Abstract: Embodiments in accordance with the present invention encompass compositions containing one or more polycycloolefinic monomers and at least one multifunctional olefinic monomer which when subjected to a suitable temperature undergoes mass polymerization to provide a three-dimensional insulating article which exhibits hitherto unattainable low dielectric constant and low-loss properties, and very high thermal properties. The compositions of this invention may additionally contain one or more organic or inorganic filler materials, which provide improved thermo-mechanical properties in addition to very low dielectric properties. The compositions are stable at room temperature and undergo mass polymerization only when subjected to suitable higher temperatures generally above 100° C. The compositions of this invention are useful in various applications, including as insulating materials in millimeter wave radar antennas, among others.

Abstract: A ring-opened copolymer composition has a ring-opened copolymer containing structural unit derived from a norbornene compound represented by general formula (1) below and structural unit derived from a monocyclic olefin, wherein a content of a norbornene compound represented by general formula (1) is 1 ppm by weight or more and 1000 ppm by weight or less based on the ring-opened copolymer, wherein R1 to R4 are each a hydrogen atom, a hydrocarbon group having 1 to 20 carbon atoms, or a substituent containing a halogen atom, a silicon atom, an oxygen atom or a nitrogen atom, and R2 and R3 may be bonded to each other to form a ring, and “m” is 0 or 1.

Abstract: A tetraanionic OCO pincer ligand metal-oxo-alkylidene complex is prepared from a trianionic pincer ligand supported metal-alkylidyne. The metal can be tungsten or other group 5-7 transition metal. The tetraanionic pincer ligand metal-oxo-alkylidene complex, a trianionic OCO pincer ligand metal complex, or a trianionic ONO pincer ligand metal complex can be used to polymerize cycloalkenes. The poly(cycloalkene)s are predominantly cis-alkene macrocyclics.

Abstract: The present invention provides a 1,3,7-octatriene polymer having a narrow molecular weight distribution and a hydride thereof. Specifically, the 1,3,7-octatriene polymer is a polymer containing a structural unit derived from 1,3,7-octatriene, wherein the polymer has not only a molecular weight distribution (Mw/Mn) of 2.05 or less but also a weight average molecular weight (Mw) of 1,000 to 1,000,000.

Abstract: A process for improving a latex comprising the steps of (a) providing a latex comprising a polymer binder, wherein said polymer binder is formed by polymerization of a monomer mixture comprising one or more ethylenically unsaturated carboxylic acid functional monomer, and (b) passing said latex comprising said polymer binder over a cation exchange resin.

Abstract: Aromatic resin polymers and compositions containing them are useful as underlayers in semiconductor manufacturing processes.

Abstract: Microporous sheet product and methods of making and using the same. In one embodiment, the microporous sheet product is made by a process that includes melt-extruding a sheet material using an extrusion mixture that includes (i) a cyclic olefin copolymer, (ii) an electrolyte swellable thermoplastic, and (iii) a compatibilizing agent that promotes mixing of the cyclic olefin copolymer and the electrolyte swellable thermoplastic, the compatibilizing agent having a boiling point in the range of 135-300° C. As an example, the cyclic olefin copolymer may be an ethylene-norbornene copolymer, the electrolyte swellable thermoplastic may be polyethylene oxide, and the compatibilizing agent may be mineral spirits. After extrusion, the sheet material may be cooled, and the compatibilizing agent may be removed, forming an ionically-conductive microporous sheet product.

Abstract: The present invention provides methods of making low energy polymerizable monomers and resins for use in making dielectric materials.

Abstract: The present invention provides an olefin-based polymer which satisfies the following conditions of (1) to (4) and is capable of exhibiting improved impact strength without degrading mechanical properties such as tensile strength: (1) density (d): from 0.850 to 0.910 g/cc, (2) melting index (MI, 190° C., 2.16 kg load conditions): from 0.1 to 100 g/10 min, (3) molecular weight distribution (MWD): from 1.5 to 3.0, and (4) two peaks are shown in a temperature range of ?20° C. to 120° C. when taking measurements of temperature rising elution fractionation (TREF), and a relation of T(90)?T(50)?60° C. is satisfied (where T(90) is a temperature at which 90 wt % of the olefin-based polymer is eluted, and T(50) is a temperature at which 50 wt % of the olefin-based polymer is eluted).

Abstract: The present invention relates to a cycloolefin resin composition, a molded article of the cycloolefin resin composition, and an optical element, and in particular, to a resin composition containing inorganic particles in a resin, a molded article of the resin composition, and an optical element formed of the molded article.

Abstract: [Problem] To provide a cyclopentene ring-opening copolymer used in a rubber composition for tires having excellent wet grip performance and low heat buildup; and a method for producing the cyclopentene ring-opening copolymer. To further provide a rubber composition obtained by using the cyclopentene ring-opening copolymer. [Solution] This cyclopentene ring-opening copolymer comprises cyclopentene and a cyclic olefin containing an aromatic ring; the content of the aromatic ring with respect to the total weight of the copolymer is 10 to 40 wt %; and the weight average molecular weight (Mw) is 200,000 to 1,000,000. The cyclopentene ring-opening copolymer alternatively comprises cyclopentene and a norbornene compound; the weight ratio of cyclopentene-derived structural units to all repeating structural units in the copolymer is 40 to 90 wt %, and the weight ratio of norbornene compound-derived structural units is 10 to 60 wt %; and the weight average molecular weight (Mw) is 200,000 to 1,000,000.

Abstract: A film for use in architectural applications (e.g. for roofs, walls or windows of buildings) comprises a polymeric material and an additive, wherein said polymeric material is a fluoropolymer and said additive is selected from titaniumnitride and tungsten oxide. Preferred polymeric materials may be ethylene chlorotrifluoroethylene (ECTFE) or an ethylene-tetrafluoroethylene copolymer (ETFE).

Abstract: Certain polyarylene oligomers having improved solubility are useful in forming dielectric material layers in electronics applications.

Abstract: A monomer having a plurality of tertiary alcoholic hydroxyl groups is provided. A useful polymer is obtained by polymerizing the monomer. From a resist composition comprising the polymer, a negative pattern which is insoluble in alkaline developer and has high etch resistance is formed at a high resolution.

Abstract: The invention is: a fiber produced by forming a fiber using pellets, and annealing the fiber at 150 to 220° C., the pellets being formed of a resin powder of a cycloolefin polymer, the resin powder having a loose bulk density of 0.3 to 0.6 g/cc when measured using 100 cc of the resin powder: a method for producing the fiber. The invention provides a method for producing a cycloolefin polymer fiber that exhibits good productivity and strength during spinning, and a low thermal shrinkage ratio.

Abstract: A method of forming a crosslinked polymer comprising the step of reacting a crosslinkable group in the presence of a polymer, wherein: the crosslinkable group comprises a core unit substituted with at least one crosslinkable unit of formula (I): the crosslinkable group is bound to the polymer or is a crosslinkable compound mixed with the polymer; Ar is aryl or heteroaryl which may be unsubstituted or substituted with one or more substituents independently selected from monovalent substituents and a divalent linking group linking the unit of formula (I) to the core unit; and R is independently in each occurrence H, a monovalent substituent or a divalent linking group linking the unit of formula (I) to the core unit, with the proviso that at least one R is not H.

Abstract: A method of forming a pattern by directed self-assembly, comprising: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) applying a crosslinkable underlayer composition over the one or more layers to be patterned to form a crosslinkable underlayer, wherein the crosslinkable underlayer composition comprises a crosslinkable polymer comprising a first unit formed from a monomer of the following general formula (I-A) or (I-B): wherein: P is a polymerizable functional group; L is a single bond or an m+1-valent linking group; X1 is a monovalent electron donating group; X2 is a divalent electron donating group; Ar1 and Ar2 are trivalent and divalent aryl groups, respectively, and carbon atoms of the cyclobutene ring are bonded to adjacent carbon atoms on the same aromatic ring of Ar1 or Ar2; m and n are each an integer of 1 or more; and each R1 is independently a monovalent group; (c) heating the crosslinkable underlayer to form a crosslinked underlayer; (d) forming a self-

Abstract: The present invention relates to a norbornene monomer, a polynorbornene derivative, a liquid crystal alignment film including the same, and a liquid crystal display device including the same. More particularly, the present invention relates to a norbornene monomer, a polynorbornene derivative, a liquid crystal alignment film including the same, and a liquid crystal display device including the same, which have an alignment property by photoreaction, excellent thermal stability and photoreactivity, the increased photo-reaction rate and reliability of the alignment film, thereby showing high manufacturing process efficiency.

Abstract: A polymer containing a recurring unit having an aliphatic polycyclic structure, wherein at least two atoms constituting the ring skeleton of the aliphatic polycyclic structure constitute the main chain of the polymer, and the recurring unit has an aliphatic ring containing a sulfonyl group as the constitutive group of the ring skeleton, has high refractivity, high Abbe's number, high-level heat resistance, high-level light transmittance and low water absorption.

Abstract: A thermoplastic transparent resin which is produced by hydrogenating 70% or more of aromatic double bonds of a copolymer. The copolymer is produced by polymerizing a monomer composition containing at least one (meth)acrylic ester monomer and at least one aromatic vinyl monomer and has a molar ratio (A/B) of from 1 to 4 wherein A is a molar amount of a constitutional unit derived from the (meth)acrylic ester monomer and B is a molar amount of a constitutional unit derived from the aromatic vinyl monomer. The thermoplastic transparent resin is suitable for the production of a molded article such as optical article having a good color tone because molding defect is less produced.

Abstract: A polymerizable composition including a cycloolefin monomer mixture, a metathesis polymerization catalyst, and a crosslinking agent, the cycloolefin monomer mixture including a compound represented by a formula and an additional cycloolefin compound, the polymerizable composition producing a crosslinkable resin having a modulus of elasticity at 100° C. and a modulus of elasticity at 140° C. of 1.0×108 Pa or less when subjected to a ring-opening polymerization reaction at 170° C. or less, and the crosslinkable resin producing a crosslinked resin having a glass transition temperature (Tg) of 160° C. or more when subjected to a crosslinking reaction.

Abstract: A negative resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R4—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition exhibits a high resolution due to controlled acid diffusion and forms a resist film which is unsusceptible to swell in the developer and hence to pattern collapse.

Abstract: A resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R5—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is an acid labile group, R5 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition is of dual-tone type in that an intermediate dose region of resist film is dissolved in a developer, but unexposed and over-exposed regions of resist film are insoluble.

Abstract: A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).

Abstract: Nonconjugated conductive polymers absorb radioactive iodine, therefore are useful for protection against nuclear radiation. These polymers have at least one double bond per repeat unit. The ratio of the number of double bonds to the total number of bonds along the polymer chain is less than half. Examples of nonconjugated conductive polymers include: cis-1,4-polyisoprene (natural rubber), trans-1,4-polyisoprene (gutta percha), polybutadiene, polydimethyl butadiene, poly(b-pinene), styrene butadiene rubber (SBR), polyalloocimene, polynorbornene and many others. Through interaction with iodine atoms the double bonds in the nonconjugated polymers transform into radical cations leading to a dark color. The iodine atoms remain (immobile) bound to the polymer chain through the charge-transfer interaction, these polymers are very inexpensive and can be easily processed into any shape, structure and size. Therefore, these are useful for protection against nuclear radiation including radioactive iodine.

Abstract: A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.

Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic ca

Abstract: A polymerizable monomer represented by the following formula (1) wherein at least one of Ar1 to Ar3 is substituted by a group represented by the following formula (2) and which is substituted by one or more groups comprising a polymerizable functional group. Ar1 to Ar3 are a substituted or unsubstituted aryl group having 6 to 40 ring carbon atoms, Ar6 is a substituted or unsubstituted aryl group having 6 to 40 ring carbon atoms and Ar4 and Ar5 are a substituted or unsubstituted arylene group having 6 to 40 ring carbon atoms.

Abstract: Embodiments in accordance with the present invention encompass negative-tone, aqueous base developable, self-imagable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.

Abstract: Provided is a producing method for a retardation film with a reverse wavelength dispersion property, which is highly reliable in terms of a small wavelength dispersion change and is low in display unevenness due to a position dependence of a retardation variation. The production method is designed for a retardation film which satisfies the following formulas (1) and (2): 0.7<Re1[450]/Re1[550]<0.97 - - - (1); and 1.5×10?3<?n<6.0×10?3 - - - (2) (where: Re1[450] and Re1[550] represent, respectively, in-plane retardation values thereof as measured by using light of a wavelengths of 450 nm and light of a wavelength of 550 nm, at 23° C.; and ?n represents an in-plane birefringence thereof as measured by using light of a wavelength of 550 nm).

Abstract: A curable resin composition comprising a (meth)acrylate monomer having an aromatic ring, a non-conjugated vinylidene group-containing compound represented by the general formula below, and a thermal or a photo-radical polymerization initiator makes it possible to produce a cured product with minimized occurrence of burring during molding and high product yield after molding. The cured product has good heat coloration resistance and low Abbe's number. R11, R12, R15, and R16 represent a substituent and A represents an atomic group necessary for forming a cyclic structure.

Abstract: The present invention provides polymers containing an acetoacetate moiety. The polymers may be readily functionalized and the functionalized polymers may be further derivatized to provide a wide variety of useful polymers having desirable chemical and physical properties. The polymers of the present invention may be employed in a wide variety of compositions. wherein R1-R6, w, y, and z are described herein.

Abstract: The present invention relates to a polar group-containing olefin copolymer (A?) which is produced through polymerization using a transition metal catalyst, which has a weight-average molecular weight falling within a specific range and which contains a polar group-containing monomer within a specific range; a multinary polar olefin copolymer (A?) indispensably containing a polar monomer component that has a norbornene skeleton and a carboxyl group or an acid anhydride group and having three or more types of monomer units; and a resin composition (C) containing a specific amount of a polar group-containing olefin copolymer (A) and a specific amount of an olefin resin (B).

Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the ?-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms).

Abstract: A resinous structure derived from fluorine-containing polymers useful as a mold with dimensional stability is disclosed.

Abstract: This invention relates to the new functional norbornanyl ester derivative and/or polymer compositions which are easily obtainable by reacting the Diels-Alder adduct of appropriate dienes and dienophiles with carboxylic acids. In particular, this invention relates to a new process for making cyclic chemical raw materials suitable for production coating, ink, adhesive, plasticizer, thermoplastic or thermosetting plastic and functional polymers.

Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.

Abstract: The invention relates to a catalyst for the polymerization of norbornene monomers comprising transition metal complex (A) represented by formula (1); and a method for producing a norbornene (co)polymer, especially a norbornene copolymer containing a monomer unit represented by formulae (2) and (3), wherein a norbornen monomer is homopolyzed or copolymerized in the presence of the polymerization catalyst. Preferable examples of the transition metal complex (A) include (?-allyl){4-(2,6-diisopropylphenylimino)-2-penten-2-olato-?2N,O}palladium and (?-allyl){4-(1-naphthylimino)-2-penten-2-olato-?2N,O}palladium. In the formulae, the symbols are as defined in the description. A norbornene (co)polymer which has excellent transparency, excellent heat resistance, excellently low water absorption and excellent electrical insulation characteristics can be efficiently produced by the present invention.

Abstract: Embodiments in accordance with the present invention provide polymers for forming layers/films useful in the manufacture of a variety of types of optoelectronic displays. Such embodiments also provide compositions of such polymers for forming such layers/films where the formed layers/films have high transparency over the visible light spectrum.

Abstract: A polymer for an optical film including: a repeating unit A including a repeating unit represented by the following Chemical Formula 1; and a repeating unit B derived from a monomer including an unsaturated bond copolymerizable with the repeating unit A: wherein, in Chemical Formula 1, the variables R1 to R9 are defined herein.

Abstract: A water-soluble resin composition for forming fine patterns comprising water-soluble polymer represented by Chemical Formula 1 as below and the first water-soluble solvent, is coated and heated on a photoresist layer having at least one contact hole to reduce a size of the at least one contact hole. (In Chemical Formula 1, each of R1, R2, R3 and R5 independently represents an alkyl group of C1-30 or an cyclo alkyl group of C3-30 which respectively have one selected from the group consisting of hydrogen, an ether group, an ester group, a carbonyl group, an acetal, an epoxy group, a nitril group, an amine group, and an aldehyde group; each of R4, R6, R7 and R8 independently represents hydrogen or a methyl group; n represents an integer of 0 to 5; a represents a real number of 0.05 to 0.5; each of b, c and d respectively represents a real number of 0 to 0.7; and a+b+c+d=1).

Abstract: Conventional cross-linked cyclic olefin polymers do not have a sufficiently low linear expansion coefficient. A compound having a structure represented by the following formula (a).

Abstract: Sulfur chelated ruthenium compounds represented by the following formula: wherein M indicates the ruthenium metal bound to a benzylidene carbon; R represents C1-C7 alkyl group or optionally substituted aryl; X1 and X2 each independently represent halogen; Y1 and Y2 each independently denote unsubstituted or alkyl-substituted phenyl; and Z independently represents hydrogen, electron withdrawing or electron donating substituent, with m being an integer from 1 to 4, and processes and compositions related thereto.

Abstract: A cycloolefin-based copolymer and a hydrogenation process are disclosed, wherein the cycloolefin-based copolymer is prepared by using: a monomer which can be easily and economically obtained by hydrogenating dicyclopentadiene that occupies much of C5 fractions from naphtha cracking; or a monomer which can be obtained by chemically bonding three molecules of cyclopentadiene via Diels-Alder reactions and then hydrogenating the cyclopentadiene. The copolymer can be used in various fields as an amorphous transparent resin.

Abstract: A process (1) for producing a cycloolefin resin film comprising the steps of: the step (I) of mixing a cycloolefin monomer and a metathesis polymerization catalyst to prepare a polymerizable composition (A); the step (II) of coating or impregnating the supporting body with the polymerizable composition (A) at once after the step (I), and the step (III) of polymerizing the polymerizable composition (A) by polymerization; and a process (2) for producing a cycloolefin polymer sheet or film with the thickness of 1 mm or less comprising polymerizing a reactive solution containing a ruthenium complex catalyst, having a hetero atom-containing carbene compound as a ligand, and a cycloolefin monomer by ring-opening metathesis bulk polymerization, wherein the polymerization of the cycloolefin monomer is completed by heating the reactive solution to 100° C. or higher at the heating rate of 20° C./min or more.

Abstract: A resin for thermal imprint include a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. Tg(° C.

Abstract: The present invention relates to a norbornene monomer, a polynorbornene derivative, a liquid crystal alignment film including the same, and a liquid crystal display device including the same. More particularly, the present invention relates to a norbornene monomer, a polynorbornene derivative, a liquid crystal alignment film including the same, and a liquid crystal display device including the same, which have an alignment property by photoreaction, excellent thermal stability and photoreactivity, the increased photo-reaction rate and reliability of the alignment film, thereby showing high manufacturing process efficiency.

Abstract: This invention discloses and claims a series of polycyclic monomers and polymers useful in the production of optical waveguides. The polymers of the invention comprise one or more repeating units represented by the formula (IV): Wherein m, X, R1 and R2 are as defined herein. The films formed from the polymers of this invention exhibit significant changes in refractive index (greater than or equal to 0.5%) after exposure to suitable actinic or thermal energy thereby having superior optical transmission performance, which is of importance for modern optical applications such as wave guiding and optical data storage.

Abstract: The molded product of the present invention is used for an optical component selected from an f? lens, an imaging lens, and a light guide plate and contains a polymer having an alicyclic structure in a portion or all of repeating structural units. Moreover, when the molded product is dipped in cyclohexane at a concentration of 1 g/mL at 23° C. for 6 hours under stirring, a number of insoluble fine particles contained in the cyclohexane and having a particle size of equal to or larger than 1 ?m and equal to or smaller than 2 ?m that is measured by a liquid-borne particle counter is equal to or less than 200 particles/ml.

Abstract: A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of main-chain carbon-carbon double bonds of a ring-open polymer obtained by ring-opening polymerization of 2-norbornene. The hydrogenated norbornene ring-open polymer has a weight average molecular weight determined by gel permeation chromatography (GPC) of 50,000 to 200,000, a molecular weight distribution of 1.5 to 10.0, and a melting point of 110 to 145° C. A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of carbon-carbon double bonds of a ring-open polymer obtained by ring-opening copolymerization of 2-norbornene and a substituent-containing norbornene monomer, wherein the proportion of a repeating unit (A) derived from the 2-norbornene with respect to all repeating units is 90 to 99 wt % and the proportion of a repeating unit (B) derived from the substituent-containing norbornene monomer with respect to all repeating units is 1 to 10 wt %. A resin composition and a molding material.