Plural Rings Bonded Directly To The Same Acyclic Carbon In Acid Moiety Patents (Class 560/57)
  • Publication number: 20150115199
    Abstract: The present description relates to a polymerizable liquid crystal compound, a polymerizable liquid crystal composition including the same, and an optically anisotropic body.
    Type: Application
    Filed: April 19, 2013
    Publication date: April 30, 2015
    Inventors: Dai Seung Choi, Sung Ho Chun, Dong Woo Yoo, Mi Ra Hong, Kyung Chang Seo, Hyeong Bin Jang, Jung Hyun Kim, Min Hyung Lee, Eun Seok Park
  • Publication number: 20150119458
    Abstract: The present invention discloses a 4-((substituted phenyl)difluoromethyl)phenoxycarboxylic acid derivative and preparation process and use thereof. More specifically, the present invention relates to a compound of the following formula I, which is defined in the specification. The compounds according to the present invention can be used as PPAR agonists, and demonstrates a strong effect on reducing the levels of total cholesterol (TC), triglyceride (TG), and low density lipoprotein cholesterol (LDL-C) in blood plasma, and thus the compound according to the present invention can be used in the preparation of a medicament for treating or preventing hyperlipoidemia or cardio-cerebrovascular diseases caused by hyperlipoidemia, such as diabetes, atherosclerosis, stroke, coronary heart disease, etc. The present invention also relates to a novel intermediate compound for the preparation of the compound of formula I and preparation method thereof.
    Type: Application
    Filed: April 25, 2013
    Publication date: April 30, 2015
    Applicant: Zhejiang Hisun Pharmaceutical Co., Ltd.
    Inventors: Hua Bai, Jian Hong, Lifeng Cai, Hegeng Wei, Xiaoyu Liu, Xiaohe Zheng
  • Publication number: 20150068427
    Abstract: Provided is an optical film used for the optical compensation, in which additives are added to thereby have a good stability at high temperature and high humidity, a higher chromaticity, a higher Haze and a higher moisture resistance, as well as a small thickness direction retardation (Rth).
    Type: Application
    Filed: May 7, 2013
    Publication date: March 12, 2015
    Inventors: Won Yeob Kim, Myoung Lae Kim, Hyuk Jun Kim, Yong Gyun Cho, Min Joung Im, Yeong Min Jo, Seung Eon Lee, Hyo Shin Kwak
  • Publication number: 20150045387
    Abstract: Bi- and tri-aromatic compounds of the formula (I) wherein R1 to RIO and X are as defined, are Nox2 inhibitors that are useful as medicaments for the treatment of a disease or condition selected from: cardiovascular diseases, respiratory diseases, inflammatory diseases, cancers, ageing and age related disorders, kidney diseases, neurodegenerative diseases, diabetes and conditions associated with diabetes. The compounds, their preparation and pharmaceutical compositions comprising them are disclosed.
    Type: Application
    Filed: September 17, 2012
    Publication date: February 12, 2015
    Inventors: Jian-Mei Li, Brendan Howlin, Daniel Nathan Meijles
  • Publication number: 20140371310
    Abstract: Disclosed herein are compounds and compositions useful for reducing the risk of infection. In particular, disclosed herein are mandelic acid condensation polymers, compositions comprising such compounds, processes for producing such compounds, and methods of using such compounds.
    Type: Application
    Filed: November 30, 2012
    Publication date: December 18, 2014
    Inventors: Robert A. Anderson, JR., Xiao-Hui Diao, Lourens J.D. Zaneveld, Calvin J. Chany, II, Aleksej Krunic, Donald P. Waller, Duane L. Venton, Sanjay Jain
  • Publication number: 20140336259
    Abstract: The present document describes a phytochemical isolated from maple syrup and composition comprising the same. More specifically, the document describes an antioxidant phytochemical compound, derivates thereof, and composition comprising the same. The document also describes a process of synthesizing the antioxidant phytochemical compound.
    Type: Application
    Filed: June 11, 2012
    Publication date: November 13, 2014
    Inventors: Navindra Seeram, Julie Barbeau, Genevieve BeLand, Keykavous Parang
  • Patent number: 8846292
    Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with good shape and a method of forming a resist pattern and novel compositions for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Radiation-sensitive composition containing a solvent and a cyclic compound having, e.g., a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups, and a cyclic compound for use in the radiation-sensitive composition.
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: September 30, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masatoshi Echigo, Dai Oguro
  • Patent number: 8802887
    Abstract: The present invention relates to a method for the crystallization of n-hexyl 2-(4-N,N-diethylamino-2-hydroxybenzoyl)benzoate, to a method for the production of pourable or flowable particles of crystalline n-hexyl 2-(4-N,N-diethylamino-2-hydroxybenzoyl)benzoate and to specific pourable or flowable particles of crystalline n-hexyl 2-(4-N,N-diethylamino-2-hydroxybenzoyl)benzoate.
    Type: Grant
    Filed: April 17, 2008
    Date of Patent: August 12, 2014
    Assignee: BASF SE
    Inventors: Samantha Champ, Manfred Hetterich, Günther Gottwald
  • Patent number: 8748078
    Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.
    Type: Grant
    Filed: August 30, 2010
    Date of Patent: June 10, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Hiromi Hayashi, Masatoshi Echigo, Dai Oguro
  • Publication number: 20130310595
    Abstract: The present invention provides a compound useful as a synthetic intermediate for an anti-HIV agent having an integrase inhibitory activity, and a production method thereof, and a production method of an anti-HIV agent using the synthetic intermediate. Specifically, for example, a compound represented by the formula (2?): wherein R is a fluorine atom or a methoxy group, and R400 is a hydrogen atom or a C1-C4 alkyl group, or a salt thereof, and a production method thereof, and a production method of an anti-HIV agent using the synthetic intermediate.
    Type: Application
    Filed: November 21, 2012
    Publication date: November 21, 2013
    Applicant: JAPAN TOBACCO INC.
    Inventor: Japan Tobacco Inc.
  • Publication number: 20130228332
    Abstract: Novel derivatives of tris(2-hydroxyphenyl)methanes which have, as functional groups, polyalkoxy groups unmodified or modified with terminal hydrophilic groups, preparation of such compounds and use thereof, especially for mineral oil production.
    Type: Application
    Filed: November 21, 2012
    Publication date: September 5, 2013
    Inventors: Sophie Maitro-Vogel, Roman Benedikt Raether, Markus Hansch
  • Patent number: 8404840
    Abstract: The present invention relates to improved processes for the preparation of endolthelin receptor antagonists darusentan and ambrisentan, their salts and intermediates. Processes for the preparation of darusentan and ambrisentan comprise reacting benzophenone with a compound of Formula-3 to provide a compound of Formula-4, which on in-situ treatment with methanol and a suitable acid provides a compound of Formula-5; hydrolyzing the compound of Formula-5 to provide a compound of Formula-6; resolving the compound of Formula-6 to provide a compound of Formula-7; esterifying the compound of Formula-7 to provide a compound of Formula-8; reacting the compound of Formula-8 with a compound of Formula-9 to provide a compound of Formula-10; hydrolyzing the compound of Formula-10 to provide darusentan or ambrisentan; and purifiying darusentan or ambrisentan to provide darusentan or ambrisentan having purity greater than 99.00% by HPLC.
    Type: Grant
    Filed: November 4, 2009
    Date of Patent: March 26, 2013
    Assignee: MSN Laboratories Limited
    Inventors: Manne Satyanarayana Reddy, Chakilam Nagaraju, Achampeta Kodanda Ramprasad
  • Patent number: 8324244
    Abstract: The invention provides synthetic processes and synthetic intermediates that can be used to prepare 4-oxoquinolone compounds having useful integrase inhibiting properties.
    Type: Grant
    Filed: September 28, 2010
    Date of Patent: December 4, 2012
    Assignee: Gilead Sciences, Inc.
    Inventors: Eric Dowdy, Xi Chen, Steven Pfeiffer
  • Patent number: 8318699
    Abstract: The present invention is directed to compounds that are allosteric inhibitors of tumor necrosis factor receptor I, compositions comprising such compounds, and methods of using such compounds and compositions thereof in the treatment of TNF-? mediated conditions.
    Type: Grant
    Filed: January 31, 2006
    Date of Patent: November 27, 2012
    Assignees: The Trustees Of The University Of Pennsylvania, Cephalon, Inc.
    Inventors: Mark I Greene, Ramachandran Murali, Xin Cheng, Raphael Ottenbrite, Yingxin Xiao
  • Publication number: 20120277460
    Abstract: The present invention concerns the design of an environmentally friendly and efficient fluorous phase based on dendritic architectures containing short semifluorinated groups on their periphery.
    Type: Application
    Filed: April 26, 2012
    Publication date: November 1, 2012
    Applicant: THE TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIA
    Inventors: Virgil Percec, Christopher J. Wilson, Daniela A. Wilson, Andrew E. Feiring
  • Patent number: 8257903
    Abstract: The present invention provides a compound that can be used within a resist composition, an intermediate compound for the compound, a positive resist composition, and a method for forming a resist pattern.
    Type: Grant
    Filed: August 3, 2007
    Date of Patent: September 4, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Daiju Shiono, Hideo Hada
  • Publication number: 20120142934
    Abstract: A method for synthesis of secondary alcohols is provided for pharmaceutical secondary alcohol by addition of organoboronic acids with aldehydes in presence of the cobalt ion and bidentate ligands as the catalyst. In addition, an enantioselective synthesis method for secondary alcohols is also herein provided in the present invention. The present invention has advantages in using less expensive cobalt ion and commercially available chiral ligands as the catalyst, wide scope of organoboronic acids and aldehydes compatible with this catalytic reaction and achieving excellent yields and/or enantiomeric excess.
    Type: Application
    Filed: March 10, 2011
    Publication date: June 7, 2012
    Inventors: Chien-Hong CHENG, Jaganathan Karthikeyan, Pang-Chi Huang
  • Patent number: 8110334
    Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition.
    Type: Grant
    Filed: November 1, 2007
    Date of Patent: February 7, 2012
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masatoshi Echigo, Dai Oguro
  • Publication number: 20110319641
    Abstract: The present invention is directed to a novel method for preparing a synthetic intermediate for treprostinil via a stereoselective alkyne addition reaction. Also described are methods of preparing treprostinil comprising the alkyne addition reaction described herein as well as novel intermediates useful for synthesis prostacyclin derivatives, such as treprostinil.
    Type: Application
    Filed: June 2, 2011
    Publication date: December 29, 2011
    Inventors: Hitesh Batra, Raju Penmasta, Vijay Sharma, Sudersan M. Tuladhar, David A. Walsh
  • Publication number: 20110263854
    Abstract: The present invention relates to improved processes for the preparation of Endothelin receptor antagonists, their salts and intermediates.
    Type: Application
    Filed: November 4, 2009
    Publication date: October 27, 2011
    Inventors: Manne Satyanarayana Reddy, Chakilam Nagaraju, Achampeta Kodanda Ramprasad
  • Patent number: 8043789
    Abstract: A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to 15 weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 10 to 5000 weight parts of an organic solvent. In the formula, n is 0 or 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, z is 0, 1, 2, 3 or 4, R, R? and R? are independently hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms, and R?? is a hydrogen atom or hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms.
    Type: Grant
    Filed: December 17, 2008
    Date of Patent: October 25, 2011
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Jae-Woo Lee, Min-Ja Yoo, Jun-Gyeong Lee, Young-Bae Lim, Jae-Hyun Kim
  • Publication number: 20110190301
    Abstract: Therapeutic compounds, methods, and compositions are disclosed herein for treating glaucoma and baldness in mammals. The specific compounds are described herein and are modified prostaglandin derivates.
    Type: Application
    Filed: May 13, 2009
    Publication date: August 4, 2011
    Applicant: ALLERGAN, INC.
    Inventors: David W. Old, Vinh X. Ngo, Todd S. Gac
  • Publication number: 20110172457
    Abstract: Disclosed are tetrakis(ether-substituted formylphenyl) expressed by General Formula (1), as well as polynuclear polyphenol derived from such tetrakis(ether-substituted formylphenyl): (In the formula, R1 represents an alkyl group with 1 to 8 carbon atoms or alkoxyl group with 1 to 8 carbon atoms, or aromatic hydrocarbon group or saturated hydrocarbon group with 1 to 8 carbon atoms having an aromatic hydrocarbon group, n represents 0 or an integer of 1 to 3, R2 represents a divalent monocyclic or fused-ring aromatic hydrocarbon group with 6 to 15 carbon atoms or divalent aliphatic hydrocarbon group with 1 to 8 carbon atoms that may have a monocyclic or fused-ring aromatic hydrocarbon group with 6 to 15 carbon atoms, R3 represents a hydrogen atom or alkyl group with 1 to 6 carbon atoms, A represents a tetravalent carbon atom group or tetravalent saturated hydrocarbon group with 2 or more carbon atoms, where, if A is a tetravalent saturated hydrocarbon group with 2 or more carbon atoms, the two carbon atoms i
    Type: Application
    Filed: June 22, 2009
    Publication date: July 14, 2011
    Applicant: HONSHU CHEMICAL INDUSTRY CO., LTD.
    Inventors: Akira Yoshitomo, Tatsuya Iwai
  • Publication number: 20110104078
    Abstract: The invention includes an UV absorbing complex polyol polyester polymer that is the product of a reaction scheme that includes: (i) the esterification of a polyol and a dianhydride, wherein the esterification is carried out under conditions that facilitate substantially only anhydride opening, to form a polyester polymer comprising at least two pendant carboxylic groups, and at least two hydroxyl groups; and (ii) the reaction of at least one pendant carboxylic group and at least one terminal hydroxyl group of the polyester polymer with an epoxide having a functional group, wherein the epoxide comprises an UV absorbing moiety. Also included are linear UV absorbing complex polyol polyester polymers represented by Formula (XI): wherein R3 is independently selected from an UV absorbing moiety; R4 and R5 are each independently selected from a hydrocarbon group, and n is an integer of 1 to 1000.
    Type: Application
    Filed: November 2, 2010
    Publication date: May 5, 2011
    Inventors: Rocco Burgo, Daniel Winn
  • Patent number: 7927627
    Abstract: The present invention is directed to fibrate compositions having improved pharmacokinetic profiles and reduced fed/fasted variability. The fibrate particles of the composition have an effective average particle size of less than about 2000 nm.
    Type: Grant
    Filed: May 23, 2007
    Date of Patent: April 19, 2011
    Assignees: Elan Pharma International, Ltd., Fournier Laboratories Ireland, Ltd.
    Inventors: Tuula Ryde, Evan E. Gustow, Stephen B. Ruddy, Rajeev Jain, Rakesh Patel, Michael John Wilkins
  • Patent number: 7858825
    Abstract: The invention provides compounds that are useful as linkers for solid phase synthesis and as protecting groups, and methods for producing and using the same.
    Type: Grant
    Filed: February 15, 2008
    Date of Patent: December 28, 2010
    Assignee: Colorado State University Research Foundation
    Inventors: Michio Kurosu, Dean Crick
  • Publication number: 20100266952
    Abstract: A cyclic compound shown by the following formula (I): wherein, of two R1s which are present on the same aromatic ring, one is a group shown by R3, and the other is a dissolution controlling group; R3s are independently hydrogen, a substituted or unsubstituted linear aliphatic hydrocarbon group having 1 to 20 carbon atoms, a substituted or unsubstituted branched aliphatic hydrocarbon group having 3 to 12 carbon atoms, a substituted or unsubstituted cyclic aliphatic hydrocarbon group having 3 to 20 carbon atoms, a substituted or unsubstituted aromatic group having 6 to 10 carbon atoms, an alkoxyalkyl group, a silyl group or a group formed by combining these groups with a divalent group.
    Type: Application
    Filed: December 11, 2008
    Publication date: October 21, 2010
    Applicant: IDEMITSU KOSAN CO., LTD.
    Inventors: Takashi Kashiwamura, Akinori Yomogita, Mitsuru Shibata, Takanori Owada, Hirotoshi Ishii, Masashi Sekikawa, Norio Tomotsu
  • Publication number: 20100137629
    Abstract: The present invention relates to a method for the crystallization of n-hexyl 2-(4-N,N-diethylamino-2-hydroxybenzoyl)benzoate, to a method for the production of pourable or flowable particles of crystalline n-hexyl 2-(4-N,N-diethylamino-2-hydroxybenzoyl)benzoate and to specific pourable or flowable particles of crystalline n-hexyl 2-(4-N,N-diethylamino-2-hydroxybenzoyl)benzoate.
    Type: Application
    Filed: April 17, 2008
    Publication date: June 3, 2010
    Applicant: BASF SE
    Inventors: Samantha Champ, Manfred Hetterich, Günther Gottwald
  • Publication number: 20100121069
    Abstract: An electron withdrawing group substituted ?-arylolefin derivative represented by general formula (I) (in the formula, Ar1 represents an aryl group, E represents a formyl, acyl and so on) is allowed to react with an arylboronic acid represented by general formula (II) Ar2—BXmMn in the general formula (IV) RhYoL1p (Chiraphos)q (in the formula, Y represents ClO4, BF4, PF6, SbF6, OTf, halogen atom, hydroxyl group, alkoxy group or acyloxy group, L1 represents an organic ligand) to produce an optically active ?-diaryl electron withdrawing group substituted compound represented by general formula (V)
    Type: Application
    Filed: July 13, 2007
    Publication date: May 13, 2010
    Inventors: Norio Miyaura, Yasunori Yamamoto, Takashi Nishikata, Takahiro Itoh
  • Publication number: 20100047709
    Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition.
    Type: Application
    Filed: November 1, 2007
    Publication date: February 25, 2010
    Inventors: Masatoshi Echigo, Dai Oguro
  • Publication number: 20100016597
    Abstract: Disclosed is a method for producing pulverized particles of a crystalline organic compound which is poorly water-soluble. Also disclosed is a pulverized organic compound particle produced by such a method. Specifically disclosed is a method for producing a poor water solubility organic compound particle for medical use, which is characterized in that a poor water solubility organic compound for medical use is mixed with a physiologically acceptable salt and a physiologically acceptable polyol, and subjected to wet milling. Also specifically disclosed is a poor water solubility organic compound particle for medical use, which is produced by such a production method.
    Type: Application
    Filed: September 24, 2009
    Publication date: January 21, 2010
    Applicant: Activus Pharma Co., Ltd.
    Inventors: Takashi Hirokawa, Takahiro Tada
  • Publication number: 20100010253
    Abstract: The present invention relates to a method of working up an aluminium-containing reaction product from the production of isopulegol by cyclization of citronellal in the presence of complex compounds, comprising at least one ligand of the formula (I), where Ar1, Ar2, Ar3, Ar4 are chosen from C6-C15-aryl or C2-C15-hetero; R1, R2, R3, R4 are chosen from H, C1-C6-alkyl, C1-C6-perfluoroalkyl, C1-C6-alkoxy, C7-C12-aralkyl, halogen, SiR5bR6bR7b, C6-C10-aryl, NR8bR9b, SR10b, NO2; and where R1 or R2 and/or R3 or R4, together with A, can form an aromatic or nonaromatic cycle; etc.; in which a) the aluminum-containing reaction product is subjected to distillative separation, b) the isopulegol-depleted bottom product is brought into close contact with an aqueous base and c) the ligand of the formula (I) is separated off from the organic phase, preferably by crystallization. Moreover, the invention relates to a method of producing isopulegol, and to a method of producing menthol.
    Type: Application
    Filed: August 31, 2007
    Publication date: January 14, 2010
    Applicant: BASF SE
    Inventors: Gunnar Heydrich, Gabriele Gralla, Klaus Ebel
  • Publication number: 20100009284
    Abstract: A compound including a polyhydric phenol compound represented by general formula (I) shown below (wherein R11 to R17 each independently represents an alkyl group of 1 to 10 carbon atoms or aromatic hydrocarbon group which may contain a hetero atom in the structure thereof, and X represents an aliphatic cyclic group) and having a molecular weight of 300 to 2,500, in which some or all of the hydrogen atoms of the phenolic hydroxyl groups are substituted with acid dissociable, dissolution inhibiting groups; a positive resist composition containing the compound; and a method of forming a resist pattern using the positive resist composition.
    Type: Application
    Filed: June 7, 2006
    Publication date: January 14, 2010
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Daiju Shiono, Taku Hirayama, Hideo Hada
  • Publication number: 20090269698
    Abstract: The present invention provides a compound that can be used within a resist composition, an intermediate compound for the compound, a positive resist composition, and a method for forming a resist pattern.
    Type: Application
    Filed: August 3, 2007
    Publication date: October 29, 2009
    Inventors: Daiju Shiono, Hideo Hada
  • Publication number: 20090221527
    Abstract: The present invention is directed to compounds that are allosteric inhibitors of tumor necrosis factor receptor I, compositions comprising such compounds, and methods of using such compounds and compositions thereof in the treatment of TNF-? mediated conditions.
    Type: Application
    Filed: January 31, 2006
    Publication date: September 3, 2009
    Applicants: CEPTION THERAPEUTICS, INC., TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIA
    Inventors: Mark I. Greene, Ramachandran Murali, Xin Cheng, Raphael Ottenbrite, Yingxin Xiao
  • Publication number: 20090220886
    Abstract: The present invention provides a polyhydric compound represented by the formula (I): wherein R51 to R67 each independently represent a hydrogen atom etc., at least one selected from the group consisting of R1 to R5 is a group represented by the formula (II): wherein Q1 and Q2 each independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., and A+ represents an organic counter ion, and the others are hydrogen atoms or groups represented by the formula (III): wherein X1 to X4 each independently represent a hydrogen atom etc., n represents an integer of 0 to 3, W represents any one of the following groups: Z1 represents a C1-C6 alkyl group etc., and ring Y represents a C3-C20 alicyclic hydrocarbon group, and a chemically amplified resist composition containing the same.
    Type: Application
    Filed: February 23, 2009
    Publication date: September 3, 2009
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Ichiki Takemoto, Nobuo Ando
  • Publication number: 20090176995
    Abstract: Disclosed are soluble diarylmethanofullerene derivatives that are effective as acceptors for organic thin-film solar batteries. They help to constitute effective organic thin-film solar batteries.
    Type: Application
    Filed: November 28, 2008
    Publication date: July 9, 2009
    Applicant: NATIONAL UNIVERSITY CORPORATION NAGOYA INSTITUTE OF TECHNOLOGY
    Inventors: Takeshi Toru, Norio Shibata, Shuichi Nakamura, Tetsuo Soga, Yasuhiko Hayashi, Surya Prakash Singh
  • Publication number: 20090162781
    Abstract: This resist composition is a resist composition containing a compound in which a portion or all of hydrogen atoms of phenolic hydroxyl groups in a polyhydric phenol compound (a) having two or more phenolic hydroxyl groups and having a molecular weight of 300 to 2,500 are substituted with at least one selected from the group consisting of acid dissociable dissolution inhibiting groups represented by the following general formulas (p1) and (p2) wherein R1 and R2 each independently represents a branched or cyclic alkyl group, and may contain a hetero atom in the structure; R3 represents a hydrogen atom or a lower alkyl group; and n? represents an integer of 1 to 3.
    Type: Application
    Filed: September 30, 2005
    Publication date: June 25, 2009
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Daiju Shiono, Taku Hirayama, Toshiyuki Ogata, Hideo Hada
  • Publication number: 20090155714
    Abstract: A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 10 to 5000 weight parts of an organic solvent. In the formula, n is 0 or 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, z is 0, 1, 2, 3 or 4, R, R? and R? are independently hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms, and R?? is a hydrogen atom or hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms.
    Type: Application
    Filed: December 17, 2008
    Publication date: June 18, 2009
    Inventors: Jae-Woo LEE, Min-Ja Yoo, Jun-Gyeong Lee, Young-Bae Lim, Jae-Hyun Kim
  • Patent number: 7534475
    Abstract: A new liquid crystal compound comprises two condensed and substituted rings. The ring preferably is a five-membered heterocyclic ring. The heterocyclic ring is preferably condensed with benzene ring or an aromatic six-membered heterocyclic ring. The benzene ring or the aromatic six-membered heterocyclic ring is preferably substituted with a group comprising a cyclic structure and a chain structure. The liquid crystal compound is advantageously used in preparation of a thin phase retarder, such as a wide-ranged ?/4 plate, which gives inverse wavelength distribution. The phase retarder can be easily produced according to a simple process by using the new liquid crystal compound.
    Type: Grant
    Filed: March 8, 2005
    Date of Patent: May 19, 2009
    Assignee: Fujifilm Corporation
    Inventors: Hideyuki Nishikawa, Ryo Hamasaki, Atsuhiro Ohkawa
  • Publication number: 20090081580
    Abstract: A positive type resist composition for forming a high resolution resist pattern and a method of forming a resist pattern are provided which use a low-molecular-weight material as a base component, and a compound and a dissolution inhibitor that are each suitable for the positive type resist composition. Here, the compound is a non-polymer having a molecular weight of 500 to 3000, and is decomposed under the action of an acid to produce two or more molecules of a decomposition product having a molecular weight of 200 or more; the dissolution inhibitor comprises the compound; the positive type resist composition comprises the compound and the acid generator component; and the method of forming a resist pattern uses the positive type resist composition.
    Type: Application
    Filed: April 17, 2006
    Publication date: March 26, 2009
    Applicant: TOKYO OHKA KOGYO CO., LTD
    Inventors: Daiju Shiono, Taku Hirayama, Toshiyuki Ogata, Shogo Matsumaru, Hideo Hada
  • Publication number: 20090039322
    Abstract: Disclosed herein are compounds of formula (I), compositions having compounds of formula (I) and methods of stabilizing a photodegradable polymer or compound in a composition; wherein R1, R2, and R3 are the same or different and are selected from the group consisting of C1-C30 alkyl, C3-C8 cycloalkyl, substituted alkyl, substituted cycloalkyl, ester, aryl, heteroaryl, heterocycloalkyl, substituted aryl, substituted heteroaryl, substituted heterocycloalkyl, and amino; R4, R5, R6, and R7 are each independently selected from the group consisting of hydrogen and alkoxy, wherein R4 and R5 cannot both be hydrogen and R6 and R7 cannot both be hydrogen; a, b, c, and d are each independently an integer of 1 to 4; n is an integer of 1 to 100; and s is an integer of 0 to 100.
    Type: Application
    Filed: August 9, 2007
    Publication date: February 12, 2009
    Applicant: HALLSTAR INNOVATIONS CORP.
    Inventors: Craig A. Bonda, Anna Pavlovic
  • Publication number: 20090036684
    Abstract: The present invention provides a compound useful as a synthetic intermediate for an anti-HIV agent having an integrase inhibitory activity, and a production method thereof, and a production method of an anti-HIV agent using the synthetic intermediate. Specifically, for example, a compound represented by the formula (2?): wherein R is a fluorine atom or a methoxy group, and R400 is a hydrogen atom or a C1-C4 alkyl group, or a salt thereof, and a production method thereof, and a production method of an anti-HIV agent using the synthetic intermediate.
    Type: Application
    Filed: March 6, 2007
    Publication date: February 5, 2009
    Inventors: Koji Matsuda, Koji Ando, Shigeki Ohki, Jun-ichi Hoshi, Takahiro Yamasaki
  • Publication number: 20090023926
    Abstract: The present invention provides a compound of the formula: (IIa); having a reactive functional group M, capable of reacting with a biopolymer, BP, having at least one group capable of reacting with M to form a covalent linkage, to provide a biopolymer derivative of the formula: (IIIa). The biopolymer derivatives of the invention have enhanced ionisability with respect to free 10 biopolymer (Bp) enabling improved analysis of the biopolymer using mass spectrometry. The invention further provides specific examples of compounds formula (IIa), e.g. compounds of formula: (IIa-2a) and (IIa-58a).
    Type: Application
    Filed: September 22, 2005
    Publication date: January 22, 2009
    Inventors: Edwin Mellor Southern, Vladimir Korshun, Mikhail Sergeevich Shchepinov
  • Publication number: 20080312322
    Abstract: A compound of formula (I); in free or pharmaceutically acceptable salt form, where R1, R2, R3, R4, R5, m, n, w, X, Y and Q have the meanings as indicated in the specification, are useful for treating conditions mediated by the CRTh2 receptor, especially inflammatory or obstructive airways diseases.
    Type: Application
    Filed: May 22, 2006
    Publication date: December 18, 2008
    Inventors: Urs Baettig, Brian Cox, Katharine Louise Turner, Simon James Watson, Diana Janus, Catherine Leblanc, David Andrew Sandham
  • Patent number: 7456136
    Abstract: A linear compound and a metal salt or boron-containing metal salt thereof contains one or more carboxyl-containing phenol units or derivatives thereof and one or more on average at least C18 hydrocarbyl-substituted hydroxyaromatic units or derivatives thereof connected by one or more divalent bridging groups. A concentrate contains the linear compound or metal salt thereof and an organic diluent. A lubricating oil composition contains a minor amount of the linear compound or metal salt thereof and a major amount of a lubricating oil. Additional embodiments of the invention are processes to make the linear compound and the metal salt thereof.
    Type: Grant
    Filed: August 21, 2002
    Date of Patent: November 25, 2008
    Assignee: The Lubrizol Corporation
    Inventors: David J. Moreton, Stephen J. Cook, David Cressey
  • Publication number: 20080248584
    Abstract: Compounds of formula (IIa): are provided where: X is a group capable of being cleaved from the ?-carbon atom to form an ion of formula (I?) C is a carbon atom bearing a single positive charge or a single negative charge; The invention further provides compounds of formula (IIb): where: X is a counter-ion to C. The compounds of formula (IIa) and (IIb) may form ions of formula (I?) by either cleaving the C—X bond between X and the ?-carbon atoms in the case of the compounds of formula (IIa) or dissociating X in the case of compounds of formula (IIb).
    Type: Application
    Filed: August 22, 2007
    Publication date: October 9, 2008
    Inventors: Mikhail Sergeevich SHCHEPINOV, Edwin Mellor SOUTHERN
  • Publication number: 20080214860
    Abstract: The present invention concerns a method for preparation of fispemifene by use of ospemifene as a starting material.
    Type: Application
    Filed: February 13, 2008
    Publication date: September 4, 2008
    Inventors: Marja Sodervall, Maire Eloranta, Arja Kalapudas, Brian Kearton, Michael McKenzie
  • Publication number: 20080194790
    Abstract: The invention relates to a hydroxy-aromatic compound of formula (I): wherein: at least one of the set consisting of R1, R3, and R5 is a group of formula (II); any remaining one or two of the set consisting of R1, R3, and R5 being H, OH, a C1-C12 alkyl group or an oligomeric or polymeric system; R2 and R4 are H, OH, a C1-C12 alkyl group or an oligomeric or polymeric system; formula (II) is the following group: wherein EWG is an electron-withdrawing group.
    Type: Application
    Filed: December 1, 2005
    Publication date: August 14, 2008
    Inventors: Rudolfus A.T.M. Van Benthem, Renier H.M. Kierkels
  • Patent number: 7393969
    Abstract: The present invention relates to calix[4]arenes which effectively bind alkali metal ions (Na+, K+) and transport them over phase boundaries, their preparation and use.
    Type: Grant
    Filed: August 16, 2005
    Date of Patent: July 1, 2008
    Assignee: Bayer Technology Services GmbH
    Inventors: Michael Traving, Wilfried Gutknecht, Werner Bäcker, Wolfgang Kummer, Rainer Ludwig