Patents Represented by Attorney Adams & Wilks
  • Patent number: 8278714
    Abstract: A semiconductor device has an external connection terminal, an internal circuit region, an ESD protection N-MOS transistor provided between the external connection terminal and the internal circuit region to protect an internal element formed in the internal circuit region, and a shallow trench structure provided to isolate the ESD protection N-MOS transistor. A thin insulating film is formed on a drain region of the ESD protection N-MOS transistor. An electrode is disposed above the drain region and on the thin insulating film for receiving a signal from the external connection terminal. The thin insulating film has a film thickness and film properties that allow dielectric breakdown and establish conduction between the electrode and the drain region when a voltage exceeding an absolute maximum rating of the semiconductor device is applied to the electrode.
    Type: Grant
    Filed: September 23, 2010
    Date of Patent: October 2, 2012
    Assignee: Seiko Instruments Inc.
    Inventor: Hiroaki Takasu
  • Patent number: 8279553
    Abstract: A rolling bearing provided with a shield plate which hardly induces the irregular deformation of an outer ring without increasing a cost is provided. A rolling bearing includes an inner ring and an outer ring; a plurality of rolling bodies which are held between the inner ring and the outer ring in a rotatable manner; and an annular shield plate which is engageable with an engaging groove portion which is formed on an inner peripheral surface of the outer ring along the circumferential direction and opens toward an inner peripheral surface side and an open end side. The shield plate includes: an annular shield body; and a plurality of engaging projections which are arranged along the outer peripheral portion of the shield body, project outwardly in the radial direction from the outer peripheral portion in an inclined state, and are engageable with the engaging groove portion.
    Type: Grant
    Filed: June 9, 2011
    Date of Patent: October 2, 2012
    Assignee: Seiko Instruements Inc.
    Inventor: Haruhiko Hasegawa
  • Patent number: 8279717
    Abstract: To provide a calendar mechanism which can easily and reliably cause first and second date indicators to coincide in rotation phase, and an analog timepiece equipped therewith. A calendar mechanism of an analog timepiece includes a first date indicator including a first date character indication portion which indicates the ones column of the date, a first date indicator gear portion, and a drive cam portion which defines an endless ring-shaped cam face; a drive cam lever which includes a driven lever portion whose one end portion abuts against the drive cam portion, and an operating lever portion which includes a first fan-shaped gear portion at the leading end portion, the operating lever portion being pivoted in accordance with the driven lever portion; and a second date indicator which, being rotatable, includes a second date character indication portion which indicates the tens column of the date, and a second fan-shaped gear portion meshing with the first fan-shaped gear portion.
    Type: Grant
    Filed: October 20, 2010
    Date of Patent: October 2, 2012
    Assignee: Seiko Instruments Inc.
    Inventor: Kei Hirano
  • Patent number: 8277134
    Abstract: A printer with a cutter has a print head, a a platen roller, a fixed blade, and a movable blade that slides toward the fixed blade for cutting a printed recording sheet. A fixed blade holder has a first surface supporting the fixed blade thereon and a second surface curved along an outer periphery of the platen roller with a first gap therebetween for guiding the recording sheet toward a downstream side of the fixed blade holder when the recording sheet enters the first gap. A holder support pivotally supports the fixed blade holder and has a surface opposed to the outer periphery of the platen roller with a second gap therebetween for guiding the recording sheet to allow the recording sheet to be wound around the outer periphery of the platen roller when the recording sheet is guided by the second surface of the fixed blade holder.
    Type: Grant
    Filed: May 7, 2009
    Date of Patent: October 2, 2012
    Assignee: Seiko Instruments Inc.
    Inventor: Kouji Kawaguchi
  • Patent number: 8277879
    Abstract: There are disclosed a platen roller capable of inhibiting drop of an adhesive force of a thermally active adhesive layer, which is seen in a case where recording and thermal activating are performed with respect to a thermally active adhesive sheet having the thermally active adhesive layer on a backside of a recording surface of a sheet-like substrate, a method of manufacturing the platen roller, and a recording device and a sticking label printer which are provided with the platen rollers. As the platen roller for conveying the thermally active adhesive sheet having the thermally active adhesive layer on the backside of the recording surface of the sheet-like substrate, a platen roller is used which is subjected to a contact treatment to bring the surface of a roller portion into contact with a compound (a) containable as a solid plasticizer in the thermally active adhesive layer.
    Type: Grant
    Filed: May 25, 2010
    Date of Patent: October 2, 2012
    Assignee: Seiko Instruments Inc.
    Inventors: Yoshinori Sato, Masanori Takahashi, Hiroyuki Kohira, Tatsuya Obuchi, Minoru Hoshino
  • Patent number: 8277017
    Abstract: An image forming and cutting apparatus has an inkjet head with a first coupling member having a hole, a cutting head with a second coupling member having a hole, and a coupling pin that is received by the holes of the coupling members to couple the first and second coupling members to each other. The coupling pin has first and tapered portions with a columnar portion interposed therebetween. The hole of the first coupling member has a tapered surface for receiving the first tapered portion, and the hole of the second coupling member has a tapered surface portion and a columnar surface portion for receiving the second tapered portion and the columnar portion, respectively.
    Type: Grant
    Filed: February 4, 2008
    Date of Patent: October 2, 2012
    Assignee: Seiko I Infotech Inc.
    Inventors: Hideyuki Sakamaki, Tsunejiro Ioka
  • Patent number: 8279468
    Abstract: A printing device connects to at least one client computer via a network. The printing device includes a storage section that stores image formats for general-purpose image format data. A control section converts page description language (PDL) data sent via the network from the at least one client computer into pixel map format data, converts the pixel map format data into general-purpose image format data based on one of the image formats stored in the storage section, and sends via the network to the at least one client computer the general-purpose image format data together with a source information file containing source information indicating the source of the PDL data. A memory section stores the pixel map format data obtained through the conversion performed by the control section. A printer prints the pixel map format data.
    Type: Grant
    Filed: August 17, 2007
    Date of Patent: October 2, 2012
    Assignee: Seiko I Infotech Inc.
    Inventor: Takayuki Oyama
  • Patent number: 8274830
    Abstract: A non-volatile semiconductor memory circuit capable of improving data retention characteristics and decreasing an area thereof comprises a constant current circuit and a non-volatile memory cell connected in series. A connection point between the constant current source and the non-volatile memory cell is selected to be an output to thereby enable writing, in a reading mode or a retention mode, in the non-volatile memory cell which is in a write state. The non-volatile semiconductor memory circuit includes a power supply for data reading and retaining and a power supply for data rewriting which are provided independently, and a transistor connected between the output and the power supply for data rewriting, in which the transistor is brought into conduction state when data is rewritten.
    Type: Grant
    Filed: August 11, 2009
    Date of Patent: September 25, 2012
    Assignee: Seiko Instruments Inc.
    Inventor: Kazuhiro Tsumura
  • Patent number: 8274863
    Abstract: Disclosed is a chronograph timepiece in which it is possible to prevent the battery reliability service life time from being exceeded even when the period of time that the chronograph function is used is short, making it possible to prevent failure generation in the chronograph timepiece due to liquid leakage. A 24-hour counter down-counts a period of time that has elapsed starting from 24 hours, and a chronograph counter down-counts the period of time that chronograph measurement operation is performed from a predetermined time; when the count values of the 24-hour counter and the chronograph counter become equal to each other, a processing unit consumes a battery for the residual period of time of the two counters by a battery power consuming unit.
    Type: Grant
    Filed: July 22, 2010
    Date of Patent: September 25, 2012
    Assignee: Seiko Instruments Inc.
    Inventors: Tomohiro Ihashi, Kenji Ogasawara, Kazuo Kato, Kazumi Sakumoto, Hiroshi Shimizu, Akira Takakura, Eriko Noguchi, Takanori Hasegawa, Keishi Honmura, Saburo Manaka, Kosuke Yamamoto
  • Patent number: 8274049
    Abstract: There is provided a sample processing and observing method including irradiating a focused ion beam to a sample to form an observed surface, irradiating an electron beam to the observed surface to form an observed image, removing the surface opposite to the observed surface of the sample, forming a lamella including the observed surface and obtaining a transmission observed image for the lamella.
    Type: Grant
    Filed: March 17, 2011
    Date of Patent: September 25, 2012
    Assignee: SII NanoTechnology Inc.
    Inventors: Keiichi Tanaka, Yo Yamamoto, Xin Man, Junichi Tashiro, Toshiaki Fujii
  • Patent number: 8272778
    Abstract: A bezel member rotatably mounted to a case band member is provided with an accommodating groove, a pair of passing portions continuous with the accommodating groove at positions spaced apart by approximately 180°, and a pair of escape grooves continuous with both passing portions from the center side of the bezel member and open to the exterior of the case band member. The case band member is provided with engagement grooves arranged in a ring-like fashion so as to be opposed to the accommodating groove, and a ring-like reception groove surrounded by the engagement grooves and continuous with the engagement grooves. A lock member retains the bezel member at an arbitrary rotating position.
    Type: Grant
    Filed: February 12, 2010
    Date of Patent: September 25, 2012
    Assignee: Seiko Instruments Inc.
    Inventors: Haruki Hiranuma, Kazutaka Imai
  • Patent number: 8274864
    Abstract: Disclosed is a slip gear structure which is easy to handle at the time of dismantling/assembly and which does not easily suffer breakage even if dismantling/assembly is repeated, and a timepiece equipped with the same. A slip gear structure for a timepiece includes: a gear main body portion in the form of an annular plate having in the outer periphery thereof tooth portions, there being provided spring portions extending across an inner opening; and a positioning member equipped with a small diameter plate-like portion having a central hole with which a shaft is rotatably fit-engaged and a pair of support wall portions arranged on both sides of the central hole and protruding from one surface.
    Type: Grant
    Filed: August 25, 2010
    Date of Patent: September 25, 2012
    Assignee: Seiko Instruments Inc.
    Inventor: Tamotsu Ono
  • Patent number: 8274063
    Abstract: A composite focused ion beam device has a first ion beam irradiation system that irradiates a first ion beam for processing a sample and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a plasma type gas ion source that generates first ions for forming the first ion beam, each of the first ions having a first mass. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. Each of the second ions has a second mass smaller than that of the first mass.
    Type: Grant
    Filed: August 6, 2008
    Date of Patent: September 25, 2012
    Assignee: SII NanoTechnology Inc.
    Inventors: Takashi Kaito, Yoshitomo Nakagawa, Junichi Tashiro, Yasuhiko Sugiyama, Toshiaki Fujii, Kazuo Aita, Takashi Ogawa
  • Patent number: 8270259
    Abstract: A near field light generating element has a polyhedron core and a clad covering the core so as to contact side surfaces of the core. The polyhedron core has a reflection surface that reflects a luminous flux in a direction different from a direction of introduction of the luminous flux via one end side of the near field light generating element. A luminous flux condensing unit condenses the luminous flux reflected by the reflection surface and propagates the condensed luminous flux to the another end side. A near field light generation unit generates near field light from the propagated condensed luminous flux and emits the near field light to the exterior of the near field light generating element via the another end side. The near field light generation unit has an end surface that is exposed to the exterior on the another end side and has at least one side surface that is shielded by a light-shielding film.
    Type: Grant
    Filed: November 9, 2007
    Date of Patent: September 18, 2012
    Assignee: Seiko Instruments Inc.
    Inventors: Masakazu Hirata, Manabu Oumi, Majung Park
  • Patent number: 8269194
    Abstract: A composite focused ion beam device has a sample stage for supporting a sample, a first ion beam irradiation system that irradiates a first ion beam for processing the sample, and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a liquid metal ion source that generates first ions for forming the first ion beam. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. The first ion beam irradiated by the first ion beam irradiation system has a first beam diameter and the second ion beam irradiated by the second ion beam irradiation system has a second beam diameter smaller than the first beam diameter. The first and second ion beam irradiation systems are disposed relative to the sample stage so that axes of the first and second ion beams are orthogonal to a tilt axis of the sample stage.
    Type: Grant
    Filed: August 6, 2008
    Date of Patent: September 18, 2012
    Assignee: SII NanoTechnology Inc.
    Inventors: Takashi Kaito, Junichi Tashiro, Yasuhiko Sugiyama, Kouji Iwasaki, Toshiaki Fujii, Kazuo Aita, Takashi Ogawa
  • Patent number: 8269188
    Abstract: A charged particle beam apparatus includes an ion beam column having an ion source for generating an ion beam, a first objective lens electrode which forms a first objective lens for focusing the ion beam on a sample, and a second objective lens electrode which is disposed at a position closer to the sample than the first objective lens electrode and forms a second objective lens for focusing an ion beam accelerated with a lower acceleration voltage on the sample.
    Type: Grant
    Filed: June 30, 2011
    Date of Patent: September 18, 2012
    Assignee: SII NanoTechnology Inc.
    Inventor: Takashi Ogawa
  • Patent number: 8264912
    Abstract: A watch with a calendar mechanism has a rotatable first date indicator for displaying a ones place of a date, a rotatable second date indicator for displaying a tens place of the date, and a second date indicator feeding lever for rotating the second date indicator. The first date indicator has calendar shift teeth and first date indicator tooth portions. The calendar shift teeth include a first calendar shift tooth, a second calendar shift tooth arranged relative to the first calendar shift tooth at a first interval, a third calendar shift tooth arranged relative to the second calendar shift tooth at a second interval greater than the first interval, and a fourth calendar shift tooth arranged relative to the first calendar shift tooth at a third interval greater than each of the first and second intervals.
    Type: Grant
    Filed: January 22, 2010
    Date of Patent: September 11, 2012
    Assignee: Seiko Instruments Inc.
    Inventor: Mamoru Watanabe
  • Patent number: 8256099
    Abstract: The manufacturing method for a thermal head includes: forming a hollow concave portion and a marking concave portion having a depth larger than a depth of the hollow concave portion on one surface of a thin plate glass; a bonding step of bonding a supporting plate onto the one surface of the thin plate glass, in which the hollow concave portion and the marking concave portion are formed in the concave portion forming step; a thinning step of thinning the thin plate glass onto which the supporting plate is bonded in the bonding step until the marking concave portion extends through the substrate from a side of a back surface opposite to the one surface; and a heating resistor forming step of forming a heating resistor on the back surface of the thin plate glass thinned in the thinning step so as to be opposed to the hollow concave portion.
    Type: Grant
    Filed: October 19, 2009
    Date of Patent: September 4, 2012
    Assignee: Seiko Instruments Inc.
    Inventors: Noriyoshi Shoji, Norimitsu Sanbongi, Yoshinori Sato, Toshimitsu Morooka, Keitaro Koroishi
  • Patent number: 8257599
    Abstract: In a thermal head manufacturing method, at least one concave portion is formed on a surface of a first substrate, and a second substrate comprised of a first layer and a second layer that is denser and harder than the first layer is provided. The first and second substrates are bonded to one another so that the second layer of the second substrate covers the concave portion of the first substrate. The first layer of the second substrate is then etched until a surface of the second layer of the second substrate is exposed. At least one heating resistor is formed on the exposed surface of the second layer of the second substrate after the etching step so that the heating resistor is disposed over the concave portion of the first substrate.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: September 4, 2012
    Assignee: Seiko Instruments Inc.
    Inventors: Norimitsu Sanbongi, Toshimitsu Morooka, Keitaro Koroishi, Noriyoshi Shoji, Yoshinori Sato
  • Patent number: 8257887
    Abstract: A photomask defect correction method for correcting a defect of a photomask. A defect in a portion of a photomask to be corrected is observed and information of the observed defect for performing correction of the defect is acquired. The observed defect is corrected in accordance with the acquired defect information by irradiating the observed defect with a focused ion beam from an ion beam irradiation system having a gas field ion source that generates rare gas ions for forming the focused ion beam.
    Type: Grant
    Filed: August 6, 2008
    Date of Patent: September 4, 2012
    Assignee: SII NanoTechnology Inc.
    Inventor: Osamu Takaoka