Abstract: The invention relates to a process for the preparation of polyether polyols, which process involves: (a) contacting a phosphorus containing compound having at least one hydroxyl group with alkylene oxide to obtain alkoxylated initiator, (b) contacting the alkoxylated initiator with further alkylene oxide in the presence of a double metal cyanide complex catalyst.

Abstract: Disclosed herein is a resin composition for an organic insulating layer, a method of manufacturing the same, and a display panel including an insulating layer formed using the resin composition. The resin composition for an organic insulating layer is produced by polymerizing about 5 to about 35 wt % of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture of the unsaturated carboxylic acid and the unsaturated carboxylic acid anhydride, about 5 to about 40 wt % of a styrene compound, about 5 to about 40 wt % of an epoxy compound, about 0.1 to about 10 wt % of an isobornyl compound, and about 20 to about 40 wt % of a dicyclopentadiene compound, based on the total weight of unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, styrene compound, isobornyl compound, and dicyclopentadiene compound.

Abstract: To provide a curable composition which gives a cured fluorinated product excellent in transparency, light resistance (particularly against a short wavelength light having a wavelength of from 200 to 500 nm) and heat resistance, and having a controlled volume particularly thickness. A curable composition which contains a perfluorocyclic polyene having alicyclic structures which comprise carbon atoms and which may contain an oxygen atom and having at least two carbon-carbon double bonds, at least one of which is a polymerizable carbon-carbon double bond in which at least one of the two carbon atoms forming the polymerizable carbon-carbon double bond is a carbon atom forming the alicyclic structure, and a polymerization initiator; a cured fluorinated product obtained by curing the curable composition; an optical material made of the cured fluorinated product; and a light emitting device encapsulated with the cured fluorinated product in a light-transmitting manner.

Abstract: The present invention relates to the formation of low volatile anhydride-containing vinyl polymers by polymerizing the half ester of the anhydride with a vinyl aromatic monomer followed by devolatilizing the half-ester multi-polymer at elevated temperature and reduced pressures.

Abstract: There is disclosed a polymer which at least has the repeating unit represented by the following general formula (1a), and the repeating unit represented by the following general formula (1b) and/or the repeating unit represented by the following general formula (1c), and a positive resist composition comprising the polymer as a base resin.

Abstract: There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1; and a weight-average molecular weight of the polymer is in the range of 2000 to 200000, and a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the

Abstract: Provided is a polymer useful as a base resin of a resist material featuring a high resolution, patterns with less sidewall roughness, practically acceptable etching resistance, and a substantial margin allowed for heat treatment temperature after exposure. The polymer has a weight-average molecular weight of from 1,000 to 50,000 and comprises at least one repeating unit of formula (1) below, at least one repeating unit of formula (2) below and at least one repeating unit of formula (3) below. A resist material comprising the polymer is also provided.

Abstract: A hydrophilic ethylenically unsaturated macromonomer is disclosed that is prepared by the addition polymerization of addition polymerizable monomers that include monomers that have hydroxyl or amino functional groups, some of which may be subsequently reacted to provide (meth)acryl ethylenic unsaturation. The macromonomers may be used to form intraocular lenses in situ by polymerization of the macromonomers, and thus treat presbyopia.

Abstract: A polymer comprising recurring units of formulae (1), (2), (3) and (4) increases a dissolution rate in an alkali developer under the action of an acid. R1, R2, R3 and R6 are H or CH3, R4 and R5 are H or OH, X is a tertiary exo-alkyl group having a bicyclo[2.2.1]heptane framework, represented by any of formulae (X-1) to (X-4): wherein R7 is C1–C10 alkyl, and Y is a tertiary alkyl group having an adamantane structure. A resist composition comprising the inventive polymer has a sensitivity to high-energy radiation, improved resolution and minimized proximity bias and lends itself to micropatterning with electron beams or deep UV for VLSI fabrication.

Abstract: A polymer comprising recurring units containing silicon and recurring units having a substituent group of formula (1) is novel wherein A1 is a divalent group selected from furandiyl, tetrahydrofurandiyl and oxanorbornanediyl, R1 and R2 are selected from monovalent C1–C10 hydrocarbon groups, or R1 and R2 taken together may form an aliphatic hydrocarbon ring with the carbon atom, and R3 is hydrogen or a monovalent C1–C10 hydrocarbon group which may contain a hetero atom. The polymer is useful as a base resin to formulate a resist composition which is sensitive to high-energy radiation, and has excellent sensitivity and resolution at a wavelength of less than 300 nm as well as satisfactory oxygen plasma etching resistance.

Abstract: A data storage medium includes a haze-prevention layer between a heat-resistant thermoplastic substrate and a reflective metal layer. The haze-prevention layer includes a metal having a tensile modulus of at least about 15×106 pounds per square inch. The data storage medium resists hazing of the reflective layer at elevated temperatures.

Abstract: A reflective article useful, for example, in automotive headlights includes a haze-prevention layer between a heat-resistant thermoplastic substrate and a reflective metal layer. The haze-prevention layer includes a metal having a tensile modulus of at least about 15×106 pounds per square inch. The article resists hazing of the reflective layer at elevated temperatures.

Abstract: A polymeric compound for photoresist of the invention includes at least one monomer unit represented by following Formula (I): wherein R1, R2, R3, R4 and R5 are the same or different and are each a hydrogen atom or a methyl group; m, p and q each denote an integer of from 0 to 2; and n denotes 0 or 1, where the hydroxyl group and carbonyloxy group extending from a principle chain in the formula are independently combined with either of two carbon atoms on the far-left portion of the rings. By using the polymeric compound for photoresist as a base of a photoresist, the resulting photoresist exhibits well-rounded adhesion to substrates and resistance to etching.

Abstract: Optical devices fabricated from solvent processible polymers suffer from susceptibility to solvents and morphological changes. A semiconductive polymer capable of luminescence in an optical device is provided. The polymer comprises a luminescent film-forming solvent processible polymer which contains cross-linking so as to increase its molar mass and to resist solvent dissolution, the cross-linking being such that the polymer retains semiconductive and luminescent properties.

Abstract: The heat-curable resin composition of the present invention comprises an epoxy-containing resin and a curing agent, wherein the curing agent is cyclohexanetricarboxylic acid and/or an anhydride thereof. The heat-curable resin composition exhibits an excellent curability without using an curing accelerator and provides a colorless transparent cured product which is little discolored under high-temperature conditions and irradiation conditions of high-energy light. The heat-curable resin composition is suitable for producing coating compositions, adhesives, shaped articles, protective films for color filters and sealing materials for photosemiconductors such as blue LED and white LED.

Abstract: A polymer compound contains a cyclic structure represented by the following general formula (1): wherein each of X and Y represent an alkylene group or the like, where X and Y may be the same or different, Z represents a bond derived from an alkylene group or the like having from 1 to 20 carbon atoms, which is bonded to a group represented by Y belonging to another cyclic structure, m represents 0 or an integer of 1 or more and n represents an integer of 2 or more, provided that the integer represented by m is independent in respective repeating units, and a total number of the bond represented by Z is 1 or more.

Abstract: Disclosed herein are a ring-opened cycloolefin copolymer excellent in optical properties such as transparency, low in water (moisture) absorption property, high in affinity for other materials, good in post processing properties such as adhesive property and printability, and excellent in heat resistance and mechanical strength, a production process thereof, and an optical material. The ring-opened cycloolefin copolymer of the invention contains a structural unit (A) represented by any one of general formulae (1-1) to (1-3) and a structural unit (B) derived from a specific cycloolefin having an ester group in a proportion of 10:90 to 50:50 in terms of a molar ratio, wherein a monomer for obtaining the structural unit (A) is a tricyclomonoolefin compound containing an endo form in a proportion of at least 80 mol % and has a glass transition temperature of 120 to 250° C.

Abstract: This invention is directed to a coating composition used for original equipment manufacturing or refinishing uses in the automotive industry, which coating composition utilizes an acrylic polymer which contains substituted or unsubstituted exomethylene lactones or lactams as a comonomer.

Abstract: Polytetrahydrofuran, polytetrahydrofuran copolymers, diesters or monoesters of these polymers are prepared by polymerization of tetrahydrofuran in the presence of at least one telogen and/or comonomer, which is in the form of shaped catalyst bodies or catalyst particles having a volume of the individual shape of the body or particle of at least 0.05 mm3, preferably at least 0.2 mm3, in particular 1 mm3, and has at least one of the features a) and b): a) a pore radius distribution having at least one maximum in the pore radius range from 100 to 5000 ?, b) a pore volume of catalyst pores having radii of 200–3000 ? of greater than 0.05 cm3/g and/or a pore volume of pores having radii of 200–5000 ? of greater than 0.075 cm3/g and/or a pore volume of pores having radii of >200 ? of greater than 0.1 cm3/g.

Abstract: A thermally processable graft copolymer formed from a water soluble polymer and a water insoluble polymer, wherein the graft copolymer forms a hydrogel upon exposure to water. A method to form such a hydrogel-forming graft copolymer by copolymerizing a water soluble 2-substituted-2-oxazolines with a water insoluble 2-substituted-2-oxazoline. A method to form such a hydrogel-forming graft copolymer by transamidating a poly-2-oxazoline with a carboxylic acid terminated water-insoluble polymer.

Abstract: The present invention relates compositions containing acetoacetylated polyvinyl polymers obtained from polyvinyl polymers, such as polyvinyl butyrals. These coating compositions are especially suitable for use as wash primers in automotive OEM and refinish coating applications.

Abstract: Herein are disclosed modified vinyl alcohol polymers (mPVOH), wherein the mPVOH can comprise structure VII: and at least one structure comprising structure IX: or structure X: wherein —R can independently comprise an unsubstituted hydrocarbon moiety comprising at least one alpha hydrogen or a substituted hydrocarbon moiety comprising at least one alpha hydrogen. The mPVOH can be useful in oxygen barrier applications, such as a forming an oxygen barrier layer of a packaging article. Also disclosed are methods of forming mPVOH and methods of using mPVOH to make packaging articles with a superior barrier to entry by atmospheric oxygen.

Abstract: A cyclic olefin addition copolymer obtained by copolymerizing a cyclic olefin compound having a side chain substituent group with a ring structure, such as endo-tricyclo[4.3.0.12,5]deca-3,7-diene or endo-tricyclo[4.3.0.12,5]deca-3-ene, with another cyclic olefin compound such as bicyclo[2.2.1]hept-2-ene, and further with a cyclic olefin compound having a hydrolysable silyl group as needed, or hydrogenating after copolymerization; a composition for crosslinking in which a specific crosslinking agent is incorporated; a crosslinked product obtained by crosslinking the composition; an optical material containing the copolymer, the composition or the crosslinked product; and a method for producing the copolymer in which addition polymerization is conducted using a specific nickel catalyst.

Abstract: Novel silicon-containing polymers are provided comprising recurring units having a POSS pendant and units which improve alkali solubility under the action of an acid. Resist compositions comprising the polymers are sensitive to high-energy radiation and have a high sensitivity and resolution at a wavelength of up to 300 nm and improved resistance to oxygen plasma etching.

Abstract: Acetal compounds in which a 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by —(CH2)m— in which one hydrogen atom may be substituted with a hydroxyl or acetoxy group, and m is from 1 to 8 are novel. Using the acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.

Abstract: In accordance with the present invention, there are provided novel thermosetting resin compositions which do not require solvent to provide a system having suitable viscosity for convenient handling. Invention compositions have the benefit of undergoing rapid cure. The resulting thermosets are stable to elevated temperatures, are highly flexible, have low moisture uptake and are consequently useful in a variety of applications, e.g., in adhesive applications since they display good adhesion to both the substrate and the device attached thereto.

Abstract: A monomer containing an electron-withdrawing group of the present invention is represented by following Formula (a), (b) or (c): wherein A1, A2, and A3 are each a ring; Ra, Rb, Rc, and Ru are the same or different and are each a hydrogen atom or organic group; at least one of Rs, Rw and Rv, at least one of Rt and Rw1, and at least one of the two Rw2s are each an electron-withdrawing group, and the others are each a hydrogen atom or organic group; W1 is a single bond or linkage group; and n denotes an integer of 2 to 25, where at least two of Ra, Rb, Rc, Rs, Rt, Ru, Rv, Rw, Rw1, Rw2, W1, and carbon atoms constituting ring A1, carbon atoms constituting ring A2, and carbon atoms constituting ring A3 may be combined to form a ring, respectively. The electron-withdrawing groups in Rs, Rt, Rv, Rw, Rw1, and Rw2 are, for example, groups each containing a fluorine atom. The monomer is useful as a raw material for photoresist polymeric compounds.

Abstract: This invention discloses a process for synthesizing an amine functionalized monomer that comprises (1) reacting a secondary amine with a 2,3-dihalopropene to produce a vinyl halide containing secondary amine having a structural formula selected from the group consisting of wherein R and R? can be the same or different and represent allyl, alkoxyl or alkyl groups containing from 1 to about 10 carbon atoms, and wherein X represents a halogen atom, and wherein m represents an integer from 4 to about 10, and wherein X represents a halogen atom; and (2) reacting the vinyl halide containing secondary amine with a vinyl magnesium halide to produce the monomer having a structural formula wherein R and R? can be the same or different and represent alkyl, allyl or alkoxyl groups containing from 1 to about 10 carbon atoms, and wherein m represents an integer from about 4 to about 10.

Abstract: The instant invention relates to multifunctional alkoxyamines based on polyalkylpiperidines, polyalkylpiperazinones and polyalkylmorpholinones and their use as polymerization regulatros/initiators. Further subjects of the invention are a polymerizable composition comprising an ethylenically unsaturated monomer or oligomer and the alkoxyamine compound as well as a process for polymerization and a process for preparation of the compounds.

Abstract: Disclosed herein is a novel norbornene, acrylate or methacrylate monomer as a photoresist monomer containing an oxepan-2-one group. Further disclosed are photoresist compositions comprising a polymer prepared from the monomer, methods for preparing the photoresist compositions, and methods for forming photoresist patterns using the photoresist compositions.

Abstract: This invention discloses a process for synthesizing an amine functionalized monomer that comprises (1) reacting a secondary amine with a 2,3-dihalopropene to produce a vinyl halide containing secondary amine having a structural formula selected from the group consisting of wherein R and R? can be the same or different and represent allyl, alkoxyl or alkyl groups containing from 1 to about 10 carbon atoms, and wherein X represents a halogen atom, and wherein m represents an integer from 4 to about 10, and wherein X represents a halogen atom; and (2) reacting the vinyl halide containing secondary amine with a vinyl magnesium halide to produce the monomer having a structural formula wherein R and R? can be the same or different and represent alkyl, allyl or alkoxyl groups containing from 1 to about 10 carbon atoms, and wherein m represents an integer from about 4 to about 10.

Abstract: Polymers and co-polymers having monomeric units formed by the polymerization of monomers of the Structure I where R1 is a moiety containing an ethylenically unsaturated polymerizable group, R2 is a C1-C3 alkylene group, and R3 is a C1-10 linear or cyclic alkyl group, a C6-10 aromatic or substituted aromatic group, a C1-8 alkoxy methyl, or a C1-8 alkoxy ethyl group, are useful as binder resins for photosensitive compositions, and processes for photolithography in the production of semiconductor devices and materials.

Abstract: The present invention relates compositions containing acetoacetylated polyvinyl polymers obtained from polyvinyl polymers, such as polyvinyl butyrals. These coating compositions are especially suitable for use as wash primers in automotive OEM and refinish coating applications.

Abstract: A process for producing a crosslinkable silyl group-containing polymer which is excellent in oil resistance, heat resistance, weatherability, low staining properties, and compression set characteristics, includes the steps of radically polymerizing a vinyl monomer in the presence of a thiocarbonylthio group-containing compound with a specific structure, and introducing crosslinkable silyl groups. Also provided is a curable composition which contains the polymer and which is easy to handle.

Abstract: This invention provides novel methods for synthesis of narrow polydispersity oxazolone-containing polymers via nitroxide-mediated living free radical polymerization, as well as the products and derivatives thereof.

Abstract: Disclosed are methods of preparing solution polymers and compositions derived therefrom.

Abstract: A polymer for a chemically amplified negative photoresist and a photoresist composition are provided. A representative polymer of the invention is a compound of formula 5: wherein: R1 through R5 and R14 through R17 are defined as set fourth in the specification, and a, b, c, and d represent the mole ratios of each monomer, wherein a has a value of 0-0.5, b has a value of 0-0.9, c has a value of 0-0.3, and d has a value of 0-0.3, provided that a+b+c+d=1; and n represents the degree of polymerization of each polymer, and has a value of at least 2.

Abstract: An epoxy resin composition suitable for forming a film of excellent water repellency which comprises an epoxy resin having one or more water repellent groups and two or more cyclic aliphatic epoxy groups per molecule, a triazine-base catalyst for cationic polymerization and a non-polar solvent.

Abstract: The invention relates to a catalyst which contains a catalytically active quantity of at least one oxygen-containing molybdenum and/or wolfram compound on an oxidic support material and which has been calcinated at temperatures of 400 to 900° C. after the precursor compound of the catalytically active compounds have been applied to the support material or to a support material precursor. The transport pores for this catalyst each have a diameter of >25 nm and a volume of at least 50 mm3/g. The catalyst contains x ?mol (wolfram and/or molybdenum)/m2 molybdenum and/or wolfram, with 10.1<x<20.9 in relation to the finished catalyst, with the oxidic support material having a BET surface area of 135 to 220 m2/g. Catalysts of this type are characterized by an acidity of at least 70 ?mol/g at pKs<?3 in the dry state and are therfore very active. The invention also relates to a method for producing a catalyst of this type and to the preferred use thereof.

Abstract: The invention provides carbamate-functional resins and coating compositions incorporating said resins that have improved adhesion with respect to subsequently applied films or coatings. More particularly, the invention relates to carbamate-functional addition polymers having at least 250 grams of polymer per carbamate group which are made with less than 35 percent by weight of nonfunctional monomers, preferably with less than 20 percent by weight and most preferably from 0 to less than 10 percent by weight, based on the total weight of the polymer. The invention further provides a method of making a carbamate-functional polymer and carbamate-functional polymers made by the claimed method. Finally, the invention provides a method for improving the adhesion of a first coating composition to a subsequently applied material as well as a method of making a composite comprising a coated substrate, an adhesive composition, and a glass having at least one surface.

Abstract: The invention provides carbamate-functional resins and coating compositions incorporating said resins that have improved adhesion with respect to subsequently applied films or coatings. More particularly, the invention relates to carbamate-functional addition polymers having at least 250 grams of polymer per carbamate group which are made with less than 35 percent by weight of nonfunctional monomers, preferably with less than 20 percent by weight and most preferably from 0 to less than 10 percent by weight, based on the total weight of the polymer. The invention further provides a method of making a carbamate-functional polymer and carbamate-functional polymers made by the claimed method. Finally, the invention provides a method for improving the adhesion of a first coating composition to a subsequently applied material as well as a method of making a composite comprising a coated substrate, an adhesive composition, and a glass having at least one surface.

Abstract: A photosensitive polymer including silicon and a resist composition using the same are disclosed. The photosensitive polymer has the following formula 1. In formula 1, R1 of the first monomer and R3 of the third monomer are an alkyl group. R2 of the first monomer is hydrogen, alkyl, alkoxy, or carbonyl. The X of the first monomer is an integer selected from 1 to 4. Further, m/(m+n+p) is about 0.1 to about 0.4, n/(m+n+p) is about 0.1 to about 0.5, and p/(m+n+p) is about 0.1 to about 0.4.

Abstract: The invention includes polymers that contain a polymers of the invention contain one or more 1) carbonate units and/or 2) a lactone provided by a monomer having a ring oxygen adjacent to the monomer vinyl group. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.

Abstract: The present invention pertains to a process for controlled free radical polymerization or copolymerization of vinyl chloride at a temperature between 40° C. and 95° C., at a pressure between 5 and 30 bar in the presence of a stable free nitroxyl radical.

Abstract: A novel polymer is obtained by copolymerizing a (meth)acrylic acid derivative with a vinyl ether compound, an allyl ether compound and an oxygen-containing alicyclic olefin compound. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.

Abstract: The present invention relates to relates to copolymers containing fluorine, aqueous compositions containing said copolymers, and the use of said copolymers and compositions for surface treatment.

Abstract: Use of amorphous perfluorinated polymers for preparing transparent films at 157 nm, said perfluorinated polymers being free from unstable ionic end groups COF, COOH or their amidic derivatives, esters or salts, said polymers formed by cyclic units deriving from perfluorodioxoles of formula: 1

Abstract: A resist composition comprising a copolymer of an acrylic ester monomer containing fluorine at &agr;-position with a norbornene derivative containing oxygen or sulfur within the norbornene ring as a base resin is sensitive to high-nergy radiation below 200 nm, has excellent sensitivity, transparency and dry etching resistance, and is suited for lithographic microprocessing.

Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.

Abstract: An aspect of this invention discloses novel copolymeric compositions with repeat units of glycidyl methacrylate and alpha-methylene-gamma-methyl-gamma-butyrolactone. This invention also discloses an emulsion polymerization process for making such copolymers. This invention further discloses blends of such copolymers with polyamides and blends of such copolymers with polyesters. This invention further discloses a process for improving mechanical properties of polyamides and polyesters.