Abstract: The disclosure is related to a method for performing SPM measurements, wherein a sample is attached to a cantilever and scanned across a tip. The tip is one of several tips present on a substrate comprising at least two different types of tips on its surface, thereby enabling performance of multiple SPM measurements requiring a different type of tip, without replacing the cantilever. The at least two different types of tips are different in terms of their material, in terms of their shape or size, and/or in terms of the presence or the type of active or passive components mounted on or incorporated in the substrate, and associated to tips of one or more of the different types. The disclosure is equally related to a substrate comprising a plurality of tips suitable for use in the method of the disclosure.

Abstract: The present invention relates to nanoprocessing and heterostructuring of silk. It has been shown that few-cycle femtosecond pulses are ideal for controlled nanoprocessing and heterostructuring of silk in air. Two qualitatively different responses, ablation and bulging, were observed for high and low laser fluence, respectively. Using this approach, new classes of silk-based functional topological microstructures and heterostructures which can be optically propelled in air as well as on fluids remotely with good control have been fabricated.

Abstract: Determination of non-linearity of a positioning scanner of a measurement tool is disclosed. In one embodiment, a method may include providing a probe of a measurement tool coupled to a positioning scanner; scanning a surface of a first sample with the surface at a first angle relative to the probe to attain a first profile; scanning the surface of the first sample with the surface at a second angle relative to the probe that is different than the first angle to attain a second profile; repeating the scannings to attain a plurality of first profiles and a plurality of second profiles; and determining a non-linearity of the positioning scanner using the different scanning angles to cancel out measurements corresponding to imperfections due to the surface of the sample. The non-linearity may be used to calibrate the positioning scanner.

Abstract: Apparatus and techniques for extracting information carried in higher eigenmodes or harmonics of an oscillating cantilever or other oscillating sensors in atomic force microscopy and related MEMs work are described. Similar apparatus and techniques for extracting information from piezoelectric, polymer and other materials using contact resonance with multiple excitation signals are also described.

Abstract: The arrangement for calibrating probes comprises a source (10) of coherent photon radiation and at least one optically based strain sensor (12a) for measuring an amount of strain (?). The at least one optically based strain sensor is optically coupled to said source of coherent photon radiation. The arrangement further comprises at least one calibration lever (14) having a surface for placement of a tip (21) of a probe (2) to be calibrated, and that is mechanically coupled to the at least one optically based strain sensor for converting a force (F) exerted by said tip at said surface into an amount of strain in the optically based strain sensor. The arrangement further comprises at least one probe holder (24) for holding the probe (2) to be calibrated, the at least one probe holder having a controllable position in at least a direction (y) transverse to the surface of the calibration lever (14).

Abstract: The arrangement for calibrating probes comprises a source (10) of coherent photon radiation and at least one optically based strain sensor (12a) for measuring an amount of strain (?). The at least one optically based strain sensor is optically coupled to said source of coherent photon radiation. The arrangement further comprises at least one calibration lever (14) having a surface for placement of a tip (21) of a probe (2) to be calibrated, and that is mechanically coupled to the at least one optically based strain sensor for converting a force (F) exerted by said tip at said surface into an amount of strain in the optically based strain sensor. The arrangement further comprises at least one probe holder (24) for holding the probe (2) to be calibrated, the at least one probe holder having a controllable position in at least a direction (y) transverse to the surface of the calibration lever (14).

Abstract: A structure for the characterization of a tip of an atomic force microscope, the structure being produced on a substrate and including a first support element located above the substrate; a first characterization element with a constant thickness, the first characterization element being located above the first support element and having an upper flat surface and a lower flat surface covering the upper surface of the first support element with two zones extending beyond the upper surface of the first support element, each zone having a characterization surface at one end which is capable of coming into contact with a tip to be characterized, the upper surface and the lower surface of said first characterization element being parallel to the upper surface of the substrate.

Abstract: To measure surface potentials in a liquid, the in-liquid potential measurement device according to the present invention includes: a cantilever having a probe at its free end; a displacement measurement unit that measures a voltage corresponding to a displacement of a tip of the cantilever; an AC source that applies an AC voltage between the probe and the sample; and a signal detection unit. A frequency of the AC voltage is 10 kHz or higher. The signal detection unit detects, from the voltage measured by the displacement measurement unit, an amplitude of a frequency component having the same frequency as that of the AC voltage, an amplitude of a frequency component having double frequency of that of the AC voltage, and a frequency component having the same phase as that of the frequency of the AC voltage.

Abstract: Provided is a method of evaluating a probe tip shape in a scanning probe microscope, including: measuring the probe tip shape by a probe shape test sample having a needle-like structure; determining radii of cross-sections at a plurality of distances from the apex; and calculating, based on the distances and the radii, a radius of curvature when the probe tip shape is approximated by a circle.

Abstract: An optimal input design method and apparatus to achieve rapid broadband nanomechanical measurements of soft materials using the indentation-based method for the investigation of fast evolving phenomenon, such as the crystallization process of polymers, the nanomechanical measurement of live cell during cell movement, and force volume mapping of nonhomogeneous materials, are presented. The indentation-based nanomechanical measurement provides unique quantification of material properties at specified locations. Particularly, an input force profile with discrete spectrum is optimized to maximize the Fisher information matrix of the linear compliance model of the soft material.

Abstract: Provided are a surface state measuring device which can measure an alternating force of an arbitrary frequency and which is excellent in spatial resolution, and a surface state measuring method using the device. This surface state measuring device measures the surface state of a sample by detecting the modulation of the oscillation of a probe arranged above the sample. The measuring device comprises: a cantilever having a probe near a free end; an excitation mechanism for exciting the cantilever; a scanning mechanism for making the probe scan the sample by moving the probe and the sample relative to each other; and alternating force generator for generating an alternating force of an arbitrary frequency in a space; and a modulation measuring mechanism for measuring the degree of frequency modulation or amplitude modulation of the oscillations of the probe, which are generated by the alternating force.

Abstract: A dynamic probe detection system (29,32) is for use with a scanning probe microscope of the type that includes a probe (18) that is moved repeatedly towards and away from a sample surface. As a sample surface is scanned, an interferometer (88) generates an output height signal indicative of a path difference between light reflected from the probe (80a,80b,80c) and a height reference beam. Signal processing apparatus monitors the height signal and derives a measurement for each oscillation cycle that is indicative of the height of the probe. This enables extraction of a measurement that represents the height of the sample, without recourse to averaging or filtering, that may be used to form an image of the sample. The detection system may also include a feedback mechanism that is operable to maintain the average value of a feedback parameter at a set level.

Abstract: A method for characterizing an atomic force microscopy tip using a characterization structure having two inclined sidewalls opposite one another and of which at least one actual lateral distance separating the two inclined sidewalls corresponding to a given height is known, the method including scanning the surfaces of the inclined sidewalls by the tip, the scanning being carried out while the tip oscillates solely vertically; measuring, for the given height, the lateral distance separating the two inclined sidewalls, the measurement incorporating the convolution of the shape of the tip with the shape of the characterization structure; and determining a characteristic dimension of the tip as a function of the measured lateral distance, and of the actual lateral distance.

Abstract: An active scanner bow compensator for use with a scanner is described. The scanner includes a moveable scanning platform supported within a frame. The active scanner bow compensator supports the scanner and includes a frame of reference, sensors, and an actuator. The sensors detect out-of-plane motion of the scanning platform relative to the frame of reference, and the actuators compensate for the out-of-plane motion by adjusting the orientation of the frame relative to the frame of reference. The active scanner bow compensator may be used in atomic force microscopy applications.

Abstract: A calibration leveling system and method are provided which improve printing and imaging at the nanoscale including improved tip-based deposition and nanolithography. The system can include a scanning probe instrument having a video camera with an adjustable lens. The scanner can be coupled to a one or two dimensional array of cantilevers comprising cantilever tips for imaging or printing. The scanning probe instrument has one or more motors for controlling the scanner in the z-axis. The z-axis motors position the scanner so that the cantilever tips are in a level orientation relative to the surface of a substrate. Once the cantilever tips are level with the substrate, the positions of the z-axis motors can be recorded for future reference.

Abstract: The present invention allows simple and sensitive detection of microimpurities, microdefects, and corrosion starting points which may be present in a material. A probe microscope has a function to sense ions diffused from a specimen in a liquid. A probe is caused to scan over a predetermined range on a specimen. Then, the probe is fixed to a particular position in a liquid so as to set the distance between the specimen and the probe to a given value at which the microstructure of the specimen surface cannot be observed. Thereafter, one of the current between the probe and a counter electrode and the potential between the probe and a reference electrode is controlled, and the other of the current and potential which varies in accordance with the control is measured. Thus, ions diffused from the specimen are sensed.

Abstract: A portion of light emitted from a laser source (11) for detecting a displacement of a cantilever (4) is extracted by a half mirror (20) and guided onto a photodetector (21) having a light-receiving surface divided into four sections. When the direction of the emitted light is inclined due to a change in the ambient temperature or other factors, the light spot formed on the light-receiving surface of the photodetector (21) moves. Accordingly, the amount and direction of the inclination of the emission direction can be recognized from the amount and direction of the movement of the light spot. A drive amount calculator (22) calculates a drive amount according to the amount and direction of the inclination, and operates an actuator (23) to rotate the laser source (11) around each of the Y and Z axes. This operation compensates for the inclination of the direction of the emitted light and thereby prevents the inclination from being falsely recognized as an irregularity on the sample surface.

Abstract: An atomic force microscopy (AFM) method includes a scanning probe that scans a surface of a structure to produce a first structure image. The structure is then rotated by 90° with respect to the scanning probe. The scanning probe scans the surface of the structure again to produce a second structure image. The first and second structure images are combined to produce best fit image of the surface area of the structure. The same method is used to produce the best fit image of a flat standard. The best fit image of the flat standard is subtracted from the best fit image of the structure to obtain a true topographical image in which Z direction run out error is substantially reduced or eliminated.

Abstract: A The local probe microscopy apparatus (1) comprises a probe (3) with translation stages (5a, 5b) for controlling the position of the probe (3) relative to a sample surface. The probe (3) has a feedback mechanism (6, 5 7) for maintaining the deflection of the probe and a height measuring system (9) which includes means for compensating for environmental noise. The local probe microscopy apparatus is particularly suitable for use as a wafer inspection tool in a wafer fabrication plant where the inspection tool is liable to be exposed to significant mechanical vibration.

Abstract: Scanning probe microscope (SPM) images are enhanced by enforcing one or more symmetries that can be selected based on suitable Fourier coefficient amplitude or phase angle residuals, and/or geometric Akaike information criteria, and/or cross correlation techniques. Alternatively, this selection can be based on prior knowledge of specimen characteristics. In addition, a scanning microscope point spread function is obtained based on the evaluation of a calibration image by enforcing at least one symmetry and can be applied to other image acquisitions.

Abstract: A cantilever assembly (1) comprises a cantilever (10) having a cantilever tip (11). The cantilever is mounted to a rigid support (12,120,121) and is provided on its back side with an area (110) of a high reflectance material having a boundary (111) sloping towards the support (12). The extensions (c, ?c) of the area (110) and of the boundary (111) towards the support fulfil the condition c/?c?1 wherein c denotes the extension of the area (110) of the high reflectance material in the direction towards the support (12), and ?c denotes the extension of the sloped boundary (111) of the area (110) of the high reflectance material in the direction towards the support (12).

Abstract: Atomic force photovoltaic microscopy apparatus and related methodologies, as can be used to quantitatively measure spatial performance variations in functioning photovoltaic devices.

Abstract: The invention relates to a method for examining a sample by using probe microscopy, in particular scanning probe microscopy in which a sample is examined by way of a probe microscope with a multi-part measuring probe comprising a probe element and a guide clement guiding the probe element during the probe microscopy examination with the method furthermore comprising the following steps: capturing of noise measuring signals for the measuring probe in a non measuring configuration in which the probe clement is arranged separately from the guide element, capturing of measuring signals for the measuring probe in a measuring configuration in which the probe element is guided by the guide element, and analysing the measuring signals by at least partially assigning the measuring signals to the noise measuring signals. Further, the invention relates to a device for examining a sample with a probe microscope.

Abstract: A calibration structure for probing devices.

Abstract: Determination of non-linearity of a positioning scanner of a measurement tool is disclosed. In one embodiment, a method may include providing a probe of a measurement tool coupled to a positioning scanner; scanning a surface of a first sample with the surface at a first angle relative to the probe to attain a first profile; scanning the surface of the first sample with the surface at a second angle relative to the probe that is different than the first angle to attain a second profile; repeating the scannings to attain a plurality of first profiles and a plurality of second profiles; and determining a non-linearity of the positioning scanner using the different scanning angles to cancel out measurements corresponding to imperfections due to the surface of the sample. The non-linearity may be used to calibrate the positioning scanner.

Abstract: Force, pressure, or stiffness measurement or calibration can be provided, such as by using a graphene or other sheet membrane, which can provide a specified number of monolayers suspended over a substantially circular well. In an example, the apparatus can include a substrate, including a substantially circular well. A deformable sheet membrane can be suspended over the well. The membrane can be configured to include a specified integer number of one or more monolayers. A storage medium can comprise accompanying information about the suspended membrane or the substrate that, with a deflection displacement response of the suspended membrane to an applied force or pressure, provides a measurement of the applied force or pressure.

Abstract: An improved method of loading tips and other surfaces with patterning compositions or inks for use in deposition. A method of patterning is described, the method comprising: (i) providing at least one array of tips; (ii) providing a plurality of patterning compositions; (iii) ink jet printing at least some of the patterning compositions onto some of the tips; and (iv) depositing at least some of the patterning compositions onto a substrate surface; wherein the ink jet printing is adapted to prevent substantial cross-contamination of the patterning composition on the tips. Good printing reproducibility and control of printing rate can be achieved. The surfaces subjected to ink jet printing can be treated to encourage localization of the ink at the tip. The method is particularly important for high density arrays.

Abstract: A system (100) for characterizing surfaces can include a nanotip microscope (104) in a first pressure envelope (102) at a first pressure with an electrically conductive nanotip (110) mounted thereon for characterizing a sample surface. The system can also include an ion imaging system (122, 124, 128) within a second pressure envelope (120) at a second pressure. The second pressure can less than or equal to the first pressure and the pressure envelopes (102, 120) can be separated by a pressure limiting aperture (PLA) (132). The system can further include gas sources (116, 118) for introducing into the first pressure envelope (102) at least one gas, and a voltage supply (114) coupled to the nanotip (110) for generating an electric field between the nanotip (114) and the PLA (132).

Abstract: When a characterization of a tip of a diamond stylus for working is needed, the tip of the diamond stylus for working used is observed by a high resolution scanning electron microscope of a high acceleration voltage under a steam atmosphere. When the tip of the diamond stylus for working is worn or when a shape of the tip of the stylus needs to be changed, the tip of the diamond stylus for working is worked by selectively irradiating an electron beam only to a necessary region by increasing an amount of steam and an amount of a current of the electron beam. When a working chip is strongly adhered to the diamond stylus for working and needs to be removed, the electron beam is selectively irradiated only to the working chip adhered to the tip of the diamond stylus for working to be removed under a xenon fluoride atmosphere.

Abstract: A The local probe microscopy apparatus (1) comprises a probe (3) with translation stages (5a, 5b) for controlling the position of the probe (3) relative to a sample surface. The probe (3) has a feedback mechanism (6, 5 7) for maintaining the deflection of the probe and a height measuring system (9) which includes means for compensating for environmental noise. The local probe microscopy apparatus is particularly suitable for use as a wafer inspection tool in a wafer fabrication plant where the inspection tool is liable to be exposed to significant mechanical vibration.

Abstract: A signal coupling system interposed between a scanning probe and a measurement instrument provides signal communication between the scanning probe and the measurement instrument. The signal coupling system has a pre-stressed shape when the scanning probe is in a neutral position. The pre-stressed shape is designated to provide a characteristic impedance of the signal coupling system that varies linearly as a function of displacement of the scanning probe from the neutral position when the scanning probe is displaced, relative to the neutral position, over a designated range of displacements.

Abstract: Scanning probe microscope (SPM) images are enhanced by enforcing one or more symmetries that can be selected based on suitable Fourier coefficient amplitude or phase angle residuals, and/or geometric Akaike information criteria, and/or cross correlation techniques. Alternatively, this selection can be based on prior knowledge of specimen characteristics. In addition, a scanning microscope point spread function is obtained based on the evaluation of a calibration image by enforcing at least one symmetry and can be applied to other image acquisitions.

Abstract: A self-calibrating apparatus comprises a primary device and a test structure fabricated on an integrated circuit chip. The primary device and the test structure have at least one unknown property due to a fabrication process of the integrated circuit chip. An electrical measurand sensor is configured to measure an electrical measurand of the test structure. A controller coupled to the primary device and electrical measurand sensor. The controller is configured to calculate the at least one unknown property of the test structure based on the measured electrical measurand and use the calculated at least one unknown property to calibrate the primary device.

Abstract: Method and apparatus of easily controlling the Z-position of the probe used in a microprobe analyzer. The apparatus has: (A) a holder, (B) a reference body having a reference surface that is at the same height as a surface of a sample, the reference body being placed on or in the holder, (C) a probe-positioning device for bringing the probe into contact with the reference surface, (D) a controller for controlling motion of the probe-positioning device in the Z-direction, (E) position-measuring apparatus for measuring the Z-coordinate of the probe at which it is in contact with the reference surface, (F) a memory for storing a positional coordinate outputted by the position-measuring apparatus, and (G) probe contact detection apparatus for detecting that the probe is in contact with the reference surface.

Abstract: A dual tip probe for scanning probe epitaxy and a method of forming the dual tip probe are disclosed. The dual tip probe includes first and second tips disposed on a cantilever arm. The first and second tips can be a reader tip and a synthesis tip, respectively. The first tip can remain in contact with a substrate during writing and provide in situ characterization of the substrate and or structures written, while the second tip can perform in non-contact mode to write and synthesis nanostructures. This feature can allow the dual tip probe to detect errors in a printed pattern using the first tip and correct the errors using the second tip.

Abstract: Provided is a scanning probe microscope (SPM), a probe of which can be automatically replaced and the replacement probe can be attached onto an exact position. The SPM includes a first scanner that has a carrier holder, and changes a position of the carrier holder in a straight line; a second scanner changing a position of a sample on a plane; and a tray being able to store a spare carrier and a spare probe attached to the spare carrier. The carrier holder includes a plurality of protrusions.

Abstract: An object of the present invention is to provide a scanning electron microscope suitable for monitoring apparatus conditions of the microscope itself, irrespective of the presence of charge-up, specimen inclination, and the like. In order to achieve the object, proposed is a scanning electron microscope including a function to monitor the apparatus conditions on the basis of information obtained with an electron beam reflected before reaching a specimen. Specifically, for example, while applying a negative voltage to the specimen to reflect the electron beam before the electron beam reaches the specimen, and simultaneously supplying a predetermined signal to a deflector for alignment, the scanning electron microscope monitors changes of the detected positions of the reflected electrons of the electron beam. If the above-mentioned predetermined signal is under the condition where an alignment is properly performed, the changes of the detected positions of the electrons reflect deviation of an axis.

Abstract: A method of position control for scanning probe spectroscopy of a specimen. Probe positional error is determined by comparing images generated from a sequence of scans to identify differences between positions of at least a portion of a reference characteristic of the specimen in the images. A probe is moved to a target location for spectroscopic analysis, as a function of the determined probe positional error.