Abstract: A composition comprises a distribution of telomers of ethylene and at least one fluoroalkyl or perfluoroalkyl halide, the telomers comprising at least one polymethylene segment (—(CH2)n—) and at least one halomethyl group (—CXH2) and optionally comprising at least one non-fluorine heteroatom, and the halogen being selected from iodine and bromine; wherein the distribution has a number average ratio of methylene moieties of the polymethylene segment to the halomethyl groups of at least about 15.

Abstract: Provided is a novel fluorinated compound, a fluoropolymer, and a method for producing the compound. A monomer of the compound has a formula F2?CFCF2C(X)(C(O)OZ)(CH2)nCR?CHR, wherein X is a hydrogen atom, a cyano group, or a group of formula —C(O)OZ; Z is a hydrogen atom or a C1-20 monovalent organic group, n is 0, 1, or 2; and R is a hydrogen atom or a C1-20 monovalent organic group.

Abstract: The present invention relates to a photoreactive norbornene polymer comprising a photoreactive norbornene monomer, a process for preparing the same, and an alignment layer using the same. The photoreactive norbornene polymer includes a photoreactive functional group having a halogen, in particular, a fluorine substituent group so that it gives a compositional gradient in the alignment layer to improve an orientation rate, an orientation, and an adhesion property.

Abstract: Improved expanded PTFE materials and improved gasket materials made therefrom, the gaskets being capable of forming a seal with greater bolt load retention than is possible with existing PTFE gaskets. The expanded PTFE membranes of the invention can be tailored to exhibit a matrix tensile strength in at least one direction of at least 25,000 psi, a matrix tensile strength ratio in two orthogonal directions of between 0.25 and 4, an orientation index of 50° or less, and a density of 2.0 g/cc or less. The improved gaskets exhibit improved mechanical properties such as high bolt load retention, low creep, high tensile strength, low stress to seal and high crystallinity index.

Abstract: Fluoropolymer foams are prepared by mixing fluoropolymer resin with blowing agents and additives to produce foamable compounds at temperatures below the activation temperature of the blowing agent. The compounded material is expanded at temperatures above both the softening point of the fluoropolymer resin and the activation temperature of the blowing agent. The resulting fluoropolymer foam can be fabricated into any desired shape, such as pipes, sheets, tapes, blocks and rods, using techniques such as cutting, welding, thermoforming and adhesive bonding. Alternatively the fluoropolymer compound may be expanded directly into the desired shape, for example, by expanding the compound in a mold.

Abstract: Disclosed herein is a method to produce a semi-crystalline fluoro-polymer film. A semi-crystalline fluoro-polymer material is used. The material is compressed to produce the film. During compression, the material is maintained at a temperature below the melting point of the material. The compression step can be cycled to allow cooling of the material between compression stages. Alternative methods are provided for compressing the material with a co-extrusion substrate, extruding the material and utilizing mandrel expansion for the material.

Abstract: To provide a fluorinated compound having an RF group with at most 6 carbon atoms, whereby a fluorinated polymer having a highly durable water/oil repellency can be produced, and an environmental load is little, and a fluorinated polymer and a fluorinated copolymer having a highly durable water/oil repellency and presenting little environmental load, obtainable by polymerizing such a fluorinated compound. A fluorinated compound represented by the following formula (I) and its polymer: CH2?C(M)COO(CH2)nPhCOO(CH2)mCF2r+1??(I) (in the formula (I), M is a hydrogen atom, a methyl group or a halogen atom, n is an integer of from 0 to 2, Ph is a phenylene group, m is an integer of from 1 to 4, and r is an integer of from 1 to 6).

Abstract: A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.

Abstract: The present invention provides a fluoropolymer capable of giving fluorine-containing molded materials and laminates excellent in moldability, productivity, interlaminar bonding and stress cracking resistance, in particular stress cracking resistance upon contacting with various liquid chemicals, without impairing such characteristics intrinsic in fluororesins as chemical resistance, solvent resistance, weathering resistance, antifouling properties, liquid chemical impermeability and nonstickiness. The present invention provides a fluoropolymer which is an oligomer-containing or oligomer-free fluoropolymer, wherein said oligomer has a molecular weight not higher than 10,000 and amounts to not more than 0.05% by mass relative to the fluoropolymer.

Abstract: Embodiments in accordance with the present invention provide polymers for forming layers/films useful in the manufacture of a variety of types of optoelectronic displays. Such embodiments also provide compositions of such polymers for forming such layers/films where the formed layers/films have high transparency over the visible light spectrum.

Abstract: The present invention provides prepolymers based on poly(alkyl ethers) having terminal trifluorovinyl aromatic containing groups and polymers produced from such prepolymers. The prepolymers and polymers are useful as biomedical devices such as contact lenses or intraocular lenses.

Abstract: A polymerizable compound represented by general formula (1): wherein Z1 and Z2 each represent a (meth)acryloyloxy group; X1 and X2 each independently represent a single bond, an optionally branched alkylene group having 1 to 8 carbon atoms, an ether linkage, —COO—, —OCO—, —OCOO—, a 6-membered ring optionally having a substituent, or a combination thereof; R1 represents —R?, —OR?, —CO—R?, or —OCO—R?; R? represents a halogen atom, an optionally branched alkyl group having 1 to 8 carbon atoms, or a 6-membered ring optionally having a substituent, L1 and L2 each independently represent a member selected from a single bond, —CH2CH2—, —CH?CH—, —C?C—, —CH2O—, —OCH2—, —COO—, and —OCO—; m represents an integer of 1 to 4; and the R1's may be the same or different.

Abstract: Disclosed is a fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.

Abstract: The invention relates to copolymers of vinyl lactams with derivatized maleates. In particular, it relates to copolymers that are suitably used in the area of personal care and pharmaceuticals, to compositions comprising the copolymers and to methods for preparing the copolymers.

Abstract: The present invention provides copolymer having repeating units based on polyoxyalkylene radicals, polysiloxane radicals and perfluorocyclobutane radicals. The copolymers are useful as biomedical devices such as contact lenses or intraocular lenses.

Abstract: The invention relates to novel ethylene copolymers comprising 10-60% polyethylenglycol (meth)acrylate monomers and 40-90% substantially cationic monomer. Compositions, in particular cosmetic or pharmaceutical compositions, containing the inventive copolymers and a cosmetic treatment method using said copolymers are also disclosed.

Abstract: A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group.

Abstract: The invention relates to compounds represented by Formula (1): wherein Ra is independently halogen, cyano, —CF3, —CF2H, —CFH2, —OCF3, —OCF2H, —N?C?O, —N?C?S or alkyl having a carbon number of approximately 1 to approximately 20; in the alkyl, optional —CH2— may be substituted with —O—, —S—, —SO2—, —CO—, —COO—, —OCO—, —CH?CH—, —CF?CF— or —C?C—, and optional hydrogen may be substituted with halogen; Rb is fluorine or —CF3; A is independently 1,4-cyclohexylene, 1,4-cyclohexenylene, 1,4-phenylene, naphthalene-2,6-diyl, tetrahydronaphthalene-2,6-diyl, fluorene-2,7-diyl or bicyclo[2.2.

Abstract: A solvent-free photocurable resin composition is provided which can be applied to the surface of optical discs or the like to form a highly transparent protective film that can stably adhere to the surface and effectively protect the surface from scratches. The solvent-free photocurable resin composition contains a urethane(meth)acrylate oligomer, a trifunctional (meth)acrylic acid ester monomer, a photopolymerization initiator, and a dilution monomer. The dilution monomer contains a fluorine-based (meth)acrylic acid ester monomer having three or more fluorine atoms and a monofunctional or difunctional (meth)acrylic acid ester monomer in amounts of from 10 to 40 wt% and from 10 to 30 wt%, respectively.

Abstract: A water/oil repellent composition which imparts sufficient dynamic water repellency and post-air-drying water repellency to a surface of an article and has a low environmental impact; a method for producing the composition; and a method of treating an article. The water/oil repellent composition contains: a copolymer which has a mass average molecular weight of at least 40,000 and includes structural units based on monomer (a), monomer (b), and monomer (c); and a medium. Monomer (a) is a compound represented by (Z—Y)nX, wherein Z is a C1-6 polyfluoroalkyl group, Y is a bivalent organic group, n is 1 or 2, and X is a polymerizable unsaturated group. Monomer (b) is an olefin, a homopolymer of which has a glass transition temperature of at most 50° C. Monomer (c) is a (meth)acrylate having no polyfluoroalkyl group and having a C12-30 alkyl group.

Abstract: A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.

Abstract: The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.

Abstract: Improved expanded PTFE materials and improved gasket materials made therefrom, the gaskets being capable of forming a seal with greater bolt load retention than is possible with existing PTFE gaskets. The expanded PTFE membranes of the invention can be tailored to exhibit a matrix tensile strength in at least one direction of at least 25,000 psi, a matrix tensile strength ratio in two orthogonal directions of between 0.25 and 4, an orientation index of 50° or less, and a density of 2.0 g/cc or less. The improved gaskets exhibit improved mechanical properties such as high bolt load retention, low creep, high tensile strength, low stress to seal and high crystallinity index.

Abstract: A process for making an aqueous dispersion of fluoropolymer particles by providing dispersed particulate of fluorinated ionomer in an aqueous polymerization medium and polymerizing at least one fluorinated monomer in the aqueous polymerization medium in the presence of the dispersed particulate of fluorinated ionomer and initiator to form the aqueous dispersion of particles of fluoropolymer.

Abstract: A fluorinated ester monomer is provided having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 are H or a monovalent hydrocarbon group, or R2 and R3 forms a hydrocarbon ring, R4 is a monovalent hydrocarbon group, and k is 0 or 1. A polymer obtained from the monomer has transparency to radiation with a wavelength of up to 200 nm and appropriate alkaline hydrolysis, is constructed such that any of water repellency, water slip and surface segregation may be adjusted by a choice of its structure, and is useful in forming ArF immersion lithography materials.

Abstract: [Problem] To reduce the time required for a film to exhibit decreased hydrophobicity after liquid immersion lithography while allowing the surface of a film to exhibit high hydrophobicity during liquid immersion lithography. [Solution] A radiation-sensitive resin composition including (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of the following formulas (1-1) to (1-3).

Abstract: Fluoroalcohol compounds of formula (1) are useful in producing polymers which are used as the base resin to formulate radiation-sensitive resist compositions having transparency to radiation having a wavelength of up to 500 nm and improved development characteristics. R1 is hydrogen or a monovalent C1-C20 hydrocarbon group in which any constituent —CH2— moiety may be replaced by —O— or —C(?O)—, Aa is a (k1+1)-valent C1-C20 hydrocarbon or fluorinated hydrocarbon group, and k1 is 1, 2 or 3.

Abstract: A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R8 represents a substituted or unsubstituted alkyl group or the like; and W1 represents a single bond, a substituted or unsubstituted methylene group or the like.

Abstract: The purpose of the present invention is to provide an organic silicon compound which has a vinyl group more reactive than those of the conventional organic silicon compounds and can be bonded with another compound. The present organic silicon compound is represented by the following formula (1), wherein R1 is, independently of each other, a vinyl group or an alkyl group having 1 to 4 carbon atoms, R2 is an alkylene group having 3 to 6 carbon atoms, and R3 is, independently of each other, a hydrogen atom or an alkyl group having 1 to 4 carbon atoms and optionally substituted with one or more fluorine atoms.

Abstract: The present invention provides a fluoropolymer capable of giving fluorine-containing molded materials and laminates excellent in moldability, productivity, interlaminar bonding and stress cracking resistance, in particular stress cracking resistance upon contacting with various liquid chemicals, without impairing such characteristics intrinsic in fluororesins as chemical resistance, solvent resistance, weathering resistance, antifouling properties, liquid chemical impermeability and nonstickiness. The present invention provides a fluoropolymer which is an oligomer-containing or oligomer-free fluoropolymer, wherein said oligomer has a molecular weight not higher than 10,000 and amounts to not more than 0.05% by mass relative to the fluoropolymer.

Abstract: A composition which provides surface effects to substrates comprising a polymer containing at least one urea linkage prepared by (i) reacting (1) at least one organic diioscyanate, polyisocyanate, or mixture thereof, and (2) at least one fluorochemical compound of Formula I Rf—O(CF2CF2)r(CH2CH2)q(R1)sXH??Formula (I) wherein Rf is a linear or branched C1 to C7 perfluoroalkyl optionally interrupted by one to three oxygen atoms, r is 1 to 3, q is 1 to 3, s is 0 or 1, X is O, S, or NR2 wherein R2 is H, or C1 to C6 alkyl, and R1 is a divalent radical selected from —S(CH2)n—, p is 1 to 50, and R3, R4 and R5 are each independently H or C1 to C6 alkyl; (ii) and then reacting with (3) water, a linking agent, or a mixture thereof.

Abstract: The invention provides a fluoropolymer coated film comprising: a polymeric substrate film; and a fluoropolymer coating on the polymeric substrate film, the fluoropolymer coating comprising a vinyl fluoride copolymer comprised of about 40 to about 90 mole % of repeat units derived from vinyl fluoride and about 10 to about 60 mole % of repeat units derived from monomer selected from the group consisting of (a) and (b) below and mixtures thereof, with the proviso that about 0.

Abstract: The present invention relates to a method for the polymerization of fluoromonomers using non-fluorinated alkyl phosphonate surfactants, and to the fluoropolymers formed thereby. Specifically, the method of the polymerization uses one or more alkyl phosphonic acids or salts thereof.

Abstract: A crosslinkable fluorine-containing compound, which is an adduct compound having a crosslinkable group, wherein the adduct compound is an adduct of a fluorine-containing compound having, per molecule, 2 or more terminal fluorine-containing vinyl groups each directly bonded to an oxygen atom, and a compound having 2 or more groups represented by —XH, where X represents an oxygen atom or a sulfur atom.

Abstract: A process comprising polymerizing tetrafluoroethylene in an aqueous emulsion in the presence of a non-telogenic surfactant having an anionic portion with the general formula (I): Rf—O-L-CO2—??(I) wherein Rf is selected from a partially fluorinated alkyl group, a perfluorinated alkyl group, a partially fluorinated alkyl group interrupted by one or more oxygen atoms, and a perfluorinated alkyl group interrupted by one or more oxygen atoms, wherein Rf has from 1 to 10 carbon atoms; and L is an alkylene group having the general formula (CX2)n wherein each X is independently selected from Rf, fluorine, and hydrogen and n is selected from 1 to 5, with the proviso that the surfactant contains at least one unit selected from a —CH2— unit and a —CHF— unit. Also provided are aqueous dispersions comprising these surfactants and methods of coating substrates with the aqueous dispersions.

Abstract: The present invention relates to a fluorine-containing cyclic compound of formula (5): wherein R2-R4 and R9-R15 are independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group, and may contain fluorine atom, oxygen atom, sulfur atom, or nitrogen atom. R10 and R11, R12 and R13, or R14 and R15 may be bonded together to form a ring. In such a case, it is a C1-C25 alkylene group that may contain a hetero atom such as oxygen, sulfur and nitrogen, “a” is 0 or 1, “b” is an integer of 0-2 and “c” is an integer of 0-2.

Abstract: A radiation-sensitive resin composition includes (A) a polymer that includes a structural unit (I) including a group shown by the following formula (i), (B) a photoacid generator, and (C) a polymer that has a fluorine atom content lower than that of the polymer (A), and includes an acid-labile group. The polymer (A) preferably includes a structural unit shown by the following formula (1) as the structural unit (I). It is preferable that X in the formula (1) represent a divalent or trivalent chain-like hydrocarbon group or alicyclic hydrocarbon group.

Abstract: A radiation-sensitive resin composition includes (A) a fluorine-containing compound that includes a group shown by the following formula (1), and (B) a photoacid generator. wherein RC represents a (p+1)-valent aromatic ring group, Q represents a linking group obtained by removing one hydrogen atom from a monovalent hydrophilic group, RE represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms, p is an integer from 1 to 5, provided that a plurality of Q and a plurality of RE may respectively be either the same or different when p is an integer from 2 to 5, and “*” indicates a bonding hand.

Abstract: The present invention provides an ink composition containing (A) a polymer compound having (a-1) a photoradical generation site and (a-2) at least one segregation site selected from a fluoroalkyl group, a siloxane structure, and a long-chain alkyl group, (B) a radical-polymerizable compound, and (C) a photoradical generator having a structure different from that of (A).

Abstract: The present invention provides a liquid crystal display device capable of reducing the probability of image sticking. The liquid crystal display device includes a pair of substrates and a liquid crystal layer between the substrates. At least one of the substrates includes an alignment film and a polymer layer on the alignment film. The polymer layer includes monomer units derived from at least two species of polymerizable monomers. The at least two species of polymerizable monomers include at least two species of monomers selected from the group consisting of: specific polyfunctional monomers and specific monofunctional monomers.

Abstract: A polymer for forming a resist protection film which is used in a liquid immersion lithography process to protect a photoresist layer, a composition for forming a resist protection film, and a method of forming a pattern of a semiconductor device using the composition are disclosed. The polymer for forming a resist protection film includes a repeating unit represented by Formula 1 below. In Formula 1, R1 is a hydrogen atom (H), a fluorine atom (F), a methyl group (—CH3), a C1-C20 fluoroalkyl group, or a C1-C5 hydroxyalkyl group, R2 is a C1-C10 linear or branched alkylene group or alkylidene group, or a C5-C10 cycloalkylene group or cycloalkylidene group, X is wherein n is an integer of 0 to 5 and * denotes the remaining moiety of Formula 1 after excluding X, and m, the stoichiometric coefficient of X, is 1 or 2.

Abstract: The present invention is directed to methods for assessing the purity of carbon nanotube (CNT) compositions, specifically, a method for assessing the presence of contaminants in a CNT composition using polyaryl ethynyl (PAE) conjugate polymer as an indicator material. Additionally, compositions and kits comprising a polyaryl ethynyl (PAE) conjugate polymer are also provided.

Abstract: A method of producing a fluoropolymer by which a melt-processable fluoropolymer (A) having a specific unstable terminal group or groups (P) is subjected to melt-kneading in a kneader having a stabilization treatment zone to thereby produce a fluoro-polymer (B) resulting from conversion of the specific unstable terminal group or groups (P) to —CF2H. The specific unstable terminal group or groups (P) include alkoxycarbonyl groups, fluoroalkoxycarbonyl groups and/or carboxyl group quaternary nitrogen compound salts, the melt-kneading is carried out in the absence or presence of an alkali metal element or alkaline earth metal element, the content of the alkali metal element or alkaline earth metal element is not greater than 2 ppm of the composition under melt-kneading, and the melt-kneading in the stabilization treatment zone is carried out in the presence of water. A fluoro-polymerised material is also disclosed.

Abstract: The present invention relates to a partially-crystalline copolymer comprising tetrafluoroethylene, hexafluoropropylene in an amount corresponding to hexafluoropropylene index (HFPI) of from about 2.8 to 5.3, and preferably from about 0.2% to 3% by weight of perfluoro(alkyl vinyl ether), said copolymer having less than about 50 ppm alkali metal ion, having a melt flow rate of within the range of about 30±3 g/10 min, and having no more than about 50 unstable endgroups/106 carbon atoms and which can be extruded at high speed onto conductor over a broad polymer melt temperature range to give insulated wire of high quality.

Abstract: Crosslinkable polymers and crosslinked fluoropolymers are prepared from selected fluorinated dienes and monomers containing Br and I. Also disclosed are proton conductive membranes of these crosslinked fluoropolymers.

Abstract: An ionomer and a process for forming the ionomer such that the ionomer has (1) low equivalent weight (below 950, preferably between 625 and 850, and most preferably between 675 and 800) and (2) high conductivity (greater than 0.13 S/cm). In another embodiment, the invention is an ionomer having (1) low equivalent weight (below 950, preferably between 625 and 850, and most preferably between 675 and 800) and (2) acceptably low hydration (less than about 120 weight percent). These ionomers are capable of being processed into thin film and are extremely well-suited for low humidity or high temperature fuel cell applications.

Abstract: A process for making an aqueous dispersion of fluoropolymer particles by polymerizing in a first polymerization step at least one fluorinated monomer having an ionic group in an aqueous polymerization medium in the presence of initiator, the polymerizing providing dispersed particulate of fluorinated ionomer, and polymerizing in a second polymerization step at least one fluorinated monomer in the aqueous polymerization medium in the presence of the dispersed particulate of fluorinated ionomer and initiator to form the aqueous dispersion of particles of fluoropolymer.

Abstract: Provided are polyfluorinated carboxylic acids and their salts containing an ethylene-tetrafluoroethylene moiety. The polyfluorinated carboxylic acids and salts are useful as surfactants in polymerization processes.

Abstract: A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×104 or less.

Abstract: A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer or a cage structure which shows negligible intermixing with the imaging layer and is soluble in aqueous base developer. A method of forming a patterned material layer on a substrate and a coated substrate comprising the topcoat material is also disclosed.