Aromatic Or Plural Ethylenic Groups Patents (Class 526/334)
  • Patent number: 9188869
    Abstract: A method of forming a structure containing a phase-separated structure, the method including: a step of forming a layer containing a block copolymer having a plurality of blocks bonded and a purity of 98% or more, and a step of phase-separating the layer containing the block copolymer.
    Type: Grant
    Filed: July 29, 2014
    Date of Patent: November 17, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takehiro Seshimo, Takahiro Dazai, Takaya Maehashi, Ken Miyagi, Yoshiyuki Utsumi
  • Patent number: 9023950
    Abstract: The present invention provides a styrene-based star polymer with narrow dispersion and suitable as a resist material, etc. A star polymer of the present invention is represented by the formula A[C(Y)Xm]n (wherein A represents a polyvalent aliphatic hydrocarbon group with 4-15 carbons, C represents a carbon atom, X represents a styrene-based polymer chain, Y represents a hydroxy group or an oxo group, m represents an integer of 1 or 2, and n represents any integer from 2 to 5, with the proviso that if Y is a hydroxy group, m is 2, and if Y is an oxo group, m is 1). The star polymer can be produced by reacting a styrene-based polymer having an anionic end, and an aliphatic carboxylic acid ester represented by A(COOR)n (wherein R represents an alkyl group having 1-8 carbons, and A and n are as defined for the above formula).
    Type: Grant
    Filed: April 18, 2011
    Date of Patent: May 5, 2015
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Akihiro Shirai, Takeshi Niitani
  • Patent number: 8808960
    Abstract: A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.
    Type: Grant
    Filed: March 8, 2010
    Date of Patent: August 19, 2014
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Makoto Akita, Isao Yoshida, Kazuhiko Hashimoto
  • Patent number: 8785582
    Abstract: A vinyloxy group-containing vinyl polymer, useful as a heat or light curing reactive prepolymer, containing at least a constituent unit expressed by the following formula (I):
    Type: Grant
    Filed: September 28, 2009
    Date of Patent: July 22, 2014
    Assignee: Nippon Carbide Industries Co., Ltd.
    Inventors: Takuma Hojo, Kyoko Yamamoto, Hiroki Fujiwara, Kazuhiko Atsumi, Take-aki Mitsudo
  • Patent number: 8703383
    Abstract: A copolymer has formula: wherein R1-R5 are independently H, C1-6 alkyl, or C4-6 aryl, R6 is a fluorinated or non-fluorinated C5-30 acid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic C6-20 aryl group; each R7 and R8 is —OR11 or —C(CF3)2OR11 where each R11 is H, a fluorinated or non-fluorinated C5-30 acid decomposable group, or a combination; each R9 is independently F, a C1-10 alkyl, C1-10 fluoroalkyl, C1-10 alkoxy, or a C1-10 fluoroalkoxy group; R10 is a cation-bound C10-40 photoacid generator-containing group, mole fractions a, b, and d are 0 to 0.80, c is 0.01 to 0.80, e is 0 to 0.50 provided where a, b, and d are 0, e is greater than 0, the sum a+b+c+d+e is 1, l and m are integers of 1 to 4, and n is an integer of 0 to 5. A photoresist and coated substrate, each include the copolymer.
    Type: Grant
    Filed: November 17, 2011
    Date of Patent: April 22, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James W. Thackeray, Emad Aqad, Su Jin Kang, Owendi Ongayi
  • Patent number: 8524849
    Abstract: Hydrophilic silicone copolymers are the addition polymerization product of an unsaturated silicone macromer, and unsaturated polyoxyalkylene polyether, and optionally further unsaturated addition polymerizable monomers.
    Type: Grant
    Filed: February 17, 2011
    Date of Patent: September 3, 2013
    Assignee: Wacker Chemie AG
    Inventor: Kurt Stark
  • Patent number: 8492483
    Abstract: To provide a novel ABA-type triblock copolymer of vinyl ether series, comprising polyvinyl ether and an oxystyrene-series unit, and a process of producing the ABA-type copolymer at a series of steps. The invention relates to a novel ABA-type triblock copolymer comprising Segment A comprising an oxystyrene-series repeat unit (a) and Segment B comprising a vinyl ether-series repeat unit (b), in which the Segment A and the Segment B are bonded together with a single bond, and to a simple process of producing the same. The triblock copolymer can be produced at a series of steps in a simple manner, comprising living cationic polymerization of a vinyl ether-series monomer such as ethyl vinyl ether in the presence of a bifunctional initiator and a Lewis acid, and subsequently adding an oxystyrene-series monomer such as p-hydroxystyrene for living cationic polymerization.
    Type: Grant
    Filed: June 19, 2008
    Date of Patent: July 23, 2013
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Norihiro Yoshida, Hijiri Aoki, Takahito Mita, Ami Yamaguchi, Kazuhiko Haba, Goro Sawada
  • Patent number: 8410234
    Abstract: A vinyl ether compound represented by formula (1-a) or formula (1-b): wherein n represents 0 or 1, and R1 and R2 each independently represent a hydrogen atom, a methyl group, or an ethyl group, provided that a total of the number of carbon atoms of R1 and the number of carbon atoms of R2 is 1 or 2.
    Type: Grant
    Filed: September 8, 2010
    Date of Patent: April 2, 2013
    Assignee: JX Nippon Oil & Energy Corporation
    Inventors: Tsutomu Takashima, Akira Shiibashi
  • Patent number: 8389631
    Abstract: The present invention is a thermosetting bismaleimide resin system comprising a liquid phase and a solid phase where the non-crystallizing liquid phase contains the curing agents diallyl ether of a substantially aromatic radical and a bis(alkenylphenoxy) ether of a substantially aromatic radical along with a substantially aromatic bismaleimide as a particle slurry and optionally a free radical inhibitor. The curing agents are non-crystallizing compositions for use in bismaleimide resin formulations to increase the thermal durability of a cured resin composite as shown by reduced microcracking as measured by reduced weight loss after thermal aging. The present invention resists microcracking over bismaleimide resin systems which incorporate other curing agents or combinations of curing agents. The present invention further provides a bismaleimide resin formulation suitable to make prepregs with reduced crystallization for reduced viscosity supporting improved manufacturing properties and improved tack.
    Type: Grant
    Filed: December 17, 2008
    Date of Patent: March 5, 2013
    Assignee: Cytec Technology Corp.
    Inventors: Christopher Bongiovanni, Jack Boyd, Christopher Pederson
  • Patent number: 8349983
    Abstract: The invention relates to a process for the preparation of an aqueous solution comprising 30 to 95% by weight of water and 5 to 70% by weight of a copolymer dissolved in the water by free radical solution polymerizations of an isoprenol polyether derivative with an acrylic acid derivative, so that the copolymer has 20 to 45 mol % of an isoprenol polyether derivative structural unit and 55 to 80 mol % of an acrylic acid derivative structural unit. The aqueous solution is suitable as a superplasticizer for hydraulic binders.
    Type: Grant
    Filed: January 12, 2009
    Date of Patent: January 8, 2013
    Assignee: Construction Research & Technology GmbH
    Inventors: Klaus Lorenz, Gerhard Albrecht, Silke Flakus, Alexander Kraus, Helmut Mack, Petra Wagner, Barbara Wimmer, Christian Scholz, Angelika Hartl, Martin Winklbauer
  • Patent number: 8337824
    Abstract: The present invention is directed to compositions of a linear polyol and a salt of a crosslinked cation exchange polymer comprising a fluoro group and an acid group. These compositions are useful to bind potassium in the gastrointestinal tract.
    Type: Grant
    Filed: August 22, 2009
    Date of Patent: December 25, 2012
    Assignee: Relypsa, Inc.
    Inventors: Detlef Albrecht, Michael Burdick, Han-Ting Chang, Dominique Charmot, Ramakrishnan Chidambaram, Eric Connor, Sherin Halfon, I-Zu Huang, Mingjun Liu, Jonathan Mills, Werner Strüver
  • Publication number: 20120264857
    Abstract: A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; and (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom.
    Type: Application
    Filed: May 23, 2012
    Publication date: October 18, 2012
    Inventors: WILLIAM RICHARD RUSSELL, John Anthony Schultz
  • Patent number: 8263718
    Abstract: A method for the polymerization of free radically polymerizable vinyl monomers involves polymerizing free radically (co)polymerizable vinyl monomers in a batch reaction under essentially adiabatic conditions, and utilizing scavenger monomer to reduce undesirable residual monomer.
    Type: Grant
    Filed: June 14, 2011
    Date of Patent: September 11, 2012
    Assignee: 3M Innovative Properties Company
    Inventor: Mark F. Ellis
  • Patent number: 8247508
    Abstract: An isobutylene-based polymer comprising a structural unit represented by the following formula (1): and a structural unit represented by the following formula (2): wherein X represents a divalent group; Y represents a substituted or unsubstituted alicyclic group having an unsaturated bond in the ring; and n represents 0 or 1.
    Type: Grant
    Filed: May 27, 2010
    Date of Patent: August 21, 2012
    Assignee: JX Nippon Oil & Energy Corporation
    Inventors: Tsutomu Takashima, Akira Shiibashi, Tsuyoshi Yamaguchi
  • Publication number: 20120165414
    Abstract: Process for preparing a macromonomer, in which a starting compound H2C?CR1—C6H4-s(R4)s—R3—OH or H2C?CR2—CO—NH—R3—OH, where R1 and R2 are each H or a linear or branched alkyl radical having from 1 to 4 carbon atoms, R3 is a linear or branched alkylene, aralkylene radical which has from 1 to 20 carbon atoms and can contain one or more hydroxy groups and the radicals R4 are each, independently of one another, a linear or branched alkyl, aralkyl, alkoxy or aralkoxy radical having from 1 to 20 carbon atoms and s=0-4, is, after partial deprotonation, reacted with at least one hydroxy-functional oxirane compound in the presence of an inhibitor of free-radical polymerization with opening of the oxirane ring, where the molar ratio of the molar amounts used n(starting compound):n(oxirane compound) is in the range from 1:100 to 1:1. Macromonomers which can be obtained by the process, polymers which can be obtained therefrom and their use as additives in coating compositions, plastics and cosmetics.
    Type: Application
    Filed: June 4, 2010
    Publication date: June 28, 2012
    Applicant: BYK-Chemie GmbH
    Inventors: Wojciech Jaunky, Albert Frank, Alfred Bubat, Jürgen Omeis
  • Patent number: 8158748
    Abstract: The invention provides hetero-functional compound compounds useful in a variety of adhesive applications. More particularly, the invention provides compounds bearing at least one electron rich olefinic bond and at least one electron poor olefinic bond, wherein the two olefinic bonds are separated by a C3 to about C500 aliphatic, cycloaliphatic, or aromatic spacer.
    Type: Grant
    Filed: August 13, 2009
    Date of Patent: April 17, 2012
    Assignee: Designer Molecules, Inc.
    Inventors: Stephen M. Dershem, Farhad G Mizori
  • Patent number: 8143359
    Abstract: The purpose of the present invention is to provide an organic silicon compound which has a vinyl group more reactive than those of the conventional organic silicon compounds and can be bonded with another compound. The present organic silicon compound is represented by the following formula (1), wherein R1 is, independently of each other, a vinyl group or an alkyl group having 1 to 4 carbon atoms, R2 is an alkylene group having 3 to 6 carbon atoms, and R3 is, independently of each other, a hydrogen atom or an alkyl group having 1 to 4 carbon atoms and optionally substituted with one or more fluorine atoms.
    Type: Grant
    Filed: November 18, 2009
    Date of Patent: March 27, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Noriyuki Koike, Takashi Matsuda, Hirofumi Kishita
  • Patent number: 7989573
    Abstract: A method for the polymerization of free radically polymerizable vinyl monomers involves polymerizing free radically (co)polymerizable vinyl monomers in a batch reaction under essentially adiabatic conditions, and utilizing scavenger monomer to reduce undesirable residual monomer.
    Type: Grant
    Filed: December 16, 2005
    Date of Patent: August 2, 2011
    Assignee: 3M Innovative Properties Company
    Inventor: Mark F. Ellis
  • Patent number: 7968661
    Abstract: A method for the polymerization of free radically polymerizable vinyl monomers involves polymerizing free radically (co)polymerizable vinyl monomers in a batch reaction under essentially adiabatic conditions in the presence of an non-reactive diluent that can remain in the polymer product.
    Type: Grant
    Filed: December 28, 2005
    Date of Patent: June 28, 2011
    Assignee: 3M Innovative Properties Company
    Inventors: Mark F. Ellis, Peter A. Stark
  • Patent number: 7893293
    Abstract: A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc.
    Type: Grant
    Filed: June 20, 2008
    Date of Patent: February 22, 2011
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Makoto Akita, Isao Yoshida, Kazuhiko Hashimoto
  • Patent number: 7842767
    Abstract: The present invention relates to a cross-linked polyether which is obtained by polymerization of at least one monomer selected from the group consisting of (a) (?-X-methyl) vinyl-EWG, (?-X-methyl) vinyl-ERG, or (?-X-methyl) vinyl-aryl, where X is oxygen, sulfur, PEG, PPG or poly (THF); (b) a monomer which is polymerizable with a PEG, PPG or poly (THF) cross-linker having at least one (?-X-methyl) vinyl-EWG, (?-X-methyl) vinyl-ERG or (?-X-methyl) vinyl-aryl, where X is oxygen, sulfur, PEG, PPG, or poly (THF); (c) a PEG, PPG, or poly (THF) cross-linker having at least an acrylamide or a methacrylamide end group; and (d) mixtures thereof. Various monomers, resins and methods for preparing such cross-linked polyethers are also disclosed.
    Type: Grant
    Filed: August 4, 2004
    Date of Patent: November 30, 2010
    Assignee: Matrix Innovation Inc.
    Inventor: Simon Côté
  • Publication number: 20100221653
    Abstract: A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; and (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom.
    Type: Application
    Filed: May 6, 2010
    Publication date: September 2, 2010
    Applicant: DuPont Electronic Polymers L>P>
    Inventors: William Richard Russell, John Anthony Schultz
  • Patent number: 7715083
    Abstract: The present invention aims to provide a light control material capable of optionally controlling the light transmittance in an arbitrary wavelength range among a wide wavelength range, and a light control film formed by using the light control material.
    Type: Grant
    Filed: November 24, 2006
    Date of Patent: May 11, 2010
    Assignees: Sekisui Chemical Co., Ltd., National Institute of Advanced Industrial Science and Technology
    Inventors: Kazuyuki Yahara, Kenji Tsuchihara
  • Publication number: 20100041840
    Abstract: The present invention relates to a method for preparing an unsaturated ethylene-diene copolymer by high pressure radical-initiated polymerisation, said method providing an improved conversion of added diene into pendant vinyl groups.
    Type: Application
    Filed: November 6, 2007
    Publication date: February 18, 2010
    Inventors: Kenneth Johansson, Peter Rydin, Annika Smedberg
  • Patent number: 7650930
    Abstract: A process for the solution polymerization of olefins with improved on-stream time is provided. The solution polymerization process of the current invention comprises a method for the on-line removal of foulant material from one or more heat exchangers downstream of a polymerization reactor. Removal of foulant material is accomplished by deliberately applying a positive pressure differential across a heat exchanger. In the process of the current invention, reactor shut down is not required for the purpose of cleaning foulant material from a heat exchanger.
    Type: Grant
    Filed: August 22, 2008
    Date of Patent: January 26, 2010
    Assignee: NOVA Chemical (International) S.A.
    Inventors: Eric Cheluget, Arun Sood, Rob VanAsseldonk, Ryan McCabe
  • Patent number: 7625988
    Abstract: The present invention is directed to novel flame retardant monomers and polymers, wherein the flame retardant properties of the polymers are provided by functionality in pendant groups attached to a polymer backbone (as opposed to the polymer backbone itself possessing flame retardant properties. The present invention is also directed to methods of making such polymers and monomers, and articles of manufacture incorporating such monomers and polymers.
    Type: Grant
    Filed: June 18, 2004
    Date of Patent: December 1, 2009
    Assignee: William Marsh Rice University
    Inventors: James M. Tour, Joshua L. Jurs, Jason J. Stephenson
  • Patent number: 7604918
    Abstract: A photosensitive polymer for a photoresist and a photoresist composition having the same are provided. The photosensitive polymer for a photoresist includes the repeating unit represented by the formula below: wherein R1 is a C1-C20 hydrocarbon group or a C1-C20 hetero hydrocarbon group including at least one hetero atom selected from the group consisting of nitrogen, fluorine and sulfur.
    Type: Grant
    Filed: January 22, 2007
    Date of Patent: October 20, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-jun Choi, Han-ku Cho
  • Patent number: 7598332
    Abstract: There is provided a polymer compound including a repetitive unit structure represented by the following general formula (2): General formula (2): (where X? represents a polyalkenyl group; A represents a linear or branched alkylene group having a carbon atom number of 1 to 15, which may be substituted; m represents an integer of 0 to 30; B represents a single bond or an alkylene group which may be substituted; D represents an aromatic ring structure which may be substituted; n represents an integer of 0 to 10; and R represents a hydrogen atom, an alkyl group which may be substituted, or an aromatic ring structure which may be substituted). The polymer compound is suitable for improving dispersibility of a coloring material or solid material in an ink composition or toner composition.
    Type: Grant
    Filed: April 30, 2004
    Date of Patent: October 6, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masayuki Ikegami, Koichi Sato, Ikuo Nakazawa, Sakae Suda, Keiichiro Tsubaki, Ryuji Higashi, Keiko Yamagishi
  • Patent number: 7585918
    Abstract: A block polymer compound containing block segments, characterized in that at least one hydrophilic segment among the block segments is a copolymer segment composed of an ionic or hydrophilic repeating unit structure and a hydrophobic repeating unit structure.
    Type: Grant
    Filed: September 30, 2004
    Date of Patent: September 8, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Koichi Sato, Ikuo Nakazawa, Sakae Suda, Ryuji Higashi, Masayuki Ikegami, Keiichiro Tsubaki
  • Publication number: 20090080056
    Abstract: The present invention aims to provide a light control material capable of optionally controlling the light transmittance in an arbitrary wavelength range among a wide wavelength range, and a light control film formed by using the light control material.
    Type: Application
    Filed: November 24, 2006
    Publication date: March 26, 2009
    Inventors: Kazuyuki Yahara, Kenji Tsuchihara
  • Patent number: 7491780
    Abstract: A composition containing a polymer compound and medium being a solvent or a binder resin, wherein the polymer compound comprises monomer units represented by the general formula (1): wherein A is a straight-chain or branched alkylene group of 1 to 15 carbon atoms, which may be substituted; m is an integer of 0 to 30, and; B is a single bond or alkylene, which may be substituted; D is an aromatic ring structure; n is an integer of 1 to 10, and R is a hydrogen atom, an alkyl group, which may be substituted, an aromatic ring structure, or a mono- or poly-valent metal cation.
    Type: Grant
    Filed: August 17, 2005
    Date of Patent: February 17, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Koichi Sato, Ikuo Nakazawa, Sakae Suda, Masayuki Ikegami, Keiichiro Tsubaki
  • Patent number: 7442724
    Abstract: The invention relates to the use of copolymers with styrene-oxide-based, vinyl-functionalized polyethers for preparing aqueous pigment preparations.
    Type: Grant
    Filed: October 19, 2004
    Date of Patent: October 28, 2008
    Assignee: Goldschmidt GmbH
    Inventors: Jutta Esselborn, Philippe Favresse, Kathrin Lehmann, Ute Linke, Angela Rüttgerodt, Stefan Silber
  • Patent number: 7442753
    Abstract: A compound represented by the following general formula (1): (1) wherein A represents an alkenyl ether group which may be substituted; B represents a linear or branched alkylene group having 1 to 15 carbon atoms which may be substituted; m represents an integer from 0 to 30; when m is larger than 1, B may be different from each other; D represents a single bond or a linear or branched alkylene group having 1 to 10 carbon atoms which may be substituted; E represents any one of an aromatic ring which may be substituted, a condensed ring which may be substituted, and a structure formed by bonding through single bonds at most three aromatic rings which may be substituted; R represents a hydrogen atom, a linear or branched alkyl group having 1 to 5 carbon atoms which may be substituted, or an aromatic ring which may be substituted; n represents a positive number larger than 1; a COOR group in the formula is substituted into the aromatic ring of E; and a hydrogen atom in the aromatic ring, which is not substituted
    Type: Grant
    Filed: October 27, 2004
    Date of Patent: October 28, 2008
    Assignee: Canon Kabushiki Kaisha
    Inventors: Keiichiro Tsubaki, Koichi Sato, Ikuo Nakazawa, Ryuji Higashi, Sakae Suda, Masayuki Ikegami, Keiko Yamagishi
  • Patent number: 7381759
    Abstract: A dispersible composition that comprises a polymer compound, a functional substance such as a colorant, and a solvent or a dispersion medium, where the polymer compound is comprised of a monomer unit represented by the general formula (1) wherein A is a straight-chain or branched alkylene group of 1 to 15 carbon atoms with or without substitution; m is an integer of 0 to 30, and when m is 2 or more, A is the same or different each other; B is a single bond or an alkylene with or without substitution; D is a substituted or unsubstituted aromatic ring structure; n is an integer of 1 to 10, and when n is 2 or more, D is the same or different with each other. The composition is usable as an ink composition or toner composition.
    Type: Grant
    Filed: July 2, 2003
    Date of Patent: June 3, 2008
    Assignee: Canon Kabushiki Kaisha
    Inventors: Sakae Suda, Koichi Sato, Ikuo Nakazawa, Masayuki Ikegami
  • Patent number: 7378480
    Abstract: Polymeric compounds suitable for ink and toner compositions, and image forming methods and apparatus using an ink or toner composition containing such a polymer compound, and particularly to a polymer compound having a repeating unit structure represented by the general formula wherein B is a linear or branched alkylene group having 1 to 15 carbon atoms and may be substituted, m is an integer of 1 to 30, q is an integer of 2 to 30, and R1 is hydrogen, an alkyl group which may be substituted, or an aromatic ring structure which may be substituted, with the proviso that when m is a plural number, the B groups may be different from each other, ink and toner compositions containing the polymer compound, a solvent or dispersion medium and a coloring material, and image forming methods and image forming apparatus using such a composition.
    Type: Grant
    Filed: August 25, 2004
    Date of Patent: May 27, 2008
    Assignee: Canon Kabushiki Kaisha
    Inventors: Koichi Sato, Ikuo Nakazawa, Sakae Suda, Masayuki Ikegami, Keiichiro Tsubaki
  • Patent number: 7291668
    Abstract: The present invention provides an ink composition containing a pigment dispersed uniformly in a solvent and a block polymer having an ionic functional group, an image-forming method and an image-forming apparatus employing the ink composition. The composition comprises a pigment, a solvent and a polymer having an ionic functional group, an acid residue, or a base residue at the terminal. The polymer having an ionic functional group, an acid residue, or a base residue at the terminal is a block polymer of ABX type having A, B, and X segments, wherein A and B are respectively a block segment having a vinyl ether structure as the repeating unit, and X is a terminal segment having an ionic functional group, an acid residue, or an base residue.
    Type: Grant
    Filed: August 9, 2005
    Date of Patent: November 6, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masayuki Ikegami, Koichi Sato, Ikuo Nakazawa, Sakae Suda
  • Patent number: 7256245
    Abstract: Provided is a polymeric fluorescent substance showing fluorescence in solid state, which has a specific carrier drift mobility, a specific repeating unit, and specific number-average molecular weight. The polymeric fluorescent substance is excellent in solubility to organic solvents, and has higher efficiency and longer lifetime in applying as a polymer LED.
    Type: Grant
    Filed: June 9, 2003
    Date of Patent: August 14, 2007
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Masato Ueda, Takanobu Noguchi
  • Patent number: 7157539
    Abstract: A composition containing a polymer compound and medium being a solvent or a binder resin, wherein the polymer compound comprises monomer units represented by the general formula (1): wherein A is a straight-chain or branched alkylene group of 1 to 15 carbon atoms, which may be substituted; m is an integer of 0 to 30, and; B is a single bond or alkylene, which may be substituted; D is an aromatic ring structure; n is an integer of 1 to 10, and R is a hydrogen atom, an alkyl group, which may be substituted, an aromatic ring structure, or a mono- or poly-valent metal cation.
    Type: Grant
    Filed: April 24, 2003
    Date of Patent: January 2, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Koichi Sato, Ikuo Nakazawa, Sakae Suda, Masayuki Ikegami, Keiichiro Tsubaki
  • Patent number: 7125642
    Abstract: A sulfonate compound having formula (1) is novel wherein R1 to R3 are H, F or C1-20 alkyl or fluoroalkyl, at least one of R1 to R3 contains F.
    Type: Grant
    Filed: February 9, 2004
    Date of Patent: October 24, 2006
    Assignees: Shin-Etsu Chemical Co., Ltd., Matsushita Electric Industrial Co., Ltd., Central Glass Co., Ltd.
    Inventors: Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Kazuhiko Maeda, Haruhiko Komoriya, Satoru Miyazawa
  • Patent number: 7037997
    Abstract: A vinyl monomer of the structure R—B—Ar(—CH?CH2)n (1) in which Ar is an aromatic ring (arylene group); n is an integer >0, in particular one or two; B is a bridge structure; R is a (C2-30)-hydrocarbon group carrying two or more protected or unprotected hydroxy groups. The monomer is characterized in that B comprises a chain of atoms linking R to Ar and consisting of 1–10 atoms selected from carbons and the heteroatoms ether oxygen, thioether sulphur or amino nitrogen, with the proviso that the terminal atom in B which is attached to R is one of the heteroatoms. A method for producing a polymer support matrix in which the vinylmonomer is one of the monomeric units. The support matrix as such is also claimed. The preferred method for producing the support matrices involves suspension polymerisation, the preferred form of matrix is beads.
    Type: Grant
    Filed: June 6, 2000
    Date of Patent: May 2, 2006
    Assignee: GE Healthcare Bio-Sciences AB
    Inventors: Rose Nasman, legal representative, Harry Nasman, legal representative, Jan Nasman, deceased
  • Patent number: 6989224
    Abstract: The invention provides novel polymers and photoresist compositions that comprise the polymers as a resin component. Polymers of the invention contain two distinct groups which can undergo a deblocking reaction in the presence of photogenerated acid, wherein one of the deblocking moieties is an acetal group. The second photoacid-labile group is suitably an ester, particularly as provided by polymerization of an alkyl acrylate group, such as t-butylmethacrylate.
    Type: Grant
    Filed: October 9, 2002
    Date of Patent: January 24, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: Timothy G. Adams, Matthew A. King
  • Patent number: 6921454
    Abstract: A radiation curable adhesive composition which includes: a) an ?,?-olefinically unsaturated ether monomer component consisting of one or more compounds having the formula: R[O—CH?CHR1]n??(I) where R is an n-valent carbon-linked organic group R1 is H or a monovalent carbon-linked organic group and n has a value of 1 or more, b) an elastomeric polymer having a tensile strength at break of greater than 1500 psi (10342 kPa), and an elongation at break of greater than 100%, and c) a cationic photoinitiator.
    Type: Grant
    Filed: November 27, 2001
    Date of Patent: July 26, 2005
    Assignee: Henkel Corporation
    Inventors: Weitong Shi, JoAnn DeMarco, Shabbir Attarwala
  • Patent number: 6822063
    Abstract: A waterborne radiation curable coating composition containing at least one acrylate functional oligomer having a functionality greater than 3 and at least one vinyl ether oligomer having a functionality greater than 1 provides a cured coating resists deep scratches.
    Type: Grant
    Filed: August 27, 2002
    Date of Patent: November 23, 2004
    Assignee: Ecolab Inc.
    Inventors: Keith E. Olson, Bryan M. Anderson
  • Patent number: 6815517
    Abstract: An at least two-component mortar composition is described, which can be cured by thermal initiation and contains at least one polymerizable monomer and/or at least one curable resin, at least one polymerization initiator for the polymerizable monomer and/or the curable resin and optionally at least one filler, wherein, as polymerization initiator, at least one organically substituted ammonium salt is contained as constituent of a mortar component and at least one inorganic persulfate is contained as constituent of a further mortar component, and which, after the mortar components are mixed in situ, results in an organically substituted ammonium persulfate, the nature and amount of organically substituted ammonium salt and inorganic persulfate as well as of polymerizable monomer or curable resin being selected so that a mortar composition results, which can be polymerized by free radical polymerization due to the action of heat, as well as a method for fastening tie rods, reinforcing steel for concrete or the
    Type: Grant
    Filed: July 1, 2002
    Date of Patent: November 9, 2004
    Assignee: Hilti Aktiengesellschaft
    Inventors: Thomas Bürgel, Marianne Böck
  • Patent number: 6809889
    Abstract: A radiation curable resin composition for a Fresnel lens is provided, which exhibits a high elastic modulus and a high refractive index and is superior in adhesion to the plastic substrate and is superior in transparency. A lens layer exhibits excellent shape retention over a wide temperature range and is less likely to chip and crack due to an external force. A Fresnel lens sheet using the radiation curable resin composition is also provided. The resin composition comprises, as an essential component, an epoxy (meth)acrylate (a) having an epoxy equivalent per weight of 450 g/eq or more, which has a cyclic structure and two or more (meth)acryloyl groups; a specific trifunctional (meth)acrylate (b); a (meth)acrylate (c) having a molecular weight of 700 or less from an aliphatic polyhydric alcohol having an oxypropylene structure; and a monofunctional (meth)acrylate (d) having a cyclic structure.
    Type: Grant
    Filed: October 16, 2002
    Date of Patent: October 26, 2004
    Assignees: Dainippon Ink and Chemicals, Inc., Dai Nippon Printing Co., Ltd.
    Inventors: Hiroyuki Tokuda, Yasunobu Hirota, Yasuhiro Doi
  • Patent number: 6800418
    Abstract: Provided are a fluorine-containing photosensitive polymer having a hydrate structure and a resist composition including the photosensitive polymer.
    Type: Grant
    Filed: October 4, 2002
    Date of Patent: October 5, 2004
    Assignee: Samsung Electronics
    Inventors: Kwang-sub Yoon, Ki-yong Song, Sang-jun Choi, Sang-gyun Woo
  • Patent number: 6800709
    Abstract: A method has been described of preparing monodisperse polymer particles by free radical polymerization or copolymerization of hydrophobic monomers in a water-based system in the presence of cyclodextrin, characterized in that said free radical polymerization is performed with semi-continuous addition of monomer, wherein said monomer is absent before initiating polymerization, and in that a total solid contents of less than 30% by weight is present in said water-based system, in order to provide monodisperse polymer particles which are very suitable for use in many applications as e.g. in inks or toners, in photonic crystal films, in thermal printing plates for computer-to-plate or computer-to-press applications, in inkjet media, in displays, in photographic films, or as a spacing agent.
    Type: Grant
    Filed: March 6, 2002
    Date of Patent: October 5, 2004
    Assignee: AGFA-Gevaert N.V.
    Inventors: Huub Van Aert, Joachim Storsberg, Helmut Ritter, Christiaan Van Roost
  • Patent number: 6765079
    Abstract: Novel cross linked polymer films prepared from poly4-[(4-cardanylazo]benzoic acid and poly4-[(4-acryloylcardanylazo]benzoic acid are disclosed. The invention also relates to novel monomers 4-[(4-cardanylazo] benzoic acid and 4-[(4-acryloylcardanylazo] benzoic acid and polymers thereof as well processes for the preparation thereof.
    Type: Grant
    Filed: March 24, 2003
    Date of Patent: July 20, 2004
    Assignee: Council of Scientific and Industrial Research
    Inventors: Muthusamy Saminathan, Chennakkattu Krishna Sadasivan Pillai
  • Patent number: 6710150
    Abstract: The present invention provides a protolytically leaving group-containing copolymer having improved characteristics such as increased solubility in alkaline aqueous solution in the presence of a proton, thus finding application with advantage in various uses, and a process for producing the copolymer. A protolytically leaving group-containing copolymer represented by the following general formula (1): in the formula, R1, R2 and R3 are the same or different and each represents a protolytically leaving group and a, b and c represent the amounts of existence (mole %) of repeating units (A), (B) and (C), respectively, in the copolymer, which comprises the repeating unit (A) as well as the repeating unit (B) and/or the repeating unit (C) and has a weight average molecular weight of 2000˜30000, said a, b and c satisfying the condition that a is 5 to 30 mole % and (b+c) is 70 to 95 mole %.
    Type: Grant
    Filed: November 29, 2001
    Date of Patent: March 23, 2004
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Masatoshi Yoshida, Shigeru Tanimori, Yasutaka Nakatani, Yohei Murakami, Hideaki Nagano
  • Patent number: 6689855
    Abstract: Fluoropolymers consisting of alternating perfluorocyclobutane and aryl ether linkages possess suitable properties for optical waveguides and other devices using refractive properties of the polymers. Perfluorocyclobutane (PFCB) polymers having aryl groups alternating on an ether chain have shown useful physical properties for optical waveguide applications. Processes for micromolding such polymeric films by replicating a pattern or image directly from a silicon master, rather than from a polydimethyl siloxane (PDMS) mold) are disclosed.
    Type: Grant
    Filed: July 16, 2002
    Date of Patent: February 10, 2004
    Assignee: Clemson University
    Inventors: Dennis W. Smith, Hiren V. Shah, John Ballato, Stephen Foulger