Abstract: Provided are: a method for producing fluorenylidene diallylphenols represented by formula (1), the method including a reaction step for reacting fluorenones represented by formula (2) and allylphenols represented by formula (3) in the presence of an acid catalyst, excluding compounds having mercapto groups, the amount of acid catalyst being 0.001-20 mol per mol of compound represented by formula (2); and fluorenylidene diallylphenols represented by formula (4).

Abstract: Embodiments in accordance with the present invention relate generally to polycarbonate polymers having repeat units derived from adamantane epoxide monomers and methods of using such polymers and compositions containing them. The compositions thus formed are useful in a variety of optoelectronic device fabrications.

Abstract: A fluorene-containing compound having a formula (I) where X and R are as defined in as defined in the specification.

Abstract: Disclosed are a process and catalysts useful for carrying out asymmetric methlyallylations. The catalysts used in the invention have the formula (IV): wherein X1, X2, R3 and R4 are as defined herein. Compounds made by the process of the invention can be used to prepare pharmaceutically active compounds such as 11-?-hydroxysteroid hydrogenase type 1 (11-?-HSD1) inhibitors including 1,3-disubstituted oxazinan-2-ones.

Abstract: Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern.

Abstract: A monomer for a hardmask composition is represented by the following Chemical Formula 1,

Abstract: Providing a method for forming a pattern capable of forming a resist underlayer film that can be easily removed using an alkali liquid while maintaining etching resistance is objected to. Provided by the present invention is a method for forming a pattern, the method including: (1) forming a resist underlayer film on a substrate using a composition for forming a resist underlayer film containing a compound having an alkali-cleavable functional group; (2) forming a resist pattern on the resist underlayer film; (3) forming a pattern on the substrate by dry etching of the resist underlayer film and the substrate, using the resist pattern as a mask; and (4) removing the resist underlayer film with an alkali liquid.

Abstract: An object of the invention is to provide an anthracene derivative having characteristics peculiar to anthracene such as e.g., high carbon density, high melting point, high refractive index and fluorescent properties for ultraviolet rays, etc., and reaction diversity that results from the bisphenol structure, and a process for producing the same. Disclosed is an anthracene derivative represented by the following general formula (1): in the formula (1), X and Y each independently represent a hydroxyaryl group. The aforementioned X and Y are preferably a hydroxyphenyl group. In addition, the anthracene derivative can be produced by a process including allowing at least one compound selected from phenols and anthracene-9-carboaldehyde to react in the presence of an oxygen-containing inert organic solvent and an acid catalyst.

Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A?, L and n are the same as in the detailed description.

Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Abstract: A cyclic compound of the present invention has a molecular weight of 500 to 5000, and is represented by the following formula (1):

Abstract: Disclosed herein are indane bisphenol monomer units, and polymers derived from such monomer units. Also disclosed herein are blends including such polymers, articles made from such polymers and blends, methods of using such monomers, polymers, and blends, and processes for preparing such monomers, polymers, and blends.

Abstract: This invention relates to a resveratrol polymerization compound represented by Formula (1) (in which, in Formula (1), R1 and R2 represent —OH or Formula (2) and R1 and R2 are not the same) or a pharmaceutically acceptable salt thereof and an anticancer agent, an anticancer agent for oral cancer, an antioxidant, an antibacterial agent, a lipase inhibitor, an antiobesity agent, a therapeutic agent for skin diseases, a food, a pharmaceutical agent, a quasi drug, or a cosmetic containing one or more compounds selected from the group consisting of the resveratrol polymerization compound and the pharmaceutically acceptable salt thereof.

Abstract: A biphenyl derivative having formula (1) is provided wherein Ar1 and Ar2 denote a benzene or naphthalene ring, and x and z each are 0 or 1. A material comprising the biphenyl derivative or a polymer comprising recurring units of the biphenyl derivative is spin coated and heat treated to form a resist bottom layer having improved properties, optimum values of n and k, step coverage, etch resistance, heat resistance, solvent resistance, and minimized outgassing.

Abstract: Dihydroxyaryl compounds and pharmaceutically acceptable esters, their synthesis, pharmaceutical compositions containing them, and their use in the treatment of ?-amyloid diseases, such as observed in Alzheimer's disease, and synucleinopathies, such as observed in Parkinson's disease, and the manufacture of medicaments for such treatment.

Abstract: This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition.

Abstract: A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

Abstract: A polymer, a luminescent material, and the likes are provided, wherein a film can be formed by a wet film-forming method, the film formed has a high stability, and is capable of being laminated with other layers by a wet film-forming method or another method, which are less decrease in charge transportation efficiency or luminescent efficiency, and attain an excellent driving stability. The polymer has a thermally dissociable and soluble group.

Abstract: A monomer for a hardmask composition is represented by the following Chemical Formula 1,

Abstract: Disclosed are a process and catalysts useful for carrying out asymmetric methlyallylations. The catalysts used in the invention have the formula (IV): wherein X1, X2, R3 and R4 are as defined herein. Compounds made by the process of the invention can be used to prepare pharmaceutically active compounds such as 11-?-hydroxysteroid hydrogenase type 1 (11-?-HSD1) inhibitors including 1,3-disubstituted oxazinan-2-ones.

Abstract: This invention related to atropisomeric 1,8-bisphenolnaphthalenes and derivatives thereof of the general formula (I): which are useful in resolution of enantiomers, enantioselective recognition and asymmetric synthesis.

Abstract: Novel method for synthesis of optically pure (S)-(?)-1,1?-bi-2-naphthol and/or (R)-(+)-1,1?-bi-2-naphthol via resolution of racemic (RS)-1,1?-bi-2-naphthol through formation of co-crystal with optically active derivatives of ?-amino acids.

Abstract: A cyclopolyarylene compound represented by Formula (1): wherein k is the same or different, and each represents 0, 1 or 2; m is the same or different, and each represents 1, 2 or 3; and n represents 3, 4, 5 or 6.

Abstract: Disclosed herein are indane bisphenol monomer units, and polymers derived from such monomer units. Also disclosed herein are blends including such polymers, articles made from such polymers and blends, methods of using such monomers, polymers, and blends, and processes for preparing such monomers, polymers, and blends.

Abstract: The present invention relates to an epoxy group-containing novel fluorene compound having a methallyl group at the end thereof represented by the following general formula (1): wherein R represents a hydrogen atom or a methyl group, which compound gives a compound excellent in regioselectivity at the time of hydrosilylation with a Si—H containing organosilicon compound, with a less formed amount of an internally added ? adduct, as compared with the conventionally known fluorene compound having an allyl group, so that heat resistance of the resulting organosilicon compound is expected to be improved whereby it is a useful compound.

Abstract: The invention provides a compound for forming an organic film having a partial structure represented by the following formula (i) or (ii), wherein the ring structures Ar1, Ar2 and Ar3 each represent a substituted or unsubstituted benzene ring or naphthalene ring; e is 0 or 1; R0 represents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; L0 represents a linear, branched or cyclic divalent organic group having 1 to 32 carbon atoms; and the methylene group constituting L0 may be substituted by an oxygen atom or a carbonyl group. There can be provided an organic film composition for forming an organic film having high dry etching resistance as well as advanced filling/planarizing characteristics.

Abstract: A compound having the structure: wherein bond ? is present or absent, wherein when bond ? is absent, then R1 is ?O or S(CH2)1-3-phenyl and when bond ? is present, then R1 is H, wherein the phenyl is substituted or unsubstituted; R2, R3, R4, R5, R6, R7, R8, R9 and R10 are independently H or OR11 wherein each occurrence of R11 is independently H, methyl, substituted or unsubstituted alkyl, substituted or unsubstituted aryl, phosphate, sulfate, sulfonic ester, or ester; when ? is absent and R1 is ?O, then R10 is other than OH; and when ? is absent and R1 is S(CH2)1-3-phenyl, then R10 is other than OCH3, or a salt thereof.

Abstract: Disclosed are compositions and methods for treating and/or preventing infections in mammals, by administering to a mammal a therapeutically effective amount of at least one defensin-like molecule, e.g., in a composition that includes such molecule. Also disclosed are kits that include such molecules, or compositions that include such molecules, as well as instructions for using such molecules to treat a mammal.

Abstract: Embodiments in accordance with the present invention provide for norbornane-type ballast materials, norbornane-type photoactive compounds derived from such ballast materials and alkali-soluble positive-tone polymer compositions that encompass such norbornane-type photoactive compounds and one of a PBO or PNB resin.

Abstract: An industrially advantageous purification method for a cyclic compound with a particular structure is provided. A purification method for a cyclic compound, including a step of contacting a solution containing a cyclic compound with a particular structure and an organic solvent with water or an acidic aqueous solution.

Abstract: This disclosure includes a process that unexpectedly can produce very inexpensive graphene, functionalized graphenes, and a new compound called graphenol in particulate or dispersions in solvents. The process can also produce graphene layers on metallic and nonmetallic substrates. Further, the graphenol, functionalized graphenes, and graphene can be utilized to form nanocomposites that yield property improvements exceeding anything reported previously.

Abstract: Gossypol and apogossypol derivatives of general formula (1), preparation thereof and use thereof.

Abstract: This disclosure includes a process that unexpectedly can produce very inexpensive graphene and a new compound called graphenol in particulate or dispersions in solvents. The process can also produce graphene layers on metallic and nonmetallic substrates. Further, the graphenol and graphene can be utilized to form nanocomposites that yield property improvements exceeding anything reported previously.

Abstract: There is disclosed A resist underlayer film composition, the resist underlayer film composition contains a truxene compound having a substituted or an unsubstituted naphthol group as shown by the following general formula (1). There can be provided a resist underlayer film composition to form a resist underlayer film being capable of reducing reflectance and having high etching resistance, heat resistance.

Abstract: There is disclosed a resist top coat composition, used in a patterning process onto a photoresist film, wherein a resist top coat is formed by using the resist top coat composition onto a photoresist film formed on a wafer, and then, after exposure, removal of the resist top coat and development of the photoresist film are performed to effect the patterning on the photoresist film, wherein the resist top coat composition contains a truxene compound having phenol groups shown by the following general formula (1). As a result, there is provided a resist top coat composition not only having an effect from an environment to a resist film reduced and effectively shielding an OOB light, but also reducing film loss of a resist pattern and bridging between patterns and having an effect to enhance sensitivity of the resist; and a patterning process using this.

Abstract: A compound shown by the following formula (1).

Abstract: Novel method for synthesis of optically pure (S)-(?)-1,1?-bi-2-naphthol and/or (R)-(+)-1,1?-bi-2-naphthol via resolution of racemic (RS)-1,1?-bi-2-naphthol through formation of co-crystal with optically active derivatives of ?-amino acids.

Abstract: A biphenyl derivative having formula (1) is provided wherein Ar1 and Ar2 denote a benzene or naphthalene ring, and x and z each are 0 or 1. A material comprising the biphenyl derivative or a polymer comprising recurring units of the biphenyl derivative is spin coated and heat treated to form a resist bottom layer having improved properties, optimum values of n and k, step coverage, etch resistance, heat resistance, solvent resistance, and minimized outgassing.

Abstract: This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition.

Abstract: An object of the invention is to provide an anthracene derivative having characteristics peculiar to anthracene such as e.g., high carbon density, high melting point, high refractive index and fluorescent properties for ultraviolet rays, etc., and reaction diversity that results from the bisphenol structure, and a process for producing the same. Disclosed is an anthracene derivative represented by the following general formula (1): in the formula (1), X and Y each independently represent a hydroxyaryl group. The aforementioned X and Y are preferably a hydroxyphenyl group. In addition, the anthracene derivative can be produced by a process including allowing at least one compound selected from phenols and anthracene-9-carboaldehyde to react in the presence of an oxygen-containing inert organic solvent and an acid catalyst.

Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with good shape and a method of forming a resist pattern and novel compositions for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Radiation-sensitive composition containing a solvent and a cyclic compound having, e.g., a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups, and a cyclic compound for use in the radiation-sensitive composition.

Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Abstract: This invention relates to methods, compositions, and apparatuses for producing macrocyclic compounds. First, one or more reactants are provided in a reaction medium, which are capable of forming the macrocyclic compound through a desired reaction pathway that includes at least cyclization, and which are further capable of forming undesired oligomers through a undesired reaction pathway that includes undesirable oligomerization. Oligomerization of such reactions in the reaction medium is modulated to reduce formation of undesired oligomers and/or to reduce separation of the undesired oligomers from the reaction medium, relative to a corresponding unmodulated oligomerization reaction, thereby maximizing yields of the macrocyclic compound. The macrocyclic compound so formed is then recovered from the reaction medium. Preferably, the macrocyclic compound spontaneously separates from the reaction medium via phase separation.

Abstract: An object of the present invention is to provide a process for producing high-purity hydroxytriphenylenes in which not only inexpensive raw materials can be used but also no complicated steps of deprotection such as dealkylation, and reduction and the like are necessary, and which is thereby advantageous in industrial production. Also there is provided a novel crystal of 2,3,6,7,10,11-hexahydroxytriphenylene monohydrate, which has satisfactory thermal stability. The process for producing a compound represented by the general formula (2) is characterized by reacting a compound represented by the general formula (1) in the presence of a metal oxide comprising a metal selected from trivalent iron, pentavalent vanadium and hexavalent molybdenum and of a nonvolatile strong acid: wherein, Rs are each independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 3 carbon atoms or an alkoxy group having 1 to 3 carbon atoms.

Abstract: A method of using a crystallographic framework of sterically bulky calixarene molecules to selectively separate and/or store volatile gas components. Sterically bulky calix[4]arenes or their derivatives form a crystalline lattice that has relatively large lattice voids, is nonporous, and is held together predominately by van der Weals forces. The calix[4]arene lattice can form a guest-host assembly by absorbing a desired volatile gas guest component into the crystalline lattice without any phase shift or other change to the lattice structure. The crystalline calixarene can also be desirably used to purify a gas mixture by removing one or more volatile gas contaminants or by removing and storing the desired volatile gas component. This method can preferably be used to purify a hydrogen gas stream by removing the carbon dioxide and carbon monoxide contaminants or to remove and store oxygen from the air or carbon dioxide and carbon monoxide from combustion gases.

Abstract: A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner.

Abstract: Functionalized fullerenes are used in a method of combating fungal growth on surfaces and treating fungal diseases of patients. Surfaces that can be treated by the materials comprising an effective amount of functionalized fullerenes include those of fruits, vegetables, harvested grains, plants, or plant seeds. The method of combating fungal growth on a surface can be augmented but is not dependent on irradiation of the surface by light. Functional fullerenes are employed in various dosage forms such as topical, ingestible or administration.