Auxiliary Means Serving To Assist Or Improve The Scanning Probe Techniques Or Apparatus, E.g., Display Or Data Processing Devices (epo) Patents (Class 850/8)
  • Publication number: 20100263096
    Abstract: The invention relates to a measuring probe device for a probe microscope, in particular a scanning probe microscope, with a measuring probe holder and a measuring probe arranged on the measuring probe holder, which is set up for a probe microscopic investigation of a sample, wherein on the measuring probe holder, a measuring probe chamber is formed, which receives the measuring probe at least partially and is open on a side away from the measuring probe holder, and is configured to receive a liquid surrounding the measuring probe. The invention also relates to a measuring cell for receiving a liquid sample for a probe microscope, a scanning probe microscope with a measuring probe device and a scanning probe microscope with a measuring cell.
    Type: Application
    Filed: July 24, 2008
    Publication date: October 14, 2010
    Inventors: Torsten Jähnke, Torsten Müller, Kathryn Anne Poole, Detlef Knebel
  • Publication number: 20100257644
    Abstract: A novel way for constructing and operating scanning probe microscopes to dynamically measure material properties of samples, mainly their surface hardness, by separating the functions of actuation, indentation and sensing into separate dynamic components. The amplitude and phase shift of higher modes occurring at periodic indentations with the sample are characteristic values for different sample materials. A separate sensor cantilever, connected to the indentation probe tip, has the advantage of a high mechanical amplification of a desired higher mode while suppressing the actuation signal itself. The operational range of the sensor can be extended just by switching the actuation signal to another submultiple of the sensor cantilever's resonance frequency and/or by using more than one sensor cantilever for each indentation tip.
    Type: Application
    Filed: February 13, 2007
    Publication date: October 7, 2010
    Inventors: Kimberly L. Turner, Benedikt Zeyen
  • Publication number: 20100100990
    Abstract: A system contains a first actuator half containing a first pair of actuator coils and a second pair of actuator coils located above the first pair of actuator coils, wherein the first pair of actuator coils is connected to a first metallic backing. A second actuator half is also providing within the system, which contains a first pair of actuator coils and a second pair of actuator coils located above the first pair of actuator coils, wherein the first pair of actuator coils is connected to a second metallic backing. The system also contains a mechanical flexure suspension having at least one flexure supporting a permanent magnet that is capable of moving, wherein the mechanical flexure suspension is located between the first actuator half and the second actuator half.
    Type: Application
    Filed: October 17, 2009
    Publication date: April 22, 2010
    Applicant: Massachusetts Institute of Technology
    Inventors: David L. Trumper, Ian MacKenzie
  • Publication number: 20100051807
    Abstract: The invention concerns a phase plate, in particular for an electron microscope, which is disposed in an electron beam path (4), comprises at least one thin film (8, 8a-h), which thin film is at least partially permeable to electron beams, wherein the thin film (8, 8a-h) comprises electrically conductive material, is connected to a predeterminable electrical voltage (12, 12a-e) and is equipped with at least one through-hole (9, 9a-c).
    Type: Application
    Filed: August 27, 2008
    Publication date: March 4, 2010
    Applicant: Max-Planck-Gesellschaft Zur Foerderung der Wissenschaften e.V.
    Inventors: Physiker Bastian Barton, Rasmus R. Schroeder
  • Patent number: 7663103
    Abstract: A line-width measurement adjusting method, which is used when first and second electron beam intensity distributions for measuring a line width are produced from intensity distribution images of secondary electrons obtained respectively by scanning a first irradiation distance with an electron beam at first magnification, and by scanning a second irradiation distance with an electron beam at second magnification, includes the step of adjusting the second electron beam intensity distribution of the electron beam at the second magnification such that the second electron beam intensity distribution is equal to the first electron beam intensity distribution of the electron beam at first magnification. The second electron beam intensity distribution may be adjusted by increasing or decreasing a second irradiation distance when producing the electron beam intensity distribution.
    Type: Grant
    Filed: March 23, 2007
    Date of Patent: February 16, 2010
    Assignee: Advantest Corp.
    Inventors: Masayuki Kuribara, Jun Matsumoto
  • Patent number: 7638767
    Abstract: There is provided an electron microscope which can clearly detect a microscopic unevenness in a sample. According to a scanning electron microscope, when luminance signals from one pair of backscattered electron detectors are given by L and R, and when a luminance signal from a scattered electron detector is given by S, an adjustment value Lc of L and an adjustment value Rc of R are calculated by using primary homogeneous expressions of L, R, and S.
    Type: Grant
    Filed: January 19, 2007
    Date of Patent: December 29, 2009
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kohei Yamaguchi, Kenji Obara
  • Patent number: 7631547
    Abstract: A scanning probe apparatus for obtaining information of a sample or processing the sample with relative movement between the sample and the apparatus includes a sample stage for holding the sample, and a drive stage with a probe, a cantilever supporting the probe, a cantilever holding member for holding the cantilever, and a drive element for driving the probe in three directions perpendicular to each other. In addition, a movable portion surrounds the drive element and is positioned outside of the drive element, with the movable portion movable in a direction in which an inertial force generated during movement of the probe is canceled. The drive stage includes an optical path, through which light passes, provided inside of the drive stage.
    Type: Grant
    Filed: December 18, 2006
    Date of Patent: December 15, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Nobuki Yoshimatsu, Takao Kusaka, Susumu Yasuda, Junichi Seki
  • Patent number: 7618465
    Abstract: The invention relates to a near-field antenna comprising a dielectric shaped body having a tip. The shaped body is characterized in that at least the surface of the tip is metallized, thereby enhancing the sensitivity of devices comprising the near-field antenna, for example, spectroscopes, microscopes or read-write heads.
    Type: Grant
    Filed: November 19, 2005
    Date of Patent: November 17, 2009
    Assignee: Forschungszentrum Julich GmbH
    Inventors: Norbert Klein, Filip Kadlec, Petr Kuźel
  • Patent number: 7588605
    Abstract: To be able to measure a value with regard to a dissipation, or a value in proportion to a dissipation energy without making a premise by being brought into a steady state. Exciting means 12 for carrying out an excitation by following a resonance frequency of a cantilever 2, a displacement detector 10 for detecting a displacement of a stylus at a tip of the cantilever 2, an amplitude detector 20 for successively providing an amplitude from a signal from the displacement detector 10, a difference value detector 21 for providing a time difference value of the amplitude, a divider 22 for providing a value of a quotient between the time difference values, a logarithmic converter 23 for providing a logarithmic value of the value of the quotient, and a second divider 24 for providing a value with regard to a dissipation by calculating a value constituted by dividing the logarithmic value by a difference time period are provided.
    Type: Grant
    Filed: August 7, 2007
    Date of Patent: September 15, 2009
    Assignee: SII NanoTechnology Inc.
    Inventor: Norio Ookubo
  • Patent number: 7553334
    Abstract: For adjusting a positional relationship between a specimen and a probe to measure an electric characteristic of the specimen through a contact therebetween, a base table holding a specimen table holding the specimen and a probe holder holding the probe is positioned at a first position to measure the positional relationship between the probe and the specimen at the first position, and subsequently positioned at a second position to measure the positional relationship therebetween at the second position so that the probe and the specimen are contact each other at the second position, the specimen table and the probe holder are movable with respect to each other on the base table at each of the first and second positions to adjust the positional relationship between the probe and the specimen, and a measuring accuracy at the second position is superior to a measuring accuracy at the first position.
    Type: Grant
    Filed: October 23, 2007
    Date of Patent: June 30, 2009
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Eiichi Hazaki, Yasuhiro Mitsui, Takashi Furukawa, Hiroshi Yanagita, Susumu Kato, Osamu Satou, Osamu Yamada, Yoshikazu Inada
  • Publication number: 20090106868
    Abstract: The invention relates to an atomic force microscope tip characterization tool. An atomic force microscope uses a very fine exploration tip placed at the end of an elastic cantilever beam and an optical system for exploring movements of the beam in contact with a relief to be explored. The shape of the exploration tip must be known, and to this end a tool is used, placed in an atomic force microscope, the known shapes whereof are used to derive the shape of the tip. The tool of the invention includes a thin silicon beam (50) placed between two separated studs, formed on a support plate. The tip to be measured is moved between the studs remaining in contact with the beam and the measurement of the position of the tip during these movements enables the shape of the tip to be derived. The very small thickness (less than 5 nm) of the beam allows great accuracy and great reproducibility of measurement.
    Type: Application
    Filed: December 4, 2006
    Publication date: April 23, 2009
    Applicant: COMMISSARIAT A L'ENRGIE ATOMIQUE
    Inventors: Johann Foucher, Stefan Landis