Abstract: A negative working, aqueous base developable, photosensitive photoresist composition and a process of using this composition to produce lithographic images, where this composition is one comprising: a) a polymer containing the four repeat units of structures (1), (2), (3), and (4), but no other types of repeat units; wherein v, x, y and z, respectively, represent the mole % of each repeat units of structures (1), (2), (3) and (4); b) a radical photo-initiator component, which is comprised of at least one radical photo initiator which is activated by a broad absorption of radiation from about 360 nm to about 440 nm; c) a crosslinker component which is either a mixture consisting of crosslinkers of structure (5), (6) and (7), or a single crosslinker of structure (8); d) a radical inhibitor component; e) an optional surfactant component; f) an optional dissolution promoter component; and g) a solvent. The invention also relates to the process of using this negative resist to produce lithographic images.

Abstract: A resin composition is provided which has high transparency, light guiding properties and luminescent properties and can guide light therethrough with little change in chromaticity. A shaped article such as an optical element including the resin composition is also provided. The resin composition includes an acrylic block copolymer (A) and a light diffusing agent (B), wherein the acrylic block copolymer (A) has at least one structure in which polymer blocks (a1) based on methacrylic acid ester units are bonded to both ends of a polymer block (a2) based on acrylic acid ester units, and has a weight average molecular weight of 10,000 to 150,000 and a tensile elastic modulus of 1 to 1,500 MPa, the light diffusing agent (B) is rutile titanium oxide having an average particle size of 0.5 to 2.0 ?m, and the content of the light diffusing agent (B) is 0.5 to 10 ppm (on mass basis) based on the acrylic block copolymer (A).

Abstract: Embodiments in accordance with the present invention encompass compositions encompassing a procatalyst and a thermal or photoactivator along with one or more monomers which undergo vinyl addition polymerization when said composition is heated to a temperature from 50° C. to 100° C. to form a substantially transparent film. The monomers employed therein have a range of refractive index from 1.4 to 1.6 and thus these compositions can be tailored to form transparent films of varied refractive indices. Accordingly, compositions of this invention are useful in various opto-electronic applications, including as coatings, encapsulants, fillers, leveling agents, among others.

Abstract: A method for preparing a magnesium adamantane carboxylate salt is provided. The method includes mixing a magnesium salt and a diamondoid compound having at least one carboxylic acid moiety to form a reactant mixture and hydrothermally treating the reactant mixture at a reaction temperature for a reaction time to form the magnesium adamantane carboxylate salt.

Abstract: A method for preparing a transition-metal adamantane carboxylate salt is presented. The method includes mixing a transition-metal hydroxide and a diamondoid compound having at least one carboxylic acid moiety to form a reactant mixture, where M is a transition metal. Further, the method includes hydrothermally treating the reactant mixture at a reaction temperature for a reaction time to form the transition-metal adamantane carboxylate salt.

Abstract: The present invention provides a process for preparing a highly polymerized aromatic polycarbonate resin which not only has excellent quality such that it has high molecular weight and high fluidity, but also has more excellent heat resistance. The process of the present invention comprises a highly polymerizing step for reacting an aromatic polycarbonate prepolymer with an aliphatic diol compound of the following formula (I) having hydroxymethyl groups (HO—CH2—) each bonded to a quaternary carbon atom in the presence of a transesterification catalyst to obtain a highly polymerized aromatic polycarbonate resin: wherein Ra to Rf, n, and m are as defined in the present specification and claims.

Abstract: Laser-inscribable film, comprising a contrast layer based on a cured acrylate coating composition and, arranged above the contrast layer, an engraving layer, where the cured acrylate coating composition is based on a composition comprising from 30 to 80% by weight of a trifunctional oligomer A, from 0 to 20% by weight of a trifunctional monomer B, from 1 to 30% by weight of a difunctional monomer C, and from 2 to 40% by weight of a colorant pigment.

Abstract: A method for forming a pattern includes providing a resist underlayer film on a substrate using a first composition for forming a resist underlayer film. The first composition includes a polymer having a structural unit represented by a following formula (1). In the formula (1), Ar1 and Ar2 each independently represent a bivalent group represented by a following formula (2). A resist coating film is provided on the resist underlayer film using a resist composition. A resist pattern is formed using the resist coating film. A predetermined pattern is formed on the substrate by sequentially dry-etching the resist underlayer film and the substrate using the resist pattern as a mask.

Abstract: Disclosed herein are a photoreactive polymer, and an alignment layer comprising the same that exhibit excellences in alignment rate and alignment stability. The photoreactive polymer comprises a cyclic olefin-based repeating unit with at least one photoreactive substituent, and the maximum absolute value of a variation in dichloric ratio per unit UV dose as given by d(dichloric ratio)/d(mJ/cm2) upon exposure to a polarized UV radiation having a wavelength of 150 to 450 nm at a total exposure dose of 20 mJ/cm2 or less is at least 0.003.

Abstract: The present invention provides a resin composition for resist to be efficiently formed into a cured product with high properties of crack resistance, bulge resistance, protrusion resistance, and the like for filling a through-hole, a via hole, or the like with the cured product. The resin composition for masks in accordance with the present invention contains a first resin and a second resin. The first resin is prepared by an addition reaction of polybasic acid anhydride with an adduct of an ethylenically unsaturated compound having a carboxyl group and bifunctional epoxy resin. The second resin having; a group obtained by an addition reaction of an epoxy group with monocarboxylic acid; and a group obtained by addition reaction of an epoxy group with polybasic acid.

Abstract: The present invention relates to an adhesive composition comprising: an alkyl acrylic acid ester monomer having an alkyl carbon number of 2 to 14; an acrylic acid ester monomer containing a hydroxyl group; and a copolymer obtained by copolymerizing an acrylic acid ester monomer. The present invention also provides the adhesive composition and an adhesive film using the same, a touch panel, and an electronic device. The adhesive composition of the present invention has characteristics of high flexibility and good cutting properties, durability, transparency, etc.

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.

Abstract: A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).

Abstract: A process for the production of methacrylic acid or esters thereof by the base catalysed decarboxylation of at least one dicarboxylic acid selected from itaconic, citraconic or mesaconic acid or mixtures thereof in an aqueous reaction medium is described. The decarboxylation is carried out at a temperature in the range from 200° C. and up to 239° C. The methacrylic acid is isolated from the aqueous reaction medium by a purification process which does not include introducing an organic solvent to the aqueous reaction medium for solvent extraction of the methacrylic acid into an organic phase. A method of preparing polymers or copolymers of methacrylic acid or methacrylic acid esters is also described.

Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic ca

Abstract: Disclosed therein are a cyclic olefin compound, a photoreactive polymer, and an alignment layer comprising the photoreactive polymer, where the cyclic olefin compound can be used to provide the photoreactive polymer having not only excellences in liquid crystal alignment and alignment rate but also readiness for change in the alignment direction depending on the polarization direction.

Abstract: A polymerizable composition including a cycloolefin monomer mixture, a metathesis polymerization catalyst, and a crosslinking agent, the cycloolefin monomer mixture including a compound represented by a formula and an additional cycloolefin compound, the polymerizable composition producing a crosslinkable resin having a modulus of elasticity at 100° C. and a modulus of elasticity at 140° C. of 1.0×108 Pa or less when subjected to a ring-opening polymerization reaction at 170° C. or less, and the crosslinkable resin producing a crosslinked resin having a glass transition temperature (Tg) of 160° C. or more when subjected to a crosslinking reaction.

Abstract: The present invention provides novel, modified polydicyclopentadienes and methods to prepare modified polydicyclopentadienes. The modified polydicyclopentadienes prepared by the methods of the invention are useful in many applications including new and useful solid phases for chromatography.

Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and recurring units of tert-butyl or tert-amyl-substituted hydroxyphenyl methacrylate and having a weight average molecular weight of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.

Abstract: Provided is an ethylene-?-olefin-nonconjugated polyene copolymer having ethylene units, ?-olefin units and nonconjugated polyene units, wherein the copolymer satisfies the following requirements: (A): the intrinsic viscosity [?] is 0.5 to 1.8 dl/g, (B): the content of ethylene units is 50 to 90 mol % and the content of ?-olefin units is 50 to 10 mol % where the sum total of the contents of ethylene units and ?-olefin units is taken as 100 mol %, (C): the iodine value is 1 to 50, (D): the ratio of tan ? taken at 100° C. and 2 cpm to tan ? taken at 100° C. and 1000 cpm is from 1.0 to 1.7, and (E): the ratio of the Z-average molecular weight to the number average molecular weight is from 15 to 25 and the weight average molecular weight to the number average molecular weight is from 3 to 5.

Abstract: Disclosed is an adhesive composition comprising a low Tg (meth)acrylate copolymer component, a high Tg (meth)acrylate copolymer component, and a hydrogenated hydrocarbon tackifier. This disclosure provides a pressure-sensitive adhesive and pressure-sensitive adhesive articles that are particularly useful in the bonding of low surface energy (LSE) substrates.

Abstract: Disclosed herein are a cyclic olefin compound, a photoreactive polymer, and an alignment layer comprising the photoreactive polymer, where the cyclic olefin compound can be used to provide the photoreactive polymer having not only excellences in liquid crystal alignment and alignment rate but also readiness for change in the alignment direction depending on the polarization direction.

Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of hydroxyanthraquinone or hydroxy-2,3-dihydro-1,4-anthracenedione methacrylate, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).

Abstract: Certain embodiments are directed to resins comprising norbornene derivatives for use in structures such as radomes. In some examples, the radome comprises a dielectric constant of less than 2.7, a loss tangent of less than 0.003 and a moisture absorption of less than 1.5%.

Abstract: In the present invention, the two-pack type curable resin composition using a compound having one or more (meth)acrylic groups in the molecule enables both of prolongation of a working life and maintenance of physical properties of a cured product. Prior art had a difficulty in controlling a working life continuously; however, the present invention can easily control the working life and therefore makes it possible to be used in various conditions. Provided is a two-pack type curable resin composition, containing components (A) to (E): component (A) being a compound having one or more (meth)acrylic groups in the molecule thereof; component (B) being hydroperoxide; component (C) being at least one type of copper compound and vanadium compound; component (D) being a compound having 2 to 6 thiol groups in the molecule thereof; and component (E) being saccharin.

Abstract: The present invention relates to a method of producing an elastomer. Specifically, the method of producing an elastomer according to the present invention comprises a step of polymerizing ethylene, propylene, and optionally, a diene monomer in the presence of a catalyst composition containing a transition metal compound. The method of producing an elastomer according to the present invention makes it possible to prepare a high molecular weight, ethylene-propylene or ethylene-propylene-diene, elastic copolymer at a high temperature.

Abstract: A process and the resultant product from the process for continuously making an EPDM utilizing ethylene, propylene, and dienes. This process allows for the creation of products with high diene contents and broad molecular weight distributions while utilizing a continuous flow reactor and a known catalyst. The process allows for these products to be made without gelling, or fouling of the reactor, which are problems known in the art.

Abstract: A process for continuously making a terpolymer or a tetrapolymer utilizing ethylene, an alpha olefin, and at least one polyene. This process allows for the creation of products with high polyene contents and broad molecular weight distributions while utilizing a continuous flow reactor and a known catalyst. The process allows for these products to be made without gelling, or fouling of the reactor.

Abstract: The present disclosure is directed to a composition and articles containing the composition. The composition includes an ethylene-propylene-diene interpolymer (EPDM) having a rheology ratio greater than 33. The EPDM also has a molecular weight distribution greater than 3.0. The composition has a dissipation factor less than or equal to 0.01 radians as measured in accordance with ASTM D 150 (130° C., 60 Hz).

Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.

Abstract: Provided is an ethylene-?-olefin-nonconjugated polyene copolymer having ethylene units, ?-olefin units and nonconjugated polyene units, wherein the copolymer satisfies the following requirements: (A): the intrinsic viscosity [?] is 0.5 to 1.8 dl/g, (B): the content of ethylene units is 50 to 90 mol % and the content of ?-olefin units is 50 to 10 mol % where the sum total of the contents of ethylene units and ?-olefin units is taken as 100 mol %, (C): the iodine value is 1 to 50, (D): the ratio of tan ? taken at 100° C. and 2 cpm to tan ? taken at 100° C. and 1000 cpm is from 1.0 to 1.7, and (E): the ratio of the Z-average molecular weight to the number average molecular weight is from 15 to 25 and the weight average molecular weight to the number average molecular weight is from 3 to 5.

Abstract: Described is a resinous article of manufacture that is wrinkle-resistant and is warpage-resistant when subjected to very high temperatures. Such an article is useful as an optical lens.

Abstract: [Task to Be Achieved] To provide a chemically amplified type positive copolymer for semiconductor lithography, which has eliminated the problems of prior art, has a high development contrast, and has excellent resolution in fine-pattern formation; a composition for semiconductor lithography which contains the copolymer; and a process for producing the copolymer. [Means for Achievement] The copolymer for semiconductor lithography according to the present invention is a copolymer which has at least (A) a repeating unit having a structure which has an alkali-soluble group protected by an acid-labile, dissolution-suppressing group, (B) a repeating group having a lactone structure and (C) a repeating group having an alcoholic hydroxyl group and which is characterized by having an acid value of 0.01 mmol/g or less as determined by dissolving the copolymer in a solvent and subjecting the solution to neutralization titration with a solution of an alkali metal hydroxide using Bromothymol Blue as an indicator.

Abstract: A polymer includes (a) one or more first monomeric units, each independently comprising at least one bicycloheptyl-polyether, bicycloheptenyl-polyether or branched (C5-C50)alkyl-polyether group per monomeric unit, wherein the bicycloheptyl-polyether or bicycloheptenyl-polyether group may optionally be substituted on one or more ring carbon atoms by one or two (C1-C6)alkyl groups per carbon atom, and (b) one or more second monomeric units, each independently comprising at least one pendant linear or branched (C5-C50)alkyl-polyether group per monomeric unit, provided that the first and second monomeric units cannot both comprise a branched (C5-C50)alkyl-polyether group and is useful as a component in liquid compositions, such as aqueous latex coating compositions, personal care compositions, home care compositions, and institutional or industrial care compositions.

Abstract: Objects of the invention are to obtain ethylene copolymers which have excellent rubber elasticity even without being crosslinked and maintain sufficient shaping processability even when filled with significantly large amounts of additives, and to provide methods for producing with good productivity films or sheets having flexibility and high stretchability. The invention is directed to an ethylene copolymer (X) including structural units derived from a component [A], a component [B] and a component [C] which are ethylene [A], an ?-olefin of 3 to 20 carbon atoms [B] and a polyene and/or a cyclic olefin [C]. In the ethylene copolymer, (1) the content of structural units derived from the ethylene [A] is in the range of 50 to 90 mol % in 100 mol % of all the structural units in the copolymer (X); (2) the content of structural units derived from at least one polyene and/or the cyclic olefin [C] is in the range of 1.0 to 5.

Abstract: Provided according to the present invention are an adamantyl (meth)acrylate represented by formula (1), having a formazin standard turbidity of less than 1.7 NTU (Nephelometric Turbidity Unit) in methylethylketone or tetrahydrofuran, and also a (meth)acrylic copolymer comprising the adamantyl (meth)acrylate as a repeating unit: (in the formula, R1 represents hydrogen or a methyl group; R2 through R4 each independently represent a hydrogen atom, a hydroxyl group, an alkyl group having a carbon number of 1 to 3, an aryl group, an alkoxy group, an aryloxy group, a halogen group, an alkyl halide group, or a hydroxyalkyl group; and n1 represents 0 or 1).

Abstract: Disclosed is a dispersing agent to be used for dispersing metal particles, comprising a structural unit originating from a compound represented by a general formula of wherein R1 is a hydrogen atom or a methyl group, R2 is a hydrogen atom, an alkyl group with a carbon number equal to or greater than 1 and equal to or less than 9, a phenyl group, a bicyclopentenyl group, or a nonylphenyl group, x is 2 or 3, and n is equal to or greater than 1, and a structural unit that has an ionic group, wherein a number average molecular weight of the compound represented by general formula (I) is equal to or less than 10000.

Abstract: A binder composition for a rechargeable battery, including a binder polymer having a glass transition temperature (Tg) of 20° C. or less, and having a storage modulus (60° C.) of 50-150 MPa. The binder composition according to an embodiment can improve life characteristics of the rechargeable battery by efficiently controlling expansion of a negative electrode plate.

Abstract: The present invention relates to a polymer having a novel structure and a photosensitive resin composition comprising the same. A photosensitive resin composition comprising a polymer according to the present invention has a high taper angle and excellent adhesion strength. Accordingly, the photosensitive resin composition comprising the polymer according to the present invention may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.

Abstract: A soluble UVA and/or UVB absorbing chromophore-comprising polymer useful for preparation of a sunscreen lotion has a multiplicity of repeating units where one or more of the repeating units includes at least one UVA and/or UVB absorbing chromophore. The repeating units are those formed from the ring-opening metathesis polymerization (ROMP) of a strained cycloakene, cycloalkadiene, bicycloalkene, or bicycloalkadiene, or where one or more sp3 hybridized carbons of the strained cycloakene, cycloalkadiene, bicycloalkene, or bicycloalkadiene is replaced with a heteroatom. The UVA and/or UVB absorbing chromophore-comprising polymer can be formed from a UVA and/or UVB absorbing chromophore-comprising monomer, which can be homopolymerized or copolymerized by ROMP. Alternately, the UVA and/or UVB absorbing chromophore-comprising polymer can be formed by polymerization of monomers that can subsequently be substituted with UVA and/or UVB absorbing chromophores.

Abstract: A photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group or one of a specified subset of alicyclic hydrocarbon groups, alicyclic hydrocarbon groups, or hydrocarbon groups; R6 is a hydrogen atom or one of a specified subset of hydrocarbon groups or alicyclic hydrocarbon groups; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1. Also disclosed is a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the formula (3): wherein R8 is a hydrogen atom or a methyl group, and R9 is one of a specified subset of hydrocarbon groups.

Abstract: A polymer for an optical film including: a repeating unit A including a repeating unit represented by the following Chemical Formula 1; and a repeating unit B derived from a monomer including an unsaturated bond copolymerizable with the repeating unit A: wherein, in Chemical Formula 1, the variables R1 to R9 are defined herein.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: (P) a resin that contains (A) a repeating unit capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid in a side chain of the resin (P) and (C) a repeating unit represented by the following formula (I) as defined in the specification, wherein a polydispersity of the resin (P) is 1.20 or less.

Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.

Abstract: A vinyloxy group-containing vinyl polymer, useful as a heat or light curing reactive prepolymer, containing at least a constituent unit expressed by the following formula (I):

Abstract: A resist resin composition includes 100 parts by weight of a copolymer represented by Formula 3 below; 0.5 to 1.5 parts by weight of a photoacid generator and 700 to 1,500 parts by weight of a solvent: wherein R1, R2, and R3 are each independently a C1-30 alkyl group, a C3-30 cycloalkyl group, an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitrile group, or an aldehyde group, R4, R5, and R6 are each independently hydrogen or a methyl group, and l, m, n, and o each independently refer to the number of repeating units in a main backbone and satisfy the conditions: l+m+n+o=1, 0?l/(l+m+n+o)<0.4, 0<m/(l+m+n+o)<0.6, 0?n/(l+m+n+o)<0.6, and 0<o/(l+m+n+o)<0.4.

Abstract: Disclosed is a pH responsive polymer made with mono-[2-(methacryloyloxy)ethyl]phthalate and/or mono-[2-(methacryloyloxy)ethyl hexahydro]phthalate. Also disclosed is an aqueous coating composition including at least one latex polymer derived from at least one monomer copolymerized or blended with alkali swellable acrylate copolymer. Also provided is an aqueous coating composition including at least one latex polymer derived from at least one monomer blended with alkali swellable acrylate copolymer, at least one pigment, and water. Also provided is a method of preparing an aqueous coating composition such as a latex paint including the above components. Also provided are methods of preparing mono-[2-(methacryloyloxy)ethyl]phthalate. Also provided are conpositions and methods using the polymer in hydraulic fracturing, personal care and or home and industrial cleaners.

Abstract: The present invention relates to a method of preparing an ethylene-?-olefin-diene copolymer and an ethylene-?-olefin-diene copolymer prepared thereby, by using a transition metal compound based on a cyclopenta[b]fluorenyl group as a catalyst.

Abstract: Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cyclicmulticyclic compound having a high glass transition temperature at as its main chain. In addition, the photoreactive polymer has a relatively large vacancy so that a photoreactive group can move relatively freely in the main chain therein. As a result, a slow photoreaction rate, which is a disadvantage of a conventional polymer material used to form an alignment layer for a liquid crystal display device, can be overcome.