)n—; y is 2 to 6; m and n are 0 to 6; Rf is a straight or branched perfluoroalkyl group of 2 to 20 carbon atoms; R7 is a straight or branched C4-C30 alkyl; r is 1 to 4; and t is 1 to 5, such that r+s+t is 2 to 6.

Abstract: To provide an ETFE film which is unlikely to wrinkle when stretched and retracted, and a method for producing the same. It is an ethylene-tetrafluoroethylene copolymer film characterized in that the crystallinity obtained by the formula (1) from the peak area S20 in the vicinity of 2?=20°, the peak area S19 in the vicinity of 2?=19° and the peak area S17 in the vicinity of 2?=17° in the diffraction intensity curve obtained by the X-ray diffraction method, is from 55 to 70%, and the proportion of the quasi-crystal layer obtained by the formula (2) is from 10 to 20%: crystallinity (%)=(S19+S2)/(S17+S19+S20)×100??(1) proportion of quasi-crystal layer (%)=S20/(S17+S19++S20)×100??(2).

Abstract: The invention of the present application is a laminate in which thermoplastic polyurethane is used, excellent antifouling and adhesion properties are obtained, and glue residue is minimized. The laminate is provided with a substrate film formed from thermoplastic polyurethane, and an adhesive layer formed on one surface side of the substrate film. The substrate film has a surface layer on the opposite side of the first surface, a mixture of the thermoplastic polyurethane and a curable resin composition being present in the surface layer. The content ratio of the curable resin composition is configured so as to gradually decrease from the surface of the surface layer towards the interior of the substrate film. The curable resin composition contains at least one fluorine compound selected from the group consisting of fluorosilsesquioxane and fluorosilsesquioxane polymers, and a curable resin. The adhesive layer has a surface roughness of 350-750 nm.

Abstract: To provide a copolymer capable of producing a molded article excellent in strength at a high temperature. A copolymer comprising ethylene units, tetrafluoroethylene units and other monomer units, wherein to the sum of ethylene units and tetrafluoroethylene units, the ethylene units are from 49 to 40 mol % and the tetrafluoroethylene units are from 51 to 60 mol %; to all units in the copolymer, other monomer units are from 2.6 to 6.0 mol %; the melting point is at least 230° C.; and the melt flow rate is from 1 to 15 g/10 min.

Abstract: A pressure sensitive adhesive composition is described that comprises a (meth)acrylic polymer comprising polymerized units of (meth)acrylic ester monomer having a Tg less than 0° C. and ethylenically unsaturated monomer comprising a pendent functional group crosslinked with an amine or carboxylic acid group of at least one amino acid. Also described are aqueous pressure sensitive adhesive compositions, adhesive-coated articles, and methods.

Abstract: The invention provides a production method of a polymer compound having a constitutional unit represented by the formula (3-1) and a constitutional unit represented by the formula (3-2), which contains a step of reacting a compound represented by the formula (1) and a compound represented by the formula (2) in the presence of a transition metal complex, a base and an organic solvent having a peroxide amount of 15 ppm by weight or less: wherein Ar1 and Ar2 represent a divalent aromatic hydrocarbon group, a divalent heteroaromatic group, a group represented by the formula (4) or the like; X1 represents a bromine atom or the like; X2 represents —B(OH)2, a borane residue, a borate ester residue or the like; wherein Ar represents a divalent aromatic hydrocarbon group, a divalent heteroaromatic group or the like, Ar? represents an aryl group or a monovalent heteroaromatic group, m represents an integer of 0-2.

Abstract: To provide an adhesive film comprising a polyimide film and a fluorinated resin layer directly laminated, in which blisters (foaming) in an atmosphere corresponding to reflow soldering at high temperature are suppressed, and a flexible metal laminate. An adhesive film having a fluorinated resin layer containing a fluorinated copolymer (A) directly laminated on one side or both sides of a polyimide film, wherein the fluorinated copolymer (A) has a melting point of at least 280° C. and at most 320° C., is melt-moldable, and has at least one type of functional groups selected from the group consisting of a carbonyl group-containing group, a hydroxy group, an epoxy group and an isocyanate group, and the fluorinated resin layer has a thickness of from 1 to 20 ?m.

Abstract: There is provided a substituted bis(trifluorovinyl)benzene compound that is excellent in heat stability and is industrially useful, and a method for producing the same. There are used a substituted bis(trifluorovinyl)benzene compound represented by general formula (1); and a method for producing a substituted bis(trifluorovinyl)benzene compound, comprising the step of reacting in the presence of a catalyst (such as palladium) a bishalobenzene derivative represented by general formula (3) and a compound obtained by reacting 1,1,1,2-tetrafluoroethane, a zinc halide, and an organolithium compound and represented by general formula (4), to thereby obtain a substituted bis(trifluorovinyl)benzene compound represented by general formula (1).

Abstract: A light source device includes a LED package, a container where the LED package is arranged and that is filled with nitrogen gas, and a fluorine-based coating film applied on a surface of the LED package and covering a light exit surface of the LED package. The LED package includes a LED element, a base board on which the LED element is mounted, a peripheral wall portion surrounding the LED element and extending from the base board, sealing resin disposed in an inner space within the peripheral wall portion such that the LED element is sealed with the sealing resin, and the light exit surface that is a surface of the sealing resin surrounded by the peripheral wall portion. Light from the LED element is exited outside the sealing resin through the light exit surface.

Abstract: A crosslinking agent includes a compound represented by the following formula (1). In the formula (1), R1, R2, and R3 are independently a fluorine atom, an alkyl group, a fluoroalkyl group, or a substituted or unsubstituted aryl group, a plurality of R1 are identical or different, a plurality of R2 are identical or different, a plurality of R3 are identical or different, provided that at least one of R1, R2, and R3 is a fluorine atom or a fluorine atom-containing group, m is an integer of from 2 to 6, l is an integer of from 0 to 2, and each hydrogen on the benzene ring(s) is optionally substituted with a substituent.

Abstract: The invention relates to alkenyl(perfluoroalkyl)phosphinic acids, to the preparation and intermediates thereof, to the use thereof as monomers for the preparation of oligomers and/or polymers, to the corresponding oligomers/polymers, to the corresponding support materials comprising the oligomers/polymers, and to the use thereof as ion exchangers, as catalysts or extraction medium and corresponding salts thereof.

Abstract: An optical filter and an imaging device comprising the optical filter are provided. The optical filet comprises: a binder resin; a light absorption containing at least two kinds of light absorbents dispersed in the binder resin; and a near-infrared reflection layer. Further, the light absorbents comprise a first light absorbent having maximum absorption in a wavelength range of 680 to 700 nm and a second light absorbent having maximum absorption in a wavelength range of 700 to 750 nm, a wavelength at which the near-infrared reflection layer has a transmittance of 50% with regard to light incident in a direction perpendicular to the optical filter is in a range of 680 to 730 nm, and the optical filter satisfies [Equation 1] ?E*?1.

Abstract: A fluorinated resin composition includes a copolymer (A); and a copolymer (B). A mass ratio (A/B) of the copolymer (A) to the copolymer (B) is from 60/40 to 99/1, and a volume flow rate is from 0.5 to 100 mm3/sec. The copolymer (A) comprises: units derived from a monomer (a) which is tetrafluoroethylene; units derived from a monomer (b) which is at least one member selected from ethylene, hexafluoropropylene and a perfluoro(alkyl vinyl ether). The copolymer (A) has carbonyl groups. The copolymer (B) comprises: units derived from the monomer (a); units derived from the monomer (b); and units derived from the monomer (c) having two or more polymerizable carbon-carbon double bonds. A content of the units derived from the monomer (c) is from 0.1 to 2 mol % based on total units in the copolymer (B).

Abstract: Provided is a powder coating composition, whereby a cured film excellent in water resistance, chemical resistance and weather resistance, can be formed by single coating operation, wherein a fluorinated resin layer and a polyester layer are layer-separated in the process of melting and curing the powder coating composition. A powder coating composition comprising a fluorinated resin (A), a polyester polymer (B), a curing agent (C) and an ultraviolet absorber (D), wherein the polyester polymer (B) is a polyester polymer comprising units derived from a C8-15 aromatic polybasic carboxylic acid compound and units derived from a C2-10 a polyhydric alcohol compound.

Abstract: The present invention belongs to the field of preparation of high performance polymers, and specifically relates to a low dielectric constant polymer containing dinaphthyl and hexafluorocyclobutyl ether units, and preparation method and use thereof. The polymer is prepared as follows: under the effect of an alkali, 1-naphthol bromotetrafluoroethane ether is prepared from 1-naphthol and tetrafluorodibromoethane in an organic solvent, and then reduced by a zinc powder so as to obtain 1-naphthol trifluorovinyl ether. 1-naphthol trifluorovinyl ether is treated at a high temperature to obtain a bisnaphthol hexafluorocyclobutyl ether monomer. The monomer is subjected to oxidative coupling in the presence of ferric trichloride so as to obtain a thermal polymer containing dinaphthyl and hexafluorocyclobutyl structural units with a good film-forming property, and in a nitrogen atmosphere, the temperature for 5% weight loss (Td5%) of the obtained film is 437° C., and the carbon residue yield at 1000° C. is 54.24%.

Abstract: Described herein is a composition comprising a partially fluorinated compound selected from the group consisting of: (a) I(CF2)xCH2CF2I; (b) ICF2CH2(CF2)xCH2CF2I; (c) I(CF2)yCH?CF2; (d) CF2?CH(CF2)yCH2CF2I; and (e) CF2?CH(CF2)yCH?CF2 wherein x is an odd integer selected from 3 to 11, and y is an integer greater than 2, along with methods of making and polymerizing such compounds.

Abstract: A fumaric acid diester based resin containing a dipropyl fumarate residue unit and a fumaric acid diester residue unit having a C1 or C2 alkyl group, wherein in a retardation film composed of the resin, when a refractive index in the fast axis direction within the film plane is designated as nx, a refractive index in the film in-plane direction orthogonal thereto is designated as ny, and a refractive index in the thickness direction of the film is designated as nz, the respective refractive indices are satisfied with a relationship of (nx?ny<nz) and a relationship between a film thickness and an out-of-plane retardation measured at a wavelength of 550 nm and expressed by the specific equation is 4.5 nm/film thickness (?m) or more in terms of an absolute value.

Abstract: A core/shell particle is provided, comprising: a water-absorbent, dye-fixing polymeric core, comprising: (a) a multivalent cation and a polymerization product of a monoethylenically unsaturated carbonyl-group containing monomer; (b) a nitrogen-containing polymer; or (c) a combination of (a) and (b); and a water-insoluble, porous polymeric shell, surrounding all or a portion of said core. A paper sizing or coating composition which incorporates the core/shell particles is provided. Recording sheets which include the composition, methods of making the composition and recording sheets, and methods for making an image are provided.

Abstract: A negative resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R4—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition exhibits a high resolution due to controlled acid diffusion and forms a resist film which is unsusceptible to swell in the developer and hence to pattern collapse.

Abstract: Provided is a method for producing a polymer compound that has very low contents of impurities such as metal components and exhibits excellent storage stability. The production method gives such a polymer compound. The polymer compound is incorporated into a photoresist resin composition. The method for producing a polymer compound includes the step of filtering a resin solution containing a polymer compound through a filter. The filter is approximately devoid of strongly acidic cation-exchange groups and develops a positive zeta potential. The polymer compound includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) includes at least one monomer units represented by Formulae (a1) to (a3). The monomer unit (b) contains a group capable of releasing a moiety thereof by the action of an acid to develop solubility in an alkali.

Abstract: An ion conducting membrane for fuel cells involves coupling a compound having a sulfonic acid group with a polymeric backbone. Each of the compounds having a sulfonic acid group and the polymeric backbone are first functionalized with a halogen.

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.

Abstract: A process of synthesizing poly(2,3,3,3-tetrafluoropropene), comprising reacting 2,3,3,3-tetrafluoropropene monomers in a reaction medium in the presence of an initiator, wherein the initiator is added to the reaction medium in multiple portions at different times during the process.

Abstract: There is provided a curable fluorine-containing polymer composition which is rapidly cured at relatively low temperature by hydrosilylation reaction to form a coating film having not only high hardness and flexibility but also water- and oil-repellency, thereby giving stain-proofing effect for a long period of time, especially maintaining property of removing and wiping-off stain.

Abstract: A compound represented by the following formula (a): CH2?CR1—CONJ-CGR2—(CH2)n—COO-Q1-Rf1??(a) is provided. This compound is capable of forming a polymer having an oil repellency equivalent to polymers containing a polyfluoroalkyl group containing at least 8 carbon atoms, although the polyfluoroalkyl group contains up to 6 carbon atoms. In the formula, R1 is hydrogen atom or methyl group, R2 is hydrogen atom or a group represented by —(CH2)m—COO-Q2-Rf2 (r), n and m are independently an integer of 0 to 4, Rf1 and Rf2 are independently a polyfluoroalkyl group or a polyfluoroether group containing 1 to 6 carbon atoms, Q1 and Q2 are independently single bond or a divalent linkage group, J is hydrogen atom or an alkyl group containing 1 to 3 carbon atoms, and G is hydrogen atom or an alkyl group containing 1 to 3 carbon atoms.

Abstract: Disclosed is a water and oil resistant agent comprising a fluorine-containing copolymer obtained by copolymerizing a (meth)acrylate monomer having a polyfluoroalkyl group having 1 to 6 carbon atoms, the agent being able to afford a superior water and oil resistance to a paper. The invention also discloses a composition comprising the water and oil resistant agent, a process for treating a paper thereby and a treated paper thereby.

Abstract: The present disclosure describes fluoropolymers having long chain branches and methods of making these fluoropolymers. These fluoropolymers may have improved melt processing properties. Shaped articles containing these fluoropolymers are also provided.

Abstract: The invention provides a compound which is useful in production of a fluoropolymer and easy to be removed from the produced fluoropolymer, a method of producing the compound, and a method of producing a fluoropolymer using the compound. The invention provides a compound which is represented by Rf1—CH2O—CF2—CHF—Rf2—X, wherein Rf1 represents a fluoroalkyl group containing 1 to 5 carbon atoms, Rf2 represents a fluoroalkylene group containing 1 to 3 carbon atoms, X represents —COOM or —SO3M, and M represents one of H, K, Na, and NH4.

Abstract: A block copolymer comprising a methoxyethyl methacrylate (MOEMA) midblock is provided for forming a coating a medical device for controlled release of a bioactive agent.

Abstract: A polymeric or oligomeric composition comprising at least one first divalent unit represented by formula: and at least one of a second divalent unit comprising a pendant phosphonate group —P(O)(OY)2 or a monovalent unit comprising a thioether linkage and a terminal Z group, wherein each Z group is independently —P(O)(OY)2 or —O—P(O)(OY)2. Rf is a perfluoropolyether group. Q is a bond, —C(O)—N(R1)—, or —C(O)—O—. R?, R??, R and R1 are each independently hydrogen and alkyl having from 1 to 4 carbon atoms. X is alkylene, arylalkylene, and alkylarylene, wherein alkylene, arylalkylene, and alkylarylene are each optionally interrupted by at least one ether linkage. Y is hydrogen, alkyl, trialkylsilyl, and a counter cation. Methods of treating a surface using these compositions and articles with a surface in contact with these compositions are provided. Methods of making these compositions are also provided.

Abstract: The present invention relates to the polymerization and copolymerization of monomers in the presence of fluorinated propylene solvents. More particularly, the present invention relates to the use of polymerization mediums suitable to polymerize one or more monomers to form polymers and/or copolymers, with a tetrafluoropolypropylene being used as a solvent or diluent for the one or more monomers.

Abstract: To provide a copolymer which can impart sufficient dynamic water repellency, after air-drying water repellency and friction durability to a surface of an article, and which has low impact on the environment, a method for producing the same, a water repellent composition and an article excellent in dynamic water repellency, after air-drying water repellency and friction durability.

Abstract: There is provided a perfluoroelastomer composition having a low glass transition temperature and excellent cold resistance and heat resistance and comprising a perfluoroelastomer comprising a tetrafluoroethylene unit (a), a perfluoro vinyl ether unit (b) and a cure site unit (c) having nitrile group, carboxyl group and/or alkoxycarbonyl group as a cure site, wherein the perfluoro vinyl ether unit (b) is contained in an amount of 8 to 23% by mole in the perfluoroelastomer.

Abstract: A fluorinated elastic copolymer which has iodine atoms, bromine atoms, or both iodine and bromine atoms, at its molecular terminals and which includes repeating units (a) based on tetrafluoroethylene, repeating units (b) based on a fluorinated monomer having one polymerizable unsaturated bond (provided that tetrafluoroethylene is excluded), and repeating units (c) based on a fluorinated monomer having at least two polymerizable unsaturated bonds, wherein the ratio (molar ratio) of the repeating units (a) to the repeating units (b) is (a)/(b)=40/60 to 90/10, and the proportion of the repeating units (c) based on the total amount of the repeating units (a) and the repeating units (b) is from 0.01 to 1 mol %.

Abstract: A method for the preparation of a fluoropolymer by means of emulsion polymerization of a reaction mixture in an aqueous medium is disclosed wherein the reaction mixture includes a fluoromonomer having the structure of wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, and wherein R is each independently a substituent on the styrenic ring, n is an integer from 0 to 5 representing the number of the substituents on the styrenic ring; b) an emulsion stabilizer combination comprising: i) an anionic surfactant; and, ii) a cationic surfactant or a non-ionic surfactant; and, c) a free-radical initiator.

Abstract: The invention at hand concerns hydrophobic polymer surfaces, in particular superhydrophobic polymer surfaces, comprising at least one homo- or copolymer, which comprises at least one side chain with at least one fluoro-substituted aryl group. Furthermore, the invention at hand concerns a method for the production of polymer surfaces of this type, their use and polymers of the general formula I: wherein n is an integer between 10 and 4,500, preferably between 20 and 2,200 and particularly preferably between 100 and 670.

Abstract: The invention provides a method for inhibiting bacterial attachment to a surface, the method comprising forming the surface from a polymer, or applying a polymer to the surface, wherein the polymer is a homopolymer formed from a (meth) acrylate or (meth) acrylamide monomer or a copolymer formed from one or more (meth) acrylate or (meth) acrylamide monomers, wherein the (meth) acrylate or (meth) acrylamide monomers are of formula (I) or (II): [H2C?CR?—C(?O)—O—]nR??(I) [H2C?CR?—C(?O)—NH—]nR??(II) wherein n is 1, 2 or 3, R? is independently H or CH3, R is an organic group having a total of from 2 to 24 carbon atoms, wherein the organic group includes an aliphatic or aromatic hydrocarbon moiety and wherein the organic group does not include any hydroxyl groups.

Abstract: A resin composition including an aromatic polyether ketone resin (I), and a fluororesin (II), the fluororesin (II) being a copolymer of tetrafluoroethylene and a perfluoroethylenic unsaturated compound represented by the following formula (I): CF2?CF—Rf1??(1) wherein Rf1 represents —CF3 or—ORf2, and Rf2 represents a C1 to C5 perfluoroalkyl group; the composition containing the aromatic polyether ketone resin (I) and the fluororesin (II) at a mass ratio (I):(II) of 95:5 to 50:50; the fluororesin (II) being dispersed as particles in the aromatic polyether ketone resin (I) and having an average dispersed particle size of 3.0 ?m or smaller.

Abstract: A fluorine-containing polymer has a repeating unit of the general formula (2) and is produced by homopolymerization or copolymerization with another polymerizable double bond-containing monomer. In general formula (2), W represents a linking group; R1 each independently represents a perfluoroalkyl group; Q represents a unit structure formed by cleavage of a double bond of a polymerizable double bond-containing group; and M+ represents a hydrogen cation, a metal ion or a quaternary ammonium ion.

Abstract: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 are a monovalent hydrocarbon group, R4 to R9 are hydrogen or a monovalent hydrocarbon group, R10 is a monovalent hydrocarbon group or fluorinated hydrocarbon group, A1 is a divalent hydrocarbon group, k1 is 0 or 1, and n1A is 0, 1 or 2. A resist composition comprising the polymer displays a high dissolution contrast during organic solvent development.

Abstract: The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.

Abstract: A polymer comprising recurring units (a) of styrene having an HFA group and an ester group adjacent thereto and recurring units (b) having a hydroxyl group is used as base resin to formulate a negative resist composition. The negative resist composition has a high dissolution contrast in alkaline developer, high sensitivity, high resolution, good pattern profile after exposure, and a suppressed acid diffusion rate.

Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.

Abstract: A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represents a (n+1) valent linking group. Each Q independently represents a group that includes an alkali-dissociable group.

Abstract: Disclosed therein are an acrylate compound having a photoreactive group, a photoreactive acrylate polymer, and a photo-alignment layer comprising the same that not only have excellences in alignment properties and alignment rate and readiness for change in the alignment direction based on the polarization direction of radiation but also exhibit a high solubility to organic solvents and good workability.

Abstract: To provide a fluorinated compound having an RF group with at most 6 carbon atoms, whereby a fluorinated polymer having a highly durable water/oil repellency can be produced, and an environmental load is little, and a fluorinated polymer and a fluorinated copolymer having a highly durable water/oil repellency and presenting little environmental load, obtainable by polymerizing such a fluorinated compound. A fluorinated compound represented by the following formula (I) and its polymer: CH2?C(M)COO(CH2)nPhCOO(CH2)mCrF2r+1??(I) (in the formula (I), M is a hydrogen atom, a methyl group or a halogen atom, n is an integer of from 0 to 2, Ph is a phenylene group, m is an integer of from 1 to 4, and r is an integer of from 1 to 6).

Abstract: Blended release materials including a blend of a fluoro-functional silicone release polymer and a fluoropolymer are described. Exemplary fluoropolymers include fluoroolefin-based polymers and linear fluoropolymers including linear fluoroacryaltes. Articles including such release materials such as release liners, and adhesive articles, including silicone adhesive articles, are also described.