Abstract: A polymer composition for use in forming a stent is described. The composition includes a monomer of an aliphatic ester of acrylic acid which has a glass transition temperature less than 25° C. and a second monomer that copolymerizes with the first monomer and which has a glass transition temperature greater than 25° C. The components in the composition are mixed in amounts suitable to give a copolymer having a glass transition temperature less than 25° C., or in case of block copolymers, having at least one glass transition temperature less than 25° C. A stent including polymer members formed from the described composition is also disclosed.

Abstract: A thermoplastic polymer containing glutaric anhydride units of the following general formula (1) and having an absorbance at a wavelength of 280 nm of at most 0.5 (the absorbance is a value of the polymer film having a thickness of 100 ?m, measured with a UV-visible spectrophotometer) and a glass transition temperature of not lower than 130° C. has high-level colorless transparency and good heat resistance, moldability and dwell stability. wherein R1 and R2 are the same or different and each represents a hydrogen atom or an alkyl group having from 1 to 5 carbon atoms.

Abstract: A coating having an adhesive hydrophilic polymer and an amphiphilic additive. The amphiphilic additive has a hydrophilic chain, a biocidal functional group bonded to the hydrophilic chain, and a hydrophobic moiety bonded to the hydrophilic chain or to the biocidal functional group. A method of forming a biocidal surface by providing an article, and coating the article with the above coating. A compound having the formula: Y—(O—CH2—CH2)n—R—(CH2)m—CH3. Y is CH3 or H. R is X is a halogen, and m and n are independently selected positive integers.

Abstract: Curable formulations comprising: (a) at least one multifunctional acrylate having a functionality of at least two, (b) at least one mono-acrylate monomer, (c) at least one heteroatom-containing diacrylate, wherein the heteroatom is sulfur or selenium; and (d) a curing agent, have been discovered. The curable formulations show promise as precursors to high refractive index materials suitable for use in light management devices and other optical devices. In addition the novel curable formulations are useful for producing coatings, which may be useful in forming display films, in particular brightness enhancing display films.

Abstract: Disclosed are multi-purpose alkali-swellable and alkali soluble associative polymers, which are the polymerization product of a monomer mixture comprising: (a) at least one acidic vinyl monomer; (b) at least one nonionic vinyl monomer; (c) a first associative monomer having a first hydrophobic end group; (d) a monomer selected from the group consisting of a second associative monomer having a second hydrophobic end, a semihydrophobic monomer and a combination thereof; and, optionally, (e) one or more crosslinking monomers or chain transfer agents. When monomer (d) is an associative monomer, the first and second hydrophobic end groups of monomers (c) and (d) have significantly different hydrophobic and/or steric character from one another. The multi-purpose associative polymers surprisingly provide desirable Theological and aesthetic properties in aqueous media.

Abstract: Covalently-bound, hydrophilic copolymer coatings for implants are disclosed. The copolymer coatings comprise a hydrophobic aryl acrylic monomer, a hydrophilic monomer selected from the group consisting of hydroxyalkyl (meth)acrylates, n-vinyl pyrrolidone and acrylamides, and a (meth)acrylamide reactive plasticizer.

Abstract: A polymer composition for use in forming a stent is described. The composition includes a monomer of an aliphatic ester of acrylic acid which has a glass transition temperature less than 25° C. and a second monomer that copolymerizes with the first monomer and which has a glass transition temperature greater than 25° C. The components in the composition are mixed in amounts suitable to give a copolymer having a glass transition temperature less than 25° C., or in case of block copolymers, having at least one glass transition temperature less than 25° C. A stent including polymer members formed from the described composition is also disclosed.

Abstract: The present invention provides copolymers made up of alkoxyalkyl methacrylate and/or alkoxyalkyl acrylate monomers in combination with one or more additional hydrophobic monomers. The copolymers may be used in the manufacture of intraocular lenses, including both the optic and haptic portions of the lenses. The present invention also provide methods for making intraocular lenses from the copolymers.

Abstract: Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.

Abstract: The invention provides novel polymers and photoresist compositions that comprise the polymers as a resin component. Polymers of the invention contain two distinct groups which can undergo a deblocking reaction in the presence of photogenerated acid, wherein one of the deblocking moieties is an acetal group. The second photoacid-labile group is suitably an ester, particularly as provided by polymerization of an alkyl acrylate group, such as t-butylmethacrylate.

Abstract: The present invention relates compositions containing acetoacetylated polyvinyl polymers obtained from polyvinyl polymers, such as polyvinyl butyrals. These coating compositions are especially suitable for use as wash primers in automotive OEM and refinish coating applications.

Abstract: Novel cross linked polymer films prepared from poly4-[(4-cardanylazo]benzoic acid and poly4-[(4-acryloylcardanylazo]benzoic acid are disclosed. The invention also relates to novel monomers 4-[(4-cardanylazo] benzoic acid and 4-[(4-acryloylcardanylazo] benzoic acid and polymers thereof as well processes for the preparation thereof.

Abstract: It is an object of the present invention to provide a polycarboxylic acid copolymer which improves the water reducing capacity and workability of cement compositions and the like and making them easier to handle when the fluidity and water reducing capacity are at the same levels, a method of producing the copolymer, and a cement additive and a cement composition comprising the copolymer. The present invention is further to provide a polycarboxylic acid copolymer and a cement additive which are capable of improving the strength and durability of hardening products of cement compositions, hence can advantageously be used in ultrahigh strength concrete. The present invention is still further to provide a method of producing polycarboxylic acid copolymers having high water reducing capacity, reducing the viscosity of cement compositions and improving the workability in applying cement.

Abstract: A polymer comprising recurring units of formula (2) is prepared by effecting deblocking reaction on a polymer comprising recurring units of formula (1) in the presence of an acid catalyst. In the formulae, R1 and R4 are H or methyl, R2 and R3 are C1-C10 alkyl, or R2 and R3 may form a ring, R5 is H, hydroxyl, alkyl, alkoxy or halogen, R6 and R7 are H, methyl, alkoxycarbonyl, cyano or halogen, R8 is C4-C20 tertiary alkyl, n is an integer of 0 to 4, p is a positive number, q and r each are 0 or a positive number, exclusive of q=r=0, p1 is a positive number, p2 is 0 or a positive number, and p1+p2=p. The polymer thus produced has a narrower molecular weight distribution than polymers produced by the prior art methods. A resist composition comprising the polymer as a base resin has advantages including a dissolution contrast of resist film, high resolution, exposure latitude, process flexibility, good pattern profile after exposure, and minimized line edge roughness.

Abstract: A novel polymer is obtained by copolymerizing a (meth)acrylic acid derivative with a vinyl ether compound, an allyl ether compound and an oxygen-containing alicyclic olefin compound. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.

Abstract: An aqueous dispersion of a fluorocopolymer, which is excellent in stability and film-forming properties as an aqueous dispersion, and which gives a coating film excellent in mechanical strength and improved in transparency, water resistance and stain resistance. A stable aqueous dispersion of a fluorocopolymer obtained in such a manner that a fluorocopolymer comprising polymerized units based on a vinyl monomer having a reactive group as the base is subjected to a composite treatment or a mixing treatment with a (meth)acrylate containing a reactive group capable of forming a bond by reaction with the above reactive group or the like.

Abstract: A photosensitive polymer having a hydroxy alkyl vinyl ether monomer and a resist composition are provided. The photosensitive polymer includes an alkyl vinyl ether monomer having the formula, and the photosensitive polymer has a weight average molecular weight of 3,000 to 50,000: where x is an integer from 3 to 6 inclusive, R1 and R2 are independently alkyl having from 1 to 20 carbon atoms, fluorinated alkyl having from 1 to 10 carbon atoms or perfluoronated alkyl having from 1 to 10 carbon atoms.

Abstract: Disclosed is an organic anti-reflective film composition suitable for use in submicrolithography, comprising a compound of Formula 13 and a compound of Formula 14. The organic anti-reflective film effectively absorbs the light penetrating through the photoresist film coated on top of the anti-reflective film, thereby greatly reducing the standing wave effect. Use of organic anti-reflective films of the present invention allows patterns to be formed in a well-defined, ultrafine configuration, providing a great contribution to the high integration of semiconductor devices. wherein b, c, R′, R″, R1, R2, R3, and R4 are those defined herein.

Abstract: A hydrophobe-containing alkali soluble or swellable copolymer thickener comprising an emulsion polymerization product of (A) an ethylenically unsaturated copolymerizable surfactant monomer having a cloud point of from about 65° C. to about 95° C., wherein the surfactant monomer has the formula M(EO)x(BO)zOR1 wherein M is a residue selected from the group consisting of an ethylenically unsaturated carboxylic acid, and an ethylenically unsaturated dicarboxylic acid, EO is an ethylene oxide unit; BO is a butylene oxide unit; x is from 10 to 45; z is from 5 to 35; provided that x+z is from 20 to 45; and R1 is selected from the group consisting of alkyl, alkylene, cycloalkyl, cycloalkylene, and arylalkyl group wherein the alkyl group has 1 to 4 carbon atoms; (B) an &agr;,&bgr;-ethylenically unsaturated monocarboxylic acid monomer; and (C) a nonionic &agr;,&bgr;-ethylenically unsaturated monomer.

Abstract: Disclosed is a polymer for use in a chemically amplified resist, a resist composition including such a polymer is suitable for use in a chemically amplified resist, which is sensitive to KrF or ArF excimer laser and forms a photoresist pattern having low dependence on and good adhesion to substrate, high transparency in the wavelength range of the above radiation, strong resistance to dry etching, and excellencies in sensitivity, resolution and developability. The resist composition can have a stronger etching resistance with a maximized content of unsaturated aliphatic ring in the polymer and a reduced edge roughness of the photoresist pattern with an alkoxyalkyl acrylate monomer employed.

Abstract: An absorbent binder composition including a monoethylenically unsaturated polymer, such as carboxylic acid, sulphonic acid, or phosphoric acid, or salts thereof, and an acrylate or methacrylate ester that contains an alkoxysilane functionality, or a monomer capable of co-polymerization with a compound containing a trialkoxy silane functional group and subsequent reaction with water to form a silanol group. The absorbent binder composition is particularly suitable for use in manufacturing absorbent articles. A method of making the absorbent binder composition includes preparing a monomer solution, adding the monomer solution to an initiator solution, and activating a polymerization initiator within the initiator solution.

Abstract: The present invention is a method of preparing an acrylic copolymer having an acid anhydride group with a number average molecular weight of 1,500-5,000 comprising; polymerizing a monomer mixture of a radical polymerizable monomer having an acid anhydride group and another radical polymerizable monomer at a temperature of 150° C. or higher by using a radical initiator, wherein the concentration of the monomer mixture is 50-75 wt %. This method can provide an acrylic copolymer having an acid anhydride group with a relatively low molecular weight that does not cause the problem of yellowing after baking when used in an acid/epoxy curing type clear paint, by means of high temperature polymerization without the use of a large amount of an expensive initiator.

Abstract: A method for the production of glass or plastic laminates is provided comprising applying between opposing faces of glass or plastic substrates a pressure sensitive adhesive comprised of a curable blend of an epoxy resin and a polymer comprised of the polymerization reaction product of an alkyl (meth)acrylate monomer whose homopolymer has a Tg>20° C., optionally a C1-30 (meth)acrylate monomer, a nitrogen-containing polar monomer, and a polymerizable epoxy-containing monomer, with the monomers being present in an amount such that the copolymer has a Tg>50° C., and curing the adhesive.

Abstract: An improved process for manufacturing a dual cure anaerobic/ultraviolet adhesive. The process includes the first step of mixing a polymerizable (meth)acrylate ester monomer, such as methacrylic acid, a chelating agent and an accelerator. The second step is heating the mixture sufficiently to provide anaerobic curing properties. Next, one or more photoinitiators are added to the composition. No chelating agent is added during the addition of the photoinitiators.

Abstract: The invention relates to a copolymer which can be obtained by radical copolymerisation of at least two components A and B. According to the invention, a) at least one ester of one at least difunctional carboxylic acid which has at least one olefinically unsaturated double bond is used with an alkyl oxide addition compound as component A and b) at least one additional monomer which can be subjected to radical polymerisation is used as component B. The invention also relates to a method for producing copolymers of this type and to the use thereof, in particular, to their use as a binding agent in adhesives.

Abstract: A composition that can be coated as a hot melt or as a high solids content solution comprises, on a percent-by-weight basis, 85-99.7% of at least one acrylic copolymer, 0.1-5% of at least one photoinitiator, and 0.2-10% of at least one multifunctional (meth)acrylate. The composition is readily crosslinked by exposure to ultraviolet light to yield a high-performance acrylic PSA.

Abstract: An organic anti-reflective polymer having the following Formula 1, its preparation method, an anti-reflective coating composition comprising the said organic anti-reflective polymer and a preparation method of an anti-reflective coating made therefrom. The anti-reflective coating comprising the disclosed polymer eliminates standing waves caused by the optical properties of lower layers on the wafer and by the thickness changes of the photoresist, prevents back reflection and CD alteration caused by the diffracted and reflected light from such lower layers. Such advantages enable the formation of stable ultrafine patterns suitable for 64M, 256M, 1G, 4G, and 16G DRAM semiconductor devices and improve the production yields. Further, it is also possible to control the k value and the increased hydrophobicity facilitates EBR (Edge Bead Removal).

Abstract: An organic anti-reflective polymer having the following Formula 1, its preparation method, an anti-reflective coating composition comprising the said organic anti-reflective polymer and a preparation method of an anti-reflective coating made therefrom. The anti-reflective coating comprising the polymer eliminates standing waves caused by the optical properties of lower layers on the wafer and by the thickness changes of the photoresist, prevents back reflection and CD alteration caused by the diffracted and reflected light from such lower layers. Such advantages enable the formation of stable ultrafine patterns suitable for 64M, 256M, 1G, 4G, and 16G DRAM semiconductor devices and improve the production yields. Another advantage is the ability to control the k value.

Abstract: An aqueous dispersion of a fluorocopolymer, which is excellent in stability and film-forming properties as an aqueous dispersion and which gives a coating film excellent in mechanical strength and improved in transparency, water resistance and stain resistance.

Abstract: A method is provided for the production of a graft copolymer or acrylate polymer blend in the presence of at least one liquid diluent comprising the steps of (1) providing a reaction mixture of at least one A monomer consisting of a monomeric (meth)acrylic acid ester of a non-tertiary alcohol in admixture with at least one liquid diluent which is non-reactive under conditions of free radical polymerization employed, optionally at least one B monomer different from said A monomer, optionally at least one polymeric graft moiety C having a Tg greater than 20° C.

Abstract: Process that is capable of synthesizing a metal-containing resin having a good antifouling property in a short period of time without having such problems associated with the synthesis as gelation. The process for producing a metal-containing resin by conducting a copolymerization reaction of a monomer mixture (A) comprising 1 to 50% by weight of a carboxyl group-containing polymerizable unsaturated monomer (a) and 50 to 99% by weight of other polymerizable unsaturated monomer (b) in an organic solvent in the presence of water and an oxide or hydroxide of a metal having a valency of at least 2, wherein the amount of water is 1 to 30 parts by weight based on 100 parts by weight of the monomer mixture (A), and the formation of a metal carboxylate bond occurs together with the copolymerization of the monomer mixture (A); and an antifouling coating composition containing, as an active constituent, a metal-containing resin obtained by the production process.

Abstract: The present invention provides a polymer that can be used as an anti-refelctive coating (ARC) polymer, an ARC composition comprising the same, methods for producing the same, and methods for using the same. The polymer of the present invention is particularly useful in a submicrolithographic process, for example, using KrF (248 nm), ArF (193 nm), or F2 (157 nm) laser as a light source. The polymer of the present invention comprises a chromophore that is capable of absorbing light at the wavelengths used in a submicrolithographic process. Thus, the ARC of the present invention significantly reduces or prevents back reflection of light and the problem of the CD alteration caused by the diffracted and/or reflected light. The ARC of the present invention also significantly reduces or eliminates the standing wave effect and reflective notching.

Abstract: Polymers are disclosed having the following formula 1 or 2: Polymers of the present invention can be used as an ARC material useful for submicrolithography processes using 248 nm KrF, 193 nm ArF and 157 nm F2 lasers. The polymers contain a chromophore substituent that exhibits sufficient absorbance at the wavelengths useful for the submicrolithography process. The ARC prevents back reflection of light from lower layers and the alteration of the CD by diffracted and reflected light from the lower layers. The ARC also eliminates standing waves and reflective notching due to the optical properties of lower layers on the wafer and to changes in the thickness of the photosensitive film applied thereon, thereby resulting in the stable formation of ultrafine patterns suitable for 64M, 256M, 1 G, 4 G and 16 G DRAMs and a great improvement in the production yield.

Abstract: Polymers are disclosed having the following formula 1 or 2: Polymers of the present invention can be used as an ARC material useful for submicrolithography processes using 248 nm KrF, 193 nm ArF and 157 nm F2 lasers. The polymers contain a chromophore substituent that exhibits sufficient absorbance at the wavelengths useful for the submicrolithography process. The ARC prevents back reflection of light from lower layers and the alteration of the CD by diffracted and reflected light from the lower layers. The ARC also eliminates standing waves and reflective notching due to the optical properties of lower layers on the wafer and to changes in the thickness of the photosensitive film applied thereon, thereby resulting in the stable formation of ultrafine patterns suitable for 64 M, 256 M, 1 G, 4 G and 16 G DRAMs and a great improvement in the production yield.

Abstract: An organic anti-reflective polymer having the following Formula 1, its preparation method, an anti-reflective coating composition comprising the said organic anti-reflective polymer and a preparation method of an anti-reflective coating made therefrom. The anti-reflective coating comprising the polymer eliminates standing waves caused by the optical properties of lower layers on the wafer and by the thickness changes of the photoresist, prevents back reflection and CD alteration caused by the diffracted and reflected light from such lower layers. Such advantages enable the formation of stable ultrafine patterns suitable for 64M, 256M, 1G, 4G, and 16G DRAM semiconductor devices, improves production yields and enables control of the k value. Further, it is also possible to prevent undercutting due to an unbalanced acidity after finishing the coating.

Abstract: Fluorochemical polymers for use in providing stain-release properties to a substrate material are disclosed. The present invention provides for polymeric fluorochemical polymers that include perfluoroaliphatic, hydrophilic, cationogenic, and either N-hydroxyalkylacrylamide and/or diacrylate monomers.

Abstract: A copolymer comprising monomers copolymerized in the following percentages by weight: (a) from about 40% to about 75% of a monomer of formula I: Rf—CH2CH2—OC(O)—C(R)═CH2  I (b) from about 15% to about 55% of a monomer of formula II: R2—OC(O)—C(R)═CH2  II (c) from 1.5% to about 5% of a monomer of the formula III: HO—CH2CH2—OC(O)—C(R)═CH2  III (d) from 1.5% to about 5% of a monomer of the formula IV: H—(OCH2CH2)m—O—C(O)—C(R)═CH2  IV (e) from 1% to about 3% of a monomer of the formula V: HO—CH2—NH—C(O)—C(R)═CH2  V (f) from 0% to about to about 9.

Abstract: Polymers are disclosed having the following formula 1 or 2: 1

Abstract: The present invention is directed to radical-curable adhesive compositions which include a (meth)acrylate component; a thermal resistance-conferring component; and a radical cure-inducing composition. Reaction products of the compositions of this invention exhibit superior resistance of thermal degradation.

Abstract: Copolymers of ethylene and alpha olefins that have been formed by a polymerization reaction in the presence of a single site catalyst, such as a metallocene, are used as a film or as a layer in multiple layer films, including molecularly oriented and irradiated heat shrinkable films. Novel blends of the copolymers with other polymeric materials are disclosed and used as a film or a layer in a film particularly in molecularly oriented and heat shrinkable films. Bags made from the multiple layer films are especially useful for shrink packaging primal cuts of meat. Processes for the formation of flexible films and packages made therefrom are also disclosed.

Abstract: The present invention is directed to radical-curable adhesive compositions which include a (meth)acrylate component; a thermal resistance-conferring component; and a radical cure-inducing composition. Reaction products of the compositions of the compositions of this invention exhibit superior resistance to thermal degradation.

Abstract: A resin composition for an aqueous paint containing different phase structure emulsion particles obtained by multi-stage emulsion polymerization as a binder, wherein the different phase structure emulsion particles have an outermost phase formed by an emulsion polymer of an ethylenic unsaturated monomer, having a glass transition temperature of from −50° C. to 10° C., and satisfy the following conditions (1) to (3): (1) the emulsion polymer forming the outermost phase contains from 1 to 20 mass % of an ethylenic unsaturated monomer having at least one of a polyethylene glycol chain and a polypropylene glycol chain, (2) at least one phase of inner phases from the outermost phase of the different phase structure emulsion particles comprises an emulsion polymer of an ethylenic unsaturated monomer having a glass transition temperature of from 30° C. to 110° C., and (3) the binder has a minimum film-forming temperature of at most 10° C.

Abstract: A polymer support is provided which comprises hydroxypolyC2-4 alkyleneoxy chains attached to a cross-linked polymer. The hydroxypolyC2-4 alkyleneoxy chain contains from 2 to 8 C2-4 alkyleneoxy groups and the polymer support has from about 0.1 to about 5 meq free hydroxy groups per gram of polymer. Preferably, the cross linked polymer is a copolymer comprising phenylethylene and 4-hydroxyphenylethylene units or phenylethylene and 4-chloromethylphenylethylene units.

Abstract: Polymers are disclosed having the following formula 1 or 2: Polymers of the present invention can be used as an ARC material useful for submicrolithography processes using 248 nm KrF, 193 nm ArF and 157 nm F2 lasers. The polymers contain a chromophore substituent that exhibits sufficient absorbance at the wavelengths useful for the submicrolithography process. The ARC prevents back reflection of light from lower layers and the alteration of the CD by diffracted and reflected light from the lower layers. The ARC also eliminates standing waves and reflective notching due to the optical properties of lower layers on the wafer and to changes in the thickness of the photosensitive film applied thereon, thereby resulting in the stable formation of ultrafine patterns suitable for 64M, 256M, 1G, 4G and 16G DRAMs and a great improvement in the production yield.

Abstract: A process for making an allylic copolymer is disclosed. The process is a free radical copolymerization of a mono-ethylenic monomer, a multi-ethylenic monomer, and a mono-allylic monomer. The copolymer produced has a high molecular weight and a broad molecular weight distribution, and it is particularly useful as a toner resin.

Abstract: A process for making an allylic copolymer is disclosed. The process is a free radical copolymerization of a mono-ethylenic monomer, a multi-ethylenic monomer, and a mono-allylic monomer. The copolymer produced has a high molecular weight and a broad molecular weight distribution, and it is particularly useful as a toner resin.

Abstract: To provide a composition for coating or printing for baking finish which assures a small amount of misting and excellent physical properties of a coating film such as mechanical strength, water resistance, solvent resistance and adhesiveness. The composition comprises a benzoguanamine compound having at least one radically polymerizable double bond and a polymerizable functional group in its molecule and as the case demands, a radically polymerizable (meth)acrylate compound.

Abstract: A process for making an allylic copolymer is disclosed. The process is a free radical copolymerization of a mono-ethylenic monomer, a multi-ethylenic monomer, and a mono-allylic monomer. The copolymer produced has a high molecular weight and a broad molecular weight distribution, and it is particularly useful as a toner resin.

Abstract: The present invention is related to a shrinkage reducing agent for hydraulic materials

Abstract: The present invention discloses the synthesis of a novel crosslinker having the following structure: R1 is C(R8) (R9) wherein (R8) is H, or an alkyl group having 1-5 carbon atoms, and (R9) is H, or an alkyl group having 1-5 carbon atoms. R2 is H, or an alkyl group having 1-5 carbon atoms. R3 is H or an alkyl group having 1-5 carbon atoms. R4 is an alkyl group having 1-5 carbon atoms. R5 is H or an alkyl group having 1-5 carbon atoms. R6 is H or an alkyl group having 1-5 carbon atoms. R7 is C(R10) (R11) wherein (R10) is H, or an alkyl group having 1-5 carbon atoms, and (R11) is H, or an alkyl group having 1-5 carbon atoms. The crosslinker is stable in a basic environment, but decomposable in an acidic environment.