Abstract: A compound represented by general formula (I) shown below; and a polymeric compound having a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; A represents a divalent hydrocarbon group of 2 or more carbon atoms which may have a substituent; B represents a divalent hydrocarbon group of 1 or more carbon atoms which may have a substituent; and R2 represents an acid dissociable, dissolution inhibiting group.

Abstract: The invention relates to polymeric transition metal catalysts, to processes for preparing them, to intermediates and also to the use of the transition metal catalysts as catalysts in organic reactions, in particular in olefin metathesis reactions.

Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

Abstract: A resist protective coating material is provided comprising an ?-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography.

Abstract: A high-quality cellulose acylate film and saturated norbornene resin film which are produced by a melt film formation method and can be inhibited from having steak failures. Also provided is a process for producing the cellulose acylate film or the saturated norbornene resin film. The process, which is for producing a cellulose acylate film (12) or a saturated norbornene resin film, comprises melting a cellulose acylate resin or saturated norbornene resin with an extruder (22), feeding the molten resin to a die (24) through a piping (23), and ejecting the melt in a sheet form from the die (24) onto a cooled support (26) which is running or rotating to thereby cool and solidify the sheet. Thus, a cellulose acylate film (12) or saturated norbornene resin film is formed. In the process, a static mixer (27) is disposed in the piping (23) and the molten resin flowing in the piping (23) is statically stirred.

Abstract: Vinyl addition polymer compositions, methods for forming such compositions, methods for using such compositions to form microelectronic and optoelectronic devices are provided. The vinyl addition polymer encompassed by such compositions has a polymer backbone having two or more distinct types of repeat units derived from norbornene-type monomers independently selected from monomers of Formula I: wherein each of X, m, R1, R2, R3, and R4 is as defined herein and wherein a first type of repeat unit is derived from a glycidyl ether substituted norbornene monomer and a second type of repeat unit is derived from an aralkyl substituted norbornene monomer.

Abstract: The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.

Abstract: A novel cycloolefin copolymer that can be employed in the production of molding with fewer defects, for example, fewer gel particles (fish eyes). There is provided a cycloolefin copolymer comprising 80 to 20 mol % of repeating units derived from an ?-olefin monomer and 20 to 80 mol % of repeating units derived from at least one cycloolefin monomer selected from the group consisting of monomer of the general formula (I), monomer of the general formula (II), monomer of the general formula (III), monomer of the general formula (IV) and monomer of the general formula (V), wherein with respect to the repeating units derived from cycloolefin monomer, the proportion thereof being present in the form of dimer (Rd) is 50 mol % or below and the proportion thereof being present in the form of trimer (Rt) 5 mol % or above.

Abstract: A norbornene-based polymer contains at least one kind of a repeating unit represented by the following formula (I): wherein R1 and R2 each represent a hydrogen atom, an alkyl group which may possess a substituent group or an aryl group which may possess a substituent group, L and L? each represent a bivalent linking group or a single bond, and A and A? each represent an aromatic group.

Abstract: A composition includes a coupling agent composition and a polymer precursor. The coupling agent includes a first cycloolefin substituted with at least one anhydride group and the coupling agent is capable of bonding to a filler having a corresponding binding site. The polymer precursor includes a second cycloolefin. An associated article and a method are also provided.

Abstract: A retardation film, formed by stretching a film including a norbornene-based, ring-opening polymer containing a structural unit (A) represented by a formula (1), has high transparency, excellent wavelength dispersion characteristics in a single layer, is capable of providing specific retardation to broadband light, is extremely adhesive to other materials, is capable of attaining optical characteristics that are unique among negative birefringence characteristics, and is capable of providing a reverse dispersion of birefringence wavelength dispersion characteristics. The present invention also provides a liquid crystal display device using the foregoing film.

Abstract: Dental material being polymerizable by ring-opening metathesis polymerization comprising (i) at lest one ruthenium complex bearing at least one N-heterocyclic carbene ligand or precursors which generate a ruthenium complex bearing at least one N-heterocyclic carbene ligand in situ; and (ii) at least one cyclic olefin capable of metathesis.

Abstract: A polymer for immersion lithography comprising a repeating unit represented by Formula 1 and a photoresist composition containing the same. A photoresist film formed by the photoresist composition of the invention is highly resistant to dissolution, a photoacid generator in an aqueous solution for immersion lithography, thereby preventing contamination of an exposure lens and deformation of the photoresist pattern by exposure.

Abstract: A photoresist polymer comprising a fluorine component, a photoresist composition containing the photoresist polymer and an organic solvent to reduce surface tension, and a method for manufacturing a semiconductor device using the same by forming a photoresist film uniformly on the whole surface of an underlying layer pattern to allow a subsequent ion-implanting process to be performed stably.

Abstract: The present invention provides a negative C-plate type optical anisotropic film having negative birefringence along the thickness direction. In particular, the present invention provides a film comprising cycloolefin addition polymer, which is prepared by addition polymerizing norbornene-based monomers, a method for preparing the same, and a liquid crystal display comprising the same. The film of the present invention can be used for optical compensation films of a variety of LCD (liquid crystal display) modes because the refractive index alone the thickness direction can be controlled by the kind and amount of functional groups introduced to the cycloolefin addition polymer.

Abstract: A polymerizable composition including a late transition metal complex, a non-polar olefin, a polar olefin, and a free radical scavenger, wherein the polymerizable composition is capable of forming a linear poly[(non-polar olefin)-(polar olefin)] substantially free of free radical addition polymer, is disclosed. A method of copolymerizing a non-polar olefin with a polar olefin, catalyzed by a late transition metal complex in the presence of a free radical scavenger, to produce a linear poly[(non-polar olefin)-(polar olefin)] substantially free of free radical addition polymer is also disclosed.

Abstract: This disclosure relates to olefin polymerization processes for polymerizing ethylene, higher alpha-olefin comonomer and at least one diene, especially vinyl norbornene (VNB), and especially processes for producing amorphous or semi-crystalline polymers such as ethylene propylene diene (EPDM).

Abstract: A copolymer contains 10 to 69 mol % of a structural unit derived from propylene, 1 to 50 mol % of a structural unit derived from at least one ?-olefin having a carbon number of from 4 to 20 and 30 to 89 mol % of a structural unit derived from at least one cyclic olefin represented by the formula (1) as defined herein, and has a weight average molecular weight of from 50,000 to 1,000,000.

Abstract: The invention provides certain novel water-soluble and water-insoluble monomers for ring opening metathesis polymerization and novel polymers, compositions and products, and related methods thereof.

Abstract: The present invention relates to novel unsaturated polycyclic compounds containing two fluoroalcohol substitutents. This invention also relates to homopolymers and copolymers derived from such unsaturated polycyclic compounds. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.

Abstract: It is an object of the present invention to provide a sealant for a One prop Fill process which hardly causes a peeling phenomenon between the sealant and a substrate in production of liquid crystal display device since the sealant has excellent adhesion to the substrate, and which is most suitable for producing a liquid crystal display device having low color irregularity in liquid crystal display since the sealant does not cause liquid crystal contamination, and relates to a sealant for a One prop Fill process, in which in production of liquid crystal display device by a One prop Fill process, even a portion where light may be not directly irradiated can be adequately cured, a liquid crystal is not deteriorated by ultraviolet light to be irradiated in curing the sealant, and high display quality and high reliability of the liquid crystal display device can be realized, a vertically conducting material, and a liquid crystal display device obtained by using these.

Abstract: A polymer is composed of recurring units of hydroxyvinylnaphthalene, (meth)acrylic units having a lactone ring fused to a bridged ring, and (meth)acrylic units having acid labile groups. A positive resist composition comprising the polymer as a base resin, when exposed to high-energy radiation and developed, exhibits a high sensitivity, a high resolution, and a minimal line edge roughness due to controlled swell during development.

Abstract: A cyclic olefin-based polymer containing a repeating unit represented by formula (1), an optical material containing the cyclic olefin-based polymer, a polarizing plate containing the optical material, and a liquid crystal display device containing the polarizing plate: in which R1 represents a substituent; L represents a single bond or a divalent linking group, and forms an alcohol together with the —OH group; p represents an integer of 0 or 1; q represents an integer of from 0 to 3; r represents an integer of from 1 to 4; and R1 and L may be combined with each other to form a 5- to 7-membered ring.

Abstract: A polymer comprising recurring units of formula (1) wherein R1 is F or fluoroalkyl, R2 is alkylene or fluoroalkylene, and R3 is an acid labile group and having a Mw of 1,000-500,000 is used to formulate a resist composition, which is processed by the lithography involving ArF exposure and offers many advantages including resolution, minimal line edge roughness, etch resistance, and minimal surface roughness after etching. The composition performs well when processed by the ArF immersion lithography with liquid interposed between the projection lens and the wafer.

Abstract: A process for manufacturing a cycloolefin addition polymer includes polymerizing monomers containing a cycloolefin compound using a catalyst containing a nickel compound or a palladium compound by addition polymerization in the presence of a molecular weight controlling agent in two steps, that is a step of a initiating the polymerization reaction using the monomers in an amount of not more than 80 wt % of the total monomers and a step of supplying the remaining monomers to the reaction system during the polymerization reaction. A cycloolefin addition polymer with a uniform quality, having a narrow molecular weight distribution and a controlled molecular weight, and excellently balanced processability and mechanical strength can be obtained at a high polymerization conversion rate using the process. The process can be operated at a highly controlled polymerization temperature, and is thus suitable for industrially manufacturing a cycloolefin addition polymer.

Abstract: A norbornene addition copolymer obtained by subjecting a norbornene monomer (A), an aromatic vinyl compound (B), and an ?-olefin having 2 to 20 cabon atoms (C) to addition copolymerization, the sum of the content of repeating units derived from the norbornene monomer (A) and the content of repeating units derived from the aromatic vinyl compound (B) being 25 to 90 mol % based on the total repeating units, and the content of repeating units derived from the aromatic vinyl compound (B) being 0.55 to 10 (mol) times the content of repeating units derived from the norbornene monomer (A); and a molded article obtained by molding the norbornene addition copolymer. According to the present invention, a norbornene addition copolymer exhibiting excellent transparency, a high refractive index, and a small intrinsic birefringence value, and a molded article obtained by molding the norbornene addition copolymer are provided.

Abstract: The invention relates to a process for the production of post-crosslinkable thermoplastic resins by bulk-polymerizing a polymerizable composition (A) comprising (I) a monomer fluid containing a cyclic olefin (?) having two or more metathetical ring-opening reaction sites in the molecule in an amount 10 wt % or above based on the total amount of the monomers or a monomer fluid containing a norbornene monomer and a crosslinking agent, (II) a metathetical polymerization catalyst, and (III) a chain transfer agent; thermoplastic resins obtained by this process; and a process for producing crosslinked resins or crosslinked resin composite materials which comprises laminating such a thermoplastic resin with a substrate at need and then crosslinking the thermoplastic resin. According to the invention, thermoplastic resins which are free from odor due to residual monomers and excellent in storage stability can be efficiently obtained by a simple process of bulk-polymerizing the composition (A).

Abstract: A noble alicyclic unsaturated compound represented by the general formula (1): wherein at least one of R1 and R2 is a fluorine atom or a fluorinated alkyl group; a polymer formed by the polymerization of a polymer precursor comprising the alicyclic compound. The polymer is useful, in the lithography using a light having a wavelength of 190 nm or less, as a chemically amplified resist which exhibits excellent transparency with respect to the light for use in exposure and also is excellent in the adhesion to a substrate and the resistance to dry etching.

Abstract: The present invention relates to a method of preparing a copolymer having controlled gel content by polymerizing cyclic olefin compound by ROMP (Ring Opening Metathesis Polymerization), and more precisely, a method of preparing cyclic olefin copolymer with high yield, in which a complex prepared by mixing a W salt compound and an organoaluminum halide compound is used as a catalyst in the presence or absence of a molecular weight regulator, and a method of controlling gel formation by regulating the composition of cyclic olefin monomer composing a copolymer as shown in the following Empirical Formula 1 without using a reaction speed regulator or gel formation inhibitor. (Empirical Formula 1) Norbornene=30˜70 weight % Cyclic olefin compound=70˜30 weight % At this time, the cyclic olefin compound presented in the above Empirical Formula 1 is one or more compounds selected from a group consisting of dicyclopentadiene and compounds represented by the following Formula 1.

Abstract: Provided are a barrier coating composition and a method of forming photoresist pattern by an immersion photolithography process using the same. The barrier coating composition includes a polymer corresponding to formula I having a weight average molecular weight (Mw) of 5,000 to 100,000 daltons and an organic solvent, wherein the expressions 1+m+n=1; 0.1?1/(1+m+n)?0.7; 0.3?m/(1+m+n)?0.9; and 0.0?n/(1+m+n)?0.6 are satisfied; Rf is a C1 to C5 fluorine-substituted hydrocarbon group; and Z, if present, includes at least one hydrophilic group. Compositions according to the invention may be used to form barrier layers on photoresist layers to suppress dissolution of photoresist components during immersion photolithography while allowing the barrier layer to be removed by alkaline developing solutions.

Abstract: A polymerizable composition which comprises a cycloolefin monomer (A), a filler (B), a polymer (C) having a carboxyl group or a carboxylic acid anhydride group and having an acid value of 0.1 to 100 mgKOH/g, and a metathesis polymerization catalyst (D). The polymerizable composition comprises a cycloolefin monomer and a large amount of a filler, and has a low viscosity and is excellent in fluidity, and further can provide a molded product which is excellent in the lowness of dielectric constant, the lowness of dielectric loss tangent, the lowness of linear expansion coefficient, high heat resistance and adhesiveness, and further is free of bubble inclusion.

Abstract: A cyclic olefin polymer is provided and includes a repeating unit represented by formula (1A) and a repeating unit represented by the formula (1B): R1 and R3 each independently represents a substituent, L1 and L2 each independently represents a single bond or a divalent linking group, m and p each independently represents an integer of 0 or 1, and n and q each independently represents an integer of 1 to 4; and A represents COOR2 or OCOR2, and R2 represents a linear alkyl group having a carbon number of 1 to 10. The cyclic olefin polymer has a copolymerization ratio of x and y satisfying 0.03?y/(x+y)?0.50, a number average molecular weight of from 70,000 to 300,000, and a weight average molecular weight of from 200,000 to 700,000.

Abstract: A cycloolefin copolymer obtained by ring opening polymerization according to the present invention is characterized by comprising a specific structural unit and exhibiting a single peak in a derivative differential scanning calorimetry curve obtained by differential scanning calorimeter (DSC), having a temperature width of the rising part in the peak of 35° C. or below, and having a glass transition temperature (Tg) of 110° C. or above. The cycloolefin copolymer provided by the present invention has excellent heat resistance and optical properties, is suitable for the formation of a film or sheet therefrom, and can be stretched even at a relatively low temperature around the Tg without causing troubles such as cloudiness. A film or sheet comprising the cycloolefin copolymer, which has excellent optical properties and heat resistance and is also suitable for stretching even at a relatively low temperature, is also provided.

Abstract: The present invention relates to a norbornene based addition polymer, and more particularly to an addition polymer of norbornene based monomers containing an ester group. The present invention provides a norbornene-ester based addition polymer having a molecular weight (Mn) larger than 20,000 and comprising a norbornene-ester based monomer comprising more than 50 mol % of exo norbornene-ester monomer as a repeating unit, a method for preparing the same, and an optically anisotropic film comprising the same. The norbornene-ester based addition polymer of the present invention is transparent, has a low dielectric constant, has good thermal stability and strength, leaves no unwanted materials when attached to metals or other polymers, and has good adhesivity, so that it can be used for optical films, retardation films, plastic substrate materials, transparent polymers such as POF or PCB, insulating materials, or insulating electronic devices such as PCB or insulating materials.

Abstract: The present invention provides a star polymer which comprises a central core and three or more branches bonded to the central core, and has a weight average molecular weight of from 1,000 to 100,000, wherein at least one of the branches containing at least one repeating unit selected from the group consisting of the following repeating units (1), (2), (3), (4) and (9); and a process for producing the star polymer. The present invention also provides a chemically amplified positive resist composition comprising the star polymer and an acid generator.

Abstract: Oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making such oligomers that includes reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the case of allylic monomers in the presence of a free radical initiator. The oligomers can be included in photoresist compositions as dissolution rate modifiers. The photoresist compositions can further include a polymeric binder resin, a photoacid generator, and solvents.

Abstract: A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the deprotection reaction of the spiro cyclic ketal group, and can produce fine photoresist patterns due to its low PEB (Post Exposure Baking) temperature sensitivity.

Abstract: The invention pertains to low polydispersity copolymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity copolymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.

Abstract: The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.

Abstract: The present invention is a polar group-containing olefin copolymer having excellent adhesion properties to metals or polar resins and excellent compatibility therewith. A process for preparing the copolymer, a thermoplastic resin composition containing the copolymer, and uses thereof are also described. The polar group-containing olefin copolymer comprises a constituent unit derived from an ?-olefin of 2 to 20 carbon atoms, and a constituent unit derived from a straight-chain, branched or cyclic polar group-containing monomer having at the end a polar group such as a hydroxyl group or an epoxy group and/or a constituent unit derived from a macromonomer having at the end a polymer segment obtained by anionic polymerization, ring-opening polymerization or polycondensation.

Abstract: The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.

Abstract: A norbornene-based polymer, which is formed by addition polymerization of a composition comprising at least one norbornene derivative represented by formula (1): wherein R1, R2, R3, R4, R5, R6, R7 and R8 each independently represents a hydrogen atom or a substituent; and n represents an integer of 0 to 2.

Abstract: It is the object of the present invention to provide a retardation film comprising a norbornene type copolymer, being excellent in heat resistance, low specific gravity, low birefringence, low photoelasticity, and low chromatic dispersion and having high performance of retardation compensation.

Abstract: A low-k organic dielectric material having stable nano-sized porous is provided as well as a method of fabricating the same. The porous low-k organic dielectric material is made from a composition of matter having a vitrification temperature (Tv-comp) which includes a b-staged thermosetting resin having a vitrification temperate (Tv-resin), a pore generating material, and a reactive additive. The reactive additive lowers Tv-comp below Tv-resin.

Abstract: A norbornene-based polymer, which is formed by addition polymerization of a composition comprising at least one norbornene derivative represented by formula (1): wherein R1, R2, R3, R4, R5, R6, R7 and R8 each independently represents a hydrogen atom or a substituent; and n represents an integer of 0 to 2.

Abstract: The present invention relates to a chemically amplified polymer having a pendent group with dicyclohexyl bonded thereto, a process for the preparation thereof, and a resist composition comprising it, and more particularly, to a novel (meth)acrylic or norbornene carboxylate compound with dicyclohexyl bonded thereto, a process for the preparation thereof, a chemically amplified polymer synthesized therewith, and a positive photoresist composition for ArF comprising said polymer, with high resolution and excellent etching resistance.

Abstract: The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.

Abstract: A (meth)acrylate represented by the following formula (1): wherein each of R1, R2, R3 and R4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X1 or X2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A1 and A2 represent hydrogen atoms, or A1 and A2 form —O—, —CH2— or —CH2CH2—, which can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol; a polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.

Abstract: The present invention relates to novel functional norbornenes as initiators for radical polymerization, its polymer and a process for producing the same. More particularly, the novel functional norbornenes can be selectively polymerized by ring-opening metathesis polymerization or radical polymerization to obtain various polynorbornene derivatives or grafted copolymer materials. The polynorbornene derivatives and grafted copolymer materials not only exhibit excellent functional properties but also enhanced physical and chemical properties after modification. The polynorbornene derivatives and grafted copolymer materials disclosed in the present invention exhibit excellent heat resistance, transparency and water resistance. The present invention also deals with a process for producing such derivatives and materials having controllable molecular weight with narrow molecular weight distribution.

Abstract: The invention is a curable cyclobutarene based polymer comprising acid functional pendant groups. The cured polymer displays excellent qualities of toughness, adhesion, dielectric constant, and low stress. The preferred system is soluble in an aqueous base and can be used to generate patterned films with excellent resolution without the need to handle organic developer solvents.